CN105467773B - direct exposure device - Google Patents
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- CN105467773B CN105467773B CN201510617271.6A CN201510617271A CN105467773B CN 105467773 B CN105467773 B CN 105467773B CN 201510617271 A CN201510617271 A CN 201510617271A CN 105467773 B CN105467773 B CN 105467773B
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Abstract
Direct exposure device, by pattern exposure in the direct exposure device from the strip workpiece that supply spool is sent out and is winding on winding reel, the focus alignment area of exposure image can be expanded, and the lines of depicting pattern is made to attenuate while inhibiting exposure roller diameter to increase.The direct exposure device has：Cylinder part keeps being rotated while strip workpiece in a certain range of its circumferential surface between above-mentioned supply spool and winding reel；Guiding elements guides strip workpiece in strip workpiece at the disengaging configuration that above-mentioned cylinder part is detached from along the tangential direction vertical with the radial direction in the axis vertical cross-section of above-mentioned cylinder part；And exposure component, before and after the conveying direction comprising above-mentioned disengaging configuration in a certain range, to the strip workpiece depicting pattern for being detached from from above-mentioned cylinder part and extending along above-mentioned tangential direction.
Description
Technical field
The present invention relates to the direct exposure devices of so-called roll-to-roll mode, are being sent out from supply spool and are being wound spool
In the conveying of the strip workpiece of winding, a face depicting pattern positive and negative to its.
Background technology
Usually as the substrate material of the electronic circuit board (printed circuit board) for mobile phone and mobile device etc.
Material, for example, using be 0.1mm or less by thickness and strip workpiece that length is 500mm or more (for example, 100m) (photonasty is long
Film (synthetic resin soft film made of photoreceptor is coated on positive and negative at least one face)) be formed as the workpiece of web-like.
In addition, in recent years, description light without using transfer mask being shone directly into substrate and depicts the direct exposure device of pattern
It emerges in the market, also uses the requirement of this Exposure mode increasingly strong strip workpiece.
As the direct exposure device of this roll-to-roll mode, in order to carry out the conveying and exposure of continuous strip workpiece
Light, there is known following direct exposure devices：It (is exposed using the flat conveyer between supply spool and winding reel
Light conveyer), strip workpiece is kept, and (patent document 1) is exposed on the conveyer.
In addition, it is also known that there are following direct exposure devices：To (being exposed in the roller between supply spool and winding reel
Smooth roll) barrel surface on the strip workpiece advanced be exposed (patent document 2).
【Patent document 1】Japanese Unexamined Patent Publication 2006-098720 bulletins
【Patent document 2】Japanese Unexamined Patent Publication 2014-035412 bulletins
If to the mode that is exposed on planar conveyer and the mode that is exposed on cylindric roller
It is compared, conveyer mode keeps entirely being exposed for workpiece more excellent in terms of region is planar, still, due to stream
Waterline length increases, and exposure device is easy enlargement, and face precision in the case of locally observed at exposure position
It is poor.In contrast, since roller mode can shorten pipeline length, so can realize the miniaturization of exposure device, and
It is excellent in terms of face precision (flatness in face) and workpiece feed accuracy.On the other hand, roller mode is due to (bent in barrel surface
Face) on be exposed, so the focus alignment area there are exposure image is narrow, the more difficult problem of the description of filament.If increased
Roller diameter is exposed, then the problem is eased, but sacrifices miniaturization.
In addition, from the viewpoint of the feed accuracy of workpiece, in conveyer mode, due to the complications of conveyer belt or flexible
Deng influence, feed accuracy is likely to decrease.On the other hand, for roller mode, although by the adsorption zone on absorption of workpieces to roller
In can obtain higher feed accuracy, but as noted previously, as adsorption zone is not plane (for barrel surface), so there is exposure
The narrow problem of the focus alignment area of image.
Invention content
The first object of the present invention is to obtain a kind of direct exposure device, in the direct exposure device of exposure roller mode
In, the focus alignment area of exposure image can be expanded, and make the lines of depicting pattern while inhibiting exposure roller diameter to increase
Attenuate.
In addition, the second object of the present invention is to obtain a kind of direct exposure device, movement is carried out in absorption workpiece
In the direct exposure device of roller mode, the high feed accuracy of the cylinder part of absorption conveying workpieces can be flexibly used, work is kept
The flatness of part improves the precision of exposure image, and so that the lines of depicting pattern is attenuated.
