CN107272095A - Polarising beam splitter and the substrate board treatment for having used the polarising beam splitter - Google Patents
Polarising beam splitter and the substrate board treatment for having used the polarising beam splitter Download PDFInfo
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- CN107272095A CN107272095A CN201710559592.4A CN201710559592A CN107272095A CN 107272095 A CN107272095 A CN 107272095A CN 201710559592 A CN201710559592 A CN 201710559592A CN 107272095 A CN107272095 A CN 107272095A
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- Prior art keywords
- beam splitter
- light
- incident
- illuminating bundle
- substrate
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
- G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polarising Elements (AREA)
- Lenses (AREA)
- Optical Elements Other Than Lenses (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Possess：Keep the light shield holding cylinder (21) of the light shield (M) of reflection-type；Incident illuminating bundle (EL1) is reflected and made the beam splitter (PBS) that illuminating bundle (EL1) projected light beam (EL2) obtained from light shield (M) reflection is transmitted towards light shield (M)；Make illuminating bundle (EL1) to the incident illumination optics (ILM) of beam splitter (PBS)；It is located at will transmit through beam splitter (PBS) projected light beam (EL2) projection exposure to substrate (P) Projection optics (PLM), illumination optics (ILM) and beam splitter (PBS) between light shield (M) and Projection optics (PLM).In addition, beam splitter (PBS) possesses the 1st prism, the 2nd prism and polarizing coating, polarizing coating (93) is to be laminated the 2nd film body of the 1st film body of silica and hafnium oxide in film thickness direction.
Description
The present patent application be international filing date be on November 5th, 2013, international application no be PCT/JP2013/079911,
National applications number into National Phase in China is 201380067898.8, entitled " polarising beam splitter, processing substrate
The divisional application of the patent application of device, device inspection apparatus and device making method ".
Technical field
The present invention relates to polarising beam splitter, substrate board treatment, device inspection apparatus and device making method.
Background technology
In the past, as substrate board treatment, it is known to which cylindric graticule (light shield) irradiation exposure to reflection-type is used
Light, will be projected to the exposure device on sensitive substrate (chip) (for example, referring to patent document from the exposure light that light shield reflects
1).The exposure device of patent document 1, which has, to be projected from the exposure light that light shield reflects to the projection optical system of chip, projection
Optical system is configured to include polarising beam splitter, the polarising beam splitter according to the polarization state of incident exposure light
Make exposure light transmission or reflection in imaging optical path.
Prior art literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 2007-227438 publications
The content of the invention
It is configured in the exposure device of patent document 1：Illuminating bundle from lamp optical system from projection optics
The different direction of system is obliquely irradiated on the light shield of cylindrical shape, and the exposure light (projected light beam) reflected by light shield is incident to
Projection optical system.If lamp optical system configured as Patent Document 1 with projection optical system, there is illumination
The utilization ratio of light beam is low, and the mask pattern being projected on sensitive substrate (chip) picture quality it is not good the problem of.As
The lighting system of picture quality is kept effectively and well, has and coaxially falls to penetrate lighting system.This mode is following manner：Will be partly
The beam splitter such as speculum and/or beam splitter is configured in the imaging optical path formed by projection optical system, via the light splitting
Illuminating bundle is irradiated in light shield by element, and the projected light beam reflected by light shield is also guided via beam splitter to photosensitive
Substrate.
By falling to penetrate lighting system, in the feelings for separating the illuminating bundle towards light shield with the projected light beam from light shield
Under condition, beam splitter is used as using polarising beam splitter, is damaged thus, it is possible to the light quantity for entering to be about to illuminating bundle and projected light beam
Lose the effective exposure for suppressing relatively low.
However, for example make illuminating bundle reflection (or transmission) by polarising beam splitter and make projected light beam transmission (or
Reflection) in the case of, due to having polarising beam splitter in lamp optical system and projection optical system, therefore there is illumination
The possibility that optical system is physically interfered with projection optical system.
In addition, in the exposure device of patent document 1 use polarising beam splitter in the case of, polarising beam splitter it is inclined
A part for incident incident beam is reflected and turns into the reflected beams by vibrating diaphragm, by a part of transmit as transmitted light beam.This
When, the reflected beams or transmitted light beam produce energy loss due to being separated.Therefore, it is anti-in order to suppress to produce due to separation
The energy loss of irradiating light beam or transmitted light beam, the incident beam for being preferably incident to polarizing coating is wavelength and the consistent laser of phase.
However, the energy density of laser is high.Therefore, in the case where making incident beam be laser, if on polarizing coating
The reflectivity of the reflected beams and the transmissivity of transmitted light beam are low, then the energy of laser is absorbed by polarizing coating, cause to put on polarization
The load of film becomes big.Thus, in the case where using the high light of the energy densities such as laser as incident beam, polarising beam splitter
The patience of polarizing coating be easily reduced, it is thus possible to be difficult to preferably separate incident beam.
The solution of the present invention be in view of above-mentioned technical problem and make, its object is to provide one kind even in by inclined
The beam splitter that shakes makes in the case that illuminating bundle separates with projected light beam, can also suppress lamp optical system and projection optics system
The physical interference of system and it can easily configure the polarising beam splitter of lamp optical system and projection optical system, at substrate
Manage device (exposure device), device inspection apparatus and device making method.
In addition, the solution of the present invention be in view of above-mentioned technical problem and make, even if to also reside in offer a kind of for its purpose
It is the high incident beam of energy density, also can makes a part for incident beam while reduction is applied to the load of polarizing coating
Reflection and as the reflected beams, make the part transmission of incident beam and as the polarising beam splitter of transmitted light beam, substrate at
Manage device, device inspection apparatus and device making method.
According to the 1st scheme of the present invention there is provided a kind of substrate board treatment (exposure device), it possesses：Light shield maintaining part
Part, keeps the light shield of reflection-type；Beam splitter, incident illuminating bundle is reflected towards the light shield, and make the illumination light
Projected light beam is transmitted obtained from beam is reflected by the light shield；Illumination optics, make the illuminating bundle to the beam splitter
It is incident；And Projection optics, the projected light beam that will transmit through the beam splitter projected to the substrate of photoinduction, will
The lamp optical system that the illuminating bundle is guided to the light shield includes the illumination optics and the beam splitter, by institute
State projected light beam includes the Projection optics and the beam splitter, the photograph to the substrate-guided projection optical system
Bright optical module and the beam splitter are located between the light shield and the Projection optics.
According to the 2nd scheme of the present invention there is provided a kind of device inspection apparatus, it possesses：What the 1st scheme of the present invention was related to
Substrate board treatment and the substrate is supplied to the substrate feeding device of the substrate board treatment.
According to the 3rd scheme of the present invention there is provided a kind of device making method, it includes：Related to using the 1st scheme of the present invention
And substrate board treatment projection exposure is carried out to the substrate and by being handled the substrate after projection exposure
By the pattern formation of the light shield on the substrate.
According to the 4th scheme of the present invention there is provided a kind of substrate board treatment (exposure device), it possesses：Light shield maintaining part
Part, keeps the light shield of reflection-type；Beam splitter, incident illuminating bundle is transmitted towards the light shield, and make the illumination light
Projected light beam reflects obtained from beam is reflected by the light shield；Illumination optics, make the illuminating bundle to the beam splitter
It is incident；And Projection optics, it will be projected by the projected light beam of the beam splitter reflection to the substrate of photoinduction, by institute
Stating the lamp optical system that illuminating bundle guided to the light shield includes the illumination optics and the beam splitter, will be described
Projected light beam includes the Projection optics and the beam splitter, the illumination to the substrate-guided projection optical system
Optical module and the beam splitter are located between the light shield and the Projection optics.
According to the 5th scheme of the present invention there is provided a kind of polarising beam splitter, it possesses：1st prism；2nd prism, the 2nd
Prism has the face relative with a face of the 1st prism；And polarizing coating, the polarizing coating is in order to will be from the 1st prism
Towards the 2nd prism incident beam according to polarization state be separated into the 1st prism lateral reflection the reflected beams or to
The transmitted light beam of the 2nd prism side transmission, and be located between the 1st prism and the relative face of the 2nd prism, and will
The 1st film body by principal component of silica is laminated with the 2nd film body using hafnium oxide as principal component in film thickness direction.
According to the 6th scheme of the present invention there is provided a kind of substrate board treatment, the substrate board treatment irradiates to light shield to be illuminated
Light beam, and will be formed in the light shield pattern as projection exposure to the substrate as the photoinduction for being projected body, it has
Have：Light shield holding member, keeps the light shield of reflection-type；Illumination optics, the illuminating bundle is guided to the light shield；Throw
Shadow optical module, will project to described from the projected light beam obtained from light shield reflection and be projected body (substrate)；This hair
The polarising beam splitter that the 1st bright scheme is related to, is configured between the illumination optics and the light shield and is configured at institute
State between light shield and the Projection optics；And wave plate, the illuminating bundle to described in the polarising beam splitter
The incidence angle of polarizing coating is the defined angular range for including 52.4 °~57.3 ° of Brewster angle, with the polarized light beam splitting
Device makes the illuminating bundle be reflected towards the light shield and makes what the projected light beam was transmitted towards the Projection optics
Mode, the wave plate makes the illuminating bundle from the polarising beam splitter polarize and also make from the light shield
The projected light beam polarization.
