TW201624142A - Direct exposure apparatus - Google Patents

Direct exposure apparatus Download PDF

Info

Publication number
TW201624142A
TW201624142A TW104129741A TW104129741A TW201624142A TW 201624142 A TW201624142 A TW 201624142A TW 104129741 A TW104129741 A TW 104129741A TW 104129741 A TW104129741 A TW 104129741A TW 201624142 A TW201624142 A TW 201624142A
Authority
TW
Taiwan
Prior art keywords
exposure
workpiece
cylindrical member
unit
direct exposure
Prior art date
Application number
TW104129741A
Other languages
Chinese (zh)
Inventor
Norio Hashimoto
Akira Morita
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014196544A external-priority patent/JP6424053B2/en
Priority claimed from JP2014196543A external-priority patent/JP6460699B2/en
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW201624142A publication Critical patent/TW201624142A/en

Links

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)

Abstract

Provided is a direct exposure apparatus. The direct exposure device is a direct exposure device that exposes a pattern on an elongate workpiece that is fed from a supply reel and is wound up around a take-up reel so as to, on the one hand, suppress the increase of the diameter of an exposure roll and, on the other hand, expand focusing area of an exposure image to allow for line thinning of drawing pattern. A direct exposure device comprises a cylindrical member, which is arranged between the supply reel and the take-up reel for holding the elongate workpiece in a predetermined range of a circumferential surface thereof while rotating; a guide means, which guides, at a location of disengagement from the cylindrical member, the elongate workpiece in a tangential direction that is perpendicular to a radial direction in a cross-section that is normal to an axis of the cylindrical member; and an exposure means, which draws a pattern on the elongate workpiece that disengages from the cylindrical member and extends in the tangential direction within a fixed width in front of and behind the disengagement location in the conveyance direction.

Description

直接曝光裝置 Direct exposure device

本發明係有關於一種在從供給捲盤所抽出並被捲繞捲盤所捲繞之長條狀工件的搬運中將圖案描繪於其表背的一面之所謂的輥對輥(roll to roll)方式的直接曝光裝置。 The present invention relates to a so-called roll to roll in which a pattern is drawn on one side of the front and back of a sheet-like workpiece that is taken up from a supply reel and wound by a reel. Direct exposure device.

一般,作為在手機或行動機器等所使用之電子電路基板(印刷電路板)的基底材料,例如使用將厚度0.1mm以下、長度500mm以上(例如100mm)之長條狀工件(感光性長條薄膜(將感光體塗布於表背之至少一面的合成樹脂製柔軟薄膜))作成捲筒狀者。又,近年來,不使用轉印遮罩而將描繪光直接照射於基板而描繪圖案的直接曝光裝置在市場抬頭,對長條狀工件亦採用此曝光方式的要求高漲。 In general, as a base material of an electronic circuit board (printed circuit board) used in a mobile phone or a mobile device, for example, a long-length workpiece (photosensitive long film) having a thickness of 0.1 mm or less and a length of 500 mm or more (for example, 100 mm) is used. (The synthetic resin soft film in which the photoreceptor is applied to at least one side of the front and back sides)) is formed into a roll shape. Further, in recent years, a direct exposure apparatus that draws a pattern by directly irradiating a drawing light onto a substrate without using a transfer mask has been raised in the market, and the demand for the use of this exposure method for a long-shaped workpiece has been increasing.

作為這種捲筒對捲筒方式的直接曝光裝置,已知一種直接曝光裝置(專利文獻1),該直接曝光裝置係為了進行連續之長條狀工件的搬運與曝光,利用位於供給捲盤與捲繞捲盤之間之平板狀的輸送帶(曝光輸送帶)固持長條狀工件,並在該輸送帶上進行曝光。 As such a roll-to-roll type direct exposure apparatus, a direct exposure apparatus (Patent Document 1) for transporting and exposing a continuous elongated workpiece is used, and is located in a supply reel and A flat conveyor belt (exposure conveyor belt) between the winding reels holds the elongated workpiece and is exposed on the conveyor belt.

又,亦已知一種直接曝光裝置(專利文獻2),該直接曝光裝置係對在位於供給捲盤與捲繞捲盤之間之輥(曝光輥)的圓筒面上行進的長條狀工件進行曝光。 Further, there is also known a direct exposure apparatus (Patent Document 2) which is a long workpiece which travels on a cylindrical surface of a roller (exposure roller) between a supply reel and a winding reel Exposure.

【先行專利文獻】 [Prior patent documents] 【專利文獻】 [Patent Literature]

[專利文獻1]日本特開2006-098720號公報 [Patent Document 1] Japanese Laid-Open Patent Publication No. 2006-098720

[專利文獻2]日本特開2014-035412號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2014-035412

若比較在平面狀之輸送帶上曝光的方式與在圓筒狀之輥上曝光的方式,輸送帶方式係在使工件之被曝光區域整體變成平面狀上優異,但是因為生產線長度變長,所以曝光裝置易大形化,又在曝光裝置局部性觀察的情況之面精度差。相對地,輥方式係因為生產線長度可縮短,所以曝光裝置可小形化,而且在面精度(面之平滑性)與工件進給精度上優異。另一方面,輥方式係因為在圓筒面(曲面)上進行曝光,所以曝光影像之對焦的區域窄,而具有細線之描繪變得困難的問題。此問題係若使曝光輥徑變大而減輕,但是小形化被犠牲。 When comparing the manner of exposure on a flat conveyor belt and the manner of exposure on a cylindrical roller, the conveyor belt method is excellent in making the entire exposed area of the workpiece flat, but since the length of the production line becomes long, The exposure apparatus is easily shaped, and the surface accuracy of the exposure apparatus is poor. In contrast, since the roll mode can be shortened because of the length of the production line, the exposure apparatus can be reduced in size and excellent in surface accuracy (surface smoothness) and workpiece feed accuracy. On the other hand, since the roll method is exposed on a cylindrical surface (curved surface), the area in which the exposure image is focused is narrow, and it is difficult to draw a thin line. This problem is alleviated if the exposure roll diameter is made larger, but the miniaturization is sacrificed.

又,從工件之進給精度的觀點,輸送帶方式具有因輸送帶皮帶之蛇行或伸縮等的影響而進給精度降低的可能性。另一方面,輥方式係在輥吸附工件之吸附區域可得到高的進給精度,但是因為吸附區域係如上述所示不是平面(是圓筒面),所以曝光影像之對焦的區域窄的問題殘留。 Further, from the viewpoint of the feeding accuracy of the workpiece, the conveyor belt method has a possibility that the feeding accuracy is lowered due to the influence of the meandering or the expansion and contraction of the belt belt. On the other hand, the roller method can achieve high feed accuracy in the adsorption region where the roller adsorbs the workpiece, but since the adsorption region is not a flat surface (which is a cylindrical surface) as described above, the problem that the focused region of the exposure image is narrow is small. Residual.

本發明之第一目的在於得到一種直接曝光裝置,在曝光輥方式之直接曝光裝置,可一面抑制曝光輥徑的增大,一面擴大曝光影像之對焦的區域,而可使描繪圖案細線化。 A first object of the present invention is to provide a direct exposure apparatus in which a direct exposure apparatus of an exposure roll type can increase a focus area of an exposure image while suppressing an increase in an exposure roll diameter, thereby making the drawing pattern thin.

又,本發明之第二目的在於得到一種直接曝光裝 置,在吸附工件並使其移動之輥方式的直接曝光裝置,可一面活用吸附並搬運工件之圓筒構件的高進給精度,一面固持工件的平面性,而提高曝光影像的精度,使描繪圖案細線化。 Moreover, the second object of the present invention is to obtain a direct exposure package. The direct exposure apparatus of the roller type that adsorbs and moves the workpiece can improve the accuracy of the exposure image and enhance the accuracy of the exposure image while utilizing the high feed precision of the cylindrical member that adsorbs and transports the workpiece while maintaining the planarity of the workpiece. The pattern is thin.

