HK1212476A1 - Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method - Google Patents

Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method

Info

Publication number
HK1212476A1
HK1212476A1 HK16100427.5A HK16100427A HK1212476A1 HK 1212476 A1 HK1212476 A1 HK 1212476A1 HK 16100427 A HK16100427 A HK 16100427A HK 1212476 A1 HK1212476 A1 HK 1212476A1
Authority
HK
Hong Kong
Prior art keywords
device manufacturing
processing apparatus
beam splitter
substrate processing
polarization beam
Prior art date
Application number
HK16100427.5A
Other languages
Chinese (zh)
Inventor
加藤正紀
鈴木哲男
鐮田剛忠
荒井正範
北紘典
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1212476A1 publication Critical patent/HK1212476A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Polarising Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
HK16100427.5A 2012-11-06 2016-01-15 Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method HK1212476A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012244731 2012-11-06
JP2013128877 2013-06-19
PCT/JP2013/079911 WO2014073535A1 (en) 2012-11-06 2013-11-05 Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method

Publications (1)

Publication Number Publication Date
HK1212476A1 true HK1212476A1 (en) 2016-06-10

Family

ID=50684638

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18104809.3A HK1245410A1 (en) 2012-11-06 2016-01-15 Polarization beam splitter and substrate processing apparatus using the same
HK18104872.5A HK1245418B (en) 2012-11-06 2016-01-15 Exposure apparatus
HK16100427.5A HK1212476A1 (en) 2012-11-06 2016-01-15 Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18104809.3A HK1245410A1 (en) 2012-11-06 2016-01-15 Polarization beam splitter and substrate processing apparatus using the same
HK18104872.5A HK1245418B (en) 2012-11-06 2016-01-15 Exposure apparatus

Country Status (6)

Country Link
JP (3) JP6540027B2 (en)
KR (4) KR101984451B1 (en)
CN (3) CN107255911B (en)
HK (3) HK1245410A1 (en)
TW (3) TWI596652B (en)
WO (1) WO2014073535A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106547172B (en) * 2015-09-17 2018-11-13 上海微电子装备（集团）股份有限公司 A kind of exposure device
CN108169923B (en) * 2017-12-21 2021-01-26 冯杰 Light source polarizer
CN109143750A (en) * 2018-09-08 2019-01-04 深圳阜时科技有限公司 A kind of optical module, optical projection mould group, sensing device and equipment
CN113686892B (en) * 2021-08-20 2023-08-25 四川轻化工大学 Novel bearing surface defect intelligent detection system