According to the 7th scheme of the present invention there is provided a kind of device inspection apparatus, it possesses：What the 6th scheme of the present invention was related to
Substrate board treatment and the body that is projected is supplied to the substrate feeding device of the substrate board treatment.
According to the 8th scheme of the present invention there is provided a kind of device making method, it includes：Related to using the 6th scheme of the present invention
And substrate board treatment to it is described be projected body carry out projection exposure；With by entering to being projected body described in after projection exposure
Row handles and formed the pattern of the light shield.
The effect of invention
According to the solution of the present invention, using the teaching of the invention it is possible to provide even in point shared by lamp optical system and projection optical system
Beam device makes in the case that illuminating bundle separates with projected light beam, can also suppress the thing of lamp optical system and projection optical system
Reason interference and easily polarising beam splitter, substrate board treatment, the device of configuration lamp optical system and projection optical system
Manufacture system and device making method.
In addition, according to the solution of the present invention, using the teaching of the invention it is possible to provide while reduction is applied to the load of polarizing coating, make incident light
A part for beam reflects and turns into the reflected beams, a part for incident beam is transmitted and the polarized light beam splitting as transmitted light beam
Device, substrate board treatment, device inspection apparatus and device making method.
Brief description of the drawings
Fig. 1 is the figure of the composition for the device inspection apparatus for representing the 1st embodiment.
Fig. 2 is the figure being monolithically fabricated for the exposure device (substrate board treatment) for representing the 1st embodiment.
Fig. 3 is the figure of the configuration for the illumination region and view field for representing the exposure device shown in Fig. 2.
Fig. 4 is the figure of the composition of the lamp optical system and projection optical system that represent the exposure device shown in Fig. 2.
Fig. 5 A are the figures for representing illuminating bundle and projected light beam on light shield.
Fig. 5 B are the figures of the 4th relay lens for representing to observe from polarising beam splitter.
Fig. 6 is the figure for representing illuminating bundle and projected light beam on polarising beam splitter.
Fig. 7 is to represent that the figure of the configuring area of lamp optical system can be configured.
Fig. 8 is the figure of the composition around the polarizing coating for the polarising beam splitter for representing the 1st embodiment.
Fig. 9 is the composition around the polarizing coating for the polarising beam splitter for representing the comparative example relative to the 1st embodiment
Figure.
Figure 10 is the curve map for the transmissison characteristic and reflection characteristic for representing the polarising beam splitter shown in Fig. 8.
Figure 11 is the curve map for the transmissison characteristic and reflection characteristic for representing the polarising beam splitter shown in Fig. 9.
Figure 12 is the flow chart for the device making method for representing the 1st embodiment.
Figure 13 is the figure being monolithically fabricated for the exposure device (substrate board treatment) for representing the 2nd embodiment.
Figure 14 is the figure of the composition for the exposure device (substrate board treatment) for representing the 3rd embodiment.
Figure 15 is the figure being monolithically fabricated for the exposure device (substrate board treatment) for representing the 4th embodiment.
Figure 16 is the figure of the composition for the exposure device (substrate board treatment) for representing the 5th embodiment.
Figure 17 is the figure of the composition around the polarizing coating for the polarising beam splitter for representing the 6th embodiment.
Figure 18 is the curve map for the transmissison characteristic and reflection characteristic for representing the polarising beam splitter shown in Figure 17.
Figure 19 is the figure of the composition around the polarizing coating for the polarising beam splitter for representing the 7th embodiment.
Figure 20 is the curve map for the transmissison characteristic and reflection characteristic for representing the polarising beam splitter shown in Figure 19.
Figure 21 is the figure of the composition around the polarizing coating for the polarising beam splitter for representing the 8th embodiment.
Figure 22 is the curve map for the transmissison characteristic and reflection characteristic for representing the polarising beam splitter shown in Figure 21.
Embodiment
While the mode (embodiment) for implementing the present invention is described in detail on one side referring to the drawings.Following
Content described in embodiment is not intended to limit the present invention.In addition, in following described inscape, including this area
Content that technical staff is readily apparent that or substantially the same.In addition, following described inscape can be appropriately combined.Separately
Outside, without departing from the spirit and scope of the invention, various omissions can be carried out to inscape, replaces or changes.
[the 1st embodiment]
The polarising beam splitter of 1st embodiment is arranged at exposure device, and the exposure device is right as substrate board treatment
Exposure-processed is imposed as the substrate for the photoinduction for being projected body.The substrate after exposure is applied in addition, exposure device is assembled in
The device inspection apparatus of device is manufactured in various process.First, device inspection apparatus is illustrated.
<Device inspection apparatus>
Fig. 1 is the figure of the composition for the device inspection apparatus for representing the 1st embodiment.Device inspection apparatus 1 shown in Fig. 1 is
Manufacture the production line (flexible display production line) of the flexible display as device.As flexible display, for example, it there are
Machine EL display etc..The device inspection apparatus 1 is to send out the substrate with volume FR1 from by the supply of flexible substrate P wound into rolls
P, the substrate P after processing after continuously being applied in various process to the substrate P of submitting, batched and used in reclaiming as flexible devices
Roll up FR2 so-called volume to volume (Roll to Roll) mode.In the device inspection apparatus 1 of the 1st embodiment, film is shown
The substrate P of shape sheet material from supply with volume FR1 send out, from supply with volume FR1 submitting substrate P sequentially pass through n platform processing units U1,
U2, U3, U4, U5 ... Un until be recovered with volume FR2 batch untill example.First, to the processing pair of device inspection apparatus 1
The substrate P of elephant is illustrated.
Substrate P is such as can use paper tinsel (foil) that resin film, the metal or alloy as stainless steel formed etc..As
The material of resin film, such as comprising polyvinyl resin, acrylic resin, polyester resin, Ethylene Vinyl Ester Copolymers resin, poly-
Vinyl chloride resin, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene resin, acetic acid
It is more than the one or two kinds of in vinylester resin.
Preferably, substrate P for example selectes the less notable big material of thermal coefficient of expansion, actually neglect
The deflection produced in the various processing that apparent is implemented to substrate P because heated.Thermal coefficient of expansion for example can be by will be inorganic
Filler is mixed in resin film and is set as smaller than threshold value corresponding with technological temperature etc..Inorganic filler for example can be oxidation
Titanium, zinc oxide, aluminum oxide, silica etc..In addition, it by the thickness of the manufactures such as float method is 100 μm or so that substrate P, which can be,
The individual layers of very thin glass or the layered product that above-mentioned resin film, paper tinsel etc. are pasted on the very thin glass.
The substrate P so constituted is by being wound into web-like into FR1 is rolled up for the supply, and the supply is mounted with volume FR1
In device inspection apparatus 1.The 1 pair of substrate P from supply volume FR1 submittings of device inspection apparatus for being provided with supply volume FR1 is anti-
The multiple various processing performed for manufacturing device.Therefore, the substrate P after processing turns into the state that multiple devices are connected.Namely
Say, the substrate of layout is turned into from supply with the volume FR1 substrate Ps sent out.In addition, substrate P can be beforehand through before defined
The part that processing is modified to its surface and activates it, or or be formed with the surface for accurate figure
The part of the fine next door construction (sag and swell) of case.
Substrate P after processing is recovered by being wound into web-like as reclaiming with volume FR2.Reclaim and installed with volume FR2
In cutter device (not shown).Be provided with recovery volume FR2 cutter device by the substrate P after processing by each Device singulation
(cutting) and as multiple devices.The size of substrate P is, for example, the size of width (direction for turning into short side) for 10cm~
2m or so, the size of length direction (direction for turning into long side) is more than 10m.In addition, the size of substrate P is not limited to above-mentioned chi
It is very little.
Reference picture 1, continuation is illustrated to device inspection apparatus.In Fig. 1, it is that X-direction, Y-direction and Z-direction are orthogonal
Rectangular coordinate system.X-direction is that supply is rolled up into the direction that FR1 and recovery volume FR2 link in the horizontal plane.Y-direction is in water
The direction orthogonal with X-direction in plane.Y-direction is into volume FR1 for the supply and reclaims with the axial direction for rolling up FR2.Z-direction is and X side
Distinguish orthogonal direction (vertical) to Y-direction.
Device inspection apparatus 1 possess supplying substrate P substrate feeding device 2, to by substrate feeding device 2 supply Lai base
Plate P applies processing unit U1~Un in various process, to imposing what the substrate P after processing was reclaimed by processing unit U1~Un
The host control device 5 that substrate retracting device 4 and each device to device inspection apparatus 1 are controlled.
