NL1007707C2 - Alpha-Aminoacetofenonen en hun toepassing als foto-initiatoren. - Google Patents
Alpha-Aminoacetofenonen en hun toepassing als foto-initiatoren. Download PDFInfo
- Publication number
- NL1007707C2 NL1007707C2 NL1007707A NL1007707A NL1007707C2 NL 1007707 C2 NL1007707 C2 NL 1007707C2 NL 1007707 A NL1007707 A NL 1007707A NL 1007707 A NL1007707 A NL 1007707A NL 1007707 C2 NL1007707 C2 NL 1007707C2
- Authority
- NL
- Netherlands
- Prior art keywords
- alkyl
- phenyl
- substituted
- unsubstituted
- groups
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C323/24—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/25—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
- C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/08—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms
- C07D211/18—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D211/20—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms with hydrocarbon radicals, substituted by singly bound oxygen or sulphur atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Indole Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Paper (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Hydrogenated Pyridines (AREA)
- Pyrrole Compounds (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96810854 | 1996-12-06 | ||
EP96810854 | 1996-12-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1007707A1 NL1007707A1 (nl) | 1998-06-09 |
NL1007707C2 true NL1007707C2 (nl) | 1998-10-27 |
Family
ID=8225767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1007707A NL1007707C2 (nl) | 1996-12-06 | 1997-12-05 | Alpha-Aminoacetofenonen en hun toepassing als foto-initiatoren. |
Country Status (19)
Country | Link |
---|---|
US (1) | US6022906A (fr) |
JP (1) | JPH10291969A (fr) |
CN (1) | CN1134457C (fr) |
AT (1) | AT500120B1 (fr) |
AU (1) | AU741581B2 (fr) |
BE (1) | BE1012647A5 (fr) |
BR (1) | BR9706068A (fr) |
CA (1) | CA2223376A1 (fr) |
CH (1) | CH692422A5 (fr) |
DE (1) | DE19753655B4 (fr) |
FR (1) | FR2758139B1 (fr) |
GB (1) | GB2320027B (fr) |
ID (1) | ID17686A (fr) |
IT (1) | IT1296930B1 (fr) |
MY (1) | MY119467A (fr) |
NL (1) | NL1007707C2 (fr) |
SG (1) | SG73482A1 (fr) |
TW (1) | TW452575B (fr) |
ZA (1) | ZA9710956B (fr) |
Families Citing this family (87)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6524379B2 (en) | 1997-08-15 | 2003-02-25 | Kimberly-Clark Worldwide, Inc. | Colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
US6458864B1 (en) | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
PL338379A1 (en) * | 1998-06-03 | 2000-10-23 | Kimberly Clark Co | Novel photoinitiators and their application |
AU2853000A (en) | 1999-01-19 | 2000-08-01 | Kimberly-Clark Worldwide, Inc. | Novel colorants, colorant stabilizers, ink compositions, and improved methods ofmaking the same |
