TWI730831B - Manufacturing method of brightening film in transfer manner and brightening film - Google Patents

Manufacturing method of brightening film in transfer manner and brightening film Download PDF

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TWI730831B
TWI730831B TW109122318A TW109122318A TWI730831B TW I730831 B TWI730831 B TW I730831B TW 109122318 A TW109122318 A TW 109122318A TW 109122318 A TW109122318 A TW 109122318A TW I730831 B TWI730831 B TW I730831B
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light
brightness enhancement
enhancement film
transfer
manufacturing
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TW109122318A
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TW202202328A (en
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林劉恭
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光群雷射科技股份有限公司
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Abstract

The present invention provides a manufacturing method of brightening film in a transfer manner and a brightening film. The manufacturing method of brightening film includes manufacturing a brightening film transfer roller and rolling a light-transmitting film by the brightening film transfer roller to form the brightening film. A manufacturing process of the brightening film transfer roller includes coating a negative photoresist layer on an outer surface of a light-transmitting tube; providing a light source that is surrounded by a photomask and is configured to emit a pre-determined light shape through the photomask and be extended into the transparent tube so that the pre-determined light shape will pass through the light-transmitting tube and illuminate the negative photoresist layer; rotating the light-transmitting tube relative to the light source and photomask so that a part of the negative photoresist layer on the outer surface of the light-transmitting tube can be irradiated with the predetermined light shape to form a microstructure transfer layer; removing the other part of the negative photoresist layer that has not formed the microstructure transfer layer to constitute the brightening film transfer roller.

Description

增亮膜的轉印式製造方法及增亮膜Transfer type manufacturing method of brightness enhancement film and brightness enhancement film

本發明涉及一種增亮膜的製造方法及增亮膜,特別是涉及一種增亮膜的轉印式製造方法及以所述增亮膜的轉印式製造方法製造的增亮膜。The invention relates to a method for manufacturing a brightness enhancement film and a brightness enhancement film, in particular to a transfer type manufacturing method of the brightness enhancement film and a brightness enhancement film manufactured by the transfer type manufacturing method of the brightness enhancement film.

現有的增亮膜製造方法往往需要藉由特殊的製程製造(如:鑽石雕刻刀切割),上述特殊的製程經常需要耗費大量的經費與時間,使增亮膜的製造時間及製造成本大幅提升。Existing brightness enhancement film manufacturing methods often require special manufacturing processes (such as diamond carving knife cutting). The above-mentioned special manufacturing processes often require a lot of money and time, which greatly increases the manufacturing time and manufacturing cost of the brightness enhancement film.

故,如何通過增亮膜製造方法的設計與改良,以克服上述的缺陷,已成為該項事業所欲解決的重要課題之一。Therefore, how to overcome the above-mentioned shortcomings through the design and improvement of the manufacturing method of the brightness enhancement film has become one of the important issues to be solved by this business.

本發明實施例針對現有技術的不足提供一種增亮膜的轉印式製造方法及增亮膜,其能有效地改善現有增亮膜製造方法所可能產生的缺陷。The embodiment of the present invention provides a transfer type manufacturing method of a brightness enhancement film and a brightness enhancement film for the shortcomings of the prior art, which can effectively improve the defects that may occur in the existing brightness enhancement film manufacturing method.

本發明實施例公開一種增亮膜的轉印式製造方法,其包括:一滾輪製造步驟:製造一增亮膜轉印滾輪,其製造過程包含:一塗佈步驟:於一透光圓管的外表面塗佈圍繞360度的一負光阻層;一光形步驟:將一光源搭配一光罩來共同伸入所述透光圓管內,以使所述光源所發出的光線能穿過所述光罩、而以一預定光形穿過所述透光圓管並照射在所述負光阻層;一曝光步驟:將所述光源與所述光罩相對於所述透光圓管旋轉,以使鄰近所述透光圓管的所述外表面的所述負光阻層的一部位,其能夠受到具備所述預定光形的所述光線照射而構成一稜鏡微結構轉印層;及一顯影步驟:去除未形成所述稜鏡微結構轉印層的所述負光阻層的另一部位,以令所述透光圓管及形成於所述透光圓管上的所述稜鏡微結構轉印層共同構成所述增亮膜轉印滾輪;以及一增亮膜轉印步驟:以所述增亮膜轉印滾輪不間斷地滾壓於一透光膜上,以使所述透光膜形成有多條稜鏡微結構、進而構成一增亮膜。The embodiment of the present invention discloses a transfer type manufacturing method of a brightness enhancement film, which includes: a roller manufacturing step: manufacturing a brightness enhancement film transfer roller, and the manufacturing process includes: a coating step: a light-transmitting tube The outer surface is coated with a negative photoresist layer that surrounds 360 degrees; a light shape step: a light source is combined with a mask to jointly extend into the transparent tube, so that the light emitted by the light source can pass through The light shield passes through the light-transmitting round tube in a predetermined light shape and irradiates the negative photoresist layer; an exposure step: the light source and the light shield are opposed to the light-transmitting round tube Rotate so that a part of the negative photoresist layer adjacent to the outer surface of the light-transmitting tube can be irradiated by the light having the predetermined light shape to form a microstructure transfer Layer; and a developing step: removing another part of the negative photoresist layer where the microstructure transfer layer is not formed, so that the light-transmitting tube and the light-transmitting tube formed on the The microstructure transfer layers together constitute the brightness-enhancing film transfer roller; and a brightness-enhancing film transfer step: the brightness-enhancing film transfer roller is continuously rolled on a light-transmitting film, In this way, the light-transmitting film is formed with a plurality of micro-structures, thereby forming a brightness enhancement film.

