CN104011597B - Substrate Processing Device, Device Manufacturing System And Device Manufacturing Method - Google Patents

Substrate Processing Device, Device Manufacturing System And Device Manufacturing Method Download PDF

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Publication number
CN104011597B
CN104011597B CN201280063563.4A CN201280063563A CN104011597B CN 104011597 B CN104011597 B CN 104011597B CN 201280063563 A CN201280063563 A CN 201280063563A CN 104011597 B CN104011597 B CN 104011597B
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China
Prior art keywords
optical system
photomask
face
substrate
pattern
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CN201280063563.4A
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Chinese (zh)
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CN104011597A (en
Inventor
加藤正纪
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Nikon Corp
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Nikon Corp
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Priority to CN201510964816.0A priority Critical patent/CN105425553B/en
Priority to CN201710321582.7A priority patent/CN107255858B/en
Publication of CN104011597A publication Critical patent/CN104011597A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A substrate processing device (1011) is provided with: a first support component (1021) that supports one member object of a set consisting of a first object (M) and a second object (P), said member object being supported such that, in one member area of a set consisting of an illumination area (IR) and a projection area (PA), said member object aligns with a first surface (p1001) that curves with a specified curvature and in the form of a cylindrical surface; and a second support component (1022) that supports the other member object of the set consisting of the first object and the second object, said member object being supported such that, in the other member area of the set consisting of the illumination area and the projection area, said member object aligns with a specified second surface (p1002). A projection optical system (PL) is provided with a deflecting component for propagating an image-forming light beam such that within a principal ray of the image-forming light beam, which extends from the illumination area to the projection area, the principal ray between the first surface and the projection optical system is oriented in a radial direction not perpendicular to the second surface, said direction being a first-surface radial direction.

Description

Substrate treating apparatus, device inspection apparatus and device making method
Technical field
The present invention is with regard to substrate treating apparatus, device inspection apparatus and device making method.
Subject application Japanese Patent Application No. 2011-278290 and on 2 7th, 2012 according to filed in 20 days December in 2011 The Japanese Patent Application 2012-024058 CLAIM OF PRIORITY of application, its content is quoted for this.
Background technology
The substrate treating apparatus such as exposure device, described in example patent documentation 1 described as follows, for the manufacture of various devices. Substrate treating apparatus, can will be configured at the pattern image that formed on the photomask M of illumination region and be projected on configuration in view field Substrate it is first-class.Photomask M for substrate treating apparatus has plane, cylindrical shape.
Also, one of method as manufacture device, it is known to the volume to volume described in example patent documentation 2 described as follows (roll to roll) mode.Volume to volume mode, is while transporting the substrates such as film, one side toward recovery reel with reel from sending The process of various modes is carried out to substrate in transport path.Substrate for example waits substantially to put down between conveyance cylinder sometimes The state in face is subjected to process.Also, substrate also has for example in the first-class situation that process is subjected to the state for bending of cylinder surface.
Prior art literature：
[patent documentation 1] Japanese Unexamined Patent Publication 2007-299918 publications；
[patent documentation 2] International Publication No. 2008/129819.
The content of the invention
The invention problem to be solved：
Substrate treating apparatus (exposure device) described above, the illumination region on such as photomask and the projection in substrate One or both of region is with the situation of set curvature bending, if considering the imaging performance of the projection optical system for exposure, Restriction then particularly can be produced in the setting of the chief ray of imaging beam.For example, examination assumes the cylindrical shape that will be formed in radius R The photomask pattern of the periphery barrel surface of rotation photomask is by projection optical system projection in the cylinder wound on radius R The situation on substrate (film, the piece, net etc.) surface of rotating drum (cylinder).Under this situation, it is however generally that, as long as arranging from photomask Pattern (cylinder planar) to the chief ray of the imaging beam of substrate surface (cylinder planar) can be formed cylindric rotation photomask Pivot axle and cylinder rotating drum the projection optical system of light path that links of Pivot axle straight line.
However, work as the rotation direction of principal axis in cylindric rotation photomask, the larger-size situation of photomask pattern, sometimes This kind of projection optical system need to be arranged multiple and multiple changes in the direction of rotary shaft.The situation of this kind of multipleization, even if will be many Individual projection optical system closely forms a line in the direction of rotary shaft, the projection visual field (view field) of each projection optical system The thickness of the metal objects such as lens barrel is inherently separated each other, so big photomask pattern cannot verily be exposed.
Also, substrate treating apparatus described above are when the composition of such as device is complicated, it is likely that have installation cost to improve, Plant bulk becomes big situation.As a result, the manufacturing cost that there is a possibility that device is improved.
For example, when precise pattern must be imposed, as substrate treating apparatus, using illumination description have electronic device or The photomask of the pattern of display device simultaneously will be exposed to from the optical projection of the pattern of photomask and be formed with photosensitive layer (photoresistance etc.) Substrate on exposure device.In the flexible strip that the pattern of photomask is exposed to continuous conveyance repeatedly by volume to volume mode The situation of substrate (film, piece, net etc.), if also using using the conveyance direction of strip substrate as scanning direction, using cylindric rotation Turn photomask as the scanning exposure apparatus of photomask, then improve with can expecting productivity jumping characteristic.
This kind of rotation photomask, has and forms figuratum transmission mode with light shield layer in the transparent cylinder such as glass outer peripheral face Figuratum reflection mode is formed with reflecting part and absorption portion with the outer peripheral face in metallicity cylinder (also can be cylinder).Thoroughly The cylinder photomask of emitting, it is necessary in the cylinder photomask assembled inside to irradiate the illumination light of the pattern towards outer peripheral face Lamp optical system (optical component such as reflecting mirror, lens), it is difficult to the inside center that rotary shaft is passed through into cylinder photomask, and also There are the holding construction of cylinder photomask or the composition of rotary drive system to become complicated situation.
On the other hand, the situation of the cylinder photomask of reflection-type, due to metal cylinder (or cylinder) can be used, Therefore though photomask can be inexpensively made, must be in the illumination light of the peripheral space of cylinder photomask setting irradiation exposure Lamp optical system with self-forming in future in the projection optical system that projects toward substrate of reflected light of the pattern of outer peripheral face, it is and promising Meeting compositions of the exposure device side of the resolution or the transfer informativeness that are required etc. becomes the situation of complexity.
The form of the present invention, its object is to provide a kind of substrate treating apparatus, even if being equipped with photomask or substrate One or both of (flexible substrates such as film, piece, net) is configured to cylinder planar also can verily expose larger photomask pattern The projection optical system for being used.Other purposes, are to provide the device manufacture system that can verily expose larger photomask pattern System and device making method.
Also, other purposes are to provide device can be constituted into simplified substrate treating apparatus.Also, other purposes are to provide The device inspection apparatus and device making method of manufacturing cost can be lowered.
To the means to solve the problem：
According to a form of the present invention, there is provided a kind of substrate treating apparatus, possess：Projection optical system, will be from the 1st thing The light beam of the illumination region on body (photomask) is projeced into the view field on the 2nd object (substrate)；1st supporting member, with The is supported in the way of the 1st cylindric face along by set curvature bending in a side region in illumination region and view field A side in 1 object and the 2nd object；And the 2nd supporting member, with the opposing party region in illumination region and view field Mode along set 2nd face supports the 1st object and the opposing party in the 2nd object；Projection optical system possesses deflection component, should Deflection component is with from the key light in the chief ray of the imaging beam of illumination region to view field between the 1st face and projection optical system Line propagates imaging beam towards in the footpath direction in the 1st face with the mode that the 2nd face is non-perpendicular footpath direction.
According to other forms of the invention, there is provided a kind of device inspection apparatus, the substrate treating apparatus for possessing above-mentioned form.
According to other forms of the invention, there is provided a kind of device making method, comprising：Filled by the base treatment of above-mentioned form Putting exposes the 2nd object；And by processing exposure after the 2nd object forming the pattern of the 1st object.
According to other forms of the invention, there is provided a kind of substrate treating apparatus, the picture of reflexive photomask pattern is projected It is exposed in sensing substrate, it possesses：Photomask holding member, keeps photomask pattern；Projection optical system, will be from being set in The reflected beams that the illumination region that last point of photomask pattern is produced toward sensing substrate projection, whereby by photomask pattern one The picture for dividing images in sensing substrate；Optical component, comprising：Projection optics is configured in order to carry out falling oblique illumination to illumination region In the light path of system, make the part that the side in illumination light toward illumination region and the reflected beams from illumination region generation passes through With the part for reflecting the opposing party；And lamp optical system, the light source image in the source as illumination light is generated, via projection optics A part of light path of system and optical component make illumination light from light source image toward illumination region, and will be with light source image optically The conjugate planes of conjugation is formed at the reflecting part of optical component or the position by part or nearby.
According to other forms of the invention, there is provided a kind of substrate treating apparatus, the picture of reflexive photomask pattern is projected It is exposed in sensing substrate, it possesses：Photomask holding member, keeps photomask pattern；Projection optical system, will be from being set in The reflected beams that the illumination region that last point of photomask pattern is produced toward sensing substrate projection, whereby by photomask pattern one The picture for dividing images in sensing substrate；Optical component, comprising：Projection optics is configured in order to carry out falling oblique illumination to illumination region In the light path of system, make the part that the side in illumination light toward illumination region and the reflected beams from illumination region generation passes through With the part for reflecting the opposing party；And lamp optical system, will be regularly or random as the multiple light sources picture in the source of illumination light Be formed at severally the reflecting part of optical component or the position by part or its near.
According to other forms of the invention, there is provided a kind of device inspection apparatus, the substrate treating apparatus for possessing above-mentioned form.
According to other forms of the invention, there is provided a kind of device making method, comprising：Filled by the base treatment of above-mentioned form Putting exposes object；And make the object after exposure develop.
According to other forms of the invention, there is provided a kind of device making method, by the long side side of the continuous DIYU of flexible sheet substrate To transfer, while the pattern of device is formed in the sheet form base, it is included：Edge is set to be certain radius from the 1st centrage Barrel surface be formed with transmission-type corresponding with the pattern of device or reflection-type photomask pattern cylinder photomask in the 1st Heart line rotates；By the cylinder with the cylindric outer peripheral face from the 2nd centrage of the 1st centerline parallel for certain radius Body, make sheet form base a part bending and support, while sheet form base is transferred in long side direction；By one group of projection optics system The projection image of photomask pattern is exposed to sheet form base by system, and one group of projection optical system is configured to relative comprising the 1st center Line be configured to the median plane of the 2nd centrage it is substantially symmetric, and using the photomask pattern of cylinder photomask as object plane, will be with Cylinder supporting sheet form base surface as during image planes from object plane toward the chief ray of the imaging beam of image planes pass through object plane Chief ray extended line towards the 1st centrage, by the extended line of the chief ray of image planes towards the 2nd centrage.
According to other forms of the invention, there is provided another kind of substrate treating apparatus, make justifying away from the set radius of the 1st centrage Cylinder planar ground forms the cylinder photomask of pattern plane and rotates around the 1st centrage, and long by the sheet form base edge for making strip Edge direction is moved, and will be formed in the pattern exposure of pattern plane of the cylinder photomask in the sheet form base, and it possesses：Rotation Reel, it possesses in cylindric the periphery for being formed away from the radius set with the 2nd centrage of the 1st centerline parallel Face, supports a part of cylindric of the long side direction of the sheet form base in the outer peripheral face, and in the described 2nd The rotation of heart line simultaneously transports sheet form base along long side direction, and projection optical system, its inject in by illumination in setting During the illumination region of the part in the pattern plane of the cylinder photomask, from the figure that the 1st illumination region occurs The imaging beam of case, by the projection of the part towards the surface for being set in the sheet form base supported with the rotating drum Region project, the pattern is imaged in the sheet form base；The projection optical system, will be comprising the 1st centrage And the plane of the 2nd centrage as median plane when, it possesses：1st deflection component, with the chief ray of the imaging beam By the center of the illumination region towards the illumination region normal direction advance the 1st chief ray, to the median plane in The circumferential direction of the cylinder photomask is partial to the imaging beam into the mode at set inclination angle, and the 2nd deflection component, with The 2nd advanced towards the normal direction of the view field by the center of the view field in the chief ray of the imaging beam Chief ray, it is into the mode at set inclination angle that the imaging beam is inclined in the circumferential direction of the rotating drum to the median plane To.
Invention effect
Form of the invention, even if one or both of photomask and substrate is the situation of cylinder planar, also can lead to The substrate treating apparatus (exposure device) for crossing the projection optical system for possessing small-sized verily expose larger photomask pattern.Also, Form of the invention, can provide can verily expose the device inspection apparatus and device manufacturing method of larger photomask pattern Method.
Also, form of the invention, can provide can be by the simplified substrate treating apparatus of the composition of device.Also, according to this The form of invention, can provide can lower the device inspection apparatus and device making method of manufacturing cost.
Description of the drawings
Fig. 1 shows the device inspection apparatus pie graph of the 1st embodiment.
Fig. 2 shows the monolithically fabricated figure of the substrate treating apparatus (exposure device) of the 1st embodiment.
Fig. 3 shows the pie graph of the photomask holding meanss of the exposure device shown in Fig. 2.
Fig. 4 shows the 1st mandrel member of the exposure device shown in Fig. 2 and the pie graph of lamp optical system.
Fig. 5 shows the configuration figure of the illumination region of the exposure device shown in Fig. 2 and view field.
Fig. 6 shows the pie graph of the projection optical system suitable for the exposure device shown in Fig. 2.
Fig. 7 shows the monolithically fabricated figure of the exposure device of the 2nd embodiment.
Fig. 8 shows the monolithically fabricated figure of the exposure device of the 3rd embodiment.
Fig. 9 illustrates the position relationship information drawing of the view field of the illumination region of the exposure device shown in Fig. 8.
Figure 10 shows the chart with the condition of Fig. 9 explanations with cylinder photomask radius change.
Figure 11 shows the monolithically fabricated figure of the exposure device of the 4th embodiment.
Figure 12 shows the oblique illumination mode pie graph that falls of the exposure device of the 5th embodiment.
Figure 13 shows the pie graph of the projection optical system of the 6th embodiment.
Figure 14 is shown the pie graph of the situation after projection optical system multipleization shown in Figure 13.
Figure 15 shows the projection optical system figure watched after multipleization shown in Figure 14 from other directions.
Figure 16 shows the pie graph of the projection optical system of the 7th embodiment.
Figure 17 shows the pie graph of the projection optical system of the 8th embodiment.
Figure 18 shows the pie graph of the projection optical system of the 9th embodiment.
Figure 19 shows the pie graph of the projection optical system of the 10th embodiment.
Figure 20 shows the pie graph of the device inspection apparatus of the 11st embodiment.
Figure 21 shows the pie graph of the substrate treating apparatus (exposure device) of the 11st embodiment.
Figure 22 shows the pie graph of the optical component of the 11st embodiment.
Figure 23 shows the light path schematic diagram from illumination region to view field.
Figure 24 shows the figure of the configuration example of the light supply apparatuses of the 11st embodiment.
Figure 25 shows the figure of the configuration example of the fly eye lens array of the 11st embodiment.
Figure 26 shows the figure of the configuration example of the diaphragm in the lamp optical system of the 11st embodiment.
Figure 27 shows the figure of the configuration example of the optical component of the 11st embodiment.
Figure 28 shows the figure of the configuration example of the fly eye lens array of the 12nd embodiment.
Figure 29 shows the figure of the configuration example of the fly eye lens array of the 13rd embodiment.
Figure 30 shows the figure of the configuration example of the fly eye lens array of the 14th embodiment.
Figure 31 shows the figure of the configuration example of the light source image forming portion of the 15th embodiment.
Figure 32 A show the figure of the configuration example of the lamp optical system of the 16th embodiment.
Figure 32 B show the figure of the configuration example of the lamp optical system of the 16th embodiment.
Figure 33 A show the figure in each portion of lamp optical system of the 16th embodiment.
Figure 33 B show the figure in each portion of lamp optical system of the 16th embodiment.
Figure 33 C show the figure in each portion of lamp optical system of the 16th embodiment.
Figure 34 shows the pie graph of the substrate treating apparatus (exposure device) of the 17th embodiment.
Figure 35 shows the illumination region of the 17th embodiment and the configuration figure of view field.
Figure 36 shows the figure of the configuration example of the exposure device of the 17th embodiment.
Figure 37 shows the figure of the configuration example of the projection optical system of the 18th embodiment.
Figure 38 shows the figure of the configuration example of the projection optical system of the 19th embodiment.
Figure 39 shows the flow chart of the device making method of this embodiment.
Specific embodiment
[the 1st embodiment]
Fig. 1 shows the figure of the composition of the device inspection apparatus 1001 of this embodiment.Device inspection apparatus shown in Fig. 1 1001, possess the substrate feeding mechanism 1002 of supply substrate P, substrate P to supplying by substrate feeding mechanism 1002 and perform both The fixed processing meanss 1003 for processing, the substrate retracting device 1004 for reclaiming substrate P for having processed by processing meanss 1003 and The host control device 1005 in each portion of control device manufacture system 1001.
In this embodiment, (piece) substrate with flexible (flexibility) of for example so-called flexible substrates of substrate P etc.. The device inspection apparatus 1001 of this embodiment, can be by having flexible device with flexible substrate P manufacture.Substrate P example Such as it is chosen to have the flexibility of degree that will not be disrumpent feelings when device inspection apparatus 1001 bend.
Additionally, the flexibility of substrate P when device is manufactured, for example, can adjust according to the material of substrate P, size, thickness etc., And the environmental condition such as humidity, temperature when can manufacture according to device etc. is adjusting.Also, substrate P also can be such as so-called hard substrate etc. There is no flexible substrate.Also, the composite substrate that substrate P can also combine flexible substrates and hard substrate.
With flexible substrate P, the paper tinsel that for example metal or alloy such as resin film, rustless steel is constituted can be used (foil).The material of resin film is for example included and uses polyvinyl resin, acrylic resin, polyester resin, ethylene-vinyl copolymerization Resin, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene In resin, polyvinyl alcohol resin one or more than two.
The characteristic of substrate P such as thermal coefficient of expansion etc. is set to substantially ignore the various process for putting on substrate P Deflection caused by suffered heat in step.Substrate P, for example, can select thermal coefficient of expansion non-significant big.Thermal coefficient of expansion, example Such as also can be set to that threshold value more corresponding than manufacturing process temperature is little by the way that inorganic filler is mixed in into resin film.It is inorganic Filler, for example, have titanium oxide, Zinc Oxide, aluminium oxide, silicon oxide etc..Additionally, substrate P can be with the thickness of the manufactures such as float method Very thin glass monolith for 100 μm or in the above-mentioned resin film of the very thin glass gluing and the sedimentary of aluminium foil.
In this embodiment, substrate P is the substrate of so-called multiaspect acquisition.The device inspection apparatus of this embodiment 1001, substrate P is performed repeatedly to carry out various process to a device.Substrate P for being subjected to various process is divided (Dicing) into each device, and multiple devices are become.The size of substrate P, such as width (short side direction) size be 1m～ 2m, length direction (long side direction) size is then such as more than 10m.
Additionally, size of the device manufactured by the scale visual of substrate P etc. is suitably setting.For example, the size of substrate P is also But width size is below 1m or more than 2m, and long side direction size also can be below 10m.Also, when substrate P is so-called many During the substrate of face acquisition, the substrate of a piece of banding is also can be, also can be the substrate that multiple substrates are formed by connecting.Also, device system Make system 1001 also can be by manufacturing device according to the substrate of each device independence.Under this situation, substrate P also can be equivalent to one The substrate of the size of individual device.
The substrate feeding mechanism 1002 of this embodiment, is rolled up in for substrate P using spool 1006, by substrate by sending P is supplied to processing meanss 1003.Substrate feeding mechanism 1002 includes the axle portion for for example winding substrate P, the rotation for making this axle portion rotation Turn drive division etc..In this embodiment, substrate P is sent to processing meanss 1003 by toward its long side direction conveyance.That is, this enforcement In form, the conveyance direction of substrate P is substantially the same with the long side direction of substrate P.
Additionally, substrate feeding mechanism 1002 also can include to cover rolling up in for cover portion of substrate P using spool 1006 etc.. Also, substrate feeding mechanism 1002 also can sequentially send substrate P comprising for example clipping driving cylinder etc. toward its long side direction Mechanism.
The substrate retracting device 1004 of this embodiment, be by by by substrate P of processing meanss 1003 batch in return Receipts reclaim substrate P with spool 1007.Substrate retracting device 1004 is for example in the same manner as substrate feeding mechanism 1002 comprising winding The axle portion of substrate P, the rotary driving part for making the rotation of this axle portion, will cover and roll up cover portion of substrate P in recovery spool 1007 etc..
Additionally, substrate P after processed is cut off device cut-out, the also recyclable cut-off base of substrate retracting device 1004 Bottom.Under this situation, substrate retracting device 1004 also can be the device for overlapping the substrate after cut-out to reclaim.Above-mentioned shearing device But also a part for processing meanss 1003, also can be different devices from processing meanss 1003, such as also can be substrate and reclaim A part for device 1004.
Processing meanss 1003 transport substrate P supplied from substrate feeding mechanism 1002 toward substrate retracting device 1004, and The processed surface of substrate P is processed during conveyance.Processing meanss 1003 possess the processed surface to substrate P to be carried out adding Processing device 1010 and transfer conveyance cylinder 1008 of substrate P etc. comprising with correspondence processed condition that work is processed Carrying device 1009.
Processing device 1010 comprising one or more than two device, its to substrate P processed surface perform to Form the various process of the important document for constituting device.In the device inspection apparatus 1001 of this embodiment, the dress of various process is performed Put the transport path along substrate P suitably to arrange, can be with devices such as so-called volume to volume mode production flexibility display.It is right by rolling up Volume mode, can produce device with good efficiencies.
In this embodiment, the various devices of processing device 1010 are comprising film formation device, exposure device, coating development Device and etching device.Film formation device, such as plating apparatus, evaporation coating device, sputter equipment etc..Film formation device, by conduction The functional membranes such as film, semiconductor film, dielectric film are formed in substrate P.Coating developing unit is in forming active by film formation device The photosensitive material such as photoresistance film can be formed in substrate P of film.Exposure device, by by with the corresponding pattern image of film figure for constituting device Substrate P for being formed with photosensitive material is projected on, exposure-processed is applied to substrate P.Coating developing unit, makes substrate P after exposure Development.Etching device, functional membrane is etched using the photosensitive material of substrate P after development as photomask M.In this way, at processing The functional membrane of be intended to pattern is formed at substrate P by reason device 1010.
Additionally, processing device 1010 also can to possess, such as imprint the film formation device of mode, liquid drop jetting apparatus obstructed Over etching and directly form the device of film figure.At least one of various devices of processing device 1010 also can be omitted.
In this embodiment, host control device 1005 controls substrate feeding mechanism 1002 and makes substrate feeding mechanism 1002 The process that execution supplies substrate P toward processing device 1010.Host control device 1005 controls processing device 1010 And make processing device 1010 perform the various process to substrate P.Host control device 1005 controls substrate retracting device 1004 and make substrate retracting device 1004 perform by processing device 1010 applied various process substrate P reclaim place Reason.
Secondly, the composition of the substrate treating apparatus of this embodiment is illustrated with reference to Fig. 2, Fig. 3, Fig. 4.Fig. 2 shows this enforcement The monolithically fabricated figure of the substrate treating apparatus 1011 of form.The processed described above of substrate treating apparatus 1011 shown in Fig. 2 At least a portion of device 1010.In this embodiment, substrate treating apparatus 1011 include the exposure device for performing exposure-processed At least a portion of EX and carrying device 1009.
The exposure device EX of this embodiment is so-called scanning-exposure apparatus, synchronous on one side to drive cylindric photomask (circle Cylinder photomask) M rotation and flexible substrates P transfer, while the picture that will be formed in the pattern of photomask M is by projection multiplying power Projection optical system PL (PL1001～PL1006) of equimultiple (× 1) is projected on substrate P.Additionally, in Fig. 2～Fig. 4, by orthogonal seat The Y-axis of mark system XYZ is set as parallel with rotation centerline (the 1st centrage) AX1001 of cylindric photomask M, and X-axis is set It is set to the direction of scan exposure and the conveyance direction of substrate P in exposure position.
As shown in Fig. 2 exposure device EX possesses photomask holding meanss 1012, illuminator 1013, projection optical system PL and control device 1014.Substrate treating apparatus 1011 move the photomask M rotations for being held in photomask holding meanss 1012 It is dynamic, and substrate P is transported by carrying device 1009.Illuminator 1013, by illuminating bundle EL1 with homogeneous intensity illumination The part (illumination region IR) for the photomask M that mask holding meanss 1012 are kept.Projection optical system PL, by photomask M On illumination region IR pattern image be projected on carrying device 1009 transport substrate P a part (view field PA).Companion With the movement of photomask M, the position being configured on the photomask M of illumination region IR also changes, and with the movement of substrate P, The position being configured in substrate P of view field PA also changes, whereby by the predetermined pattern (photomask pattern) on photomask M As being projected in substrate P.Control device 1014 controls each portion of exposure device EX, makes each portion perform process.Also, this embodiment In, control device 1014 controls at least a portion of carrying device 1009.
Additionally, control device 1014 also can be a part for the host control device 1005 of device inspection apparatus 1001 or complete Portion.Also, control device 1014 also but be generalized control device 1005 control from host control device 1005 be different dresses Put.Control device 1014 includes such as computer system.Computer system includes such as CPU and various memorizeies or OS, periphery machine Deng hardware.The operating process in each portion of substrate treating apparatus 1011, is to be stored in readable in computer record by the form of program Media, and read this program to be performed by computer system, various process are carried out whereby.Computer system can be connected to it is internet The situation of network or the Internet system, also provides environment (or display environment) comprising webpage.Also, computer-readable recording medium Can take media, be built in the storage devices such as the hard disk of computer system comprising floppy disk, photomagneto disk, ROM, CD-ROM etc..Computer-readable Record media is taken, also comprising such as by the order wire during communication line routers such as network or telephone line such as world-wide web Road, can in short time dynamic holding program, also comprising the computer system as server client such as in this case inside Volatile memory, maintain the program of certain hour.Also, program also may be used to realize the function of substrate treating apparatus 1011 A part, also can realize the function of substrate treating apparatus 1011 with the suite for being recorded in computer system.Upper control Device 1005 can be realized in the same manner as control device 1014 using computer system.
Secondly, each portion of the exposure device EX of Fig. 2 is described in detail with reference to Fig. 3, Fig. 4.Fig. 3 shows photomask holding meanss 1012 pie graph, Fig. 4 shows the pie graph of the 1st mandrel member 1021 and lamp optical system IL.
