HUE035050T2 - Galvanic bath or galvanic bath blend to remove glossy nickel, and a method for producing a glossy nickel product - Google Patents

Galvanic bath or galvanic bath blend to remove glossy nickel, and a method for producing a glossy nickel product Download PDF

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Publication number
HUE035050T2
HUE035050T2 HUE15164491A HUE15164491A HUE035050T2 HU E035050 T2 HUE035050 T2 HU E035050T2 HU E15164491 A HUE15164491 A HU E15164491A HU E15164491 A HUE15164491 A HU E15164491A HU E035050 T2 HUE035050 T2 HU E035050T2
Authority
HU
Hungary
Prior art keywords
galvanic
mixture
nickel
acid
bath
Prior art date
Application number
HUE15164491A
Other languages
English (en)
Hungarian (hu)
Inventor
Joerg Cordes
Gerd Schoengen
Reiner Dickbreder
Original Assignee
Kiesow Dr Brinkmann Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52997919&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HUE035050(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kiesow Dr Brinkmann Gmbh & Co Kg filed Critical Kiesow Dr Brinkmann Gmbh & Co Kg
Publication of HUE035050T2 publication Critical patent/HUE035050T2/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16Acetylenic compounds
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18Heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cosmetics (AREA)
HUE15164491A 2014-04-25 2015-04-21 Galvanic bath or galvanic bath blend to remove glossy nickel, and a method for producing a glossy nickel product HUE035050T2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014207778.8A DE102014207778B3 (de) 2014-04-25 2014-04-25 Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht

Publications (1)

Publication Number Publication Date
HUE035050T2 true HUE035050T2 (en) 2018-05-02

Family

ID=52997919

Family Applications (1)

Application Number Title Priority Date Filing Date
HUE15164491A HUE035050T2 (en) 2014-04-25 2015-04-21 Galvanic bath or galvanic bath blend to remove glossy nickel, and a method for producing a glossy nickel product

Country Status (7)

Country Link
EP (1) EP2937450B1 (fr)
JP (1) JP6687331B2 (fr)
DE (1) DE102014207778B3 (fr)
HU (1) HUE035050T2 (fr)
PL (1) PL2937450T3 (fr)
PT (1) PT2937450T (fr)
SI (1) SI2937450T1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105170922B (zh) * 2015-10-19 2017-12-01 重庆天春科技有限公司 一种具有单质镍过渡层的结晶器铜管
CN105200462A (zh) * 2015-10-19 2015-12-30 姜少群 一种结晶器铜管的单质镍过渡层电镀方法
CN106245070B (zh) * 2016-10-21 2019-03-05 湘潭大学 一种用于镁合金电镀镍的组合镀液及镁合金表面电镀镍的方法
PT3642396T (pt) * 2017-06-23 2021-09-10 Atotech Deutschland Gmbh Banho de galvanoplastia de níquel para depositar um revestimento de níquel decorativo sobre um substrato
WO2019215287A1 (fr) * 2018-05-09 2019-11-14 Atotech Deutschland Gmbh Réseau de couches comprenant du nickel et son procédé de fabrication
JP6542437B1 (ja) * 2018-06-19 2019-07-10 奥野製薬工業株式会社 光沢ニッケルめっき方法及び光沢ニッケルめっき皮膜の制御方法。
JP7190280B2 (ja) * 2018-08-10 2022-12-15 株式会社Lixil 水道用器具
TWI734362B (zh) * 2019-01-31 2021-07-21 美商麥克達米德恩索龍股份有限公司 用於製造鎳互連之組成物及方法
KR102293664B1 (ko) * 2019-11-12 2021-08-26 주식회사엘콤 니켈인 합금 도금을 위한 조성물
JP7141780B1 (ja) 2022-05-19 2022-09-26 奥野製薬工業株式会社 めっき皮膜の製造方法。