Supply volume FR1 can be rotatably mounted to substrate feeding device 2.Substrate feeding device 2 has from mounted
The marginal position of the position on the driven roller R1 of substrate P and the width (Y-direction) for adjusting substrate P is sent out in supply with volume FR1
Controller EPC1.Driven roller R1 clamps the table back of the body two sides of substrate P while rotating, and FR1 is rolled up by the way that substrate P edge is used from supply
Sent out towards reclaiming with volume FR2 conveyance direction, substrate P is supplied to processing unit U1~Un.At this moment, marginal position controller
EPC1, so that substrate P relative to target location converges on ± more than ten μm~tens μ in the position of the end (edge) of width
Mode in the range of m or so is moved in the width direction substrate P, so as to correct the position on the width of substrate P.
Recovery volume FR2 can be rotatably mounted to substrate retracting device 4.Substrate retracting device 4 has after processing
Substrate P pulls to recovery the edge for rolling up the position of the driven roller R2 and adjustment substrate P of FR2 sides on width (Y-direction)
Positioner EPC2.Substrate retracting device 4 carries on the back two sides while rotating, by base by the driven roller R2 tables for clamping substrate P
Plate P is pulled along conveyance direction and recovery is rolled up FR2 rotations, thus rolls substrate P.At this moment, marginal position controller
EPC2 is constituted in the same manner as marginal position controller EPC1, corrects the position on the width of substrate P, in order to avoid the width of substrate P
The end (edge) in degree direction produces deviation in the direction of the width.
Processing unit U1 is that photonasty functional liquid is coated on to the surface that the substrate P come is supplied from substrate feeding device 2
Applying device.Photoresist, photonasty silane coupling agent material, UV solidification trees can be for example used as photonasty functional liquid
Fat liquid etc..Processing unit U1 is sequentially provided with applying mechanism Gp1 and drier since the upstream side of the conveyance direction of substrate P
Gp2.Applying mechanism Gp1 has the roller platen DR1 and the application roll DR2 relative with roller platen DR1 for winding substrate P.Coating machine
Structure Gp1 is wound in the state of roller platen DR1 by the substrate P being supplied to, and base is clamped by roller platen DR1 and application roll DR2
Plate P.Then, applying mechanism Gp1 is by rotating roller platen DR1 and application roll DR2, while substrate P is moved along conveyance direction,
While applying photonasty functional liquid by application roll DR2.Drier Gp2 blows out the drying air such as hot blast or dry air,
Solute (solvent or water) contained in photonasty functional liquid is removed, and dries the substrate P for being coated with photonasty functional liquid, by
This forms photonasty functional layer in substrate P.
Processing unit U2 is heater, in order that the photonasty functional layer for being formed at the surface of substrate P is stable, will be from
The substrate P that reason device U1 is moved is heated to set point of temperature (for example, tens DEG C~120 DEG C or so).Processing unit U2 is from substrate P
The upstream side of conveyance direction start to be sequentially provided with heating chamber HA1 and cooling chamber HA2.Heating chamber HA1 is set inside it
There are multiple rollers and multiple air turning-bars (air turn bar), multiple rollers and multiple air turning-bars constitute the conveyance of substrate P
Path.Multiple rollers are set in the way of the back side of rotating contact substrate P, and multiple air turning-bars are arranged at base with contactless state
Plate P face side.Multiple rollers and multiple air turning-bars form the conveyance of snake shape to lengthen the transport path of substrate P
The configuration in path.The substrate P passed through out of heating chamber HA1, the transport path of edge snake shape is transported while being heated
To set point of temperature.Cooling chamber HA2 makes substrate P be cooled to environment temperature, so that the substrate P after heating chamber HA1 heating
Temperature is consistent with the environment temperature of subsequent handling (processing unit U3).Cooling chamber HA2 is being internally provided with multiple rollers, with heating
Similarly, multiple rollers form the configuration of the transport path of snake shape to chamber HA1 in order to lengthen the transport path of substrate P.From cold
But the substrate P passed through in chamber HA2, the transport path of edge snake shape is transported while cooled.Cooling chamber HA2's
Downstream in conveyance direction, provided with driven roller R3, driven roller R3 while substrate P one of the clamping from cooling chamber HA2 after
Side rotates, and thus supplies substrate P towards processing unit U3.
Processing unit (substrate board treatment) U3 is the exposure device of sweep type, to supplying the surface of coming from processing unit U2
Substrate (sensitive substrate) P of photonasty functional layer is formed with, the pattern of the circuit of display or wiring etc. is subjected to projection exposure
Light.Detailed content is reserved for later described, and processing unit U3 irradiates illuminating bundle to the cylindric light shield M of reflection-type, by illuminating bundle quilt
Projected light beam projection exposure obtained from light shield M reflection is in substrate P, outside the substrate supporting cylinder 25 that the substrate P can be rotated
Side face is supported.Processing unit U3, which has, to supply the drive that next substrate P delivers to the downstream of conveyance direction from processing unit U2
The dynamic roller R4 and marginal position controller EPC3 of the position on the width (Y-direction) of adjustment substrate P.Driven roller R4 is on one side
The table back of the body two sides of substrate P is clamped while rotation, substrate P is sent to the downstream of conveyance direction, thus by substrate P direction exposure
Position is supplied.Marginal position controller EPC3 is constituted in the same manner as marginal position controller EPC1, corrects the width of substrate P
On position so that the width of substrate P on exposure position turns into target location.
In addition, processing unit U3 has in the state of the substrate P after to exposure assigns slackness, substrate P is delivered to and removed
Send two groups of driven rollers R5, R6 in the downstream in direction.As defined in two groups of driven rollers R5, R6 are separated by the conveyance direction of substrate P
It is spaced and configures.Driven roller R5 clamps the upstream side of the substrate P transported and rotated, the substrate P that driven roller R6 clampings are transported
Downstream and rotate, thus by substrate P towards processing unit U4 supply.At this moment, because substrate P is endowed slackness, therefore
The variation in the conveyance speed produced by the downstream than driven roller R6 by conveyance direction can be absorbed, so as to block because removing
Send the influence of the caused exposure-processed to substrate P of variation of speed.In addition, in processing unit U3, in order to by light shield M light
The picture and substrate P of a part for cover pattern are relatively aligned (alignment), and pair in substrate P is previously formed in provided with detection
Aligming microscope AM1, AM2 of fiducial mark note etc..
Processing unit U4 is wet type processing device, and it carries out wet to the substrate P after the exposure that is moved from processing unit U3
Development treatment, electroless plating processing of formula etc..Processing unit U4 has inside it：3 be layered along vertical (Z-direction)
Individual treatment trough BT1, BT2, BT3 and the multiple rollers for transporting substrate P.Multiple rollers with as substrate P successively from 3 treatment trough BT1,
BT2, BT3 inside transport path by way of configure.Downstream in treatment trough BT3 conveyance direction, provided with drive
The substrate P that dynamic roller R7, driven roller R7 clamps from treatment trough BT3 after is rotated on one side, and substrate P direction thus is handled into dress
Put U5 supplies.
Though omitting diagram, processing unit U5 is drying device, and it from the processing unit U4 substrate Ps moved to being done
It is dry.Processing unit U5 will be adjusted to defined water in processing unit U4 through the moisture accompanying by the substrate P of wet processed
Divide content.Several processing units are passed through by the processing unit U5 substrate Ps dried, processing unit Un is transported to.Then, exist
After processing unit Un is handled, substrate P is rolled by the recovery of substrate retracting device 4 with volume FR2.
Host control device 5 is united to substrate feeding device 2, substrate retracting device 4 and multiple processing units U1~Un
Include control.The control base board feedway 2 of host control device 5 and substrate retracting device 4, and make substrate P from substrate feeding device 2
Transported towards substrate retracting device 4.In addition, the one side of host control device 5 makes the conveyance of substrate P synchronous, while controlling multiple places
Device U1~Un is managed, so as to perform the various processing to substrate P.
＜ exposure devices (substrate board treatment) ＞
Next, reference picture 2 is to Fig. 7, to the exposure device (processing substrate as processing unit U3 of the 1st embodiment
Device) composition illustrate.Fig. 2 is that exposure device (substrate board treatment) for representing the 1st embodiment is monolithically fabricated
Figure.Fig. 3 is the figure of the configuration for the illumination region and view field for representing the exposure device shown in Fig. 2.Fig. 4 is represented shown in Fig. 2
Exposure device lamp optical system and projection optical system composition figure.Fig. 5 A be represent illuminating bundle on light shield and
The figure of projected light beam.Fig. 5 B are the figures of the 4th relay lens for representing to observe from polarising beam splitter.Fig. 6 is to represent polarised light
The figure of illuminating bundle and projected light beam on beam splitter.Fig. 7 is to represent that the figure of the configuring area of lamp optical system can be configured.
Processing unit U3 shown in Fig. 2 is so-called scanning-exposure apparatus, an edge conveyance direction (scanning direction) conveyance
Substrate P, while will be formed in the picture projection exposure of the mask pattern of the light shield M of cylindrical shape outer peripheral face to the surface of substrate P.This
Outside, be X-direction, Y-direction and the orthogonal rectangular coordinate system of Z-direction in Fig. 2 and Fig. 4 into Fig. 7, sat with Fig. 1 identicals right angle
Mark system.