As shown in Fig. 3 (Fig. 2), photomask holding meanss 1012 possess the 1st component the (the hereinafter referred to as the 1st for keeping photomask M Mandrel member 1021), supporting the 1st mandrel member 1021 guide roller 1023, drive the 1st mandrel member 1021 driving cylinder 1024th, the 1st detector 1025 and the 1st drive division 1026 of the position of the 1st mandrel member 1021 are detected.
As shown in Fig. 4 (Fig. 2 or Fig. 3), the 1st mandrel member 1021 forms the illumination region IR configuration being assigned on photomask M The 1st face p1001.In this embodiment, the 1st face p1001 is included makes line segment (bus) around the axle parallel with this line segment (in the 1st Heart axle AX1001) rotation face (hereinafter referred to as barrel surface).Barrel surface is, for example, outer peripheral face of the outer peripheral face of cylinder, cylinder etc.. 1st mandrel member 1021 is for example constituted with glass or quartz etc., with certain thickness cylindrical shape, its outer peripheral face (barrel surface) shape Into the 1st face p1001.That is, in this embodiment, illumination region IR on photomask M bends to from rotation centerline AX1001 Cylinder planar with certain radius r1001 (with reference to Fig. 1).From the footpath direction of the 1st mandrel member 1021 in 1st mandrel member 1021 Viewing be with two sides of the Y direction of the 1st mandrel member 1021 shown in the part of the pattern overlapping of photomask M, such as Fig. 3 with Outer middle body has light transmission to illuminating bundle EL1001.
Photomask M is made into for example in the very thin glass plate of the good short strip shape of flatness (such as 100～500 μm of thickness) Simultaneously plane photomask of figuratum transmission-type is formed with light shield layers such as chromium so as to along the outer peripheral face of the 1st mandrel member 1021 Bending, and used in the state of this outer peripheral face in winding (attaching).Photomask M is non-with the pattern for being formed without pattern Forming region, in the non-formation region of pattern the 1st mandrel member 1021 is provided with.Photomask M can be filled to the 1st mandrel member 1021 Unload (release).
Additionally, also may replace and photomask M being constituted with very thin glass plate and photomask M being wound in into transparent cylinder mother metal The 1st mandrel member 1021 mode, in the outer peripheral face of the 1st mandrel member 1021 of transparent cylinder mother metal directly describe to be formed with Photomask pattern that the light shield layers such as chromium are formed and be made of one.Under this situation, the 1st mandrel member 1021 also plays photomask The function of the supporting member of (the 1st object).
Laminal photomask M is set to bend and be installed on the structure of inner circumferential surface additionally, the 1st mandrel member 1021 also can be made Make.Also, photomask M can also be formed with the entirety or a part of the panel pattern of one display device of correspondence, also can be formed with The panel pattern of the multiple display devices of correspondence.Furthermore, in photomask M, also can be anti-in the circumferential direction around the 1st central shaft AX1001 Compounding puts multiple panel patterns, also can repeatedly match somebody with somebody small panel pattern in the direction parallel with the 1st central shaft AX1001 Put multiple.Also, photomask M also can include the 1st display device panel pattern and size etc. it is different from the 1st display device the The panel pattern of 2 display devices.Also, in the outer peripheral face (or inner peripheral surface) of the 1st mandrel member 1021, also may be provided at and the 1st The construction of multiple detached laminal photomask M is installed individually in central shaft AX1001 parallel direction or circumferential direction.
Guide roller 1023 and driving cylinder 1024 shown in Fig. 3 extends the 1st center of relative 1st mandrel member 1021 Axle AX1001 is parallel Y direction.Guide roller 1023 and drive cylinder 1024 be arranged to around with the 1st central shaft AX1001 Parallel axle rotation.Guide roller 1023 and driving cylinder 1024, the external diameter of direction of principal axis end is big compared with the profile of other parts, this End is external in the 1st mandrel member 1021.As described above, guide roller 1023 and driving cylinder 1024 are arranged to not be contacted with the 1st The photomask M that mandrel member 1021 is kept.Cylinder 1024 is driven by the way that the torque supplied from the 1st drive division 1026 is transferred to 1st mandrel member 1021, makes the 1st mandrel member 1021 rotate around the 1st central shaft AX1001.
Additionally, though photomask holding meanss 1012 possess a guide roller 1023 and a driving cylinder 1024, lead The number for drawing cylinder 1023 also can be two or more, and the number for driving cylinder 1024 also can be two or more.Guide roller 1023 The inner side of the 1st mandrel member 1021 is also configured in at least one of cylinder 1024 is driven, in the 1st mandrel member 1021 Connect.Also, from the footpath direction of the 1st mandrel member 1021, viewing is and the nonoverlapping portion of the pattern of photomask M in the 1st mandrel member 1021 It is divided to (side of Y direction two), there can be light transmission to illuminating bundle EL1001, can not also has light transmission.Also, guide roller 1023 and drive cylinder 1024 one or both, also but such as circular cone shape, relative 1st center of central shaft (rotary shaft) Axle AX1001 is non-parallel.
1st detector 1025 detects optically the rotation position of the 1st mandrel member 1021.1st detector 1025 is wrapped Containing such as rotary encoder.1st detector 1025 will show the information of the rotation position of the 1st detected mandrel member 1021 Supply to control device 1014.The 1st drive division 1026 comprising actuators such as electro-motors from control device 1014 according to supplying Control signal, adjust to make driving cylinder 1024 rotate torque.Control device 1014 is by according to the 1st detector 1025 Testing result control the 1st drive division 1026 to control the rotation position of the 1st mandrel member 1021.In other words, control device 1014 controls are held in one or both of the rotation position of the photomask M of photomask holding meanss 1012 and rotary speed.
Additionally, can also add the 1st reel structure for measuring Y direction in figure 3 optically in the 1st detector 1025 The sensor (hereinafter referred to as Y-direction position measurement sensor) of the position of part 1021.Though the 1st mandrel member shown in Fig. 2, Fig. 3 1021 Y-direction position is substantially confined to wrap and does not change, but in order to carry out in substrate P be exposed region or alignment mark with The relative position alignment of the pattern of photomask M, also it is contemplated that assembling makes the 1st mandrel member 1021 (photomask M) fine motion in Y-direction Mechanism's (actuator).Under this kind of situation, the metrical information from Y-direction position measurement sensor can be also utilized, control volume 1 The Y-direction micromotion mechanism of barrel member 1021.
As shown in Fig. 2 carrying device 1009 possesses the 1st conveyance cylinder 1030, the 1st guide member 1031, forms configuration base 2nd supporting member (hereinafter referred to as the 2nd mandrel member 1022) of the 2nd face p1002 of the view field PA on the P of bottom, the 2nd guiding structure The conveyance cylinder 1034 of part the 1033, the 2nd, the 2nd detector 1035 and the 2nd drive division 1036.Additionally, the conveyance cylinder shown in Fig. 1 1008 include the 1st conveyance conveyance cylinder 1034 of cylinder 1030 and the 2nd.
In this embodiment, from substrate P that transport path upstream moves toward the 1st conveyance cylinder 1030, via the 1st conveyance Cylinder 1030 is transported toward the 1st guide member 1031.Via substrate P of the 1st guide member 1031, tubular is supported by radius r1002 Or the columned surface bearing of 2nd mandrel member (cylinder) 1022, transport toward the 2nd guide member 1033.Via the 2nd guiding structure Substrate P of part 1033, transports via the 2nd conveyance cylinder 1034 toward the downstream of transport path.Additionally, the 2nd mandrel member 1022 The conveyance cylinders 1030 and the 2nd of rotation centerline (the 2nd centrage) AX1002 and the 1st transport each rotation centerline of cylinder 1034, It is set as parallel with Y-axis.
1st guide member 1031 and the 2nd guide member 1033 are for example intersected by being displaced into the width of substrate P (moving in XZ faces in fig. 2) is moved in direction, and adjustment acts on tension force of substrate P etc. in transport path.Also, the 1st leads Primer component 1031 (and the 1st conveyance cylinder 1030) can for example pass through structure with the 2nd guide member 1033 (and the 2nd conveyance cylinder 1034) Becoming can be displaced into the width (Y-direction) of substrate P to adjust the Y of substrate P for being wound in the periphery of the 2nd mandrel member 1022 Direction position etc..As long as additionally, carrying device 1009 can along projection optical system PL view field PA transport substrate P, Its composition can suitably be changed.
2nd mandrel member 1022 forms the 2nd face p1002, and the 2nd face p1002 is by comprising from projection optical system PL A part of view field PA in substrate P that imaging beam is projected is supported to arc-shaped.In this embodiment, the 2nd reel Component 1022 is a part for carrying device 1009, and as the supporting member (substrate microscope carrier) for supporting exposure object substrate P. That is, the 2nd mandrel member 1022 also can be a part of exposure device EX.
2nd mandrel member 1022 can rotate around central shaft (hereinafter referred to as the 2nd central shaft AX1002), and substrate P is removed along the 2nd The outer peripheral face (barrel surface) on cylinder 1034 is sent to bend to cylinder planar, in the part configuration view field PA for being bent.
Additionally, in this embodiment, the radius r1001 of the part of photomask M is wound in the outer peripheral face of the 1st mandrel member 1021 It is set as with the radius r1002 of the part that substrate P is wound in the outer peripheral face of the 2nd mandrel member 1022 substantially the same.This is because assuming The thickness of laminal photomask M and the roughly equal situation of the thickness of substrate P.
On the other hand, for example when the outer peripheral face in the 1st mandrel member 1021 (transmission cylinder mother metal) passes through the direct shape of layers of chrome During into pattern, the thickness due to the layers of chrome can be ignored, therefore the pattern radius surface relative to photomask is maintained as r1001, if The thickness of substrate P is 200 μm of degree, then the radius on the surface of substrate P of view field PA is r1002+200 μm.This kind of feelings Shape, also can will wind the thickness of radius r1002 diminution substrates P of the part of substrate P in the outer peripheral face of the 2nd mandrel member 1022 Amount.
From the foregoing, in order to strictly carry out condition setting, also can be by the 1st mandrel member 1021 and the 2nd mandrel member 1022 each radius is set to the radius of the pattern plane (barrel surface) of the photomask that the outer peripheral face of the 1st mandrel member 1021 is supported It is equal with the radius on the surface of substrate P that the outer peripheral face of the 2nd mandrel member 1022 is supported.
In this embodiment, the 2nd mandrel member 1022 is by from the 2nd drive division 1036 comprising actuators such as electro-motors The torque of supply and rotate.2nd detector 1035 includes such as rotary encoder, and the 2nd detector 1035 is detected optically The rotation position of the 2nd mandrel member 1022.2nd detector 1035 will show the rotation of the 2nd detected mandrel member 1022 The information of position is supplied to control device 1014.2nd drive division 1026 is adjusted according to the control signal supplied from control device 1014 The whole torque rotate the 2nd mandrel member 1022.Control device 1014 is by the testing result according to the 2nd detector 1035 Control the 2nd drive division 1036 to control the rotation position of the 2nd mandrel member 1022, make the 1st mandrel member 1021 and the 2nd reel The synchronizing moving of component 1022 (synchronous rotary).
Additionally, when substrate P is thin flexible membrane, also having when rolling up in 2 mandrel member 1022 and producing wrinkle or distortion Situation.Therefore, substrate P is made to enter to the contact position with the outer peripheral face of the 2nd mandrel member 1022 as the crow flies as far as possible and make The tension force for giving the conveyance direction (X-direction) of substrate P is important as far as possible for certain value.Under this kind of viewpoint, control device 1014 rotary speeies that the 2nd drive division 1036 is controlled into into the 2nd mandrel member 1022 are uneven little to heavens.
Additionally, in this embodiment, if by volume 1 central shaft AX1001 and the 2nd comprising the 1st mandrel member 1021 The plane of the 2nd central shaft AX1002 of barrel member 1022 is set to median plane p1003 (parallel with YZ faces), then in median plane p1003 Near the position intersected with the 1st cylindric face p1001, median plane p1003 can become approx orthogonal with the 1st face p1001 Relation, similarly, near the position that median plane p1003 intersects with the 2nd face p1002 of cylindrical shape, median plane p1003 and the 2nd Face p1002 can become approx orthogonal relation.
The exposure device EX of this embodiment is assumed to the exposure dress of the projection optical system for carrying so-called poly-lens mode Put.Projection optical system PL possesses multiple projection modules of the picture of a part in the pattern for projecting photomask M.For example, in Fig. 2, There are three projections module (projection optical system) PL1001, PL1003 in median plane p1003 left sides, PL1005 is in Y-direction with one Fixed interval configuration, also has three projections module (projection optical system) PL1002, PL1004 in median plane p1003 right sides, PL1006 is configured at certain intervals in Y-direction.
In the exposure device EX of this kind of poly-lens mode, made by with multiple projection module PL1001～PL1006 by scanning The Y-direction end in the region (view field PA1001～PA1006) of exposure overlaps each other, and projection whereby is intended to the entirety of pattern Picture.This kind of exposure device EX, though process photomask M on pattern Y-direction become large-sized and inevitably Y-direction width compared with When the necessity of big substrate P is produced, due to only to set up projection module and corresponding its side of illuminator 1013 in Y-direction Module, therefore have the advantages that the maximization that can be easily adaptable panel size (width of substrate P).
Additionally, exposure device EX also can be non-for poly-lens mode.For example, when the width size of substrate P is little to certain journey When spending, the picture of pattern overall with also can be projected on substrate P by exposure device EX by a projection module.Also, multiple projection modules PL1001～PL1006, also can respectively project the pattern of one device of correspondence.That is, exposure device EX also can be by multiple projections Module concurrently projects the pattern of multiple devices.
The illuminator 1013 of this embodiment possesses light supply apparatuses (diagram is omited) and lamp optical system IL.Such as Fig. 4 institutes Show, lamp optical system IL possess it is respective corresponding with multiple projection module PL1001～PL1006 and in Y direction arrangement Multiple (such as six) illumination modules IL1001～IL1006.Light supply apparatuses include lamp source or the laser two such as such as finsen lamp The solid state light emitters such as pole pipe, light emitting diode (LED).The illumination light that light supply apparatuses are projected is the bright line (g for for example projecting from lamp source Line, h lines, i lines), extreme ultraviolet light (DUV light), the ArF excimer laser (wavelength such as KrF excimer laser (wavelength 248nm) 193nm) etc..From the illumination light that light supply apparatuses are projected, Illumination Distribution is homogenized, for example, by the light conducting members such as optical fiber distribute to Multiple illumination modules IL1001～IL1006.
Additionally, light supply apparatuses are also configured in the inner side of the 1st mandrel member 1021, the 1st mandrel member 1021 is also configured in Outside.Also, light supply apparatuses also can be the device (external device (ED)) different from exposure device EX.
Multiple illumination modules IL1001～IL1006 is respectively comprising multiple optical components such as lens.In this embodiment, will Project from light supply apparatuses and illuminating bundle EL1 is referred to as by arbitrary light of multiple illumination modules IL1001～IL1006.Multiple photographs Each of bright module IL1001～IL1006 includes such as integrator optical system, bar lens, fly's-eye lens etc., with homogeneous illumination Illuminating bundle EL1 illumination regions IR of distribution.In this embodiment, multiple illumination modules IL1001～IL1006 is configured at the 1st The inner side of mandrel member 1021.Multiple illumination modules IL1001～IL1006's is each since the inner side of the 1st mandrel member 1021 passes through the 1st Mandrel member 1021 and illuminate and be held in each illumination region IR (IR1001 on the photomask M of the outer peripheral face of the 1st mandrel member 1021 ～IR1006).
In this embodiment, by each illumination module according to-Y sides (Fig. 2 papers are outside) past+Y sides (Fig. 2 papers are inside) order It is referred to as the 1st illumination module IL1001, the 2nd illumination module IL1002, the 3rd illumination module IL1003, the 4th illumination module IL1004, the 5th illumination module IL1005, the 6th illumination module IL1006.That is, in multiple illumination modules IL1001～IL1006 It is the 1st illumination module IL1001 to be configured at most-Y sides person, is configured at most+Y sides person for the 6th illumination module IL1006.Additionally, projection The number of the projection module that optical system PL possesses also can be more than one, and less than five, also can be more than seven.
Multiple illumination modules IL1001～IL1006 is in the direction (such as X-direction) intersected with the 1st central shaft AX1001 Configured separate is not into interfering each other.1st illumination module IL1001, the 3rd illumination module IL1003 and the 5th illumination module It is the position for overlapping each other that IL1005 is configured at from Y direction when watching.1st illumination module IL1001, the 3rd illumination module IL1003 and the 5th illumination module IL1005 are in Y direction configuration separated from one another.
In this embodiment, the 2nd illumination module IL1002 be configured to from Y direction watch phase to median plane p1003 with 1st illumination module IL1001 is into symmetrical.4th illumination module IL1004 and the 6th illumination module IL1006 are configured at from Y direction and see It is the position Chong Die with the 2nd illumination module IL1002 when seeing.2nd illumination module IL1002, the 4th illumination module IL1004 and 6th illumination module IL1006 is in Y direction configuration separated from one another.
Multiple illumination modules IL1001～IL1006, toward the 1st central shaft AX1001's of the 1st mandrel member 1021 relatively The 1st footpath direction D1001 intersected with median plane p1003 in radiation direction (footpath direction) or the 2nd footpath direction D1002 irradiation illumination light Beam EL1.The direction of illumination of the illuminating bundle EL1 of each illumination module, becomes according to illumination module in the order interaction that Y direction is arranged Change.For example from the 1st illumination module IL1001 illuminating bundle direction of illumination (the 1st footpath direction D1001)-X past compared with Z-direction Roll it is oblique, from the direction of illumination (the 2nd footpath direction D1002) of the illuminating bundle of the 2nd illumination module IL1002 it is past compared with-Z-direction+ X rolls oblique.Similarly, from the irradiation of the 3rd illumination module IL1003 and each illuminating bundle of the 5th illumination module IL1005 Direction, it is substantial parallel with the direction of illumination of the 1st illumination module IL1001, from the 4th illumination module IL1004 and the 6th illumination mould The direction of illumination of each the illuminating bundle of group IL1006, it is substantial parallel with the direction of illumination of the 2nd illumination module IL1002.
Fig. 5 shows the figure of the configuration of illumination region IR of this embodiment and view field PA.Additionally, Fig. 5 is illustrated from-Z Side viewing be configured at the top view (left figure in Fig. 5) of illumination region IR on the photomask M of the 1st mandrel member 1021 with from+Z Side viewing is configured at the top view (right figure in Fig. 5) of the view field PA in substrate P of the 2nd mandrel member 1022.In Fig. 5 Symbol Xs shows the moving direction (direction of rotation) of the 1st mandrel member 1021 or the 2nd mandrel member 1022.
1st to the 6th illumination module IL1001～IL1006, illuminates respectively the 1st to the 6th illumination region on photomask M IR1001～IR1006.For example, the 1st illumination module IL1001 illuminates the 1st illumination region IR1001, the 2nd illumination module IL1002 Illuminate the 2nd illumination region IR1002.
1st illumination region IR1001 of this embodiment, though bright its is elongated trapezoid area in the Y direction, according to Rear explanation projection optical system (projection module) PL constitute difference, also can be the rectangle comprising this trapezoid area Domain.3rd illumination region IR1003 and the 5th illumination region IR1005 are the region with the 1st illumination region IR1001 same shape, Separate certain intervals configuration in Y direction.Also, the 2nd illumination region IR1002 is and the 1st illumination region with respect to median plane p1003 The region of IR1001 symmetrical trapezoidal (or rectangle).4th illumination region IR1004 and the 6th illumination region IR1006 are and The region of 2 illumination region IR1002 same shapes, in Y direction certain intervals configuration is separated.
As shown in figure 5, each of the 1st to the 6th illumination region IR1001～IR1006 is configured to the week along the 1st face p1001 The triangular part in the hypotenuse portion of direction trapezoidal illumination region adjacent when watching overlaps (overlap).Thus, for example passing through volume 1 The rotation of barrel member 1021 and pass through the 1st region A1001 on the photomask M of the 1st illumination region IR1001, and by volume 1 The rotation of barrel member 1021 and pass through the 2nd region A1002 on the photomask M of the 2nd illumination region IR1002 a part overlap.
In this embodiment, photomask M have form figuratum pattern forming region A1003 and be formed without pattern The non-formation region A1004 of pattern.The non-formation region A1004 of the pattern is configured to frame-shaped and surrounds pattern forming region A1003, tool There is the characteristic of masking illuminating bundle EL1.Pattern forming region A1003 of photomask M is past with the rotation of the 1st mandrel member 1021 Direction Xs is moved, and each several part region of the Y direction in pattern forming region A1003 passes through the 1st to the 6th illumination region IR1001 Any one of～IR1006.In other words, the 1st to the 6th illumination region IR1001～IR1006 is configured to cover pattern forming region The Y direction overall with of A1003.
As shown in Fig. 2 projection optical system PL possess be arranged in multiple projection module PL1001 of Y direction～ PL1006.Multiple projection module PL1001～PL1006 each, it is each with the 1st to the 6th illumination region IR1001～IR1006 Individual to answer one by one, the picture of the local pattern of the photomask M occurred in illumination region IR that will be illuminated by corresponding illumination module is thrown Each view field PA of the shadow in substrate P.
For example, the 1st projection module PL1001 corresponds to the 1st illumination module IL1001, will be shone by the 1st illumination module IL1001 The pattern image of the photomask M in the 1st bright illumination region IR1001 (with reference to Fig. 5) is projected on the 1st view field in substrate P PA1001.3rd projection module PL1003, the 5th projection module PL1005 respectively with the 3rd illumination module IL1003, the 5th illumination module IL1005 correspondences.3rd projection module PL1003 and the 5th projection module PL1005 are configured at from Y direction when watching and do not throw with the 1st The position that shadow module PL1001 is overlapped.
Also, the 2nd projection module PL1002 corresponds to the 2nd illumination module IL1002, will be illuminated by the 2nd illumination module IL1002 The 2nd illumination region IR1002 (with reference to Fig. 5) in the pattern image of photomask M be projected on the 2nd view field in substrate P PA1002.2nd projection module PL1002 is configured at from Y direction when watching and clips median plane with respect to the 1st projection module PL1001 P1003 is into symmetrical position.
4th projection module PL1004, the 6th projection module PL1006 illuminate mould with the 4th illumination module IL1004, the 6th respectively Group IL1006 correspondence configure, the 4th projection module PL1004 and the 6th projection module PL1006 be configured at from Y direction watch when not The position Chong Die with the 2nd projection module PL1002.
Additionally, in this embodiment, covering light is reached from each illumination module IL1001 of illuminator 1013～IL1006 The light of each illumination region IR1001～IR1006 on film M is referred to as illuminating bundle EL1, will by with each illumination region IR1001～ The local pattern corresponding intensity distributions adjustment of the photomask M occurred in IR1006 and inject each projection module PL1001～ PL1006 simultaneously reaches the light of each view field PA1001～PA1006 and is referred to as imaging beam EL2.
As shown in the right figure in Fig. 5, the pattern image in the 1st illumination region IR1001 is projected in the 1st view field PA1001, the pattern image in the 3rd illumination region IR1003 is projected in the 3rd view field PA1003, the 5th illumination region IR1005 In pattern image be projected in the 5th view field PA1005.In this embodiment, the 1st view field PA1001, the 3rd projected area Domain PA1003 and the 5th view field PA1005 are configured to be arranged in string in Y direction.
Also, the pattern image in the 2nd illumination region IR1002 is projected in the 2nd view field PA1002.In this embodiment, 2nd view field PA1002 is configured to paired with the 1st view field PA1001 to median plane p1003 from Y direction viewing phase Claim.Also, the pattern image in the 4th illumination region IR1004 is projected in the 4th view field PA1004, the 6th illumination region IR1006 In pattern image be projected in the 6th view field PA1006.In this embodiment, the 2nd view field PA1002, the 4th projected area Domain PA1004 and the 6th view field PA1006 are configured to be arranged in string in Y direction.
Each of 1st to the 6th view field PA1001～PA1006 is configured to along during the circumferential direction viewing of the 2nd face p1002 In the direction parallel with the 2nd central shaft AX1002, adjacent view field is Chong Die with end (trapezoidal triangular portions).Therefore, example Such as the 3rd region A1005 in substrate P of the 1st view field PA1001 is passed through by the rotation of the 2nd mandrel member 1022, with The 4th region A1006 in substrate P of the 2nd view field PA1002 is passed through by the rotation of the 2nd mandrel member 1022 a part of Overlap.
1st view field PA1001 and the 2nd view field PA1002, respective shape etc. are set in the 3rd region The light exposure in A1005 Chong Die with the 4th region A1006 region is substantially the same with the light exposure in nonoverlapping region.
In this embodiment, in the region (hereinafter referred to as exposure area A1007) of the exposure object of substrate P is such as Fig. 5 Shown in right figure, move toward direction Xs with the rotation of the 2nd mandrel member 1022, each several part of Y direction in the A1007 of exposure area Region passes through any one of the 1st to the 6th view field PA1001～PA1006.In other words, the 1st to the 6th view field PA1001 ～PA1006 is configured to cover the Y direction overall with of exposure area A1007.
Additionally, the direction of illumination of the illuminating bundle EL1 of relative 1st projection module PL1001, such as also can be to shine by the 1st The direct of travel of the chief ray of any position in the IR1001 of area pellucida domain, also can be by the 1st illumination region IR1001 center The direct of travel of chief ray.The direction of illumination of the illuminating bundle EL1 with respect to the 2nd to the 6th projection module PL1002～PL1006 is also It is identical.
Additionally, the 1st to the 6th view field PA1001～PA1006 also can be configured by its substrate P of any one Region does not overlap each other in end.For example, by the 3rd region A1005 of the 1st view field PA1001 also can not with by the 2nd The part overlap of the 4th region A1006 of view field PA1002.That is, even poly-lens mode, can not also carry out each throwing The continuous exposure of shadow module.Under this situation, the 3rd region A1005 also can be projected correspondence the 1st device pattern region, the 4th Region A1006 also can be the region of the pattern for being projected the 2nd device of correspondence.The 2nd above-mentioned device also can be of the same race with the 1st device Device, in the 4th region A1006 projection with the 3rd region A1005 identical patterns.The 2nd above-mentioned device also can be and the 1st device The different types of device of part, in the 4th region A1006 the patterns different from the 3rd region A1005 are projected.
Secondly, the detailed composition of projection optical system PL of this embodiment is illustrated with reference to Fig. 6.Additionally, this embodiment In, each of the 2nd to the 6th projection module PL1002～PL1006 is constituted with the 1st projection module PL1001 identicals.Therefore, Illustrate the composition of the 1st projection module PL1001 representing projection optical system PL.