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US3528894A (en) * 1966-08-25 1970-09-15 M & T Chemicals Inc Method of electrodepositing corrosion resistant coating
US3898138A (en) * 1974-10-16 1975-08-05 Oxy Metal Industries Corp Method and bath for the electrodeposition of nickel
DE2450527C2 (de) 1974-10-24 1982-09-16 Henkel KGaA, 4000 Düsseldorf Wäßriges, saures Bad zur galvanischen Abscheidung von halbglänzenden Nickelüberzügen
US4150232A (en) * 1977-07-15 1979-04-17 Cilag-Chemie A.G. 1-Carboxymethyl-3-sulfoloweralkyl pyridinium betaine inner salts
DE2825966A1 (de) * 1978-06-14 1980-01-03 Basf Ag Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt
US4430171A (en) 1981-08-24 1984-02-07 M&T Chemicals Inc. Electroplating baths for nickel, iron, cobalt and alloys thereof
US4421611A (en) 1982-09-30 1983-12-20 Mcgean-Rohco, Inc. Acetylenic compositions and nickel plating baths containing same
DE3722778A1 (de) 1987-07-09 1989-03-09 Raschig Ag Polyalkylenglykol-naphthyl-3-sulfopropyl- diether und deren salze, verfahren zur herstellung dieser verbindungen und ihre verwendung als netzmittel in der galvanotechnik
DE3817722A1 (de) * 1988-05-25 1989-12-14 Raschig Ag Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe
DE4013349A1 (de) * 1990-04-23 1991-10-24 Schering Ag 1-(2-sulfoaethyl)pyridiniumbetain, verfahren zu dessen herstellung sowie saure nickelbaeder enthaltend diese verbindung
US5164069A (en) * 1990-11-05 1992-11-17 Shipley Company Inc. Nickel electroplating solution and acetylenic compounds therefor
JP2962598B2 (ja) * 1991-06-20 1999-10-12 荏原ユージライト株式会社 マイクロポーラスクロムめっき方法
CA2128022A1 (fr) * 1992-01-25 1993-08-05 Volker Schwendemann Procede de fabrication de moulages nickeles
DE19610361A1 (de) 1996-03-15 1997-09-18 Basf Ag Bad und Verfahren für die galvanische Abscheidung von Halbglanznickel
JP2003138396A (ja) * 2001-08-24 2003-05-14 Toto Ltd ニッケルクロムめっき方法及びそのめっきを施した水道用器具
DE10327374B4 (de) 2003-06-18 2006-07-06 Raschig Gmbh Verwendung von propansulfonierten und 2-Hydroxy-propansulfonierten Alkylaminaloxylaten als Hilfsmittel zur elektrolytischen Abscheidung von metallischen Schichten und galvanische Bäder enthaltend diese
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
PL2145986T3 (pl) * 2008-07-15 2010-09-30 Atotech Deutschland Gmbh Roztwór i sposób elektrochemicznego osadzania metalu na substracie
DE102008056470B3 (de) * 2008-11-05 2010-04-22 Atotech Deutschland Gmbh Verfahren zum Untersuchen einer Metallschicht und Verfahren zur analytischen Kontrolle eines zum Abscheiden der Metallschicht dienenden Abscheideelektrolyten
BRPI0924283B1 (pt) 2009-02-13 2019-11-12 Atotech Deutschland Gmbh parte cromada e método de fabricação da mesma
DE102011106099B4 (de) * 2011-06-09 2016-06-02 Keuco Gmbh & Co. Kg Verfahren zur Beschichtung von Bauteilen
EP2801640A1 (fr) 2013-05-08 2014-11-12 ATOTECH Deutschland GmbH Bain électrolytique de nickel galvanique ou d'alliage de nickel pour déposer un alliage de nickel ou de nickel mi-lustré

Also Published As

Publication number Publication date
JP6687331B2 (ja) 2020-04-22
EP2937450A1 (fr) 2015-10-28
EP2937450B1 (fr) 2017-04-05
PT2937450T (pt) 2017-06-30
DE102014207778B3 (de) 2015-05-21
PL2937450T3 (pl) 2017-08-31
JP2015212417A (ja) 2015-11-26
SI2937450T1 (sl) 2017-07-31

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