PL2937450T3 - Kąpiel galwaniczna lub mieszanina do zastosowania w kąpieli galwanicznej do osadzania warstwy niklu błyszczącego, jak też sposób wytwarzania produktu z warstwą niklu błyszczącego - Google Patents
Kąpiel galwaniczna lub mieszanina do zastosowania w kąpieli galwanicznej do osadzania warstwy niklu błyszczącego, jak też sposób wytwarzania produktu z warstwą niklu błyszczącegoInfo
- Publication number
- PL2937450T3 PL2937450T3 PL15164491T PL15164491T PL2937450T3 PL 2937450 T3 PL2937450 T3 PL 2937450T3 PL 15164491 T PL15164491 T PL 15164491T PL 15164491 T PL15164491 T PL 15164491T PL 2937450 T3 PL2937450 T3 PL 2937450T3
- Authority
- PL
- Poland
- Prior art keywords
- nickel layer
- galvanic bath
- gloss nickel
- depositing
- item
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/16—Acetylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Cosmetics (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014207778.8A DE102014207778B3 (de) | 2014-04-25 | 2014-04-25 | Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht |
EP15164491.1A EP2937450B1 (fr) | 2014-04-25 | 2015-04-21 | Bain galvanique ou mélange à utiliser dans un bain galvanique pour la séparation d'une couche de nickel brillant et procédé de production d'un article doté d'une couche de nickel brillant |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2937450T3 true PL2937450T3 (pl) | 2017-08-31 |
Family
ID=52997919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL15164491T PL2937450T3 (pl) | 2014-04-25 | 2015-04-21 | Kąpiel galwaniczna lub mieszanina do zastosowania w kąpieli galwanicznej do osadzania warstwy niklu błyszczącego, jak też sposób wytwarzania produktu z warstwą niklu błyszczącego |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP2937450B1 (fr) |
JP (1) | JP6687331B2 (fr) |
DE (1) | DE102014207778B3 (fr) |
HU (1) | HUE035050T2 (fr) |
PL (1) | PL2937450T3 (fr) |
PT (1) | PT2937450T (fr) |
SI (1) | SI2937450T1 (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105170922B (zh) * | 2015-10-19 | 2017-12-01 | 重庆天春科技有限公司 | 一种具有单质镍过渡层的结晶器铜管 |
CN105200462A (zh) * | 2015-10-19 | 2015-12-30 | 姜少群 | 一种结晶器铜管的单质镍过渡层电镀方法 |
CN106245070B (zh) * | 2016-10-21 | 2019-03-05 | 湘潭大学 | 一种用于镁合金电镀镍的组合镀液及镁合金表面电镀镍的方法 |
PT3642396T (pt) * | 2017-06-23 | 2021-09-10 | Atotech Deutschland Gmbh | Banho de galvanoplastia de níquel para depositar um revestimento de níquel decorativo sobre um substrato |
WO2019215287A1 (fr) * | 2018-05-09 | 2019-11-14 | Atotech Deutschland Gmbh | Réseau de couches comprenant du nickel et son procédé de fabrication |
JP6542437B1 (ja) * | 2018-06-19 | 2019-07-10 | 奥野製薬工業株式会社 | 光沢ニッケルめっき方法及び光沢ニッケルめっき皮膜の制御方法。 |
JP7190280B2 (ja) * | 2018-08-10 | 2022-12-15 | 株式会社Lixil | 水道用器具 |
TWI734362B (zh) * | 2019-01-31 | 2021-07-21 | 美商麥克達米德恩索龍股份有限公司 | 用於製造鎳互連之組成物及方法 |
KR102293664B1 (ko) * | 2019-11-12 | 2021-08-26 | 주식회사엘콤 | 니켈인 합금 도금을 위한 조성물 |
JP7141780B1 (ja) | 2022-05-19 | 2022-09-26 | 奥野製薬工業株式会社 | めっき皮膜の製造方法。 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3528894A (en) * | 1966-08-25 | 1970-09-15 | M & T Chemicals Inc | Method of electrodepositing corrosion resistant coating |
US3898138A (en) * | 1974-10-16 | 1975-08-05 | Oxy Metal Industries Corp | Method and bath for the electrodeposition of nickel |
DE2450527C2 (de) | 1974-10-24 | 1982-09-16 | Henkel KGaA, 4000 Düsseldorf | Wäßriges, saures Bad zur galvanischen Abscheidung von halbglänzenden Nickelüberzügen |