本發明實施例公開一種增亮膜,其是以上述增亮膜的轉印式製造方法所製成。The embodiment of the present invention discloses a brightness enhancement film, which is made by the transfer type manufacturing method of the above brightness enhancement film.

本發明的其中一有益效果在於,本發明所提供的增亮膜的轉印式製造方法及增亮膜,其能通過“所述曝光步驟及所述顯影步驟,使所述透光圓管及形成於所述透光圓管上的所述稜鏡微結構轉印層共同構成所述增亮膜轉印滾輪”以及“所述增亮膜轉印步驟以所述增亮膜轉印滾輪不間斷地滾壓於所述透光膜上,以使所述透光膜形成有多條稜鏡微結構、進而構成所述增亮膜”的技術方案,以大幅降低所述增亮膜的製造時間及製造成本。One of the beneficial effects of the present invention is that the transfer type manufacturing method of the brightness enhancement film and the brightness enhancement film provided by the present invention can make the light-transmitting tube and the brightness enhancement film through the "exposure step and the development step". The microstructure transfer layer formed on the light-transmitting tube together constitutes the brightness enhancement film transfer roller" and "the brightness enhancement film transfer step is based on the brightness enhancement film transfer roller not Rolling on the light-transmitting film intermittently, so that the light-transmitting film is formed with a plurality of microstructures, and then constitutes the "brightness enhancement film" technical solution, so as to greatly reduce the manufacturing of the brightness enhancement film Time and manufacturing cost.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings about the present invention. However, the provided drawings are only for reference and description, and are not used to limit the present invention.

以下是通過特定的具體實施例來說明本發明所公開有關“增亮膜的轉印式製造方法及增亮膜”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。The following are specific examples to illustrate the implementation of the "brightness enhancement film manufacturing method and brightness enhancement film" disclosed in the present invention. Those skilled in the art can understand the advantages of the present invention from the content disclosed in this specification. And effect. The present invention can be implemented or applied through other different specific embodiments, and various details in this specification can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the concept of the present invention. In addition, the drawings of the present invention are merely schematic illustrations, and are not drawn according to actual dimensions, and are stated in advance. The following embodiments will further describe the related technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another, or one signal from another signal. In addition, the term "or" used in this document may include any one or a combination of more of the associated listed items depending on the actual situation.

請參閱圖1至圖8B所示,其為本發明的實施例,需先說明的是,本實施例所對應到的附圖及其所提及的相關數量與外形,僅用來具體地說明本發明的實施方式,以便於了解本發明的內容,而非用來侷限本發明的保護範圍。Please refer to FIGS. 1 to 8B, which are embodiments of the present invention. It should be noted that the drawings corresponding to this embodiment and the related numbers and appearances mentioned in this embodiment are only used for specific description. The embodiments of the present invention are used to facilitate the understanding of the content of the present invention, rather than to limit the protection scope of the present invention.

本發明實施例公開一種增亮膜500以及一種增亮膜的轉印式製造方法。為便於理解所述增亮膜500的構造,以下將先介紹所述增亮膜的轉印式製造方法,而後再說明所述增亮膜500的構造,但本實施例的所述增亮膜500並不受限於依循該製造方法所製成。其中,如圖1所示,所述增亮膜的轉印式製造方法於本實施例中包含有一滾輪製造步驟S1以及一增亮膜轉印步驟S2。The embodiment of the invention discloses a brightness enhancement film 500 and a transfer type manufacturing method of the brightness enhancement film. In order to facilitate the understanding of the structure of the brightness enhancement film 500, the following will first introduce the transfer type manufacturing method of the brightness enhancement film, and then explain the structure of the brightness enhancement film 500, but the brightness enhancement film of this embodiment 500 is not limited to being made according to this manufacturing method. Wherein, as shown in FIG. 1, the transfer manufacturing method of the brightness enhancement film includes a roller manufacturing step S1 and a brightness enhancement film transfer step S2 in this embodiment.