First, light shield M used in exposure device U3 is illustrated.Light shield M is, for example, to have used metal cylinder
The cylinder light shield of the reflection-type of body.Light shield M be formed at will the 1st axle AX1 that extends along Y-direction as center radius of curvature
For the cylinder of Rm outer peripheral face (periphery), there is certain thickness in radial direction.Light shield M periphery, which turns into, is formed with regulation
Mask pattern light shield face P1.Light shield face P1 include with high efficiency to the high reflection portion of prescribed direction the reflected beams and not to
Prescribed direction the reflected beams or with poor efficiency to the reflection suppression portion (or light absorption department) of prescribed direction the reflected beams, mask pattern
Formed by high reflection portion and reflection suppression portion.This light shield M is due to being metal cylinder, therefore, it is possible to make at low cost
Make.
In addition, light shield M could be formed with the entirety or a part of panel pattern corresponding with a display device, also may be used
To be the layout for being formed with panel pattern corresponding with multiple display devices.In addition, on light shield M, can be around the 1st axle
AX1 circumference is repeatedly formed multiple panel patterns, can also be repeatedly formed along the direction parallel with the 1st axle AX1 multiple small-sized
Panel pattern.In addition, light shield M could be formed with panel pattern and size etc. and the 1st display of the 1st display device
The panel pattern of the 2nd different display device of part.As long as in addition, light shield M is with the radius of curvature centered on the 1st axle AX1
For Rm periphery, the shape of cylinder is not limited to.For example, light shield M can be the plate of the arc-shaped with periphery
Material.In addition, light shield M can be lamellar, laminal light shield M can also be made to bend and be attached in the way of with periphery
The framework of columned mother metal or cylindrical shape.
Next, being illustrated to the exposure device U3 shown in Fig. 2.Exposure device U3 is on above-mentioned driven roller R4~R6, side
On the basis of edge positioner EPC3 and aligming microscope AM1, AM2, also with light shield maintaining body 11, base supporting mechanism
12nd, lamp optical system IL, projection optical system PL and slave control device 16.Exposure device U3 passes through lamp optical system IL
And the illuminating bundle EL1 that projection optical system PL guiding is projected from light supply apparatus 13, and will be kept by light shield maintaining body 11
The picture of light shield M mask pattern is projected to the substrate P supported by base supporting mechanism 12.
The control exposure device of slave control device 16 U3 each several part, makes each several part perform processing.Slave control device 16
Can be device inspection apparatus 1 host control device 5 it is some or all.In addition, slave control device 16 can also
It is generalized control device 5 to control, is other devices different from host control device 5.Slave control device 16 is for example including meter
Calculation machine.
Light shield maintaining body 11 has the light shield holding cylinder (light shield holding member) 21 for keeping light shield M and keeps light shield
1st drive division 22 of the rotation of cylinder 21.Light shield holding cylinder 21 keeps light shield in the way of light shield M the 1st axle AX1 turns into pivot
M.1st drive division 22 is connected with slave control device 16, and light shield holding cylinder 21 is rotated using the 1st axle AX1 as pivot.
In addition, light shield maintaining body 11 keeps the light shield M of cylinder, but not limited to this structure by light shield holding cylinder 21
Into.Light shield maintaining body 11 can also along the outer peripheral face rolled sheet shape of light shield holding cylinder 21 light shield M and keep.In addition,
Light shield maintaining body 11 can also be maintained as the light shield M of the sheet material of arc-shaped in the outer peripheral face of light shield holding cylinder 21.
Base supporting mechanism 12 has supporting substrates P cylindric substrate supporting cylinder (substrate supporting part) 25, makes base
The 2nd drive division 26, a pair of air turning-bar ATB1, ATB2 and a pair of guide reels 27,28 that plate supporting cylinder 25 rotates.Substrate branch
Hold cylinder 25 and be formed as drum, the drum is with the radius of curvature centered on the 2nd axle AX2 extended along Y-direction
Rfa outer peripheral face (periphery).Here, the 1st axle AX1 and the 2nd axle AX2 are parallel to each other, with logical from the 1st axle AX1 and the 2nd axle AX2
Face CL centered on the face crossed.A part for the periphery of substrate supporting cylinder 25 turns into supporting substrates P bearing-surface P2.Namely
Say, substrate supporting cylinder 25 by substrate P by being wound in bearing-surface P2 and supporting substrates P.2nd drive division 26 is filled with the next control
16 connections are put, rotate substrate supporting cylinder 25 by pivot of the 2nd axle AX2.A pair of air turning-bars ATB1, ATB2 are clipped
Substrate supporting cylinder 25 and be respectively arranged on upstream side and the downstream side of the conveyance direction of substrate P.A pair of air turning-bars ATB1, ATB2
Located at the face side of substrate P, than the bearing-surface P2 side configurations on the lower of substrate supporting cylinder 25 in vertical (Z-direction).One
A pair of air turning-bar ATB1, ATB2 are clipped to guide reel 27,28 and be respectively arranged on the upstream side of the conveyance direction of substrate P and under
Flow side.In a pair of guide reels 27,28, wherein the guide reel 27 of a side will be guided to air from the driven roller R4 substrate Ps moved
Turning-bar ATB1, the guide reel 28 of the opposing party will be guided to driven roller R5 from the air turning-bar ATB2 substrate Ps moved.
Thus, base supporting mechanism 12 will be guided to air from the driven roller R4 substrate Ps moved by guide reel 27 and turned
Substrate supporting cylinder 25 is imported to bar ATB1, and by the substrate P for having passed through air turning-bar ATB1.Base supporting mechanism 12 passes through
2 drive divisions 26 rotate substrate supporting cylinder 25, thus will imported into the substrate P of substrate supporting cylinder 25 while by substrate supporting cylinder 25
Bearing-surface P2 supported, while towards air turning-bar ATB2 conveyance.Base supporting mechanism 12 passes through air turning-bar
ATB2 will be transported to air turning-bar ATB2 substrate P and guided to guide reel 28, and the substrate P for having passed through guide reel 28 is guided
To driven roller R5.
At this moment, the slave control device 16 being connected with the 1st drive division 22 and the 2nd drive division 26 makes light shield holding cylinder 21 and base
Plate supports cylinder 25 with defined rotary speed than synchronous rotary, thus will be formed in light shield M light shield face P1 mask pattern
Picture, continuously repeatedly projection exposure in wound on substrate supporting cylinder 25 bearing-surface P2 on substrate P surface (along periphery
The face of bending).
Light supply apparatus 13 projects the illuminating bundle EL1 illuminated in light shield M.Light supply apparatus 13 has light source 31 and light guide member
32.Light source 31 is the light source of the light of the provision wavelengths for the photoinduction layer imparting chemical action for projecting the surface to being formed at substrate P.
Light source 31 can use the lamp source such as mercury vapor lamp or laser diode, light emitting diode (LED) etc..Light source 31 is penetrated
The illumination light gone out is remote such as the open-wire line (g lines, h lines, i lines), KrF PRKs (wavelength 248nm) that are projected from lamp source
Ultraviolet light (DUV light), ArF PRKs (wavelength 193nm) etc..Here it is preferred that light source 31, which is projected, includes i lines
The illuminating bundle EL1 of the wavelength of (365nm wavelength) below.It is used as the light source for the illuminating bundle EL1 for producing the wavelength below i lines
31,3 subharmonic laser that the YAG for the laser for projecting wavelength 355nm can be used, the 4 of the YAG for the laser for projecting wavelength 266nm
Subharmonic laser or injection wavelength 248nm KrF PRKs of laser etc..
Here, the illuminating bundle EL1 projected from light supply apparatus 13 is incident to polarising beam splitter PBS described later.For shining
The energy produced Mingguang City beam EL1, the separation in order to suppress the illuminating bundle EL1 because being realized based on polarising beam splitter PBS is damaged
Lose, preferably incident illuminating bundle EL1 turns into the light beam as the substantially the entirety of reflections of polarising beam splitter PBS.Polarised light point
Beam device PBS becomes the light beam reflection of the rectilinearly polarized light of S-polarization light, and the light beam for becoming the rectilinearly polarized light of P polarization light is saturating
Penetrate.Therefore, light supply apparatus 13 projects the illuminating bundle EL1 for being incident to polarising beam splitter PBS as rectilinearly polarized light (S-polarization
Light) light beam illuminating bundle EL1.Thus, light supply apparatus 13 projects consistent inclined of wavelength and phase to polarising beam splitter PBS
Shake laser.
Light guide member 32 will be guided to lamp optical system IL from the illuminating bundle EL1 that light source 31 is projected.Light guide member 32
By being constituted using relay component for having optical fiber or speculum etc..In addition, in the case of provided with multiple lamp optical system IL, leading
Illuminating bundle EL1 from light source 31 is separated into a plurality of by light part 32, and a plurality of illuminating bundle EL1 is guided to multiple illuminations
Optical system IL.In addition, for example, in the case where the light beam projected from light source 31 is polarization laser, light guide member 32 can make
With polarization-maintaining fiber (polarization maintainingfiber) as optical fiber, maintained by polarization-maintaining fiber
Carried out under the polarization state of polarization laser guide-lighting.