本發明係使用將圖案曝光於從供給捲盤所抽出並被捲繞捲盤所捲繞之長條狀工件之光調變元件陣列的直接曝光裝置,其特徵為包括:圓筒構件,係在該供給捲盤與捲繞捲盤之間,一面在工件之周面的固定範圍固持長條狀工件一面旋轉;切線方向導引手段,係在自該圓筒構件的脫離位置在與該圓筒構件之軸正交截面的徑向正交的切線方向導引長條狀工件;以及第1曝光手段,係對從該圓筒構件所脫離並在該切線方向延伸的長條狀工件,至少在包含該脫離位置之搬運方向的前後固定寬度描繪圖案。 The present invention is directed to a direct exposure apparatus for exposing a pattern to an array of optical modulation elements of an elongated workpiece drawn from a supply reel and wound by a reel, characterized by comprising: a cylindrical member attached to Between the supply reel and the winding reel, one side of the workpiece is fixed in a fixed range of the workpiece, and the tangential direction guiding means is in a disengaged position from the cylindrical member. a radially-oriented tangential direction of the orthogonal cross-section of the member guides the elongated workpiece; and the first exposure means is a strip-shaped workpiece that is detached from the cylindrical member and extends in the tangential direction, at least A front and rear fixed width drawing pattern including the conveyance direction of the disengagement position.

該前後固定寬度係自脫離位置往搬運方向下游側的寬度比往上游側的寬度寬較佳。 The front and rear fixed width is preferably wider from the detachment position toward the downstream side in the conveying direction than the width on the upstream side.

本發明之直接曝光裝置係進而,拍攝形成於長條狀工件之對準記號的對準相機被配置於隔著該圓筒構件與該曝光手段相對向的位置較佳。 Further, in the direct exposure apparatus of the present invention, it is preferable that the alignment camera that photographs the alignment mark formed on the elongated workpiece is disposed at a position facing the exposure means via the cylindrical member.

進而,曝光手段的光軸與對準相機的光軸係朝向鉛垂方向較佳。 Further, the optical axis of the exposure means and the optical axis of the alignment camera are preferably oriented in the vertical direction.

該圓筒構件係至少在該曝光手段的曝光位置與該對準相機的拍攝位置,將該長條狀工件固持於其周面較佳。 The cylindrical member is preferably held at least at the exposure position of the exposure means and the photographing position of the alignment camera, and the elongated workpiece is held on the circumferential surface thereof.

本發明係最好更包括:圓筒構件,係在該供給捲盤與捲繞捲盤之間,一面在工件之周面的固定範圍固持長條狀 工件一面旋轉;平面導引手段,係在比自該圓筒構件的脫離位置下游側,以非接觸將長條狀工件平面狀地支撐於導面;以及第2曝光手段,係在該平面導引手段上對該長條狀工件描繪圖案。 Preferably, the present invention further comprises: a cylindrical member between the supply reel and the winding reel, which holds a long strip on a fixed surface of the circumferential surface of the workpiece The workpiece is rotated on one side; the plane guiding means is supported on the downstream side of the disengaged position from the cylindrical member, and the elongated workpiece is planarly supported on the guide surface in a non-contact manner; and the second exposure means is attached to the plane guide A pattern is drawn on the elongated workpiece.

該第2曝光手段之曝光區域係在其一形態,可跨在該長條狀工件之自該圓筒構件的脫離位置與導引手段上的位置。 The exposure region of the second exposure means is in a form that can span the position of the elongated workpiece from the disengaged position of the cylindrical member and the guiding means.

該第1曝光手段之曝光區域與該第2曝光手段之曝光區域係位於大致同一平面上者切乎實際。 It is practical that the exposure area of the first exposure means is located on substantially the same plane as the exposure area of the second exposure means.

該導引手段係具體而言,例如可由包括氣體吹出手段與氣體吸入手段的浮起吸引導引手段所構成。 Specifically, the guiding means may be constituted by, for example, a floating suction guiding means including a gas blowing means and a gas suction means.

若依據本發明,雖然是使用曝光輥對長條狀工件連續地曝光的直接曝光裝置,因為在包含圓筒狀構件的脫離位置之搬運方向的前後固定寬度描繪圖案,所以在曝光區域就包含切線(切面)方向的平面區域,而可使曝光影像之對焦的區域比以往之曝光輥式的直接曝光裝置更寬廣。結果,曝光之圖案可細線化。 According to the present invention, although the direct exposure apparatus for continuously exposing the elongated workpiece using the exposure roller has a fixed width drawing pattern at the front and rear of the conveyance direction including the detachment position of the cylindrical member, the tangential line is included in the exposure region. The area of the (cut surface) direction is wider, and the area where the exposure image is focused can be made wider than the conventional exposure roll type direct exposure apparatus. As a result, the pattern of exposure can be thinned.

又,本發明係進而,在供給捲盤與捲繞捲盤之間,配置一面在工件之周面的固定範圍固持長條狀工件一面旋轉之圓筒構件的下游側,以非接觸將長條狀工件平面狀地支撐於導面的導引手段,藉由使曝光手段之對長條狀工件之曝光區域的至少一部分位於導引手段上,利用圓筒構件之高的進給精度、與藉導引手段之工件之平面性的保持,提高曝光影像的精 度,而可使描繪圖案細線化。 Further, according to the present invention, the downstream side of the cylindrical member that rotates while the long workpiece is held in the fixed range of the circumferential surface of the workpiece is disposed between the supply reel and the winding reel, and the strip is non-contacted. The guiding means for supporting the workpiece in a planar shape on the guiding surface, by using at least a part of the exposure region of the exposed portion of the elongated workpiece on the guiding means, utilizing the high feed precision of the cylindrical member, and borrowing The planarity of the workpiece by the guiding means improves the precision of the exposed image Degree, and the drawing pattern can be thinned.

100‧‧‧直接曝光裝置 100‧‧‧Direct exposure device

10‧‧‧供給捲盤 10‧‧‧Supply reel

11‧‧‧捲繞捲盤 11‧‧‧Winding reel

12、13、14‧‧‧導輥(切線方向導引手段) 12, 13, ‧ ‧ guide rollers (steering direction guide)

30A(30)‧‧‧曝光單元(曝光手段、第1曝光單元) 30A (30)‧‧‧Exposure unit (exposure means, first exposure unit)

30B(30)‧‧‧曝光單元(曝光手段、第2曝光單元) 30B (30)‧‧‧Exposure unit (exposure means, second exposure unit)

36‧‧‧DMD元件(光調變元件陣列) 36‧‧‧DMD components (optical modulation element array)

40‧‧‧曝光輥 40‧‧‧Exposure roller

41‧‧‧多孔圓筒構件 41‧‧‧Porous cylindrical components

41a‧‧‧微細孔 41a‧‧‧Micropores

42‧‧‧中心固定體 42‧‧‧Center fixed body

42a‧‧‧吸入凹部 42a‧‧‧Inhalation recess

43‧‧‧負壓源 43‧‧‧ Negative pressure source

44‧‧‧控制器 44‧‧‧ Controller

45‧‧‧線性尺度 45‧‧‧ linear scale

46‧‧‧線性感測器 46‧‧‧Line sensor

50‧‧‧對準相機(攝像手段) 50‧‧‧Aligning the camera (camera means)

60‧‧‧浮起吸引導引單元(平面導引手段) 60‧‧‧Floating suction guiding unit (plane guiding means)

61‧‧‧導板 61‧‧‧ Guide

61a‧‧‧導面 61a‧‧‧ Guide

61b‧‧‧貫穿孔(氣體吹出手段) 61b‧‧‧through holes (gas blowing means)

61c‧‧‧貫穿孔(氣體吸入手段) 61c‧‧‧through holes (gas inhalation means)

62‧‧‧空氣迴路本體 62‧‧‧Air loop body

62a‧‧‧空氣供給槽 62a‧‧‧Air supply tank

62b‧‧‧空氣吸入槽 62b‧‧‧Air suction slot

63‧‧‧負壓源 63‧‧‧Negative pressure source

64‧‧‧正壓源 64‧‧‧ Positive pressure source

MA‧‧‧對準記號 MA‧‧‧ alignment marks

W‧‧‧長條狀工件 W‧‧‧ long strip workpiece

α‧‧‧吸入區間 α‧‧‧Inhalation interval

第1圖係表示本發明之直接曝光裝置之整體構成的側視圖。 Fig. 1 is a side view showing the overall configuration of a direct exposure apparatus of the present invention.

第2圖係其立體圖。 Figure 2 is a perspective view of the same.

第3圖係表示曝光單元之一例的立體圖。 Fig. 3 is a perspective view showing an example of an exposure unit.