所述滾輪製造步驟S1的製造過程依序包含下列幾個步驟:一塗佈步驟S11、一光形步驟S12、一曝光步驟S13、一顯影步驟S14,但本發明並不限於此。舉例來說,於本發明未繪示的其他實施例中,所述滾輪製造步驟S1可進一步包含銜接於所述顯影步驟S14的一烘烤步驟。The manufacturing process of the roller manufacturing step S1 includes the following steps in sequence: a coating step S11, a light shaping step S12, an exposure step S13, and a developing step S14, but the invention is not limited to this. For example, in other embodiments not shown in the present invention, the roller manufacturing step S1 may further include a baking step connected to the developing step S14.

如圖1及圖2所示,所述塗佈步驟S11:提供一透光圓管1,並在所述透光圓管1的外表面12塗佈圍繞360度的一負光阻層2。需要說明的是,於本實施例中,所述透光圓管1定義有一中心軸線11,並且所述透光圓管1是由鈉鈣玻璃、石英玻璃或丙烯酸玻璃等具有透明性質的材料製成;所述負光阻層2主要是由聚異戊二烯橡膠(Polyisoprene rubber)或環氧基聚合物(Epoxy-based polymer)等材料製成,但本發明並不限於此。舉例來說,所述透光圓管1也可以由派熱克斯(Pyrex)玻璃等其他透明材料製成;所述負光阻層2也可以由硫醇烯聚合物(Thiol-enes(OSTE)polymer)等負光阻劑材料製成。As shown in FIG. 1 and FIG. 2, the coating step S11 is to provide a light-transmitting circular tube 1, and coating the outer surface 12 of the light-transmitting circular tube 1 with a negative photoresist layer 2 surrounding 360 degrees. It should be noted that, in this embodiment, the light-transmitting circular tube 1 defines a central axis 11, and the light-transmitting circular tube 1 is made of soda lime glass, quartz glass, or acrylic glass, and other materials with transparent properties. The negative photoresist layer 2 is mainly made of materials such as polyisoprene rubber (Polyisoprene rubber) or epoxy-based polymer (Epoxy-based polymer), but the present invention is not limited to this. For example, the light-transmitting round tube 1 can also be made of other transparent materials such as Pyrex glass; the negative photoresist layer 2 can also be made of Thiol-enes (OSTE ) Polymer) and other negative photoresist materials.

如圖1及圖3所示,所述光形步驟S12:提供一光源200以及間隔地環繞所述光源200的一光罩300,而後將所述光源200搭配所述光罩300來共同伸入所述透光圓管1內,以使所述光源200所發出的光線能穿過所述光罩300、而以一預定光形穿過所述透光圓管1並照射在所述負光阻層2。其中,所述光源200於本實施例中可以是用來發出紫外光線、且較佳是包含有能夠發出介於340奈米(nm)~410奈米的至少一個發光二極體晶片,並且至少一個所述發光二極體晶片的種類包含有雷射二極體晶片,但至少一個所述發光二極體晶片的種類可依設計需求而加以調整變化,本發明不以此為限。As shown in FIGS. 1 and 3, the light shape step S12: provide a light source 200 and a light cover 300 that surrounds the light source 200 at intervals, and then the light source 200 is combined with the light cover 300 to extend into Inside the light-transmitting round tube 1, so that the light emitted by the light source 200 can pass through the mask 300, and pass through the light-transmitting round tube 1 in a predetermined light shape and irradiate the negative light.防层2。 Resistance layer 2. Wherein, the light source 200 can be used to emit ultraviolet light in this embodiment, and preferably includes at least one light-emitting diode chip capable of emitting between 340 nanometers (nm) and 410 nanometers, and at least One type of the light-emitting diode chip includes a laser diode chip, but the type of at least one light-emitting diode chip can be adjusted and changed according to design requirements, and the present invention is not limited thereto.

如圖3所示,所述光罩300於本實施例中為一灰階光罩,而且所述光罩300的灰階值呈漸層式分佈。進一步地說,所述光罩300的灰階之間具有明顯的界線。所述光罩300可藉由調整其灰階值分佈來控制所述預定光形,但本發明並不限於此。舉例來說,所述光罩300的灰階值也可以呈連續漸進式分佈。也就是說,所述光罩300的灰階之間不具有明顯的界線。As shown in FIG. 3, the photomask 300 is a grayscale photomask in this embodiment, and the grayscale values of the photomask 300 are gradually distributed. Furthermore, the gray scales of the photomask 300 have obvious boundaries. The photomask 300 can control the predetermined light shape by adjusting its grayscale value distribution, but the invention is not limited to this. For example, the grayscale values of the mask 300 may also be continuously and progressively distributed. In other words, there is no obvious boundary between the gray levels of the photomask 300.