The 1st projection module PL1001 shown in Fig. 6 possesses the figure of the photomask M by the 1st illumination region IR1001 is configured at The 1st optical system 1041 that case picture images in intermediate image plane p1007, the intermediary image for forming the 1st optical system 1041 are at least A part of reimaging in the 1st view field PA1001 of substrate P the 2nd optical system 1042 and be configured at and to form intermediary image Intermediate image plane p1007 the 1st field stop 1043.
Also, the 1st projection module PL1001 possesses to finely tune the pattern image of the photomask being formed in substrate P (hereinafter referred to as For projection image) focus state focusing amendment optical component 1044, repair in image planes move the micro- traversing picture of projection image Positive optical component 1045, the multiplying power amendment optical component 1047 of the multiplying power of micro- amendment projection image and to make in image planes The rotation correction mechanism 1046 of the micro- rotation of projection image.
Focusing amendment optical component 1044 is configured at the imaging beam EL2 projected from the 1st illumination region IR1001 and is injected Position, as move amendment optical component 1045 be configured at from focus on amendment optical component 1044 project imaging beam EL2 penetrated The position for entering.Multiplying power amendment optical component 1047 is configured at the imaging beam EL2 projected from the 2nd optical system 1042 and is injected Position.
Imaging beam EL2 from the pattern of photomask M is projected from the 1st illumination region IR1001 along normal direction, is passed through Focus on amendment optical component 1044 to inject as moving amendment optical component 1045.Transmitted through the imaging as moving amendment optical component 1045 Light beam EL2 is that the 1st reflecting surface (plane mirror) p1004 of the 1st deflection component 1050 reflects in the important document of the 1st optical system 1041, Reflected in the 1st concave mirror 1052 by the 1st lens group 1051, once again component is partial to the 1st by the 1st lens group 1051 1050 the 2nd reflecting surface (plane mirror) p1005 reflections, inject the 1st field stop 1043.
By the imaging beam EL2 of the 1st field stop 1043 the important document of the 2nd optical system 1042 be the 2nd deflection component 1057 the 3rd reflecting surface (plane mirror) p1008 reflections, are reflected, once again by the 2nd lens group 1058 in the 2nd concave mirror 1059 By the 2nd lens group 1058 in the 4th reflecting surface (plane mirror) the p1009 reflections of the 2nd deflection component 1057, multiplying power amendment is injected With optical component 1047.
From the imaging beam EL2 that multiplying power amendment is projected with optical component 1047, the 1st view field in substrate P is injected PA1001, the pattern image come across in the 1st illumination region IR1001 is projected on the 1st view field PA1001 with equimultiple (× 1).
It is anti-that 1st optical system 1041 will e.g. wear the telecentricity after gloomy (Dyson) system variant with the 2nd optical system 1042 Dioptric system.In this embodiment, the optical axis (hereinafter referred to as the 1st optical axis AX1003) of the 1st optical system 1041 and center Face p1003 is substantially orthogonal.It is recessed that 1st optical system 1041 possesses the 1st deflection component 1050, the 1st lens group 1051 and the 1st Face mirror 1052.From 1st reflectings surface of the imaging beam EL2 in the 1st deflection component 1050 as moving the amendment injection of optical component 1045 P1004 reflects and advances toward the side (- X sides) of the 1st optical axis AX1003, is injected by the 1st lens group 1051 and is configured at pupil face 1st concave mirror 1052.In the imaging beam EL2 of the reflection of the 1st concave mirror 1052, toward the opposite side (+X sides) of the 1st optical axis AX1003 Advance and pass through the 1st lens group 1051, in the 2nd reflecting surface p1005 reflections of the 1st deflection component 1050 the 1st visual field light is injected Door screen 1043.
1st deflection component 1050 extends the triangular prism of Y direction.In this embodiment, the 1st reflecting surface p1004 with Each of 2nd reflecting surface p1005 is comprising the minute surface (surface of reflectance coating) for being formed at triangular prism surface.By the 1st lighting area The chief ray EL3 of the imaging beam EL2 at domain IR1001 centers, along relative median plane p1003 in the 1st tilted footpath direction of XZ faces D1001 advances and injects the 1st projection module PL1001.
1st deflection component 1050 is partial to into imaging beam EL2, and from the 1st illumination region IR1001 the 1st reflecting surface is reached The chief ray EL3 of the p1004 and chief ray EL3 from the 2nd reflecting surface p1005 arrival intermediate image planes p1007 is (with median plane p1003 It is parallel) become non-parallel in XY faces.
In order to form the light path as more than, in this embodiment, the 1st reflecting surface p1004 comprising the 1st deflection component 1050 The crest line intersected with the 2nd reflecting surface p1005 and the 1st optical axis AX1003, are set to p1006, with respect to this by the face parallel with XY faces Face p1006, the 1st reflecting surface p1004 and the 2nd reflecting surface p1005 is with asymmetrical angle configurations.
When by the 1st reflecting surface p1004 relative to the angle of face p1006 be set to θ 1001, by the 2nd reflecting surface p1005 relative to When the angle of face p1006 is set to θ 1002, in this embodiment, angle (θ 1001+ θ 1002) is set smaller than 90 °, angle, θ 1001 are set smaller than 45 °, and angle, θ 1002 is set as substantial 45 °.
By the way that the chief ray EL3 for reflecting in the 1st reflecting surface p1004 and injecting the 1st lens group 1051 is set as and optical axis AX1003 is parallel, and chief ray EL3 can pass through the center that is, pupil face of the 1st concave mirror 1052 and the intersection point of optical axis AX1003, energy Guarantee the image formation state of telecentricity.Therefore, in Fig. 6, when the key light by the 1st reflecting surface p1004 is reached from the 1st illumination region IR1001 When line EL3 (the 1st footpath direction D1001) is set to θ d relative to the inclination angle of median plane p1003, the angle, θ of the 1st reflecting surface p1004 As long as 1001 are set to and meet following formula (1).
θ 1001=45 °-(θ d/2) ... (1)
In this embodiment, each for belonging to multiple lens of the 1st lens group 1051 is into axle pair around the 1st optical axis AX1003 The shape of title.It is saturating the 1st to be injected in the imaging beam EL2 of the 1st reflecting surface p1004 reflections from the side (+Z sides) of opposite face p1006 Lens group 1051.1st concave mirror 1052 be configured at the position in the pupil face of the 1st optical system 1041 or its near.
By the chief ray EL3 of the imaging beam EL2 of the 1st lens group 1051, the 1st optical axis AX1003 and the 1st concave surface are injected The intersection point of mirror 1052.The 1st concave mirror 1052 reflection imaging beam EL2, with inject toward the 1st concave mirror 1052 before compare, Along opposite face p1006 it is that symmetrical light path is advanced in 1st lens group 1051.In the imaging beam of the reflection of the 1st concave mirror 1052 EL2, projects from the opposing party side (- Z sides) of the 1st lens group 1051, anti-in the 2nd reflecting surface p1005 of the 1st deflection component 1050 Penetrate, advance along the chief ray EL3 parallel with median plane p1003.
1st field stop 1043 has the opening of the shape of the 1st view field PA1001 of regulation.That is, the 1st field stop 1043 opening shape specifies the shape of the 1st view field PA1001.Therefore, as shown in fig. 6, when can be in intermediate image plane p1007 When configuring 1 field stop 1043, can make the opening shape of this 1st field stop 1043 becomes as shown in the right figure of previous Fig. 5 It is trapezoidal, under this situation, the respective shape of the 1st to the 6th illumination region IR1006 can not be with the 1st to the 6th view field PA1001 The respective shapes of～PA1006 (trapezoidal) is similar, can be comprising the trapezoidal of each view field (opening of the 1st field stop 1043) The rectangle of shape.
2nd optical system 1042 is identical composition with the 1st optical system 1041, is arranged to relative comprising the 1st field stop 1043 intermediate image plane p1007 is symmetrical with the 1st 1041 one-tenth of optical system.The optical axis the (the hereinafter referred to as the 2nd of the 2nd optical system 1042 Optical axis AX1004) it is substantially orthogonal with median plane p1003.2nd optical system 1042 possesses the 2nd deflection component 1057, the 2nd lens The 1058 and the 2nd concave mirror 1059 of group.Project from the 1st optical system 1041 and pass through the imaging beam of the 1st field stop 1043 EL2 injects the 2nd concave mirror 1059 in the 3rd reflecting surface p1008 reflections of the 2nd deflection component 1057 by the 2nd lens group 1058. In the imaging beam EL2 of the reflection of the 2nd concave mirror 1059, once again by the 2nd lens group 1058, the 4th of the 2nd deflection component 1057 the Reflecting surface p1009 reflects and injects multiplying power amendment optical component 1047.
2nd deflection component 1057, the 2nd lens group 1058, the 2nd concave mirror 1059 of the 2nd optical system 1042 is respectively with the 1st 1st deflection component 1050 of optical system 1041, the 1st lens group 1051, the 1st concave mirror 1052 are identical.2nd deflection component 1057 The 3rd reflecting surface p1008 and the angle, θs 1003 that constituted of the 2nd optical axis AX1004, the 2nd reflecting surface with the 1st deflection component 1050 The angle, θ 1002 that p1005 is constituted with the 1st optical axis AX1003 is substantially the same.Also, the 4th reflecting surface of the 2nd deflection component 1057 The angle, θ 1004 that p1009 and the 2nd optical axis AX1004 are constituted, the 1st reflecting surface p1004 and the 1st with the 1st deflection component 1050 The angle, θ 1001 that optical axis AX1003 is constituted is substantially the same.Each for belonging to multiple lens of the 2nd lens group 1058 is around 2 optical axis AX1004 are axisymmetric shape.
2nd concave mirror 1059 be configured at the position in the pupil face of the 2nd optical system 1042 or its near.
By the imaging beam EL2 of the 1st field stop 1043, toward along the direction of the chief ray parallel with median plane p1003 Advance and inject the 3rd reflecting surface (plane) p1008.2nd optical axises of the 3rd reflecting surface p1008 with respect to the 2nd optical system 1042 The tilt angle theta 1003 of AX1004 (or face p1006 or intermediate image plane p1007) is 45 ° in XZ faces, the imaging reflected herein Light beam EL2, injects the area of visual field of the top half of the 2nd lens group 1058.Inject the imaging beam of the 2nd lens group 1058 The chief ray EL3 of EL2, becomes parallel with the 2nd optical axis AX1004, injects the friendship of the 2nd optical axis AX1004 and the 2nd concave mirror 1059 Point.
The 2nd concave mirror 1059 reflection imaging beam EL2, with inject toward the 2nd concave mirror 1059 before compare, with respect to the 2nd Optical axis AX1004 symmetrically advances.In the imaging beam EL2 of the reflection of the 2nd concave mirror 1059, once again by the 2nd lens group 1058 The area of visual field of the latter half, reflects in the 4th reflecting surface p1009 of the 2nd deflection component 1057, past to intersect with median plane p1003 Direction advance.
Project from the 2nd optical system 1042 and imaging beam EL2 toward the 1st view field PA1001 chief ray EL3 Direct of travel, is set as relative intermediate image plane p1007 comprising the 1st field stop 1043 and penetrates from the 1st illumination region IR1001 Enter the direct of travel of chief ray EL3 of the imaging beam EL2 of the 1st optical system 1041 into symmetrical.That is, watch in XZ faces When, the 2nd is partial to angle, θs 1004 of the 4th reflecting surface p1009 of component 1057 with respect to the 2nd optical axis AX1004, with previous formula (1) Similarly it is set to and meets following formula (2).
θ 1004=45 °-(θ d/2) ... (2)
Whereby, the chief ray EL3 of the imaging beam EL2 for projecting from the 2nd optical system 1042, projects toward the 1st in substrate P The normal direction (toward direction of the rotation centerline AX1002 in Fig. 2) of region PA1001 (cylinder planar) is advanced.
In this embodiment, amendment optical component 1044 is focused on, optical component 1045 is corrected as shifting, correction mechanism is rotated 1046 and multiplying power amendment optical component 1047, the imaging characteristic for constituting the imaging characteristic that adjustment the 1st projects module PL1001 is adjusted Whole mechanism.By controlling imaging characteristic adjustment mechanism, and can be with regard to the projection of each projection image of the projection module adjustment in substrate P Condition.The projection condition of indication herein, go forward side by side position or rotation position, multiplying power, the focusing of the view field being included in substrate P In the project of more than 1.Projection condition, can determine with regard to each position of the view field of opposed substrate P during synchronous scanning It is fixed.By adjusting the projection condition of projection image, and the crooked of projection image when comparing with the pattern of photomask M can be corrected.Additionally, The composition of imaging characteristic adjustment mechanism can be changed suitably, can omit its at least a portion.
It is, for example, to fold on the prism of two panels wedge shape reverse (in Fig. 6 in X-direction be reverse) to focus on amendment optical component 1044 The generally transparent parallel flat of synthesis.By make this pair of prisms not change the interval between face opposite to one another and in bevel direction Slide, the thickness as parallel flat can be changed.The actual effect optical path length of the 1st optical system 1041 is finely tuned whereby, and is finely tuned It is formed at the focus state of the pattern image of intermediate image plane p1007 and view field PA1001.
As move amendment optical component 1045 with can be in figure 6 the tilted Plane-parallel Transparent Materiel glass in XZ faces with can incline Plane-parallel Transparent Materiel glass in orthogonal to that direction is constituted.By each tilt quantity for adjusting the two panels parallel plate glass, And can make to be formed at the pattern image of intermediate image plane p1007 and view field PA1001 in the displacement a little of X-direction or Y-direction.
Multiplying power amendment optical component 1047, is configured to for example by concavees lens, convex lenss, three of concavees lens with set Every arranged coaxial, in front and back concavees lens are to fix so as to convex lenss be displaced into optical axis (chief ray) direction.Whereby, it is formed at The pattern image of view field PA1001, can maintain telecentricity image formation state, while etc. just expand or shrink small quantity.This Outward, constitute the multiplying power amendment optical axis of three lens groups of optical component 1047, XZ faces it is tilted into by master herein Light EL3 is parallel.
Rotation correction mechanism 1046, for example by actuator (diagram omit) make the 1st deflection component 1050 around with the 1st optical axis AX1003 parallel axle rotates a little.The picture for being formed at intermediate image plane p1007 can be made at this by this rotation correction mechanism 1046 Rotate a little in intermediate image plane p1007.
As described above, the imaging beam EL2 for projecting from the 1st projection module PL1001, in being configured at outside the 2nd mandrel member 1022 1st view field PA1001 of substrate P of side face forms the picture of the pattern for coming across the 1st illumination region IR1001.This enforcement shape It is past from the 1st illumination region IR1001 by the chief ray EL3 of the imaging beam EL2 at the 1st illumination region IR1001 center in state Normal direction is projected, and the 1st view field PA1001 is injected from normal direction.In this way, the 1st photograph of cylinder planar is come across The pattern image of the photomask M of area pellucida domain IR1001, is projected the 1st view field PA1001 in substrate P of cylinder planar. Also, coming across the 2nd to the 6th illumination region IR1002～respective pattern images of IR1006, also similarly it is projected in cylinder planar Substrate P on the 2nd to the 6th view field PA1002～PA1006 each.
In this embodiment, as shown in Fig. 2, Fig. 5, the illumination of odd number illumination region IR1001, IR1003, IR1005 and even number Region IR1002, IR1004, IR1006, it is symmetrical distance to be configured at relative median plane p1003, and odd number view field PA1001, PA1003, PA1005 and even number view field PA1002, PA1004, PA1006, are also configured at relative median plane P1003 is symmetrical distance.Accordingly, it is capable to each whole of six projection modules is made into identical composition, can common projected light The part of system, simplifies number of assembling steps, checking step, and imaging characteristic (aberration etc.) remittance of each projection module can be made into into one Sample.This point, particularly in the situation for carrying out continuous exposure between the view field of each projection module by poly-lens mode, shape Position or the region that can be not dependent in panel into the quality (transfer informativeness) of the panel pattern in substrate P and remain Necessarily, it is favourable.
Also, general exposure device, if view field bends to cylinder planar, such as in imaging beam from non-perpendicular side When view field is injected etc., make to defocus change sometimes because of the difference of view field position big.As a result, producing exposure sometimes Light is bad, produces bad device.
In this embodiment, the 1st deflection component 1050 of projection optical system PL (the such as the 1st projection module PL1001) (the 1st reflecting surface p1004) and the 2nd deflection component 1057 (the 4th reflecting surface p1009), chief ray EL3 is partial to into from the 1st illumination Region IR1001 is projeced into the 1st view field PA1001 toward the chief ray EL3 that normal direction is projected from normal direction.Therefore, Substrate treating apparatus 1011, can reduce the focusing error of the projection image in view field PA1001, be particularly shown in Fig. 5 The optimum focusing face of the projection image in each view field PA1001～PA1006 is overall from each projection module PL1001～PL1006 The width of depth of focus (Depth of Focus) significantly offset, suppress the generation of ill-exposed grade.As a result, can suppression device system Make the generation of the bad device of system 1001.
In this embodiment, projection optical system PL is due to comprising the 1st visual field light for being configured at the position to form intermediary image Door screen 1043, therefore can accurately manage shape of projection image etc..Therefore, substrate treating apparatus 1011, can reduce the such as the 1st to The aliasing error of the 6th view field PA1001～PA1006, suppresses the generation of ill-exposed grade.Also, the 1st deflection component 1050 2nd reflecting surface p1005 will be partial to into orthogonal with field stop 1043 from the chief ray EL3 of the 1st illumination region IR1001.Cause This, substrate treating apparatus 1011 can more precisely manage shape of projection image etc..
Also, in this embodiment, the 1st to the 6th projects each of module PL1001～PL1006, is by the figure of photomask M Case picture is projected as erect image.Therefore, the pattern of photomask M is divided into into the 1st to the 6th projection module in substrate treating apparatus 1011 Region (such as the 3rd region A1005 and the 4th when PL1001～PL1006 is to project, due to the projection image for being about to be projected can be entered Region A1006) a part of continuous exposure for overlapping, therefore the design of photomask M becomes easy.
In this embodiment, substrate treating apparatus 1011, due to be by the face p1002 of 1,009 1 edge of carrying device the 2nd with Certain speed continuously transports substrate P, while substrate P is exposed by exposure device EX, therefore the productivity of exposure-processed can be improved. As a result, device inspection apparatus 1001 can manufacture device with good efficiencies.
Additionally, in this embodiment, though the 1st reflecting surface p1004 and the 2nd reflecting surface p1005 are configured at identical deflection structure Part (the 1st deflection component 1050) surface, but also it is configured in the surface of different component.Also, the reflections of the 1st reflecting surface p1004 and the 2nd One or both of face p1005 is also configured in the inner face of the 1st deflection component 1050, and has for example anti-by total reflection condition Penetrate the characteristic of light.
Furthermore, described above also to can be suitably used for the 3rd anti-for the deformation related to the 1st reflecting surface p1004, the 2nd reflecting surface p1005 Penetrate face p1008 and the 4th reflecting surface p1009 one or both.For example in the situation of the radius r1002 changes by the 2nd face p1002 Deng, the 2nd deflection component 1057 the 4th reflecting surface p1009, be set to imaging beam EL2 to the 1st view field angle, θ 1004 PA1001 is injected from normal direction, and configuration is set to, in the 1st view field PA1001 and the 2nd view field PA1002 Arc-shaped girth between heart point, central point and the photograph with corresponding illumination region IR1001 on photomask M (radius r1001) Arc-shaped girth between the central point of area pellucida domain IR1002 is consistent.
[the 2nd embodiment]
Secondly, the 2nd embodiment is illustrated.In this embodiment, constituting with above-mentioned embodiment identical sometimes pair will Part gives and above-mentioned embodiment identical symbol, simplifies or the description thereof will be omitted.
Fig. 7 shows the pie graph of substrate treating apparatus 1011 of this embodiment.The carrying device 1009 of this embodiment, tool Standby 1st conveyance cylinder 1030, the conveyance conveyance cylinder of cylinder the 1071, the 5th of the 1st guide member (air swingle etc.) the 1031, the 4th 1072nd, the 6th conveyance cylinder 1073, the conveyance cylinder 1034 of the 2nd guide member (air swingle etc.) the 1033 and the 2nd.
From substrate P that transport path upstream moves toward the 1st conveyance cylinder 1030, via the 1st conveyance cylinder 1030 toward the 1st Guide member 1031 is transported.Via substrate P of the 1st guide member 1031, via the 4th conveyance cylinder 1071 toward the 5th conveyance cylinder 1072 conveyances.The 5th conveyance central shaft of cylinder 1072 is configured on median plane p1003.Via the substrate of the 5th conveyance cylinder 1072 P, transports via the 6th conveyance cylinder 1073 toward the 2nd guide member 1033.
The relative median plane p1003 of 6th conveyance cylinder 1073 is configured to symmetrical with the 4th conveyance cylinder 1071.Via the 2nd guiding Substrate P of component 1033 is transported via the 2nd conveyance cylinder 1034 toward the downstream of transport path.1st guide member 1031 and the 2nd is led Primer component 1033 in the same manner as the 1st guide member 1031 and the 2nd guide member 1033 shown in previous Fig. 2, in transport path Accommodation is in the tension force of substrate P.
The 1st view field PA1001 in Fig. 7, is set in the quilt between the 4th conveyance conveyance cylinder 1072 of cylinder 1071 and the 5th In substrate P of straight line conveyance.Between the 4th conveyance conveyance cylinder 1072 of cylinder 1071 and the 5th, substrate P is supported in conveyance Direction is endowed set tension force, and substrate P is transferred along the 2nd plane face p1002.
It is non-perpendicular that 1st view field PA1001 (the 2nd face p1002) is inclined to relative median plane p1003.1st projected area The normal direction (hereinafter referred to as the 1st normal direction D1003) of domain PA1001, be configured to the relative face orthogonal with median plane p1003, Such as Fig. 6 also have display intermediate image plane p1007 and with the 1st footpath direction D1001 into symmetrical.Project from the 1st projection module PL1001 Imaging beam EL2 chief ray EL3, the 1st view field PA1001 is injected from the 1st normal direction D1003.In other words, the 4th Conveyance cylinder 1071 is configured to the 5th conveyance cylinder 1072, is set up in the 4th conveyance conveyance cylinder 1072 of cylinder 1071 and the 5th Substrate P the 1st normal direction D1003, relative intermediate image plane p1007 orthogonal with median plane p1003 and with the 1st footpath direction D1001 is into symmetrical.
2nd view field PA1002, is set in and is removed by straight line between the 5th conveyance conveyance cylinder 1073 of cylinder 1072 and the 6th In substrate P sent.Substrate P is supported to be endowed certain between the 5th conveyance conveyance cylinder 1073 of cylinder 1072 and the 6th Power, substrate P is transferred along the 2nd plane face p1002.
It is non-perpendicular that 2nd view field PA1002 is inclined to relative median plane p1003.The method of the 2nd view field PA1002 Line direction (hereinafter referred to as the 2nd normal direction D1004), is configured to respect to intermediate image plane p1007 orthogonal with median plane p1003 With the 2nd footpath direction D1002 into symmetrical.The chief ray EL3 of the imaging beam EL2 projected from the 2nd projection module PL1002, to the 2nd View field PA1002 is injected from the 2nd normal direction D1004.In other words, the 5th conveyance conveyance cylinder 1073 of cylinder 1072 and the 6th It is configured to, is set up in the 2nd normal direction D1004 of substrate P of the 5th conveyance conveyance cylinder 1073 of cylinder 1072 and the 6th, relatively Intermediate image plane p1007 orthogonal with median plane p1003 and with the 2nd footpath direction D1002 into symmetrical.
The substrate treating apparatus 1011 of this embodiment by the 4th conveyance cylinder the 1071, the 5th transport cylinder 1072 and 6th conveyance cylinder 1073 makes the 2nd face p1002 of the cylinder planar shown in previous Fig. 2 be close to approximate plane, each view field The transfer informativeness of the pattern image being projected in PA1001～PA1006 in substrate P, more carries from from the viewpoint of depth of focus (DOF) Rise.Also, as shown in previous Fig. 2, and in order to support and transport the feelings of the 2nd mandrel member 1022 of substrate P and actionradius r1002 Shape is compared, and the Z-direction of the entirety of carrying device 1009 can highly be suppressed into lower, and device can be made integrally small-sized.
Also, during the device of Fig. 7 is constituted, the 4th conveyance conveyance conveyance cylinder of cylinder 1072 and the 6th of cylinder the 1071, the 5th 1073 is a part for carrying device 1009, and as supporting member (the exposure device EX sides of substrate P for supporting exposure object Substrate microscope carrier).Additionally, also can in the 4th conveyance cylinder 1071 and the 5th conveyance cylinder 1072 between, the 5th conveyance cylinder 1072 with Between 6th conveyance cylinder 1073, the Bei Nuyi by the FDB rear side of flat bearing substrate P in a non contact fashion is set The backing plate of mode, the flatness of the regional area of substrate P that Shi Ge view fields PA1001～PA1006 is located at more is improved.
Furthermore, the conveyance cylinder at least one of the carrying device 1009 shown in Fig. 7 also can be solid to projection optical system PL It is fixed, also can be movable.For example, the 5th conveyance cylinder 1072 also can be comprising parallel to the direction of going forward side by side of X-direction, parallel to Y-axis Direction go forward side by side direction and parallel to three of direction of going forward side by side of Z-direction go forward side by side direction with around the axle parallel to X-direction Direction of rotation, around the direction of rotation of the axle parallel to Y direction and around the direction of rotation of the axle parallel to Z-direction At least one party of (six degree of freedom) moves a little to (single-degree-of-freedom) in six directions of three direction of rotation.Or, also can pass through The Z-direction of one or both that cylinder 1071 and the 6th transports cylinder 1073 is transported with respect to the 5th conveyance cylinder 1072 adjustment the 4th Relative position finely tuning the 1st normal direction D1003 of the 1st view field PA1001 or the 2nd of the 2nd view field PA1002 the The angle that normal direction D1004 is constituted with the surface of substrate P of flattened supporting.Thus, by making selected cylinder Move a little, and can accurately make substrate P of the graphic pattern projection image planes in relatively each view field PA1001～PA1006 Surface posture is consistent.
[the 3rd embodiment]
Secondly, the 3rd embodiment is illustrated.In this embodiment, constitute with above-mentioned each embodiment identical sometimes pair Important document gives and above-mentioned each embodiment identical symbol, simplifies or the description thereof will be omitted.
Fig. 8 shows the composition of the exposure device EX as substrate treating apparatus 1011 of this embodiment, it is basic constitute with Previous Fig. 7 is identical.But, discrepancy is compared with the composition of Fig. 7, located at each projection module of projection optical system PL Angle, θs 1004 of the 4th reflecting surface p1009 of the 2nd deflection component 1057 in PL1001～PL1006 with respect to optical axis AX1004 sets Substrate P for be set to 45 °, transporting by carrying device 1009 the position of each view field PA1001～PA1006 be supported in Median plane p1003 orthogonal plane (parallel with the XY faces in Fig. 8).