The present invention is a kind of direct exposure device, it uses array of light modulation elements, by pattern exposure in from supply roll
The strip workpiece on winding reel is sent out and be winding to axis, and the direct exposure device is characterized in that having：Cylindrical portion
Part, between above-mentioned supply spool and winding reel, in a certain range of its circumferential surface keep strip workpiece while into
Row rotation；Tangential direction guiding elements, in strip workpiece at the disengaging configuration that above-mentioned cylinder part is detached from, along with it is above-mentioned
The vertical tangential direction of radial direction in the axis vertical cross-section of cylinder part guides strip workpiece；And the 1st exposure component, until
It is few before and after the conveying direction comprising above-mentioned disengaging configuration in a certain range, to being detached from from above-mentioned cylinder part and being cut along above-mentioned
The strip workpiece depicting pattern that line direction extends.
Preferably in above-mentioned front and back a certain range, range ratio from disengaging configuration to conveyance direction downstream side is from being detached from position
The range for setting conveying direction upstream side is wide.
The direct exposure device of the present invention is also preferably that shooting is formed in the alignment of the alignment mark of above-mentioned strip workpiece
Camera configuration is across above-mentioned cylinder part and at the position opposite with above-mentioned exposure component.
Also preferably, the optical axis of component and the optical axis of alignment cameras are exposed towards vertical direction.
Above-mentioned cylinder part is preferably at least in the camera site of the exposure position and above-mentioned alignment cameras of above-mentioned exposure component
Place keeps above-mentioned strip workpiece on the circumferential face.
The present invention is also preferably to have：Cylinder part, between above-mentioned supply spool and winding reel, in its circumferential surface
A certain range in keep strip workpiece while rotated；Plane guiding elements, in strip workpiece from above-mentioned circle
The downstream side for the disengaging configuration that cartridge unit is detached from, by the strip workpiece in the state that strip workpiece is not contacted with guide surface
Support is planar；And the 2nd exposure component, on above-mentioned plane guiding elements, to above-mentioned strip workpiece depicting pattern.
The exposure region of above-mentioned 2nd exposure component can cross over above-mentioned strip workpiece from above-mentioned circle in one mode
The position on disengaging configuration and plane guiding elements that cartridge unit is detached from.
The exposure region of the exposure region of above-mentioned 1st exposure component and the 2nd exposure component is physically located on substantially same plane.
Specifically, above-mentioned guiding elements can for example be taken out by the suspension for blowing out component and gas aspiration means with gas
Guiding elements is inhaled to constitute.
It is a kind of direct exposure device using exposure roller to strip workpiece continuous exposure according to the present invention, meanwhile,
Including depicting pattern in front and back a certain range of the conveying direction of the disengaging configuration of cylinder-like part, so tangent line (tangent plane) side
To plane area be included in exposure region in, the focus alignment area of exposure image can be made than the direct exposure of previous exposure roll shape
Device is wide.As a result, the hachure for the pattern to be exposed can be realized.
In addition, the present invention further configures the shape not contacted with guide surface in strip workpiece in the downstream side of cylinder part
Under state by the strip workpiece support be planar guiding elements, make the exposure region for strip workpiece of exposure component
At least part is located on guiding elements, and thus, it is possible to be put down to workpiece using the high feed accuracy and guiding elements of cylinder part
Face property is kept, and improves the precision of exposure image, and the lines of depicting pattern is made to attenuate, wherein the cylinder part is in supply spool
Between winding reel, keep being rotated while strip workpiece in a certain range of its circumferential surface.
Description of the drawings
Fig. 1 is the integrally-built side view for showing the direct exposure device of the present invention.
Fig. 2 is its stereogram.
Fig. 3 is the stereogram of an example for showing exposing unit.
Fig. 4 be illustrate unit cell pattern region (alignment mark), alignment cameras and exposing unit on strip workpiece it
Between interval example expanded view.
Fig. 5 is the axis vertical sectional view for the details for showing exposure roller.
Fig. 6 is the figure of an example for showing the exposure region relative to strip workpiece.
Fig. 7 is the stereogram of suspension pump unit monomer.
Fig. 8 is its exploded perspective view.
Fig. 9 is the schematic diagram for showing the exposure status based on array of light modulation elements in exposure region.
Figure 10 is another embodiment of the direct exposure device of the present invention, is to show to remove downstream from the structure of Fig. 1
The embodiment after guidance unit, corresponding with Fig. 1 side view is aspirated in the exposing unit of side and suspension.
Figure 11 is the stereogram corresponding with Fig. 2 of the embodiment of Figure 10.
Label declaration
100：Direct exposure device；10：Supply spool；11：Winding reel；12、13、14：(tangential direction guiding is single for deflector roll
Member)；30A(30)：Exposing unit (exposure component, the 1st exposing unit)；30B(30)：Exposing unit (exposure component, the 2nd exposure
Unit)；36：DMD elements (array of light modulation elements)；40：Expose roller；41：Perforated cylinder component；41a：Micropore；42：Center
Fixed body；42a：Aspirate recess portion；43：Negative pressure source；44：Controller；45：Linear graduation；46：Linear transducer；50：Alignment cameras
(imaging member)；60：Suspend suction guidance unit (plane guiding elements)；61：Guide plate；61a：Guide surface；61b：Through hole (gas
Body blows out component)；61c：Through hole (gas sucking component)；62：Air loop main body；62a：Air feed trough；62b：Air
Suction socket；63：Negative pressure source；64：Positive pressure source；MA：Alignment mark；W：Strip workpiece；α：Aspirate section.