第4圖係說明長條狀工件上之單位圖案區域(對準記號)、及對準相機與曝光單元之間隔之例子的展開圖。 Fig. 4 is a development view showing an example of a unit pattern area (alignment mark) on a long workpiece and an interval between the camera and the exposure unit.

第5圖係表示曝光輥之細節的軸正交剖面圖。 Figure 5 is an orthogonal cross-sectional view showing the details of the exposure roller.

第6圖係表示對長條狀工件之曝光區域之一例的圖。 Fig. 6 is a view showing an example of an exposure region of a long workpiece.

第7圖係浮起吸引單元單體的立體圖。 Fig. 7 is a perspective view of the floating suction unit unit.

第8圖係其分解立體圖。 Fig. 8 is an exploded perspective view thereof.

第9圖係表示在曝光區域之光調變元件陣列之曝光狀態的模式圖。 Fig. 9 is a schematic view showing an exposure state of the array of light modulation elements in the exposure region.

第10圖係本發明之直接曝光裝置之別的實施形態,係表示從第1圖的構成拿掉下游側之曝光單元及浮起吸引導引單元的實施形態之對應於第1圖的側面。 Fig. 10 is a view showing another embodiment of the direct exposure apparatus of the present invention, which is a side view corresponding to Fig. 1 in an embodiment in which the downstream exposure unit and the floating suction guide unit are removed from the configuration of Fig. 1.

第11圖係第10圖的實施形態之對應於第2圖的立體圖。 Fig. 11 is a perspective view corresponding to Fig. 2 of the embodiment of Fig. 10.

第1圖、第2圖係表示本發明之直接曝光裝置100之一實施形態的整體圖。直接曝光裝置100係曝光輥40位於抽出所捲繞之長條狀工件(以下僅稱為工件)W的供給捲盤10與捲繞工件W的捲繞捲盤11之間,並在此曝光輥40的上方 具備在工件W之搬運方向分開的一對曝光單元(曝光手段、曝光描繪部)30A與30B,在下方具備對準相機50。工件W係由將感光體塗布於表背之至少一面的合成樹脂製柔軟薄膜所構成,在離開供給捲盤10後,經由導輥12、13,至曝光輥40,進而經由導輥(切線方向導引手段)14被捲繞於捲繞捲盤11。在曝光輥40與導輥14之間,設置位於工件W之下面的浮起吸引導引單元(平面導引手段)60。 Fig. 1 and Fig. 2 are overall views showing an embodiment of the direct exposure apparatus 100 of the present invention. The direct exposure apparatus 100 is an exposure roller 40 located between the supply reel 10 that draws the wound long workpiece (hereinafter simply referred to as workpiece) W and the winding reel 11 that winds the workpiece W, and is exposed thereto. Above 40 A pair of exposure units (exposure means, exposure drawing sections) 30A and 30B that are separated in the conveyance direction of the workpiece W are provided, and an alignment camera 50 is provided below. The workpiece W is composed of a synthetic resin soft film in which the photoreceptor is applied to at least one surface of the front and back, and after leaving the supply reel 10, passes through the guide rolls 12 and 13, to the exposure roll 40, and further via the guide roller (tangential direction). The guiding means 14 is wound around the winding reel 11. Between the exposure roller 40 and the guide roller 14, a floating suction guiding unit (planar guiding means) 60 located below the workpiece W is provided.

一對曝光單元30A、30B中下游側的曝光單元30B被配置於浮起吸引導引單元60上。此構成係利用曝光輥40(圓筒構件)之高的進給精度、與浮起吸引導引單元60(平面導引手段)對工件W之平面性的保持來提高曝光影像的精度,是在使描繪圖案細線化上有用的構成,但是與藉由使上游側之曝光單元30A的曝光區域包含曝光輥40(圓筒構件)之切線(切面)方向的平面區域,可使曝光影像之對焦的區域比以往之曝光輥型的直接曝光裝置更寬廣的特徵無直接的關係。即,下游側之曝光單元30B與浮起吸引導引單元60係可省略。關於這一點,將使用圖面後述。 The exposure unit 30B on the downstream side of the pair of exposure units 30A and 30B is disposed on the floating suction guiding unit 60. In this configuration, the accuracy of the exposure image is improved by the high feed precision of the exposure roller 40 (cylindrical member) and the flatness of the workpiece W by the floating suction guiding unit 60 (planar guiding means). A configuration that is useful for thinning the drawing pattern, but by focusing the area of the tangential (cut surface) direction of the exposure roller 40 (cylindrical member) by the exposure region of the upstream exposure unit 30A, the focus of the exposure image can be focused. The area has no direct relationship to the broader features of the prior exposure roll type direct exposure apparatus. That is, the exposure unit 30B on the downstream side and the floating suction guide unit 60 can be omitted. In this regard, the drawings will be described later.

曝光輥40係如第2圖、第5圖所示,具有藉未圖示之驅動源被驅動成以軸心41X為中心旋轉的多孔圓筒構件41、與位於此多孔圓筒構件41內的中心固定體42,並在中心固定體42,在其周面之一部分,形成用以使在多孔圓筒構件41之周面所形成的無數個微細孔(吸入孔)41a成為負壓的吸入凹部(槽)42a。在吸入凹部42a,經由負壓源43及控制器(調壓器)44成為負壓。在吸入凹部42a被供給負壓之狀態驅動多孔 圓筒構件41旋轉時,在吸入凹部42a所形成的吸入區間α(第5圖),從多孔圓筒構件41之微細孔41a吸入空氣的結果,工件W在被多孔圓筒構件41的周面吸附並固持下旋轉。 As shown in FIGS. 2 and 5, the exposure roller 40 is driven by a drive source (not shown) to rotate the porous cylindrical member 41 around the axis 41X and the porous cylindrical member 41. In the center fixing body 42, a central suction body 42 is formed in a suction recessed portion in which a plurality of fine holes (suction holes) 41a formed on the circumferential surface of the porous cylindrical member 41 are negatively pressed at a portion of the circumferential surface thereof. (slot) 42a. The suction recess 42a becomes a negative pressure via the negative pressure source 43 and the controller (pressure regulator) 44. Driving the porous state in a state where the suction recess 42a is supplied with a negative pressure When the cylindrical member 41 rotates, the air is taken in from the fine hole 41a of the porous cylindrical member 41 in the suction section α (Fig. 5) formed by the suction recess 42a, and the workpiece W is on the circumferential surface of the porous cylindrical member 41. Adsorb and hold the lower rotation.

吸入凹部42a之吸入區間α、與導輥13及導輥14的位置係被決定成在從軸向觀察多孔圓筒構件41時,在多孔圓筒構件41的最高位置(最上位置)與最低位置(最下位置)之間,工件W在被多孔圓筒構件41吸引下旋轉。導輥13係被定位成工件W從對多孔圓筒構件41的徑向正交之最下方的水平切線(切面)方向進入多孔圓筒構件41(在下方之水平切線(切面)方向與徑向的交點(切線)開始吸引、固持),導輥14係被定位成工件W往對多孔圓筒構件41的徑向正交之最上方的水平切線(切面)方向出去(在上方之水平切線(切面)方向與徑向的交點(切線)結束吸引、固持)。即,吸入凹部42a之吸入區間α係被設定成跨在多孔圓筒構件41開始吸附工件的位置、與工件W從多孔圓筒構件41脫離之位置的約半周之間(約180°)。此外,工件W係至少在吸入區間α的兩端部,即吸引開始位置與吸引解除位置被多孔圓筒構件41吸引並固持即可。 The suction section α of the suction recess 42a and the position of the guide roller 13 and the guide roller 14 are determined so as to be at the highest position (uppermost position) and the lowest position of the porous cylindrical member 41 when the porous cylindrical member 41 is viewed from the axial direction. Between (lowest position), the workpiece W is rotated by being attracted by the porous cylindrical member 41. The guide roller 13 is positioned such that the workpiece W enters the porous cylindrical member 41 from the horizontal tangential (tangential) direction of the lowermost orthogonal to the radial direction of the porous cylindrical member 41 (in the horizontal tangential (tangential) direction and radial direction below) The intersection (tangent line) starts to be attracted and held, and the guide roller 14 is positioned such that the workpiece W goes out in the direction of the horizontal tangent (cutting plane) of the radial direction orthogonal to the porous cylindrical member 41 (the horizontal tangent at the upper side ( The intersection of the cut surface and the radial intersection (tangent line) ends the attraction and retention). In other words, the suction section α of the suction recessed portion 42a is set to span between about half a week (about 180°) of the position at which the porous cylindrical member 41 starts to adsorb the workpiece and the position where the workpiece W is separated from the porous cylindrical member 41. Further, the workpiece W may be sucked and held by the porous cylindrical member 41 at least at both end portions of the suction section α, that is, the suction start position and the suction release position.