Here, as shown in figure 3, the exposure device U3 of the 1st embodiment assumes that the exposure device of so-called poly-lens mode.
In addition, in fig. 3 it is shown that the illumination region IR being held on the cylinder light shield M of light shield holding cylinder 21 observed from-Z sides
Top view (Fig. 3 left figure) and the view field PA being supported in the substrate P of substrate supporting cylinder 25 that is observed from+Z sides
Top view (Fig. 3 right figure).Fig. 3 reference Xs represents the moving direction (rotation of light shield holding cylinder 21 and substrate supporting cylinder 25
Turn direction).The exposure device U3 of poly-lens mode is to multiple (being, for example, 6 in the 1st embodiment) lighting areas on light shield M
Domain IR1~IR6 irradiates illuminating bundle EL1 respectively, by each illuminating bundle EL1 obtained from each illumination region IR1~IR6 reflections
A plurality of projected light beam EL2 projection exposures to multiple (in the 1st embodiment be, for example, 6) view field PA1 in substrate P~
PA6。
First, to being illustrated by the lamp optical system IL multiple illumination region IR1~IR6 illuminated.As shown in figure 3,
Multiple illumination region IR1~IR6 clip median plane CL and are configured to two row along direction of rotation, the light shield in the upstream side of direction of rotation
The 1st illumination region IR1, the 3rd illumination region IR3 and the 5th illumination region IR5 of odd number are configured on M, in flowing down for direction of rotation
The 2nd illumination region IR2, the 4th illumination region IR4 and the 6th illumination region IR6 of even number are configured on the light shield M of side.Each lighting area
Domain IR1~IR6 is with the parallel short side extended along light shield M axial direction (Y-direction) and elongated trapezoidal (rectangle) on long side
Region.At this moment, trapezoidal each illumination region IR1~IR6 is that its short side is located at median plane CL sides, and its long side is located at the area in outside
Domain.1st illumination region IR1, the 3rd illumination region IR3 and the 5th illumination region IR5 are configured at axially spaced defined interval.Separately
Outside, the 2nd illumination region IR2, the 4th illumination region IR4 and the 6th illumination region IR6 are configured at axially spaced defined interval.This
When, the 2nd illumination region IR2 in the axial direction, is configured between the 1st illumination region IR1 and the 3rd illumination region IR3.Similarly, the 3rd
Illumination region IR3 in the axial direction, is configured between the 2nd illumination region IR2 and the 4th illumination region IR4.4th illumination region IR4 exists
On axial direction, it is configured between the 3rd illumination region IR3 and the 5th illumination region IR5.5th illumination region IR5 in the axial direction, is configured at
Between 4th illumination region IR4 and the 6th illumination region IR6.Each illumination region IR1~IR6 is with the phase from light shield M circumference
The mode (mode of coincidence) that the triangular part in adjacent trapezoidal illumination region IR hypotenuse portion is overlapping is configured.In addition, implementing the 1st
In mode, each illumination region IR1~IR6 is trapezoidal region but it is also possible to be rectangular region.
In addition, light shield M has the pattern forming region A3 for being formed with mask pattern and does not form the pattern of mask pattern not
Forming region A4.Pattern non-forming region domain A4 is the region for being difficult to reflect for absorbing illuminating bundle EL1, is configured to surround with frame-shaped
Pattern forming region A3.1st~the 6th illumination region IR1~IR6 is configured to the overall with of overlay pattern forming region A3 Y-direction.
Lamp optical system IL and multiple illumination region IR1~IR6 are accordingly provided with multiple (in the 1st embodiment examples
6 in this way).The illuminating bundle EL1 from light supply apparatus 13 is injected respectively in multiple lamp optical system IL1~IL6.Each illumination
Optical system IL1~IL6 by each illuminating bundle EL1 injected from light supply apparatus 13 be separately directed to each illumination region IR1~
IR6.That is, the 1st lamp optical system IL1 guides illuminating bundle EL1 to the 1st illumination region IR1, similarly, the 2nd shines
The lamp optical system IL6 of bright optical system IL2~the 6th guides illuminating bundle EL1 to the lighting area of the 2nd illumination region IR2~the 6th
Domain IR6.Multiple lamp optical system IL1~IL6 clip median plane CL in the arranged circumferentially into two row of light shield M.Multiple illumination lights
System IL1~IL6 clips median plane CL, is configuring the 1st illumination region IR1, the 3rd illumination region IR3, the 5th illumination region IR5
Side (Fig. 2 left side), the 1st lamp optical system IL1 of configuration, the 3rd lamp optical system IL3 and the 5th lamp optical system
IL5.1st lamp optical system IL1, the 3rd lamp optical system IL3 and the 5th lamp optical system IL5 are separated by defined compartment of terrain
It is configured at Y-direction.In addition, multiple lamp optical system IL1~IL6 clip median plane CL, the 2nd illumination region IR2, the are being configured
4 illumination region IR4, the 6th illumination region IR6 side (Fig. 2 right side), the 2nd lamp optical system IL2 of configuration, the 4th illumination light
System IL4 and the 6th lamp optical system IL6.2nd lamp optical system IL2, the 4th lamp optical system IL4 and the 6th illumination
Optical system IL6 is separated by defined compartment of terrain and is configured at Y-direction.At this moment, the 2nd lamp optical system IL2 in the axial direction, is configured at
Between 1st lamp optical system IL1 and the 3rd lamp optical system IL3.Similarly, the 3rd lamp optical system IL3 in the axial direction,
It is configured between the 2nd lamp optical system IL2 and the 4th lamp optical system IL4.4th lamp optical system IL4 in the axial direction,
It is configured between the 3rd lamp optical system IL3 and the 5th lamp optical system IL5.5th lamp optical system IL5 in the axial direction,
It is configured between the 4th lamp optical system IL4 and the 6th lamp optical system IL6.In addition, the 1st lamp optical system IL1, the 3rd
Lamp optical system IL3 and the 5th lamp optical system IL5, with the 2nd lamp optical system IL2, the 4th lamp optical system IL4 and
6th lamp optical system IL6, in terms of Y-direction, is symmetrically configured centered on median plane CL.
Next, reference picture 4, is illustrated to each lamp optical system IL1~IL6.Further, since each illumination optical system
IL1~the IL6 that unites is same composition, therefore is with the 1st lamp optical system IL1 (hereinafter simply referred to as lamp optical system IL)
Example is illustrated.
Lamp optical system IL is in order that irradiation illumination region IR (the 1st illumination region IR1) illuminating bundle EL1 illumination
It is evenly distributed, and is applicable Kohler illumination method.In addition, lamp optical system IL is using there is polarising beam splitter PBS to fall to penetrate photograph
Bright system.Lamp optical system IL has illumination light successively since the light incident side of the illuminating bundle EL1 from light supply apparatus 13
Learn component ILM, polarising beam splitter PBS and quarter wave plate 41.
As shown in figure 4, illumination optics ILM since illuminating bundle EL1 light incident side successively include collimation lens 51,
Fly's-eye lens 52, multiple collector lenses 53, cylindrical lens 54, illuminated field diaphragm 55 and multiple relay lens 56, and located at the
On 1 optical axis BX1.Emitting side of the collimation lens 51 located at the light guide member 32 of light supply apparatus 13.The optical axis configuration of collimation lens 51
In on the 1st optical axis BX1.The face of the light incident side of the irradiation fly's-eye lens 52 of collimation lens 51 is overall.Fly's-eye lens 52 is saturating located at collimation
The emitting side of mirror 51.The center configuration in the face of the emitting side of fly's-eye lens 52 is on the 1st optical axis BX1.Fly's-eye lens 52 will come from
The illuminating bundle EL1 of collimation lens 51 is divided into the light beam dissipated respectively from multiple spot light pictures.At this moment, generation spot light as
The face of the emitting side of fly's-eye lens 52, by from fly's-eye lens 52 via illuminated field diaphragm 55 to projection optical system described later
The various lens of PL the 1st concave mirror 72, are configured to optically common with the pupil plane where the reflecting surface of the 1st concave mirror 72
Yoke.
Collector lens 53 is located at the emitting side of fly's-eye lens 52.The optical axis of collector lens 53 is configured on the 1st optical axis BX1.
Collector lens 53 make the divided illuminating bundle EL1 of fly's-eye lens 52 each via cylindrical lens 54 in illumination field of view light
It is overlapping on door screen 55.Thus, illuminating bundle EL1 turns into uniform Illumination Distribution on illuminated field diaphragm 55.Cylindrical lens 54 is
The piano convex cylindrical lens that light incident side is plane, emitting side is convex surface.Cylindrical lens 54 is located at the emitting side of collector lens 53.Cylinder
The optical axis of lens 54 is configured on the 1st optical axis BX1.
