JP2011022585A - Pattern forming apparatus and method, and device manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To achieve exposure with high precision even on a contracted sheet material. <P>SOLUTION: A pattern forming method is provided, which includes: restraining at least two positions of an elongated sheet S in the longitudinal direction to apply a tension in the longitudinal direction to a prescribed area SA<SB>i</SB>in the longitudinal direction; adsorbing and restraining both sides of the sheet material by a holder SH<SB>2</SB>in the width direction intersecting the longitudinal direction of the sheet material to apply a tension in the width direction to the prescribed area SA<SB>i</SB>in the width direction; allowing a backside portion corresponding to the prescribed area of the sheet material S to change in accordance with a flat reference surface while the tensions in the longitudinal direction and in the width direction are applied to the prescribed area; and the prescribed area of the flattened sheet material is irradiated with an energy beam to form a pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a pattern forming apparatus, a pattern forming method, and a device manufacturing method, and more specifically, a pattern forming apparatus and a pattern forming method for forming a pattern in a plurality of regions on the surface of a long sheet material by scanning exposure, The present invention also relates to a device manufacturing method for manufacturing an electronic device using the pattern forming method.

  Flat display panels such as liquid crystal display panels and plasma display panels are gradually becoming larger. For example, in the case of a liquid crystal display panel, a glass substrate (large substrate) used for the manufacture thereof is a large substrate having a side length exceeding 3 m in order to efficiently produce a plurality of screens. It has become. Therefore, the stage apparatus that holds the substrate becomes larger as the substrate becomes larger. In the stage apparatus that processes a substrate of more than 10 kg, the weight of the movable part is nearly 10 tons, and the weight of the entire apparatus exceeds 100 tons. It has become. For this reason, in the near future, it is expected that the substrate will become larger and its manufacture and transport will be difficult, and the stage device will become even larger, which will definitely require a huge investment in infrastructure development. It is.

  On the other hand, an exposure apparatus that uses a roll sheet-like recording medium as an object to be exposed is known, which is mainly used in the field of manufacturing printed wiring boards. If such an exposure apparatus is applied to, for example, the manufacture of a liquid crystal display element, it is freed from the various problems associated with the increase in the size of the glass substrate described above. It is expected to be.

  As exposure apparatuses for conventional sheet-like recording media, for example, exposure apparatuses disclosed in Patent Documents 1 to 3 are known. Even if these exposure apparatuses are used as they are for manufacturing a liquid crystal display element, a desired exposure apparatus can be used. It is difficult to manufacture an accurate liquid crystal display element. For example, a liquid crystal display element is manufactured by overlaying patterns over multiple layers by exposure. However, through processes between layers, phenomena such as sheet shrinkage due to heating, etc., are addressed. There is a need to.

US Pat. No. 5,562,645 US Patent Application Publication No. 2006/0066715 US Pat. No. 6,243,160

  According to the first aspect of the present invention, there is provided a pattern forming method for forming a predetermined pattern in a predetermined region on the surface of a long sheet material, and restrains at least two places in the long direction of the sheet material, Applying a first tension to the predetermined region with respect to the longitudinal direction; constraining the sheet material on both sides in the width direction intersecting the longitudinal direction of the sheet material; and applying the first region to the predetermined region with respect to the width direction Applying a second tension; and having the first and second tensions applied to the predetermined region, the back surface portion of the sheet material corresponding to the predetermined region is made to follow a flat reference surface. And irradiating the predetermined region of the sheet material in a flattened state with an energy beam corresponding to the pattern.

  According to this, for example, heat or the like is applied by the processing of the process, and even a contracted sheet material can be exposed with high accuracy.

  According to the second aspect of the present invention, a pattern is formed on a long sheet material using the pattern forming method of the present invention; and the sheet material on which the pattern is formed is treated. A device manufacturing method is provided.

  According to the third aspect of the present invention, the pattern forming apparatus forms a predetermined pattern in a predetermined region on the surface of the long sheet material, and restrains at least two places in the long direction of the sheet material, A first tension applying device that applies a first tension to the predetermined region with respect to the longitudinal direction; the sheet material is restrained on both sides of the sheet material in a width direction intersecting the longitudinal direction; A second tension applying device that applies a second tension to the predetermined region; a reference surface member having a flat reference surface, and the first and second tensions being applied to the predetermined region, A flattening device for copying a back surface portion corresponding to the predetermined area of the sheet material to the reference surface; and an energy beam corresponding to the pattern in the predetermined area of the sheet material in a flattened state Irradiation device that irradiates; patterning device comprising a are provided.

  According to this, at least two locations in the longitudinal direction of the sheet material are constrained by the first tension applying device, the first tension is applied to the predetermined region with respect to the longitudinal direction, and the width direction is applied by the second tension applying device. The sheet material is restrained on both sides of the sheet, and the second tension is applied to the predetermined region in the width direction. Then, the back surface portion corresponding to the predetermined region of the sheet material follows the flat reference surface of the reference surface member in a state where the first and second tensions are applied to the predetermined region of the sheet material by the flattening device. Is done. Then, the irradiation device irradiates the predetermined region of the flattened sheet material with an energy beam corresponding to the pattern, exposes the sheet material, and forms a pattern. Therefore, for example, heat is applied by the process, and even a contracted sheet material can be exposed with high accuracy.

  According to the fourth aspect of the present invention, a pattern is formed on a long sheet material using the pattern forming apparatus of the present invention; and the sheet material on which the pattern is formed is treated. A device manufacturing method is provided.

It is a figure which shows schematically the structure of the exposure apparatus of one Embodiment. It is a top view which shows schematic structure of the mask stage with which the exposure apparatus of FIG. 1 is provided, and arrangement | positioning of an illumination area | region. It is a top view which shows arrangement | positioning of the projection optical system with which the exposure apparatus of FIG. 1 is provided, and the projection area | region (exposure area | region) on a sheet | seat. 4A and 4B are a side view and a plan view showing a schematic configuration of the stage, respectively. 5A is a cross-sectional view of a table in the vicinity of the auxiliary sheet holder and the holder driving device, and FIG. 5B is a cross-sectional view taken along line BB in FIG. 5A. FIG. 2 is a plan view showing a sheet conveyance system and a stage device provided in the exposure apparatus of FIG. 1. 7A is a plan view showing the vicinity of the conveying roller portions 41 and 42, FIG. 7B is a side view showing the conveying roller portion 41, and FIGS. 7C to 7G are sheets. It is a figure for demonstrating the function of a conveyance system. 5 is a diagram illustrating an example of an arrangement of alignment marks attached to each partition area on a sheet S. FIG. FIG. 2 is a block diagram showing an input / output relationship of a main controller provided in the exposure apparatus of FIG. 1. FIG. 6 is a diagram (No. 1) for describing a flow of operations for sheet exposure in the exposure apparatus of FIG. 1; It is a figure for demonstrating temporary holding | maintenance of the sheet | seat using an auxiliary sheet holder. FIG. 8 is a diagram (No. 2) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; FIG. 10 is a diagram (No. 3) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; It is a figure for demonstrating position alignment of the sheet | seat using an auxiliary sheet | seat holder. FIG. 6 is a diagram (No. 4) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; FIG. 10 is a view (No. 5) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; FIG. 10 is a diagram (No. 6) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; FIG. 8 is a view (No. 7) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; FIG. 10 is a diagram (No. 8) for explaining the flow of operations for sheet exposure in the exposure apparatus of FIG. 1; It is a figure which shows arrangement | positioning of the alignment system which concerns on a modification.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

  FIG. 1 shows a schematic configuration of an exposure apparatus 100 according to an embodiment. The exposure apparatus 100 is a so-called scanner, a multi-lens type projection exposure apparatus that uses a flexible sheet or film (hereinafter collectively referred to as a sheet) as an object to be exposed. In the present embodiment, as an example, a sheet having a thickness of about 100 μm is used.

  The exposure apparatus 100 includes an illumination system IOP, a mask stage MST that holds a mask M, a projection optical system PL that projects an image of a pattern formed on the mask M onto a sheet S, and a sheet stage that holds the sheet S (hereinafter, a stage). A stage device SS including the SST, a sheet transport system 40 for transporting the sheet S, a control system for these, and the like.

Note that the sheet S used in the exposure apparatus 100 of the present embodiment is a continuous long sheet. Sheet S is rolled is set in the roller 40 _1. As described later, the sheet S is pulled out from the roller 40 ₁ by a sheet transport system 40 (transfer roller portions 41 to 44 provided in), through a region directly below the projection optical system PL, collected up by the take-up roller 40 ₂ It is done. In addition, a photosensitive agent (resist) is applied to the surface of the sheet S. In the present embodiment, as an example, the sheet S is drawn from the roller 40 ₁ (fed), but it is assumed to be taken up by the take-up roller 40 ₂ is not limited thereto, the process of pre-exposure, in for example a resist The exposure apparatus 100 can also expose a sheet that is fed from a resist coating apparatus that performs coating and that is sent to a developing apparatus that performs post-exposure processing, for example, development.

