HK1245418B - Exposure apparatus - Google Patents
Exposure apparatusInfo
- Publication number
- HK1245418B HK1245418B HK18104872.5A HK18104872A HK1245418B HK 1245418 B HK1245418 B HK 1245418B HK 18104872 A HK18104872 A HK 18104872A HK 1245418 B HK1245418 B HK 1245418B
- Authority
- HK
- Hong Kong
- Prior art keywords
- exposure apparatus
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
- G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polarising Elements (AREA)
- Lenses (AREA)
- Optical Elements Other Than Lenses (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012244731 | 2012-11-06 | ||
| JP2013128877 | 2013-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1245418B true HK1245418B (en) | 2020-04-24 |
Family
ID=50684638
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK18104872.5A HK1245418B (en) | 2012-11-06 | 2016-01-15 | Exposure apparatus |
| HK16100427.5A HK1212476A1 (en) | 2012-11-06 | 2016-01-15 | Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method |
| HK18104809.3A HK1245410A1 (en) | 2012-11-06 | 2016-01-15 | Polarization beam splitter and substrate processing apparatus using the same |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK16100427.5A HK1212476A1 (en) | 2012-11-06 | 2016-01-15 | Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method |
| HK18104809.3A HK1245410A1 (en) | 2012-11-06 | 2016-01-15 | Polarization beam splitter and substrate processing apparatus using the same |
Country Status (6)
| Country | Link |
|---|---|
| JP (3) | JP6540027B2 (en) |
| KR (4) | KR101984451B1 (en) |
| CN (3) | CN107255911B (en) |
| HK (3) | HK1245418B (en) |
| TW (3) | TWI596652B (en) |
| WO (1) | WO2014073535A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106547172B (en) * | 2015-09-17 | 2018-11-13 | 上海微电子装备（集团）股份有限公司 | A kind of exposure device |
| CN108169923B (en) * | 2017-12-21 | 2021-01-26 | 冯杰 | Light source polarizer |
| CN109143750A (en) * | 2018-09-08 | 2019-01-04 | 深圳阜时科技有限公司 | A kind of optical module, optical projection mould group, sensing device and equipment |
| CN113686892B (en) * | 2021-08-20 | 2023-08-25 | 四川轻化工大学 | Novel bearing surface defect intelligent detection system |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01241502A (en) * | 1988-03-23 | 1989-09-26 | Namiki Precision Jewel Co Ltd | Polarizing element for optical isolator |
| JPH11264904A (en) * | 1998-03-17 | 1999-09-28 | Nikon Corp | Prism type optical element |
| DE10005189A1 (en) * | 2000-02-05 | 2001-08-09 | Zeiss Carl | Projection exposure system has light source, illumination system, reflective reticle, beam divider cube in reduction objective that superimposes illumination and imaging beam paths |
| AU4459701A (en) * | 2000-03-31 | 2001-10-15 | Nikon Corporation | Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
| JP4158317B2 (en) * | 2000-05-31 | 2008-10-01 | 三菱電機株式会社 | Illumination device and projection display device using the illumination device |
| JP2003114326A (en) * | 2001-10-04 | 2003-04-18 | Olympus Optical Co Ltd | Polarized beam splitter and optical apparatus using the polarized beam splitter |
| JP2005024941A (en) * | 2003-07-03 | 2005-01-27 | Nikon Corp | Projection optical system, projection aligner, and projection exposing method |
| JP4510547B2 (en) * | 2004-08-09 | 2010-07-28 | キヤノン株式会社 | Polarization separating element and projection apparatus having the same |
| JP2006098719A (en) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | Exposure apparatus |
| JP2006220879A (en) * | 2005-02-10 | 2006-08-24 | Sony Corp | Polarizer, luminescent device, and liquid crystal display |
| JP2007163804A (en) * | 2005-12-13 | 2007-06-28 | Canon Inc | Polarization beam splitter |
| JP2007227438A (en) | 2006-02-21 | 2007-09-06 | Nikon Corp | Exposure apparatus and exposure method, and mask for light exposure |
| TWI481968B (en) * | 2006-09-08 | 2015-04-21 | 尼康股份有限公司 | A mask, an exposure device, and an element manufacturing method |
| US7580131B2 (en) * | 2007-04-17 | 2009-08-25 | Asml Netherlands B.V. | Angularly resolved scatterometer and inspection method |
| JP4936385B2 (en) * | 2007-06-06 | 2012-05-23 | キヤノン株式会社 | Polarizing element and exposure apparatus |
| KR20090021755A (en) * | 2007-08-28 | 2009-03-04 | 삼성전자주식회사 | Exposure apparatus and method of exposing a semiconductor substrate |
| CN101165597B (en) * | 2007-10-11 | 2010-04-14 | 上海微电子装备有限公司 | Aligning system and lightscribing device using the system |