It is orthogonal with the 1st optical axis BX1 in XZ faces in Fig. 4 that cylindrical lens 54 converges on illuminating bundle EL1 chief ray
Direction.Cylindrical lens 54 is adjacent with the light incident side of illuminated field diaphragm 55 and sets.The opening portion shape of illuminated field diaphragm 55
As the rectangle with the trapezoidal or rectangle of illumination region IR same shapes etc., the center of the opening portion of illuminated field diaphragm 55 is matched somebody with somebody
It is placed on the 1st optical axis BX1.At this moment, illuminated field diaphragm 55 passes through the various lens from illuminated field diaphragm 55 to light shield M, quilt
It is configured at the face being optically conjugated with the illumination region IR on light shield M.Relay lens 56 is penetrated located at illuminated field diaphragm 55
Go out side.The optical axis of relay lens 56 is configured on the 1st optical axis BX1.Relay lens 56 is by the illumination from illuminated field diaphragm 55
Light beam EL1 is incident to polarising beam splitter PBS.
When illuminating bundle EL1 is incident to illumination optics ILM, illuminating bundle EL1 is turned into by collimation lens 51 to be shone
Penetrate the overall light beam in the face of the light incident side of fly's-eye lens 52.The illuminating bundle EL1 for injecting fly's-eye lens 52 is more as being divided into
The illuminating bundle EL1 of individual spot light picture, cylindrical lens 54 is incident to via collector lens 53.Inject the illumination of cylindrical lens 54
Light beam EL1 converges on the direction orthogonal with the 1st optical axis BX1 in XZ faces.The illuminating bundle EL1 passed through from cylindrical lens 54 is incident
To illuminated field diaphragm 55.The opening portion for injecting illuminating bundle EL1 from the illuminated field diaphragm 55 of illuminated field diaphragm 55 is (trapezoidal
Or the rectangle of rectangle etc.) pass through, it is incident to polarising beam splitter PBS via relay lens 56.
Polarising beam splitter PBS is configured between illumination optics ILM and median plane CL.Polarising beam splitter PBS will
Illuminating bundle EL1 reflections from illumination optics ILM, on the other hand make the projected light beam EL2 transmissions by light shield M reflection.
That is, by making the illuminating bundle EL1 from illumination optics ILM turn into the rectilinearly polarized light of S-polarization light, it is incident to polarised light
Beam splitter PBS projected light beam EL2 is by rectilinearly polarized light of the effect as P polarization light of quarter wave plate 41 transmitted through polarization
Beam splitter PBS.
In addition, polarising beam splitter PBS's in detail will be aftermentioned, but as shown in fig. 6, polarising beam splitter PBS has the 1st rib
Mirror 91, the 2nd prism 92, the polarizing coating (wavefront division face) 93 between the 1st prism 91 and the 2nd prism 92.1st prism 91 and
2nd prism 92 is made up of quartz glass, is the triangular prism of triangle in XZ faces.Also, by the 1st prism for making triangle
91 and the 2nd prism 92 clips polarizing coating 93 and engaged, and polarising beam splitter PBS turns into quadrangle in XZ faces.
1st prism 91 is the prism of illuminating bundle EL1 and projected light beam EL2 light incident sides.2nd prism 92 is transmitted through polarization
The prism of the projected light beam EL2 emitting sides of film 93.Polarization is incident to from the illuminating bundle EL1 of the 1st prism 91 towards the 2nd prism 92
Film 93.The illuminating bundle EL1 of the reflection S-polarization light of polarizing coating 93 (rectilinearly polarized light), makes the projection of P polarization light (rectilinearly polarized light)
Light beam EL2 is transmitted.
Preferably, polarising beam splitter PBS reaches the big of the illuminating bundle EL1 of polarizing coating (wavefront division face) 93
Part, and make projected light beam EL2 most of transmission.Polarization separation in polarising beam splitter PBS wavefront division face is special
Property represents with extinction ratio, but because the extinction ratio can change because of the incidence angle of the light towards wavefront division face, therefore corrugated
The characteristic of divisional plane further contemplates illuminating bundle EL1 and/or projected light beam EL2 NA (numerical aperture) and designed, to cause to reality
The influence for the imaging performance used will not turn into problem.
Quarter wave plate 41 is configured between polarising beam splitter PBS and light shield M.Quarter wave plate 41 will be by polarising beam splitter
The illuminating bundle EL1 of PBS is converted to circularly polarized light from rectilinearly polarized light (S-polarization light).Because of the illuminating bundle of circularly polarized light
EL1 irradiation and by the light (circularly polarized light) of light shield M reflection, P polarization light (rectilinearly polarized light) is converted to by quarter wave plate 41
Projected light beam EL2.
Fig. 5 A are the illuminating bundle EL1 for the illumination region IR that will be irradiated on light shield M, the throwing with being reflected by illumination region IR
Shadow light beam EL2 state, exaggerates the figure of display in XZ faces (face vertical with the 1st axle AX1).As shown in Figure 5A, above-mentioned photograph
Bright optical system IL will be irradiated in light shield M illumination region IR illuminating bundle EL1 chief ray, in XZ faces (with the 1st axle AX1
Vertical face) in be set to non-telecentricity state consciously, telecentricity state is set in YZ faces (parallel with median plane CL), to cause
Telecentricity (parallel system) is turned into by the light shield M illumination region IR projected light beam EL2 reflected chief ray.Illuminating bundle EL1's
This characteristic is endowed by the cylindrical lens 54 shown in Fig. 4.Specifically, setting from the illumination region on the P1 of light shield face
IR circumferential central point Q1 by and towards the 1st axle AX1 line and light shield face P1 radius Rm 1/2 circle intersection point Q2 when,
With from illumination region IR illuminating bundle EL1 each chief ray in XZ facing to by way of intersection point Q2, set cylindrical lens
The curvature of 54 dome cylinder lens face.In this way, by illumination region IR internal reflections projected light beam EL2 each chief ray
In XZ faces, as with the state from the 1st axle AX1, point Q1, intersection point the Q2 straight line parallel (telecentricity) passed through.
Next, to being illustrated by multiple view field PA1~PA6 of projection optical system PL projection exposures.Such as
Shown in Fig. 3, multiple view field PA1~PA6 in substrate P and multiple illumination region IR1 on light shield M~IR6 is corresponding and matches somebody with somebody
Put.That is, multiple view field PA1~PA6 in substrate P clip median plane CL and are configured to two row in conveyance direction,
The 1st view field PA1, the 3rd view field PA3 and the 5th projected area of odd number are configured in the substrate P of the upstream side of conveyance direction
Domain PA5, in the substrate P of the downstream side of conveyance direction configure even number the 2nd view field PA2, the 4th view field PA4 and
6th view field PA6.Each view field PA1~PA6 is the short side and length extended with the width (Y-direction) along substrate P
The region of elongated trapezoidal (rectangle) on side.At this moment, trapezoidal each view field PA1~PA6 be its short side be located at median plane CL sides,
Its long side is located at the region in outside.1st view field PA1, the 3rd view field PA3 and the 5th view field PA5 are in width
It is spaced and configures as defined in being separated by.In addition, the 2nd view field PA2, the 4th view field PA4 and the 6th view field PA6 are in width
Direction is spaced and configured as defined in being separated by.At this moment, the 2nd view field PA2 in the axial direction, is configured at the 1st view field PA1 and
Between 3 view field PA3.Similarly, the 3rd view field PA3 in the axial direction, is configured at the projections of the 2nd view field PA2 and the 4th
Between the PA4 of region.4th view field PA4 is configured between the 3rd view field PA3 and the 5th view field PA5.5th projected area
Domain PA5 is configured between the 4th view field PA4 and the 6th view field PA6.Each view field PA1~PA6 and each illumination region
IR1~IR6 similarly, the triangle in adjacent trapezoidal view field PA hypotenuse portion during with from the conveyance direction of substrate P
The overlapping mode in portion (mode of coincidence) is configured.At this moment, view field PA turns into the repetition caused in adjacent view field PA
The light exposure in region and substantially the same such shape of light exposure in unduplicated region.Also, the 1st view field PA1
~the 6 view field PA6 is configured to cover the overall with of the Y-direction for the exposure area A7 being exposed in substrate P.
Here, in fig. 2, when being observed in XZ faces, the central point from illumination region IR1 (and IR3, IR5) on light shield M
Girth to illumination region IR2 (and IR4, IR6) central point is set to：With in bearing-surface P2 substrate P from throwing
The girth of shadow zone domain PA1 (and PA3, PA5) central point to view field PA2 (and PA4, PA6) central point is substantially equal.