  In the following, the vertical direction (vertical direction in FIG. 1 in FIG. 1) parallel to the optical axes of the object plane side and the image plane side portion of the projection optical system PL (except for the intermediate portion between both portions) is the Z axis. The X-axis direction, the Z-axis, and the X-axis are the scanning directions in which the mask M and the sheet S are scanned relative to the projection optical system PL in the direction perpendicular to the direction (the left-right direction in FIG. 1). A description will be given assuming that the orthogonal direction is the Y-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are the θx, θy, and θz directions, respectively.

The illumination system IOP includes a plurality of, here, five illumination system modules (hereinafter simply referred to as illumination systems) IOP _{1 to} IOP ₅ . Each of the illumination systems IOP _{1 to} IOP ₅ includes an ultra-high pressure mercury lamp (light source) that emits ultraviolet light, an elliptical mirror that collects ultraviolet light from the light source, and a wavelength disposed on the optical path of the collected ultraviolet light. And an illumination optical system (all not shown) including a selection filter, an optical integrator, and a field stop. Through the wavelength selection filter, bright lines in the ultraviolet region from ultraviolet light, for example, i-line (wavelength 365 nm) (g-line (wavelength 436 nm) or h-line (wavelength 405 nm)) are extracted as illumination lights IL _{1 to} IL _5. The The extracted illumination lights IL _{1 to} IL ₅ are emitted outside the illumination system IOP (IOP _{1 to} IOP ₅ ) (toward the mask M) along the optical axes AX _{1 to} AX ₅ (see FIG. 2). ).

The optical axes AX ₁ , AX ₃ , and AX ₅ are arranged at predetermined intervals in the Y-axis direction in the XY plane (pattern surface of the mask M) as shown in FIG. The optical axes AX ₂ , AX ₄ are separated from the optical axes AX ₁ , AX ₃ , AX ₅ by a predetermined distance on the + X side, between the optical axes AX ₁ , AX ₃ and between the optical axes AX ₃ , AX ₅ , respectively. Is arranged. That is, the optical axes AX _{1 to} AX ₅ are arranged in a staggered manner in the XY plane.

The illumination systems IOP _{1 to} IOP ₅ illuminate the illumination areas IAM _{1 to} IAM ₅ on the mask M with uniform illuminance with the illumination lights IL _{1 to} IL ₅ around the optical axes AX _{1 to} AX ₅ , respectively. Each illumination area has an isosceles trapezoid shape defined by a field stop (not shown) in the illumination optical system. Details of the configuration of the illumination system IOP (IOP _{1 to} IOP ₅ ) are disclosed in, for example, US Pat. No. 6,552,775.

  As shown in FIG. 1, mask stage MST is arranged below illumination system IOP (−Z side). On the mask stage MST, a rectangular mask M in which a rectangular pattern region is formed on the pattern surface (the surface on the −Z side) is fixed by, for example, vacuum suction. The mask stage MST can be finely driven in the XY plane by a mask stage drive system MSD (not shown in FIG. 1, refer to FIG. 9) including a linear motor and the like, and has a predetermined stroke in the scanning direction (X-axis direction). And can be driven at a predetermined scanning speed.

The position information of the mask stage MST in the XY plane is always obtained by laser interferometers (hereinafter abbreviated as interferometers) 16X and 16Y that constitute a part of the mask stage interferometer system 16 (see FIG. 9). For example, it is measured with a resolution of about 0.25 to 1 nm. The + X side surface and the −Y side surface of the mask stage MST are respectively mirror-finished, and reflection surfaces 15X and 15Y are formed as shown in FIG. The interferometer 16X irradiates the reflecting surface 15X with a plurality of length measuring beams along an optical path parallel to the X axis, receives the reflected light from each reflecting surface 15X, and positions the mask stage MST in the X axis direction. (X position) and rotation in the θz direction are measured. Substantial measurement axis of the interferometer 16X is an axis parallel to the X axis orthogonal to the optical axis AX _3. Interferometer 16Y along optical paths parallel to the Y axis that are orthogonal respectively to the optical axis AX ₁ and AX ₂ two length measuring beams irradiated to the reflecting surface 15Y, by receiving the reflected light from the reflecting surface 15Y, The position (Y position) of the mask stage MST in the Y-axis direction is measured. In addition, instead of the reflection surfaces 15X and 15Y described above, a movable mirror made of a plane mirror may be fixed to the mask stage MST.

  The measurement information of the interferometers 16X and 16Y is supplied to the main controller 50 (see FIG. 9). Main controller 50 controls mask stage MST via mask stage drive system MSD based on measurement information (position information of mask stage MST) of interferometers 16X and 16Y.

As shown in FIG. 1, projection optical system PL is arranged below mask stage MST (on the −Z side). The projection optical system PL of the present embodiment includes, for example, five projection optical system modules (hereinafter simply referred to as projection optics) arranged in a staggered manner corresponding to the arrangement of the optical axes AX _{1 to} AX ₅ as shown in FIG. PL _{1 to} PL ₅ are included. In FIG. 1, the projection optical systems PL ₃ , PL _5, and PL ₄ are located on the back side of the projection optical systems PL ₁ and PL ₂ , respectively. As each of the projection optical systems PL _{1 to} PL ₅ , for example, a bilateral telecentric catadioptric system that forms an equal-magnification erect image on the image plane is used.

The arrangement of the above-mentioned projection optical system _PL 1 _{~PL 5} (optical axis _AX 1 _{~AX 5),} on the sheet S on which the image of the pattern is projected by the projection optical system _PL 1 through PL ₅ projection area _IA 1 _{~IA 5} Are arranged in a staggered manner, similarly to the illumination areas IAM _{1 to} IAM ₅ . Here, the projection areas IA _{1 to} IA ₅ have the same isosceles trapezoid shape as the illumination areas IAM _{1 to} IAM ₅ . The arrangement and shape of the projection area _IA 1 _{~IA 5,} an image of the pattern of the illumination area _IAM 1 _{~IAM 5} on the mask M (partial image), respectively, via a projection optical system _PL 1 through PL ₅ on the sheet S The partial image of the pattern projected on the sheet S is applied to the mask M by driving the mask M and the sheet S in synchronization with the scanning direction (X-axis direction) while projecting onto the projection areas IA _{1 to} IA _5. It is synthesized into one image (composite image) equal to the formed pattern. Therefore, by scanning exposure, the pattern of the mask M is transferred onto the sheet S (in one shot area (partition area) SA _i ) via the projection optical systems PL _{1 to} PL ₅ . Details of the scanning exposure will be described later.

In the present embodiment, since employing the optical system for projecting a magnification erected image as the projection optical system _PL 1 through PL _5, the shape and arrangement of the projection area _IA 1 _{~IA 5} (positional relationship), respectively, the illuminated area IAM ₁ Equivalent to the shape and arrangement (positional relationship) of IAM ₅ Details of the configuration of the projection optical system PL of this embodiment are disclosed in, for example, US Pat. No. 6,552,775.

The exposure apparatus 100 includes a lens controller LC (see FIG. 9) that corrects distortion (positional deviation and / or shape error) of a projection image projected onto the sheet S by the projection optical systems PL _{1 to} PL ₅ . Lens controller LC is perpendicular to the optical axis _AX 1 _~AX directions parallel and the optical axis _AX 1 _{~AX 5} to ₅ at least some of the optical element group (lens group) in the projection optical system _PL 1 through PL ₅ respectively Drive in any tilt direction with respect to the XY plane. Thereby, the distortion (shift, rotation, magnification (scaling), etc.) of the partial image of the pattern projected onto each of the projection areas IA _{1 to} IA ₅ on the sheet S is corrected. The lens controller LC changes the pressure of the gas in the hermetic chamber formed in each of the projection optical systems PL _{1 to} PL _{5 in place of} or in addition to the driving of the optical element group, or these At the same time, the wavelength of the illumination light may be changed.

As shown in FIG. 1, the stage device SS is disposed below (−Z side) the projection optical system PL (PL _{1 to} PL ₅ ). The stage device SS has a base member BS supported almost horizontally by a vibration isolation mechanism (not shown) on the floor, a stage SST that moves while holding the sheet S on the base member BS, and a stage drive that drives the stage SST. A system SSD (not shown in FIG. 1, refer to FIG. 9), a stage interferometer system 18 (refer to FIG. 9) for measuring position information of the stage SST, and the like are included. In FIG. 1, the sheet S is sucked and held on the stage SST.

  As shown in FIG. 1, the stage SST includes a stage main body ST that is levitated and supported on a base member BS by a plurality of non-contact bearings (for example, air bearings (not shown)) provided on the bottom surface, and the stage SST And a Z / leveling device 38 (see FIG. 4A) and a table TB supported by the Z / leveling device 38 at three points.

  As shown in FIG. 4B, the Z / leveling device 38 includes three Z drive mechanisms 38a, 38b, 38c including, for example, voice coil motors arranged at three points not on a straight line on the stage main body ST. have. The Z / leveling device 38 can finely drive the table TB on the stage main body ST in the three degrees of freedom in the Z-axis direction, the θx direction, and the θy direction.