In the composition of Fig. 8, substrate P is (empty via the 1st conveyance cylinder 1030, the 1st guide member 1031 from transport path upstream Cyclone bull stick etc.), the 4th conveyance cylinder 1071 and toward the 8th conveyance cylinder 1076 transport.Via substrate P of the 8th conveyance cylinder 1076 Transport toward the downstream of transport path with the 2nd conveyance cylinder 1034 via the 2nd guide member 1033 (air swingle etc.).
As shown in figure 8, between the 4th conveyance conveyance cylinder 1076 of cylinder 1071 and the 8th, substrate P is with set tension force quilt Supporting, transport into it is parallel with XY faces.Under this situation, the 2nd face p1002 of support base P is plane, is matched somebody with somebody in the 2nd face p1002 Zhi Ge view fields PA1001～PA1006.
Also, in the 2nd optical system 1042 for constituting each projection module PL1001～PL1006, the 2nd deflection component 1057 The 3rd reflecting surface p1008 and the 4th reflecting surface p1009 be configured to from the 2nd optical system 1042 project to the imaging beam of substrate P The chief ray EL3 of EL2 is substantially parallel to median plane p1003.That is, projection optical system PL (projection module PL1001～ PL1006 the 1st deflection deflection component 1057 of component 1050 and the 2nd), by imaging optical path each illumination from cylinder planar is partial to into Region IR1001～IR1006 projects each chief ray EL3 in normal direction, injects from normal direction and is set in common plane Each view field PA1001～PA1006.
In this embodiment, in the XZ faces watched from the direction of the 1st central shaft AX1001 parallel to photomask M, throw The center of the central point in shadow zone domain PA1001 (and PA1003, PA1005) to view field PA1002 (and PA1004, PA1006) Point along the 2nd face p1002 (surface of substrate P) apart from DFx, be set as with illumination region IR1001 (and IR1003, The central point of central point IR1005) to illumination region IR1002 (and IR1004, IR1006) along the 1st face p1001 (radiuses The barrel surface of r1001) distance (chord length or girth) DMx be substantially equal.
Herein, with reference to the mutual position relationship of Fig. 9 explanations illumination region IR for schematically illustrating and the mutual positions of view field PA Put relation.Additionally, in Fig. 9, symbol α shows the angle (angular aperture) that the 1st footpath direction D1001 and the 2nd footpath direction D1002 are constituted [°], symbol r shows the radius [mm] of the 1st face p1001.
In Fig. 9, the girth of the central point of the central point to illumination region IR1002 of illumination region IR1001 in XZ faces DMx [mm], is represented using angle [alpha] and radius r with following formula (3).
DMx=π α r/180... (3)
Also, air line distance Ds of the central point of the central point of illumination region IR1001 to illumination region IR1002 is with following formula (4) represent.
Ds=2rsin (π α/360) ... (4)
For example, it is 30 ° in angle [alpha], when radius r is 180mm, girth DMx is for about 94.248mm, is for about apart from Ds 93.175mm.That is, if assuming the X of the X-coordinate of the central point of illumination region IR1001 and the central point of view field PA1001 Coordinate is consistent, the X-coordinate of the central point of illumination region IR1002 is consistent with the X-coordinate of the central point of view field PA1002, then Thrown by view field PA1001, PA1002 respectively will separate at 2 points of girth DMx in circumferential direction in the pattern of photomask M Shadow when substrate P, this 2 points can in substrate P in X-direction being exposed apart from Ds (Ds ＜ DMx).That is, if according to previous Numerical example, it is meant the pattern being exposed in substrate P by view field PA1001, PA1003, PA1005 of odd number and is passed through View field PA1002, PA1004, PA1006 of even number are exposed to the pattern in substrate P, and in X-direction maximum can be offset 1.073mm degree.
Therefore, in this embodiment, from the condition shown in previous Fig. 6 the particular optical structure in projection optical system PL is changed The configuration condition of part, with the central point of the view field PA1001 in flattened substrate P and view field PA1002 Air line distance DFx between heart point is substantially equal with girth DMx.
Specifically, by the 2nd deflection component 1057 the 4th reflecting surface p1009 from shown in previous Fig. 6 position toward and optical axis AX1004 (X-axis) parallel direction is a little to stagger, and it is consistent with girth DMx that its result is arranged to air line distance DFx.According to previously act The numerical example for going out, girth DMx with apart from Ds difference be 1.073mm, can easily by odd number project module PL1001, The position of the 4th reflecting surface p1009 of the 2nd deflection component 1057 contained by each of PL1003, PL1005 is past along optical axis AX1004 The side of 2nd concave mirror 1059 moves in parallel 1mm degree to configure.
However, configuring if so, sometimes must with regard to the composition (configuration of the 4th reflecting surface p1009) of the 2nd deflection component 1057 There must be the parts different from projection module PL1002, PL1004, PL1006 of even number.
Therefore, as long as the 4th of the 2nd deflection component 1057 for being equipped on all projection module PL1001～PL1006 the is reflected The position of face p1009 moves in parallel the 0.5mm degree of the half of above-mentioned 1mm along optical axis AX1004 toward the side of the 2nd concave mirror 1059, i.e., The common of part can be sought.
Figure 10 shows the girth DMx and odd number and even number of the pattern plane (the 1st face p1001) along photomask M that Fig. 9 is illustrated The difference of air line distance Ds in the illumination region in the heart chart related to angle [alpha], the longitudinal axis represents difference, and transverse axis represents aperture Angle α.Also, a plurality of curve in the chart of Figure 10, represents the half of the pattern plane (the 1st face p1001 of cylinder planar) of photomask M Footpath r changes into the situation of 180mm, 210mm, 240mm, 300mm.As the numerical example explanation previously enumerated, angle [alpha] is 30 °, radius r for 180mm situation, girth DMx is for about 94.248mm, is for about 93.175mm apart from Ds, therefore the chart of Figure 10 The longitudinal axis shown in difference be for about 1.073mm.
As shown in Figure 10, in the girth DMx in the pattern plane (the 1st face p1001) of photomask M and illumination region IR1001 The difference amount of heart point to air line distance Ds of the central point of illumination region IR1002, due to can according to the 1st face p1001 radius r with Angle [alpha] and change, as long as therefore according to the chart relation of Figure 10 setting the 2nd be partial to component 1057 the 4th reflecting surface p1009 position Put.
Additionally, in order that air line distance DMx in substrate P is substantially equal with the girth DMx on photomask M, due to i.e. Make to be configured to the X-direction position of the 4th reflecting surface p1009 of the 2nd deflection component 1057 most preferably, be finally still difficult in ultra micro rice etc. Level is lower consistent, therefore several μm～less than tens of μm of remaining difference, can move amendment optics by using the picture shown in previous Fig. 6 Component 1045 can make air line distance DMx consistent with girth DMx making projection image in X-direction displacement a little with sufficient precision.
As described above, correct optical component 1045 to make projection image in X-direction displacement a little using as shifting, by each view field PA1001～PA1006 be adjusted to the spacing distance (girth) of two object points in the scan exposure direction in photomask pattern face with The spacing distance (girth) in the scan exposure direction of each picture point when two object point is projected in substrate P is under super micron grade Equal method, also similarly previously the device composition of Fig. 2～Fig. 6, the device of Fig. 7 can be suitable in constituting.
[the 4th embodiment]
Secondly, the 4th embodiment is illustrated.In Figure 11, assign with above-mentioned each embodiment identical constitutive requirements sometimes pair Give and above-mentioned each embodiment identical symbol, simplify or the description thereof will be omitted.
Figure 11 shows the figure that the exposure device EX as substrate treating apparatus 1011 of this embodiment is constituted.This enforcement shape In state, the composition of the carrying device 1009 of substrate P is identical with the composition of the carrying device 1009 shown in previous Fig. 2.Shown in Figure 11 Substrate treating apparatus 1011 composition and previous Fig. 2, Fig. 7, Fig. 8 each device constitute discrepancy be that photomask M is not Be common transmission-type plane photomask for rotor photomask, located at each projection module of projection optical system PL Angles of the 1st reflecting surface p1004 of the 1st deflection component 1050 in PL1001～PL1006 with respect to optical axis AX1003 (face p1006) Degree θ 1001 is set as 45 ° etc..
In Figure 11, photomask holding meanss 1012 possess the photomask microscope carrier 1078 that keeps plane photomask M and Make photomask microscope carrier 1078 scan mobile mobile device in X direction in the face orthogonal with median plane p1003 (diagram is omited).
Because the pattern plane of the photomask M of Figure 11 is substantially the plane parallel with XY faces, therefore project module PL1001 Each chief ray EL3 of the photomask M sides of～PL1006, into vertical, illuminates each illumination region IR1001 on photomask M with XY faces The optical axis (chief ray) of illumination module IL1001 of～IR1006～IL1006 is also relative to XY faces into vertical.
In this embodiment, the 1st deflection structure that the 1st optical system 1041 of module PL1001～PL1006 is included is projected 1st reflecting surface p1004 of part 1050 and the 2nd reflecting surface p1005 are configured to the imaging beam projected from the 1st optical system 1041 The chief ray EL3 of EL2 is substantially parallel with median plane p1003.That is, each of projection module PL1001～PL1006 is included The 1st deflection component 1050 and the 2nd deflection component 1057, imaging beam EL2 is partial to into each illumination region from photomask M IR1001～IR1006 is injected from normal direction toward the chief ray EL3 that normal direction is advanced and formed in substrate P of barrel surface Each view field PA1001～PA1006.
For this purpose, the 1st reflecting surface p1004 and the 2nd reflecting surface p1005 configurations of the 1st deflection component 1050 are orthogonal, the 1st is anti- Penetrate face p1004 and be set to that relative 1st optical axis AX1003 (XY faces) is substantially at 45 ° with the 2nd reflecting surface p1005.
Also, the 3rd reflecting surface p1008 of the 2nd deflection component 1057 is configured to relatively comprising the 2nd optical axis AX1004 and is orthogonal to The face (parallel with XY faces) of median plane p1003 is that non-face is symmetrical with the 4th reflecting surface p1009.Also, the 3rd reflecting surface p1008 and the 2nd The angle, θ 1003 that optical axis AX1004 is constituted is essentially 45 °, what the 4th reflecting surface p1009 and the 2nd optical axis AX1004 was constituted Angle, θ 1004 is substantially less than 45 °, with regard to the setting of its angle, θ 1004, as illustrated by previous Fig. 6.
Furthermore, this embodiment also in the same manner as previous Fig. 9, when watching in XZ faces, on photomask M (the 1st face p1001) Illumination region IR1001 (and IR1003, IR1005) central point to illumination region IR1002 (and IR1004, IR1006) The distance of central point, the center of the view field PA1001 (and PA1003, PA1005) being set as in substrate P with cylinder planar O'clock to the 2nd view field PA1002 (and PA1004, PA1006) central point along the 2nd face p1002 along the 2nd of cylinder planar The length (girth) of face p1002 is substantially equal.
Also similarly, the control device 1014 by shown in previous Fig. 2 controls light to substrate treating apparatus 1011 shown in Figure 11 The mobile device (linear motor of scan exposure or the actuator of fine motion etc.) of mask holding meanss 1012, with the 2nd reel The rotation of component 1022 synchronously drives photomask microscope carrier 1078.Substrate treating apparatus 1011 shown in Figure 11, with photomask M The synchronizing moving toward +X direction be scanned exposure after, it is necessary to have make photomask M return -X direction primary position operation (volume Return).Therefore when making the 2nd mandrel member 1022 continuously transfer substrate P with constant speed so that certain speed continuously rotates, cover in light During the rollback of film M is operated, not to carrying out pattern exposure in substrate P, and shape dispersedly (can be separated) in the conveyance direction of substrate P Into panel pattern.However, in practicality, because the speed (being herein peripheral speed) of substrate P during scan exposure is with photomask M's Speed is assumed to 50～100mm/s, as long as therefore in the rollback of photomask M by photomask microscope carrier 1078 with such as 500mm/s Most high-speed driving, then can reduce between the panel pattern being formed in substrate P in the blank of substrate conveyance direction.
[the 5th embodiment]
Secondly, the 5th embodiment is illustrated.In Figure 12, assign with above-mentioned each embodiment identical constitutive requirements sometimes pair Give and above-mentioned each embodiment identical symbol, simplify or the description thereof will be omitted.
Though the photomask M of Figure 12 is using the photomask M cylindric with previous Fig. 2, Fig. 7, Fig. 8 identical, its composition It is that figuratum reflection type optical mask is partly being made with low reflection (light absorbs) for high reflection part to illumination light.Therefore, nothing Method utilizes the illuminator 1013 (lamp optical system IL) of the transmission-type such as previous each embodiment, it is necessary to just like from each projection Composition of the module PL1001～PL1006 sides toward the oblique illumination system that falls of reflection type optical mask M projection illumination light.
In Figure 12, in the 1st reflecting surface p1004 and reflection-type of the 1st deflection component 1050 for constituting the 1st optical system 1041 Photomask M between, arrange polarizing beam splitter PBS and 1/4 wavelength plate PK.The previously composition of each projection module shown in Fig. 6 In, though being provided with focusing amendment optical component 1044 with as moving amendment optical component 1045 in the position, in this embodiment, gather Jiao's amendment optical component 1044, the front that intermediate image plane p1007 (field stop 1043) is moved to as moving amendment optical component 1045 Or the space at rear.
The wavefront division face of polarizing beam splitter PBS, according to the relative optical axises of the 1st reflecting surface p1004 of the 1st deflection component 1050 The angle, θ 1001 (45 ° of ＜) of AX1003 (face p6), is configured to relative median plane p1003 tilt angle alpha/2 (θ d) and relative from anti- Illumination region IR1001 on the photomask M of emitting is about 45 ° toward the chief ray EL3 that footpath direction (normal direction) advances.
Illuminating bundle EL1 is for example projected from the good LASER Light Source of polarized light property, by beam-shaping optical system or illumination Homogenization optical system (fly's-eye lens or bar-shaped device etc.) etc. becomes linear polarization (S polarisations) and injects polarizing beam splitter PBS. The major part of the wavefront division face indirect illumination light beam EL1 of polarizing beam splitter PBS, illuminating bundle EL1 passes through 1/4 wavelength plate PK quilts Rotatory polarization is converted to, by the illumination region IR1001 irradiation on reflection type optical mask M in echelon or rectangle.
In the light (imaging beam) that the pattern plane (the 1st face p1001) of photomask M reflects, once again by 1/4 wavelength plate PK quilts Be converted to linear polarization (P polarisations), most of wavefront division face transmitted through polarizing beam splitter PBS, the deflection component of directive the 1st 1050 the 1st reflecting surface p1004.1st reflecting surface p1004 later composition or the light path of imaging beam (chief ray EL3) with It is identical with person illustrated by previous Fig. 6, what the reflecting part occurred in illumination region IR1001 on reflection type optical mask M was formed The picture of pattern is projected in view field PA1001.
As previously discussed, in this embodiment, only in the 1st optics of projection module PL1001 (and PL1002～PL1006) System 1041 adds polarizing beam splitter PBS and 1/4 wavelength plate PK, even if the cylindric photomask of reflection-type, also can be simply real Now fall oblique illumination system.Also, illuminating bundle EL1 is configured to the key light from the relative imaging beam in reflection type optical mask M reflection Line EL3 directions are that polarizing beam splitter PBS, and directive reflection type optical mask M are injected in the direction for intersecting.Therefore, even if how rare The P polarisations of less polarizing beam splitter PBS and the situation of the extinction ratio (stalling characteristic) of S polarisations, also can avoid becoming veiling glare, make A part of illuminating bundle EL1 is emitted directly toward the 1st anti-of the 1st deflection component 1050 from the wavefront division face of polarizing beam splitter PBS The view field PA1001 of face p1004, substrate P is penetrated, picture matter (contrast etc.) of the projection exposure in substrate P can be well kept, Carry out the loyal transfer of photomask pattern.
[the 6th embodiment]
Figure 13 shows projection optical system PL (the 1st projection module PL1001) pie graph of the 6th embodiment.1st projection Module PL1001 possesses the 3rd deflection component (plane mirror) the 1120, the 1st lens group (equimultiple projection) 1051, is configured at the 1st of pupil face Concave mirror the 1052, the 4th is partial to component (plane mirror) the 1121 and the 5th optical system (amplification optical projection system) 1122.Configuration illumination The 1st face p1001 of region IR (the 1st illumination region IR1001), is held in the photomask of the 1st mandrel member 1021 of cylinder planar The pattern plane of M (transmission-type or reflection-type), is barrel surface.Also, the substrate of configuration view field PA (the 1st view field PA1001) The 2nd face p1002 on P, is plane herein.
Additionally, be held in the photomask M of the 1st mandrel member 1021 (photomask supporting member), when for such as previous Figure 12 Reflection-type situation, in photomask M and the 3rd deflection component 1120 between be provided with polarizing beam splitter and 1/4 wavelength plate.
In Figure 13, from the imaging beam EL2 that the 1st illumination region IR1001 is projected, the 5th in the 3rd deflection component 1120 is anti- Face p1017 reflections are penetrated, the 1st lens group 1051 is injected.The imaging beam EL2 of the 1st lens group 1051 is injected, in the 1st concave mirror 1052 reflect and are turned back from the 1st lens group 1051 and projected, and inject the 6th reflecting surface p1018 of the 4th deflection component 1121.Pass through 1st lens group 1051 and the 1st concave mirror 1052, are formed with equimultiple in the same manner as above-mentioned embodiment and come across the 1st illumination region The intermediary image of the pattern of the photomask M of IR1001.
In the imaging beam EL2 of the 6th reflecting surface p1018 reflections, the 5th optical system is injected by the forming position of intermediary image System 1122, by the 5th optical system 1122 the 1st view field PA1001 is reached.5th optical system 1122 will be by the 1st lens The intermediary image that group 1051 and the 1st concave mirror 1052 are formed is with set enlargement ratio (such as more than 2 times) reimaging in the 1st projected area Domain PA1001.
In Figure 13, the 5th reflecting surface p1017 of the 3rd deflection component 1120, equivalent to the 1st deflection component illustrated in Fig. 6 1050 the 1st reflecting surface p1004, the 6th reflecting surface p1018 of the 4th deflection component 1121, equivalent to the 1st deflection illustrated in Fig. 6 2nd reflecting surface p1005 of component 1050.
In the projection optical system shown in Figure 13, the 3rd deflection component 1120 and photomask M (the 1st faces of cylinder planar The extended line of the chief ray EL3 between p1001) is set to the rotation centerline AX1001 by photomask M, with by plane Projection in 5th optical system 1122 of the vertical optical axis AX1008 in the surface (the 2nd face p1002) of substrate P of supporting and substrate P The chief ray EL3 of the imaging beam EL2 between the PA1001 of region be configured to it is vertical with the 2nd face p1002 that is, meet telecentricity into Slice part.In order to maintain this kind of condition, the projection optical system of Figure 13, possessing makes the 3rd deflection deflection component of component 1120 or the 4th The adjustment mechanism rotated a little in 1121 XZ faces in fig. 13.
Additionally, the 3rd deflection component 1120 or the 4th deflection component 1121 except can be in fig. 13 YZ faces in rotate a little with Outward, also may be configured as a little moving, rotating a little around the axle parallel with Z axis toward X-direction or Z-direction.Under this situation, energy A little displacement rotates a little in X-direction or in XY faces to make the picture being projected onto in view field PA1001.
Additionally, though projection module PL1001 is integrally to amplify projection optical system, also can generally equimultiple projection optics System, also can be reduction projection.Under this situation, due to what is be made up of the 1st lens group 1051 and the 1st concave mirror 1052 1st optical system be equimultiple system, as long as therefore by the projection multiplying power of the 5th optical system 1122 of its back segment change into equimultiple or Reduce.
[variation of the 6th embodiment]
Figure 14 shows the pie graph from Y direction viewing using the variation of the projection optical system of the 6th embodiment, figure 15 is the pie graph that Figure 14 is watched from X-direction.Projection optical system shown in Figure 14, Figure 15, shows and throws the amplification of Figure 13 Shadow optical system in Y direction that is, the rotation centerline AX1001 of the photomask M of cylinder planar direction of principal axis configuration it is multiple and Become the variation of the situation of multipleization.
Projection optical system PL of this variation, as shown in figure 15, possesses the 1st projection module PL1001 and the 2nd projective module Group PL1002.2nd projection module PL1002 and the 1st projection module PL1001 identicals are constituted, as shown in figure 14, though relative center Face p1003 is configured to the 1st projection module PL1001 symmetrically, but the Y direction in Figure 14, is as shown in figure 15 separated from one another 's.
1st projection module PL1001, as shown in figure 14, possesses illumination region IR1001 of the reception on photomask M Imaging beam the 3rd deflection component 1120A, the 1st lens group 1051A, the 1st concave mirror 1052A, the 4th deflection component 1121A, with And the 5th optical system (zooming into as system) 1122A.
Projection module PL1001 shown in Figure 14, Figure 15, compares with previous each projection optical system (Fig. 6 or Figure 13), Change the incline direction of the chief ray between the deflection component 1120A of photomask M and the 3rd.That is, the 1st deflection component 1050 of Fig. 6 Reflecting surface p1004 or Figure 13 the 3rd deflection component 1120 reflecting surface, make illumination region IR1001 from photomask M Chief ray EL3 with obtuse angle (more than 90 °) be partial to into with the 1st lens group 1051 (1051A) and the 1st concave mirror 1052 (1052A) The optical axis AX1003 of the 1st optical system for constituting into parallel, in contrast, being inclined with obtuse angle (less than 90 °) in the composition of Figure 14 To into from the chief ray EL3 of illumination region IR1001 and the optical axis of the 1st optical system into parallel.
2nd projection module PL1002, similarly as shown in figure 14, possesses the illumination region received on photomask M 3rd deflection component 1120B of the imaging beam of IR1002, the 1st lens group 1051B, the 1st concave mirror 1052B, the 4th deflection component 1121B and the 5th optical system (zooming into as system) 1122B.
Projection module PL1001, PL1002 shown in Figure 14, Figure 15, generally amplifies projection optical system, such as Figure 15 institutes Show, the 1st region A1001 configured on the photomask M (the 1st mandrel member 1021) of the 1st illumination region IR1001 shines with configuration the 2nd The 2nd region A1002 on the photomask M (the 1st mandrel member 1021) of area pellucida domain IR1002 is separated from one another in the Y direction.However, logical Crossing will project module PL1001, and the enlargement ratio of PL1002 suitably sets, and will be projected on the view field in substrate P The of 3rd region A1005 (as region) and the view field PA1002 being projected in substrate P of the 1st region A1001 of PA1001 The relation overlapped in a Y-direction part when the 4th region A1006 (as region) of 2 region A1002 is set as the viewing in YZ faces. Whereby, the 1st region A1001 and the 2nd region A1002 on photomask M (the 1st mandrel member 1021), is linked to Y in substrate P Direction and formed, and can the big panel pattern of projection exposure.
As previously discussed, possess the substrate treating apparatus of projection optical system PL shown in Figure 14, Figure 15, will be previously scheming Projection optical system shown in 13 is configured to symmetrically with respect to median plane p1003, and configures multiple situation phases with Y direction Than, the overall X-direction width dimensions of projection optical system can be made less, can also make X-direction size less as processing meanss.
Additionally, Fig. 9 previously is also described, in the Figure 14 watched in XZ faces, it is stipulated that in photomask M (the 1st reel structures Part 1021) on illumination region IR1001 and the girth DMx between each central point of illumination region IR1002 and substrate P on it is corresponding View field PA1001, PA1002 each central point apart from DFx, the enlargement ratio of projection optical system is being set to into Mp When, it is set as the relation of DFx=MpDMx.
[the 7th embodiment]
Figure 16 shows the figure that the projection optical system of the 7th embodiment is constituted.From the 1st face for being formed at cylindrical shape The imaging beam EL2 of the 1st illumination region IR1001 of p1001 (photomask pattern face) injects the 6th optical system 1131, by 6 optical systems 1131 and the imaging beam EL2 of the 9th reflecting surface p1022 reflections in the 7th deflection component (plane mirror) 1132, arrive Up to intermediate image plane p1007 of the 1st field stop 1043 of configuration, in this intermediate image plane p1007 the pattern image of photomask M is formed.
By the imaging beam EL2 of intermediate image plane p1007 in the 8th the 10th reflecting surface for being partial to component (plane mirror) 1133 P1023 reflects, and the 1st projection in substrate P being supported by along the 2nd cylindric face p1002 is reached by the 7th optical system 1134 Region PA1001.Figure 16 the 1st projection module PL1001, using the pattern image of the photomask M of the 1st illumination region IR1001 as Erect image is projected on the 1st view field PA1001.
In Figure 16, the 6th optical system 1131 is the imaging optical system of equimultiple, its optical axis AX1010 with illuminate by the 1st The chief ray of the imaging beam EL2 at region IR1001 centers is substantially coaxial.In other words, optical axis AX1010 and Fig. 4 or Fig. 7～9 The 1st shown footpath direction D1001 is substantial parallel.
7th optical system 1134 is the imaging optical system of equimultiple, and the intermediary image that the 6th optical system 1131 is formed is again Image in the 1st view field PA1001.The optical axis AX1011 of the 7th optical system 1134 with by the 1st view field PA1001 1st normal direction (footpath direction) D1003 of the 2nd cylindric face p1002 of the heart is substantial parallel.
In this embodiment, two deflection components 1132,1133, across intermediate image plane p1007 in XZ faces in figure 16 It is configured to symmetrical.For illustrative ease, the optical axis AX1010 and the 7th optical system 1134 in the 6th optical system 1131 is also considered Optical axis AX1011 intersect position formed intermediate image plane, in the intermediate image plane position configuration have the reflection parallel with YZ faces The a piece of plane mirror in face, and the situation that light path is bent.However, when can with a piece of plane mirror to process when, in the XZ faces of Figure 16 Interior, the angle that the optical axis AX1010 of the 6th optical system 1131 and the optical axis AX1011 of the 7th optical system 1134 are constituted is compared with 90 ° Big situation, the angle that should be constituted with each optical axis AX1010, AX1011 with a piece of plane mirror becomes less than 45 ° of acute angle, into Picture characteristic is simultaneously not very good.For example, if the angle that optical axis AX1010, AX1011 are constituted becomes 140 ° or so, a piece of plane mirror The angle that reflecting surface is constituted with each optical axis AX1010, AX1011 becomes 20 °.Therefore, if being partial to using two panels as shown in figure 16 Component (plane mirror) 1132,1133 bends light path, then can relax this kind of problem.
