HK1245410A1 - Polarization beam splitter and substrate processing apparatus using the same - Google Patents

Polarization beam splitter and substrate processing apparatus using the same

Info

Publication number
HK1245410A1
HK1245410A1 HK18104809.3A HK18104809A HK1245410A1 HK 1245410 A1 HK1245410 A1 HK 1245410A1 HK 18104809 A HK18104809 A HK 18104809A HK 1245410 A1 HK1245410 A1 HK 1245410A1
Authority
HK
Hong Kong
Prior art keywords
processing apparatus
same
beam splitter
substrate processing
polarization beam
Prior art date
Application number
HK18104809.3A
Other languages
Chinese (zh)
Inventor
加藤正紀
鈴木哲男
鐮田剛忠
荒井正範
北紘典
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1245410A1 publication Critical patent/HK1245410A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
HK18104809.3A 2012-11-06 2016-01-15 Polarization beam splitter and substrate processing apparatus using the same HK1245410A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012244731 2012-11-06
JP2013128877 2013-06-19

Publications (1)

Publication Number Publication Date
HK1245410A1 true HK1245410A1 (en) 2018-08-24

Family

ID=50684638

Family Applications (3)

Application Number Title Priority Date Filing Date
HK16100427.5A HK1212476A1 (en) 2012-11-06 2016-01-15 Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method
HK18104872.5A HK1245418B (en) 2012-11-06 2016-01-15 Exposure apparatus
HK18104809.3A HK1245410A1 (en) 2012-11-06 2016-01-15 Polarization beam splitter and substrate processing apparatus using the same

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK16100427.5A HK1212476A1 (en) 2012-11-06 2016-01-15 Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method
HK18104872.5A HK1245418B (en) 2012-11-06 2016-01-15 Exposure apparatus

Country Status (6)

Country Link
JP (3) JP6540027B2 (en)
KR (4) KR102045713B1 (en)
CN (3) CN104885012B (en)
HK (3) HK1212476A1 (en)
TW (3) TWI596652B (en)
WO (1) WO2014073535A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106547172B (en) * 2015-09-17 2018-11-13 上海微电子装备（集团）股份有限公司 A kind of exposure device
CN108169923B (en) * 2017-12-21 2021-01-26 冯杰 Light source polarizer
CN109143750A (en) * 2018-09-08 2019-01-04 深圳阜时科技有限公司 A kind of optical module, optical projection mould group, sensing device and equipment
CN113686892B (en) * 2021-08-20 2023-08-25 四川轻化工大学 Novel bearing surface defect intelligent detection system

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JPH01241502A (en) * 1988-03-23 1989-09-26 Namiki Precision Jewel Co Ltd Polarizing element for optical isolator
JPH11264904A (en) * 1998-03-17 1999-09-28 Nikon Corp Prism type optical element
DE10005189A1 (en) * 2000-02-05 2001-08-09 Zeiss Carl Projection exposure system has light source, illumination system, reflective reticle, beam divider cube in reduction objective that superimposes illumination and imaging beam paths
CN1440512A (en) * 2000-03-31 2003-09-03 株式会社尼康 Method and device for holding optical member, optical device, exposure apparatus and device manufacturing method
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JP2005024941A (en) * 2003-07-03 2005-01-27 Nikon Corp Projection optical system, projection aligner, and projection exposing method
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US7580131B2 (en) * 2007-04-17 2009-08-25 Asml Netherlands B.V. Angularly resolved scatterometer and inspection method
JP4936385B2 (en) * 2007-06-06 2012-05-23 キヤノン株式会社 Polarizing element and exposure apparatus
KR20090021755A (en) * 2007-08-28 2009-03-04 삼성전자주식회사 Exposure apparatus and method of exposing a semiconductor substrate
CN101165597B (en) * 2007-10-11 2010-04-14 上海微电子装备有限公司 Aligning system and lightscribing device using the system
CN101681123B (en) * 2007-10-16 2013-06-12 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
JP5533659B2 (en) * 2008-10-10 2014-06-25 株式会社ニコン Flexible substrate, display element manufacturing method, and display element manufacturing apparatus
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US20130027684A1 (en) * 2010-04-13 2013-01-31 Tohru Kiuchi Exposure apparatus, substrate processing apparatus, and device manufacturing method
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Also Published As

Publication number Publication date
CN107272095A (en) 2017-10-20
KR101900225B1 (en) 2018-09-18
KR20190044126A (en) 2019-04-29
WO2014073535A1 (en) 2014-05-15
TWI596652B (en) 2017-08-21
JP6540027B2 (en) 2019-07-10
CN104885012A (en) 2015-09-02
KR102045713B1 (en) 2019-11-15
JP2018025810A (en) 2018-02-15
KR101984451B1 (en) 2019-05-30
CN107255911A (en) 2017-10-17
JP2019117409A (en) 2019-07-18
TWI627662B (en) 2018-06-21
TW201738933A (en) 2017-11-01
HK1245418B (en) 2020-04-24
CN107272095B (en) 2020-04-28
TW201432785A (en) 2014-08-16
TW201738934A (en) 2017-11-01
JPWO2014073535A1 (en) 2016-09-08
KR20180071428A (en) 2018-06-27
TWI683345B (en) 2020-01-21
JP6512253B2 (en) 2019-05-15
JP6705527B2 (en) 2020-06-03
CN104885012B (en) 2017-07-28
KR20180008893A (en) 2018-01-24
HK1212476A1 (en) 2016-06-10
CN107255911B (en) 2019-07-09
KR101979979B1 (en) 2019-05-17
KR20150083852A (en) 2015-07-20

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