  The stage SST (stage main body ST) is scanned and driven in the X-axis direction (scanning direction) on the base member BS by the stage drive system SSD, and is also finely driven in the Y-axis direction and the θz direction. The stage drive system SSD includes a fine movement device (not shown) that finely drives the stage SST in the Y-axis direction, and a coarse movement device 30 that drives the fine movement device (not shown) in the scanning direction (X-axis direction) (see FIG. 9). And including.

As shown in FIGS. 4B and 6, coarse movement device 30 includes a pair of linear motors 30 ₁ and 30 ₂ provided on one side and the other side of stage SST in the Y-axis direction, respectively. One of the linear motor 30 _1, the base member and the stator 31 ₁ extending arranged X-axis direction on the -Y side of the BS, the movable element 32 which is mounted to be movable along the longitudinal direction of the stator 31 _{1 1} is included. The other of the linear motor _{30. 2,} the base member and the stator 31 ₂ + Y side extending arranged X-axis direction in the BS, the stator 31 ₂ the mover 32 ₂ mounted movably along the longitudinal direction thereof Including. Each of the stators 31 ₁ and 31 ₂ has a plurality of magnets (or coils) arranged along the X-axis direction, and each of the movers 32 ₁ and 32 ₂ has a coil (or magnet). The movers 32 ₁ and 32 ₂ are respectively fixed to the −Y side surface and the + Y side surface of the stage main body ST via a fine movement device (not shown) that minutely drives them in the Y-axis direction. The stage main body ST can be finely driven in the θz direction by generating different thrusts in the linear motors 30 ₁ and 30 ₂ . Instead of the coarse motion device 30 and the fine motion device, for example, a Lorentz electromagnetic force drive type planar motor, a variable magnetoresistive drive type planar motor disclosed in US Pat. No. 5,196,745, etc., magnetic A stage drive system for two-dimensionally driving the stage SST along the upper surface (guide surface) of the base member BS may be configured by a floating plane motor or the like.

  The table TB is placed on the base member BS in the X-axis direction, the Y-axis direction, by the stage drive system SSD (see FIG. 9) including the above-described coarse movement device 30, fine movement device (not shown), and Z / leveling device 38. Driven in the six-degree-of-freedom directions of the Z-axis direction, θx direction, θy direction, and θz direction.

The central portion of the upper surface of the table TB, as shown in FIG. 4 (A) and FIG. 4 (B), the sheet holder SH ₁ for attracting and holding the sheet S is provided. The sheet holder SH ₁ has a rectangular holding surface that is substantially parallel to the XY plane and is somewhat larger than the partition area arranged on the sheet S, and holds the sheet S flat on the holding surface. Here, since the attracting and holding the sheet S, a sheet holder SH _1, the arrangement interval of the pin (pitch) is sufficiently finely, the pin is less height, for example, pin chuck holder of approximately 200μm is employed.

On the upper surface of the table TB, 4 single auxiliary sheet holders SH ₂ of the rear surface of both ends in the width direction of the sheet S (Y-axis direction orthogonal to the longitudinal direction) for holding suction is provided. More specifically, the ± Y side of the sheet holder SH _1, the X-axis direction of each elongated two auxiliary sheet holders SH ₂ is disposed at a predetermined distance in the X-axis direction. Each auxiliary sheet holders SH ₂ has a holding surface of a rectangular, and is configured to be finely driven in the Y-axis and Z-axis directions by a holder driving device provided in the table TB.

5A is a plan view showing the configuration of the holder driving device 60 provided inside the table TB, and FIG. 5B is a sectional view taken along line BB in FIG. 5A. It is shown. Here, as an example, the holder driving device 60 for driving the auxiliary sheet holders SH ₂ is located on the + Y side end and + X side end portion of the table TB is shown.

The holder driving device 60 includes a parallel link mechanism 61 that is a kind of a four-bar linkage mechanism installed in a hollow portion formed in the table TB, and a drive mechanism 63 that drives the parallel link mechanism 61 (drive node thereof). includes a Y driver for driving the auxiliary sheet holders SH ₂ in the Y-axis direction, together with the auxiliary sheet holders SH ₂ to support the base 60 ₁ of the rectangular fixed to the upper surface on the bottom surface of the table TB, Z And a Z drive unit (not shown) configured by, for example, a drive element, a voice coil motor, or the like that is finely driven in the axial direction. Base 60 ₁ of the end portion (-X end), the link located on the opposite side of the fixed link of the parallel link mechanism 61 (hereinafter, for convenience, referred to as parallel movement link) is integrally provided.

More specifically, the parallel link mechanism 61 has one end connected to a pair of link support members 66 ₃ and 66 ₄ fixed to the + X side wall of the hollow portion of the table TB, and the other end connected to the pair of link support members 66 ₃ and 66 _4. comprising an end portion 66 ₅ and the other end 66 a pair of which are connected respectively to the ₆ swing link ₆₄ 4, 64 ₅ translation link above. In this case, since the link support members 66 ₃ and 66 ₄ are fixed to the table TB, a fixed link is configured. The fixed link, the rocking links 64 ₄ and 64 _5, and the translational link constitute a rotating pair of adjacent links.

Drive mechanism 63 includes an actuator 62 having one end secured to a portion of the side wall of the hollow portion of the table TB, one end (driving point 68 ₀₎ is pressed against the actuator 62, the supporting point 68 a _second intermediate portion of the table TB the fixture 66 ₁ fixed to the bottom wall and rotatable in the supported L-shaped lever link 64 _1, one end connected to the lever link 64 ₁ of the other end (the point 68 _3), the other end includes a movable link 64 ₂ connected to the mounting member 66 ₇ fixed to a portion of the parallel movement links described above, the. The lever link 64 ₁ and the movable link 64 _2, constitute a turning pair constitute a turning pair and member 66 ₇ attached to the movable link 64 _2. Further, the attachment member 66 ₇ is connected a spring member (tension spring) 64 ₃ the mounting member 66 ₂ fixed to a portion of the -Y side wall of the hollow portion of the table TB via. In this case, the attachment member 66 ₇ and the spring member (tension spring) 64 _3, constitute a turning pair, and the spring member (tension spring) 64 ₃ and the mounting member 66 ₂ constitute a turning pair.

In the Y drive unit configured as described above, one end (drive point 68 ₀ ) of the lever link 64 ₁ is constantly pressed against the actuator 62 by the spring member (tensile spring) 64 ₃ . Then, the actuator 62 against the pressing force of the spring member _643, the lever link 64 ₁ at one end (driving point 68 ₀₎ in a direction (+ X direction) indicated by a white arrow in FIG. 5 (A) by driving, via a movable link 64 ₂ is driven in the direction (+ Y direction) attachment member 66 ₇ is shown by the black arrow. That is, the base 60 ₁ and the auxiliary sheet holder SH ₂ integrally is driven in the + Y direction. In this case, the amount of movement of the auxiliary sheet holders SH ₂ is determined by the force generated by the actuator 62. Further, as described above, the base 60 ₁ of the auxiliary sheet holders SH ₂ by Z drive unit arranged below, together with the base 60 _1, although being driven in the Z-axis direction, in the following, the base 60 _first auxiliary sheet holder SH ₂ is assumed to be driven in the Z-axis direction. That is, the base 60 ₁ is assumed to be the Z drive section.

Drive of the installed auxiliary sheet holders SH ₂ on the + X side end and the -Y side end of the table TB, albeit symmetrical about the X axis, has the same configuration as the holder driving device 60 described above.

Length between the force point 68 ₁ of the lever link 64 ₁ and the length between the support points 68 _2, and the supporting point 68 ₂ and the point 68 ₃ is, for example, 1: 3. Therefore, when the one end of the drive point 68 ₀ Niteteko link 64 ₁ by an actuator 62 of the holder driving device 60 (drive mechanism 63) + X direction to 10μm drive, lever link 64 ₁ of the bent portion (force point 68 ₁₎ -Y The other end of the lever link 64 ₁ (the working point 68 ₃ ) is driven by 30 μm in the + Y direction. Accordingly, the holder driving device 60 (drive mechanism 63), the auxiliary sheet holder SH ₂ + Y direction can be 30μm driven. Also, holding the both ends of the Y-axis direction of the sheet S by the pair of auxiliary sheet holders SH ₂ which are spaced apart in the Y-axis direction on the table TB, the auxiliary sheet holders SH ₂ in the direction opposite (away direction) to each other By driving the sheet S, the sheet S can be stretched by a maximum of 60 μm.

The driving device for the auxiliary sheet holder SH ₂ installed on the −X side end, the + Y side, and the −Y side of the table TB is also symmetric with respect to the Y axis, but is configured similarly to the above-described holder driving device 60. .

Auxiliary sheet holders SH _2, as described later, supplementarily used when holding flat the sheet S in the sheet holder SH _1. Note that the + Y end on the base 60 _1, rectangular positioning member 60 ₂ is fixed in contact with the auxiliary sheet holder SH _2. The positioning member 60 _2, at the time of sucking and holding the sheet S on the holding surface of the auxiliary sheet holders SH _2, plays a role of positioning the sheet S in the Y-axis direction pressing + Y edge of the sheet S (or -Y end) ing.