在曝光輥40之多孔圓筒構件41的外周,如第2圖示意地表示,形成線性尺度45,並將線性感測器46配設於此曝光輥40的外側固定位置,該線性感測器46係讀取此線性尺度45,而檢測出多孔圓筒構件41的絕對旋轉位置。 On the outer circumference of the porous cylindrical member 41 of the exposure roller 40, as schematically shown in Fig. 2, a linear scale 45 is formed, and the line sensor 46 is disposed at an outer fixed position of the exposure roller 40, the line sensor The 46 series reads this linear dimension 45 and detects the absolute rotational position of the porous cylindrical member 41.

浮起吸引導引單元60係位於曝光輥40(多孔圓筒構件41)之出口(下游)側,並藉氣體之吹出及吸引以非接觸平面狀地支撐長條狀工件W,其動作原理本身係已知。 The floating suction guiding unit 60 is located on the outlet (downstream) side of the exposure roller 40 (the porous cylindrical member 41), and supports the elongated workpiece W in a non-contact planar manner by blowing and attracting by gas, and the operation principle itself The system is known.

第7圖、第8圖係示意地表示浮起吸引導引單元60,包括導板61與空氣迴路本體62。導板61包括開口其平板狀之導面61a的無數個貫穿孔(吹出孔)61b及貫穿孔(吸入孔)61c。空氣迴路本體62包括形成梳齒狀並其梳齒組合成彼此交錯的空氣供給槽62a、與空氣吸入槽62b,空氣供給槽62a係與正壓源64連接,空氣吸入槽62b係與負壓源63連接。以貫穿孔61b與空氣供給槽62a連通、貫穿孔62c與空氣吸入槽62b連通的方式形成陣列狀,而且空氣供給槽62a與空氣吸入槽62b係設置成吹出空氣之貫穿孔61b的列與吸入空氣之貫穿孔61c的列分別與工件W之行進方向平行。不過,吹出空氣之貫穿孔與吸入之貫穿孔係未必是列狀,將複數個吸入孔(吹出孔)配置於中心之吹出孔(吸入孔)之周圍的形態等是可能。 FIGS. 7 and 8 schematically show the floating suction guiding unit 60, including the guide 61 and the air circuit body 62. The guide plate 61 includes an innumerable number of through holes (blowing holes) 61b and through holes (suction holes) 61c through which the flat guide surfaces 61a are opened. The air circuit body 62 includes an air supply groove 62a which is formed in a comb shape and whose comb teeth are combined to be staggered with each other, and an air suction groove 62b. The air supply groove 62a is connected to the positive pressure source 64, and the air suction groove 62b is connected to the negative pressure source. 63 connections. An array is formed so that the through hole 61b communicates with the air supply groove 62a, and the through hole 62c communicates with the air suction groove 62b, and the air supply groove 62a and the air suction groove 62b are provided in a row of the through holes 61b for blowing air and the intake air. The rows of the through holes 61c are respectively parallel to the traveling direction of the workpiece W. However, the through hole that blows out the air and the through hole that is sucked in are not necessarily in a line shape, and it is possible to arrange a plurality of suction holes (blowing holes) around the center blowing hole (suction hole).

此浮起吸引導引單元60係經由正壓源64將加壓空氣供給至空氣供給槽62a,並使其從貫穿孔61b吹出,同時經由負壓源63對空氣吸入槽62b供給負壓,從貫穿孔61c吸入空氣,藉此,可提高通過導面61a上之工件W的平面精度。 The floating suction guiding unit 60 supplies pressurized air to the air supply tank 62a via the positive pressure source 64, and blows it out from the through hole 61b, while supplying a negative pressure to the air suction groove 62b via the negative pressure source 63. The air is taken in through the hole 61c, whereby the plane accuracy of the workpiece W passing through the guide surface 61a can be improved.

以上之浮起吸引導引單元60係具體而言,可使用PISCO(股份有限公司)製AFU1(精密浮起型式)。 Specifically, the above-described floating suction guiding unit 60 can be AFU1 (precision floating type) manufactured by PISCO Co., Ltd.

一對曝光單元30係實質上相同的構成,其一方之曝光單元30A(第1曝光單元30)係設置於工件W離開多孔圓筒構件41之位置的附近,另一方之曝光單元30B(第2曝光單元30)係位於浮起吸引導引單元60上。 The pair of exposure units 30 have substantially the same configuration, and one of the exposure units 30A (first exposure unit 30) is provided in the vicinity of the position where the workpiece W is separated from the porous cylindrical member 41, and the other exposure unit 30B (second The exposure unit 30) is located on the floating attraction guiding unit 60.

第3圖表示曝光單元30(30A與30B)的具體例。曝光單元30係具備光源部20,光源部20係由具有相同之內部構 成的2個光源部20a與光源部20b所構成。因為光源部20a與光源部20b的構成係相同,所以代表性地說明光源部20a。 Fig. 3 shows a specific example of the exposure unit 30 (30A and 30B). The exposure unit 30 includes a light source unit 20, and the light source unit 20 has the same internal structure. The two light source units 20a and the light source unit 20b are formed. Since the light source unit 20a and the light source unit 20b have the same configuration, the light source unit 20a will be representatively described.

光源部20a係由UV燈泡21、第1全反射鏡22、聚光透鏡23、第2全反射鏡24、蠅眼透鏡25以及孔徑(未圖示)所構成。光源部20a係具備UV燈泡21,從UV燈泡21係射出由從365nm至440nm的各種波長所混合的紫外光。 The light source unit 20a is composed of a UV bulb 21, a first total reflection mirror 22, a condenser lens 23, a second total reflection mirror 24, a fly's eye lens 25, and an aperture (not shown). The light source unit 20a includes a UV bulb 21, and ultraviolet light mixed by various wavelengths from 365 nm to 440 nm is emitted from the UV bulb 21.

從UV燈泡21所射出之紫外光係藉橢圓反射鏡26照射於天頂方向,藉第1全反射鏡22將方向改變成水平方向,藉聚光透鏡23聚光,再藉第2全反射鏡24將方向改變成地面方向(工件W方向)。已改變方向之紫外光係經由蠅眼透鏡25及孔徑,成為四分叉的光束。光束係更成為藉由經由8個第1投影透鏡33與8個反射鏡34並射入8個DMD(Digital Micro-mirror Device)元件(光調變元件陣列)36所控制的光束。此受到控制之光束係藉由通過第2投影透鏡群37,調整投影之曝光描繪的倍率,並照射於工件W。即,描繪裝置直接曝光裝置100係根據預先收容有所要之曝光像的描繪資料,控制光源部20a及光源部20b的紫外光。 The ultraviolet light emitted from the UV bulb 21 is irradiated to the zenith direction by the elliptical mirror 26, and the direction is changed to the horizontal direction by the first total reflection mirror 22, and is collected by the collecting lens 23, and then the second total reflection mirror 24 is used. Change the direction to the ground direction (workpiece W direction). The ultraviolet light that has changed direction is a four-forked beam through the fly's eye lens 25 and the aperture. The light beam system is a light beam that is controlled by eight DMD (Digital Micro-mirror Device) elements (light modulation element arrays) 36 via the eight first projection lenses 33 and eight mirrors 34. The controlled light beam is adjusted to the magnification of the exposure drawing by the second projection lens group 37, and is irradiated onto the workpiece W. In other words, the drawing device direct exposure device 100 controls the ultraviolet light of the light source unit 20a and the light source unit 20b based on the drawing data in which the desired exposure image is stored in advance.