如圖1、圖3及圖4所示,所述曝光步驟S13:將所述光源200與所述光罩300相對於所述透光圓管1旋轉,以使鄰近所述透光圓管1的所述外表面12的所述負光阻層2的一部位,其能夠受到具備所述預定光形的所述光線照射而構成一稜鏡微結構轉印層3。其中,所述透光圓管1沿所述中心軸線11自轉,而且當所述透光圓管1自轉時,所述光源200與所述光罩300自所述透光圓管1的一端移動至另一端。As shown in Figure 1, Figure 3 and Figure 4, the exposure step S13: Rotate the light source 200 and the mask 300 with respect to the light-transmitting tube 1 so as to be adjacent to the light-transmitting tube 1 A portion of the negative photoresist layer 2 of the outer surface 12 can be irradiated with the light having the predetermined light shape to form a microstructure transfer layer 3. Wherein, the transparent circular tube 1 rotates along the central axis 11, and when the transparent circular tube 1 rotates, the light source 200 and the light cover 300 move from one end of the transparent circular tube 1 To the other end.

需要說明的是,如圖5A及圖7A所示,在垂直所述中心軸線11的所述稜鏡微結構轉印層3的一截面中,所述稜鏡微結構轉印層3呈封閉狀,而且所述稜鏡微結構轉印層3具有彼此平行且依序相連的多個長條狀結構31。其中,每個所述長條狀結構31自所述透光圓管1的一端延伸至另一端,而且任兩個相鄰的所述長條狀結構31具有相同的高度,但本發明並不限於此。舉例來說,如圖5B及圖7B所示,任兩個相鄰的所述長條狀結構31也可以具有不同的高度;如圖7C及圖7D所示,每個所述長條狀結構31也可以環繞於所述透光圓管1,而且任兩個相鄰的所述長條狀結構31可以具有相同的高度,但本發明並不限於此。舉例來說,於本發明未繪示的其他實施例中,任兩個相鄰的所述長條狀結構31也可以具有不同的高度。It should be noted that, as shown in FIGS. 5A and 7A, in a cross section of the microstructure transfer layer 3 perpendicular to the central axis 11, the microstructure transfer layer 3 is in a closed shape. Moreover, the microstructure transfer layer 3 has a plurality of elongated structures 31 that are parallel to each other and connected in sequence. Wherein, each of the elongated structures 31 extends from one end to the other end of the light-transmitting round tube 1, and any two adjacent elongated structures 31 have the same height, but the present invention does not Limited to this. For example, as shown in FIG. 5B and FIG. 7B, any two adjacent elongated structures 31 may also have different heights; as shown in FIG. 7C and FIG. 7D, each of the elongated structures 31 31 may also surround the light-transmitting circular tube 1, and any two adjacent elongated structures 31 may have the same height, but the present invention is not limited to this. For example, in other embodiments not shown in the present invention, any two adjacent elongated structures 31 may also have different heights.

需要說明的是,如圖5A及圖5B所示,任兩個相鄰所述長條狀結構31的垂直其長軸方向的截面的寬度不相同,但本發明並不限於此。舉例來說,於本發明未繪示的其他實施例中,任兩個相鄰所述長條狀結構31的垂直其長軸方向的截面的寬度可以相同。It should be noted that, as shown in FIGS. 5A and 5B, the widths of the cross-sections perpendicular to the long axis direction of any two adjacent elongated structures 31 are different, but the present invention is not limited to this. For example, in other embodiments not shown in the present invention, the width of the cross section perpendicular to the long axis direction of any two adjacent long strip structures 31 may be the same.

需要說明的是,如圖7A至圖7D所示,每個所述長條狀結構31平行於所述中心軸線11,而且任兩個相鄰所述長條狀結構31的垂直其長軸方向的截面具有不同的形狀。更詳細地說,於本實施例中,任兩個相鄰所述長條狀結構31的垂直其長軸方向的截面具有不同的三角形,但本發明並不限於此。舉例來說,於本發明未繪示的其他實施例中,任兩個相鄰所述長條狀結構31的垂直其長軸方向的截面也可以具有半圓形以及三角形。It should be noted that, as shown in FIGS. 7A to 7D, each of the elongated structures 31 is parallel to the central axis 11, and the longitudinal direction of any two adjacent elongated structures 31 is perpendicular to its longitudinal axis. The sections have different shapes. In more detail, in this embodiment, the cross-sections perpendicular to the long axis direction of any two adjacent elongated structures 31 have different triangles, but the present invention is not limited to this. For example, in other embodiments not shown in the present invention, the cross section perpendicular to the long axis direction of any two adjacent elongated structures 31 may also have a semicircle or a triangle.

需要說明的是,任一個所述長條狀結構31的形狀對應於所述光罩300部位的灰階值而有所不同。其中,所述光罩300的所述部位可定義為一色塊301。進一步地說,使用者可藉由調整每個所述色塊301的灰階值分佈來控制所述預定光形,進而調整對應的所述長條狀結構31的形狀。如圖5A及圖5B所示,當每個所述色塊301的灰階值分佈都不同時,所述稜鏡微結構轉印層3對應形成有多種不同形狀的長條狀結構31。It should be noted that the shape of any one of the elongated structures 31 is different corresponding to the gray scale value of the part of the photomask 300. Wherein, the part of the photomask 300 can be defined as a color block 301. Furthermore, the user can control the predetermined light shape by adjusting the grayscale value distribution of each color block 301, and then adjust the shape of the corresponding elongated structure 31. As shown in FIG. 5A and FIG. 5B, when the grayscale value distribution of each color block 301 is different, the microstructure transfer layer 3 correspondingly forms a variety of elongated structures 31 with different shapes.

