FR2758139B1 - Compose photo-initiateur, compositions le contenant et leurs utilisations - Google Patents

Compose photo-initiateur, compositions le contenant et leurs utilisations

Info

Publication number
FR2758139B1
FR2758139B1 FR9715289A FR9715289A FR2758139B1 FR 2758139 B1 FR2758139 B1 FR 2758139B1 FR 9715289 A FR9715289 A FR 9715289A FR 9715289 A FR9715289 A FR 9715289A FR 2758139 B1 FR2758139 B1 FR 2758139B1
Authority
FR
France
Prior art keywords
compositions containing
containing same
photoinitiator compound
photoinitiator
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9715289A
Other languages
English (en)
Other versions
FR2758139A1 (fr
Inventor
Masaki Ohwa
Hitoshi Yamoto
Jean Luc Birbaum
Hiroko Nakashima
Akira Matsumoto
Hidetaka Oka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Ciba SC Holding AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of FR2758139A1 publication Critical patent/FR2758139A1/fr
Application granted granted Critical
Publication of FR2758139B1 publication Critical patent/FR2758139B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/24—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/25—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D211/08—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms
    • C07D211/18—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D211/20—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms with hydrocarbon radicals, substituted by singly bound oxygen or sulphur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paper (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Hydrogenated Pyridines (AREA)
  • Pyrrole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Indole Compounds (AREA)
FR9715289A 1996-12-06 1997-12-04 Compose photo-initiateur, compositions le contenant et leurs utilisations Expired - Fee Related FR2758139B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96810854 1996-12-06

Publications (2)

Publication Number Publication Date
FR2758139A1 FR2758139A1 (fr) 1998-07-10
FR2758139B1 true FR2758139B1 (fr) 2001-04-20

Family

ID=8225767

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9715289A Expired - Fee Related FR2758139B1 (fr) 1996-12-06 1997-12-04 Compose photo-initiateur, compositions le contenant et leurs utilisations

Country Status (19)

Country Link
US (1) US6022906A (fr)
JP (1) JPH10291969A (fr)
CN (1) CN1134457C (fr)
AT (1) AT500120B1 (fr)
AU (1) AU741581B2 (fr)
BE (1) BE1012647A5 (fr)
BR (1) BR9706068A (fr)
CA (1) CA2223376A1 (fr)
CH (1) CH692422A5 (fr)
DE (1) DE19753655B4 (fr)
FR (1) FR2758139B1 (fr)
GB (1) GB2320027B (fr)
ID (1) ID17686A (fr)
IT (1) IT1296930B1 (fr)
MY (1) MY119467A (fr)
NL (1) NL1007707C2 (fr)
SG (1) SG73482A1 (fr)
TW (1) TW452575B (fr)
ZA (1) ZA9710956B (fr)