Specific implementation mode
Fig. 1, Fig. 2 are the overall diagrams for an embodiment for showing the direct exposure device 100 of the present invention.Directly exposing
In device 100, exposure roller 40 is located at the supply spool 10 for sending out strip workpiece (hereinafter referred to as making " the workpiece ") W being wound
With between the winding reel 11 that is wound to workpiece W, in the top of the exposure roller 40 there is the conveying direction along workpiece W to separate
A pair of of exposing unit (exposure component, exposure plotting portion) 30A and 30B, there is alignment cameras 50 thereunder.Workpiece W by
It coats synthetic resin soft film made of photoreceptor on positive and negative at least one face to constitute, workpiece W is sent by supply spool 10
After going out, exposure roller 40 is reached by deflector roll 12,13, and then spool 11 is wound after deflector roll (tangential direction guidance unit) 14
Winding.Suspension suction guidance unit (the plane guiding positioned at the lower surface of workpiece W is provided between exposure roller 40 and deflector roll 14
Component) 60.
The exposing unit 30B configurations in the downstream side in a pair of of exposing unit 30A, 30B are suspending on suction guidance unit 60.
Although the structure is conducive to the high feed accuracy using exposure roller 40 (cylinder part) and the suction 60 (plane of guidance unit that suspends
Guiding elements) flatness of workpiece W is kept, the precision of exposure image is improved, the lines of depicting pattern is made to attenuate, still, with
Following characteristics are without direct relation：The plane area in tangent line (tangent plane) direction of exposure roller 40 (cylinder part) is set to be included in upstream side
Exposing unit 30A exposure region in, so as to keep the focus alignment area of exposure image more direct than previous exposure roll shape
Exposure device is wide.I.e. it is capable to omit the exposing unit 30B in downstream side and the suction guidance unit 60 that suspends.About this point,
It will be described later using attached drawing.
As shown in Fig. 2, Fig. 5, exposure roller 40 has：Centered on the 41X of axle center, not shown driving source carries out rotation drive
Dynamic perforated cylinder component 41；And the center fixed body 42 in the perforated cylinder component 41, the fixed body 42 at center
A part for circumferential surface is formed with suction recess portion (slot) 42a, and the suction recess portion (slot) 42a is to being formed in perforated cylinder component 41
Countless micropores (suction hole) 41a of circumferential surface applies negative pressure.Via negative pressure source 43 and controller (adjuster) 44, to aspirating recess portion
42a applies negative pressure.When carrying out rotation driving to perforated cylinder component 41 in the state of having supplied negative pressure to suction recess portion 42a,
In the suction section α (Fig. 5) for being formed with suction recess portion 42a, air, knot are aspirated from the micropore 41a of perforated cylinder component 41
Fruit workpiece W is adsorbed the circumferential surface for being held in perforated cylinder component 41 and rotation.
Determine the suction section α of suction recess portion 42a and the position of deflector roll 13 and deflector roll 14 so that from end on observation
When perforated cylinder component 41, it (is set lowermost position) in the extreme higher position (uppermost position in fig-ure) of perforated cylinder component 41 and extreme lower position
Between, workpiece W is aspirated and is rotated by perforated cylinder component 41.Determine the position of deflector roll 13 so that workpiece W from perforated cylinder component
Horizontal tangent line (tangent plane) direction of the 41 vertical bottom of radial direction enters the (horizontal cutting in lower section of perforated cylinder component 41
Start suction at line (tangent plane) direction and radial intersection point (intersecting lens) to keep), determine the position of deflector roll 14 so that by workpiece
(water above is discharged to horizontal tangent line (tangent plane) direction of the top vertical with the radial direction of perforated cylinder component 41 in W
Terminate suction at truncation line (tangent plane) direction and radial intersection point (intersecting lens) to keep).That is, the suction district of suction recess portion 42a
Between α be set at across starting to the position of perforated cylinder component 41 and workpiece W to take off absorption of workpieces from perforated cylinder component 41
From position substantially half cycle between (substantially 180 ゜).In addition, workpiece W at least starts at the both ends of suction section α, i.e. suction
It is aspirated and keeps by perforated cylinder component 41 at position and suction release position.