Projection optical system PL and multiple view field PA1~PA6 are accordingly provided with multiple (in the 1st embodiment examples
6 in this way).In multiple projection optical system PL1~PL6, inject respectively from a plurality of of multiple illumination region IR1~IR6 reflections
Projected light beam EL2.Each projection optical system PL1~PL6 will be separately directed to each throwing by each projected light beam EL2 of light shield M reflection
Shadow zone domain PA1~PA6.That is, the 1st projection optical system PL1 draws the projected light beam EL2 from the 1st illumination region IR1
The 1st view field PA1 is directed at, similarly, the projection optical system PL6 of the 2nd projection optical system PL2~the 6th will be from the 2nd illumination
The illumination region IR6 of region IR2~the 6th each projected light beam EL2 is guided to the view field PA6 of the 2nd view field PA2~the 6th.It is many
Individual projection optical system PL1~PL6 clips median plane CL in the arranged circumferentially into two row of light shield M.Multiple projection optical system PL1
~PL6 clips median plane CL, is configuring the 1st view field PA1, the 3rd view field PA3, the 5th view field PA5 side (figure
2 left side), the 1st projection optical system PL1 of configuration, the 3rd projection optical system PL3 and the 5th projection optical system PL5.1st throws
Shadow optical system PL1, the 3rd projection optical system PL3 and the 5th projection optical system PL5 are separated by defined compartment of terrain and are configured at Y side
To.In addition, multiple projection optical system PL1~PL6 clip median plane CL, the 2nd view field PA2, the 4th view field are being configured
PA4, the 6th view field PA6 side (Fig. 2 right side), the 2nd projection optical system PL2 of configuration, the 4th projection optical system PL4
And the 6th projection optical system PL6.2nd projection optical system PL2, the 4th projection optical system PL4 and the 6th projection optical system
PL6 is separated by defined compartment of terrain and is configured at Y-direction.At this moment, the 2nd projection optical system PL2 in the axial direction, is configured at the 1st projection
Between optical system PL1 and the 3rd projection optical system PL3.Similarly, the 3rd projection optical system PL3 in the axial direction, is configured at
Between 2nd projection optical system PL2 and the 4th projection optical system PL4.4th projection optical system PL4 is configured at the 3rd projected light
Between system PL3 and the 5th projection optical system PL5.5th projection optical system PL5 is configured at the 4th projection optical system PL4
Between the 6th projection optical system PL6.In addition, the 1st projection optical system PL1, the 3rd projection optical system PL3 and the 5th projection
Optical system PL5 and the 2nd projection optical system PL2, the 4th projection optical system PL4 and the 6th projection optical system PL6, from Y side
To seeing, symmetrically configured centered on median plane CL.
Referring again to Fig. 4, each projection optical system PL1~PL6 is illustrated.Further, since each projection optical system
PL1~PL6 is same composition, therefore by taking the 1st projection optical system PL1 (hereinafter simply referred to as projection optical system PL) as an example
Illustrate.
Projection optical system PL throws the picture of the mask pattern on the illumination region IR (the 1st illumination region IR1) on light shield M
View field PA in shadow to substrate P.Projection optical system PL since the light incident side of the projected light beam EL2 from light shield M according to
It is secondary that there is above-mentioned quarter wave plate 41, above-mentioned polarising beam splitter PBS and Projection optics PLM.
, can be with lamp optical system IL dual-purposes for quarter wave plate 41 and polarising beam splitter PBS.In other words, illumination light
System IL and projection optical system PL has quarter wave plate 41 and polarising beam splitter PBS.
As illustrated in Figure 5 A, the projected light beam EL2 reflected by illumination region IR turn into telecentricity light beam (chief ray that
This parallel state), and it is incident to projection optical system PL.The projected light beam as circularly polarized light reflected by illumination region IR
EL2 is converted to after rectilinearly polarized light (P polarization light) by quarter wave plate 41 from circularly polarized light, is incident to polarising beam splitter PBS.
Polarising beam splitter PBS projected light beam EL2 is injected transmitted through after polarising beam splitter PBS, Projection optics are incident to
PLM。
Projection optics PLM is corresponding with illumination optics ILM and sets.That is, the 1st projection optical system
The 1st illumination region that PL1 Projection optics PLM will be illuminated by the 1st lamp optical system IL1 illumination optics ILM
The picture of IR1 mask pattern, projection to the 1st view field PA1 in substrate P.Similarly, the 2nd projection optical system PL2~the
6 projection optical system PL6 Projection optics PLM is by by the lamp optical system IL6's of the 2nd lamp optical system IL2~the 6th
The picture of the illumination region IR6 of the 2nd illumination region IR2~the 6th of illumination optics ILM illuminations mask pattern, projection to substrate P
On the view field PA6 of the 2nd view field PA2~the 6th.
As shown in figure 4, Projection optics PLM possesses images in intermediary image by the picture of the mask pattern on illumination region IR
Face P7 the 1st optical system 61, by least a portion reimaging for the intermediary image being imaged by the 1st optical system 61 in substrate P
View field PA the 2nd optical system 62, be configured at the intermediate image plane P7 to form intermediary image perspective view diaphragm 63.Separately
Outside, Projection optics PLM possesses focus amendment optical component 64, as skew is with optical component 65, multiplying power amendment optical section
Part 66, rotation correction mechanism 67 and polarization adjustment mechanism (polarization adjustment unit) 68.
1st optical system 61 and the 2nd optical system 62 are telecentricity reflected refractions obtained from for example wearing gloomy system variant
Optical system.1st optical system 61, its optical axis (hereinafter referred to as the 2nd optical axis BX2) is substantially orthogonal relative to median plane CL.The
1 optical system 61 possesses the 1st deflection component 70, the 1st lens group 71 and the 1st concave mirror 72.1st deflection component 70 is that have the 1st
Reflecting surface P3 and the 2nd reflecting surface P4 triangular prism.1st reflecting surface P3 is to make the projected light beam from polarising beam splitter PBS
EL2 reflects, and make the projected light beam EL2 after reflection from the 1st lens group 71 by and be incident to the face of the 1st concave mirror 72.2nd is anti-
The face P4 of penetrating be make the projected light beam EL2 that is reflected by the 1st concave mirror 72 from the 1st lens group 71 by and it is incident, and make the throwing of incidence
The face that shadow light beam EL2 reflects towards perspective view diaphragm 63.1st lens group 71 includes various lens, and the optical axis of various lens is matched somebody with somebody
It is placed on the 2nd optical axis BX2.1st concave mirror 72 is configured at the pupil plane of the 1st optical system 61, and be set to by compound eye
The relation that multiple spot light pictures that lens 52 are generated optically are conjugated.
Projected light beam EL2 from polarising beam splitter PBS is reflected by the 1st reflecting surface P3 of the 1st deflection component 70, from the
The field of view of the first half of 1 lens group 71 by and be incident to the 1st concave mirror 72.Inject the projected light beam of the 1st concave mirror 72
EL2 is reflected by the 1st concave mirror 72, from the field of view of the lower half of the 1st lens group 71 by and be incident to the 1st deflection component 70
The 2nd reflecting surface P4.The projected light beam EL2 for injecting the 2nd reflecting surface P4 is reflected by the 2nd reflecting surface P4, from focus amendment optical section
Part 64 and as skew optical component 65 passes through, is incident to perspective view diaphragm 63.
Perspective view diaphragm 63 has the opening of regulation view field PA shape.That is, the opening of perspective view diaphragm 63
Shape provide view field PA shape.
2nd optical system 62 is the composition same with the 1st optical system 61, clips intermediate image plane P7 and the 1st optical system
61 are symmetrically arranged.2nd optical system 62, its optical axis (hereinafter referred to as the 3rd optical axis BX3) is relative to median plane CL substantially just
Hand over, and it is parallel with the 2nd optical axis BX2.2nd optical system 62 possesses the 2nd deflection component 80, the 2nd lens group 81 and the 2nd concave mirror
82.2nd deflection component 80 has the 3rd reflecting surface P5 and the 4th reflecting surface P6.3rd reflecting surface P5 is to make to come from perspective view diaphragm
63 projected light beam EL2 reflection, and make the projected light beam EL2 after reflection from the 2nd lens group 81 by and be incident to the 2nd concave mirror
82 face.4th reflecting surface P6 be make the projected light beam EL2 that is reflected by the 2nd concave mirror 82 from the 2nd lens group 81 by and it is incident,
And the face for making the projected light beam EL2 of incidence be reflected towards view field PA.2nd lens group 81 includes various lens, various lens
Optical axis be configured on the 3rd optical axis BX3.2nd concave mirror 82 is configured at the pupil plane of the 2nd optical system 62, and be set to
Image in the relation that multiple spot light pictures of the 1st concave mirror 72 are optically conjugated.
Projected light beam EL2 from perspective view diaphragm 63 is reflected by the 3rd reflecting surface P5 of the 2nd deflection component 80, from the 2nd
The area of visual field of the first half of lens group 81 by and be incident to the 2nd concave mirror 82.Inject the projected light beam of the 2nd concave mirror 82
EL2 is reflected by the 2nd concave mirror 82, from the area of visual field of the lower half of the 2nd lens group 81 by and be incident to the 2nd deflection component 80
The 4th reflecting surface P6.The projected light beam EL2 for injecting the 4th reflecting surface P6 is reflected by the 4th reflecting surface P6, from multiplying power amendment optics
Part 66 by and be projected onto view field PA.Thus, the picture of the mask pattern on illumination region IR with etc. multiplying power (× 1) quilt
It is projected on view field PA.
Focus amendment optical component 64 is configured between the 1st deflection component 70 and perspective view diaphragm 63.Focus amendment light
Department of the Chinese Academy of Sciences's part 64 adjusts the focus state of the picture for the mask pattern being projected in substrate P.Focus amendment optical component 64 is by such as 2
The prism reverse (being reverse in X-direction in Fig. 4) of piece wedge shape and the parallel flat for being overlapped into whole clearing.By making
A pair of prisms are slided in the state of the interval between not changing face relative to each other along bevel direction, can change parallel flat
The thickness of plate.Thus, the optical path length of the actual effect of the 1st optical system 61 is finely adjusted, and to be formed at intermediate image plane P7 and
The focusing state of the picture of view field PA mask pattern is finely adjusted.