  Further, the + X side surface and the -Y side surface of the table TB are mirror-finished, as shown in FIG. 4B, to form reflecting surfaces 17X and 17Y. These reflective surfaces 17X and 17Y are used for position measurement of the stage SST by a stage interferometer system described later. In addition, instead of the reflection surface 17Y described above, a movable mirror made of a plane mirror may be fixed to the table TB. Further, instead of the reflecting surface 17X, a movable mirror made of a retro reflector or a plane mirror may be fixed to the table TB.

As shown in FIG. 6, the stage interferometer system 18 (see FIG. 9) includes interferometers 18X ₁ , 18X ₂ , 18Y ₁ , 18Y ₂ , and position information of the stage SST (table TB) in the XY plane. (Including rotation information in the θz direction) is always measured with a resolution of, for example, about 0.25 to 1 nm.

The interferometers 18X ₁ , 18X ₂ and 18Y ₁ , 18Y ₂ are arranged on the + X side and the −Y side of the projection optical system PL so as to face the reflecting surfaces 17X and 17Y of the table TB, respectively.

The interferometers 18X ₁ and 18X ₂ irradiate the measurement surface parallel to the X axis on the reflection surface 17X of the table TB, receive the reflected light from the reflection surface 17X, and measure the X position of the stage SST, respectively. To do. Interferometers 18Y ₁ and 18Y ₂ each irradiate two measurement beams parallel to the Y axis onto reflecting surface 17Y, receive the reflected light from reflecting surface 17Y, and measure the Y position of stage SST. Here, one of the two measurement beams of the interferometer 18Y ₂ is along an optical path parallel to the Y axis orthogonal to the optical axes AX ₁ , AX ₃ , and AX _5, and the other is the optical axis AX ₂ , AX _4. The reflecting surface 17Y is irradiated along an optical path parallel to the Y axis perpendicular to the surface. The two length measuring beams of the interferometer 18Y ₁ along each of the two optical paths parallel to the Y-axis passing through the alignment system _AL 11, _{AL 12} respective detection centers to be described later, are irradiated to reflection surface 17Y.

Measurement information of the stage interferometer system 18 (interferometers 18X ₁ , 18X ₂ , 18Y ₁ , 18Y ₂ ) is supplied to the main controller 50 (see FIG. 9). When the stage SST is on the base member BS, at least one length measurement beam of the interferometers 18Y ₁ and 18Y ₂ is always irradiated on the reflecting surface 17Y of the stage SST regardless of the X position. The Therefore, main controller 50 uses the measurement information of interferometers 18Y ₁ and 18Y ₂ according to the X position of stage SST. Further, main controller 50 measures the rotation of stage SST in the θz direction based on the measurement information of 18X ₁ and 18X ₂ .

In addition, as each of the interferometers 18X ₁ , 18X ₂ , 18Y ₁ , 18Y ₂ , it is possible to use a multi-axis interferometer that irradiates the reflection surface with a plurality of measurement beams that are separated in the Z-axis direction. In this case, main controller 50 determines not only position information (including rotation information (including yawing amount (rotation amount θz in the θz direction)) of stage SST (table TB) but also inclination information (pitching) with respect to the XY plane. The amount (rotation amount θx in the θx direction) and rolling amount (rotation amount θy in the θy direction) can also be acquired.

  As shown in FIGS. 1 and 6, the sheet conveyance system 40 includes four conveyance roller portions 41 to 44 and a clamper portion 45 arranged in the X-axis direction with the projection optical system PL interposed therebetween.

Each of the conveyance roller units 41, 42, 43, and 44 includes a pair of pressure contact rollers and a driving roller positioned vertically as shown in FIGS. 7A to 7G, for example. As drive roller _{41 2,} 42 _2, 43 2, 44 ₂ which is located on the lower side is located slightly above (+ Z side) from the upper surface of its upper end stage SST (holding surface of the sheet holder SH _1), Both ends thereof are rotatably supported by a support member (not shown) (see FIG. 1). Drive roller 41 _{2, 42 2,} 43 2, 44 ₂ is rotatably driven by a rotary motor (not shown). The pressure rollers 41 ₁ , 42 ₁ , 43 ₁ , 44 ₁ located on the upper side are pressed against the corresponding drive roller from above (+ Z side) by a spring mechanism (not shown).

However, in FIG. 7 (B), as shown by taking the conveying roller unit 41, the pressure roller 41 _1, the driving roller 41 ₂ are both stepped diameter in the portion other than the both ends in the longitudinal direction is smaller than both end portions It is formed in a cylindrical shape with a mark.

For this reason, in each of the transport roller portions 41, 42, 43, and 44, the transport roller portion 41 is typically taken up and the pressure roller (41 ₁ ) and the drive roller (41 ₂ ) as shown in FIG. 7B. The sheet S is sandwiched by both end portions of the sheet S and does not come into contact with the partition region where the pattern on the surface of the sheet S is formed. In each of the conveyance roller portions 41, 42, 43, and 44, the first state in which the sheet S can be held between the pressure roller (41 ₁ ) and the driving roller (41 ₂ ) and the pressing force by the spring mechanism are resisted. The second state in which the pressure roller (41 ₁ ) is separated from the drive roller (41 ₂ ) and the sheet S can be released can be set. Switching between the first state and the second state in each of the transport roller units 41, 42, 43, and 44 is performed by the main controller 50. The driving roller that contacts the back surface of the sheet S may be a cylindrical roller having a certain diameter.

Drive roller 41 _{2, 42 2,} 43 2, 44 _2, together with the roller ₄₀ 1, 40 _2, the main controller 50, the rotation, stoppage is controlled. As shown in FIG. 7B, the sheet S is typically taken up by the conveyance roller unit 41, and the driving roller (41 ₂ ) is rotated around an axis parallel to the Y axis in the first state of the conveyance roller unit. rotation (simultaneously rotating the pressure roller 41 ₁ is in the opposite direction), the fed in the direction of rotation.

In the sheet transfer system 40, as shown in FIG. 7 (C), that each roller ₄₁ 1, 41 ₂ of the conveyance roller 41 is rotated in the arrow direction, the roller 40 _first sheet S is a white arrow It is pulled out in the -X direction shown and sent out toward the transport roller unit 42. Here, when the rotation of the rollers 42 _1, 42 ₂ of the conveying roller unit 42 is stopped at a predetermined timing, the sheet S of a predetermined length (approximately the distance between the transfer roller portions 42, 43) are conveying rollers The portion 41, 42 is bent in a loop shape. In the sheet conveying system 40, as shown in FIG. 7D, the rollers 42 ₁ and 42 of the conveying roller unit 42 are stopped in a state where the rotation of the rollers 41 ₁ and 41 ₂ of the conveying roller unit 41 is stopped. ₂ (and the rollers 43 ₁ , 43 ₂ ) of the conveyance roller unit 43 are rotated in the direction of the arrow, so that the sheet S bent on the loop is outlined toward the area directly below the projection optical system PL. -X direction indicated by

In the sheet conveying system 40, the sheet S is pulled out from the area immediately below the projection optical system PL by the rotation and stop of the rollers of the conveying roller portions 43 and 44, as above. That is, as shown in FIG. 7 (E), in the roller ₄₄ 1, 44 the rollers ₄₃ first conveying roller portion 43 in a state where the rotation is stopped for _2, 43 ₂ is the direction of the arrow of the conveying roller unit 44 When rotated, the sheet S is pulled out from the region immediately below the projection optical system PL, and the pulled-out sheet S is bent in a loop between the transport roller units 43 and 44. Then, as shown in FIG. 7 (F), in the roller ₄₃ 1, 43 the rollers ₄₄ first conveying roller portion 44 in a state where the rotation is stopped for _2, 44 ₂ is the direction of the arrow of the conveying roller unit 43 by being rotated, the sheet S deflected on the loop, is fed to the -X side of the conveying roller unit 44, is wound around the take-up roller 40 _2.

As shown in FIG. 7A and the like, the clamper unit 45 is installed on the −X side of the transport roller unit 42. The clamper unit 45 includes a pair of clamper members 45 ₁ and 45 ₂ capable of setting a first state in which the sheet S is sandwiched from above and below and a second state in which the sandwiching is released.

Clamper member 45 ₁ located on the upper side, a cylindrical roller 46a disposed along the Y-axis direction by a somewhat longer length than the width of the sheet S, a pair of rotatably supporting both ends of the roller 46a Arm member 46b. The pair of arm members 46b are supported by a support member (not shown) so as to be rotatable about a rotation axis parallel to the Y axis. The pair of arm members 46b has a roller 46a attached to the rotating end portion thereof. Therefore, the clamper member 45 _1, by rotating in the clockwise direction about the rotation axis of the pair of arm members 46b, the roller 46a is in contact with the surface of the sheet S (see FIG. 7 (G)), a pair of arms The roller 46 moves away from the sheet S by rotating counterclockwise about the rotation axis of the member 46b.

Clamper member 45 ₂ located on the lower side, the clamper member 45 _1, is a vertically symmetrical have the same configuration. Switching of the state of the clamper unit 45 is performed by the main controller 50.