US4150232A (en) * | 1977-07-15 | 1979-04-17 | Cilag-Chemie A.G. | 1-Carboxymethyl-3-sulfoloweralkyl pyridinium betaine inner salts |
DE2825966A1 (de) * | 1978-06-14 | 1980-01-03 | Basf Ag | Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt |
US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
US4421611A (en) | 1982-09-30 | 1983-12-20 | Mcgean-Rohco, Inc. | Acetylenic compositions and nickel plating baths containing same |
DE3722778A1 (de) | 1987-07-09 | 1989-03-09 | Raschig Ag | Polyalkylenglykol-naphthyl-3-sulfopropyl- diether und deren salze, verfahren zur herstellung dieser verbindungen und ihre verwendung als netzmittel in der galvanotechnik |
DE3817722A1 (de) * | 1988-05-25 | 1989-12-14 | Raschig Ag | Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe |
DE4013349A1 (de) * | 1990-04-23 | 1991-10-24 | Schering Ag | 1-(2-sulfoaethyl)pyridiniumbetain, verfahren zu dessen herstellung sowie saure nickelbaeder enthaltend diese verbindung |
US5164069A (en) * | 1990-11-05 | 1992-11-17 | Shipley Company Inc. | Nickel electroplating solution and acetylenic compounds therefor |
JP2962598B2 (ja) * | 1991-06-20 | 1999-10-12 | 荏原ユージライト株式会社 | マイクロポーラスクロムめっき方法 |
CA2128022A1 (fr) * | 1992-01-25 | 1993-08-05 | Volker Schwendemann | Procede de fabrication de moulages nickeles |
DE19610361A1 (de) | 1996-03-15 | 1997-09-18 | Basf Ag | Bad und Verfahren für die galvanische Abscheidung von Halbglanznickel |
JP2003138396A (ja) * | 2001-08-24 | 2003-05-14 | Toto Ltd | ニッケルクロムめっき方法及びそのめっきを施した水道用器具 |
DE10327374B4 (de) | 2003-06-18 | 2006-07-06 | Raschig Gmbh | Verwendung von propansulfonierten und 2-Hydroxy-propansulfonierten Alkylaminaloxylaten als Hilfsmittel zur elektrolytischen Abscheidung von metallischen Schichten und galvanische Bäder enthaltend diese |
US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
PL2145986T3 (pl) * | 2008-07-15 | 2010-09-30 | Atotech Deutschland Gmbh | Roztwór i sposób elektrochemicznego osadzania metalu na substracie |
DE102008056470B3 (de) * | 2008-11-05 | 2010-04-22 | Atotech Deutschland Gmbh | Verfahren zum Untersuchen einer Metallschicht und Verfahren zur analytischen Kontrolle eines zum Abscheiden der Metallschicht dienenden Abscheideelektrolyten |
BRPI0924283B1 (pt) | 2009-02-13 | 2019-11-12 | Atotech Deutschland Gmbh | parte cromada e método de fabricação da mesma |
DE102011106099B4 (de) * | 2011-06-09 | 2016-06-02 | Keuco Gmbh & Co. Kg | Verfahren zur Beschichtung von Bauteilen |
EP2801640A1 (fr) | 2013-05-08 | 2014-11-12 | ATOTECH Deutschland GmbH | Bain électrolytique de nickel galvanique ou d'alliage de nickel pour déposer un alliage de nickel ou de nickel mi-lustré |
-
2014
- 2014-04-25 DE DE102014207778.8A patent/DE102014207778B3/de active Active
-
2015
- 2015-04-21 PT PT151644911T patent/PT2937450T/pt unknown
- 2015-04-21 EP EP15164491.1A patent/EP2937450B1/fr not_active Revoked
- 2015-04-21 SI SI201530067A patent/SI2937450T1/sl unknown
- 2015-04-21 HU HUE15164491A patent/HUE035050T2/en unknown
- 2015-04-21 PL PL15164491T patent/PL2937450T3/pl unknown
- 2015-04-27 JP JP2015090607A patent/JP6687331B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP6687331B2 (ja) | 2020-04-22 |
EP2937450A1 (fr) | 2015-10-28 |
EP2937450B1 (fr) | 2017-04-05 |
PT2937450T (pt) | 2017-06-30 |
DE102014207778B3 (de) | 2015-05-21 |
HUE035050T2 (en) | 2018-05-02 |
JP2015212417A (ja) | 2015-11-26 |
SI2937450T1 (sl) | 2017-07-31 |
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