曝光單元30A之曝光區域係以如下之方式所決定。如上述所示,工件W脫離多孔圓筒構件41後,在浮起吸引導引單元60上移動,在多孔圓筒構件41的最上部在水平切線方向移動(已脫離多孔圓筒構件41之工件W係藉浮起吸引導引單元60將脫離角度調整成水平)。曝光單元30A之曝光區域AE(第2圖、第3圖、第6圖)係嚴格上不是單純的矩形,但是此處簡化成以將與工件W之搬運方向正交的方向(工件W之寬 度方向)作為長度方向的矩形表達。而且,其曝光寬度Y係如第6圖所示,被設定成在將多孔圓筒構件41之軸心41X與切線方向的交點(交線)S作為基準時,交線S之下游側(導輥14側)的曝光寬度Y2比上游側(多孔圓筒構件41的圓筒面側)的曝光寬度Y1大(Y1<Y2)。 The exposure area of the exposure unit 30A is determined in the following manner. As described above, after the workpiece W is separated from the porous cylindrical member 41, it moves on the floating suction guiding unit 60, and moves in the horizontal tangential direction at the uppermost portion of the porous cylindrical member 41 (the workpiece which has been separated from the porous cylindrical member 41) The W system adjusts the disengagement angle to a level by the floating attraction guiding unit 60. The exposure area AE (Fig. 2, Fig. 3, Fig. 6) of the exposure unit 30A is strictly not a simple rectangle, but is simplified here to be a direction orthogonal to the conveyance direction of the workpiece W (the width of the workpiece W) Degree direction) is expressed as a rectangle in the length direction. Further, as shown in FIG. 6, the exposure width Y is set so as to be the downstream side of the intersection S when the intersection (crossing line) S of the axial center 41X of the porous cylindrical member 41 and the tangential direction is used as a reference. The exposure width Y2 of the roller 14 side is larger than the exposure width Y1 of the upstream side (the cylindrical surface side of the porous cylindrical member 41) (Y1 < Y2).

在浮起吸引導引單元60上,對工件W曝光之曝光單元30B係對藉浮起吸引導引單元60提高(維持)平面性的工件W在曝光區域AE(第2圖、第3圖、第6圖)曝光。此曝光單元30B之曝光寬度Y係與曝光單元30A之曝光寬度Y相同或相異都可。曝光單元30B之曝光區域AE(第2圖、第3圖、第6圖)係與曝光單元30A之曝光區域一樣,嚴格上不是單純的矩形,但是此處簡化成以將與工件W之搬運方向正交的方向(工件W之寬度方向)作為長度方向的矩形表達。曝光單元30A與30B之對工件W的曝光區域AE係位於同一平面。 In the floating suction guiding unit 60, the exposure unit 30B that exposes the workpiece W is used to raise (maintain) planarity of the workpiece W by the floating suction guiding unit 60 in the exposure area AE (Fig. 2, Fig. 3, Figure 6) Exposure. The exposure width Y of the exposure unit 30B may be the same as or different from the exposure width Y of the exposure unit 30A. The exposure area AE (Fig. 2, Fig. 3, Fig. 6) of the exposure unit 30B is the same as the exposure area of the exposure unit 30A, and is not strictly rectangular, but is simplified here to be the direction of conveyance with the workpiece W. The orthogonal direction (the width direction of the workpiece W) is expressed as a rectangle in the longitudinal direction. The exposure areas AE of the workpieces W of the exposure units 30A and 30B are located on the same plane.

第9圖係在模式上表示在2個曝光區域AE之曝光單元30A與30B的曝光狀態。在第9圖,以兩點鏈線所示的圓C係曝光單元30A與30B之第3圖所示的一個第1投影透鏡33與反射鏡34所佔有之光學系統的大小。在其中,以粗線的矩形所畫之DMD(Digital Micro-mirror Device)元件36的實際曝光區域R存在,將包含這4個實際曝光區域R之與工件W之搬運方向正交的方向之矩形區域設定為AE。此外,在第3圖,曝光光束係分叉成8個光學系統,但是在第9圖之例子,分叉成4個光學系統。 Fig. 9 is a view showing the exposure states of the exposure units 30A and 30B in the two exposure areas AE in the mode. In Fig. 9, the size of the optical system occupied by one of the first projection lenses 33 and the mirrors 34 shown in Fig. 3 of the circular C-type exposure units 30A and 30B shown by the two-dot chain line is shown. The actual exposure area R of the DMD (Digital Micro-mirror Device) element 36 drawn in a thick line rectangle exists, and a rectangle including the direction orthogonal to the conveyance direction of the workpiece W of the four actual exposure areas R is present. The area is set to AE. Further, in Fig. 3, the exposure beam is branched into eight optical systems, but in the example of Fig. 9, it is bifurcated into four optical systems.

對準相機50係在本實施形態,具備在工件W之 寬度方向分開的一對。此對準相機50係拍攝預先形成於工件W的對準記號MA(第4圖),並決定(修正)曝光單元30A與30B之描繪座標系統。因為對準相機50係在工件W之對曝光輥40(多孔圓筒構件41)的吸附開始位置拍攝對準記號MA,所以吸附開始位置係等於拍攝位置。而且,對準相機50與曝光單元30A係配置成隔著曝光輥40相對向,又,彼此之光軸位於隔著曝光輥40相反側的大致鉛垂位置。此處之相對向意指對準相機50之拍攝方向與曝光單元30A之曝光光射出方向彼此相向,但是在此時未必各自之光軸位於同一軸線上,亦可在基板搬運方向偏置。對準相機50與曝光單元30A係其至少一方的光軸配置成嚴格上朝向鉛垂方向較佳。藉由依此方式配置對準相機50與曝光單元30A,可將對準相機50與曝光單元30A之光學系統保持於最穩定的狀態,而可得到最佳的光學性能。 The alignment camera 50 is provided in the present embodiment, and is provided in the workpiece W. A pair of separate width directions. The alignment camera 50 captures an alignment mark MA (Fig. 4) previously formed on the workpiece W, and determines (corrects) the drawing coordinate system of the exposure units 30A and 30B. Since the alignment camera 50 photographs the alignment mark MA at the suction start position of the exposure roller 40 (the porous cylindrical member 41) of the workpiece W, the adsorption start position is equal to the shooting position. Further, the alignment camera 50 and the exposure unit 30A are disposed to face each other with the exposure roller 40, and the optical axes of the alignment unit 50 are located at substantially vertical positions on the opposite side of the exposure roller 40. Here, the relative orientation means that the photographing direction of the alignment camera 50 and the exposure light emitting direction of the exposure unit 30A face each other, but at this time, the respective optical axes are not necessarily on the same axis, and may be offset in the substrate conveyance direction. It is preferable that the alignment axis 50 and the exposure unit 30A are disposed so that at least one of the optical axes is strictly oriented in the vertical direction. By arranging the alignment camera 50 and the exposure unit 30A in this manner, the optical system of the alignment camera 50 and the exposure unit 30A can be maintained in the most stable state, and optimum optical performance can be obtained.

第4圖表示工件W上之單位圖案區域AP與對準記號MA、及對準相機50與曝光單元30A、30B之2個曝光區域AE的位置關係。在所圖示之例子,對準記號MA係對一個單位圖案區域AP(在一次對準及描繪的範圍)形成4個(2個×2列),對準相機50係可將位置調整成在相機視野的中心拍攝對準記號MA。 Fig. 4 shows the positional relationship between the unit pattern area AP on the workpiece W and the alignment mark MA, and the two exposure areas AE of the alignment camera 50 and the exposure units 30A and 30B. In the illustrated example, the alignment mark MA forms four (2 x 2 columns) for one unit pattern area AP (in the range of one alignment and drawing), and the alignment camera 50 can adjust the position to The center of the camera's field of view is taken with the alignment mark MA.

此外,對準記號MA之個數及配置係因應於描繪之圖案適當地設定,對準相機50之台數及配置係因應於該設定所決定,這是當然。 Further, the number and arrangement of the alignment marks MA are appropriately set in accordance with the pattern to be drawn, and the number and arrangement of the alignment cameras 50 are determined in accordance with the settings, which is of course.