In the sheet conveying system 40, as shown in FIG. 7G, the pair of clamper members 45 ₁ , 45 ₂ of the clamper unit 45 is set to the first state, and the pair of clamper members 45 ₁ , 45 ₂ sets the sheet. When the rollers of the transport roller unit 43 are rotated in the feeding direction of the sheet S in a state where S is restrained (fixed) and the rotation of the rollers of the transport roller units 41 and 42 is stopped, the clamper of the sheet S A predetermined tension is applied to the portion between the portion 45 and the transport roller portion 43 in the X-axis direction.

Here, as shown in FIG. 7A, the main controller 50 prevents the roller 46a from coming into contact with the partition area where the pattern on the surface of the sheet S is formed, that is, a pair of clamper portions 45. The rollers 46a of the clamper members 45 ₁ and 45 ₂ are brought into contact with an area between adjacent divided areas of the sheet S to restrain (fix) the sheet S. In this way, the stretched sheet S is adapted to be attracted and held on the sheet holder SH ₁ of the stage SST.

Sheet transfer system 40 further includes measuring apparatus for measuring the feed amount of the sheet S (not shown), for example, a drive roller _{41 2,} 42 _2, 43 2, 44 ₂ a rotary encoder or the like for measuring the respective rotational amount ing.

  Details of the conveyance of the sheet S by the sheet conveyance system 40 and the holding of the sheet S on the stage SST during the exposure process will be described later.

Further, the exposure apparatus 100 of the present embodiment, a plurality of to detect the alignment marks affixed to each divided area on the sheet S, where provided Twelve off-axis type alignment system AL ₁ ~AL ₁₂ of It has been. As shown in FIG. 6, the alignment systems AL _{1 to} AL ₆ are arranged at the + X side position of the projection optical system PL so as to face the + Y side end area outside each partition area on the sheet S. Are arranged along. Further, as shown in FIG. 6, the alignment systems AL _{7 to} AL ₁₂ are arranged symmetrically with respect to the alignment systems AL _{1 to} AL ₆ with respect to the X axis orthogonal to the optical axis of the projection area IA ₃ . The alignment systems AL _{7 to} AL ₁₂ can face the area at the −Y side end outside each partition area on the sheet S.

In the present embodiment, as an example, as illustrated in FIG. 8, on both the outer region of the Y-axis direction of the partitioned regions SA _i on the sheet S, one each 6, a total of 12 alignment marks AM is formed In order to detect these twelve alignment marks AM individually and simultaneously, alignment systems AL _{1 to} AL ₁₂ are provided. Therefore, not limited to this, if the alignment system can move in the X-axis direction, at least one instead of the alignment systems AL _{1 to} AL ₆ and at least one each instead of the alignment systems AL _{7 to} AL ₁₂ What is necessary is just to provide the alignment system.

As an example of the alignment systems AL _{1 to} AL ₁₂ , an image processing type FIA (Field Image Alignment) system is employed. The detection results of the alignment systems AL _{1 to} AL ₁₂ (image information of the index mark and the detection target mark) are sent to the main controller 50 via an alignment signal processing system (not shown). In addition to the FIA system, a target mark is irradiated with coherent detection light, and scattered light or diffracted light generated from the target mark is detected, or two diffracted lights (for example, of the same order) generated from the target mark. It is also possible to use an alignment sensor that detects and interferes with each other alone or in appropriate combination.

  FIG. 9 is a block diagram showing the input / output relationship of the main controller 50 that centrally configures the control system of the exposure apparatus 100 and controls the various components.

  Next, the flow of operations for exposing the sheet S using the stage SST in the exposure apparatus 100 of the present embodiment will be described with reference to FIGS. Further, the following description of the operation will be made with reference to a number of drawings, and the same members may or may not be labeled with the same members for each drawing. In other words, although the reference numerals described in the drawings are different, the drawings have the same configuration regardless of the presence or absence of the reference numerals. The same applies to each drawing used in the description so far.

In FIG. 10, among the plurality of partitioned areas arranged on the sheet S, the exposure to the first (i-1) partitioned areas SA _{1 to} SA _i-1 has already been completed, and the next partitioned area SA _i The state immediately before the process for exposure to is started is shown. In the state of FIG. 10, the stage SST used for moving the sheet S in the exposure on the segmented region SA _i is waiting at the position of the + X end portion of the base member BS (standby position).

Incidentally, the load and the mask alignment onto the mask stage MST of the mask M (mask alignment) is usually so performed before starting the exposure for the first segmented region SA ₁ on the sheet S, in the state of FIG. 10, Naturally, the loading of the mask M and the mask alignment are completed. The mask stage MST is assumed to have moved to the scanning start position for exposure on the segmented region SA _i (acceleration starting position).

a. First, the following a1. -A4. According to the procedure, the central portion of the sheet S including the segmented region SA _i is held on the stage SST.
a1. Specifically, the main control device 50 stops the rotation of each roller of the conveyance roller portion 42 of the sheet conveyance system 40 after the conveyance roller portion 41, for example, as described above with reference to FIG. withdrawing the sheet S from the roller 40 ₁ and the like to rotate the respective rollers. Alternatively, the main controller 50 stops the rotation of the rollers of the conveyance roller units 43 and 41 and then reversely rotates the conveyance roller unit 42 to pull back the sheet S from the region directly below the projection optical system PL. In any case, the sheet S having a predetermined length is bent in a loop between the conveying roller portions 41 and 42. The predetermined length is about the distance between the conveying roller portions 42 and 43.

a2. Next, the main controller 50 controls the sheet conveying system 40 based on the position information of the stage SST from the stage interferometer system 18 (18X ₁ , 18X ₂ , 18Y ₁ , 18Y ₂ ), and on the sheet S. The partition area SA _i is positioned on the sheet holder SH ₁ (holding surface) of the stage SST. Here, as described above with reference to FIG. 7G, the main controller 50 uses the clamper unit 45 to hold the sheet S between the partition areas SA _{i + 1} and SA _{i + 2 of} the sheet S ( The sheet S is moved between the clamper unit 45 and the conveying roller unit 43 by rotating the rollers of the conveying roller unit 43 in a state where the rotation of the rollers of the conveying roller units 41, 42, 44 is stopped. A predetermined tension is applied in the X-axis direction to stretch. Further, main controller 50 finely drives stage SST to align sheet holder SH ₁ (the holding surface thereof) with partition area SA _i on sheet S. In this state, a slight space is provided between the sheet S and the sheet holder SH ₁ (holding surface) of the stage SST.

In a state where the stage SST and the sheet S are aligned at the standby position, the alignment mark AM attached to the partition area SA _i is positioned in the detection visual field of each of the alignment systems AL _{1 to} AL ₁₂ .

a3. After the positioning, the main controller 50, while horizontally keeping the table TB of the stage SST via the stage drive system SSD (Z · leveling device 38), the base 60 ₁ four auxiliary sheet holders SH ₂ on the table TB finely drives the + Z direction via a rear surface of the outer portion of the ± Y side of the segmented region SA _i of the sheet S using four auxiliary sheet holders SH ₂ sucked and held.

Specifically, the main controller 50, as shown in FIG. 11, the white end of the + Y side on the table TB, for each two respectively arranged on the end of the -Y side auxiliary sheet holders SH ₂ direction indicated by arrow (+ Y direction or -Y direction) finely drives in, expand the distance between the auxiliary sheet holders SH ₂ of each pair spaced apart in the Y-axis direction on the table TB. The main control unit 50, the auxiliary sheet holder SH ₂ is driven in the + Z direction via a base 60 _1, four of the rear surface of the opposite ends of the Y-axis direction of the sheet S in the auxiliary sheet holders SH ₂ Touch the holding surface. After contact, the main controller 50, + two auxiliary sheet holders SH ₂ of Y side finely drives the -Y direction indicated by the black arrow, with pressing the positioning member 60 ₂ + Y edge of the sheet S, two auxiliary sheet holders SH ₂ on the -Y side finely drives the + Y direction shown in black, by pressing the positioning member 60 ₂ in the -Y edge of the sheet S, to position the sheet S. After positioning, the main controller 50, suction-holds the rear surface of the opposite ends of the Y-axis direction of the sheet S in the four auxiliary sheet holders SH _2. FIG 12, in this way, the sheet S is temporarily held state is indicated by the auxiliary sheet holders SH _2.

a4. After temporary retention of the sheet S, the main controller 50 finely drives the -Z direction four auxiliary sheet holders SH ₂ while provisionally retaining the sheet S through the base 60 _1, sheet comprising a segmented region SA _i the rear surface of the central portion of the S is brought into contact with the holding surface of the sheet holder SH _1. Then, main controller 50 positions the four holding surfaces of the auxiliary sheet holders SH ₂ slightly below (-Z side) than the holding surface of the sheet holder SH _1. Thus, joined by a suitable tension with respect to at least the Y-axis direction to the sheet S, the central portion of the sheet S is fixed on the holding surface of the sheet holder SH _1. In this state, the main controller 50, as shown in FIG. 12, for sucking and holding the sheet S in the sheet holder SH _1. Thus, the central portion of the sheet S including the segmented region SA _i is on the stage SST, is parallel to and held flat in the XY plane.

b. Next, the alignment measurement for the sheet S is performed by the following b1. -B5. It is performed in the procedure.

b1. As described above, in a state where the stage SST is positioned at the standby position, the alignment mark affixed on the segmented region SA _i within each of the detection field of the alignment system AL ₁ ~AL ₁₂ is positioned. Therefore, as shown in FIG. 13, main controller 50 detects alignment marks attached to partition area SA _i on sheet S using alignment systems AL _{1 to} AL ₁₂ (the alignment mark from the center of the index). Measure position). Then, main controller 50 determines the position coordinates of the 12 alignment marks on the XY coordinate system based on the alignment mark detection result and the position information of stage SST from stage interferometer system 18 at the time of detection. Ask.

b2. Next, main controller 50, based on the position coordinates of the 12 alignment marks obtained above, the amount of shrinkage in relation to the block area SA _i inside the Y-axis direction in which a pattern is formed on the sheet S is within a predetermined range It is judged whether it is settled in.
b3. Then, as a result, for example, when it is determined that at least a portion of the inner compartment area SA _i is contracted in the Y-axis direction exceeds the predetermined range, it cancels the suction holding of the sheet S by the sheet holders SH _1, the auxiliary sheet the holder SH ₂ is driven in the + Z direction via a base 60 _1, separating the back surface of the sheet S from the holding surface of the sheet holder SH _1.