US6331056B1 (en) | 1999-02-25 | 2001-12-18 | Kimberly-Clark Worldwide, Inc. | Printing apparatus and applications therefor |
KR100698799B1 (ko) * | 1999-05-10 | 2007-03-26 | 시바 스페셜티 케미칼스 홀딩 인크. | 신규한 광개시제 및 블록 공중합체 |
US6368395B1 (en) | 1999-05-24 | 2002-04-09 | Kimberly-Clark Worldwide, Inc. | Subphthalocyanine colorants, ink compositions, and method of making the same |
MXPA02012011A (es) | 2000-06-19 | 2003-04-22 | Kimberly Clark Co | Fotoiniciaodres novedosos y aplicaciones para los mismos. |
DE60136005D1 (en) * | 2000-12-13 | 2008-11-13 | Ciba Holding Inc | Oberflächenaktive photoinitiatoren |
JP4152597B2 (ja) * | 2001-02-16 | 2008-09-17 | 三菱製紙株式会社 | 感光性組成物 |
US20030225179A1 (en) * | 2002-04-26 | 2003-12-04 | Chiu Chingfan Chris | Novel morpholinoketone derivatives, and preparation process and uses of the same |
JP2004043433A (ja) * | 2002-04-26 | 2004-02-12 | Kitai Kagi Kofun Yugenkoshi | モルフォリノケトン誘導体及びその用途 |
EP1388538B1 (fr) | 2002-07-09 | 2010-09-01 | Merck Patent GmbH | Initiateur de polymérisation |
GB2403478A (en) * | 2003-07-04 | 2005-01-05 | Sun Chemical Ltd | Piperazine-based sensitisers |
US20050065227A1 (en) * | 2003-09-22 | 2005-03-24 | Condon John R. | Visible-light sensitive macro-initiator |
JP4975449B2 (ja) | 2004-02-02 | 2012-07-11 | チバ ホールディング インコーポレーテッド | 官能化光開始剤 |
DE102004022232A1 (de) * | 2004-05-04 | 2005-12-01 | Infineon Technologies Ag | Viskoses Klebematerial zur Befestigung elektronischer Bauelemente |
GB2420117A (en) * | 2004-11-10 | 2006-05-17 | Sun Chemical Ltd | Piperazino based multi-functional photoinitiators |
JP2007047302A (ja) * | 2005-08-08 | 2007-02-22 | Toshiba Corp | ホログラム記録媒体 |
JP5051417B2 (ja) * | 2006-03-29 | 2012-10-17 | Dic株式会社 | 光開始剤及び重合性組成物 |
JP5682051B2 (ja) * | 2006-05-18 | 2015-03-11 | ファーマサイクリックス,インク. | 細胞内キナーゼ阻害剤 |
AU2007343079B2 (en) * | 2006-11-14 | 2013-01-17 | Contra Vision Ltd. | Improvements to printing superimposed layers |
JP5701576B2 (ja) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | 分散組成物及び感光性樹脂組成物、並びに固体撮像素子 |
EP2585431B1 (fr) | 2010-06-28 | 2017-09-06 | Basf Se | Composition de blanchiment dépourvue de métal |
JP5622564B2 (ja) | 2010-06-30 | 2014-11-12 | 富士フイルム株式会社 | 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子 |
JP5544239B2 (ja) | 2010-07-29 | 2014-07-09 | 富士フイルム株式会社 | 重合性組成物 |
RU2584165C2 (ru) | 2010-11-12 | 2016-05-20 | Колопласт А/С | Новые полимерные фотоинициаторы |
EP2472330B1 (fr) | 2010-12-28 | 2017-01-25 | Fujifilm Corporation | Composition sensible au rayonnement noire, film durci noir, élément d'imagerie semi-conducteur et procédé de fabrication du film durci noir |
JP5821282B2 (ja) * | 2011-05-26 | 2015-11-24 | Jsr株式会社 | 新規化合物、新規化合物の製造方法、新規化合物を含有する感放射線性組成物及び硬化膜 |
CN103608704B (zh) | 2011-09-14 | 2016-03-16 | 富士胶片株式会社 | 着色放射线敏感性组合物、图案形成方法、彩色滤光片及其制备方法以及固态图像传感器 |
JP5976523B2 (ja) | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | 光学部材セット及びこれを用いた固体撮像素子 |
