HRP20200700T1 - Uređaj i postupak za čišćenje elektronskim zračenjem - Google Patents
Uređaj i postupak za čišćenje elektronskim zračenjem Download PDFInfo
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- HRP20200700T1 HRP20200700T1 HRP20200700TT HRP20200700T HRP20200700T1 HR P20200700 T1 HRP20200700 T1 HR P20200700T1 HR P20200700T T HRP20200700T T HR P20200700TT HR P20200700 T HRP20200700 T HR P20200700T HR P20200700 T1 HRP20200700 T1 HR P20200700T1
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- 238000000034 method Methods 0.000 title claims 8
- 238000005201 scrubbing Methods 0.000 title 1
- 239000002086 nanomaterial Substances 0.000 claims 37
- 239000000758 substrate Substances 0.000 claims 16
- 239000000463 material Substances 0.000 claims 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 8
- 239000007789 gas Substances 0.000 claims 8
- 239000002041 carbon nanotube Substances 0.000 claims 7
- 229910021393 carbon nanotube Inorganic materials 0.000 claims 7
- 239000011248 coating agent Substances 0.000 claims 6
- 238000000576 coating method Methods 0.000 claims 6
- 230000005684 electric field Effects 0.000 claims 6
- 238000010438 heat treatment Methods 0.000 claims 6
- 230000003197 catalytic effect Effects 0.000 claims 4
- 238000003491 array Methods 0.000 claims 3
- 238000004140 cleaning Methods 0.000 claims 3
- 239000003574 free electron Substances 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 238000004873 anchoring Methods 0.000 claims 1
- 229910052792 caesium Inorganic materials 0.000 claims 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 230000015556 catabolic process Effects 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 230000001419 dependent effect Effects 0.000 claims 1
- 239000000428 dust Substances 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 239000003546 flue gas Substances 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 230000000087 stabilizing effect Effects 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 229910052723 transition metal Inorganic materials 0.000 claims 1
- 150000003624 transition metals Chemical class 0.000 claims 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims 1
- 229910001935 vanadium oxide Inorganic materials 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
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- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
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- B01D53/34—Chemical or biological purification of waste gases
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- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/92—Chemical or biological purification of waste gases of engine exhaust gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/081—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing particle radiation or gamma-radiation
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
- F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
-
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
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- B01D2251/2062—Ammonia
-
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- B01D2257/302—Sulfur oxides
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2257/40—Nitrogen compounds
- B01D2257/404—Nitrogen oxides other than dinitrogen oxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/01—Engine exhaust gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0283—Flue gases
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/45—Gas separation or purification devices adapted for specific applications
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- B01D2259/812—Electrons
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- F01N13/00—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00
- F01N13/004—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00 specially adapted for marine propulsion, i.e. for receiving simultaneously engine exhaust gases and engine cooling water
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- F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
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Claims (14)
1. Uređaj za čišćenje elektronskim zračenjem, navedeni uređaj sadrži:
anodu (210);
katodu (220);
nanostrukturu koja se nalazi između navedene anode i navedene katode, navedena nanostruktura je električno povezana s katodom i konfigurirana za emitiranje polja elektrona kao odgovora na prisutnost električnog polja između anode i katode kada je između njih uspostavljena potencijalna razlika; i
kućište povezano s navedenom nanostrukturom i konfigurirano za lociranje nanostrukture tako da se nanostruktura pruža u spremnik koji sadrži plin koji se pročišćava tako da unutrašnjost navedenog spremnika može biti izložena navedenim elektronima.
2. Uređaj prema zahtjevu 1, naznačen time što je nanostruktura ugljikova nanocjevčica (CNT), uređaj nadalje sadrži dodatni izvor elektrona konfiguriran za utiskivanje slobodnih elektrona na CNT radi induciranja iz njega stimulirane emisije polja elektrona;
izborno pri čemu je navedeni dodatni izvor elektrona druga nanostruktura.