Here, for example, when it is determined that the −X end portion inside the partition area SA _i is contracting beyond a predetermined range in the Y-axis direction, as shown in FIG. 14, the −X side on the table TB two driven auxiliary sheet holders SH ₂ a away from each other direction (the direction indicated by a white arrow in FIG. 14) of the tension in the Y-axis directions on the -X side end portion of the segmented region SA _i of the sheet S Further, the distortion of the pattern is corrected (adjusted).

After the adjustment, the main controller 50, each auxiliary sheet holders SH ₂ is driven in the -Z direction through the base 60 _1, the back surface of the sheet S is brought into contact with the holding surface of the sheet holder SH _1, again, the suction holding To do.
b4. Then, main controller 50, an alignment mark affixed on the segmented region SA _i on the sheet S detected using alignment systems AL ₁ ~AL _12, the detection result and the stage interferometer system 18 at the time of detection The position coordinates of the 12 alignment marks on the XY coordinate system are obtained again based on the position information of the stage SST from.
b5. Then, main controller 50 performs predetermined calculation using the least squares method using all or part of the position coordinates of the 12 alignment marks, and has been formed in partition area SA _i on sheet S. Pattern distortion, that is, XY shift, rotation, XY scaling, and orthogonality are obtained.

Here, b2. Results of the determination of, when it is determined to exceed a predetermined ratio shrinkage is not the Y-axis direction on a part of the inner compartment area SA _i, the main control unit 50, b3. And b4. Is skipped and b5. Perform the process.

  Thereafter, the main controller 50 releases the fixing of the sheet S by the clamper 45.

  When the number of alignment systems is smaller than the number of alignment marks to be detected, it is necessary to perform alignment measurement while moving the stage SST holding the sheet S stepwise in the X-axis direction. At this time, the main controller 50 controls the rotation and stop of each drive roller of the sheet conveying system 40 in accordance with the movement of the stage SST.

c. Next, scanning exposure is performed on the partition area SA _i on the sheet S.
c1. Specifically, the main controller 50 moves the stage SST holding the sheet S to the scanning start position (acceleration start position) for exposure based on the alignment measurement result, in particular, the XY shift, and the mask. Alignment is performed with respect to the mask stage MST holding M. Here, in this embodiment, since the acceleration start position of the stage SST is set to the same position (or the vicinity thereof) as the above-described standby position, fine adjustment of the position of the stage SST in the XY plane is performed.

c2. Next, main controller 50 starts accelerating stage SST in the scanning direction (−X direction). Thus, the movement in the -X direction of the stage SST is started, the middle of the movement, specifically, prior to the completion of acceleration of the stage SST, as shown in FIG. 15, the length measuring from the interferometer 18Y ₂ since the beam begins to hit the reflecting surfaces 17Y, immediately thereafter, the main controller 50 switches the laser negotiations for measuring the Y position of the stage SST to the interferometer 18Y ₂ from the interferometer 18Y _1.

c3. Then, when the acceleration of both stages SST and MST is completed and both stages SST and MST reach the constant speed synchronization state, the pattern area on the mask M starts to be illuminated by the illumination light IL ₂ and IL ₄ and exposure is started. The Then, both stages SST, due to the progress of the movement, such as speed synchronization by MST, as shown in FIG. 16, the illumination region _IAM 1 _{~IAM 5} on each mask M by the illumination light _IL 1 _{~IL 5} (see FIG. 2) Projection areas IA ₁ to IA on the sheet S that are illuminated and partial images of patterns in the illumination areas IAM _{1 to} IAM ₅ are respectively held on the stage SST via the projection optical systems PL _{1 to} PL ₅ (see FIG. 3). Projected to IA ₅ .

When the entire pattern area of the mask M is illuminated by the illumination light IL _{1 to} IL ₅ , that is, when the pattern area of the mask M passes through the illumination areas IAM _{1 to} IAM ₅ , the scanning exposure for the partition area SA _i is completed. Thus, within segmented region SA _i, the pattern of the mask M is transferred. That is, a latent image of the pattern of the mask M is formed on the resist layer formed on the surface of the sheet S.

During scanning exposure, main controller 50 drives table Z on stage SST in the Z-axis direction while keeping table TB horizontal, and projects the surface of sheet S held on table TB (sheet holder SH ₁ ) onto projection optical system PL. Is positioned at the focal position (within the depth of focus). Further, during scanning exposure, main controller 50 controls the synchronous drive (relative position and relative speed) of stage SST and mask stage MST based on the result of alignment measurement, and the pattern projected onto sheet S. Correct the distortion of the whole image. Further, the main controller 50 drives and controls optical element groups (lens groups) constituting each of the projection optical systems PL _{1 to} PL ₅ via the lens controller LC, so that the projection areas IA _{1 to} IA on the sheet S are controlled. ₅ corrects the distortion of the partial image of the pattern projected onto each of ₅ . Thus, the projected image of the pattern of the mask M are superimposed with high precision pattern already formed in the segmented region SA _i.

After completion of the scan exposure on the segmented region SA _i, both stages SST, MST is decelerated, as shown in Figure 17, when it reaches the respective scan end position (deceleration end position), and stops. In the present embodiment, the deceleration end position at the time of scanning of the stage SST is determined so as to coincide with the −X end of the base member BS.

  During the scanning exposure, when the main controller 50 drives the stage SST holding the sheet S in the −X direction, the movement of the stage SST is applied to the sheet S in accordance with the movement of the stage SST as before. Each drive roller of the sheet conveying system 40 is appropriately rotated and stopped so as not to be obstructed by the acting tension.

d. As shown in Figure 17, the stage SST is stopped -X end of the base member BS front a deceleration end position, main controller 50, suction holding of the sheet S by the sheet holders SH ₁ and the auxiliary sheet holder SH ₂ Is released and the sheet S is released from the stage SST. Further, main controller 50 retracts table TB of stage SST downward (−Z direction). Thus, the sheet S, with a slight space between the the sheet holder SH ₁ of the stage SST, into an extended state between the transport rollers 42 and 43.

e. After releasing the sheet S, the main controller 50 drives the sheet stage SST in the + X direction, as shown by the black arrow, as shown in FIG. Return to the aforementioned standby position. Here, in accordance with the X position of the sheet stage SST, the interferometers for measuring its Y position is switched to the interferometer 18Y ₁ from the interferometer 18Y _2. Further, main controller 50 drives mask stage MST back to the scan start position (acceleration start position) at a high speed. In parallel with the stage drive, the main controller 50 pulls the sheet S back in the + X direction as shown by the white arrow as shown in FIG.

f. When the return driving of the stage SST and mask stage MST and the pulling back of the sheet S are completed, the stage SST waits at the standby position as shown in FIG. 19, and the next section is placed on the standby stage SST. The center portion of the sheet S including the area SA _{i + 1} is aligned. This state is the same as the state shown in FIG. 10 except that the sheet S is fed by one section area.

Thereafter, main controller 50 starts the exposure for the partitioned area SA _{i + 1 in the same} manner as described above. Thereafter, similarly, the main controller 50 is connected to the a. ~ F. The above procedure is repeated to expose all the partitioned areas on the sheet S.