舉例來說,如圖6A所示,當每個所述色塊301的灰階值大致呈深-淺-深的漸層式分佈時,受到具備所述預定光形照射的所述負光阻層2的所述部位形成一等腰三角形結構。如圖6B所示,當每個所述色塊301的部分區段的灰階值急劇變化時,受到具備所述預定光形照射的所述負光阻層2的所述部位形成一不對稱的三角形結構。For example, as shown in FIG. 6A, when the grayscale value of each color block 301 is roughly distributed in a deep-light-dark gradation, the negative photoresist irradiated with the predetermined light shape The part of the layer 2 forms an isosceles triangle structure. As shown in FIG. 6B, when the gray scale value of the partial section of each color block 301 changes sharply, the portion of the negative photoresist layer 2 irradiated with the predetermined light shape forms an asymmetric Triangle structure.

如圖6C及圖6D所示,當每個所述色塊301的灰階值大致呈深-淺-深的連續漸進式分佈時,受到具備所述預定光形照射的所述負光阻層2的所述部位形成一半圓形結構。當每個所述色塊301的灰階值呈由淺至深的連續漸進式分佈時,受到具備所述預定光形照射的所述負光阻層2的所述部位形成一直角三角形結構。As shown in FIG. 6C and FIG. 6D, when the grayscale value of each color block 301 is approximately a continuous and progressive distribution of deep-light-deep, the negative photoresist layer irradiated with the predetermined light shape The part of 2 forms a semicircular structure. When the gray scale value of each color block 301 is continuously and gradually distributed from light to dark, the portion of the negative photoresist layer 2 irradiated with the predetermined light shape forms a right-angled triangle structure.

如圖1、圖7A及圖7B所示,所述顯影步驟S14:去除未形成所述稜鏡微結構轉印層3的所述負光阻層2的另一部位,以令所述透光圓管1及形成於所述透光圓管1上的所述稜鏡微結構轉印層3共同構成一增亮膜轉印滾輪100。於本實施例中,可以使用相對應於所述負光阻層2的顯影劑來溶解未形成所述稜鏡微結構轉印層3的所述負光阻層2的另一部位(也就是,未被具備所述預定光形的所述光線所照射到的部分所述負光阻層2)。As shown in FIGS. 1, 7A and 7B, the developing step S14: remove another part of the negative photoresist layer 2 where the microstructure transfer layer 3 is not formed, so as to make the light transparent The round tube 1 and the microstructure transfer layer 3 formed on the light-transmitting round tube 1 together constitute a brightness enhancement film transfer roller 100. In this embodiment, a developer corresponding to the negative photoresist layer 2 can be used to dissolve another part of the negative photoresist layer 2 where the microstructure transfer layer 3 is not formed (that is, , The part of the negative photoresist layer 2) that is not irradiated by the light having the predetermined light shape.

如圖1及圖8A所示,所述增亮膜轉印步驟S2:以所述增亮膜轉印滾輪100不間斷地滾壓於一透光膜400上,以使所述透光膜400形成有多條稜鏡微結構501,進而構成一增亮膜500。以上為本實施例的增亮膜的轉印式製造方法的說明,以下接著介紹所述增亮膜500於本實施例中的構造,但本發明不以此為限。As shown in FIGS. 1 and 8A, the brightness enhancement film transfer step S2: the brightness enhancement film transfer roller 100 is continuously rolled on a light-transmitting film 400 to make the light-transmitting film 400 A plurality of microstructures 501 are formed to form a brightness enhancement film 500. The above is the description of the transfer type manufacturing method of the brightness enhancement film of this embodiment, and the structure of the brightness enhancement film 500 in this embodiment will be described below, but the present invention is not limited thereto.

如圖8A所示,所述增亮膜500的所述稜鏡微結構501是通過所述增亮膜轉印滾輪100的多個長條狀結構31不間斷地滾壓於所述透光膜400而形成,而且所述稜鏡微結構501依序相連不間斷。其中,所述增亮膜500的多條所述稜鏡微結構501的數量大於所述稜鏡微結構轉印層3的多個所述長條狀結構31的數量。需要說明的是,由於在本實施例中,任兩個相鄰的所述長條狀結構31具有相同的高度,使得任兩條相鄰的所述稜鏡微結構501具有相同的高度,但本發明並不限於此。舉例來說,如圖8B所示,任兩個相鄰的所述長條狀結構31具有不同的高度,使得任兩條相鄰的所述稜鏡微結構501具有不同的高度。As shown in FIG. 8A, the brightening microstructure 501 of the brightness enhancement film 500 is continuously rolled on the light-transmitting film through a plurality of elongated structures 31 of the brightness enhancement film transfer roller 100 400 is formed, and the microstructures 501 are connected in sequence without interruption. Wherein, the number of the plurality of striped microstructures 501 of the brightness enhancement film 500 is greater than the number of the strips 31 of the striped microstructure transfer layer 3. It should be noted that in this embodiment, any two adjacent elongated structures 31 have the same height, so that any two adjacent scallop microstructures 501 have the same height, but The present invention is not limited to this. For example, as shown in FIG. 8B, any two adjacent strip-shaped structures 31 have different heights, so that any two adjacent striped microstructures 501 have different heights.