Additionally, in the composition of Figure 16, also can be using the 6th optical system 1131 as the imaging len for amplifying Mf times, by the 7th light System 1134 is used as the imaging len for reducing 1/Mf times, the generally optical projection system of equimultiple.On the contrary, also can be by the 6th optics System 1131 is overall using the 7th optical system 1134 as the imaging len for amplifying Mf times as the imaging len for reducing 1/Mf times For the optical projection system of equimultiple.
[the 8th embodiment]
Figure 17 shows the pie graph of projection optical system PL (the 1st projection module PL1001) of the 8th embodiment.Basic Though the composition of optical system is identical with previous Figure 16 those shown, dissimilarity is further to have added two deflection components (to put down Face mirror) 1140,1143.
In Figure 17, equivalent to the imaging optical system 1131 in Figure 16 the 8th optical system 1135 with the 3rd lens 1139 with 4th lens 1141 are constituted, its optical axis, are set as and the 1st from the photomask M that the 1st face p1001 along cylinder planar is supported by The chief ray of the imaging beam EL2 that illumination region IR1001 center is projected toward normal direction is substantial parallel.In the 3rd lens 1139 The pupil face of the 8th optical system 1135 is formed between the 4th lens 1141, in the position the 11st deflection component (plane mirror) is provided with 1140。
Project from the 1st illumination region IR1001 and pass through the imaging beam EL2 of the 3rd lens 1139, the 11st component is partial to 1140 the 13rd reflecting surface p1026 is with 90 ° or close its angle is bent, and the 4th lens 1141 is injected, in equivalent to Figure 16 Deflection component 1132 the 9th deflection component (plane mirror) 1136 the 11st reflecting surface p1024 reflections, arrival is configured at intermediary image The field stop 1043 of face p1007.Whereby, the 8th optical system 1135 will emerge from the photomask in the 1st illumination region IR1001 The pattern image of M is formed at the position of intermediate image plane p1007.
Additionally, the 8th optical system 1135 is the imaging optical system of equimultiple, intermediate image plane p1007 is configured to and median plane P1003 is orthogonal.Also, the optical axis of the 3rd lens 1139 with from the 1st illumination region IR1001 center toward normal direction (cylindric the 1st The radial direction of face p1001) chief ray of imaging beam EL2 that projects is substantially coaxial or parallel.
9th optical system 1138 of Figure 17 is identical composition with the 8th optical system 1135, is configured to regard comprising the 1st relatively Wild diaphragm 1043 and intermediate image plane p1007 substantially orthogonal with median plane p1003 is symmetrical with the 8th 1135 one-tenth of optical system.8th The optical axis (hereinafter referred to as the 2nd optical axis AX1004) of optical system 1135 is substantially orthogonal with median plane p1003.Via the 8th optics System 1135 and the 9th is partial to component 1136 and passes through the imaging beam EL2 of field stop 1043, and the 10th component (plane is partial to Mirror) 1137 the 12nd reflecting surface p1025 reflected, by constituting the 5th lens 1142 of the 9th optical system 1138, being configured at pupil The 12nd deflection lens 1144 of component 1143 and the 6th of position, reach substrate P being supported by along the 2nd cylindric face p1002 On the 1st view field PA1001.In the composition of Figure 17, the optical axis of the 6th lens 1144 is set as and relative 1st view field The chief ray of the imaging beam EL2 that PA1001 advances toward normal direction (radial direction of the 2nd cylindric face p1002) is substantial It is coaxial or parallel.
[the 9th embodiment]
Figure 18 shows projection optical system PL (the 1st projection module PL1001) pie graph of the 9th embodiment.The of Figure 18 1 projection module PL1001 is the projection optical system of the catadicptric type of so-called line mo(u)ld top half.1st projection module PL1001 possesses with the 10th optical system 1145, the 1st field stop 1043 of the equimultiple that the two panels of 4 concave mirrors 1146 and the 5th concave mirror 1147 is constituted (intermediate image plane p1007) and the 5th optical system 1122 as shown in Figure 13,14.
10th optical system 1145, by the 1st illumination region on the photomask M that the 1st cylindric face p1001 is supported by The intermediary image of the pattern occurred in IR1001 is formed at the position of field stop 1043.In this embodiment, the 10th optical system System 1145 is the optical system of equimultiple.Each of 4th concave mirror 1146 and the 5th concave mirror 1147 is for example configured to ellipse of revolution face A part.This ellipse of revolution face, is oval around oval major axis (X-direction) or short axle (Z-direction) rotation by making The face of formation.
In the composition of Figure 18, from the 1st illumination region IR1001 central authorities toward the normal direction (footpath of the 1st cylindric face p1001 Direction) chief ray of imaging beam EL2 that projects, it is set in XZ faces face p1001 (the 1st reel structures of directive the 1st during viewing Part 1021) Pivot axle AX1001.That is, shoot to the 4th recessed of projection module PL1001 from photomask M (the 1st face p1001) The chief ray of the imaging beam EL2 of face mirror 1146 is tilted in XZ faces with respect to median plane p1003.
5th optical system 1122, such as illustrated in fig. 13 refraction shape amplifies projection optical system, will be by the 10th Optical system 1145 is formed at the intermediary image of the position of field stop 1043 and is projected on and is supported by along the 2nd plane face p1002 Substrate P on the 1st view field PA1001.
4th concave mirror 1146 and the 5th concave mirror 1147 of the 10th optical system 1145, by imaging beam EL2 be partial to into from 1st illumination region IR1001 is injected by the 5th optical system 1122 toward the imaging beam EL2 that normal direction is projected from normal direction 1st view field PA1001.Possess the substrate treating apparatus of this kind of projection optical system PL, and illustrated by above-mentioned embodiment Substrate treating apparatus 1011 similarly, can suppress ill-exposed generation, carry out the projection exposure of loyalty.Additionally, the 5th optical system System 1122 also can be the projection optical system of equimultiple, also can be the optical system for reducing.
[the 10th embodiment]
Figure 19 shows the pie graph of projection optical system PL (the 1st projection module PL1001) of the 10th embodiment.Figure 19 The 1st projection module PL1001, the dioptric system without the reflecting member with power.1st projection module PL1001 tools The standby deflection of 11st optical system the 1150, the 13rd component 1151, the deflection component 1152 and the 12nd of the 1st field stop the 1043, the 14th Optical system 1153.
In this embodiment, from the 1st illumination region on the photomask M that the 1st cylindric face p1001 is kept The imaging beam EL2 that IR1001 is projected, the 13rd deflection component constituted by the prism of wedge shape by the 11st optical system 1150 1151 are partial in XZ faces and reach and be configured at the 1st field stop 1043 of intermediate image plane p1007, in being here formed as photomask figure The intermediary image of case.Further, the 14th deflection structure for being constituted by the prism of wedge shape by the imaging beam EL2 of the 1st field stop 1043 Part 1152 is partial in XZ faces and injects the 12nd optical system 1153, by the 12nd optical system 1153, is reached along cylinder planar Substrates P that are supported by of the 2nd face p1002 on the 1st view field PA1001.
The optical axis of the 11st optical system 1150 for example with from the 1st illumination region IR1001 center toward normal direction (barrel surface The radial direction of the 1st face p1001 of shape) chief ray of imaging beam EL2 that projects is substantially coaxial or parallel.Also, the 12nd light System 1153 is identical composition with the 11st optical system 1150, is configured to be oppositely disposed the intermediary image of the 1st field stop 1043 Face p1007 (orthogonal with median plane p1003) is symmetrical with the 11st 1150 one-tenth of optical system.The optical axis of the 12nd optical system 1153, if Determine into the chief ray reality of the imaging beam EL2 that the 1st view field PA1001 is injected with the normal along the 2nd plane face p1002 It is parallel in matter.
13rd deflection component 1151 has the 9th face injected by the imaging beam EL2 of the 11st optical system 1150 P1028 and the 10th face p1029 for projecting the imaging beam injected from the 9th face p1028, is configured at the 1st field stop 1043 (middle Image planes p1007) front or close to front.In this embodiment, the 9th face p1028 and the 10th face of set drift angle is constituted Each of p1029 is constituted in the plane that the face (XY faces) of median plane p1003 inclined, extended Y direction with relative orthogonal.
14th deflection component 1152 is the prism component same with the 13rd deflection component 1151, with respect to the 1st field stop 1043 intermediate image planes p1007 being located at and the 13rd deflection balanced configuration of component 1151.14th deflection component 1152 have pass through The imaging that the 11st face p1030 that the imaging beam EL2 of the 1st field stop 1043 is injected is injected with injection from the 11st face p1030 The 12nd face p1031 of light beam EL2, be configured at the 1st field stop 1043 (intermediate image plane p1007) rear or close to rear.
In this embodiment, the 13rd deflection deflection component 1152 of component 1151 and the 14th will be from the 1st illumination region IR1001 The imaging beam EL2 projected toward normal direction is partial to into from normal direction and injects the 1st view field PA1001.Possesses this kind of projection The substrate treating apparatus of optical system PL, in the same manner as the substrate treating apparatus 1011 illustrated by above-mentioned embodiment, can suppress Ill-exposed generation, carries out the projection exposure of loyalty.
Though additionally, the 11st optical system 1150 or the 12nd optical system 1153 also but equimultiple projection optical system, also But reduce system optical system, but by photomask M or substrate P either one along barrel surface (or arc surface) supporting state During lower projection exposure, between the detached two projections module of circumferential direction of barrel surface, in the visual field of object plane side (girth is spaced Distance) also may be set to the ratio at the interval (week over long distances) in the projection visual field in final image planes side it is consistent with projection multiplying power.
[the 11st embodiment]
Figure 20 shows point pie graph of of the device inspection apparatus (flexible display manufacturing line) of the 11st embodiment. Herein, flexible substrates P (piece, film etc.) pulled out from supply roller FR1 are shown sequentially through n platform processing meanss U1, U2, U3, U4, U5 ... Un, and it is rolled to the example for reclaiming cylinder FR2.Host control device 2005, plans as a whole each process that control constitutes manufacturing line Device U1～Un.
In Figure 20, orthogonal coordinate system XYZ is set to that the surface (or back side) of substrate P is vertical with XZ faces, with removing for substrate P The width for sending direction (length direction) orthogonal is set as Y-direction.Additionally, substrate P, also can be beforehand through set front place Reason and be formed with order to the fine partition wall of precise pattern constructs (concavo-convex structure by its surfaction and activation or in surface Make).
Rolled up in substrate P of supply roller FR1, pulled out by the driving cylinder DR1 being clamped and transported to processing meanss U1, the center of the Y-direction (width) of substrate P, by marginal position controller EPC1 Service controlls into relative target position In the scope of ± ten several μm～tens of μm degree.
Processing meanss U1, be with mode of printing in the conveyance direction (length direction) of substrate P continuously or optionally Arrange in the painting of the surface coating photonasty functional liquid (photoresistance, photonasty silane coupling material, UV hardening resin liquid etc.) of substrate P Put.In processing meanss U1, it is provided with and is wound with the pressure trunk cylinder DR2 of substrate P, presses photonasty on trunk cylinder DR2 comprising here Functional liquid is equably coated the coating mechanism Gp1 for being coated with cylinder etc. on the surface of substrate P, is coated hastily removing Drier Gp2 of solvent or moisture contained by the photonasty functional liquid of substrate P etc..
Processing meanss U2, be to by substrate P moved from processing meanss U1 be heated to determined temperature (for example number 10～ 120 DEG C), make the stable heater of the photonasty functional layer for coating surface.In processing meanss U2, it is provided with to turn down and removes Send multiple cylinders of substrate P and air swingle, the heating chamber portion HA1 to heat substrate P moved into, to by after heating The driving for the cooling chamber portion HA2 consistent with the ambient temperature of rear step (processing meanss U3) is down at a temperature of substrate P on both sides by the arms, being seized Cylinder DR3 etc..
It is the photonasty work(of substrate P to moving from processing meanss U2 as processing meanss U3 of substrate treating apparatus Ergosphere irradiates the exposure device of the patterning light of ultraviolet corresponding with the circuit pattern of display or Wiring pattern.In process In device U3, marginal position controller EPC, the quilt that Y-direction (width) center of substrate P is controlled in certain position is provided with The driving cylinder DR4 that seizes on both sides by the arms, substrate P is partly wound with set tension force and is supported to the pattern exposure part in substrate P The rotating drum DR5 of homogeneous cylinder planar and two groups of driving cylinders to give set lax (space) DL to substrate P DR6, DR7 etc..
Further, in processing meanss U3, it is provided with the photomask M of cylindrical shape, in being supported to cylinder planar by rotating drum DR5 Substrate P the cylindric photomask M of part projection photomask pattern a part picture projection optical system PL, be The picture of a part for the photomask pattern being projected detected and be previously formed in substrate with substrate P alignment relative (alignment) Aligming microscope AM1, AM2 of the alignment mark of P etc..
In this embodiment, due to being cylindric photomask M to be set to into reflection-type (pattern of outer peripheral face is with high reflection portion Constitute with areflexia portion), therefore be also provided with and shone exposure illumination light by a part of optics of projection optical system PL Penetrate in the oblique illumination optical system that falls of cylindric photomask M.With regard to the composition of oblique illumination optical system that falls, after remaining in detail State.
Processing meanss U4 are that the photonasty functional layer of substrate P to moving from processing meanss U3 is carried out at the development of wet type The drying process devices such as reason, electroless plating process.Three treatment troughs in Z-direction form a social stratum are provided with processing meanss U4 BT1, BT2, BT3, multiple cylinders that the bending of substrate P is transported and clamped driving cylinder DR8 etc..
Though processing meanss U5 are to warm up substrate P moved from processing meanss U4, and will be in wet type manufacturing process moistening The moisture amount of substrate P adjust to the heat drying apparatus of set value, but its detailed configuration is omitted.Thereafter, through several Processing meanss, substrate P after last processing meanss Un of a succession of manufacturing process, by the driving cylinder DR1 being clamped It is rolled to recovery cylinder FR2.When here winds, also through marginal position controller EPC2, gradually Correction and Control drives cylinder DR1 With the center of the Y-direction (width) that the Y-direction relative position for reclaiming cylinder FR2 makes substrate P or the base terminal of Y-direction in Y Direction will not heterogeneity.
Substrate P that this embodiment is used, can use with identical illustrated in the 1st embodiment, omit herein and say It is bright.
The device inspection apparatus 2001 of this embodiment, perform to carry out various places to a device repeatedly to substrate P Reason.Substrate P of various process is applied in, according to each device (cutting) is divided, become multiple devices.The size of substrate P, such as it is wide The size of degree direction (as the Y-direction of minor face) is 10cm～2m degree, and the size of length direction (as the X-direction on long side) is More than 10m.
Next, though the composition of processing meanss U3 (exposure device) of bright embodiment, before this, with reference to Figure 21 ～Figure 23 illustrates the basic composition of the exposure device of this embodiment.
Exposure device U3 shown in Figure 21 is so-called scanning-exposure apparatus, possesses and have from Pivot axle AX2001 half The cylindric photomask M of the reflection-type of the periphery of footpath r2001 with from Pivot axle AX2002 with the circle of radius r2002 The rotating drum 2030 (DR5 in Fig. 1) of side face.Then, by making cylindric photomask M with rotating drum 2030 with set Than synchronous rotary, the pattern image that the periphery of cylindric photomask M is formed is repeated continuously projection exposure to rotary speed To the surface (along the face of barrel surface bending) of substrate P for the outer peripheral face part for being wound in rotating drum 2030.
Transport mechanism 2009, photomask holding meanss 2012, lamp optical system IL, projection are provided with exposure device U3 Optical system PL and control device 2013, by the control of control device 2013 circle of photomask holding meanss 2012 is held in The rotation driving of the photomask M of tubular or the fine motion in Pivot axle AX2001 direction or composition are by the conveyance of substrate P in length Degree direction the part of transport mechanism 2009 rotating drum 2030 rotation driving or Pivot axle AX2002 direction it is micro- It is dynamic.
Photomask holding meanss 2012 possess：Cylinder, gear, belt etc. drive passes on mechanism 2021,2022, for periphery Face is formed with the rotating drum 2020 of the photomask M (photomask pattern) of reflection-type and gives rotation around Pivot axle AX2001 Driving force makes the fine motion of rotating drum 2020 in the direction of Pivot axle AX2001 parallel with Y-axis；And the 1st drive division 2024, comprising to these drivings are passed on mechanisms 2021,2022 give the rotation motor of necessary driving forces, fine motion it is linear Motor or piezoelectric element etc..Also, the rotary angle position of rotating drum 2020 (photomask M) or Pivot axle AX2001 direction Position, measured by the 1st detector 2023 comprising rotary encoder, laser interferometer, gap sensor etc., its measurement Information is delivered to control device 2013 immediately, is used in the control of the 1st drive division 2024.
Similarly, rotating drum 2030, by comprising rotation motor, the linear motor of fine motion or piezoelectric element etc. the 2 drive divisions 2032 are endowed around the rotary driving force of Pivot axle AX2002 parallel with Y-axis or toward Pivot axle The micro power in AX2002 directions.The rotary angle position of rotating drum 2030 or the position in Pivot axle AX2002 direction, be Measured by the 2nd detector 2031 comprising rotary encoder, laser interferometer, gap sensor etc., its metrical information quilt Immediately control device 2013 is delivered to, the control of the 2nd drive division 2032 is used in.
Herein, in this embodiment, Pivot axle AX2001 of cylindric photomask M and the rotation of rotating drum 2030 Turn central shaft AX2002 to be parallel to each other, in the median plane pc parallel with YZ faces.
Then, in being formed with the portion intersected with median plane pc in cylindric pattern plane p2001 of the photomask M of cylindrical shape Divide illumination region IR for being set with exposure illumination light, in the base that cylindrical shape is wound into along the outer peripheral face p2002 of rotating drum 2030 The section sets intersected with median plane pc on the P of bottom have to be projected out an existing photomask pattern part in illumination region IR Picture view field PA.
In this embodiment, projection optical system PL projects illumination light toward illumination region IR on cylindric photomask M Beam EL1, and to inject light beam (imaging beam) EL2 of the reflection diffraction of the photomask pattern in illumination region IR, in substrate P View field PA be imaged out pattern picture mode, lamp optical system IL with share projection optical system PL a part of light The oblique mode that falls on road is constituted.
As shown in figure 21, projection optical system PL possesses：45 ° and possess each other just XZ faces are tilted with respect to median plane pc The prism mirror 2041 of the plane of reflection 2041a, 2041b of friendship and with the optical axis 2015a orthogonal with median plane pc and with It is configured at the 2nd optical system 2015 that the concave mirror 2040 of pupil face pd is constituted with multi-disc lens.
Herein, if will be comprising the optical axis 2015a and plane parallel with XY faces is set to p2005, with plane p2005 as base The angle, θ 2001 of accurate plane of reflection 2041a is+45 °, the angle, θ of the plane of reflection 2041b on the basis of plane p2005 2002 is -45 °.
Projection optical system PL is for example as the plane of reflection by the circular image visual field with prism mirror about 2041 The catadicptric type projection optical system (wearing the deformation type of gloomy optical system) of half field of view type of 2041a, 2041b segmentation And it is configured to telecentricity.Therefore, pattern reflection, the imaging beam EL2 of refraction in illumination region IR, in prism mirror 2041 Upside the plane of reflection 2041a reflection, by multi-disc lens reach be configured at pupil face pd concave mirror 2040 (but also plane Mirror).Then, concave mirror 2040 reflection imaging beam EL2 by reaching prism for symmetrical light path with respect to plane p2005 The plane of reflection 2041b of reflecting mirror 2041, is reached in this place the view field PA in substrate P by reflection, photomask pattern As being imaged in substrate P with equimultiple (× 1).
In order that this kind of projection optical system PL is suitable for oblique illumination mode, in this embodiment, it is configured in being configured at The part formation of the reflecting surface p2004 of the concave mirror 2040 of pupil face pd is passed through by partly from face p2003 by part (window) (glass surface) injects illuminating bundle EL1.
In Figure 21, the 1st light of the behind of concave mirror 2040 is configured in lamp optical system IL for only representing this embodiment A part for system 2014, only shows and is generated in the illumination light of light source described later, fly's-eye lens, illumination field stop etc. In pupil face pd more several point source pictures a point source as the illuminating bundle EL1 of Sf.
Point source as Sf, due to being for example set as being formed with each emitting side of the multiple lens devices for constituting fly's-eye lens The relation that is optically conjugated of point source picture (luminous point of light source), therefore illumination region IR on the photomask M of cylindrical shape borrows By the 2nd optical system 2015 by projection optical system PL and the photograph of the plane of reflection 2041a of the upside of prism mirror 2041 Mingguang City beam EL1, using triumphant drawing illumination by with the illumination of homogeneous Illumination Distribution.
Additionally, in Figure 21, the optical axis 2014a of the 1st optical system 2014 of lamp optical system IL is configured to and projected light The optical axis 2015a of system PL is coaxial, illumination region IR on cylindric photomask M, is set to the pattern plane of cylindrical shape The circumferential direction width of p2001 is narrow, in the longer slit-shaped in the direction of Pivot axle AX2001.
For example, when the radius r2001 of pattern plane p2001 of cylindric photomask M is set to into 200mm, by the thickness of substrate P Degree tf is set to 0.2mm, and to the condition of projection exposure, the radius r2002 that can be set as the outer peripheral face of rotating drum 2030 is R2002=r2001-tf (199.8mm).
Though also, the circumferential direction width (width in scan exposure direction) of illumination region IR (or view field PA) more it is narrow then More verily projection exposure to fine pattern, but inversely can need to improve the per unit area in illumination region IR with this Illumination.It is which kind of degree by the width setup of illumination region IR (or view field PA), can be covered by considering the light of cylindrical shape The radius r2001 of film M or rotating drum 2030, r2002, the fine degree (live width etc.) of pattern to be transferred, projection optical system PL Depth of focus etc. after determined again.
Then, Tu21Zhong, when using optical axis 2015a by concave mirror 2040 reflecting surface p2004 on position as During central point 2044, due to point source as Sf can be formed at the position offset toward -Z direction in paper (XZ faces) from central point 2044 Put, thus it is regular anti-in the imaging beam EL2 (including diffraction light) of the illumination region IR reflection on cylindric photomask M Light (0 diffraction light) is penetrated, is that the central point 2044 converged on the p2004 of relative reflection face forms point light for point-symmetric position Source image Sf '.Therefore, if first by the part being located at as Sf ' comprising the point source on reflecting surface p2004 with its around ± 1 time The region of the part that diffraction light is distributed is set to reflecting part, then the imaging beam EL2 from illumination region IR does not substantially lose Ground reaches view field PA by the multi-disc lens of the 2nd optical system 2015 with the plane of reflection 2041b of prism mirror 2041.
The concave mirror 2040, is in the concave surface AM aluminum metallization of the concavees lens being made with radioparent optical glass material (quartz etc.) Reflecting surface p2004 is made etc. metallic reflectance coating, generally, the light transmission of the reflectance coating is minimum.Therefore, this embodiment In, in order to inject illuminating bundle EL1 from the face p2003 of reflecting surface p2004 dorsal parts, and pass through etching etc. and remove composition reflecting surface A reflectance coating part of p2004, forming the illuminating bundle EL1 for having restrained can pass through the window of (transmitted through).
Figure 22 is the figure of the reflecting surface p2004 appearance that this kind of concave mirror 2040 is watched from X-direction.In Figure 22, in order that saying It is bright simple, it is certain toward -Z direction skew from plane p2005 (parallel with XY faces) comprising optical axis 2015a on reflecting surface p2004 The position of amount, separates in Y-direction and is provided with three window portions 2042a, 2042b, 2042c.This window portion 2042a, 2042b, 2042c, be Removed by selective etching and constitute the reflectance coating of reflecting surface p2004 and be made, herein, though it is made do not cover each point source picture Sfa, Sfb, Sfc (illuminating bundle EL1a, EL1b, EL1c) degree it is little rectangular-shaped, but also but other shapes are (circle, oval, more It is angular etc.).Three point sources as Sfa, Sfb, Sfc, such as by the multiple of the fly's-eye lens in lamp optical system IL Three lens devices of Y-direction are arranged in lens device and make winner.
When watching in reflecting surface p2004, each window portion 2042a, 2042b, 2042c mutual position relationship is set as phase To central point 2044 (optical axis 2015a) for non-for point symmetry that is, non-point-symmetric relation.Though three window portions are only shown herein, But the situation of more window portions is made, window portion is also set as that each other relative central point 2044 is non-point-symmetric position relationship.
Also, become almost parallel light beam as the illuminating bundle EL1a of Sfa from the point source being created in window portion 2042a and After being irradiated in illumination region IR of the photomask M of cylindrical shape, the imaging beam EL2a of its reflection diffraction light is then in concave mirror 2040 Reflecting surface p2004 on converge point source as Sfa ' for point-symmetric position in relative central point 2044 and window portion 2042a.
Similarly, though from each point source being created in window portion 2042b, 2042c as Sfb, the illuminating bundle of Sfc EL1b, EL1c also become almost parallel light beam and be irradiated in cylindrical shape photomask M illumination region IR, but its reflected light into As light beam EL2b, EL2c is then in relative central point 2044 and window portion 2042b, 2042c on the reflecting surface p2004 of concave mirror 2040 Each converge point source as Sfb ', Sfc ' for point-symmetric position.
Also, as shown in figure 22, in as point source as Sfa ', Sfb ', Sfc ' imaging beam EL2a, EL2b, EL2c, though Comprising 0 diffraction light (normal reflection light) and ± 1 diffraction light, but respectively ± 1 diffraction light DLa, DLb, DLc are across 0 diffraction light Extend with X-direction and be distributed in Z-direction.
Further, the point source on reflecting surface p2004 is formed at as Sfa ', Sfb ', Sfc ' (particularly 0 time diffraction light), by It is barrel surface in illumination region IR of cylindric photomask M, therefore in the paper (YZ faces) of Figure 22, makes point source as Sfa, The shape of Sfb, Sfc becomes to stretch and is distributed in the shape of Z-direction (circumferential direction of cylinder photomask).
As shown in figure 22, in each point source as Sfa, Sfb, Sfc is located at flat relatively comprising central point 2044 (optical axis 2015a) During face p2005 lower sides (-Z direction), in the paper shown in Figure 21 (in XZ faces), illuminating bundle EL1 (EL1a, EL1b, EL1c) cylindric photomask is reached with the plane of reflection 2041a of the upside of prism mirror 2041 by the 2nd optical system 2015 M.Grade illuminating bundle EL1 (EL1a, EL1b, EL1c), though collimated light beam is nearby just in the pole of cylindric photomask M, But incline slightly with respect to median plane pc.Its tilt quantity, corresponding in reflecting surface p2004 (pupil face pd) point source as Sf The Z-direction displacement of (Sfa, Sfb, Sfc) from central point 2044 (optical axis 2015a).