As described in detail above, the sheet S is restrained (fixed) by the main controller 50 using the clamper unit 45 of the sheet conveying system 40 so as to sandwich the partition areas SA _{i + 1} and SA _{i + 2 of} the sheet S, and Each roller of the transport roller unit 43 rotates with the rotation of the rollers of the transport roller units 41, 42, 44 stopped, and the sheet S is predetermined between the clamper unit 45 and the transport roller unit 43 in the X-axis direction. Given tension. By four auxiliary sheet holders SH _2, after the sheet S is temporarily held by main controller 50, four while temporarily holding the sheet S auxiliary sheet holders SH ₂ is finely driven in the -Z direction, the rear surface of the central portion of the sheet S including the segmented region SA _i is contact with the holding surface of the sheet holder SH _1. The main by the control unit 50, four holding surface of the auxiliary sheet holder SH ₂ is positioned downward slightly from the holding surface of the sheet holder SH ₁ (-Z side), thereby, the width direction on the sheet S (Y-axis appropriate tension is applied also with respect to the direction), the central portion of the sheet S is fixed on the holding surface of the sheet holder SH _1. That is, in a state where the segmented region SA _i XY two-dimensional direction of tension is imparted to the sheet S, the rear surface portion corresponding to the segmented region SA _i of the sheet S, modeled after the flat-shaped holding surface of the sheet holder SH ₁ Is done. Then, the illumination system IOP irradiates the divided areas SA _i of the flattened sheet S with illumination light IL _{1 to} IL ₅ through the pattern of the mask M, and the sheet S is scanned and exposed to form a pattern. The Therefore, for example, heat or the like is applied by the processing of the process, and even the contracted sheet S can be exposed with high accuracy. Therefore, it is possible to contribute to the manufacture of electronic devices such as a flexible large-screen display without increasing the size of the apparatus.

In the exposure apparatus 100 of the above embodiment, alignment measurement is performed on the sheet S using the alignment systems AL _{1 to} AL ₁₂ that are separated in the Y-axis direction and arranged in the X-axis direction. However, the present invention is not limited to this. For example, alignment marks are arranged around the partition area SA _i on the sheet S at a predetermined interval, and the alignment system corresponding to the alignment mark arrangement is divided as shown in FIG. and configuration corresponding to the periphery of the region SA _i, may be detected all the alignment marks simultaneously. In this case, when it is determined that the partition area SA _i is contracted in the X-axis direction based on the measurement result of the position of the alignment mark, the main controller 50 causes the clamper unit 45 and the transport roller unit 43 to move. The tension in the X-axis direction may be applied to the sheet S to adjust the scaling error in the X-axis direction of the partition area.

  In the above embodiment, the case where exposure is performed on the second and subsequent layers by the exposure apparatus 100 with the sheet S on which patterns are already formed in each of a plurality of partitioned regions as an exposure target is illustrated, but the present invention is not limited thereto. Of course, the exposure apparatus 100 can expose the first layer with the unexposed sheet S as an exposure target.

In the above embodiment, the case where the stage SST and the mask stage MST are scanned in the −X direction to perform scanning exposure (referred to as minus scan exposure) on the sheet S has been described. A configuration in which the mask stage MST is driven to scan in the + X direction and scanning exposure (plus scan exposure) on the sheet S is adopted, and minus scan exposure and plus scan exposure are alternately repeated, so that a plurality of sheets on the sheet S can be scanned. The partitioned areas SA _k−1 , SA _k , SA _{k + 1} ,... May be exposed. This eliminates the need to rewind the mask stage MST and the stage SST. In this case, in order to hold the sheet S on the stage SST at the −X end on the base member BS, it is desirable to dispose an additional clamper on the + X side of the transport roller portions 43 and 44. In addition, an alignment system may be arranged on the −X side of the projection optical system PL.

  In the above-described embodiment, the configuration using only one stage SST is adopted. However, the configuration in which the back surface of the partition area to be exposed on the sheet is sequentially sucked and held using two or more stages is adopted. Is also possible. In this case, the stage device SS may be configured so that the stage goes around a closed path including the scanning exposure section on the base member. Thereby, after the exposure with respect to one division area is complete | finished, the used stage can be evacuated out of a scanning exposure area, and the exposure with respect to the next division area can be started immediately using another stage. It is also possible to employ a configuration in which a plurality of sheets are exposed in parallel using a plurality of stages.

In the exposure apparatus of the above embodiment, the auxiliary sheet holder SH ₂ that can be micro-driven in the Z-axis direction is provided on the upper surface of the stage (table). It can also be configured so that it can be driven minutely in the direction. Accordingly, the auxiliary sheet holder temporarily holding the sheet and the sheet holder can be relatively driven in the Z-axis direction so that the sheet can be attached to and detached from the stage (sheet holder). In the above-described embodiment, the conveyance roller unit included in the sheet conveyance system 40 can be configured to be movable up and down in the Z axis direction. Accordingly, it is possible to attach and detach the sheet on the stage (sheet holder) by raising and lowering the conveyance roller section that stretches the sheet.

In the above embodiment, the case where the stage SST is asymmetric with respect to the Y axis passing through the center is illustrated, but the present invention is not limited to this, and a stage that is symmetric with respect to the X axis and Y axis passing through the center may be used. Of course. In this case, since the position measurement of a stage by the interferometer 18Y ₂ immediately after the end of the scanning exposure it can not be, it is desirable to provide a measuring device for measuring the Y position.

  In the above embodiment, the stage interferometer system 18 is employed as the position measurement system for the stage SST, but an encoder (or an encoder system composed of a plurality of encoders) may be employed instead. Alternatively, the stage interferometer system 18 and the encoder may be used in combination. Further, although the interferometer system is employed as the mask stage position measurement system, an encoder (or an encoder system including a plurality of encoders) may be employed instead. Or you may use together an interferometer system and an encoder.

  In the exposure apparatus 100 of the above embodiment, the projection optical system of the same magnification multi-lens type is used. However, the present invention is not limited to this, and for example, an enlargement disclosed in US Patent Application Publication No. 2008/0165334. It is also possible to use a multi-lens type projection optical system. Of course, the projection optical system is not limited to the multi-lens type. Further, the projection optical system is not limited to the equal magnification system and the enlargement system, but may be a reduction system, and is not limited to the catadioptric system, and may be a refraction system or a reflection system. Either of these is acceptable.

Further, as a light source of the exposure apparatus 100, not only an ultrahigh pressure mercury lamp that emits bright lines such as g-line (wavelength 436 nm), h-line (wavelength 405 nm), i-line (wavelength 365 nm), but also a solid-state laser (for example, 3 Double harmonic: wavelength 355 nm), KrF excimer laser (248 nm), ArF excimer laser (193 nm), F ₂ laser (157 nm) can also be used.

  In each of the above-described embodiments, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used, and the mask pattern is passed through a projection optical system. The case of projecting onto a sheet is illustrated. However, the present invention is not limited to this. Instead of a mask, a spatial light modulator (SLM) that is an element that spatially modulates the amplitude (intensity), phase, or polarization state of light traveling in a predetermined direction, For example, a reflective spatial light modulator, that is, a non-light emitting image display element such as DMD (Digital Micro-mirror Device), a reflective liquid crystal display element, an electrophoretic display (EPD), electronic paper (or electronic ink) ), An electronic mask (variable molding mask, active mask, or image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on the electronic data of the pattern using a light diffraction type light valve (Grating Light Valve), etc. May also be used. Such an electronic mask is disclosed in, for example, US Pat. No. 6,778,257. Further, an electronic mask using a transmissive spatial light modulator such as a transmissive liquid crystal display element (LCD) or an electrochromic display (ECD) may be used. For example, when an electronic mask such as DMD is used, an energy beam corresponding to a pattern to be formed on the sheet material is projected from the electronic mask onto the sheet material via a projection optical system, and an image corresponding to the pattern is displayed on the sheet material. Formed on top. In this case, when the projection optical system is not used, an energy beam corresponding to the pattern is irradiated onto the sheet by the electronic mask, and the pattern is formed on the sheet.

  The use of the exposure apparatus is not limited to the exposure apparatus for liquid crystal display elements, but is also widely used in, for example, exposure apparatuses for manufacturing flexible displays as organic EL display elements, electronic paper, printed wiring boards, and the like. Applicable.

The apparatus for forming a pattern on a sheet is not limited to the above-described exposure apparatus (lithography system), and the present invention can also be applied to an apparatus for forming a pattern on a sheet by, for example, an ink jet method. In this case, instead of arranging the above-described plurality of projection optical systems PL _{1 to} PL ₅ along the Y-axis direction, a plurality (or one large-sized) inkjet head may be arranged along the Y-axis direction.

<Device manufacturing method>
By forming a predetermined pattern on the sheet using the exposure apparatus of each of the above embodiments, an electronic device, for example, a liquid crystal display element can be manufactured.

[Pattern forming process]
First, a so-called photolithography process is performed in which the exposure apparatus of each of the above embodiments sequentially forms an image corresponding to a pattern to be formed on a sheet on a sheet coated with a resist via a projection optical system. By this photolithography process, a predetermined pattern including a large number of electrodes and the like is formed on the sheet. Thereafter, the exposed sheet undergoes various processes such as a development process, an etching process, and a resist stripping process, whereby a predetermined pattern is formed on the sheet.

[Color filter forming process]
Next, a color filter in which a set of three dots corresponding to R (Red), G (Green), and B (Blue) is arranged in a matrix or a filter with three stripes of R, G, and B A color filter in which a plurality of sets are arranged in the horizontal scanning line direction is formed.