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
JP4975211B2 (ja) * 1998-05-29 2012-07-11 チバ ホールディング インコーポレーテッド 新規な光開始剤及びその応用
AU4818299A (en) * 1998-06-03 1999-12-20 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
EP1144512B1 (fr) 1999-01-19 2003-04-23 Kimberly-Clark Worldwide, Inc. Nouveaux colorants,stabilisateurs de colorants, compositions d'encre, et leur procedes de preparation ameliores
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
KR100698799B1 (ko) * 1999-05-10 2007-03-26 시바 스페셜티 케미칼스 홀딩 인크. 신규한 광개시제 및 블록 공중합체
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
WO2002000735A1 (fr) 2000-06-19 2002-01-03 Kimberly-Clark Worldwide, Inc. Nouveaux photo-initiateurs et leurs applications
WO2002048202A1 (fr) * 2000-12-13 2002-06-20 Ciba Specialty Chemicals Holding Inc. Photo-initiateurs actifs en surface
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
US20030225179A1 (en) * 2002-04-26 2003-12-04 Chiu Chingfan Chris Novel morpholinoketone derivatives, and preparation process and uses of the same
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
EP1388538B1 (fr) 2002-07-09 2010-09-01 Merck Patent GmbH Initiateur de polymérisation
GB2403478A (en) * 2003-07-04 2005-01-05 Sun Chemical Ltd Piperazine-based sensitisers
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
KR101204282B1 (ko) 2004-02-02 2012-11-26 시바 홀딩 인크 관능화된 광개시제
DE102004022232A1 (de) * 2004-05-04 2005-12-01 Infineon Technologies Ag Viskoses Klebematerial zur Befestigung elektronischer Bauelemente
GB2420117A (en) * 2004-11-10 2006-05-17 Sun Chemical Ltd Piperazino based multi-functional photoinitiators
JP2007047302A (ja) * 2005-08-08 2007-02-22 Toshiba Corp ホログラム記録媒体
JP5051417B2 (ja) * 2006-03-29 2012-10-17 Ｄｉｃ株式会社 光開始剤及び重合性組成物
EP2027087A2 (fr) * 2006-05-18 2009-02-25 MannKind Corporation Inhibiteurs de kinases intracellulaires
US20100112223A1 (en) * 2006-11-14 2010-05-06 Contra Vision Ltd. Printing superimposed layers
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
KR101831472B1 (ko) * 2010-06-28 2018-02-22 바스프 에스이 금속 비함유 표백 조성물
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
JP5544239B2 (ja) 2010-07-29 2014-07-09 富士フイルム株式会社 重合性組成物
EP2638076B1 (fr) 2010-11-12 2018-03-28 Coloplast A/S Nouveaux photoamorceurs
KR101830206B1 (ko) 2010-12-28 2018-02-20 후지필름 가부시키가이샤 차광막 형성용 티타늄 블랙 분산 조성물과 그 제조방법, 흑색 감방사선성 조성물, 흑색 경화막, 고체촬상소자, 및 흑색 경화막의 제조방법
JP5821282B2 (ja) * 2011-05-26 2015-11-24 Jsr株式会社 新規化合物、新規化合物の製造方法、新規化合物を含有する感放射線性組成物及び硬化膜
KR101622990B1 (ko) 2011-09-14 2016-05-20 후지필름 가부시키가이샤 컬러필터용 착색 감방사선성 조성물, 패턴 형성 방법, 컬러필터, 그 제조 방법, 및 고체 촬상 소자
JP5922013B2 (ja) 2011-12-28 2016-05-24 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP5976523B2 (ja) 2011-12-28 2016-08-23 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP5934664B2 (ja) 2012-03-19 2016-06-15 富士フイルム株式会社 着色感放射線性組成物、着色硬化膜、カラーフィルタ、着色パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
JP5775479B2 (ja) 2012-03-21 2015-09-09 富士フイルム株式会社 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
IN2014DN09563A (fr) 2012-05-16 2015-07-17 Coloplast As
JP2014009173A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法
JP5934682B2 (ja) 2012-08-31 2016-06-15 富士フイルム株式会社 マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法