JP5922013B2 (ja) | 2011-12-28 | 2016-05-24 | 富士フイルム株式会社 | 光学部材セット及びこれを用いた固体撮像素子 |
JP5934664B2 (ja) | 2012-03-19 | 2016-06-15 | 富士フイルム株式会社 | 着色感放射線性組成物、着色硬化膜、カラーフィルタ、着色パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置 |
JP5775479B2 (ja) | 2012-03-21 | 2015-09-09 | 富士フイルム株式会社 | 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置 |
EP2850112B1 (fr) | 2012-05-16 | 2018-11-21 | Coloplast A/S | Nouveaux photoinitiateurs polymères et monomères de photoinitiateurs |
JP2014009173A (ja) * | 2012-06-28 | 2014-01-20 | Toray Fine Chemicals Co Ltd | スルフィド化合物およびその製造方法 |
JP5909468B2 (ja) | 2012-08-31 | 2016-04-26 | 富士フイルム株式会社 | 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子 |
JP5934682B2 (ja) | 2012-08-31 | 2016-06-15 | 富士フイルム株式会社 | マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法 |
JP5894943B2 (ja) | 2012-08-31 | 2016-03-30 | 富士フイルム株式会社 | 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、マイクロレンズの製造方法、及び固体撮像素子 |
CN104823083A (zh) | 2012-11-30 | 2015-08-05 | 富士胶片株式会社 | 硬化性树脂组合物、使用其的图像传感器芯片的制造方法及图像传感器芯片 |
SG11201504182RA (en) | 2012-11-30 | 2015-06-29 | Fujifilm Corp | Curable resin composition, production method of image sensor chip using the same, and image sensor chip |
CN102993123B (zh) * | 2012-12-21 | 2015-07-29 | 天津久日化学股份有限公司 | 一种高分子型多官能团α-胺烷基苯乙酮光引发剂 |
JP6170673B2 (ja) | 2012-12-27 | 2017-07-26 | 富士フイルム株式会社 | カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー |
KR20150086524A (ko) | 2012-12-28 | 2015-07-28 | 후지필름 가부시키가이샤 | 경화성 수지 조성물, 적외선 컷 필터 및 이것을 사용한 고체 촬상 소자 |
SG11201505047WA (en) | 2012-12-28 | 2015-08-28 | Fujifilm Corp | Curable resin composition for forming infrared reflective film, infrared reflective film and manufacturing method thereof, infrared ray cutoff filter and solid-state imaging device using the same |
CN104903759B (zh) | 2013-02-19 | 2017-09-22 | 富士胶片株式会社 | 近红外线吸收性组合物、近红外线截止滤波器及其制造方法、以及照相机模块及其制造方法 |
KR101865599B1 (ko) | 2013-04-11 | 2018-06-08 | 후지필름 가부시키가이샤 | 근적외선 흡수성 조성물, 이것을 이용한 근적외선 차단 필터 및 그 제조 방법, 및 카메라 모듈 및 그 제조 방법 |
JP6159291B2 (ja) | 2013-05-23 | 2017-07-05 | 富士フイルム株式会社 | 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタおよびその製造方法、並びに、カメラモジュール |
JP2015017244A (ja) | 2013-06-12 | 2015-01-29 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、近赤外線カットフィルタ、カメラモジュールおよびカメラモジュールの製造方法 |
JP5540165B1 (ja) * | 2013-06-28 | 2014-07-02 | 太陽インキ製造株式会社 | 光硬化性樹脂組成物、その硬化物およびプリント配線板 |
JP6162084B2 (ja) | 2013-09-06 | 2017-07-12 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素 |
CN106414398B (zh) * | 2014-05-15 | 2019-04-05 | Dic株式会社 | 化合物、活性能量射线固化性组合物、其固化物、印刷油墨和喷墨记录用油墨 |
KR102423976B1 (ko) | 2014-08-01 | 2022-07-22 | 가부시키가이샤 아데카 | 신규 중합 개시제 및 상기 중합 개시제를 함유하는 라디칼 중합성 조성물 |
JP2016079157A (ja) * | 2014-10-22 | 2016-05-16 | 株式会社Adeka | 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物 |
JP6530902B2 (ja) * | 2014-10-22 | 2019-06-12 | 株式会社Adeka | 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物 |