此外,如圖7B及圖8B所示,本發明實施例還公開一種增亮膜轉印滾輪100,其由內而外依序包括所述透光圓管1以及形成於所述透光圓管1的所述外表面12的所述稜鏡微結構轉印層3。所述透光圓管1定義有所述中心軸線11。所述稜鏡微結構轉印層3由曝光所述負光阻層2而形成,並且所述稜鏡微結構轉印層3用來在所述透光膜400上滾動轉印形成多條所述稜鏡微結構501,進而構成所述增亮膜500。其中,所述稜鏡微結構轉印層3包含有各平行於所述中心軸線11且呈圓環狀排列的多個所述長條狀結構31,並且垂直於所述中心軸線11的任兩個相鄰所述長條狀結構31的截面具有不同的形狀,但本發明並不限於此。舉例來說,如圖7C及圖7D所示,所述稜鏡微結構轉印層3也可以包含有各垂直於所述中心軸線11的多個所述長條狀結構31。In addition, as shown in FIG. 7B and FIG. 8B, the embodiment of the present invention also discloses a brightness enhancement film transfer roller 100, which includes the light-transmitting circular tube 1 and the light-transmitting circular tube in order from the inside to the outside. The microstructure transfer layer 3 on the outer surface 12 of 1. The light-transmitting round tube 1 defines the central axis 11. The microstructure transfer layer 3 is formed by exposing the negative photoresist layer 2, and the microstructure transfer layer 3 is used to roll and transfer on the light-transmitting film 400 to form multiple strips. The faint microstructure 501 further constitutes the brightness enhancement film 500. Wherein, the microstructure transfer layer 3 includes a plurality of the elongated structures 31 each parallel to the central axis 11 and arranged in an annular shape, and any two of the elongated structures 31 are perpendicular to the central axis 11 The cross-sections of the adjacent elongated structures 31 have different shapes, but the present invention is not limited to this. For example, as shown in FIG. 7C and FIG. 7D, the microstructure transfer layer 3 may also include a plurality of the elongated structures 31 each perpendicular to the central axis 11.

另,如圖8B所示,本發明實施例也公開一種增亮膜轉印滾輪100的稜鏡微結構轉印層3,其由曝光所述負光阻層2而形成,用以於所述透光膜400上滾動轉印形成多條稜鏡微結構501,進而構成所述增亮膜500;其中,所述稜鏡微結構轉印層3包含有彼此平行且呈圓環狀排列的多個所述長條狀結構31,並且任兩個相鄰所述長條狀結構31的垂直其長軸方向的截面具有不同的形狀,但本發明並不限於此。舉例來說,如圖7C及圖7D所示,所述稜鏡微結構轉印層3也可以包含有各垂直於所述中心軸線11的多個所述長條狀結構31。In addition, as shown in FIG. 8B, the embodiment of the present invention also discloses a microstructure transfer layer 3 of a brightness enhancement film transfer roller 100, which is formed by exposing the negative photoresist layer 2 for use in the The light-transmitting film 400 rolls and transfers to form a plurality of 稜鏡 microstructures 501 to form the brightness enhancement film 500; wherein, the 稜鏡 microstructure transfer layer 3 includes multi-layers arranged parallel to each other and arranged in an annular shape. There are two elongated structures 31, and the cross-sections of any two adjacent elongated structures 31 perpendicular to their long axis directions have different shapes, but the present invention is not limited to this. For example, as shown in FIG. 7C and FIG. 7D, the microstructure transfer layer 3 may also include a plurality of the elongated structures 31 each perpendicular to the central axis 11.

[實施例的有益效果][Beneficial effects of the embodiment]

本發明的其中一有益效果在於,本發明所提供的增亮膜的轉印式製造方法及增亮膜,其能通過“提供具有所述稜鏡微結構轉印層的所述增亮膜轉印滾輪”以及“以所述增亮膜轉印滾輪不間斷地滾壓於所述透光膜上,以使所述透光膜形成有多條稜鏡微結構、進而構成所述增亮膜”的技術方案,以大幅降低所述增亮膜的製造時間及製造成本。One of the beneficial effects of the present invention is that the transfer type manufacturing method of the brightness enhancement film and the brightness enhancement film provided by the present invention can be transferred by "providing the brightness enhancement film with the microstructure transfer layer. "Printing roller" and "using the brightness enhancement film transfer roller to continuously roll on the light-transmitting film, so that the light-transmitting film is formed with a plurality of microstructures to form the brightness enhancement film "To greatly reduce the manufacturing time and manufacturing cost of the brightness enhancement film.