JP5894943B2 (ja) 2012-08-31 2016-03-30 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、マイクロレンズの製造方法、及び固体撮像素子
JP5909468B2 (ja) 2012-08-31 2016-04-26 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子
JP6302650B2 (ja) 2012-11-30 2018-03-28 富士フイルム株式会社 硬化性樹脂組成物、これを用いた、色素含有層の形成方法、イメージセンサチップの製造方法及びイメージセンサチップ
JP6140593B2 (ja) 2012-11-30 2017-05-31 富士フイルム株式会社 硬化性樹脂組成物、これを用いたイメージセンサチップの製造方法及びイメージセンサチップ
CN102993123B (zh) * 2012-12-21 2015-07-29 天津久日化学股份有限公司 一种高分子型多官能团α-胺烷基苯乙酮光引发剂
JP6170673B2 (ja) 2012-12-27 2017-07-26 富士フイルム株式会社 カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー
WO2014104137A1 (fr) 2012-12-28 2014-07-03 富士フイルム株式会社 Composition de résine durcissable, filtre bloquant les rayons infrarouges, et élément d'imagerie à semi-conducteurs mettant en œuvre ce filtre
SG11201505047WA (en) 2012-12-28 2015-08-28 Fujifilm Corp Curable resin composition for forming infrared reflective film, infrared reflective film and manufacturing method thereof, infrared ray cutoff filter and solid-state imaging device using the same
EP2960691B1 (fr) 2013-02-19 2017-09-27 Fujifilm Corporation Composition d'absorption proche infrarouge, filtre de blocage proche infrarouge, procédé de production de filtre de blocage proche infrarouge, module de camera et procédé de fabrication de module de camera
CN105247391B (zh) 2013-04-11 2018-06-12 富士胶片株式会社 近红外线吸收性组合物、近红外线截止滤波器及其制造方法、以及照相机模块及其制造方法
JP6159291B2 (ja) 2013-05-23 2017-07-05 富士フイルム株式会社 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタおよびその製造方法、並びに、カメラモジュール
JP2015017244A (ja) 2013-06-12 2015-01-29 富士フイルム株式会社 硬化性組成物、硬化膜、近赤外線カットフィルタ、カメラモジュールおよびカメラモジュールの製造方法
JP5540165B1 (ja) * 2013-06-28 2014-07-02 太陽インキ製造株式会社 光硬化性樹脂組成物、その硬化物およびプリント配線板
JP6162084B2 (ja) 2013-09-06 2017-07-12 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素
WO2015174402A1 (fr) * 2014-05-15 2015-11-19 Dic株式会社 Composé, composition durcissable par rayon d'énergie actif, article durci de celui-ci, encre d'impression et encre d'impression à jet d'encre
US10005851B2 (en) 2014-08-01 2018-06-26 Adeka Corporation Polymerization initiator and radically polymerizable composition containing same
JP2016079157A (ja) * 2014-10-22 2016-05-16 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
JP6530902B2 (ja) * 2014-10-22 2019-06-12 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
JP6568218B2 (ja) 2014-12-23 2019-08-28 ブリヂストン アメリカズ タイヤ オペレーションズ、 エルエルシー 化学線硬化型高分子混合物、硬化高分子混合物、及び関連するプロセス
WO2017051182A1 (fr) * 2015-09-25 2017-03-30 Photocentric Limited Procédés de fabrication d'un objet et formulations utilisées dans ces procédés
WO2017105960A1 (fr) 2015-12-17 2017-06-22 Bridgestone Americas Tire Operations, Llc Cartouches de fabrication additive et procédés pour produire des produits polymères durcis par fabrication additive
TWI634135B (zh) 2015-12-25 2018-09-01 日商富士軟片股份有限公司 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件
KR102134138B1 (ko) 2016-03-14 2020-07-15 후지필름 가부시키가이샤 조성물, 막, 경화막, 광학 센서 및 막의 제조 방법
WO2017186480A1 (fr) 2016-04-26 2017-11-02 Basf Se Composition de blanchiment sans métal
US11079675B2 (en) 2016-05-13 2021-08-03 Dic Corporation Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink
TWI830588B (zh) 2016-08-01 2024-01-21 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜、積層體、硬化膜的製造方法、積層體的製造方法及半導體元件
EP3532267B1 (fr) 2016-10-27 2023-03-01 Bridgestone Americas Tire Operations, LLC Procédés de production de produits polymères durcis par fabrication additive
WO2018221457A1 (fr) 2017-05-31 2018-12-06 富士フイルム株式会社 Composition de résine photosensible, précurseur polymère, film durci, stratifié, procédé de production de film durci et dispositif à semi-conducteur
KR102453516B1 (ko) 2018-03-13 2022-10-12 후지필름 가부시키가이샤 경화막의 제조 방법, 고체 촬상 소자의 제조 방법
TWI677492B (zh) * 2018-07-17 2019-11-21 奇鈦科技股份有限公司 液態光引發化合物及其應用
EP3848627A4 (fr) 2018-09-07 2021-10-27 FUJIFILM Corporation Unité de phare de véhicule, film de protection contre la lumière de phare et procédé de production de film de protection contre la lumière de phare
WO2020066416A1 (fr) 2018-09-28 2020-04-02 富士フイルム株式会社 Composition de résine photosensible, film durci, stratifié, procédé de production de film durci, et dispositif à semi-conducteurs
JP7078749B2 (ja) 2018-12-05 2022-05-31 富士フイルム株式会社 感光性樹脂組成物、パターン形成方法、硬化膜、積層体、及び、デバイス
CN113168093B (zh) 2018-12-05 2024-04-30 富士胶片株式会社 图案形成方法、感光性树脂组合物、固化膜、层叠体及器件
CN113518805B (zh) * 2018-12-28 2023-08-08 意大利艾坚蒙树脂有限公司 光引发剂
EP3940018A4 (fr) 2019-03-15 2022-05-18 FUJIFILM Corporation Composition de résine durcissable, film durci, corps stratifié, procédé de production de film durci, dispositif à semi-conducteur et précurseur de polymère
EP3950753A4 (fr) 2019-03-29 2022-05-25 FUJIFILM Corporation Composition de résine photosensible, film durci, inducteur et antenne
TW202112837A (zh) 2019-09-26 2021-04-01 日商富士軟片股份有限公司 導熱層的製造方法、積層體的製造方法及半導體器件的製造方法
TW202128839A (zh) 2019-11-21 2021-08-01 日商富士軟片股份有限公司 圖案形成方法、光硬化性樹脂組成物、積層體的製造方法及電子元件的製造方法
JP7330295B2 (ja) 2019-12-25 2023-08-21 富士フイルム株式会社 樹脂組成物、硬化物、紫外線吸収剤、紫外線カットフィルタ、レンズ、保護材、化合物及び化合物の合成方法
CN115776992A (zh) 2020-08-21 2023-03-10 富士胶片株式会社 聚合性组合物、聚合物、紫外线遮蔽材料、层叠体、化合物、紫外线吸收剂及化合物的制造方法
WO2022059706A1 (fr) 2020-09-18 2022-03-24 富士フイルム株式会社 Composition, film contenant des particules magnétiques et composant électronique
EP4220669A4 (fr) 2020-09-24 2024-03-20 Fujifilm Corp Composition, produit durci contenant des particules magnétiques, substrat introduit par des particules magnétiques et matériau électronique
EP4317294A1 (fr) 2021-03-22 2024-02-07 FUJIFILM Corporation Composition, produit durci contenant des particules magnétiques, substrat dans lequel sont introduites des particules magnétiques et matériau électronique
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
KR102627683B1 (ko) 2021-08-31 2024-01-23 후지필름 가부시키가이샤 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액
WO2023054565A1 (fr) 2021-09-30 2023-04-06 富士フイルム株式会社 Procédé de production d'une composition contenant des particules magnétiques, composition contenant des particules magnétiques, produit durci contenant des particules magnétiques, substrat à particules magnétiques introduites et matériau électronique
CN115141162B (zh) * 2022-09-05 2022-12-20 天津久日新材料股份有限公司 一种光引发剂的制备方法及其产品
CN116003273B (zh) * 2023-02-09 2023-11-07 湖南勤润新材料有限公司 一种α-胺基酮类化合物、其制备方法及其在光辐射固化领域的应用
CN117532894A (zh) * 2023-12-05 2024-02-09 东莞美泰电子有限公司 一种用于保护零件的pu皮革热压贴皮工艺