CN113325664A (zh) | 2014-12-23 | 2021-08-31 | 普利司通美国轮胎运营有限责任公司 | 聚合物产品的增材制造方法 |
WO2017051182A1 (fr) * | 2015-09-25 | 2017-03-30 | Photocentric Limited | Procédés de fabrication d'un objet et formulations utilisées dans ces procédés |
WO2017105960A1 (fr) | 2015-12-17 | 2017-06-22 | Bridgestone Americas Tire Operations, Llc | Cartouches de fabrication additive et procédés pour produire des produits polymères durcis par fabrication additive |
TWI634135B (zh) | 2015-12-25 | 2018-09-01 | 日商富士軟片股份有限公司 | 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件 |
JP6721670B2 (ja) | 2016-03-14 | 2020-07-15 | 富士フイルム株式会社 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
WO2017186480A1 (fr) | 2016-04-26 | 2017-11-02 | Basf Se | Composition de blanchiment sans métal |
US11079675B2 (en) | 2016-05-13 | 2021-08-03 | Dic Corporation | Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink |
TWI810158B (zh) | 2016-08-01 | 2023-08-01 | 日商富士軟片股份有限公司 | 感光性樹脂組成物、硬化膜、積層體、硬化膜的製造方法、 積層體的製造方法及半導體元件 |
EP3532267B1 (fr) | 2016-10-27 | 2023-03-01 | Bridgestone Americas Tire Operations, LLC | Procédés de production de produits polymères durcis par fabrication additive |
WO2018221457A1 (fr) | 2017-05-31 | 2018-12-06 | 富士フイルム株式会社 | Composition de résine photosensible, précurseur polymère, film durci, stratifié, procédé de production de film durci et dispositif à semi-conducteur |
KR102453516B1 (ko) | 2018-03-13 | 2022-10-12 | 후지필름 가부시키가이샤 | 경화막의 제조 방법, 고체 촬상 소자의 제조 방법 |
TWI677492B (zh) * | 2018-07-17 | 2019-11-21 | 奇鈦科技股份有限公司 | 液態光引發化合物及其應用 |
EP3848627A4 (fr) | 2018-09-07 | 2021-10-27 | FUJIFILM Corporation | Unité de phare de véhicule, film de protection contre la lumière de phare et procédé de production de film de protection contre la lumière de phare |
JP7150040B2 (ja) | 2018-09-28 | 2022-10-07 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、および半導体デバイス |
WO2020116238A1 (fr) | 2018-12-05 | 2020-06-11 | 富士フイルム株式会社 | Procédé de formation de tracé, composition de résine photosensible, film durci, stratifié, et dispositif |
SG11202105559WA (en) | 2018-12-05 | 2021-06-29 | Fujifilm Corp | Photosensitive resin composition, pattern forming method, cured film, laminate, and device |
WO2020136522A1 (fr) * | 2018-12-28 | 2020-07-02 | Igm Resins Italia S.R.L. | Photoinitiateurs |
JP7171890B2 (ja) | 2019-03-15 | 2022-11-15 | 富士フイルム株式会社 | 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、及び、ポリマー前駆体 |
WO2020203277A1 (fr) | 2019-03-29 | 2020-10-08 | 富士フイルム株式会社 | Composition de résine photosensible, film durci, inducteur et antenne |
TW202112837A (zh) | 2019-09-26 | 2021-04-01 | 日商富士軟片股份有限公司 | 導熱層的製造方法、積層體的製造方法及半導體器件的製造方法 |
TW202128839A (zh) | 2019-11-21 | 2021-08-01 | 日商富士軟片股份有限公司 | 圖案形成方法、光硬化性樹脂組成物、積層體的製造方法及電子元件的製造方法 |
CN114867790A (zh) | 2019-12-25 | 2022-08-05 | 富士胶片株式会社 | 树脂组合物、固化物、紫外线吸收剂、紫外线截止滤波器、透镜、保护材料、化合物及化合物的合成方法 |