以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。The content disclosed above is only the preferred and feasible embodiments of the present invention, and does not limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made using the description and schematic content of the present invention are included in the application of the present invention. Within the scope of the patent.

100:增亮膜轉印滾輪 1:透光圓管 11:中心軸線 12:外表面 2:負光阻層 3:稜鏡微結構轉印層 31:長條狀結構 200:光源 300:光罩 301:色塊 400:透光膜 500:增亮膜 501:稜鏡微結構 S1:滾輪製造步驟 S11:塗佈步驟 S12:光形步驟 S13:曝光步驟 S14:顯影步驟 S2:增亮膜轉印步驟 100: Brightening film transfer roller 1: Translucent round tube 11: Central axis 12: Outer surface 2: Negative photoresist layer 3: 稜鏡 microstructure transfer layer 31: Long strip structure 200: light source 300: Mask 301: color block 400: Translucent film 500: Brightening film 501: 稜鏡 Microstructure S1: Roller manufacturing steps S11: Coating step S12: Light Shape Step S13: Exposure step S14: Development step S2: Brightening film transfer step

圖1為本發明實施例的增亮膜的轉印式製造方法的步驟流程示意圖。FIG. 1 is a schematic flow chart of the steps of a transfer type manufacturing method of a brightness enhancement film according to an embodiment of the present invention.

圖2為本發明實施例的塗佈負光阻層的透光圓管的立體示意圖。FIG. 2 is a three-dimensional schematic diagram of a light-transmitting round tube coated with a negative photoresist layer according to an embodiment of the present invention.

圖3為本發明實施例的光源與光罩共同伸入所述透光圓管的動作示意圖。FIG. 3 is a schematic diagram of the action of the light source and the light shield jointly extending into the light-transmitting circular tube according to the embodiment of the present invention.

圖4為本發明實施例的經過預定光形照射的所述透光圓管的立體示意圖。FIG. 4 is a three-dimensional schematic diagram of the light-transmitting round tube illuminated by a predetermined light shape according to an embodiment of the present invention.

圖5A至圖5B為圖4沿VA-VA剖線的剖面示意圖。5A to 5B are schematic cross-sectional views taken along the line VA-VA in FIG. 4.

圖6A至圖6D為本發明實施例的長條狀結構的剖面示意圖。6A to 6D are schematic cross-sectional views of a strip structure according to an embodiment of the present invention.

圖7A至圖7C為本發明實施例的增亮膜轉印滾輪的立體示意圖。7A to 7C are three-dimensional schematic diagrams of a brightness enhancement film transfer roller according to an embodiment of the present invention.

圖7D為圖7C沿VIID剖線的剖面示意圖。Fig. 7D is a schematic cross-sectional view of Fig. 7C along the line VIID.

圖8A至圖8B為本發明實施例的增亮膜轉印滾輪壓印透光膜的動作示意圖。8A to 8B are schematic diagrams of the movement of embossing the light-transmitting film with the brightness-enhancing film transfer roller according to an embodiment of the present invention.

S1:滾輪製造步驟 S1: Roller manufacturing steps

S11:塗佈步驟 S11: Coating step

S12:光形步驟 S12: Light Shape Step

S13:曝光步驟 S13: Exposure step

S14:顯影步驟 S14: Development step

S2:增亮膜轉印步驟 S2: Brightening film transfer step

Claims (9)