3. Uređaj prema bilo kojem od zahtjeva 1 ili 2, koji nadalje sadrži priključak za napajanje električnom energijom (250) koji je operativno povezan s nanostrukturom i konfiguriran da daje naponski impuls nanostrukturi.
4. Uređaj prema bilo kojem od prethodnih zahtjeva, nadalje sadrži:
niz nanostruktura smještenih između anode (210) i katode (220) i električno spojenih na katodu, navedeni niz je konfiguriran za emitiranje polja kao odgovor na prisutnost električnog polja između anode i katode kada je između njih uspostavljena potencijalna razlika, i sadrži navedenu nanostrukturu;
supstrat (520) na kojem se formira niz, navedeni supstrat se izborno nalazi u ili je električno povezan sa katodom;
grijaći element raspoređen za zagrijavanje nanostrukture, izborno pri čemu je navedeni grijaći element raspoređen u toplinskom kontaktu sa stranom navedenog supstrata koja je obrnuta od one na kojoj je niz prisutan tako da grijaći element može provesti toplinu kroz supstrat do niza; i
bilo kao dodatak ili kao alternativa grijaćem elementu, strujno kontrolirano napajanje energijom (560) konfigurirano za grijanje navedenog supstrata ohmskim grijanjem; pri čemu:
uređaj izborno nadalje sadrži priključak za napajanje električnom energijom (250) koji je operativno povezan s nanostrukturom i konfiguriran za pružanje naponskog impulsa nanostrukturi.
5. Uređaj prema bilo kojem od prethodnih zahtjeva, naznačen time što:
nanostruktura je barem djelomično obložena materijalom koji ima radnu funkciju manju od 4 eV, navedeni materijal izborno sadrži cezij ili hafnij pri čemu, kada ovisi o zahtjevu 4, materijal za oblaganje izborno ima talište od najmanje 400° C; i / ili
nanostruktura je barem djelomično obložena katalitičkim premazom, izborno pri čemu:
navedeni katalitički premaz sadrži jedan ili više vanadij oksida, cinkov oksida i volfram trioksida; i / ili
navedeni katalitički premaz se nanosi na stabilizirajući premaz kao što je titan dioksid; i / ili
je nanostruktura dopirana s materijalom za poboljšanje transporta elektrona ili s materijalom za poboljšanje električne provodljivosti;
izborno pri čemu uređaj nadalje sadrži niz nanostruktura smještenih između anode (210) i katode (220) i električno povezan s katodom, navedeni niz je konfiguriran za emitiranje polja elektrona kao odgovor na prisutnost električnog polja između anode i katode kada je između njih uspostavljena potencijalna razlika, i sadrži navedenu nanostrukturu, niz sadrži kombinaciju najmanje dvije od:
jedne ili više neobloženih nanostruktura,
jedne ili više nanostruktura koje su barem djelomično obložene materijalom koji ima radnu funkciju manju od 4 eV, i
jedne ili više nanostruktura koje su barem djelomično obložene katalitičkim premazom.
6. Uređaj prema bilo kojem od prethodnih zahtjeva, naznačen time što je nanostruktura šuplja, čija je unutrašnjost barem djelomično napunjena materijalom za učvršćivanje, materijal za učvršćivanje izborno sadrži prijelazni metal poput titana, željeza ili bakra;
izborno pri čemu uređaj nadalje sadrži:
niz nanostruktura smještenih između anode (210) i katode (220) i električno povezan s katodom, navedeni niz je konfiguriran za emitiranje polja elektrona kao odgovor na prisutnost električnog polja između anode i katode kada je između njih uspostavljena potencijalna razlika, i sadrži navedenu nanostrukturu; i
supstrat (520) na kojem se formira niz;
pri čemu:
materijal za učvršćivanje sadrži materijal koji supstrat sadrži, i izborno, ugljik; i
izborno, supstrat sadrži titan i materijal za učvršćivanje sadrži titanov karbid.
