JP6954274B2 - ビーム走査装置 - Google Patents

ビーム走査装置 Download PDF

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Publication number
JP6954274B2
JP6954274B2 JP2018515430A JP2018515430A JP6954274B2 JP 6954274 B2 JP6954274 B2 JP 6954274B2 JP 2018515430 A JP2018515430 A JP 2018515430A JP 2018515430 A JP2018515430 A JP 2018515430A JP 6954274 B2 JP6954274 B2 JP 6954274B2
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JP
Japan
Prior art keywords
substrate
lens
lens system
scanning
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018515430A
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English (en)
Japanese (ja)
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JPWO2017191777A1 (ja
Inventor
加藤　正紀
正紀 加藤
中山　修一
修一 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2017191777A1 publication Critical patent/JPWO2017191777A1/ja
Priority to JP2021155417A priority Critical patent/JP7226499B2/ja
Application granted granted Critical
Publication of JP6954274B2 publication Critical patent/JP6954274B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lenses (AREA)
  • Seal Device For Vehicle (AREA)
  • Confectionery (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
JP2018515430A 2016-05-06 2017-04-25 ビーム走査装置 Active JP6954274B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2021155417A JP7226499B2 (ja) 2016-05-06 2021-09-24 描画装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016093180 2016-05-06
JP2016093180 2016-05-06
PCT/JP2017/016274 WO2017191777A1 (ja) 2016-05-06 2017-04-25 ビーム走査装置および描画装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2020015970A Division JP6888700B2 (ja) 2016-05-06 2020-02-03 パターン描画装置
JP2021155417A Division JP7226499B2 (ja) 2016-05-06 2021-09-24 描画装置

Publications (2)

Publication Number Publication Date
JPWO2017191777A1 JPWO2017191777A1 (ja) 2019-03-07
JP6954274B2 true JP6954274B2 (ja) 2021-10-27

Family

ID=60203629

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2018515430A Active JP6954274B2 (ja) 2016-05-06 2017-04-25 ビーム走査装置
JP2020015970A Active JP6888700B2 (ja) 2016-05-06 2020-02-03 パターン描画装置
JP2021155417A Active JP7226499B2 (ja) 2016-05-06 2021-09-24 描画装置

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2020015970A Active JP6888700B2 (ja) 2016-05-06 2020-02-03 パターン描画装置
JP2021155417A Active JP7226499B2 (ja) 2016-05-06 2021-09-24 描画装置

Country Status (6)

Country Link
JP (3) JP6954274B2 (zh)
KR (2) KR102389080B1 (zh)
CN (3) CN110031964B (zh)
HK (1) HK1258865A1 (zh)
TW (2) TWI811646B (zh)
WO (1) WO2017191777A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7111108B2 (ja) 2017-10-25 2022-08-02 株式会社ニコン パターン描画装置
JP6998488B1 (ja) * 2021-07-07 2022-01-18 川崎重工業株式会社 レーザ走査装置及びレーザ走査方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187123A (ja) * 1984-10-05 1986-05-02 Konishiroku Photo Ind Co Ltd 走査光学系
JP3373079B2 (ja) * 1995-04-27 2003-02-04 大日本スクリーン製造株式会社 光学装置
JP3771328B2 (ja) * 1996-07-31 2006-04-26 株式会社東芝 マルチビーム露光装置
US5852490A (en) * 1996-09-30 1998-12-22 Nikon Corporation Projection exposure method and apparatus
AU1891299A (en) * 1998-01-19 1999-08-02 Nikon Corporation Illuminating device and exposure apparatus
JP2002040345A (ja) * 2000-07-26 2002-02-06 Sharp Corp レーザ走査装置
TW528879B (en) * 2001-02-22 2003-04-21 Ishikawajima Harima Heavy Ind Illumination optical system and laser processor having the same
JP2002350763A (ja) * 2001-05-25 2002-12-04 Kyocera Mita Corp レーザ走査装置およびこれを備えた画像形成装置
JP2006030791A (ja) 2004-07-20 2006-02-02 Fuji Photo Film Co Ltd 光学装置
JP4410134B2 (ja) * 2005-03-24 2010-02-03 日立ビアメカニクス株式会社 パターン露光方法及び装置
JP2006301252A (ja) * 2005-04-20 2006-11-02 Konica Minolta Business Technologies Inc レーザ光学ユニット、レーザ光学装置及び画像形成装置
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
TWI426295B (zh) * 2007-03-05 2014-02-11 尼康股份有限公司 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置
TW200844478A (en) * 2007-05-03 2008-11-16 E Pin Optical Industry Co Ltd MEMS oscillating laser scanning unit and assembly method of the same
JP4986754B2 (ja) * 2007-07-27 2012-07-25 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP2009210726A (ja) * 2008-03-03 2009-09-17 Hitachi Via Mechanics Ltd マスクレス露光装置
US7885012B2 (en) * 2008-07-23 2011-02-08 Eastman Kodak Company Shearing radiation beam for imaging printing media
DE102008043324B4 (de) * 2008-10-30 2010-11-11 Carl Zeiss Smt Ag Optische Anordnung zur dreidimensionalen Strukturierung einer Materialschicht
JP2011118134A (ja) * 2009-12-03 2011-06-16 Sharp Corp 光走査装置およびそれを備えた画像形成装置
JP2012037843A (ja) * 2010-08-11 2012-02-23 Kyocera Mita Corp 光走査装置及び画像形成装置
JP5401629B2 (ja) * 2011-03-08 2014-01-29 川崎重工業株式会社 光走査装置及びレーザ加工装置
BR112013031745B1 (pt) * 2011-06-10 2021-08-31 Hewlett-Packard Development Company, L.P. Aparelho de digitalização ótica, sistema de digitalização de disposição por laser e método de digitalização ótica
CN104380204B (zh) * 2012-06-21 2016-10-19 株式会社尼康 照明装置、处理装置、及元件制造方法
JP6459234B2 (ja) 2014-06-16 2019-01-30 株式会社ニコン 基板処理装置
CN106164779B (zh) * 2014-04-01 2019-01-22 株式会社尼康 基板处理装置
CN106489093B (zh) * 2014-04-28 2019-04-19 株式会社尼康 图案描绘装置、图案描绘方法、器件制造方法、激光光源装置、光束扫描装置及方法
JP2016033960A (ja) * 2014-07-31 2016-03-10 セイコーエプソン株式会社 露光方法および露光装置

Also Published As

Publication number Publication date
KR20220053054A (ko) 2022-04-28
CN110031965B (zh) 2021-09-10
KR102496906B1 (ko) 2023-02-08
CN110031964A (zh) 2019-07-19
TWI811646B (zh) 2023-08-11
TWI724165B (zh) 2021-04-11
JP6888700B2 (ja) 2021-06-16
CN110031964B (zh) 2022-06-10
JP2020101808A (ja) 2020-07-02
TW201804212A (zh) 2018-02-01
JP2022008529A (ja) 2022-01-13
TW202127096A (zh) 2021-07-16
JP7226499B2 (ja) 2023-02-21
CN109196423B (zh) 2021-08-27
KR20190003748A (ko) 2019-01-09
CN110031965A (zh) 2019-07-19
CN109196423A (zh) 2019-01-11
KR102389080B1 (ko) 2022-04-22
HK1258865A1 (zh) 2019-11-22
JPWO2017191777A1 (ja) 2019-03-07
WO2017191777A1 (ja) 2017-11-09

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