In the reflection of illumination region IR, the imaging beam EL2 (EL2a, EL2b, EL2c) of refraction, the relative median plane in XZ faces Pc is with the plane of reflection that tilt to up to prism mirror 2041 upside symmetrical with illuminating bundle EL1 (EL1a, EL1b, EL1c) 2041a, reflects herein and injects the 2nd optical system 2015, reaches the relatively plane of the reflecting surface p2004 of concave mirror 2040 Part above p2005 (central point 2044).
In shown in Figure 21, Figure 22 above, though in the reflecting surface p2004 of concave mirror 2040, make illuminating bundle Point source picture (collection luminous point) Sf of EL1 is distributed in the plane parallel with the XY faces of the optical axis 2015a comprising projection optical system PL P2005 downsides (-Z direction), but as long as being set as previously described condition, i.e. by the reflection of the point source picture of illuminating bundle The mutual position relationship of window portion 2042 in the p2004 of face is with respect to central point 2044 to be not that point-symmetric relation is (non-point-symmetric Relation), then the point source on reflecting surface p2004 can be freely set as the position of Sf (window portion 2042).
If the window portion that at least under such condition, will be passed through as Sf as more several point sources in illuminating bundle EL1 sources The 2042 reflecting surface p2004 for being formed at concave mirror 2040, then can on reflecting surface p2004 (pupil face pd), make illuminating bundle with into As light beam is efficiently spatially separated from.
In order to one side makes more several window portions 2042 (point source of illuminating bundle is as Sfa, Sfb, Sfc...) equably be distributed In reflecting surface p2004, spatially separating for illuminating bundle and imaging beam is kept well on one side, can pass through imaging The convergence of beam EL2 and each point source for being formed are as Sfa ', Sfb ', Sfc ' ... the size on reflecting surface p2004 is (also comprising ± 1 Secondary diffraction light DLa, the size of DLb, DLc) it is set as that the Y-direction of more adjacent window portion 2042 is little i.e. with the size of space of Z-direction Can.In other words, each point source of illuminating bundle EL1 is reduced as much as possible as Sfa, and Sfb, Sfc... are in pupil face pd (reflectings surface P2004 the size in), to reduce window portion 2042a, 2042b, 2042c... each size as much as possible, the method is effective.
In this embodiment, as light source, though can be using mercury discharge lamp, Halogen light, ultraviolet LED etc., in order to reduce Each point source of illuminating bundle EL1 can utilize high briliancy and radiate the narrow light of concussion wavelength band as Sfa, Sfb, Sfc... LASER Light Source.
Herein, the composition of lamp optical system IL (the 1st optical system 2014) with reference to shown in Figure 23 explanatory diagrams 21, Figure 22 One.Additionally, in Figure 23, pair same-sign is given with the identical person such as the component illustrated by Figure 21, Figure 22, omitted the description.Also, In Figure 23, the prism mirror 2041 in Figure 21 is omitted, by pattern planes p2001 of the cylindric photomask M with cylindrical shape The outer peripheral face (or surface of substrate P) of light path and rotating drum 2030 between illumination region IR and the 2nd optical system 2015 Light path between the view field PA and the 2nd optical system 2015 on p2002 is launched to show.
As previously discussed, in lamp optical system IL be provided with inject from the light beam EL0 (illuminating bundle EL0) of light source and Generate the fly's-eye lens 2062 of more several point source pictures, make each the light beam from more several point source pictures illuminate visual field light The collecting lenses 2065 overlapped on door screen (blind) 2064 and the illuminated light guide by the opening by illuminating field stop 2064 To the lens system 2066 of the concave mirror 2040 of projection optical system PL (the 2nd optical system 2015).Due to being suitable for triumphant drawing illumination, Therefore the emitting side in fly's-eye lens 2062 generates the face Ep of point source picture, by constitute collecting lenses 2065, lens system 2066, The glass material (concavees lens shape) of concave mirror 2040 is set to the pupil face pd conjugation being located at the reflecting surface of concave mirror 2040.
In YZ faces, the ejecting end center configuration of fly's-eye lens 2062 on the optical axis 2065a of collecting lenses 2065, in this The center of configuration illumination field stop 2064 (peristome) on optical axis 2065a.Further, field stop 2064 is illuminated, by constituting Lens system 2066, the glass material (concavees lens shape) of concave mirror 2040, the multi-disc lens of the 2nd optical system 2015, are configured at and circle The face 2014b that illumination region IR (pattern plane p2001) on the photomask M of tubular is optically conjugated.
Also, though the optical axis 2014a of the 1st optical system 2014 of lamp optical system IL is configured to and projection optical system PL The optical axis 2015a of (the 2nd optical system 2015) is coaxial, but the optical axis 2065a of collecting lenses 2065 is configured to relative 1st optical system The optical axis 2014a of system 2014 is eccentric toward -Z direction in the paper (XZ faces) of Figure 23.
Herein, to be created on multiple point source pictures of the face Ep of the emitting side of fly's-eye lens 2062 in be located at across optical axis 2065a illustrates the phenomenon of illuminating bundle as a example by two point sources that Z-direction is asymmetrical position are as SPa, SPd.
From point source as the light beam of SPa, by collecting lenses 2065 the almost parallel light beam irradiation illumination visual field is become Diaphragm 2064.Transillumination field stop 2064 peristome (in Y-direction be elongated slit-shaped) illuminating bundle EL1a, lead to Cross lens system 2066 and converge point source picture in being formed in the window of the reflecting surface of concave mirror 2040 of projection optical system PL Sfa。
From point source as the illuminating bundle EL1a of Sfa, as illustrated by Figure 21, by the 2nd of projection optical system PL the Optical system 2015 illuminates illumination region IR in cylindric pattern plane p2001 of the photomask M of cylindrical shape.By from this The imaging beam EL2a that point source is produced as the irradiation of the illuminating bundle EL1a of Sfa in pattern plane p2001, in the 2nd optical system System 2015 drives in the wrong direction and then is imaged out point source once again on concave mirror 2040 as Sfa '.By the light from lamp optical system IL Beam and the point source that is made are as Sfa and the point source being made by imaging beam EL2a are as that Sfa ' is located at point in the pd of pupil face is right The position of the relation of title.
Similarly, become almost parallel light beam irradiation by collecting lenses 2065 and shine as the light beam of SPd from point source Bright field diaphragm 2064.The illuminating bundle EL1d of the peristome of transillumination field stop 2064, by lens system 2066 in It is formed in the window of the reflecting surface of concave mirror 2040 and converges point source as Sfd.From point source as the illuminating bundle EL1d of Sfd, Illumination region IR in pattern plane p2001 of cylindrical shape is illuminated by the 2nd optical system 2015.By from the point source picture The irradiation of the illuminating bundle of Sfd and pattern plane p2001 produce imaging beam EL2a, in the 2nd optical system 2015 drive in the wrong direction into And point source is imaged out once again on concave mirror 2040 as Sfd '.The point being made by the light beam from lamp optical system IL Light source image Sfd is with the point source being made by imaging beam EL2d as Sfd ' is located at the position of point-symmetric relation in the pd of pupil face Put.
Point source is formed with as Sfa ', imaging beam EL2a, EL2d of Sfd ', be projeced in the reflecting surface of concave mirror 2040 In cylindric view field PA in substrate P, the picture projection of the photomask pattern in illumination region IR is in the throwing of substrate P In the PA of shadow zone domain.
Figure 24 shows the illuminating bundle EL0's of the fly's-eye lens 2062 for injecting generation lamp optical system IL shown in Figure 23 The composition of light supply apparatuses 2055.Light supply apparatuses 2055 possess solid state light emitter 2057, expansion lens (concavees lens) 2058, collecting lenses 2059 and light conducting member 2060.Solid state light emitter 2057 includes such as laser diode (LD), light-emittingdiode (LED) etc..From Solid state light emitter 2057 project illuminating bundle LB be converted into divergent beams by expansion lens 2058, by collecting lenses 2059 with What set convergence ratio (NA) was concentrated on light conducting member 2060 injects end face 2060a.
Light conducting member 2060 is such as optical fiber etc., injects the illuminating bundle LB of end face 2060a, preserves NA (numerical apertures Footpath) and project from end face 2060b is projected, almost parallel illuminating bundle EL0 is converted into by lens system 2061 (collimator). Lens system 2061, the beam diameter of illuminating bundle EL0 is adjusted to irradiate the face entirety for injecting side of fly's-eye lens 2062.Additionally, Though the diameter of single optical fiber is such as 300 μm, when the light intensity of the illuminating bundle LB from solid state light emitter 2057 is larger, Also can be by a plurality of close fiber optic ground harness.
Figure 25 is that the face Ep of the emitting side of the fly's-eye lens 2062 watched in Figure 23 from the side of collecting lenses 2065 is (flat with YZ faces The more several point sources for OK) being formed are as the ordered state of SP.When in YZ faces, by the face Ep of the emitting side of fly's-eye lens 2062 Central point when being set to 2062a, this central point 2062a is located on the optical axis 2065a of collecting lenses 2065.
As shown in figure 25, the fly's-eye lens 2062 of this embodiment includes the optical axis being arranged in collecting lenses 2065 Multiple lens important document 2062E in 2065a orthogonal face.Each of multiple lens important document 2062E has in the elongated rectangle of Y-direction Section, in Y-direction and the tight harness of Z-direction.Though form point source picture (point) in the center of each lens important document 2062E ejecting ends SP, but this is the conjugate image of the injection end face 2060b of the light conducting member 2060 (optical fiber) in Figure 24.Also, when watching in YZ faces, Multiple lens important document 2062E are by harness into each point source as relative central points 2062a (optical axis 2065a) of SP are non-dots pair each other Claim.
In example shown in Figure 25, when the optical axis 2065a faces parallel with XY faces comprising collecting lenses 2065 is set to During p2006, if compared with this face p2006 more positioned at+Z sides lens important document 2062E group be upper lens important document group 2062U, compared with this Groups of the face p2006 more positioned at the lens important document 2062E of-Z sides is lower lens important document group 2062D, then in upper lens important document group Between 2062U and lower lens important document group 2062D, be by position stagger lens important document 2062E Y-direction size 1/2.Its knot Really, the multiple point sources being dispersed in upper lens important document group 2062U as SP be dispersed in lower lens important document group 2062D As SP, relative be also asymmetrical configuration with the line parallel with Y-axis that be passing through central point 2062a to multiple point sources.
Why section shapes of each lens important document 2062E of fly's-eye lens 2062 in YZ faces is configured to extend Y side To rectangle, be in order to coordinate Figure 23 in illumination field stop 2064 slit-shaped openings shape it is therefore.Also with reference to Figure 26 Illustrate its appearance.
Figure 26 is the figure of the illumination field stop 2064 watched in Figure 23 in YZ faces.Formed in illumination field stop 2064 Have in the peristome 2064A that Y-direction is elongated rectangular-shaped (or trapezoidal shape), each point source from fly's-eye lens 2062 is as SP Light beam by collecting lenses 2065 illumination field stop 2064 on become the rectangular-shaped illumination light comprising peristome 2064A Beam EL1 is overlapped.When by the opening center configuration of peristome 2064A on the optical axis 2065a of collecting lenses 2065, illumination The optical axis 2014a of the 1st optical system 2014 of optical system IL, it is inclined toward +Z direction by the opening center from peristome 2064A The position of the heart.
Figure 27 be can be used in from the viewing of the side of the 2nd optical system 2015 of projection optical system PL it is saturating by the compound eye of Figure 25 The appearance of the reflecting surface p2004 (being configured at pupil face pd) of the concave mirror 2040 that the point source that mirror 2062 is generated is distributed as SP.Concave surface The reflecting surface p2004 of mirror 2040 is conjugated due to the face Ep with the emitting side of fly's-eye lens 2062, therefore the multiple points shown in Figure 25 Light source image SP's (lens important document 2062E) is distributed as the left and right in reflecting surface p2004 (pupil face pd) as shown in figure 27, inverts up and down Point source as the distribution of Sf (black circle).
As illustrated by previously with Figure 22, in the reflecting surface p2004 of concave mirror 2040, to make multiple point sources transmit as Sf The relative central point 2044 (optical axis 2015a) of window portion 2042 be configured to non-point symmetry.In the example of Figure 27, window portion 2042 be formed as in The slit-shaped of the elongated extension of Z-direction is arranged in multiple point sources of string as each illuminating bundle of Sf converges so as to come from Z-direction Whole transmission.Also, locate beyond the slit-shaped window portion 2042 in reflecting surface p2004, to make the lighting area from cylindric photomask M The high reflection portion that the imaging beam of the pattern in the IR of domain efficiently reflects.
Multiple point sources as Sf, the relative optical axis 2015a comprising the 2nd optical system 2015 and with median plane pc (Figure 21) just Plane p2005 of friendship is configured to non-face symmetrically, and the Y-direction size of each window portion 2042 of slit-shaped is narrowly set as not covering Point source is as the degree of Sf.As illustrated by with Figure 23, from by multiple point sources of each window portion 2042 as each light beams of Sf (illuminating bundle EL1) overlaps the photograph in pattern plane p2001 of the cylindric photomask M of irradiation by the 2nd optical system 2015 Area pellucida domain IR.Whereby, illumination region IR is illuminated with homogeneous Illumination Distribution.
The reflected light (imaging beam EL2) of the photomask pattern occurred in illumination region IR of pattern plane p2001 Though the reflecting surface p2004 of concave mirror 2040 can be back to, imaging beam EL2 becomes once again point source in reflecting surface p2004 Become detached distribution as Sf '.As illustrated by with Figure 22, it is created on many on reflecting surface p2004 by imaging beam EL2 Several point sources as the distribution of Sf ' (particularly 0 time diffraction light), be with respect to central point 2044 with as illuminating bundle EL1 More several point sources are distributed as point-symmetric relation as Sf's.
As shown in figure 27, the multiple window portions 2042 being distributed as Sf with the more several point sources as illuminating bundle EL1 sources For the region on the reflecting surface p2004 of point-symmetric relation, due to being high reflection portion, therefore reflecting surface is imaged in once again Point source on p2004 is reflected with hardly losing as Sf ' (also comprising 1 diffraction light), reaches substrate P.
[variation 1 of the 11st embodiment]
Additionally, in Figure 27, even if in the reflecting surface p2004 of concave mirror 2040 and comprising projection optical system PL (the 2nd light System 2015) optical axis 2015a the line that intersects of plane p2005 (parallel with XY faces) on part have as illumination light electron gun Point source as the situation of Sf, as long as by point source as the part that Sf is located at is set to window portion such as previous configuration condition 2042, and reflecting part (light shielding part) will be set to for point-symmetric region with respect to central point 2044 and the window portion 2042.
But, in point source as Sf (window portion 2042) is positioned at the position of central point 2044, if with the point source as Sf is as source Illumination region IR on the photomask M of the illuminating bundle irradiation cylindrical shape of head, then because the imaging beam for reflecting in this place can be received Hold back into the central point 2044 (window portion 2042) in reflecting surface p2004 and form point source as Sf ', therefore have not become and shoot to substrate P Imaging beam situation.Therefore, it can near the central point 2044 of reflecting surface p2004 without point source as the mode of Sf, change Become the arrangement of the more several lens important document 2062E for constituting fly's-eye lens 2062, or in lens corresponding with the position of central point 2044 Important document 2062E applies photomask (inking).
Also, in this embodiment, as shown in Figure 25 and Figure 27, though will be formed in the face of the emitting side of fly's-eye lens 2062 The point source of Ep is as the window of the configuration (arrangement of lens important document 2062E) with the reflecting surface p2004 for being formed at concave mirror 2040 of SP The configuration in portion 2042 coordinates one to one, but not necessarily has it necessary.That is, for the emitting side for being formed at fly's-eye lens 2062 More several point sources of face Ep can reach reflecting surface p2004 (pupils as injecting from the face p2003 of the dorsal part of concave mirror 2040 in SP Face pd) a part of point source as Sf, can also be not provided with window portion 2042 and keep the state of reflecting surface to carry out shading.The shading, also Can by the region being located at as Sf in the point source that should be covered in the face p2003 of the dorsal part of concave mirror 2040 formed photomask or Light absorbing zone is similarly realizing.
[variation 2 of the 11st embodiment]
The imaging beam EL2 for injecting concave mirror 2040 from the 2nd optical system 2015 for constituting projection optical system PL is (most Individual point source is as Sf '), also can be not necessarily intended to fully reflective in concave mirror 2040.For example, in the reflecting surface of concave mirror 2040 P2004, in addition to radioparent window portion 2042 and reflecting part, can also arrange the multiple points covered as illuminating bundle EL1 sources Light source image Sf is with the multiple point sources formed by the convergence of imaging beam EL2 as a part of point of one or both of Sf ' The light shielding part of light source image.
The 11st embodiment is this concludes the description of, in this embodiment, as shown in Figure 21 or Figure 22, from illumination optical system The illumination light of system IL, injects from the dorsal part of concave mirror 2040 of the pupil face pd for being configured at projection optical system PL, by constituting projection 2nd optical system 2015 of optical system PL and the plane of reflection 2041a of the upside of prism mirror 2041, as illuminating bundle EL1 reaches illumination region IR on cylindric photomask M.
If the imaging the examination of road of projection optical system PL in this embodiment is divided into into illumination region IR (object plane) The 1st light path and concave mirror 2040 (pupil face pd) to concave mirror 2040 (pupil face pd) to the 2nd light path of view field PA (image planes), Then the 1st light path doubles as being the oblique illumination that falls that illumination region IR is directed at from the illuminating bundle of lamp optical system IL to be used Light path.
As described above, processing meanss U3 (exposure device) of this embodiment, due to being to be configured at projection optical system PL Pupil face or the reflecting mirror near it be efficiently spatially separated from the oblique illumination mode that falls of illuminating bundle and imaging beam, because It is simple that this constitutes can device.Also, with compared by way of imaging beam the differential separation illuminating bundle of polarized condition, nothing Need to constitute can device simple using larger polarizing beam splitter or wavelength plate etc..
Furthermore, in the case where illuminating bundle mode detached with imaging beam polarisation is made, though have need to correspond to because caused by wavelength plate Corrugated turmoil or the problem because of the extinction ratio in polarizing beam splitter cause the situation that projection image's characteristic (contrast, aberration etc.) is deteriorated, But in this embodiment, almost do not have because of the deterioration in characteristics of projection image caused by the reason such as this, can suppress ill-exposed and send out It is raw.Also, processing meanss U3 of this embodiment are due to being assembled with illumination by a projection optical system part in anti- The oblique illumination mode that falls of emitting photomask M, thus with the situation phase of the photomask assembled inside lamp optical system in transmission-type Than especially the design freedom in lamp optical system is improved.
In this embodiment, the light supply apparatuses 2055 shown in Figure 24, the size due to point source picture can be reduced, thus assume that Using the strong LASER Light Source of radiating light directivity (such as the excimer laser such as KrF, ArF, XeF), but it is not limited to this.Example Such as, the weak laser diode or luminous of the lamp source or radiating light directivity of the bright line light such as radiation g lines, h lines, i lines can also be used Diode (LED) etc..
The device inspection apparatus 2001 (Figure 20) of this embodiment, the composition due to processing meanss U3 (exposure device) can be made Simply, therefore the manufacturing cost of device can be lowered.Also, because processing meanss U3 are while by substrate P along rotating drum 2030 Outer peripheral face p2002 transports the mode of one side scan exposure, therefore energy efficiency performs well exposure-processed.As a result, device system Making system 2001 can manufacture device with good efficiencies.
[the 12nd embodiment]
Secondly, the 12nd embodiment is illustrated with reference to Figure 28.This embodiment is by with illustrated by previous Figure 25, Figure 27 Fly's-eye lens 2062 is constituted with the point source that is formed in the reflecting surface p2004 of concave mirror 2040 as the configuration change of Sf, pair with Above-mentioned embodiment identical constitutive requirements give and above-mentioned embodiment identical symbol, simplify or the description thereof will be omitted.
Figure 28, is the reflection that concave mirror 2040 is watched in the orthogonal YZ faces of the optical axis 2015a with projection optical system PL The figure that how multiple lens important document 2062E of fly's-eye lens 2062 equivalently configure in the p2004 of face.With multiple lens important documents The central point 2044 (optical axis 2015a) of the reflecting surface p2004 of 2062E (point source is as Sf) opposed concaves mirror 2040 becomes non-each other Point-symmetric arrangement mode, closest to central point 2044 lens important document 2062E center from central point 2044 toward Y-direction and Z Direction displacement.
In this embodiment, the section shape (shape in YZ faces) of each lens important document 2062E of fly's-eye lens 2062 As illustrated by with previous Figure 26, it is set as the rectangle phase with the rectangular aperture portion 2064A comprising illumination field stop 2064 As shape, but herein, the ratio Py/Pz of Y-direction section size Py and Z-direction section size Pz is set at essentially 4.Therefore, divide The more several point sources in reflecting surface p2004 (pupil face pd) are distributed in as Sf is also in Y-direction with the spacing (pitch) of section size Py Arrangement, is arranged in Z-direction with the spacing of section size Pz.
As long as common fly's-eye lens, though each lens important document 2062E centers can be straight with two sides of Z-direction toward Y-direction Be arranged, but in this embodiment, make to come in each displacement Y of Y-direction each other in the adjacent lens important document 2062E of Z-direction Configuration.If this displacement Δ Y to be set to 1/4 or so of Y-direction section size (spacing of the arrangement) Py of lens important document 2062E, Then each point source can be located at past each other ± 45 degree in YZ faces, ± 135 degree of the detached position of either direction as Sf.
In Figure 28, when it is specific go out positioned at reflecting surface p2004 central point 2044 pole nearby, surround central point 2044 four When individual point source is as Sf, the position of centre of gravity in the region (herein as inclined rectangle) surrounded as Sf with four point sources be from The displacement of central point 2044.In other words, the position of centre of gravity in the region for being surrounded as Sf with four point sources is located at and central point 2044 Different positions.By the way that concave mirror 2040 and position relationship of the fly's-eye lens 2062 in YZ faces are set as that this kind of position can be produced Move, and can be by all point sources as each of Sf is configured each other with relative central point 2044 as non-point-symmetric relation.This thing Mean to make at any time relative to central point 2044 and each point source as the region on reflecting surface p2004 that Sf is point-symmetric relation into For reflecting part.
Though corresponding to the point source configured more than such as the distribution of Sf the shape in the reflecting surface p2004 of concave mirror 2040 Into the window portion 2042 for making each point source transmit as Sf, but the shape of the window portion, size, configuration can consider several forms.It is simple and Speech, as shown in figure 28, makes only to make a point source coordinate point source as the arrangement of Sf as circular window portion 2042H that Sf is transmitted It is distributed in the comprehensive forms of reflecting surface p2004.
Used as other forms, also can be makes the direction for inclining 45 degree with respect to Y-direction on reflecting surface p2004 be arranged in string All point sources converge channel-shaped window portion 2042K of whole transmission as Sf.When with a succession of point source picture in this window portion 2042K When Sf irradiates illumination region IR of cylindric photomask M as the illuminating bundle in source, the reflected beams (imaging beam) are Become point source on the reflecting surface p2004 of concave mirror 2040 as Sf ' (also comprising 1 time around image) is converged on from making point source as Sf The reflector space 2042K ' of the window portion displacement of transmission.Additionally, also can be the direction for making relative Y-direction incline 45 degree is arranged two Individual point source is as window portion 2042L of ellipse (or Pear-Shaped) that Sf is the whole transmission of one group of remittance.Whether any window portion 2042H, 2042K, 2042L, strongly are reduced in the range of not covering from the illumination light of each point light source image Sf local Formed.
In the 12nd embodiment above, the Y-direction displacement Δ Y of the lens important document 2062E of fly's-eye lens 2062 can appoint Meaning setting, the ratio Py/Pz of the section size of lens important document 2062E is also not necessarily intended to be set to integral multiple.
[the 13rd embodiment]
Secondly, the 13rd embodiment is illustrated with reference to Figure 29.This embodiment is also with regard to fly's-eye lens in the same manner as Figure 28 The deformation that 2062 composition is configured with the point source being formed in the reflecting surface p2004 of concave mirror 2040 as Sf.The composition of Figure 29 In, the center of multiple lens important document 2062E of fly's-eye lens 2062 in YZ faces linear array in Y-direction and Z-direction.
In the situation of this kind of fly's-eye lens 2062, the point source of emitting side of each lens important document 2062E is formed at as Sf, in Y-direction is arranged with the spacing of section size Py, is arranged with the spacing of section size Pz in Z-direction.This kind of situation is also with Figure 28's It is general illustrated by 12nd embodiment, when being conceived to central point 2044 (optical axis of the position in the reflecting surface p2004 of concave mirror 2040 Pole 2015a) nearby, surround central point 2044 four point sources as Sfv1, Sfv2, Sfv3, during Sfv4, with four point light The position of centre of gravity Gc in the region (rectangle) that source image Sfv1～Sfv4 is surrounded is from the displacement of central point 2044.In other words, center of gravity position Gc is put positioned at the position different from central point 2044.
By the way that concave mirror 2040 and position relationship of the fly's-eye lens 2062 in YZ faces are set as that this kind of displacement can be produced, And can be by all point sources as each of Sf is configured each other with relative central point 2044 as non-point-symmetric relation.Accordingly, it is capable to Relative central point 2044 and each point source is set to become reflection as the region on reflecting surface p2004 that Sf is point-symmetric relation at any time Portion.
Additionally, the reflecting surface p2004 of the concave mirror 2040 in this embodiment, is fit lens important document 2062E (point sources As Sf) arrangement pitches be formed with to make point source as Sf circular window portion 2042H not transmitted.
[the 14th embodiment]
Secondly, the 14th embodiment is illustrated with reference to Figure 30.This embodiment is also with regard to multiple in the same manner as Figure 28, Figure 29 The deformation that the composition of eyelenss 2062 is configured with the point source being formed in the reflecting surface p2004 of concave mirror 2040 as Sf.Figure 30 Composition in, though multiple lens important document 2062E (section shape is in the elongated rectangle of Y-direction) of fly's-eye lens 2062 are in Y Direction is arranged with the spacing of section size Py, is closely aligned with the spacing of section size Pz in Z-direction, but is arranged in Y-direction String amount lens important document 2062E group, in each column interaction of Z-direction change in the Y direction (stagger) position ground arrangement.
In the situation of fly's-eye lens 2062, though point source is created on illumination light (such as Figure 24 received from light source as Sf In EL0) all lens important document 2062E injection side, but in order to be shielded in the point source as opposed concave mirror in Sf The central point 2044 of 2040 reflecting surface p2004 for point-symmetric configuration relation each other two point sources as a side of Sf, and Occulter 2062s is formed in corresponding lens important document 2062E.
