HK1258865A1 - 光束掃描裝置及描繪裝置 - Google Patents
光束掃描裝置及描繪裝置Info
- Publication number
- HK1258865A1 HK1258865A1 HK19101337.9A HK19101337A HK1258865A1 HK 1258865 A1 HK1258865 A1 HK 1258865A1 HK 19101337 A HK19101337 A HK 19101337A HK 1258865 A1 HK1258865 A1 HK 1258865A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- beam scanning
- scanning device
- drawing device
- scanning
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/12—Scanning systems using multifaceted mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Lenses (AREA)
- Seal Device For Vehicle (AREA)
- Confectionery (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016093180 | 2016-05-06 | ||
PCT/JP2017/016274 WO2017191777A1 (ja) | 2016-05-06 | 2017-04-25 | ビーム走査装置および描画装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1258865A1 true HK1258865A1 (zh) | 2019-11-22 |
Family
ID=60203629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK19101337.9A HK1258865A1 (zh) | 2016-05-06 | 2019-01-25 | 光束掃描裝置及描繪裝置 |
Country Status (6)
Country | Link |
---|---|
JP (3) | JP6954274B2 (zh) |
KR (2) | KR102389080B1 (zh) |
CN (3) | CN110031964B (zh) |
HK (1) | HK1258865A1 (zh) |
TW (2) | TWI811646B (zh) |
WO (1) | WO2017191777A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7111108B2 (ja) | 2017-10-25 | 2022-08-02 | 株式会社ニコン | パターン描画装置 |
JP6998488B1 (ja) * | 2021-07-07 | 2022-01-18 | 川崎重工業株式会社 | レーザ走査装置及びレーザ走査方法 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6187123A (ja) * | 1984-10-05 | 1986-05-02 | Konishiroku Photo Ind Co Ltd | 走査光学系 |
JP3373079B2 (ja) * | 1995-04-27 | 2003-02-04 | 大日本スクリーン製造株式会社 | 光学装置 |
JP3771328B2 (ja) * | 1996-07-31 | 2006-04-26 | 株式会社東芝 | マルチビーム露光装置 |
US5852490A (en) * | 1996-09-30 | 1998-12-22 | Nikon Corporation | Projection exposure method and apparatus |
AU1891299A (en) * | 1998-01-19 | 1999-08-02 | Nikon Corporation | Illuminating device and exposure apparatus |
JP2002040345A (ja) * | 2000-07-26 | 2002-02-06 | Sharp Corp | レーザ走査装置 |
TW528879B (en) * | 2001-02-22 | 2003-04-21 | Ishikawajima Harima Heavy Ind | Illumination optical system and laser processor having the same |
JP2002350763A (ja) * | 2001-05-25 | 2002-12-04 | Kyocera Mita Corp | レーザ走査装置およびこれを備えた画像形成装置 |
JP2006030791A (ja) | 2004-07-20 | 2006-02-02 | Fuji Photo Film Co Ltd | 光学装置 |
JP4410134B2 (ja) * | 2005-03-24 | 2010-02-03 | 日立ビアメカニクス株式会社 | パターン露光方法及び装置 |
JP2006301252A (ja) * | 2005-04-20 | 2006-11-02 | Konica Minolta Business Technologies Inc | レーザ光学ユニット、レーザ光学装置及び画像形成装置 |
JP4984631B2 (ja) * | 2006-04-28 | 2012-07-25 | 株式会社ニコン | 露光装置及び方法、露光用マスク、並びにデバイス製造方法 |
TWI426295B (zh) * | 2007-03-05 | 2014-02-11 | 尼康股份有限公司 | 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置 |
TW200844478A (en) * | 2007-05-03 | 2008-11-16 | E Pin Optical Industry Co Ltd | MEMS oscillating laser scanning unit and assembly method of the same |
JP4986754B2 (ja) * | 2007-07-27 | 2012-07-25 | キヤノン株式会社 | 照明光学系及びそれを有する露光装置 |