7. Sustav za čišćenje elektronskim zračenjem dimnih plinova, navedeni sustav sadrži:
najmanje četiri niza nanostruktura smještenih između anode (210) i katode (220) i električno povezan s katodom, navedeni niz je konfiguriran za emitiranje polja elektrona kao odgovor na prisutnost električnog polja između anode i katode kada je između njih uspostavljena potencijalna razlika i sadrži navedenu nanostrukturu, svaki niz se formira na električno provodljivom supstratu (520);
napajanje električnom energijom (250);
električne veze koje povezuju navedene supstrate, navedeno napajanje energijom i temelj na takav način da je svaki supstrat na različitom električnom potencijalu; i
jedno ili više kućišta spojenih sa supstratima i konfiguriranih za lociranje navedenih nizova tako da se njihove nanostrukture pružaju u spremnik koji sadrži plin koji se pročišćava tako da unutrašnjost od navedenog spremnika može biti izložena elektronima koje polje emitira pomoću nizova;
pri čemu su supstrati raspoređeni tako da, za sve supstrate osim onih sa najvećim električnim potencijalom, postoji putanja ravnog pravca od površine svakog niza definirana slobodnim krajevima nanostruktura koje tvore taj niz do odgovarajuće površine niza oblikovanog na supstratu kod sljedećeg najvećeg potencijala;
izborno pri čemu su supstrati raspoređeni u dvostrukom cikcak uzorku.
8. Brod koji sadrži uređaj prema bilo kojem od zahtjeva 1 do 6, ili sustav prema zahtjevu 7, naznačen time što je spremnik konfiguriran da sadrži emisije iz navedenog broda.
9. Postupak za čišćenje elektronskim zračenjem koji se izvodi s uređajem prema zahtjevu 1, bilo kojem od zahtjeva 2 do 6 ovisnih o njemu, ili sustavom prema zahtjevu 7 ovisnog o njemu, postupak sadrži:
uspostavljanje potencijalne razlike između anode (210) i katode (220) tako da je nanostruktura izložena električnom polju, što rezultira emisijom polja elektrona od navedene nanostrukture; i
izlažući plinu koji se pročišćava na navedene elektrone.
10. Postupak prema zahtjevu 9, naznačen time što je nanostruktura ugljikova nanocjevčica (CNT), koja nadalje uključuje izlaganje CNT-a slobodnom elektronu radi induciranja stimulirane emisije polja elektrona iz CNT-a;
pri čemu je navedeni slobodni elektron izborno emitiran iz dodatnog izvora elektrona emisijom polja ili stimuliranom emisijom polja, navedeni dodatni izvor elektrona je druga nanostruktura.
11. Postupak prema bilo kojem od zahtjeva 9 ili 10, nadalje sadrži pružanje naponskog impulsa nanostrukturi, navedeni impuls izborno ima magnitudu nižu od probojnog napona navedenog plina;
pri čemu navedeni naponski impuls izborno:
ima apsolutnu amplitudu od 100 V do 5 kV; i / ili
ima trajanje od 1 μs do 1 ms; i / ili
se ponavlja periodično, izborno s frekvencijom od 100 Hz do 500 kHz, izborno sa radnim ciklusom manjim od 50%.
12. Postupak prema bilo kojem od zahtjeva 9 do 11, naznačen time što je navedena nanostruktura raspoređena da generira navedenu elektronsku zraku u okruženju s apsolutnim tlakom ne manjim od 80 kPa.
13. Postupak prema bilo kojem od zahtjeva 9 do 12, nadalje sadrži zagrijavanje nanostrukture za vrijeme navedene emisije polja;
naznačen time što se nanostruktura izborno zagrijava na između 200 i 1000°C, izborno na između 300 i 900°C, izborno na između 400 i 800°C, izborno na između 400 i 600°C.