該構成之本直接曝光裝置100係如以下所示動作。藉伺服系統將供給捲盤10、曝光輥40以及捲繞捲盤11 控制成正確地同步旋轉,供給捲盤10所捲繞之工件W係經由導輥12、13、曝光輥40、浮起吸引導引單元60以及導輥14,被捲繞於捲繞捲盤11。曝光輥40之多孔圓筒構件41的旋轉位置係藉線性尺度45、線性感測器46正確地檢測出。 The direct exposure apparatus 100 of this configuration operates as follows. The reel 10, the exposure roller 40, and the winding reel 11 are supplied by the servo system. The workpiece W wound by the supply reel 10 is controlled to rotate synchronously, and the workpiece W wound by the supply reel 10 is wound around the winding reel 11 via the guide rollers 12 and 13, the exposure roller 40, the floating suction guiding unit 60, and the guide roller 14. . The rotational position of the porous cylindrical member 41 of the exposure roller 40 is correctly detected by the linear scale 45 and the line sensor 46.

在此工件W之搬運移動中,經由負壓源43及控制器(調壓器)44使吸入凹部42a變成負壓時,工件W在吸入區間α被多孔圓筒構件41的周面吸附。即,從多孔圓筒構件41之最下方的吸附開始位置至最上方的脫離位置,工件W被多孔圓筒構件41的周面固持並在圓筒面上移動。吸附開始位置係同時是對準相機50之對對準記號MA的拍攝位置。工件W之吸附係為了在拍攝位置必定開始,從比拍攝位置更稍微上游側(供給側)開始較佳。 In the conveyance movement of the workpiece W, when the suction concave portion 42a is brought to a negative pressure via the negative pressure source 43 and the controller (pressure regulator) 44, the workpiece W is adsorbed by the circumferential surface of the porous cylindrical member 41 in the suction section α. In other words, the workpiece W is held by the peripheral surface of the porous cylindrical member 41 and moves on the cylindrical surface from the lowest suction start position of the porous cylindrical member 41 to the uppermost release position. The suction start position is simultaneously the photographing position of the alignment mark MA aligned with the camera 50. The adsorption of the workpiece W is preferably started at the imaging position, and is preferably from the upstream side (supply side) slightly larger than the imaging position.

又,在工件W之搬運移動中,經由正壓源64將加壓空氣供給至浮起吸引導引單元60的空氣供給槽62a,再使其從導板61之貫穿孔61b吹出,同時經由負壓源63將負壓供給至空氣吸入槽62b,再從貫穿孔61c吸入空氣。藉此空氣之吹出吸入,通過導面61a上之工件W的平面精度變高。 Further, during the conveyance movement of the workpiece W, the pressurized air is supplied to the air supply groove 62a of the floating suction guide unit 60 via the positive pressure source 64, and is then blown out from the through hole 61b of the guide 61, while passing through the negative The pressure source 63 supplies a negative pressure to the air suction groove 62b, and then takes in air from the through hole 61c. Thereby, the air is blown in and out, and the plane accuracy of the workpiece W passing through the guide surface 61a becomes high.

然後,工件W前進,藉對準相機50拍攝一個單位圖案區域AP之4個(2個×2列)對準記號MA,而決定該單位圖案區域AP的座標系統。一個單位圖案區域AP之對準記號MA的拍攝結束時,接著下一個單位圖案區域AP之對準記號MA的拍攝開始,而決定新的座標系統。 Then, the workpiece W is advanced, and the coordinate system of the unit pattern area AP is determined by the alignment camera 50 taking four (2 × 2 columns) alignment marks MA of one unit pattern area AP. When the photographing of the alignment mark MA of one unit pattern area AP is completed, the photographing of the alignment mark MA of the next unit pattern area AP is started, and a new coordinate system is determined.

單位圖案區域AP之4個對準記號MA的拍攝結束時,對準測量部計算所測量之單位圖案區域AP與設計上述之 單位圖案區域AP位置及尺度誤差(對準)。曝光控制部係根據上之誤差,對描繪資料進行座標變換,而製作曝光單元30A與30B之修正描繪資料。 When the shooting of the four alignment marks MA of the unit pattern area AP is completed, the alignment measuring unit calculates the measured unit pattern area AP and designs the above. Unit pattern area AP position and scale error (alignment). The exposure control unit performs coordinate conversion on the drawing data based on the above error, and creates corrected drawing data of the exposure units 30A and 30B.

單位圖案區域AP的前端到達曝光單元30A時,曝光控制部根據修正描繪資料來調變曝光單元30A的DMD元件36,將圖案光照射於工件W上,而將圖案形成於工件W的感光劑層。接著,單位圖案區域AP的既定位置到達曝光單元30B時,一樣地,曝光控制部根據修正描繪資料來調變曝光單元30B的DMD元件36,將圖案光照射於工件W上,而將圖案形成於工件W的感光劑層。此圖案形成係利用已知之多重曝光方法來進行。 When the front end of the unit pattern area AP reaches the exposure unit 30A, the exposure control unit modulates the DMD element 36 of the exposure unit 30A based on the corrected drawing data, irradiates the pattern light onto the workpiece W, and forms a pattern on the photosensitive layer of the workpiece W. . Next, when the predetermined position of the unit pattern area AP reaches the exposure unit 30B, the exposure control unit modulates the DMD element 36 of the exposure unit 30B based on the corrected drawing data, irradiates the pattern light onto the workpiece W, and forms the pattern on The sensitizer layer of the workpiece W. This pattern formation is carried out using a known multiple exposure method.

對多孔圓筒構件41之工件W的吸附解除係只要工件W在曝光單元30A之曝光位置不脫離(被固持)多孔圓筒構件41,可在曝光位置或比曝光位置稍微上游側(供給側)進行。 The adsorption of the workpiece W of the porous cylindrical member 41 is released as long as the workpiece W does not detach (hold) the porous cylindrical member 41 at the exposure position of the exposure unit 30A, and may be slightly upstream (supply side) at the exposure position or the exposure position. get on.

在以上之對工件W的曝光動作,在被多孔圓筒構件41吸附下移動的工件W係可保持高的進給精度,其位置係可利用線性尺度45與線性感測器46正確地檢測出。而且,因為曝光單元30A之曝光係在以高進給精度所進給的工件W之自多孔圓筒構件41的脫離位置的附近執行,所以可實現高的描繪精度。又,因為曝光單元30B之曝光係可對以高進給精度所進給並利用浮起吸引導引單元60維持高的平面性之工件W進行,所以一樣地可實現高的描繪精度。 In the above exposure operation to the workpiece W, the workpiece W moving under the adsorption by the porous cylindrical member 41 can maintain high feed accuracy, and its position can be correctly detected by the linear scale 45 and the line sensor 46. . Further, since the exposure of the exposure unit 30A is performed in the vicinity of the detachment position of the workpiece W fed by the high feed precision from the porous cylindrical member 41, high drawing accuracy can be realized. Further, since the exposure system of the exposure unit 30B can be performed on the workpiece W which is fed with high feed precision and which maintains high flatness by the floating suction guiding unit 60, high drawing accuracy can be realized in the same manner.

此外,在圖示之實施形態之曝光單元30A的曝光,可得到如下的優點。多孔圓筒構件41所吸引之工件W係 形成曲面,但是如上述所示,多孔圓筒構件41上係在面精度(面之平滑性)與工件進給精度上優異。因此,在曝光區域AE中,包含面精度與工件進給精度優異之多孔圓筒構件41上的曝光區域(寬度Y1)。另一方面,比交線S下游側之曝光區域(寬度Y2)係工件W被假設成平面,但是實際上,因為脫離多孔圓筒構件41,所以有平面精度誤差(曝光單元30A之理想焦點面與曝光區域AE的偏差)隨著遠離多孔圓筒構件41而擴大的傾向。因此,使曝光區域AE跨在交線S之上游側與下游側。又,藉由將交線S之下游側的曝光寬度Y2設定成比上游側之曝光寬度Y1大,防止實質上的焦點深度(從光學系統之焦點深度除去曝光區域AE之工件W的平面精度誤差者)變淺,而可使描繪圖案細線化。即,藉由使下游側之平面上的曝光寬度Y2比曲面上的曝光寬度Y1大,在曝光單元30A之焦點深度內描繪圖案這件事就變得容易。具體而言,將下游側的寬度設定成7成以上,設定成8成以上較佳。具體上在曝光寬度Y是10mm時,上游側的寬度是Y1=2~3mm,下游側的寬度是Y2=7~8mm。 Further, in the exposure of the exposure unit 30A of the illustrated embodiment, the following advantages can be obtained. The workpiece W system attracted by the porous cylindrical member 41 Although the curved surface is formed, as described above, the porous cylindrical member 41 is excellent in surface precision (surface smoothness) and workpiece feeding accuracy. Therefore, in the exposure region AE, the exposure region (width Y1) on the porous cylindrical member 41 excellent in surface precision and workpiece feeding accuracy is included. On the other hand, the exposure area (width Y2) on the downstream side of the intersection line S is assumed to be a plane, but actually, since the porous cylindrical member 41 is detached, there is a plane precision error (ideal focal plane of the exposure unit 30A). The deviation from the exposure region AE tends to increase as it moves away from the porous cylindrical member 41. Therefore, the exposure area AE is made to straddle the upstream side and the downstream side of the intersection line S. Further, by setting the exposure width Y2 on the downstream side of the intersection line S to be larger than the exposure width Y1 on the upstream side, the substantial depth of focus (the plane precision error of the workpiece W from which the exposure area AE is removed from the focal depth of the optical system is prevented) Lightening, the drawing pattern can be thinned. That is, by making the exposure width Y2 on the plane on the downstream side larger than the exposure width Y1 on the curved surface, it is easy to draw a pattern in the depth of focus of the exposure unit 30A. Specifically, the width on the downstream side is set to 70% or more, and it is preferably set to 80% or more. Specifically, when the exposure width Y is 10 mm, the width on the upstream side is Y1 = 2 to 3 mm, and the width on the downstream side is Y2 = 7 to 8 mm.