JP2009210726A (ja) * | 2008-03-03 | 2009-09-17 | Hitachi Via Mechanics Ltd | マスクレス露光装置 |
US7885012B2 (en) * | 2008-07-23 | 2011-02-08 | Eastman Kodak Company | Shearing radiation beam for imaging printing media |
DE102008043324B4 (de) * | 2008-10-30 | 2010-11-11 | Carl Zeiss Smt Ag | Optische Anordnung zur dreidimensionalen Strukturierung einer Materialschicht |
JP2011118134A (ja) * | 2009-12-03 | 2011-06-16 | Sharp Corp | 光走査装置およびそれを備えた画像形成装置 |
JP2012037843A (ja) * | 2010-08-11 | 2012-02-23 | Kyocera Mita Corp | 光走査装置及び画像形成装置 |
JP5401629B2 (ja) * | 2011-03-08 | 2014-01-29 | 川崎重工業株式会社 | 光走査装置及びレーザ加工装置 |
BR112013031745B1 (pt) * | 2011-06-10 | 2021-08-31 | Hewlett-Packard Development Company, L.P. | Aparelho de digitalização ótica, sistema de digitalização de disposição por laser e método de digitalização ótica |
CN104380204B (zh) * | 2012-06-21 | 2016-10-19 | 株式会社尼康 | 照明装置、处理装置、及元件制造方法 |
JP6459234B2 (ja) | 2014-06-16 | 2019-01-30 | 株式会社ニコン | 基板処理装置 |
CN106164779B (zh) * | 2014-04-01 | 2019-01-22 | 株式会社尼康 | 基板处理装置 |
CN106489093B (zh) * | 2014-04-28 | 2019-04-19 | 株式会社尼康 | 图案描绘装置、图案描绘方法、器件制造方法、激光光源装置、光束扫描装置及方法 |
JP2016033960A (ja) * | 2014-07-31 | 2016-03-10 | セイコーエプソン株式会社 | 露光方法および露光装置 |
-
2017
- 2017-04-25 KR KR1020187035184A patent/KR102389080B1/ko active IP Right Grant
- 2017-04-25 CN CN201910171295.1A patent/CN110031964B/zh active Active
- 2017-04-25 CN CN201780027995.2A patent/CN109196423B/zh active Active
- 2017-04-25 JP JP2018515430A patent/JP6954274B2/ja active Active
- 2017-04-25 WO PCT/JP2017/016274 patent/WO2017191777A1/ja active Application Filing
- 2017-04-25 CN CN201910171306.6A patent/CN110031965B/zh active Active
- 2017-04-25 KR KR1020227012846A patent/KR102496906B1/ko active IP Right Grant
- 2017-05-05 TW TW110108326A patent/TWI811646B/zh active
- 2017-05-05 TW TW106114890A patent/TWI724165B/zh active
-
2019
- 2019-01-25 HK HK19101337.9A patent/HK1258865A1/zh unknown
-
2020
- 2020-02-03 JP JP2020015970A patent/JP6888700B2/ja active Active
-
2021
- 2021-09-24 JP JP2021155417A patent/JP7226499B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR20220053054A (ko) | 2022-04-28 |
CN110031965B (zh) | 2021-09-10 |
KR102496906B1 (ko) | 2023-02-08 |
CN110031964A (zh) | 2019-07-19 |
JP6954274B2 (ja) | 2021-10-27 |
TWI811646B (zh) | 2023-08-11 |
TWI724165B (zh) | 2021-04-11 |
JP6888700B2 (ja) | 2021-06-16 |
CN110031964B (zh) | 2022-06-10 |
JP2020101808A (ja) | 2020-07-02 |
TW201804212A (zh) | 2018-02-01 |
JP2022008529A (ja) | 2022-01-13 |
TW202127096A (zh) | 2021-07-16 |
JP7226499B2 (ja) | 2023-02-21 |
CN109196423B (zh) | 2021-08-27 |
KR20190003748A (ko) | 2019-01-09 |
CN110031965A (zh) | 2019-07-19 |
CN109196423A (zh) | 2019-01-11 |
KR102389080B1 (ko) | 2022-04-22 |
JPWO2017191777A1 (ja) | 2019-03-07 |
WO2017191777A1 (ja) | 2017-11-09 |
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