As illustrated schematically in fig. 2, it is formed with linear graduation 45 in the periphery of the perforated cylinder component 41 of exposure roller 40, exposed
The outside fixed position of smooth roll 40 is equipped with linear transducer 46, and it is more to detect which reads the linear graduation 45
The absolute rotational position of hole cylinder part 41.
The suction guidance unit 60 that suspends is located at outlet (downstream) side of exposure roller 40 (perforated cylinder component 41), passes through gas
Blowout and suction, long size work W is supported to be planar in a non-contact manner, operation principle itself is well-known
's.
Fig. 7, Fig. 8 schematically show suspension suction guidance unit 60, and the suction guidance unit 60 that suspends has guide plate 61 and sky
Air circuit main body 62.Guide plate 61 has countless through holes (blowout hole) 61b being open on its flat guide surface 61a and passes through
Through-hole (suction hole) 61c.Air loop main body 62 is in comb teeth-shaped, and the air being combined with offseting one from another with its broach supplies
To slot 62a and air suction socket 62b, air feed trough 62a is connect with positive pressure source 64, and air suction socket 62b connects with negative pressure source 63
It connects.Through hole 61b is in rectangular in a manner of being connected to air feed trough 62a, and through hole 61c with air suction socket 62b to connect
Logical mode is in rectangular, and air feed trough 62a and air suction socket 62b are provided so that the through hole of blow out air
The row of the row of 61b and the through hole 61c of suction air are parallel with the direction of travel of workpiece W respectively.Originally, the perforation of blow out air
The through hole of hole and suction air can configure multiple suction holes around the blowout hole (suction hole) at center without that must be column-shaped
The mode etc. in (blowout hole).
The suspension aspirates guidance unit 60 via positive pressure source 64 to air feed trough 62a supply forced air and from through hole
61b is blown out, while being applied negative pressure to air suction socket 62b via negative pressure source 63 and being aspirated air from through hole 61c, thus, it is possible to
Improve on guide surface 61a by workpiece W plane precision.
Specifically, the AFU1 that above suspension suction guidance unit 60 can use PISCO Co., Ltds to manufacture is (accurate
Floating type).
A pair of of exposing unit 30 is essentially identical structure, and an exposing unit 30A (the 1st exposing unit 30) is arranged in work
Near the separate position of perforated cylinder component 41, another exposing unit 30B (the 2nd exposing unit 30) is located to suspend to be taken out part W
It inhales on guidance unit 60.
Fig. 3 shows the concrete example of exposing unit 30 (30A and 30B).Exposing unit 30 have light source portion 20, light source portion 20 by
The two light source portion 20a and light source portion 20b of internal structure having the same are constituted.Since light source portion 20a and light source portion 20b is phase
Same structure, so, it is illustrated using light source portion 20a as representative.
Light source portion 20a by UV lamp 21, the 1st total reflection mirror 22, collector lens 23, the 2nd total reflection mirror 24, fly's-eye lens 25,
Aperture is (not shown) to be constituted.Light source portion 20a has UV lamp 21, and the various wavelength projected from 365nm to 440nm from UV lamp 21 coexist
Ultraviolet light.
The ultraviolet light projected from UV lamp 21 is irradiated by 26 heavenwards direction of elliptical reflector, passes through the 1st total reflection mirror 22
It will be assembled towards horizontal direction is changed by collector lens 23, and will be towards changing into ground side by the 2nd total reflection mirror 24
To (direction of workpiece W).The ultraviolet light of direction is changed as four light beams are branched to by fly's-eye lens 25 and aperture.
Light beam further via 8 the 1st projecting lens 33 and 8 speculums 34, is incident on 8 DMD (Digital Micro-mirror
Device：Digital micromirror device) element (array of light modulation elements) 36 and as the light beam that is controlled.This is controlled
Light beam pass through the 2nd projection lens set 37, to be adjusted the multiplying power for the exposure plotting to be projected, and be irradiated to workpiece W.
That is the direct exposure device 100 as drawing apparatus is controlled according to describing the data for desired exposure picture is accommodated in advance
The ultraviolet light of light source portion 20a and light source portion 20b.
The exposure region of exposing unit 30A determines as follows.As described above, workpiece W from perforated cylinder component 41 disengaging after,
It suspends to aspirate and be moved on guidance unit 60, moved (from Round Porous along horizontal tangent direction in the topmost of perforated cylinder component 41
The workpiece W that cartridge unit 41 is detached from aspirates guidance unit 60 by suspension, will be disengaged from angle and is adjusted to horizontal).Exposing unit 30A's
Exposure region AE (Fig. 2, Fig. 3, Fig. 6) is not strictly speaking that simple rectangle is still showed simply by rectangle here, the square
Shape regard the direction (width direction of workpiece W) vertical with the conveying direction of workpiece W as length direction.Moreover, as shown in fig. 6,
For exposure range Y, when on the basis of by intersection point (intersecting lens) S of the axle center 41X of perforated cylinder component 41 and tangential direction,
The exposure range Y2 of downstream side (14 side of deflector roll) is set as the upstream side (barrel surface of perforated cylinder component 41 than intersecting lens S
Side) the big (Y1 of exposure range Y1<Y2).