在曝光單元30A與30B進行曝光動作之間,平行地執行下一個單位圖案區域AP之對準記號拍攝步驟、與資料修正步驟。因此,單位圖案區域AP之曝光結束時,曝光單元30係使下一個單位圖案區域AP之曝光連續地開始。 Between the exposure units 30A and 30B performing the exposure operation, the alignment mark photographing step and the data correction step of the next unit pattern area AP are performed in parallel. Therefore, when the exposure of the unit pattern area AP is completed, the exposure unit 30 causes the exposure of the next unit pattern area AP to continuously start.

為了平行地進行對準記號拍攝步驟與資料修正步驟,曝光單元30A、30B與對準相機50係如第4圖所示,在考慮單位圖案區域AP之大小下,使其位置分開成單位圖案區域AP的4個對準記號MA進入兩者之間(兩者之間的距離比單 位圖案區域AP更長)。因為本實施形態之曝光單元30A與對準相機50係隔著曝光輥40位於上下,所以使曝光輥40小形化,亦可確保其距離。又,因為曝光單元30A與對準相機50配置成隔著曝光輥40在鉛垂方向排列,所以可最高效率地利用輥,可提高工件W之對準精度與生產力。 In order to perform the alignment mark photographing step and the data correcting step in parallel, the exposure units 30A, 30B and the alignment camera 50 are separated into a unit pattern area in consideration of the size of the unit pattern area AP as shown in FIG. The four alignment marks MA of the AP enter between the two (the distance between the two is greater than the single The bit pattern area AP is longer). Since the exposure unit 30A and the alignment camera 50 of the present embodiment are positioned above and below the exposure roller 40, the exposure roller 40 can be made smaller, and the distance can be secured. Further, since the exposure unit 30A and the alignment camera 50 are arranged in the vertical direction with the exposure roller 40 interposed therebetween, the roller can be utilized most efficiently, and the alignment accuracy and productivity of the workpiece W can be improved.

在以上之實施形態,將第1曝光單元30A設置於工件W之自多孔圓筒構件41的脫離位置的附近,並將第2曝光單元30B設置於在多孔圓筒構件41之下游側所配置的浮起吸引導引單元60上。相對地,第5圖係使單一之曝光單元30的曝光區域AE跨在工件W之自多孔圓筒構件41的脫離位置與浮起吸引導引單元60上的位置的實施形態。依此方式,藉由使曝光單元30之對工件W之曝光區域的至少一部分位於浮起吸引導引單元60上,確保曝光區域的平面性,又,藉由使用曝光輥之高的工件進給精度,可實現高的描繪精度。 In the above embodiment, the first exposure unit 30A is disposed in the vicinity of the detachment position of the workpiece W from the porous cylindrical member 41, and the second exposure unit 30B is disposed on the downstream side of the porous cylindrical member 41. The floating attraction guide unit 60 is floated. In contrast, FIG. 5 is an embodiment in which the exposure area AE of the single exposure unit 30 is spanned over the position of the workpiece W from the disengaged position of the porous cylindrical member 41 and the position on the floating suction guiding unit 60. In this manner, by placing at least a portion of the exposed area of the workpiece W of the exposure unit 30 on the floating suction guiding unit 60, the planarity of the exposed area is ensured, and further, the workpiece feed by using the exposure roll is high. Accuracy for high drawing accuracy.

進而,如上述所示,在以上的實施形態中之一對曝光單元30A、30B中之下游側的曝光單元30B、與浮起吸引導引單元60係可省略。第10圖、第11圖表示在第1圖、第2圖,省略了曝光單元30B與浮起吸引導引單元60的實施形態。在此實施形態,導輥14構成工件W之切線方向導引手段。即,工件W係在脫離多孔圓筒構件41後,根據導輥14在多孔圓筒構件41的最上部在水平切線(切面)方向移動(從多孔圓筒構件41所脫離的工件W係藉導輥(導引手段)14將脫離角度調整成水平)。而且,若依據本實施形態,可使上游側之曝光單元30A的曝光區域包含曝光輥40(圓筒構件)之切線(切面)方向的 平面區域,而可使曝光影像之對焦的區域比以往之曝光輥式的直接曝光裝置更擴大。此特徵係第1實施形態亦具備的特徵。此外,在第10圖、第11圖之實施形態,在第3圖、第4圖、第6圖以及第9圖被描繪一對的曝光區域AE係成為僅曝光單元30A之一個曝光區域AE。 Further, as described above, in the above embodiment, the exposure unit 30B on the downstream side of the exposure units 30A and 30B and the floating suction guide unit 60 can be omitted. FIGS. 10 and 11 show an embodiment in which the exposure unit 30B and the floating suction guiding unit 60 are omitted in FIGS. 1 and 2 . In this embodiment, the guide roller 14 constitutes a tangential direction guiding means for the workpiece W. That is, after the workpiece W is detached from the porous cylindrical member 41, the guide roller 14 moves in the horizontal tangential (tangential) direction at the uppermost portion of the porous cylindrical member 41 (the workpiece W detached from the porous cylindrical member 41 is guided) The roller (guiding means) 14 adjusts the disengagement angle to a level). Further, according to the present embodiment, the exposure region of the upstream exposure unit 30A can be included in the tangential (cut surface) direction of the exposure roller 40 (cylindrical member). In the flat area, the area where the exposure image is focused can be expanded more than the conventional exposure roll type direct exposure apparatus. This feature is also a feature of the first embodiment. Further, in the embodiments of Figs. 10 and 11, the pair of exposure regions AE are depicted in the third, fourth, sixth, and ninth embodiments as only one exposure region AE of the exposure unit 30A.

若依據此第10圖、第11圖之實施形態,可在抑制曝光輥40之直徑下亦高精度地進行工件W的對準與描繪位置的修正,又,可使曝光影像之對焦的區域比以往之曝光輥式的直接曝光裝置更寬廣。結果,得到可在比以往之直接曝光裝置省空間下實現高精度之處理的曝光裝置。 According to the embodiment of the tenth and eleventh drawings, the alignment of the workpiece W and the correction of the drawing position can be accurately performed while suppressing the diameter of the exposure roller 40, and the area of the focus of the exposure image can be made larger. In the past, the exposure roller type direct exposure device was wider. As a result, an exposure apparatus capable of realizing high-precision processing in a space saving ratio compared with the conventional direct exposure apparatus is obtained.