In the composition of Figure 30, occulter 2062s (metallic film etc.) is formed with recessed in corresponding lens important document 2062E Selected point source is as Sf random numbers in the reflecting surface p2004 of face mirror 2040 and is equably distributed.Using this kind of fly's-eye lens When 2062, also formed to the round window that makes point source transmit as Sf in the reflecting surface p2004 of concave mirror 2040 as shown in figure 30 Portion 2042H.
[the 15th embodiment]
Secondly, the 15th embodiment is illustrated with reference to Figure 31.In this embodiment, compound eye illustrated so far is not used Lens 2062, and pass through light source image forming portion and more several point sources are formed in the reflecting surface p2004 of concave mirror 2040 as Sf.Figure 31 show the section comprising concave mirror 2040 in face parallel with XZ faces and comprising optical axis 2015a (central point 2044), in a light Each window portion 2042H is formed with the reflecting surface p2004 that source image Sf (Sfa) is located at.
Concave mirror 2040, the e.g. concave side in the mother metal of the high technology ceramics or glass ceramics of low-thermal-expansion rate are formed The person that has reflectance coating.In the reflectance coating to form multiple window portions 2042H with previous each embodiment identical condition, in this enforcement In form, the mother metal in the window portion 2042H rear is formed makes the lamp optical system IL part through hole that i.e. optical fiber Fbs passes through (diameter of 1mm degree).
The ejecting end of each optical fiber Fbs plays the function of point source picture, is arranged at the face roughly the same with reflecting surface p2004. The illumination light for injecting end of each optical fiber Fbs is irradiated in, the illuminating bundle projected from the ejecting end of optical fiber Fbs is configured to (for example EL1a) there is predetermined value aperture (dispersion angle characteristic).Also, setting from the direction of the illuminating bundle of each optical fiber Fbs ejecting ends Due to consistent with the direction by the chief ray of the ejecting end (point source picture).
In the composition shown in Figure 31, due to do not use fly's-eye lens 2062 and optical fiber Fbs ejecting end generate it is more several Point source as Sf each, though therefore need the optical fiber of correspondence window portion 2042H number, can make the light source be to concave mirror 2040 System that is, lamp optical system IL integral miniaturization.
Though also, be provided with the aperture of the ejecting end insertion of optical fiber Fbs in concave mirror 2040, also can bury in each of the aperture If thin light pipe (cylindric bar) of quartz system etc., in the light pipe, each side of injecting arranges the ultraviolet with collecting lenses Near-infrafed photodiodes (LED), and make the injection side of each light pipe consistent with the reflecting surface p2004 of concave mirror 2040.
[the 16th embodiment]
Secondly, reference picture 32A, 32B, Figure 33 A, 33B, 33C illustrate the 16th embodiment.It is to take in this embodiment For the fly's-eye lens 2062 in lamp optical system IL, and bar lens (glass or quartz of corner post shape) are used equably to illuminate Illumination region IR on cylindric photomask M.
Figure 32 A are to watch the light conducting member 2060 (optical fiber) of the light for guiding light source to projection optical system PL from Y direction The top view of the light path of (the 2nd optical system 2015), Figure 32 B are the top views of the light path that Figure 32 A are watched from Z-direction.Figure In 32A, 32B, constitute from the light path of illumination field stop 2064 to projection optical system PL, due to the composition with previous Figure 23 It is identical, therefore the explanation omission of the part.
Lamp optical system IL shown in Figure 32 A, 32B, possesses the light conducting member 2060, collecting lenses illustrated with Figure 24 2093rd, bar lens 2094, illumination field stop 2064, lens system 2066 etc..Projection optical system PL after concave mirror 2040 The composition of (the 2nd optical system 2015) is identical with previous Figure 21, Figure 23.
From the illuminating bundle EL0 that light conducting member (optical fiber) 2060 is projected, by collecting lenses 2093 bar lens are converged on 2094 inject end face 2094a or its near.Section shape of the bar lens 2094 along YZ faces (injects end face 2094a, projects end face 2094b), the rectangle of the trapezoidal or rectangular peristome 2064A (Figure 26) comprising illumination field stop 2064 is formed as.Its Section shape is big with the section shape of the lens important document 2062E of the fly's-eye lens 2062 shown in previous Figure 25, Figure 28～Figure 30 Cause similar shape.
It is in bar lens in the illuminating bundle EL0 for injecting end face 2094a convergences in the situation using bar lens 2094 Inside 2094, many movement for several times between the side 2094c and with XY face parallel side 2094d parallel with XZ faces and it is repeatedly interior Injection end face 2094b is proceeded to after portion's reflection.In the situation of bar lens, though the Illumination Distribution of illumination light is the most homogeneous for ejecting end Face 2094b, but its homogeneity can be more and better with the number repeatedly of internal reflection.Therefore, make the injection end face 2094b and with The face 2014b of the illumination region IR conjugation on cylindric photomask M is as one man configured.
Due to this embodiment bar lens 2094 section be rectangle, therefore to side 2094c photograph The order of reflection of Mingguang City, compared with to side 2094d illumination light order of reflection it is few.Illuminating bundle EL0 is in bar lens The number of times of 2094 inner faces reflection, think that mode more than twice sets bar lens 2094 from the viewpoint of illumination homogeneity from improving Length etc..Further, since the shape of the injection end face 2094b of bar lens 2094 defines the outer rim of illumination region IR, therefore shine Bright field diaphragm 2064 also can be omitted.
Then, if injecting connecting rod lens 2094 central points of the end face 2094a in YZ faces and inject end face 2094b The line of the central point in YZ faces is set to central shaft AX2003, though the then optical axis of this central shaft AX2003 and projection optical system PL 2015a (the optical axis 2014a of lens system 2066) is parallel, but eccentric toward Z-direction.Further, though the ejecting end of light conducting member 2060 is matched somebody with somebody It is placed on the optical axis 2093a of collecting lenses 2093, but optical axis 2093a is with respect to the past-Y sides of the central shaft AX2003 of bar lens 2094 To displacement configuration.
By this toward the displacement of -Y direction, and the more several points in the reflecting surface p2004 of concave mirror 2040 can be created on It is non-point symmetry that light source image Sf is configured to the central point 2044 (optical axis 2015a) of relative reflection face p2004.According to Figure 33 A～33C This thing is described in detail in detail.Figure 33 A are the figures that end face 2094b sides watch collecting lenses 2093 toward X-direction that projects from bar lens 2094, are schemed 33B is that the figure of bar lens 2094 is watched toward X-direction from the side of lens system 2066, and Figure 33 C are to watch concave mirror 2040 from X-direction Reflecting surface p2004 figure.
As shown in figure 33 a, the section of bar lens 2094 is with the side 2094d parallel with XY faces and the side parallel with XZ faces The rectangle that face 2094c specifies, the central shaft AX2003 of bar lens 2094 is relatively past with the optical axis 2093a of collecting lenses 2093 Y-direction is eccentric.Also, as shown in Figure 33 B, relative to the optical axis 2014a (2015a) of lens system 2066, the center of bar lens 2094 Axle AX2003 is eccentric toward Z-direction.
In this kind of composition, the concavees lens and lens system 2066 as the mother metal of concave mirror 2040, are by bar lens 2094 The fourier transform faces (pupil face pd) of face 2014b that are located at of injection end face 2094b be formed at the reflecting surface of concave mirror 2040 On p2004.Therefore, as shown in Figure 33 C, on the reflecting surface p2004 of concave mirror 2040 more several point sources as Sf in Y-direction with Space D Sy, formed with space D Sz in Z-direction.The grade point source, as Sf, is to inject end face 2094a as in bar lens 2094 The virtual image of the point picture of the illuminating bundle EL0 of convergence occurs.
Multiple point sources as Sf, because the section of bar lens 2094 is rectangle, therefore the side parallel with the long side of its section Point source to (Y-direction) as the arrangement pitches DSy of Sf, compared with the direction (Z-direction) parallel with minor face point source as the row of Sf Column pitch DSz length.Also, as shown in Figure 32 A, 32B, the internal reflection number of times of the illumination light in bar lens 2094, due to Z-direction It is more than Y-direction, therefore the point source on the reflecting surface p2004 of concave mirror 2040 is created on as the number of Sf, also it is that Z-direction compares Y Direction is more.In the example of Figure 33 C, five point sources are arranged as Sf, three point sources are arranged as Sf in Y-direction in Z-direction.
Furthermore, by making the central shaft AX2003 of bar lens 2094 DIYU Y relative with the optical axis 2093a of collecting lenses 2093 Direction is eccentric, and is created on the point source on the reflecting surface p2004 of concave mirror 2040 as the distribution of Sf, with respect to central point 2044 (optical axis 2015a) is overall eccentric toward Y-direction, can be by point source as each of Sf is configured to relative central point 2044 for non-dots each other Symmetrical relation.
It is same with the embodiment shown in previous Figure 27, in the reflecting surface p2004 of concave mirror 2040, make to be arranged in Z-direction Multiple point sources into string are to be formed with three row with space D Sy in the Y direction as Sf converges the channel-shaped window portion 2042 of whole transmission.Each window The Y-direction width in portion 2042, is into as little as possible in the range set for not covering the illuminating bundle with point source as Sf as source. It is non-point-symmetric configuration each other that the window portion 2042 of these channel-shaped is also formed as relative central point 2044.
In the composition of Figure 33 C, the Y side of the central shaft AX2003 of the bar lens 2094 and optical axis 2093a of collecting lenses 2093 It is set to offset, on the reflecting surface p2004 (pupil face pd) of concave mirror 2040, closest to (the optical axis of central point 2044 Point source 2015a) is set to the window portion 2042 for being arranged in Y-direction as Y-direction distance (being set to Yk) of Sf to central point 2044 Interval (being set to Yw) less than half that is, Yk ＜ (Yw/2).
As described above, if using as the point light in the source of the illuminating bundle EL1 of illumination region IR of the cylindric photomask M of irradiation Source image Sf is configured on the reflecting surface p2004 of concave mirror 2040 (pupil face pd), then the illumination region from cylindric photomask M The imaging beam EL2 that IR is produced, is as shown in Figure 33 C, point source to be become on reflecting surface p2004 as Sf is around image Sf ' (bag Containing 0 light and ± 1 diffraction light etc.) and be distributed.On reflecting surface p2004, around image Sf ' put light with illuminating bundle EL1 sources It is point-symmetric position that source image Sf is located at relative central point 2044.
In this embodiment, because above-mentioned is set as Yk ＜ (Yw/2) apart from Yk with the relation of interval Yw, therefore pass through Imaging beam EL2 and be created on multiple around image Sf on concave mirror 2040 (pupil face pd) ', be both formed in from window portion 2042 and offset Reflecting part on.Thus, imaging beam EL2 reflects with hardly losing in the reflecting part of concave mirror 2040, and such as previous figure Shown in 21, the view field PA being projeced in substrate P that circumferentially face p2002 keeps.
As described above, even with the situation of bar lens 2094, remaining to by making to inject end face in bar lens 2094 The convergence position of the illuminating bundle EL0 on 2094a from central shaft AX2003 displacements, by more several point sources as each of Sf sets The central point 2044 for being set to the reflecting surface p2004 of opposed concave mirror 2040 is non-point-symmetric relation each other.
[the 17th embodiment]
Secondly, the composition of processing meanss (exposure device) U3 of the 17th embodiment is illustrated with reference to Figure 34, Figure 35.This enforcement The exposure device of form, is in order to the Y-direction size in the pattern exposure region in correspondence substrate P is than the projection shown in previous Figure 21 Illumination region IR of optical system PL or the Y-direction size of view field PA are big, and multiple projection optical systems are arranged in Y-direction Row, with Y-direction extension actual effect exposure possible range.
Therefore, it is necessary to the pattern of cylindric photomask M is projected in substrate P as erect image.Previously Figure 21 institutes Projection optical system PL shown, is in the Y direction reversion though the X-direction of the photomask pattern picture being projected in substrate P is upright 's.Therefore, by the way that the projection optical system of identical composition one in front and one in back (tandem) is arranged, you can the throwing for inverting Y-direction Image is inverted once again in Y-direction, in view field PA of its result in substrate P, is allowed to as just in X-direction and the side of Z-direction two Standing statue.
Figure 34 shows the overall schematic configuration of the exposure device of this embodiment, and Figure 35 shows multiple projection optical systems The configuration relation of each illumination region IR for being formed and view field PA, orthogonal coordinate system XYZ of each figure, the reality with previous Figure 21 Apply coordinate system set in form consistent.Also, pair same with the component or important document of the exposure device shown in previous Figure 21, Figure 23 Same-sign is given Deng person.
From substrate P that transport path upstream moves, rotation is wound in by conveyance cylinder or guide member etc. (not shown) After turning an outer peripheral face part for reel 2030, transported toward downstream by guide member (not shown) or conveyance cylinder.2nd drive division 2032, it is that rotating drum 2030 turns clockwise driving around Pivot axle AX2002, substrate P is moved with certain speed Send.Each view field PA2001～PA2006 of six projection optical system PL2001～PL2006 is located at rotating drum 2030 The part of substrate P is wound with cylindric outer peripheral face.It is corresponding with each of six view field PA2001～PA2006, in Six illumination regions IR 2001 of setting on the outer peripheral face (cylindric photomask pattern face) of cylindric photomask M～ PA2006。
Six projection optical system PL2001～PL2006 are identical optics composition, are divided into relative comprising cylindrical shape Photomask M Pivot axle AX2001 and rotating drum 2030 Pivot axle AX2002 median plane pc (with YZ faces It is parallel) it is arranged at projection optical system PL2001, PL2003, PL2005 (the also collectively referred to as projections of odd number in left side (-X direction) Optical system PLo), (also it is collectively referred to as with projection optical system PL2002, PL2004 on right side (+X direction), PL2006 is arranged at Projection optical system PLe of even number).
Projection optical system PL2001 of this embodiment～PL2006, possess projection optical system PL shown in Figure 21 with Fall the lamp optical system IL2001～IL2006 of oblique illumination.Due to its composition it is identical with Figure 21 therefore typically simple Illustrate projection optical system PL2001 and lamp optical system IL2001.Lamp optical system IL2001, is injected from light source The illuminating bundle EL0 of device 2055, the unit from projection optical system PL2001 epimere is (with Figure 21 identical projection optical systems PL the dorsal part of concave mirror 2040 that pupil face) is configured generates more several point sources as Sf in reflecting surface p2004.With the point source picture Sf is the illuminating bundle EL1 in source, and the plane of reflection 2041a in the upside of prism mirror 2041 is reflected, irradiation cylindrical shape Illumination region IR2001 on the outer peripheral face of photomask M.
The imaging beam EL2 of the photomask pattern reflection from illumination region IR2001, is reflected in plane of reflection 2041a Afterwards, reflect in concave mirror 2040, in reflecting surface (2041b) reflection of the downside of prism mirror 2041, in face p2007 (intermediary images Face p2007) formed photomask pattern aerial image (intermediary image).
The projecting cell of projection optical system PL2001 back segment is also possess prism mirror, multi-disc lens device, configuration In the equimultiple catadioptric projection system of the VHF of the grade of concave mirror 2078 in pupil face, in intermediate image plane p2007 intermediary image is formed After the reflection of concave mirror 2078, the plane of reflection 2076b reflections on the downside of prism mirror (2076) are reached imaging beam EL2 View field PA2001 in substrate P, generates the upright erect image of photomask pattern in view field PA2001.Additionally, projection The projecting cell of optical system PL2001 back segment (intermediate image plane is to view field), as long as due to making to be formed at intermediate image plane The intermediary image of p2007 images in once again the view field PA2001 in substrate P, thus in concave mirror 2078 reflecting surface not It is provided with the window portion 2042 of the reflecting surface p2004 for being formed at concave mirror 2040.
Projection optical system PL2001 configured as described above (other projection optical systems PL2002～PL2006 also phases Together), due to be so-called poly-lens mode an optical projection system, therefore nothing as projection optical system PL just like Figure 21 sometimes Method by by the chief ray of the central point in illumination region IR with matched somebody with somebody by the chief ray of the central point in view field PA2001 The situation being placed in median plane pc.
Therefore, as shown in figure 34, the projecting cell on the upside of projection optical system PL2001 (PL2003, PL2005 are also identical) The angle, θ 2001 (with reference to Figure 21) of plane of reflection 2041a of prism mirror 2041 be set as 45 ° of values in addition so that logical Pivot axles of the extended line D2001 of the chief ray of the central point in the IR2001 of over-illumination region toward cylindric photomask M AX2001.Similarly, the plane of reflection 2076b of the prism mirror 2076 of the projecting cell on the downside of projection optical system PL2001 Angle initialization be relative XY faces be 45 ° of values in addition so that the chief ray for passing through the central point in view field PA2001 Pivot axles AX2002 of the extended line D2001 toward cylindric photomask M.
With respect to median plane pc with projection optical system PL2002 of projection optical system PL2001 balanced configuration (PL2004, PL2006 are also identical) also similarly, the plane of reflection 2041a's of the prism mirror 2041 of the projecting cell of upside Angle, θ 2001 is set as 45 ° of values in addition, so that the extended line of the chief ray by the central point in illumination region IR2002 D2002 toward cylindric photomask M Pivot axle AX2001, the projecting cell of back segment prism mirror 2076 it is anti- It is 45 ° of values in addition that the angle initialization for penetrating plane 2076b is relative XY faces, so that by the central point in view field PA2002 Chief ray extended line D2002 toward cylindric photomask M Pivot axle AX2002.
As previously discussed, throwings of extended line D2001, the D2002 of chief ray with respect to the odd number that median plane pc is symmetrically inclined Projection optical system PLe of shadow optical system PLo and even number, though it is relative median plane pc balanced configurations when watching in XZ faces, But it is then in Y-direction offset configuration when XY faces are watched.Specifically, each projection optical system PL2001～PL2006 is set Into, be formed at cylindrical shape photomask M pattern plane on illumination region IR2001～PA2006 and the throwing being formed in substrate P Shadow zone domain PA2001～PA2006 becomes the configuration relation of Figure 35.
Figure 35, is that matching somebody with somebody for illumination region IR2001～IR2006 and view field PA2001～PA2006 is watched in XY faces The figure put, the illumination region of the figure in left side from the cylindric photomask M of the intermediate image plane p2007 side viewing for forming intermediary image IR2001～IR2006, the figure on right side is the throwing being supported on from the viewing of intermediate image plane p2007 side in substrate P of rotating drum 2030 Shadow zone domain PA2001～PA2006 person.Also, the symbol Xs in Figure 35, is the photomask M (rotating drum 2020) for showing cylindrical shape With the moving direction (direction of rotation) of rotating drum 2030.
In Figure 35, each illumination region IR2001～IR2006 has with the upper bottom edge of median plane pc (parallel with Y-axis) with The elongated trapezoidal shape on base.This means that each of the lamp optical system IL2001～IL2006 shown in Figure 34 possesses as previously schemed Illumination field stop 2064 shown in 26.Additionally, each projection optical system PL2001～PL2006 of Figure 34 is due to being in centre Image planes p2007 form intermediary image, therefore when field stop of the configuration with trapezoid-shaped openings at this, also can be by each illumination region The shape of IR2001～IR2006 is configured to simple oblong-shaped (size comprising trapezoid-shaped openings).
On the outer peripheral face of cylindric photomask M, the illumination region formed by projection optical system Plo of odd number The respective central point of IR2001, IR2003, IR2005 is located on the face Lo (perpendicular to XY faces) parallel with median plane pc, by idol Illumination region IR2002, IR2004 of several projection optical system PLe formation, the respective central points of IR2006 are located at and median plane On pc parallel face Le (perpendicular to XY faces).
If making each illumination region IR2001～IR2006 be trapezoidal so as to which the Y-direction size of bottom is A2002a so as to The Y-direction size of upper bottom edge is A2002b, then the respective central point of illumination region IR2001, IR2003 of odd number, IR2005 is in Y Direction is configured with being spaced (A2002a+A2002b), the respective central point of illumination region IR2002, IR2004 of even number, IR2006 Also configured with being spaced (A2002a+A2002b) in Y-direction.Illumination region IR2001, IR2003 but, relative to odd number, IR2005, illumination region IR2002, IR2004 of even number, IR2006 in the relative offset dimensions (A2002a+A2002b) of Y-direction/ 2.Additionally, X-direction distances of the face Lo and face Le from median plane pc is set as being equal to each other.
In this embodiment, each of illumination region IR2001～IR2006 is configured to along cylindric photomask M peripheries Adjacent to the end of illumination region of Y-direction, each other (trapezoidal hypotenuse portion) overlaps each other when the circumferential direction (Xs directions) in face is watched (overlap).Whereby, even if the Y-direction size of the area of the pattern A2003 of the photomask M of cylindrical shape is larger, also can ensure that culvert Cover its effective exposure area.Additionally, though area of the pattern A2003 is by the non-formation region A2004 encirclements of the pattern of frame-shaped, pattern Non-formation region A2004 is that the material to have extremely low reflectance (or high absorptivity) to illumination light is constituted.
On the other hand, as shown in Figure 35 right sides, the view field PA2001～PA2006 in substrate P, when in each illumination light When the illumination field stop 2064 such as Figure 26 is provided with system IL2001～IL2006, reflection can be become and be formed at cylindric light The configuration of the illumination region IR2001～IR2006 on mask M outer peripheral faces and shape (similar relation).Therefore, the projection of odd number The each central point of region PA2001, PA2003, PA2005 is located on the Lo of face, view field PA2002, PA2004, PA2006 of even number Each central point is located on the Le of face.
Additionally, in the figure on the right side of Figure 35, though substrate P along rotating drum 2030 outer peripheral face in circumferential direction (Xs directions) with Certain speed is transferred, but region A2007 shown in the oblique line in the figure, is relative by six view field PA2001～PA2006 In target light exposure amount (dosage) with 100% part being exposed.
Also, for example, by corresponding to illumination region IR2001 view field PA2001 expose region A2005 in+Y The subregion A2005a that the end (gable) in direction is exposed, not up to target light exposure amount.However, being moved in substrate P Send in Xs directions (circumferential direction), when being exposed to region A006 by the view field PA2002 corresponding to illumination region IR2002, The light exposure of the deficiency that adds, its result subregion A2005a is also exposed relative to target light exposure amount (dosage) with 100%.
In this way, the overall projection images of the area of the pattern A2003 of the photomask M outer peripheral faces of cylindrical shape are formed at, often in Cylindric photomask M mono- rotates the long side direction being needed on equimultiple repeatedly in substrate P.
Though additionally, by each illumination region IR2001～IR2006 directive projection optics system from cylindric photomask M By the center in each illumination region IR2001～IR2006 in the chief ray of each imaging beam EL2 of system PL2001～PL2006 The extended line D2001 of the chief ray of point, D2002 are set to intersect with Pivot axle AX2001 of cylindric photomask M, but not Necessarily there is it necessary, as long as the chief ray and Pivot axle that pass through any point in each illumination region IR2001～IR2006 AX2001 intersects.Similarly, each view field from each projection optical system PL2001～PL2006 directive substrates P The imaging beam EL2 of PA2001～PA2006 also similarly, as long as make arbitrary chief ray in its chief ray be unanimously to and rotate volume Extended line D2001, D2002 that Pivot axle AX2002 of cylinder 2030 is intersected.
Secondly, projection optical system PL2001～PL2006 and the lamp optical system shown in Figure 34 is illustrated using Figure 36 The concrete composition of IL2001～IL2006.Figure 36, though typically show projection optical system PL2001 and lamp optical system The detailed composition of IL2001, but others projection optical system PL2002～PL2006 and lamp optical system IL2002～ The composition of IL2006 is also identical.
As shown in figure 36, self-contained light conducting member 2060 is carried out with the light supply apparatuses 2055 (with reference to Figure 24) of lens system 2061 Illuminating bundle EL0, injects the fly's-eye lens 2062 (with reference to Figure 25, Figure 28～30) of lamp optical system IL2001.To be created on More several point source pictures of the face Ep of the emitting side of fly's-eye lens 2062 for source illuminating bundle, by collecting lenses 2065 Become homogeneous Illumination Distribution with the face 2014b of the photomask conjugation of configuration illumination field stop 2064.By illuminating visual field light The illuminating bundle of the peristome of door screen 2064, transmission lens are the 2nd light of 2066, projection optical system PL2001 upside (the 1st section) The mother metal (quartz etc.) of the concave mirror 2040 of system 2015, be formed at concave mirror 2040 reflecting surface p2004 window portion (2042), the 2nd optical system 2015, and then the plane of reflection 2041a in the upside of prism mirror 2041 is reflected past along prolongation The direction of line D2001, reaches illumination region IR on cylindric photomask M.
In the same manner as the composition of previous Figure 23, because the reflecting surface p2004 of concave mirror 2040 is configured at projection optics system Pupil face pd in the imaging beam of system PL2001, its reflecting surface p2004 are configured to the face Ep realities with the emitting side of fly's-eye lens 2062 It is conjugated in matter, therefore more several point source picture relaying persons of the face Ep of the emitting side of fly's-eye lens 2062 will be created on, is created on shape Into in the window portion 2042 of reflecting surface p2004.
Also, in the concrete composition of Figure 36, plane of reflection 2041a and the light of cylindrical shape in the upside of prism mirror 2041 is covered Between pattern plane p2001 of film M, it is provided with focusing amendment optical component 2080 along inclined extended line D2001 and moves optics structure with picture Part 2081.Amendment optical component 2080 is focused on, for example, is overlapped on the prism of two panels wedge shape reverse (in Figure 36 in X-direction be reverse) It is integral for transparent parallel flat.Slided by making this pair of prisms, the thickness as parallel flat can be changed, to be imaged The actual effect optical path length of light beam, and fine setting is formed at the focus state of the pattern image of intermediate image plane p2007 and view field PA2001.
As move amendment optical component 2081 with can be in Figure 36 the tilted Plane-parallel Transparent Materiel glass in XZ faces with can incline Tiltedly the Plane-parallel Transparent Materiel glass in orthogonal to that direction is constituted.By each inclination for adjusting the two panels parallel plate glass Amount, and can make to be formed at the pattern image of intermediate image plane p2007 and view field PA2001 a little displacement in X-direction or Y-direction.
Then, come across the picture of the photomask pattern in illumination region IR2001, by focus on amendment optical component 2080, On the upside of shifting amendment optical component 2081, the plane of reflection 2041a of prism mirror 2041, projection optical system PL2001 (the One section) the 2nd optical system 2015, the plane of reflection 2041b of prism mirror 2041, intermediate image plane p2007 is imaged in, in this Intermediate image plane p2007 can be configured makes view field's PA201 shapes become trapezoidal field stop 2075 as shown in figure 35.This feelings Also can be comprising field stop 2075 located at the peristome of the illumination field stop 2064 of lamp optical system IL2001 under shape The rectangle (rectangle) in trapezoid-shaped openings portion.