[Cell assembly process]
After the color filter forming step, a cell assembling step is performed in which a liquid crystal cell is assembled using the sheet having a predetermined pattern obtained in the pattern forming step, the color filter obtained in the color filter forming step, and the like. In the cell assembly process, for example, a liquid crystal panel (liquid crystal cell) is manufactured by injecting liquid crystal between a sheet having a predetermined pattern obtained in the pattern formation process and the color filter obtained in the color filter formation process. To do.

[Module assembly process]
Thereafter, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal cell are attached to complete a liquid crystal display element. Therefore, in the pattern forming step of the microdevice manufacturing method, a pattern image having a desired line width can be accurately formed at a desired position, and as a result, a liquid crystal display element can be manufactured with a high yield.

In addition, the exposure apparatus and the exposure method in each of the above embodiments are suitable for manufacturing flexible electronic devices (microdevices) including a flexible display. For example, in the first embodiment described above, with respect to the longitudinal direction of the sheet, the resist coating device and the like for applying a resist on the surface of the sheet S between the roller 40 ₁ and the exposure apparatus 100, the exposure apparatus 100 and the take-up roller a developing device for developing the sheet S on which a pattern is formed between the 40 ₂ arranged, it is possible to construct a production line for manufacturing the electronic device.

  In general, at least a sheet is formed by forming a pattern on the sheet S using the exposure apparatus and the exposure method of the above-described embodiment and processing the sheet S on which the pattern is formed based on the pattern. An electronic device including a part of S can be manufactured. Here, developing the sheet S based on the formed pattern, etching, printing, or the like can be appropriately applied to processing the sheet S based on the formed pattern. Further, as printing, for example, applying a predetermined material such as conductive ink to the sheet S based on the formed pattern is applicable. In this printing, a layer of a functional material (for example, a material whose properties such as water repellency, hydrophilicity or hydrophobicity change by irradiation with ultraviolet rays) is formed in advance on the sheet S, and this functional material It is possible to apply an exposure pattern to the layer S and apply a material such as conductive ink to the sheet S corresponding to the formed exposure pattern.

  The exposure apparatus and exposure method of the present invention are suitable for forming a pattern on a long sheet. The device manufacturing method of the present invention is suitable for manufacturing an electronic device (micro device).

41, 42, 43, 44 ... conveying roller section, 41 ₁ , 42 ₁ , 43 ₁ , 44 ₁ ... pressure contact roller, 41 ₂ , 42 ₂ , 43 ₂ , 44 ₂ ... drive roller, 45 ... clamper section, 45 ₁ , 45 ₂ ... clamper member, 50 ... main controller, 60 ... holder drive device, 60 ₁ ... base, 61 ... parallel link mechanism, 63 ... drive mechanism, 100 ... exposure apparatus, S ... sheet, SA _i ... partition area, SH ₂ ... auxiliary sheet holder, SH ₁ ... sheet holder, TB ... table, IOP (IOP _{1 to} IOP ₅ ) ... illumination system, PL (PL _{1 to} PL ₅ ) ... projection optical system, IL _{1 to} IL ₅ ... illumination light, AL _{1 to} AL ₁₂ ... alignment system, AM ... alignment mark, LC ... lens controller.

Claims (18)

A pattern forming method for forming a predetermined pattern in a predetermined region on the surface of a long sheet material,
Constraining at least two locations in the longitudinal direction of the sheet material, and applying a first tension to the predetermined region with respect to the longitudinal direction;
Constraining the sheet material on both sides in the width direction intersecting the longitudinal direction of the sheet material, and applying a second tension to the predetermined region in the width direction;
Causing the back surface portion corresponding to the predetermined region of the sheet material to follow a flat reference surface in a state where the first and second tensions are applied to the predetermined region;
Irradiating the predetermined region of the planarized sheet material with an energy beam corresponding to the pattern.   When applying the first tension to the sheet material, the sheet material is disposed using at least two drive rollers that are arranged apart in the longitudinal direction of the sheet material and rotate in contact with the sheet material. The pattern forming method according to claim 1, wherein the rotation of the driving roller located upstream in the feeding direction of the sheet material is stopped during feeding in the longitudinal direction.   When the first tension is applied to the sheet material, the sheet material is fed by the pair of clamp members while the sheet material is fed in the longitudinal direction using a driving roller that rotates in contact with the sheet material. The pattern forming method according to claim 1, wherein the sheet material is sandwiched and feeding of the sheet material is temporarily stopped.   When applying the second tension to the sheet material, at least on one side and the other side in the direction parallel to the second axis perpendicular to the first axis parallel to the longitudinal direction with the reference plane member interposed therebetween A plurality of suction holding members arranged one by one are used to suck a back surface portion outside the predetermined area of the sheet material, and the plurality of suction holding members are relatively aligned with each other along a direction parallel to the second axis. The pattern formation method as described in any one of Claims 1-3 to which it moves automatically.   2. The method according to claim 1, further comprising: detecting at least a part of a plurality of alignment marks attached to the predetermined area on the sheet material, and correcting the first and second tensions based on the detection result. The pattern formation method as described in any one of -4. An energy beam corresponding to the pattern is projected onto the sheet material via a projection optical system, and an image of the pattern is formed on the sheet material,
Detecting at least a part of a plurality of alignment marks attached to the predetermined region on the sheet material, and based on the detection result, optical characteristics of the projection optical system, the first and second tensions, The pattern formation method as described in any one of Claims 1-5 which further includes adjusting at least 1 of these. Forming a pattern on a long sheet material using the pattern forming method according to claim 1;
Treating the sheet material with the pattern formed thereon;
A device manufacturing method including: A pattern forming apparatus for forming a predetermined pattern in a predetermined region on the surface of a long sheet material,
A first tension applying device that restrains at least two places in the longitudinal direction of the sheet material and applies a first tension to the predetermined region in the longitudinal direction;
A second tension applying device that constrains the sheet material on both sides of the sheet material in the width direction intersecting the longitudinal direction and applies a second tension to the predetermined region in the width direction;
A reference surface member having a flat reference surface is included, and a back surface portion of the sheet material corresponding to the predetermined region is copied to the reference surface in a state where the first and second tensions are applied to the predetermined region. And a flattening device
An irradiation apparatus that irradiates an energy beam corresponding to the pattern onto the predetermined region of the sheet material in a flattened state.   The first tension applying device is disposed apart in the longitudinal direction of the sheet material, and includes at least two drive rollers that rotate in contact with the sheet material to send the sheet material in the longitudinal direction. The pattern according to claim 8, wherein during the feeding of the sheet material, the rotation of a driving roller located upstream in the feeding direction of the sheet material is stopped to apply the first tension to the sheet material. Forming equipment.   The first tension applying device includes a drive roller that rotates in contact with the sheet material to feed the sheet material in the longitudinal direction, and a pair of clamps during feeding of the sheet material by the drive roller The pattern forming apparatus according to claim 8, further comprising: a clamping device that sandwiches the sheet material by a member and temporarily stops the feeding of the sheet material. The second tension applying device includes a plurality of suction holding members that suck a back surface portion outside the predetermined area of the sheet material,
The plurality of suction holding members are:
At least one each is arranged on one side and the other side in a direction parallel to the second axis perpendicular to the first axis parallel to the longitudinal direction across the reference surface member, and in a direction parallel to the second axis The pattern formation apparatus as described in any one of Claims 8-10 provided relatively movable along.   The pattern forming apparatus according to claim 11, wherein a plurality of the suction holding members are arranged on at least one of one side and the other side in a direction parallel to the second axis across the reference surface member. The second tension applying device includes a drive system for driving the suction holding member,
The pattern forming apparatus according to claim 11, wherein the drive system includes a parallel link and a drive device that drives the parallel link.   By driving at least one of the at least one pair of suction holding members and the reference surface member in a direction perpendicular to the two-dimensional plane, the at least one pair of suction holding members and the reference surface member is moved to the two-dimensional plane. The pattern formation apparatus as described in any one of Claims 11-13 further provided with the change apparatus which can change the relative position regarding a perpendicular direction.   The flattening device is configured to contact the back surface portion corresponding to the predetermined area of the sheet material, the back surface of which is respectively held by the at least one pair of suction holding members, and the reference surface member via the changing device. The pattern forming apparatus according to claim 14, wherein a relative position of the at least one pair of suction holding members and the reference surface member in a direction perpendicular to the two-dimensional plane is changed. A mark detection system for detecting a plurality of marks on the sheet material;
Using the mark detection system, at least a part of a plurality of alignment marks provided in the predetermined area on the sheet material is detected, and based on the detection result, the first and second tension applying devices The pattern forming apparatus according to claim 8, further comprising: a control device that corrects a tension applied to a portion including a predetermined region of the sheet material. A projection optical system that projects an energy beam corresponding to the pattern onto the sheet material to form an image of the pattern on the sheet material;
An adjusting device for adjusting the optical characteristics of the projection optical system;
The control device detects at least a part of a plurality of alignment marks attached to the predetermined region on the sheet material using the mark detection system, and based on the detection result, the adjustment device, The pattern forming apparatus according to claim 16, wherein at least one of the first and second tension applying apparatuses is controlled. Forming a pattern on a long sheet material using the pattern forming apparatus according to any one of claims 8 to 17;
Treating the sheet material with the pattern formed thereon;
A device manufacturing method including:

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