100‧‧‧直接曝光裝置 100‧‧‧Direct exposure device

10‧‧‧供給捲盤 10‧‧‧Supply reel

11‧‧‧捲繞捲盤 11‧‧‧Winding reel

12、13、14‧‧‧導輥(切線方向導引手段) 12, 13, ‧ ‧ guide rollers (steering direction guide)

30A(30)‧‧‧曝光單元(曝光手段、第1曝光單元) 30A (30)‧‧‧Exposure unit (exposure means, first exposure unit)

30B(30)‧‧‧曝光單元(曝光手段、第2曝光單元) 30B (30)‧‧‧Exposure unit (exposure means, second exposure unit)

40‧‧‧曝光輥 40‧‧‧Exposure roller

41‧‧‧多孔圓筒構件 41‧‧‧Porous cylindrical components

41X‧‧‧軸心 41X‧‧‧Axis

41a‧‧‧微細孔 41a‧‧‧Micropores

42‧‧‧中心固定體 42‧‧‧Center fixed body

45‧‧‧線性尺度 45‧‧‧ linear scale

46‧‧‧線性感測器 46‧‧‧Line sensor

50‧‧‧對準相機(攝像手段) 50‧‧‧Aligning the camera (camera means)

60‧‧‧浮起吸引導引單元(平面導引手段) 60‧‧‧Floating suction guiding unit (plane guiding means)

W‧‧‧長條狀工件 W‧‧‧ long strip workpiece

AE‧‧‧曝光區域 AE‧‧‧Exposure area

Claims (9)

一種直接曝光裝置,使用將圖案曝光於從供給捲盤所抽出並被捲繞捲盤所捲繞之長條狀工件之光調變元件陣列,其特徵為包括:圓筒構件,係在該供給捲盤與捲繞捲盤之間,一面在工件之周面的固定範圍固持長條狀工件一面旋轉;切線方向導引手段,係在自該圓筒構件的脫離位置在與該圓筒構件之軸正交截面的徑向正交的切線方向導引長條狀工件;以及第1曝光手段,係對從該圓筒構件所脫離並在該切線方向延伸的長條狀工件,至少在包含該脫離位置之搬運方向的前後固定寬度描繪圖案。 A direct exposure apparatus using an array of light-modulating elements for exposing a pattern to an elongated workpiece drawn from a supply reel and wound by a winding reel, characterized by comprising: a cylindrical member attached to the supply Between the reel and the winding reel, one side of the workpiece is fixed in a fixed range of the workpiece, and the tangential direction guiding means is in a disengaged position from the cylindrical member and the cylindrical member a radially-orthogonal tangential direction of the orthogonal cross-section of the axis guides the elongated workpiece; and the first exposure means is for at least the elongated workpiece that is detached from the cylindrical member and extends in the tangential direction The front and rear fixed width drawing patterns are separated from the conveyance direction of the position. 如申請專利範圍第1項之直接曝光裝置,其中該前後固定寬度係自脫離位置往搬運方向下游側的寬度比往上游側的寬度寬。 The direct exposure apparatus according to claim 1, wherein the front and rear fixed width is wider from a disengagement position to a downstream side in the conveyance direction than to an upstream side. 如申請專利範圍第1項之直接曝光裝置,其中拍攝形成於該長條狀工件之對準記號的對準相機被配置於隔著該圓筒構件與該曝光手段相對向的位置。 A direct exposure apparatus according to claim 1, wherein the alignment camera that photographs the alignment mark formed on the elongated workpiece is disposed at a position opposed to the exposure means via the cylindrical member. 如申請專利範圍第3項之直接曝光裝置,其中該第1曝光手段的光軸與對準相機的光軸係朝向鉛垂方向。 The direct exposure apparatus of claim 3, wherein the optical axis of the first exposure means and the optical axis of the alignment camera are oriented in a vertical direction. 如申請專利範圍第3項之直接曝光裝置,其中該圓筒構件係至少在該第1曝光手段的曝光位置與該對準相機的拍攝位置,將該長條狀工件固持於其周面。 The direct exposure apparatus of claim 3, wherein the cylindrical member holds the elongated workpiece on a peripheral surface thereof at least at an exposure position of the first exposure means and an imaging position of the alignment camera. 如申請專利範圍第1項之直接曝光裝置,其中更包括:平 面導引手段,係在比自該圓筒構件的脫離位置下游側,以非接觸將長條狀工件平面狀地支撐於導面;及第2曝光手段,係在該平面導引手段上對該長條狀工件曝光。 For example, the direct exposure device of claim 1 of the patent scope further includes: The surface guiding means supports the elongated workpiece in a planar manner on the downstream side of the disengaged position from the cylindrical member in a non-contact manner; and the second exposure means is on the plane guiding means The elongated workpiece is exposed. 如申請專利範圍第6項之直接曝光裝置,其中該第2曝光手段之曝光區域係跨在該長條狀工件之自該圓筒構件的脫離位置與平面導引手段上的位置。 The direct exposure apparatus of claim 6, wherein the exposure area of the second exposure means is located at a position on the elongate workpiece from the disengaged position of the cylindrical member and the plane guiding means. 如申請專利範圍第6項之直接曝光裝置,其中該第1曝光手段之曝光區域與該第2曝光手段之曝光區域存在於大致同一平面上。 The direct exposure apparatus of claim 6, wherein the exposure area of the first exposure means and the exposure area of the second exposure means are present on substantially the same plane. 如申請專利範圍第6項之直接曝光裝置,其中該平面導引手段係包括氣體吹出手段與氣體吸入手段的浮起吸引導引手段。 The direct exposure apparatus of claim 6, wherein the plane guiding means comprises a floating suction guiding means of the gas blowing means and the gas suction means.
TW104129741A 2014-09-26 2015-09-09 Direct exposure apparatus TW201624142A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014196544A JP6424053B2 (en) 2014-09-26 2014-09-26 Direct exposure system
JP2014196543A JP6460699B2 (en) 2014-09-26 2014-09-26 Direct exposure system

Publications (1)

Publication Number Publication Date
TW201624142A true TW201624142A (en) 2016-07-01

Family

ID=55605613

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104129741A TW201624142A (en) 2014-09-26 2015-09-09 Direct exposure apparatus

Country Status (3)

Country Link
KR (1) KR102352984B1 (en)
CN (1) CN105467773B (en)
TW (1) TW201624142A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106839430B (en) * 2017-03-30 2023-01-31 广东美的厨房电器制造有限公司 Microwave water heater
JP6925921B2 (en) * 2017-09-26 2021-08-25 株式会社アドテックエンジニアリング Exposure equipment and exposure method
CN109116685B (en) 2018-09-14 2020-11-20 重庆惠科金渝光电科技有限公司 Exposure method and exposure device thereof
CN113219791B (en) * 2021-02-04 2023-04-18 源能智创(江苏)半导体有限公司 Exposure device for reel-to-reel substrate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235877A (en) * 1999-12-14 2001-08-31 Sony Chem Corp Exposure method
JP2004146792A (en) * 2002-08-29 2004-05-20 Nikon Corp Holding device for optical member, illuminating optical device, exposure system, and method of exposure
KR100628455B1 (en) * 2002-12-21 2006-09-28 주식회사 이오테크닉스 Chip-scale marker and marking method
JP2006098720A (en) 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd Drawing apparatus
JP4491311B2 (en) * 2004-09-30 2010-06-30 富士フイルム株式会社 Image recording apparatus and image recording method
KR101737680B1 (en) * 2011-12-20 2017-05-18 가부시키가이샤 니콘 Substrate processing device, device manufacturing system and device manufacturing method
JP2013254113A (en) * 2012-06-07 2013-12-19 Arisawa Mfg Co Ltd Exposure device and exposure method
JP2014035412A (en) 2012-08-08 2014-02-24 Nikon Corp Exposure device and device manufacturing method

Also Published As

Publication number Publication date
KR102352984B1 (en) 2022-01-18
CN105467773A (en) 2016-04-06
KR20160037080A (en) 2016-04-05
CN105467773B (en) 2018-10-09

Similar Documents

Publication Publication Date Title
TWI541932B (en) A substrate processing apparatus and a substrate processing method
TWI417684B (en) Exposure apparatus and exposure method
TWI662373B (en) Exposure device
KR101816327B1 (en) Substrate processing device
US20100128239A1 (en) Exposure method and exposure apparatus
TW201624142A (en) Direct exposure apparatus
JP2007310209A (en) Exposure device
CN1756290A (en) Image forming apparatus
JP4304165B2 (en) Exposure method and exposure apparatus
JP2009237334A (en) Exposure apparatus and exposure method
JP6723831B2 (en) Exposure equipment
WO2013065451A1 (en) Substrate processing unit and method for processing substrate
JP6424053B2 (en) Direct exposure system
JP6460699B2 (en) Direct exposure system
JP5477862B2 (en) Film exposure apparatus and film exposure method
JP7175150B2 (en) Exposure device