14. Postupak prema bilo kojem od zahtjeva 9 do 13, nadalje sadrži:
prije izlaganja navedenog plina navedenim elektronima, miješanjem plina s amonijakom da se dobije plinska mješavina; i
nakon izlaganja navedene plinske mješavine elektronima, prikupljajući tako nastao prah.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1517477.4A GB2537196B (en) | 2015-10-02 | 2015-10-02 | Apparatus and method for electron irradiation scrubbing |
| PCT/GB2016/053075 WO2017055881A1 (en) | 2015-10-02 | 2016-10-03 | Apparatus and method for electron irradiation scrubbing |
| EP16777789.5A EP3356018B1 (en) | 2015-10-02 | 2016-10-03 | Apparatus and method for electron irradiation scrubbing |
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| Publication Number | Publication Date |
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| HRP20200700T1 true HRP20200700T1 (hr) | 2020-10-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| HRP20200700TT HRP20200700T1 (hr) | 2015-10-02 | 2020-04-30 | Uređaj i postupak za čišćenje elektronskim zračenjem |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US11123689B2 (hr) |
| EP (1) | EP3356018B1 (hr) |
| JP (1) | JP6958789B2 (hr) |
| KR (1) | KR102577612B1 (hr) |
| CN (1) | CN108136325B (hr) |
| AU (1) | AU2016330046B2 (hr) |
| BR (1) | BR112018006669B1 (hr) |
| CA (1) | CA2999719C (hr) |
| CY (1) | CY1122985T1 (hr) |
| DK (1) | DK3356018T3 (hr) |
| ES (1) | ES2789581T3 (hr) |
| GB (1) | GB2537196B (hr) |
| HK (1) | HK1259224A1 (hr) |
| HR (1) | HRP20200700T1 (hr) |
| PL (1) | PL3356018T3 (hr) |
| WO (1) | WO2017055881A1 (hr) |
| ZA (1) | ZA201802089B (hr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| GB2593786B (en) * | 2020-07-07 | 2023-01-25 | Daphne Tech Sa | Apparatus and method for electron irradiation scrubbing |
| GB2605212B (en) * | 2021-07-16 | 2024-05-22 | Daphne Tech Sa | Apparatus and method for electron irradiation scrubbing |
| CN114917704A (zh) * | 2022-05-19 | 2022-08-19 | 山东保蓝环保工程有限公司 | 一种脉冲量子烟气脱白装置 |
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- 2016-10-03 CA CA2999719A patent/CA2999719C/en active Active
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- 2016-10-03 CN CN201680059356.XA patent/CN108136325B/zh active Active
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2018
- 2018-03-28 ZA ZA2018/02089A patent/ZA201802089B/en unknown
-
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Also Published As
| Publication number | Publication date |
|---|---|
| AU2016330046B2 (en) | 2021-08-26 |
| CN108136325A (zh) | 2018-06-08 |
| EP3356018A1 (en) | 2018-08-08 |
| GB2537196B (en) | 2017-05-10 |
| CA2999719C (en) | 2023-10-03 |
| BR112018006669A2 (pt) | 2018-10-09 |
| DK3356018T3 (da) | 2020-05-04 |
| ZA201802089B (en) | 2019-07-31 |
| GB201517477D0 (en) | 2015-11-18 |
| CN108136325B (zh) | 2022-05-13 |
| HK1259224A1 (zh) | 2019-11-29 |
| US11123689B2 (en) | 2021-09-21 |
| JP2019501022A (ja) | 2019-01-17 |
| KR102577612B1 (ko) | 2023-09-11 |
| KR20180061269A (ko) | 2018-06-07 |
| GB2537196A (en) | 2016-10-12 |
| PL3356018T3 (pl) | 2020-09-07 |
| CA2999719A1 (en) | 2017-04-06 |
| BR112018006669B1 (pt) | 2022-11-29 |
| JP6958789B2 (ja) | 2021-11-02 |
| CY1122985T1 (el) | 2021-10-29 |
| AU2016330046A1 (en) | 2018-04-19 |
| WO2017055881A1 (en) | 2017-04-06 |
| US20190054418A1 (en) | 2019-02-21 |
| ES2789581T3 (es) | 2020-10-26 |
| EP3356018B1 (en) | 2020-04-08 |
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