It is suspending on suction guidance unit 60, the exposing unit 30B that workpiece W is exposed is directed to and is drawn by the suction that suspends
It leads unit 60 and improves the workpiece W of (maintenance) flatness, be exposed in exposure region AE (Fig. 2, Fig. 3, Fig. 6).The exposure
The exposure range Y of unit 30B can be identical as the exposure range Y of exposing unit 30A, can also be different.With exposing unit 30A's
Exposure region is same, and the exposure region AE (Fig. 2, Fig. 3, Fig. 6) of exposing unit 30B is not strictly speaking simple rectangle, still, here
It is showed simply by rectangle, the rectangle is by the direction (width direction of workpiece W) vertical with the conveying direction of workpiece W as length
Spend direction.Exposing unit 30A and 30B is generally aligned in the same plane the exposure region AE that workpiece W is exposed.
Fig. 9 schematically shows the exposure status of exposing unit 30A and 30B in two exposure region AE.In fig.9, by
The circle C that double dot dash line indicates is shared by the 1st projecting lens 33 and speculum 34 shown in Fig. 3 of exposing unit 30A and 30B
According to optical system size, wherein there is DMD (the Digital Micro-mirror that depict of rectangle using thick line
Device：Digital micromirror device) element 36 actual exposure area R.In illustrated example, there are four realities in an exposure region AE
The rectangle region in the direction vertical with the conveying direction of workpiece W comprising this four actual exposure area R is set as AE by border exposure region R.
In addition, exposing light beam in figure 3, branches into eight optical systems, and in the example of figure 9, branch into four optical systems.
In this embodiment, has a pair of alignment cameras 50 separated in the width direction of workpiece W.The alignment cameras 50
It is shot so that it is determined that (amendment) exposing unit 30A and 30B to being pre-formed alignment mark MA (Fig. 4) on the workpiecew
Describe coordinate system.Alignment cameras 50 is used for the absorption starting position relative to exposure roller 40 (perforated cylinder component 41) in workpiece W
Place's shooting alignment mark MA, absorption starting position are equal to camera site.Moreover, alignment cameras 50 and exposing unit 30A across
It exposes roller 40 to be oppositely disposed, and mutual optical axis is located at the substantially plumb position of opposite side across exposure roller 40.Here
It is opposite refer to the shooting direction of alignment cameras 50 and the exposure light of exposing unit 30A to project direction facing with each other, still, at this moment
Respective optical axis can also be deviated without necessarily being on same axis on substrate conveying direction.Alignment cameras 50 and exposure
Unit 30A is preferably arranged to the optical axis of wherein at least one strictly towards vertical direction.50 He of alignment cameras is configured in this way
The optical system of alignment cameras 50 and exposing unit 30A can be remained most stable of state, can obtained by exposing unit 30A
Obtain optimal optical property.
Fig. 4 shows unit cell pattern region AP and alignment mark MA on workpiece W, alignment cameras 50 and exposing unit 30A
Position relationship between two exposure region AE of 30B.In illustrative example, (carried out relative to a unit cell pattern region AP
The primary range being aligned and describe), 4 (2 × 2 row) alignment mark MA are formed with, alignment cameras 50 can carry out position tune
It is whole so that alignment mark MA is taken at the center of camera fields of view 50a.
In addition, the number of alignment mark MA and configuration are suitably set according to the pattern to be described, alignment cameras 50
Number and configuration can certainly be correspondingly determined.
The direct exposure device 100 of above structure acts as follows.Supply spool 10, exposure roller 40, winding reel
11 are accurately synchronized rotation by servo-drive system controls, the workpiece W that supply spool 10 is wound by deflector roll 12,13,
Roller 40 is exposed, suspends and aspirates guidance unit 60, deflector roll 14, is winding to winding reel 11.Pass through linear graduation 45, linear sensing
Device 46 accurately detects the rotation position of the perforated cylinder component 41 of exposure roller 40.
In the conveying of workpiece W movement, applied via 44 couples of suction recess portion 42a of negative pressure source 43 and controller (adjuster)
When adding negative pressure, workpiece W is attracted at suction section α on the circumferential surface of perforated cylinder component 41.That is, from perforated cylinder component 41
Bottom absorption starting position between the disengaging configuration of the top, workpiece W is maintained at the week of perforated cylinder component 41
It is moved on face and in barrel surface.Absorption starting position is in alignment with the position that camera 50 shoots alignment mark MA simultaneously.Workpiece W's
Absorption in shot location preferably in a manner of it must start, from than the camera site slightly on the upstream side position of (supply side)
Start.