CN115776992A (zh) | 2020-08-21 | 2023-03-10 | 富士胶片株式会社 | 聚合性组合物、聚合物、紫外线遮蔽材料、层叠体、化合物、紫外线吸收剂及化合物的制造方法 |
WO2022059706A1 (fr) | 2020-09-18 | 2022-03-24 | 富士フイルム株式会社 | Composition, film contenant des particules magnétiques et composant électronique |
EP4220669A4 (fr) | 2020-09-24 | 2024-03-20 | Fujifilm Corp | Composition, produit durci contenant des particules magnétiques, substrat introduit par des particules magnétiques et matériau électronique |
JPWO2022202394A1 (fr) | 2021-03-22 | 2022-09-29 | ||
TW202248755A (zh) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件 |
KR102627683B1 (ko) | 2021-08-31 | 2024-01-23 | 후지필름 가부시키가이샤 | 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액 |
WO2023054565A1 (fr) | 2021-09-30 | 2023-04-06 | 富士フイルム株式会社 | Procédé de production d'une composition contenant des particules magnétiques, composition contenant des particules magnétiques, produit durci contenant des particules magnétiques, substrat à particules magnétiques introduites et matériau électronique |
CN115141162B (zh) * | 2022-09-05 | 2022-12-20 | 天津久日新材料股份有限公司 | 一种光引发剂的制备方法及其产品 |
CN116003273B (zh) * | 2023-02-09 | 2023-11-07 | 湖南勤润新材料有限公司 | 一种α-胺基酮类化合物、其制备方法及其在光辐射固化领域的应用 |
CN117532894A (zh) * | 2023-12-05 | 2024-02-09 | 东莞美泰电子有限公司 | 一种用于保护零件的pu皮革热压贴皮工艺 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4307182A (en) * | 1980-05-23 | 1981-12-22 | Minnesota Mining And Manufacturing Company | Imaging systems with tetra(aliphatic) borate salts |
EP0088050B1 (fr) * | 1982-02-26 | 1986-09-03 | Ciba-Geigy Ag | Composition colorée photodurcissable |
DE3471486D1 (de) * | 1983-08-15 | 1988-06-30 | Ciba Geigy Ag | Photocurable compositions |
ES2054861T3 (es) * | 1987-03-26 | 1994-08-16 | Ciba Geigy Ag | Nuevas alfa-aminoacetofenonas como fotoiniciadores. |
JP2641260B2 (ja) * | 1988-07-26 | 1997-08-13 | キヤノン株式会社 | 光重合開始剤及び感光性組成物 |
EP0485334B1 (fr) * | 1990-11-05 | 1997-11-26 | Tokyo Ohka Kogyo Co., Ltd. | Compositions photopolymérisables |
US5698285A (en) * | 1995-10-19 | 1997-12-16 | Three Bond Co., Ltd. | Adhesive for optical disk |
-
1997
- 1997-11-08 TW TW086116781A patent/TW452575B/zh not_active IP Right Cessation
- 1997-11-14 GB GB9723965A patent/GB2320027B/en not_active Expired - Fee Related
- 1997-11-18 SG SG1997004082A patent/SG73482A1/en unknown
- 1997-11-26 CH CH02735/97A patent/CH692422A5/de not_active IP Right Cessation
- 1997-11-27 BE BE9700953A patent/BE1012647A5/fr not_active IP Right Cessation
- 1997-11-27 ID IDP973786A patent/ID17686A/id unknown
- 1997-11-28 MY MYPI97005738A patent/MY119467A/en unknown
- 1997-11-28 AU AU46773/97A patent/AU741581B2/en not_active Ceased
- 1997-12-01 US US08/982,147 patent/US6022906A/en not_active Expired - Lifetime
- 1997-12-03 DE DE19753655A patent/DE19753655B4/de not_active Expired - Fee Related