一種增亮膜的轉印式製造方法,其包括:一滾輪製造步驟:製造一增亮膜轉印滾輪,其製造過程包含:一塗佈步驟:於一透光圓管的外表面塗佈圍繞360度的一負光阻層;一光形步驟:將一光源搭配一光罩來共同伸入所述透光圓管內,以使所述光源所發出的光線能穿過所述光罩、而以一預定光形穿過所述透光圓管並照射在所述負光阻層;一曝光步驟:將所述光源與所述光罩相對於所述透光圓管旋轉,以使鄰近所述透光圓管的所述外表面的所述負光阻層的一部位,其能夠受到具備所述預定光形的所述光線照射而構成一稜鏡微結構轉印層;及一顯影步驟:去除未形成所述稜鏡微結構轉印層的所述負光阻層的另一部位,以令所述透光圓管及形成於所述透光圓管上的所述稜鏡微結構轉印層共同構成所述增亮膜轉印滾輪;以及一增亮膜轉印步驟:以所述增亮膜轉印滾輪不間斷地滾壓於一透光膜上,以使所述透光膜形成有多條稜鏡微結構、進而構成一增亮膜;其中,在所述增亮膜轉印滾輪的製造過程中,所述稜鏡微結構轉印層形成有彼此平行且依序相連的多個長條狀結構;其中,多條所述稜鏡微結構是通過多個長條狀結構不間斷地滾壓於所述透光膜而形成、且依序相連不間斷。 A transfer type manufacturing method of a brightness enhancement film, comprising: a roller manufacturing step: manufacturing a brightness enhancement film transfer roller, and the manufacturing process includes: a coating step: coating the outer surface of a light-transmitting tube around A negative photoresist layer of 360 degrees; a light shape step: a light source is combined with a light shield to jointly extend into the transparent circular tube, so that the light emitted by the light source can pass through the light shield, And pass through the light-transmitting tube in a predetermined light shape and irradiate the negative photoresist layer; an exposure step: rotate the light source and the mask relative to the light-transmitting tube to make adjacent A portion of the negative photoresist layer on the outer surface of the light-transmitting tube, which can be irradiated with the light having the predetermined light shape to form a microstructure transfer layer; and a developing Step: remove another part of the negative photoresist layer where the transfer layer of the microstructure is not formed, so that the light-transmitting circular tube and the microscopic microstructure formed on the light-transmitting tube The structural transfer layer jointly constitutes the brightness enhancement film transfer roller; and a brightness enhancement film transfer step: the brightness enhancement film transfer roller is continuously rolled on a transparent film to make the transparency The light film is formed with a plurality of microstructures to form a brightness enhancement film; wherein, during the manufacturing process of the brightness enhancement film transfer roller, the microstructure transfer layers are formed parallel to each other and in sequence A plurality of connected elongated structures; wherein, a plurality of the scallop microstructures are formed by rolling a plurality of elongated structures on the light-transmitting film uninterruptedly, and are connected in sequence without interruption. 如請求項1所述的增亮膜的轉印式製造方法,其中,任兩個相鄰的所述長條狀結構具有不同的高度,以使任兩條相鄰的所述稜鏡微結構具有不同的高度。 The transfer-type manufacturing method of the brightness enhancement film according to claim 1, wherein any two adjacent elongated structures have different heights, so that any two adjacent microstructures Have different heights. 如請求項1所述的增亮膜的轉印式製造方法,其中,任兩個相鄰所述長條狀結構的垂直其長軸方向的截面具有不同的形狀。 The transfer type manufacturing method of the brightness enhancement film according to claim 1, wherein the cross-sections perpendicular to the long axis direction of any two adjacent elongated structures have different shapes. 如請求項1所述的增亮膜的轉印式製造方法,其中,任兩個相鄰所述長條狀結構的垂直其長軸方向的截面具有不同的三角形。 The transfer type manufacturing method of the brightness enhancement film according to claim 1, wherein the cross sections perpendicular to the long axis direction of any two adjacent elongated structures have different triangles. 如請求項1所述的增亮膜的轉印式製造方法,其中,所述增亮膜的多條所述稜鏡微結構的數量大於所述稜鏡微結構轉印層的多個所述長條狀結構的數量。 The transfer-type manufacturing method of the brightness enhancement film according to claim 1, wherein the number of the plurality of the microstructures of the brightness enhancement film is greater than the number of the plurality of the microstructure transfer layers of the brightness enhancement film The number of long strips. 如請求項1所述的增亮膜的轉印式製造方法,其中,對應於任一個所述長條狀結構的所述光罩部位的灰階值為漸層式分佈。 The transfer-type manufacturing method of the brightness enhancement film according to claim 1, wherein the gray scale value of the mask portion corresponding to any one of the elongated structures is distributed gradually. 如請求項1所述的增亮膜的轉印式製造方法,其中,所述透光圓管定義有一中心軸線,並且每個所述長條狀結構平行於所述中心軸線。 The transfer-type manufacturing method of the brightness enhancement film according to claim 1, wherein the light-transmitting circular tube defines a central axis, and each of the elongated structures is parallel to the central axis. 如請求項1所述的增亮膜的轉印式製造方法,其中,所述光源包含有能夠發出介於340奈米(nm)~410奈米的至少一個發光二極體晶片。 The transfer type manufacturing method of the brightness enhancement film according to claim 1, wherein the light source includes at least one light-emitting diode chip capable of emitting between 340 nanometers (nm) and 410 nanometers. 一種增亮膜,以如請求項1所述的增亮膜的轉印式製造方法所製成。 A brightness enhancement film manufactured by the transfer type manufacturing method of the brightness enhancement film as described in claim 1.
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US20150064628A1 (en) * 2012-04-17 2015-03-05 The Regents Of The University Of Michigan Methods for making micro- and nano-scale conductive grids for transparent electrodes and polarizers by roll to roll optical lithography
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7649591B2 (en) * 2002-10-05 2010-01-19 Samsung Electronics Co., Ltd. Optical member, method of fabricating the same and liquid crystal display apparatus having the same
CN101016634A (en) * 2006-12-30 2007-08-15 苏州大学 Method of preparing metal roller with surface relief microstructure
TW202024810A (en) * 2011-12-20 2020-07-01 日商尼康股份有限公司 Substrate Processing Device, Device Manufacturing System And Device Manufacturing Method
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