In addition, in the conveying movement of workpiece W, the air feed trough of guidance unit 60 is aspirated to suspension via positive pressure source 64
62a supplies forced air and the through hole 61b blowouts from guide plate 61, while applying to air suction socket 62b via negative pressure source 63
Negative pressure simultaneously aspirates air from through hole 61c.Aspirated by the blowout of the air, on guide surface 61a by workpiece W plane
Precision improves.
Moreover, shooting 4 (2 × 2 of a unit cell pattern region AP when workpiece W advances, and by alignment cameras 50
Row) alignment mark MA when, determine the coordinate system of unit cell pattern region AP.As the alignment mark MA of a unit cell pattern region AP
Shooting at the end of, continuously start the shooting of the alignment mark MA of next unit cell pattern region AP, determine new coordinate system.
At the end of the shooting of four alignment mark MA of unit cell pattern region AP, alignment measurement portion calculates the list measured
The position and scale error (alignment) of bit patterns region AP and designed unit cell pattern region AP.Exposure control unit is according to upper
Error is stated, carries out coordinate conversion to describing the data, the correction for generating exposing unit 30A and 30B describes the data.
When the front end of unit cell pattern region AP reaches exposing unit 30A, exposure control unit is described the data according to correction, right
The DMD elements 36 of exposing unit 30A are modulated, the irradiation patterns light on workpiece W, and figure is formed in the photosensitive oxidant layer of workpiece W
Case.Then, when the specified position of unit cell pattern region AP reaches exposing unit 30B, equally, exposure control unit is retouched according to correction
Data are painted, the DMD elements 36 of exposing unit 30B are modulated, the irradiation patterns light on workpiece W, in the photosensitive oxidant layer of workpiece W
Upper formation pattern.The pattern is carried out by known multiple exposing method to be formed.
As long as workpiece W is not detached from (and being kept) at the exposure position of exposing unit 30A from perforated cylinder component 41,
It can be in exposure position or than releasing workpiece W at the exposure position slightly on the upstream side position of (supply side) to Round Porous canister portion
The absorption of part 41.
In the exposure actions above in relation to workpiece W, is adsorbed by perforated cylinder component 41 and mobile workpiece W can be higher
Its feed accuracy is kept, and can accurately detect its position by linear graduation 45 and linear transducer 46.Moreover, because
The workpiece W sent out with high feed accuracy executes the exposure using exposing unit 30A near the position that perforated cylinder component 41 is detached from
Light, so high description precision can be realized.Further, since guiding list can be aspirated to being sent out with high feed accuracy and by suspending
Member 60 maintains the workpiece W of high flatness to carry out the exposure using exposing unit 30B, so, it can equally realize high description precision.
In addition to this, following advantages can be obtained in the exposure that the exposing unit 30A of illustrated embodiment is carried out.It is more
Hole cylinder part 41 aspirate workpiece W it is in curved surface, still, as described above, on perforated cylinder component 41 face precision (face it is smooth
Property) and the aspect of workpiece feed accuracy it is excellent.Therefore, the Round Porous that face precision and feed accuracy are excellent is included in exposure region AE
Exposure region (range Y1) on cartridge unit 41.On the other hand, although in the exposure region (range Y2) than intersecting lens S downstreams
In, it is assumed that workpiece W is plane, still, actually due to being detached from from perforated cylinder component 41, so with from perforated cylinder component
41 is separate, and plane precision error (deviation of the ideal focus face and exposure region AE of exposing unit 30A) is in widened trend.Institute
To make exposure region AE cross over the upstream side and downstream side of intersecting lens S.In addition, the exposure range Y2 in the downstream side of intersecting lens S is set
It is set to bigger than the exposure range Y1 from upstream side, thus, it is possible to prevent the actual depth of focus (from the depth of focus of optical system
The plane precision error of the middle workpiece W for removing exposure region AE and obtain) shoal, realize the hachure of depicting pattern.That is, passing through
Keep the exposure range Y2 in the plane in downstream side bigger than the exposure range Y1 on curved surface, it can be easily exposing unit 30A's
Depicting pattern in the depth of focus.Specifically, it is preferable that the range in downstream side is set as 70% or more, more preferably it is set as 80%
More than.Specifically, when exposure range Y is 10mm, ranging from Y1=2~3mm of upstream side, the ranging from Y2=in downstream side
8~7mm.
During exposing unit 30A and 30B are exposed action, it is performed in parallel next unit cell pattern region AP's
Alignment mark image pickup step and data correcting step.So when the end exposure of unit cell pattern region AP, 30 energy of exposing unit
Enough exposures for continuously starting next unit cell pattern region AP.