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
EP0138754B1 (fr) * 1983-08-15 1988-05-25 Ciba-Geigy Ag Compositions photodurcissables
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
ES2110987T3 (es) * 1990-11-05 1998-03-01 Tokyo Ohka Kogyo Co Ltd Composiciones fotopolimerizables.
US5698285A (en) * 1995-10-19 1997-12-16 Three Bond Co., Ltd. Adhesive for optical disk

Also Published As

Publication number Publication date
AU4677397A (en) 1998-06-11
US6022906A (en) 2000-02-08
DE19753655A1 (de) 1998-06-10
DE19753655B4 (de) 2008-05-15
JPH10291969A (ja) 1998-11-04
NL1007707A1 (nl) 1998-06-09
CN1134457C (zh) 2004-01-14
AU741581B2 (en) 2001-12-06
BR9706068A (pt) 2000-03-21
GB2320027A (en) 1998-06-10
NL1007707C2 (nl) 1998-10-27
SG73482A1 (en) 2000-06-20
AT500120A1 (de) 2005-10-15
FR2758139A1 (fr) 1998-07-10
GB2320027B (en) 2001-05-09
CH692422A5 (de) 2002-06-14
CN1184117A (zh) 1998-06-10
ITMI972703A1 (it) 1999-06-05
CA2223376A1 (fr) 1998-06-06
TW452575B (en) 2001-09-01
ZA9710956B (en) 1998-06-15
GB9723965D0 (en) 1998-01-07
BE1012647A5 (fr) 2001-02-06
IT1296930B1 (it) 1999-08-03
AT500120B1 (de) 2007-03-15
MY119467A (en) 2005-05-31
ID17686A (id) 1998-01-22

Similar Documents

Publication Publication Date Title
FR2758139B1 (fr) Compose photo-initiateur, compositions le contenant et leurs utilisations
FR2781794B1 (fr) Compose photo-initiateur, composition le contenant, et leurs utilisations
MA24466A1 (fr) Compositions contenant de la tetrahydrolistatine
FR2777892B1 (fr) Derive de 1-alcoxy-polyalkyl-piperidine, composition polymerisable le contenant et son utilisation
DK0820459T3 (da) Organoboran-polyoxyalkylenpolyamin-komplekser og adhæsivsammensætninger fremstillet dermed
ID24703A (id) Kuinolon antimikroba, komposisi dan penggunaannya
DE69605610T2 (de) Stabile Zusammensetzung, die Ascorbinsäure enthällt
FR2763588B1 (fr) Composes triaromatiques, compositions les contenant et utilisations
FR2741622B1 (fr) Composes photo-initiateurs, composition les contenant, leur utilisation et procedes les utilisant
DZ2964A1 (fr) Diphénylurées substituées nouvelles, et compositions pharmaceutiques les contenant.
ATA900198A (de) Strahlungshärtbares cyanoacrylat-enthaltende zusammensetzung
TR28139A (tr) Polisilokzan graftli polimer ihtive eden yapistirici madde ve bunu iceren kozmetik terkipleri.
DK0747050T4 (da) Farmaceutiske sammensætninger, der indeholder irbesartan
TR199501447A2 (tr) Oral bilesimler.
DE69410628T2 (de) Wasserlösliche organosiloxanverbindungen
DE69513816D1 (de) Cellulase enthaltende gewebeweichmachende zusammensetzungen
BR9405688A (pt) Aperfeiçoamentos em composições adesivas sensíveis à pressão, repolpáveis
MA26553A1 (fr) Alpha-aryl-n-alkylnitrones et compositions pharmaceutiques contenant ceux-la
DE69601765D1 (de) Extrakt von Iridaceen und Zusammensetzungen, die ihn enthalten
DE69305615T2 (de) Parfümiertes mittel
NO20002165D0 (no) Farmasøytiske blandinger inneholdende cyklodekstriner og taksoider
FR2694195B1 (fr) Nouvelles compositions cosmétiques amincissantes.
FR2772599B1 (fr) Composition cosmetique et ses utilisations
FR2759368B1 (fr) Composes biaromatiques, compositions les contenant et utilisations
FR2746317B1 (fr) Nouvelles compositions antitumorales

Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20060831