ID17686A - Fotoinisiator alpha-aminoasetofenon baru - Google Patents

Fotoinisiator alpha-aminoasetofenon baru

Info

Publication number
ID17686A
ID17686A IDP973786A ID973786A ID17686A ID 17686 A ID17686 A ID 17686A ID P973786 A IDP973786 A ID P973786A ID 973786 A ID973786 A ID 973786A ID 17686 A ID17686 A ID 17686A
Authority
ID
Indonesia
Prior art keywords
photoinisiator
aminoasetofenon
new alpha
alpha
new
Prior art date
Application number
IDP973786A
Other languages
English (en)
Indonesian (id)
Inventor
Masaki Ohwa
Hitoshi Yamoto
Jean-Luc Birbaum
Hiroko Nakashima
Akira Matsumoto
Hidetaka Oka
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of ID17686A publication Critical patent/ID17686A/id

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/24Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/25Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D211/00Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/06Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D211/08Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms
    • C07D211/18Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D211/20Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms with hydrocarbon radicals, substituted by singly bound oxygen or sulphur atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Indole Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paper (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Hydrogenated Pyridines (AREA)
  • Pyrrole Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
IDP973786A 1996-12-06 1997-11-27 Fotoinisiator alpha-aminoasetofenon baru ID17686A (id)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96810854 1996-12-06

Publications (1)

Publication Number Publication Date
ID17686A true ID17686A (id) 1998-01-22

Family

ID=8225767

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP973786A ID17686A (id) 1996-12-06 1997-11-27 Fotoinisiator alpha-aminoasetofenon baru

Country Status (19)

Country Link
US (1) US6022906A (fr)
JP (1) JPH10291969A (fr)
CN (1) CN1134457C (fr)
AT (1) AT500120B1 (fr)
AU (1) AU741581B2 (fr)
BE (1) BE1012647A5 (fr)
BR (1) BR9706068A (fr)
CA (1) CA2223376A1 (fr)
CH (1) CH692422A5 (fr)
DE (1) DE19753655B4 (fr)
FR (1) FR2758139B1 (fr)
GB (1) GB2320027B (fr)
ID (1) ID17686A (fr)
IT (1) IT1296930B1 (fr)
MY (1) MY119467A (fr)
NL (1) NL1007707C2 (fr)
SG (1) SG73482A1 (fr)
TW (1) TW452575B (fr)
ZA (1) ZA9710956B (fr)