In order to concurrently carry out alignment mark image pickup step and data correcting step, as shown in Figure 4, it is contemplated that unit cell pattern
The size of region AP, make exposing unit 30A, 30B and alignment cameras 50 with four alignment mark MA of unit cell pattern region AP at
In mode (in such a way that distance between the two is than unit cell pattern region AP long) between the two, its position has been separated.This reality
The exposing unit 30A and alignment cameras 50 for applying mode are located at up and down across exposure roller 40, so even if exposure roller 40 is minimized,
It can also ensure that its distance.In addition, exposing unit 30A and alignment cameras 50 are configured across exposure roller 40 along vertical direction side by side,
So roller can be utilized most effectively, and the position alignment precision and productivity of workpiece W can be improved.
In embodiment of above, the 1st exposing unit 30A is arranged in workpiece from the position that perforated cylinder component 41 is detached from
Near, the 2nd exposing unit 30B is arranged on the suspension suction guidance unit 60 for being configured at the downstream of perforated cylinder component 41.
In contrast, Fig. 5 is that the exposure region AE of single exposing unit 30 is made to cross over workpiece from the position that perforated cylinder component 41 is detached from
With the embodiment for suspending the position on suction guidance unit 60.In such manner, it is possible to by making exposing unit 30 expose workpiece W
At least part of the exposure region of light, which is located at, to suspend on suction guidance unit 60, it is ensured that the flatness of exposure region, and can
By using the high workpiece feed accuracy of exposure roller, high description precision is realized.
Also, as described above, the downstream side in a pair of of exposing unit 30A, 30B in embodiment of above can be omitted
Exposing unit 30B and the suction guidance unit 60 that suspends.Figure 10, Figure 11 show that exposing unit 30B is omitted in Fig. 1, Fig. 2 and hang
The embodiment of floating suction guidance unit 60.In this embodiment, deflector roll 14 constitutes the tangential direction guidance unit of workpiece W.
That is, workpiece W is after the disengaging of perforated cylinder component 41, with deflector roll 14, perforated cylinder component 41 topmost along horizontal cutting
(the workpiece W being detached from from perforated cylinder component 41 will be disengaged from angle to the movement of line (tangent plane) direction by deflector roll (guidance unit) 14
It is adjusted to horizontal).Moreover, according to the embodiment, tangent line (tangent plane) direction of exposure roller 40 (cylinder part) can be made
Plane area is included in the exposure region of the exposing unit 30A of upstream side, and the focus alignment area of exposure image can be made than previous
Exposure roll shape direct exposure device it is wide.This feature is the feature that the 1st embodiment also has.In addition, in Figure 10, Figure 11
In embodiment, it is only one based on exposing unit 30A that a pair of exposure region AE is depicted in Fig. 3, Fig. 4, Fig. 6 and Fig. 9
Exposure region AE.
According to the embodiment of Figure 10, the Figure 11, the diameter for exposing roller 40 can be inhibited, while being accurately proceed workpiece
The alignment of W and the correction for describing position, and the focus alignment area of exposure image can be made more direct than previous exposure roll shape
Exposure device is wide.It saves space as a result, can get than previous direct exposure device and high-precision processing can be carried out
Exposure device.
Claims (8)
1. a kind of direct exposure device, it uses array of light modulation elements, by pattern exposure in being sent out from supply spool and quilt
The strip workpiece being wound up on winding reel, the direct exposure device are characterized in that having：
Cylinder part keeps strip work between above-mentioned supply spool and winding reel in a certain range of its circumferential surface
It is rotated while part；
Tangential direction guiding elements, in strip workpiece at the disengaging configuration that above-mentioned cylinder part is detached from, edge and above-mentioned circle
The vertical tangential direction of radial direction in the axis vertical cross-section of cartridge unit guides strip workpiece；And
1st exposure component, at least before and after the conveying direction comprising above-mentioned disengaging configuration in a certain range, to from above-mentioned circle
Strip workpiece depicting pattern cartridge unit disengaging and extended along above-mentioned tangential direction,
Shooting be formed in above-mentioned strip workpiece alignment mark alignment cameras configuration across above-mentioned cylinder part and with it is upper
It states at the opposite position of exposure component.
2. direct exposure device according to claim 1, wherein
In above-mentioned front and back a certain range, the range ratio from disengaging configuration to conveyance direction downstream side is from disengaging configuration to conveying side
Range to the upstream side is wide.
3. direct exposure device according to claim 1, wherein
The optical axis of above-mentioned 1st exposure component and the optical axis of alignment cameras are towards vertical direction.
4. direct exposure device according to claim 1, wherein
Above-mentioned cylinder part, will at least in the shot location of the exposure position and above-mentioned alignment cameras of above-mentioned 1st exposure component
Above-mentioned strip workpiece is kept on the circumferential face.