| CN101681123B (en) * | 2007-10-16 | 2013-06-12 | 株式会社尼康 | Illumination optical system, exposure apparatus, and device manufacturing method |
| JP5533659B2 (en) * | 2008-10-10 | 2014-06-25 | 株式会社ニコン | Flexible substrate, display element manufacturing method, and display element manufacturing apparatus |
| JP5282895B2 (en) * | 2009-03-06 | 2013-09-04 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
| US8264666B2 (en) * | 2009-03-13 | 2012-09-11 | Nikon Corporation | Exposure apparatus, exposure method, and method of manufacturing device |
| US8541163B2 (en) * | 2009-06-05 | 2013-09-24 | Nikon Corporation | Transporting method, transporting apparatus, exposure method, and exposure apparatus |
| US20110037962A1 (en) * | 2009-08-17 | 2011-02-17 | Nikon Corporation | Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method |
| JP2011043679A (en) * | 2009-08-21 | 2011-03-03 | Fujifilm Corp | Zoom lens and image pickup apparatus |
| JP5708179B2 (en) * | 2010-04-13 | 2015-04-30 | 株式会社ニコン | Exposure apparatus, substrate processing apparatus, and device manufacturing method |
| JP5724564B2 (en) * | 2010-04-13 | 2015-05-27 | 株式会社ニコン | Mask case, mask unit, exposure apparatus, substrate processing apparatus, and device manufacturing method |
| US20130027684A1 (en) * | 2010-04-13 | 2013-01-31 | Tohru Kiuchi | Exposure apparatus, substrate processing apparatus, and device manufacturing method |
| JP2011221536A (en) * | 2010-04-13 | 2011-11-04 | Nikon Corp | Mask moving device, exposure device, substrate processor and device manufacturing method |
| US9355818B2 (en) * | 2010-05-28 | 2016-05-31 | Kla-Tencor Corporation | Reflection electron beam projection lithography using an ExB separator |
| JP5695197B2 (en) * | 2010-09-29 | 2015-04-01 | 東友ファインケム株式会社 | Exposure system |
| WO2012100791A1 (en) * | 2011-01-29 | 2012-08-02 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic projection exposure apparatus |
| JP5780291B2 (en) * | 2011-02-24 | 2015-09-16 | 株式会社ニコン | Substrate processing equipment |
| CN104011597B (en) * | 2011-12-20 | 2017-05-10 | 株式会社尼康 | Substrate Processing Device, Device Manufacturing System And Device Manufacturing Method |
-
2013
- 2013-11-05 JP JP2014545710A patent/JP6540027B2/en active Active
- 2013-11-05 CN CN201710559593.9A patent/CN107255911B/en active Active
- 2013-11-05 KR KR1020187017562A patent/KR101984451B1/en active IP Right Grant
- 2013-11-05 CN CN201380067898.8A patent/CN104885012B/en active Active
- 2013-11-05 KR KR1020157011676A patent/KR101979979B1/en active IP Right Grant
- 2013-11-05 KR KR1020197011130A patent/KR102045713B1/en active IP Right Grant
- 2013-11-05 TW TW102140021A patent/TWI596652B/en active
- 2013-11-05 CN CN201710559592.4A patent/CN107272095B/en active Active
- 2013-11-05 TW TW106124329A patent/TWI627662B/en active
- 2013-11-05 WO PCT/JP2013/079911 patent/WO2014073535A1/en active Application Filing
- 2013-11-05 TW TW106124326A patent/TWI683345B/en active
- 2013-11-05 KR KR1020187001013A patent/KR101900225B1/en active IP Right Grant
-
2016
- 2016-01-15 HK HK18104872.5A patent/HK1245418B/en not_active IP Right Cessation
- 2016-01-15 HK HK16100427.5A patent/HK1212476A1/en not_active IP Right Cessation
- 2016-01-15 HK HK18104809.3A patent/HK1245410A1/en unknown
-
2017
- 2017-09-15 JP JP2017178349A patent/JP6512253B2/en active Active
-
2019
- 2019-04-03 JP JP2019071494A patent/JP6705527B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR101900225B1 (en) | 2018-09-18 |
| KR20180008893A (en) | 2018-01-24 |
| CN107255911A (en) | 2017-10-17 |
| HK1245410A1 (en) | 2018-08-24 |
| CN107255911B (en) | 2019-07-09 |
| CN104885012A (en) | 2015-09-02 |
| KR20190044126A (en) | 2019-04-29 |
| WO2014073535A1 (en) | 2014-05-15 |
| JP2018025810A (en) | 2018-02-15 |
| TWI596652B (en) | 2017-08-21 |
| KR101979979B1 (en) | 2019-05-17 |
| KR20180071428A (en) | 2018-06-27 |
| TW201738933A (en) | 2017-11-01 |
| TW201432785A (en) | 2014-08-16 |
| TW201738934A (en) | 2017-11-01 |
| KR102045713B1 (en) | 2019-11-15 |
| TWI627662B (en) | 2018-06-21 |
| JP6705527B2 (en) | 2020-06-03 |
| CN104885012B (en) | 2017-07-28 |
| KR101984451B1 (en) | 2019-05-30 |
| TWI683345B (en) | 2020-01-21 |
| JP6512253B2 (en) | 2019-05-15 |
| CN107272095B (en) | 2020-04-28 |
| HK1212476A1 (en) | 2016-06-10 |
| JP6540027B2 (en) | 2019-07-10 |
| CN107272095A (en) | 2017-10-20 |
| JP2019117409A (en) | 2019-07-18 |
| KR20150083852A (en) | 2015-07-20 |
| JPWO2014073535A1 (en) | 2016-09-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20231108 |