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6458864B1 (en) 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers
PL338379A1 (en) * 1998-06-03 2000-10-23 Kimberly Clark Co Novel photoinitiators and their application
AU2853000A (en) 1999-01-19 2000-08-01 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods ofmaking the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
KR100698799B1 (ko) * 1999-05-10 2007-03-26 시바 스페셜티 케미칼스 홀딩 인크. 신규한 광개시제 및 블록 공중합체
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
MXPA02012011A (es) 2000-06-19 2003-04-22 Kimberly Clark Co Fotoiniciaodres novedosos y aplicaciones para los mismos.
DE60136005D1 (en) * 2000-12-13 2008-11-13 Ciba Holding Inc Oberflächenaktive photoinitiatoren
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
US20030225179A1 (en) * 2002-04-26 2003-12-04 Chiu Chingfan Chris Novel morpholinoketone derivatives, and preparation process and uses of the same
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
EP1388538B1 (fr) 2002-07-09 2010-09-01 Merck Patent GmbH Initiateur de polymérisation
GB2403478A (en) * 2003-07-04 2005-01-05 Sun Chemical Ltd Piperazine-based sensitisers
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
JP4975449B2 (ja) 2004-02-02 2012-07-11 チバ ホールディング インコーポレーテッド 官能化光開始剤
DE102004022232A1 (de) * 2004-05-04 2005-12-01 Infineon Technologies Ag Viskoses Klebematerial zur Befestigung elektronischer Bauelemente
GB2420117A (en) * 2004-11-10 2006-05-17 Sun Chemical Ltd Piperazino based multi-functional photoinitiators
JP2007047302A (ja) * 2005-08-08 2007-02-22 Toshiba Corp ホログラム記録媒体
JP5051417B2 (ja) * 2006-03-29 2012-10-17 Dic株式会社 光開始剤及び重合性組成物
JP5682051B2 (ja) * 2006-05-18 2015-03-11 ファーマサイクリックス,インク. 細胞内キナーゼ阻害剤
AU2007343079B2 (en) * 2006-11-14 2013-01-17 Contra Vision Ltd. Improvements to printing superimposed layers
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
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WO2017051182A1 (fr) * 2015-09-25 2017-03-30 Photocentric Limited Procédés de fabrication d'un objet et formulations utilisées dans ces procédés
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WO2017186480A1 (fr) 2016-04-26 2017-11-02 Basf Se Composition de blanchiment sans métal
US11079675B2 (en) 2016-05-13 2021-08-03 Dic Corporation Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink
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EP3532267B1 (fr) 2016-10-27 2023-03-01 Bridgestone Americas Tire Operations, LLC Procédés de production de produits polymères durcis par fabrication additive
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SG11202105559WA (en) 2018-12-05 2021-06-29 Fujifilm Corp Photosensitive resin composition, pattern forming method, cured film, laminate, and device
WO2020136522A1 (fr) * 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiateurs
JP7171890B2 (ja) 2019-03-15 2022-11-15 富士フイルム株式会社 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、及び、ポリマー前駆体
WO2020203277A1 (fr) 2019-03-29 2020-10-08 富士フイルム株式会社 Composition de résine photosensible, film durci, inducteur et antenne
TW202112837A (zh) 2019-09-26 2021-04-01 日商富士軟片股份有限公司 導熱層的製造方法、積層體的製造方法及半導體器件的製造方法
TW202128839A (zh) 2019-11-21 2021-08-01 日商富士軟片股份有限公司 圖案形成方法、光硬化性樹脂組成物、積層體的製造方法及電子元件的製造方法
CN114867790A (zh) 2019-12-25 2022-08-05 富士胶片株式会社 树脂组合物、固化物、紫外线吸收剂、紫外线截止滤波器、透镜、保护材料、化合物及化合物的合成方法
CN115776992A (zh) 2020-08-21 2023-03-10 富士胶片株式会社 聚合性组合物、聚合物、紫外线遮蔽材料、层叠体、化合物、紫外线吸收剂及化合物的制造方法
WO2022059706A1 (fr) 2020-09-18 2022-03-24 富士フイルム株式会社 Composition, film contenant des particules magnétiques et composant électronique
EP4220669A4 (fr) 2020-09-24 2024-03-20 Fujifilm Corp Composition, produit durci contenant des particules magnétiques, substrat introduit par des particules magnétiques et matériau électronique
JPWO2022202394A1 (fr) 2021-03-22 2022-09-29
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
KR102627683B1 (ko) 2021-08-31 2024-01-23 후지필름 가부시키가이샤 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액
WO2023054565A1 (fr) 2021-09-30 2023-04-06 富士フイルム株式会社 Procédé de production d'une composition contenant des particules magnétiques, composition contenant des particules magnétiques, produit durci contenant des particules magnétiques, substrat à particules magnétiques introduites et matériau électronique
CN115141162B (zh) * 2022-09-05 2022-12-20 天津久日新材料股份有限公司 一种光引发剂的制备方法及其产品
CN116003273B (zh) * 2023-02-09 2023-11-07 湖南勤润新材料有限公司 一种α-胺基酮类化合物、其制备方法及其在光辐射固化领域的应用
CN117532894A (zh) * 2023-12-05 2024-02-09 东莞美泰电子有限公司 一种用于保护零件的pu皮革热压贴皮工艺

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
EP0088050B1 (fr) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Composition colorée photodurcissable
DE3471486D1 (de) * 1983-08-15 1988-06-30 Ciba Geigy Ag Photocurable compositions
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
EP0485334B1 (fr) * 1990-11-05 1997-11-26 Tokyo Ohka Kogyo Co., Ltd. Compositions photopolymérisables
US5698285A (en) * 1995-10-19 1997-12-16 Three Bond Co., Ltd. Adhesive for optical disk

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ITMI972703A1 (it) 1999-06-05
NL1007707A1 (nl) 1998-06-09
GB2320027A (en) 1998-06-10
BE1012647A5 (fr) 2001-02-06
TW452575B (en) 2001-09-01
AT500120A1 (de) 2005-10-15
MY119467A (en) 2005-05-31
FR2758139A1 (fr) 1998-07-10
FR2758139B1 (fr) 2001-04-20
AT500120B1 (de) 2007-03-15
GB2320027B (en) 2001-05-09
IT1296930B1 (it) 1999-08-03
CN1134457C (zh) 2004-01-14
SG73482A1 (en) 2000-06-20
AU741581B2 (en) 2001-12-06
JPH10291969A (ja) 1998-11-04
BR9706068A (pt) 2000-03-21
GB9723965D0 (en) 1998-01-07
DE19753655B4 (de) 2008-05-15
ZA9710956B (en) 1998-06-15
CA2223376A1 (fr) 1998-06-06
CN1184117A (zh) 1998-06-10
CH692422A5 (de) 2002-06-14
NL1007707C2 (nl) 1998-10-27
US6022906A (en) 2000-02-08
DE19753655A1 (de) 1998-06-10
AU4677397A (en) 1998-06-11

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