5. a kind of direct exposure device, it uses array of light modulation elements, by pattern exposure in being sent out from supply spool and quilt
The strip workpiece being wound up on winding reel, the direct exposure device are characterized in that having：
Cylinder part keeps strip work between above-mentioned supply spool and winding reel in a certain range of its circumferential surface
It is rotated while part；
Tangential direction guiding elements, in strip workpiece at the disengaging configuration that above-mentioned cylinder part is detached from, edge and above-mentioned circle
The vertical tangential direction of radial direction in the axis vertical cross-section of cartridge unit guides strip workpiece；
1st exposure component, at least before and after the conveying direction comprising above-mentioned disengaging configuration in a certain range, to from above-mentioned circle
The strip workpiece depicting pattern that cartridge unit is detached from and extends along above-mentioned tangential direction；
Plane guiding elements, in the downstream side for the disengaging configuration that strip workpiece is detached from from above-mentioned cylinder part, in strip
Workpiece do not contacted with guide surface in the state of by the strip workpiece support be it is planar；And
2nd exposure component is exposed above-mentioned strip workpiece on above-mentioned plane guiding elements.
6. direct exposure device according to claim 5, wherein
The disengaging configuration peace that the exposure region of above-mentioned 2nd exposure component is detached from across above-mentioned strip workpiece from above-mentioned cylinder part
Position on the guiding elements of face.
7. direct exposure device according to claim 5, wherein
The exposure region of the exposure region of above-mentioned 1st exposure component and the 2nd exposure component is present on substantially same plane.
8. direct exposure device according to claim 5, wherein
Above-mentioned plane guiding elements is that have gas blowout component and the suspension suction guiding elements of gas aspiration means.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014196543A JP6460699B2 (en) | 2014-09-26 | 2014-09-26 | Direct exposure system |
| JP2014-196544 | 2014-09-26 | ||
| JP2014196544A JP6424053B2 (en) | 2014-09-26 | 2014-09-26 | Direct exposure system |
| JP2014-196543 | 2014-09-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105467773A CN105467773A (en) | 2016-04-06 |
| CN105467773B true CN105467773B (en) | 2018-10-09 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510617271.6A Active CN105467773B (en) | 2014-09-26 | 2015-09-24 | direct exposure device |
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| Country | Link |
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| KR (1) | KR102352984B1 (en) |
| CN (1) | CN105467773B (en) |
| TW (1) | TW201624142A (en) |
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| CN106839430B (en) * | 2017-03-30 | 2023-01-31 | 广东美的厨房电器制造有限公司 | Microwave water heater |
| JP6925921B2 (en) * | 2017-09-26 | 2021-08-25 | 株式会社アドテックエンジニアリング | Exposure equipment and exposure method |
| CN109116685B (en) * | 2018-09-14 | 2020-11-20 | 重庆惠科金渝光电科技有限公司 | Exposure method and exposure device thereof |
| CN113219791B (en) * | 2021-02-04 | 2023-04-18 | 源能智创(江苏)半导体有限公司 | Exposure device for reel-to-reel substrate |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103488054A (en) * | 2012-06-07 | 2014-01-01 | 株式会社有泽制作所 | Exposure apparatus and exposure method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2001235877A (en) * | 1999-12-14 | 2001-08-31 | Sony Chem Corp | Exposure method |
| JP2004146792A (en) * | 2002-08-29 | 2004-05-20 | Nikon Corp | Holding device for optical member, illuminating optical device, exposure system, and method of exposure |
| KR100628455B1 (en) * | 2002-12-21 | 2006-09-28 | 주식회사 이오테크닉스 | Chip-scale marker and marking method |
| JP2006098720A (en) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | Drawing apparatus |
| JP4491311B2 (en) * | 2004-09-30 | 2010-06-30 | 富士フイルム株式会社 | Image recording apparatus and image recording method |
| KR101961605B1 (en) * | 2011-12-20 | 2019-03-22 | 가부시키가이샤 니콘 | Substrate processing device, device manufacturing system and device manufacturing method |
| JP2014035412A (en) | 2012-08-08 | 2014-02-24 | Nikon Corp | Exposure device and device manufacturing method |
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2015
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- 2015-09-11 KR KR1020150128984A patent/KR102352984B1/en active IP Right Grant
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| CN103488054A (en) * | 2012-06-07 | 2014-01-01 | 株式会社有泽制作所 | Exposure apparatus and exposure method |
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| KR20160037080A (en) | 2016-04-05 |
| TW201624142A (en) | 2016-07-01 |
| KR102352984B1 (en) | 2022-01-18 |
| CN105467773A (en) | 2016-04-06 |
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