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JPH01241502A (en) * 1988-03-23 1989-09-26 Namiki Precision Jewel Co Ltd Polarizing element for optical isolator
JPH11264904A (en) * 1998-03-17 1999-09-28 Nikon Corp Prism type optical element
DE10005189A1 (en) * 2000-02-05 2001-08-09 Zeiss Carl Projection exposure system has light source, illumination system, reflective reticle, beam divider cube in reduction objective that superimposes illumination and imaging beam paths
CN1440512A (en) * 2000-03-31 2003-09-03 株式会社尼康 Method and device for holding optical member, optical device, exposure apparatus and device manufacturing method
JP4158317B2 (en) * 2000-05-31 2008-10-01 三菱電機株式会社 Illumination device and projection display device using the illumination device
JP2003114326A (en) * 2001-10-04 2003-04-18 Olympus Optical Co Ltd Polarized beam splitter and optical apparatus using the polarized beam splitter
JP2005024941A (en) * 2003-07-03 2005-01-27 Nikon Corp Projection optical system, projection aligner, and projection exposing method
JP4510547B2 (en) * 2004-08-09 2010-07-28 キヤノン株式会社 Polarization separating element and projection apparatus having the same
JP2006098719A (en) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd Exposure apparatus
JP2006220879A (en) * 2005-02-10 2006-08-24 Sony Corp Polarizer, luminescent device, and liquid crystal display
JP2007163804A (en) * 2005-12-13 2007-06-28 Canon Inc Polarization beam splitter
JP2007227438A (en) * 2006-02-21 2007-09-06 Nikon Corp Exposure apparatus and exposure method, and mask for light exposure
TWI481968B (en) * 2006-09-08 2015-04-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
US7580131B2 (en) * 2007-04-17 2009-08-25 Asml Netherlands B.V. Angularly resolved scatterometer and inspection method
JP4936385B2 (en) * 2007-06-06 2012-05-23 キヤノン株式会社 Polarizing element and exposure apparatus
KR20090021755A (en) * 2007-08-28 2009-03-04 삼성전자주식회사 Exposure apparatus and method of exposing a semiconductor substrate
CN101165597B (en) * 2007-10-11 2010-04-14 上海微电子装备有限公司 Aligning system and lightscribing device using the system
EP2179330A1 (en) * 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
WO2010041403A1 (en) * 2008-10-10 2010-04-15 株式会社ニコン Flexible substrate, method for manufacturing display element and apparatus for manufacturing display element
JP5282895B2 (en) * 2009-03-06 2013-09-04 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
US8541163B2 (en) * 2009-06-05 2013-09-24 Nikon Corporation Transporting method, transporting apparatus, exposure method, and exposure apparatus
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
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JP5724564B2 (en) * 2010-04-13 2015-05-27 株式会社ニコン Mask case, mask unit, exposure apparatus, substrate processing apparatus, and device manufacturing method
JP5708179B2 (en) * 2010-04-13 2015-04-30 株式会社ニコン Exposure apparatus, substrate processing apparatus, and device manufacturing method
JP2011221536A (en) * 2010-04-13 2011-11-04 Nikon Corp Mask moving device, exposure device, substrate processor and device manufacturing method
JPWO2011129369A1 (en) * 2010-04-13 2013-07-18 株式会社ニコン Exposure apparatus, substrate processing apparatus, and device manufacturing method
US9355818B2 (en) * 2010-05-28 2016-05-31 Kla-Tencor Corporation Reflection electron beam projection lithography using an ExB separator
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WO2012100791A1 (en) * 2011-01-29 2012-08-02 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
KR101723354B1 (en) * 2011-02-24 2017-04-05 가부시키가이샤 니콘 Substrate processing method and substrate processing apparatus
CN105425553B (en) * 2011-12-20 2018-08-28 株式会社尼康 Substrate treating apparatus, device inspection apparatus and device making method

Also Published As

Publication number Publication date
CN107255911B (en) 2019-07-09
TWI627662B (en) 2018-06-21
KR20150083852A (en) 2015-07-20
TW201738933A (en) 2017-11-01
KR20180008893A (en) 2018-01-24
JP2018025810A (en) 2018-02-15
KR101984451B1 (en) 2019-05-30
TWI596652B (en) 2017-08-21
KR101900225B1 (en) 2018-09-18
JP6512253B2 (en) 2019-05-15
CN104885012B (en) 2017-07-28
KR20190044126A (en) 2019-04-29
WO2014073535A1 (en) 2014-05-15
KR102045713B1 (en) 2019-11-15
TW201432785A (en) 2014-08-16
KR20180071428A (en) 2018-06-27
CN107272095B (en) 2020-04-28
TWI683345B (en) 2020-01-21
JP6540027B2 (en) 2019-07-10
HK1245410A1 (en) 2018-08-24
KR101979979B1 (en) 2019-05-17
CN107255911A (en) 2017-10-17
JPWO2014073535A1 (en) 2016-09-08
JP6705527B2 (en) 2020-06-03
HK1245418B (en) 2020-04-24
JP2019117409A (en) 2019-07-18
TW201738934A (en) 2017-11-01
CN107272095A (en) 2017-10-20
CN104885012A (en) 2015-09-02

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20211104