- 1997-12-03 CA CA002223376A patent/CA2223376A1/fr not_active Abandoned
- 1997-12-04 FR FR9715289A patent/FR2758139B1/fr not_active Expired - Fee Related
- 1997-12-05 IT IT97MI002703A patent/IT1296930B1/it active IP Right Grant
- 1997-12-05 ZA ZA9710956A patent/ZA9710956B/xx unknown
- 1997-12-05 NL NL1007707A patent/NL1007707C2/nl not_active IP Right Cessation
- 1997-12-05 CN CNB971254389A patent/CN1134457C/zh not_active Expired - Fee Related
- 1997-12-05 AT AT0206997A patent/AT500120B1/de not_active IP Right Cessation
- 1997-12-08 JP JP9354199A patent/JPH10291969A/ja active Pending
-
1998
- 1998-12-03 BR BR9706068A patent/BR9706068A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ITMI972703A1 (it) | 1999-06-05 |
NL1007707A1 (nl) | 1998-06-09 |
GB2320027A (en) | 1998-06-10 |
BE1012647A5 (fr) | 2001-02-06 |
TW452575B (en) | 2001-09-01 |
AT500120A1 (de) | 2005-10-15 |
MY119467A (en) | 2005-05-31 |
FR2758139A1 (fr) | 1998-07-10 |
FR2758139B1 (fr) | 2001-04-20 |
AT500120B1 (de) | 2007-03-15 |
GB2320027B (en) | 2001-05-09 |
IT1296930B1 (it) | 1999-08-03 |
CN1134457C (zh) | 2004-01-14 |
SG73482A1 (en) | 2000-06-20 |
ID17686A (id) | 1998-01-22 |
AU741581B2 (en) | 2001-12-06 |
JPH10291969A (ja) | 1998-11-04 |
BR9706068A (pt) | 2000-03-21 |
GB9723965D0 (en) | 1998-01-07 |
DE19753655B4 (de) | 2008-05-15 |
ZA9710956B (en) | 1998-06-15 |
CA2223376A1 (fr) | 1998-06-06 |
CN1184117A (zh) | 1998-06-10 |
CH692422A5 (de) | 2002-06-14 |
US6022906A (en) | 2000-02-08 |
DE19753655A1 (de) | 1998-06-10 |
AU4677397A (en) | 1998-06-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL1007707C2 (nl) | Alpha-Aminoacetofenonen en hun toepassing als foto-initiatoren. | |
US6486228B2 (en) | Mono-and Bis-acylphosphine oxide photoinitiator combinations | |
RU2181726C2 (ru) | Молекулярно-комплексное соединение, фотополимеризующийся состав и способ фотополимеризации | |
US6048660A (en) | Non-volatile phenylglyoxalic esters | |
US5767169A (en) | Photopolymerizable compositions comprising alkoxyphenyl-substituted bisacylphosphine oxides | |
EP1177182B1 (fr) | Nouveaux photoamorceurs et leurs applications | |
CN109790137B (zh) | 多环乙醛酸酯作为光引发剂 | |
KR20010111021A (ko) | 유기 금속성 모노아실알킬포스핀 | |
NO309571B1 (no) | Alkylfenylbisacyl-fosfinoksyder, fotoinitiatorblandinger og fotopolymeriserbare sammensetninger samt anvendelse herav | |
MXPA04010254A (es) | Fotoiniciado incorporable. | |
ITMI20010242A1 (it) | Monoacilarilfosfine organometalliche | |
DE69917261T2 (de) | Photoinitiatoren und ihre Verwendungen | |
CN113518805B (zh) | 光引发剂 | |
KR100532559B1 (ko) | 신규α-아미노아세토페논광개시제 | |
KR20000047902A (ko) | 광개시제 혼합물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 19980824 |
|
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 19980824 |
|
PD2B | A search report has been drawn up | ||
VD1 | Lapsed due to non-payment of the annual fee |
Effective date: 20040701 |