Become the imaging beam of intermediary image in the peristome of field stop 2075, by constituting projection optical system PL2001 The plane of reflection 2076a of downside (second segment) prism mirror 2076, the 2nd optical system 2077, prism mirror 2076 Plane of reflection 2076b, is projected on the view field PA2001 being wound in substrate P of the outer peripheral face p2002 of rotating drum 2030. The reflecting surface of the concave mirror 2078 contained by the 2nd optical system 2077 is configured at pupil face pd, the reflection of the downside of prism mirror 2076 Plane 2076b, is less than 45 ° with respect to the angle initialization in XY faces, so that the chief ray of imaging beam is inclined along relative median plane pc Extended line D2001 advance.
Then, in the concrete composition of Figure 36, in the plane of reflection 2076b of the downside of prism mirror 2076 be wound in rotation Multiplying power amendment optical component 2083 is provided between view field PA2001 in substrate P of reel 2030, it is by concavees lens, convex lens Mirror, three of concavees lens with predetermined distance arranged coaxial, in front and back concavees lens are to fix so as to convex lenss be displaced into optical axis (chief ray) direction.Whereby, be formed at the pattern image of view field PA2001, can maintain telecentricity image formation state, while Deng just expanding or shrinking small quantity.
Though additionally, do not show in Figure 36, being also provided with can make the arbitrary of prism mirror 2041 or prism mirror 2076 Side rotates on a little the rotation correction mechanism rotated around the axle parallel with Z axis.This rotation correction mechanism, e.g. makes shown in Figure 35 Each of multiple view field PA2001～PA2006 (and the photomask pattern picture being projected) rotate a little in XY faces.
More than, in the 17th embodiment, as shown in Figure 34, Figure 36, six groups of projection optical system PL2001～ PL2006 each, can with the illumination light with the chief ray intersected with Pivot axle AX2001 of cylindric photomask M, The oblique illumination that falls is carried out to each illumination region IR2001～IR2006 on cylindric photomask M outer peripheral faces (pattern plane).
Further, imaging beam is biased into, from each illumination region IR2001～IR2006 toward the figure of cylindric photomask M The chief ray that the normal direction of case face p2001 is advanced also is injected along the projection in substrate P of outer peripheral face p2002 from normal direction Region PA2001～PA2006.Accordingly, it is capable to reduce defocusing for projection image, ill-exposed grade is suppressed to process bad generation, its result Bad device can be suppressed to produce.
Also, each of projection optical system PL2001～PL2006, due to be cylindric photomask M outer peripheral face extremely The chief ray for being configured to imaging beam between prism mirror 2041 (plane of reflection 2041a) is inclined with respect to median plane pc, therefore In the configuration spatially of each projection optical system PL2001～PL2006, the condition for interfering with each other (collision) is alleviated.
Additionally, the plane of reflection of the plane of reflection 2076b of the downside of prism mirror 2041 and the upside of prism mirror 2076 2076a is relative to XY faces with 45 ° of angle initialization into by each the intermediate image plane of projection optical system PL2001～PL2006 The chief ray of the imaging beam of p2007 is parallel with median plane pc.
[variation of the 17th embodiment]
In the exposure device of the projection optical system for possessing poly-lens mode shown in Figure 34～36, though by barrel surface The photomask pattern of shape as projection exposure to the surface of substrate P for being supported to cylinder planar, but photomask M or substrate P are also Can be made either one flat bearing, or also can be by the composition of two side's flat bearings.For example, can as shown in figure 34 roll up for substrate P Be around in rotating drum 2030 and be supported to cylinder planar, photomask M parallel flat glass (quartz) is formed at as existing and Move linearly in the scan exposure mode of X-direction, or on the contrary, photomask M can be supported on the rotating drum 2020 such as Figure 34, base Bottom P can straight line transfers scan exposure mode in X-direction with the holding tool supporting of flat plane microscope carrier or air cushion, can Any one for above-mentioned two mode.
No matter though also, the supporting configuration of photomask M or substrate P is cylinder planar or plane, can be suitable for previously each reality The projection optical system and lamp optical system of form are applied, but as long as in the plane side parallel with XY faces is supported to, will The relative XY of the plane of reflection 2041a of the upside of prism mirror 2041 or the plane of reflection 2076b of the downside of prism mirror 2076 The angle of inclination in face is set to 45 °.In other words, as long as fitting through illumination region IR (object plane) center on photomask M Normal or the normal by view field PA (image planes) center in substrate P, by the master of the object plane side of projection optical system The chief ray of light or image planes side is tilted in XZ faces.
[the 18th embodiment]
Figure 37 is projection optical system PL (being PL2001 in the situation of the poly-lens mode) structure for showing the 18th embodiment Cheng Tu.Projection optical system PL (PL2001) of this embodiment, makes illumination region IR from cylindric photomask M outer peripheral faces (IR2001) reflectings surface of the imaging beam EL2 (chief ray is set to into EL6) of the photomask pattern in plane mirror 2100 2100a reflects, by (the VHF class of the 2nd optical system 2015 with the concave mirror 2040 that reflecting surface p2004 is configured in pupil face The catadioptric imaging system of type), it is allowed to reflect in the reflecting surface 2101a of plane mirror 2101, formed out in intermediate image plane Im The existing equimultiple intermediary image of the photomask pattern in illumination region IR (IR2001).
Further, the intermediary image of intermediate image plane Im is formed at, by the amplification imaging system with such as twice above multiplying power 2102 (having the optical axis 2102a parallel with Z axis) are projected in substrate P being supported by along the outer peripheral face p2002 parallel with XY faces View field PA (PA2001).Substrate P, it is flat FDB to be supported in surface by FDB layer The plane of pad is kept on tool HH.This embodiment also similarly, in constitute projection optical system PL (PL2001) concave mirror 2040 reflecting surface p2004, being formed with makes to be generated by the illumination light of lamp optical system IL (IL2001) from behind The window portion 2042 that transmits as Sf of more several point sources.
The amplification projection optical system poly-lens such as Figure 37 is made, in the big photomask pattern of exposure Y-direction size, is Will be comprising projection optical system PL (PL1) group of lamp optical system IL (IL2001) and plane mirror 2100,2101 in such as Shown in previous Figure 34, Figure 35, it is configured in XZ faces relative to median plane pc into symmetrical, in Y-direction configured separate in projection Y-direction end (gable) projection image part of region PA (PA2001) is overlapped.
In this embodiment, when median plane pc is Pivot axle AX2001 comprising cylindric photomask M and and XY During the vertical face in face (outer peripheral face p2002), projection optical system PL2001 of odd number, illumination region IR2001 of PL2003..., IR2003... each central point (point that such as chief ray EL6 passes through), due to the relative median planes of the chief ray EL6 of photomask side Pc is inclined, therefore in girth separating distance DMx from the cylindric outer peripheral face of photomask M with the intersection of median plane pc.Therefore, Projection optical system PL2002 of even number, illumination region IR2002 of PL2004..., each central point of IR2004... is also from circle The outer peripheral face of the photomask M of tubular is risen in girth separating distance DMx with the intersection of median plane pc.Therefore, the illumination region of odd number IR2001... it is the circumferential direction separating distance on cylindric photomask M with illumination region IR2002... of even number (2DMx)。
On the other hand, due to projection optical system PL2001 of odd number, the view field PA2001 of PL2003..., PA2003... each central point (point that such as chief ray EL6 passes through) is in substrate P from median plane pc toward X-direction separating distance DFx, therefore the view field PA2001... of the odd number and view field PA2002... of even number, separate in substrate P in X-direction Distance (2DFx).Therefore, each illumination region IR2001 on the photomask M that will be formed in cylindrical shape, IR2002... is respective Photomask pattern is identically formed when circumferential direction, if by projection optical system PL2001, the enlargement ratio of PL2002... is set to Mp, then need the relation for being set as meeting Mp (2DMx)=2DFx.Problem in Ruo Yin mechanisms and cannot be constituted with above-mentioned condition When, as long as then will be formed in illumination region IR2001 of the odd number on the photomask M of cylindrical shape, the photomask of IR2003... Illumination region IR2002 of pattern and even number, the photomask pattern of IR2004... is formed in circumferential direction relative misalignment.
[the 19th embodiment]
Figure 38 shows the pie graph of projection optical system PL of the 19th embodiment.The projection optical system of this embodiment PL, be with lens system 2103, lens system 2104, be configured at pupil face concave mirror (reflection optical component) 2040, deflection mirror 2106, 2107 and the composition of lens system 2108.
In this embodiment, the imaging beam EL2 of illumination region IR on the outer peripheral face of cylindric photomask M, It is the optical axis 2103a in lens system 2103, the VHF for passing through-X sides injects lens system 2103, and injects lens system 2104 (its optical axis 2104a is coaxial with optical axis 2103a).By the imaging beam EL2 of lens system 2103, in (its optical axis of concave mirror 2040 For 2104a) reflecting surface p2004 reflections, reflect toward -X direction in the reflecting surface p2106a of deflection mirror 2106, be conducted to lens system 2103rd, 2104, after outside the light path that concave mirror 2040 is formed, reflect toward -Z direction in the reflecting surface 2107a of deflection mirror 2107.
In the imaging beam EL2 of the deflection reflection of mirror 2107, view field PA is irradiated in by lens system 2108.By the above Light path, projection optical system PL will emerge from the photomask pattern picture in illumination region IR on photomask M and images in pass through With Figure 37 identicals constitute and in view field PA in substrate P by flat bearing.The projection optical system of this embodiment, Project especially for realizing amplifying with small-sized system, and be designed to not form intermediate image plane.Also, this projection optical system PL Cylindric photomask M sides chief ray EL6 extended line D2001, be set as the center of rotation with cylindric photomask M Axle AX2001 intersects, and the chief ray EL6 of substrate P side is set as vertical with by the surface of substrate P of flat bearing.
In Figure 38, can be designed to by giving the saturating of main enlargement ratio from the imaging beam EL2 of illumination region IR - X the sides of the optical axis 2108a (parallel with Z axis and opposed substrate P is vertical) of mirror system 2108.Therefore, excision is from lens system 2108 Optical axis 2108a plays the part of+X sides and is part of the projection to photomask pattern without help.Whereby, can reduced projection optics The size of the X-direction (scanning direction of substrate P) of system PL.
The present embodiment also in the same manner as previous Figure 21, Figure 23, Figure 31, Figure 32 A, 32B, Figure 37, lamp optical system IL With the dorsal part that light supply apparatuses 2055 are configured at concave mirror 2040, more several point sources are formed at concave mirror 2040 as Sf is created on In the window portion (2042) of reflecting surface p2004 (being configured at pupil face).Distribution on the reflecting surface p2004 of the point source picture and reflection The shape of the window portion in the p2004 of face or configuration, according to the condition illustrated by previous Figure 22, are set to such as Figure 27～30 or Figure 33 A Shown in～33C.
Each embodiment described above or variation (Figure 12, Figure 21, Figure 34～38) in, though cylindric photomask M is false It is fixed that the pattern that reflecting part is formed with non-reflective portion is formed directly into into the surface of the cylinder mother metal such as metal, ceramics, glass, but also may be used One side to be made in the very thin glass plate of the good short strip shape of flatness (such as 100～500 μm of thickness) is formed with figure with reflectance coating The reflection type optical mask of the lamellar of case so as to wind along the bending of the outer peripheral face of metallic rotating drum 2020.
The reflection type optical mask of above-mentioned lamellar, also can unvaryingly be attached at the outer peripheral face of rotating drum 2020, also can fix Into can discharge (can exchange).The reflection type optical mask of this kind of lamellar, for example, have comprising aluminum etc. and have height anti-illuminating bundle EL1 Penetrate film or dielectric substance multilayer film of the material of rate etc..Under this situation, rotating drum 2020 can also be provided with and absorb by the anti-of lamellar The light shield layer (film) of the illuminating bundle EL1 of the hyalomere of emitting photomask, the light shield layer also suppresses the generation of veiling glare.
Also, the photomask M of cylindrical shape also can be cover it is all-round be simply formed with correspondence one device (display device) Pattern person, also can be the multiple pattern persons for being formed with one device (display device) of correspondence.Further, cylindric photomask Device pattern on M also can repeatedly be configured in the circumferential direction of outer peripheral face, also can be in the direction parallel with Pivot axle AX2001 Configuration is multiple.Also, also the pattern of the 1st device manufacture can be arranged and to manufacture with the 1st device not in cylindric photomask M The pattern of the 2nd same device.
[device making method]
Secondly, device making method is illustrated.Figure 39 is the flow chart of the device making method for showing this embodiment.
In device making method shown in Figure 39, the display floater of the selfluminous elements such as organic EL etc. is for example carried out first Device function, performance design, with CAD etc. necessary circuit pattern or Wiring pattern (step 201) are designed.Secondly, according to CAD The design of the devices such as each pattern of various layers Deng design, makes photomask M (the cylindric or planes of necessary each layer segment Shape) (step 202).There are device substrate i.e. hyaline membrane or piece or very thin metal forming also, first passing through purchase or manufacture etc. and preparing volume Etc. substrate or the spool (step 203) of the flexible substrates (resin film, metal foil film, plastic cement etc.) as display device base material.
Additionally, step 203 prepare reel substrate, also can optionally by its surfaction, be formed with base in advance Bottom (being for example imprinted with the minute asperities that mode is formed), the functional membrane or hyaline membrane (insulation for being previously deposited photoinduction Material).
Secondly, the substrate for being prepared is put into the manufacturing line of Scroll, batch, is formed in the substrate and is constituted display surface The backplane level that TFT of electrode or distribution, dielectric film, the semiconductor film (thin film semiconductor) of the devices such as plate device etc. etc. is constituted, Luminescent layer (the step as the selfluminous element such as organic EL in display pixel portion is formed in the way of to be deposited on the backplane level 204).On the film that step 204 is typically contained in substrate formed Resist patterns the step of, using this Resist patterns as Photomask and the step of etch above-mentioned film.The formation of Resist patterns, enforcement equably forms resist film in substrate surface The step of, expose the resist film of substrate with the exposure light being patterned via photomask M according to above-mentioned each embodiment The step of light, make the step of sub-image of photomask pattern is formed with by the exposure.
And used the situation that the flexible device of printing technology etc. manufactures, be performed on substrate surface and formed by cloth of coating-type The step of feature photosensitive layer (photonasty silane couple material), will be via photomask M by pattern according to above-mentioned each embodiment The exposure light of change be irradiated in feature photosensitive layer and in feature photosensitive layer according to pattern form formed hydrophiling part with The part of hydrophobization (drying) is to form the step of exposure of pattern, in the high part coating plating of the hydrophilic of feature photosensitive layer Deposited substrate liquid etc. simultaneously separates out the step of forming metallic pattern etc. by electroless plating.
Also, in this step 204, though the exposure device also comprising each embodiment explanation before priority of use exposes photoresist layer Existing lithography step, but also comprising pattern exposure is carried out to the catalyst layer of photoinduction pass through electroless plating method and formed The wet type step of the pattern (distribution, electrode etc.) of metal film or with depicting pattern such as the electric conductivity inks containing Nano silver grain Print steps etc. process.
Secondly, according to manufactured device, just with the display device of such as spool mode continuous manufacture in strip substrate Each, implement that substrate is cut or cut off, or by other substrates, such as protecting film of the manufacture of other steps (to environment Shielding layer), the lamellar chromatic filter with sealing function or thin substrate of glass etc. fit in the surface of each display floater device Deng the step of, with assembly device (step 205).Secondly, carry out whether display floater device works orderly or whether meet Desired performance or characteristic etc. are to post processings (step) (step 206) such as the inspections of device.In the above described manner, display surface can be manufactured The devices such as plate (flexible display).
Additionally, the technical scope of the present invention is not limited to above-mentioned embodiment or variation.For example, also can be omitted in State in embodiment or variation illustrate constitutive requirements more than one.Also, the explanation in above-mentioned embodiment or variation Constitutive requirements also can be appropriately combined.
Symbol description：
1001 device inspection apparatus
1009 carrying devices
1011 substrate treating apparatus
1021 the 1st mandrel members
1022 the 2nd mandrel members
1050 the 1st deflection components
1057 the 2nd deflection components
1078 photomask microscope carriers
1120 the 3rd deflection components
1121 the 4th deflection components
1132 the 7th deflection components
1133 the 8th deflection components
1136 the 9th deflection components
1137 the 10th deflection components
1140 the 11st deflection components
1143 the 12nd deflection components
1151 the 13rd deflection components
1152 the 14th deflection components
The central shafts of AX1001 the 1st
The central shafts of AX1002 the 2nd
The footpath directions of D1001 the 1st
The footpath directions of D1002 the 2nd
The normal directions of D1003 the 1st
The normal directions of D1004 the 2nd
DFx distances
DMx girths
IR illumination regions
M photomasks
P substrates
PA view fields
PL projection optical systems
PL1001～PL1006 projects module
The faces of p1001 the 1st
The faces of p1002 the 2nd
P1003 median planes
P1007 intermediate image planes
2001 device inspection apparatus
2005 host control devices
2013 control devices
2014 the 1st optical systems
2015 the 2nd optical systems
2020 rotating drums
2030 rotating drums
2040 concave mirrors
2094 bar lens
U3 processing meanss (substrate treating apparatus, exposure device)

Claims (20)

1. a kind of substrate treating apparatus, possess projection optical system, and the projection optical system autogamy in future is placed in the photograph of illumination light The light beam of the pattern of the 1st object in area pellucida domain is projeced into the view field of the 2nd object of configuration, and it possesses：
1st supporting member, with the side region in the illumination region with the view field along curved with set curvature The bent mode into the 1st face of cylinder planar supports the 1st object and the side in the 2nd object；And
2nd supporting member, with the opposing party region in the illumination region with the view field along set 2nd face Mode supports the 1st object and the opposing party in the 2nd object；
The projection optical system is included：
1st projection module, by the view field as described in being projected on the 1st of the pattern of illumination region described in the 1st；And
2nd projection module, by the position with the 1st illumination region on the 1st face it is different the 2nd described in illumination region The pattern picture, be projected on and be projected the 1st illumination region as region it is different the 2nd described in view field；
The 1st projection module is each provided with being partial to component with the described 2nd projection module, and the deflection component is with from the illumination Chief ray court described in chief ray of the region to the imaging beam of the view field between the 1st face and the projection optical system The imaging beam is propagated in the footpath direction in the 1st face with the mode that the 2nd face is non-perpendicular footpath direction.
2. substrate treating apparatus as claimed in claim 1, wherein, the deflection component is partial to into the imaging beam from the photograph Project the chief ray in normal direction and inject the view field from normal direction in area pellucida domain.
3. such as the substrate treating apparatus of claim 1 or 2, wherein, the 1st projection module is with the described 2nd projection module each Comprising the intermediary image for forming the illumination region and by the intermediary image be projected on the view field, be configured to be formed it is described in Between picture position field stop.
4. substrate treating apparatus as claimed in claim 3, wherein, the 1st projection module is each included with the described 2nd projection module The deflection component orthogonal with the field stop will be partial to into from the chief ray of the illumination region.
5. such as the substrate treating apparatus of claim 1 or any one of 2, wherein, the 1st projection module and the described 2nd is projected Module is respectively configured to navigate on the non-perpendicular footpath direction by the chief ray in one region.
6. substrate treating apparatus as claimed in claim 5, wherein, the 1st supporting member centered on set axis to be rotated Cylinder element, when watching from the direction of the axis, the 1st projection module and the described 2nd projection module are relative to include institute State axis and the median plane vertical with the 2nd face is symmetrically configured.
7. substrate treating apparatus as claimed in claim 5, wherein, the 1st supporting member centered on set axis to be rotated Cylinder element, when watching from the direction of the axis, the 1st view field of correspondence the 1st projection module is to correspondence The length along the 2nd face of the 2nd view field of the 2nd projection module, projects described in module with the corresponding described 1st 1st illumination region to the length along the 1st face of the 2nd illumination region of correspondence the 2nd projection module is set as It is identical.
8. substrate treating apparatus as claimed in claim 5, wherein, the 1st projection module will be configured at the 1st illumination region The picture of the pattern of the 1st object is projected on the 1st view field with equimultiple；
The 2nd projection module is projected on the picture for being configured at the pattern of the 1st object of the 2nd illumination region with equimultiple 2nd view field；
2nd bread is containing the radius of curvature face cylindric with the 1st face identical.
9. substrate treating apparatus as claimed in claim 5, wherein, the 2nd bread contains plane.
10. substrate treating apparatus as claimed in claim 5, wherein, the 1st supporting member can cover the light for being formed with the pattern Film is held in the 1st face as the 1st object, rotates by rotation axiss of the center of curvature in the 1st face.
11. substrate treating apparatus as claimed in claim 5, wherein, the 2nd supporting member possesses carrying device, the carrying device Rotor structure comprising the circumferential direction for being defined as the barrel surface of set radius and the barrel surface can be rotated on the 2nd face Part, by the 2nd object barrel surface part for the rotor component is wound in, and along the 2nd face the 2nd thing is transported Body.
A kind of 12. device inspection apparatus, possess the substrate treating apparatus of any one of claim 1 to 11.
A kind of 13. device making methods, comprising：
By the substrate treating apparatus of any one of claim 1 to 11 by the pattern exposure of the 1st object in the 2nd thing Body；And
The 2nd object after by processing the exposure, the pattern of the 1st object is formed on the 2nd object.
A kind of 14. device making methods, flexible sheet substrate is continuously transferred in long side direction, while in the sheet form base The pattern of device is formed, it is included：
Make to be formed with transmission-type corresponding with the pattern of the device or anti-along the outer peripheral face for certain radius from the 1st centrage The cylinder photomask of the photomask pattern of emitting rotates around the 1st centrage；
It is the cylindric outer peripheral face of certain radius by having from the 2nd centrage configured with the 1st centerline parallel Cylinder, make the bending of a sheet form base part and supported, while the sheet form base is transferred in the long side Direction；
The projection image of the photomask pattern is exposed to by the sheet form base by projection optical system,
The projection optical system is included in when watching in the face orthogonal with the 1st centrage and the 2nd centrage, relatively Substantially symmetric the 1st projection module and the 2nd is configured to comprising the 1st centrage and the median plane of the 2nd centrage to project Module,
The 1st projection module is configured to, and the 1st illumination region from the outer peripheral face of the cylinder photomask is towards with the cylinder In the chief ray of the imaging beam of the 1st view field in the sheet form base that body is supported, covered by the cylinder light The extended line of the chief ray of the outer peripheral face of film towards the 1st centrage, by the extended line of the chief ray of the sheet form base Towards the 2nd centrage,
The 2nd projection module is configured to, from different with the 1st illumination region the of the outer peripheral face of the cylinder photomask 2 illumination regions are towards 2nd different with the 1st view field in the sheet form base supported with the cylinder In the chief ray of the imaging beam of view field, by the extended line of the chief ray of the outer peripheral face of the cylinder photomask towards institute The 1st centrage is stated, by the extended line of the chief ray of the sheet form base towards the 2nd centrage.
A kind of 15. substrate treating apparatus, make in the cylinder light that pattern plane is formed to cylinder planar away from the set radius of the 1st centrage Mask rotates around the 1st centrage, and moves along long side direction by the sheet form base for making strip, will be formed in the cylinder In the sheet form base, it possesses the pattern exposure of the pattern plane of photomask：
Rotating drum, it possesses and is formed cylindric away from the radius set with the 2nd centrage of the 1st centerline parallel Outer peripheral face, a part of cylindric of the long side direction of the sheet form base is supported in the outer peripheral face, and around institute State the rotation of the 2nd centrage and transport the sheet form base along the long side direction, and
Projection optical system, its inject in by illumination in the part being set in the pattern plane of the cylinder photomask Illumination region when, the imaging beam of the pattern occurred from the 1st illumination region, by towards being set in the rotation View field's projection of the part on the surface of the sheet form base that reel is supported, by the pattern lamellar base is imaged in On bottom；
The projection optical system, during using the plane comprising the 1st centrage and the 2nd centrage as median plane, its Possess：
1st deflection component, with the chief ray of the imaging beam by the center of the illumination region towards the illumination region Normal direction advance the 1st chief ray, set inclination is become to circumferential direction of the median plane in the cylinder photomask The mode at angle is partial to the imaging beam, and
2nd deflection component, with the chief ray of the imaging beam by the center of the view field towards the view field Normal direction advance the 2nd chief ray, set inclination angle is become in the circumferential direction of the rotating drum to the median plane Mode the imaging beam is partial to.
16. as claim 15 substrate treating apparatus, wherein, the projection optical system possesses,
1st optical system, with 1st optical axis vertical with the median plane, and injects with the institute of the described 1st deflection component deflection Imaging beam is stated, the intermediary image of the pattern is formed, and
2nd optical system, with 2nd optical axis vertical with the median plane, and injects the imaging for becoming the intermediary image Light beam, and by the mode towards the described 2nd deflection component projection, by the intermediary image reimaging in the view field,
In with the face of the 1st centrage and the 2nd central axis in, the 1st optical axis and the 1st chief ray are set It is set to more than 90 ° of obtuse angle, the 2nd optical axis and the 2nd chief ray is set as into more than 90 ° of obtuse angle.
17. as claim 16 substrate treating apparatus, wherein, the projection optical system will manifest in the illumination region The pattern be projected on as equimultiple in the view field, and by 90 ° of the 1st optical axis and the 1st chief ray Obtuse angle above, equally sets with obtuse angle of the 2nd optical axis with more than 90 ° of the 2nd chief ray.
18. as claim 17 substrate treating apparatus, wherein, the projection optical system is matched somebody with somebody in the side of the median plane The 1st projection module is set to, and the opposite side and the 1st projection module in the median plane is symmetrically configured to the 2nd projection module,
The 1st projection module and the 2nd projection module, separate in the direction of the 1st centrage or the 2nd centrage and match somebody with somebody Put, in the pattern plane of the cylinder photomask, the pattern that will be formed in each difference region in the direction of the 1st centrage is same When project to the sheet form base.
The substrate treating apparatus of 19. such as claim 15, wherein, the cylinder photomask is reflection type optical mask, and is possessed, partially Beam splitter, it is configured in the 1st deflection component and the pattern plane of the cylinder photomask of the projection optical system The illumination region between the imaging beam light path, inject the illumination light of linear polarization and anti-towards the illumination region Penetrate, and pass through the imaging beam in illumination region reflection.
20. as claim 18 or 19 substrate treating apparatus, wherein, be set as any state of the 1st state or the 2nd state； Wherein, the 1st state, is the radius of the radius with the pattern plane of the cylinder photomask of the outer peripheral face for making the rotating drum It is identical；2nd state, is the surface of the sheet form base of the outer peripheral face for making to be supported in the rotating drum cylindricly Radius is identical with the radius of the pattern plane of the cylinder photomask.
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