As skew optical component 65 is configured between the 1st deflection component 70 and perspective view diaphragm 63.As skew is used up
Department of the Chinese Academy of Sciences's part 65 can movably adjust the picture for the mask pattern being projected in substrate P in image planes.As skew optical component
65 by Fig. 4 be capable of inclined transparent parallel plate glass and Fig. 4 in XZ faces can be inclined transparent in YZ faces
Parallel plate glass is constituted.By adjusting each tilt quantity of 2 parallel plate glass, can make to be formed at intermediate image plane P7 and
The picture of view field PA mask pattern is in X direction and/or the micro skew of Y-direction.
Multiplying power amendment optical component 66 is configured between the 2nd deflection component 80 and substrate P.Multiplying power amendment optical component
66 are for example configured to：At predetermined intervals by concavees lens, convex lens, concavees lens this 3 lens arranged coaxials, front and rear concavees lens are consolidated
Fixed, the convex lens between being allowed to are moved along optical axis (chief ray) direction.Thus, it is formed at the picture dimension of view field PA mask pattern
The image formation state of telecentricity is held, and is isotropically only zoomed in or out with micro.In addition, constituting multiplying power amendment optical component
The optical axis of 66 3 lens groups is tilted in XZ faces in the mode parallel with projected light beam EL2 chief ray.
Rotation correction mechanism 67 is for example (to omit and illustrate) by actuator, makes the 1st deflection component 70 around parallel with Z axis
The part of the micro rotation of axle.The rotation correction mechanism 67 can make to be formed at intermediary image by rotating the 1st deflection component 70
The micro rotation in intermediate image plane P7 of the picture of face P7 mask pattern.
Polarization adjustment mechanism 68 is for example to make quarter wave plate 41 around orthogonal with plate face by actuator (omit and illustrate)
Axle rotates, to adjust the part of polarization direction.Polarizing adjustment mechanism 68 can be by rotating quarter wave plate 41, to adjust projection
In view field PA projected light beam EL2 illumination.
In the projection optical system PL so constituted, the projected light beam EL2 from light shield M is from illumination region IR along light shield
Face P1 normal direction is projected, from quarter wave plate 41 and polarising beam splitter PBS by and be incident to the 1st optical system 61.Inject
The projected light beam EL2 of 1st optical system 61 by the 1st optical system 61 the 1st deflection component 70 the 1st reflecting surface (level crossing) P3
Reflection, reflects from the 1st lens group 71 by and by the 1st concave mirror 72.The projected light beam EL2 reflected by the 1st concave mirror 72, again
From the 1st lens group 71 by and by the 1st deflection component 70 the 2nd reflecting surface (level crossing) P4 reflections, and transmit overfocus amendment
Optical component 64 and as skew optical component 65, and it is incident to perspective view diaphragm 63.Pass through from perspective view diaphragm 63
Projected light beam EL2, is reflected by the 3rd reflecting surface (level crossing) P5 of the 2nd deflection component 80 of the 2nd optical system 62, and saturating from the 2nd
Microscope group 81 reflects by and by the 2nd concave mirror 82.The projected light beam EL2 reflected by the 2nd concave mirror 82, again from the 2nd lens group
81 by and by the 2nd deflection component 80 the 4th reflecting surface (level crossing) P6 reflections, and be incident to multiplying power amendment optical component
66.The projected light beam EL2 projected from multiplying power amendment with optical component 66 is incident to the view field PA in substrate P, in lighting area
It is projected in view field PA to the multiplying powers such as the picture of the mask pattern shown in the IR of domain (× 1).
In the present embodiment, the 3rd of the 2nd reflecting surface (level crossing) P4 of the 1st deflection component 70 and the 2nd deflection component 80
Reflecting surface (level crossing) P5 is to tilt 45 ° of face relative to median plane CL (or optical axis BX2, BX3), but the 1st deflection component 70
The 4th reflecting surface (level crossing) P6 of 1st reflecting surface (level crossing) P3 and the 2nd deflection component 80 is set as relative to median plane CL
Angle beyond 45 ° of (or optical axis BX2, BX3).1st reflecting surface P3 of the 1st deflection component 70 is relative to median plane CL (or light
Axle BX2) angle [alpha] ° (absolute value) be set to following relation：When will pass through in figure 6 from point Q1, intersection point Q2, the 1st axle AX1
Straight line and median plane CL folded by angle when being set to θ °, α °=45 °+θ °/2.Similarly, the 4th reflection of the 2nd deflection component 80
Angle betas ° (absolute value) of the face P6 relative to median plane CL (or optical axis BX2) is set to following relation：When will be from substrate supporting
The projected light beam EL2 passed through on the central point in circumferential view field PA of the outer peripheral face of cylinder 25 chief ray and median plane
When angles of the CL in ZX faces is set to ε °, β °=45 °+ε °/2.
The composition ＞ of ＜ lamp optical systems and projection optical system
Further, reference picture 4, Fig. 6 and Fig. 7, lamp optical system IL to the exposure device U3 of the 1st embodiment and
Projection optical system PL composition is described in detail.
As described above, the lamp optical system IL shown in Fig. 4 has illumination optics ILM, projection optical system PL tools
There are Projection optics PLM, lamp optical system IL and projection optical system PL to have polarising beam splitter PBS and quarter wave plate
41.The direction (Z-direction) that illumination optics ILM and polarising beam splitter PBS extend in median plane CL, located at light shield M with throwing
Between shadow optical module PLM.Specifically, polarising beam splitter PBS is in Z-direction, located at light shield M and Projection optics PLM
The 1st deflection component 70 between, in X-direction, between median plane CL and illumination optics ILM.In addition, light optics group
Part ILM is in Z-direction, between light shield M and Projection optics PLM the 1st lens group 71, in X-direction, clips polarised light point
Beam device PBS is located at the opposite side of median plane CL sides.
Here, reference picture 7, are illustrated to the configuring area E that can configure illumination optics ILM.In XZ faces
Configuring area E is the region divided by the 1st line L1, the 2nd line L2, the 3rd line L3.2nd line L2 is by the projection of light shield M reflection
Light beam EL2 chief ray (for example, passing through from the point Q1 in Fig. 5 A).1st line L1 is the projected light beam EL2 by light shield M reflection
The tangent line (tangent plane) for the light shield face P1 on intersection point (for example, point Q1 in Fig. 5 A) that chief ray intersects with light shield face P1.3rd line L3
It is in the way of not interfering spatially with Projection optics PLM, abreast to be set with the 2nd optical axis BX2 of the 1st optical system 61
Fixed line.Illumination optics ILM is configured in the configuring area E surrounded with the 1st line L1, the 2nd line L2 and the 3rd line L3.Make light
Cover in the case that M is cylinder, as shown in fig. 7, can with the 3rd line L3 and the 1st line L1 at the interval of Z-direction with from median plane CL
Leave and become big mode, tilt the 1st line L1.Therefore, illumination optics ILM setting becomes easy.
In addition, illumination optics ILM configuration can also be incident to polarized light beam splitting according to from illumination optics ILM
The incident angle β of the illuminating bundle EL1 of device PBS polarizing coating 93 chief ray is provided.As shown in fig. 6, will be by illumination region IR
The projected light beam EL2 of reflection chief ray (for example, passing through from the point Q1 in Fig. 5 A) is set to the median plane CL angles constituted
θ.At this moment, illumination optics ILM is configured to：It is incident to the illuminating bundle EL1 of polarising beam splitter PBS polarizing coating 93 master
The incident angle β (middle illustrating aftermentioned as θ 1) of light is in the range of 45 ° × 0.8≤β≤(45 ° of+θ/2) × 1.2.Also
It is to say, the angular range of the incident angle β is to make illumination even if being suitable for the incident angle β of polarising beam splitter PBS polarizing coating 93
Light beam EL1 is incident, also can configure illumination light in the way of not producing physical interference to light shield M and Projection optics PLM
Learn component ILM scope.In addition, although the angular range of above-mentioned incident angle β is contemplated by illuminating bundle EL1 numerical aperture
Footpath (NA) and the angular distribution that determines is determined, but more preferably 45 °≤β≤(45 ° of+θ/2).In addition, optimal incident angle β
It is in the state of illumination optics ILM the 1st optical axis BX1 is parallel with Projection optics PLM the 2nd optical axis BX2, to make photograph
Mingguang City beam EL1 is incident to incidence angle during polarising beam splitter PBS polarizing coating 93.
2 triangular prisms (for example, quartz is made) 91,92 structures that polarising beam splitter PBS is engaged by clipping polarizing coating 93
Into.It is set as and shines for the plane of incidence of prism (the 1st prism) 91 incident the illuminating bundle EL1 from illumination optics ILM
Bright optical module ILM optical axis BX1 is vertical, and illuminating bundle EL1 is set as and projected light beam EL2 towards the light shield M faces projected
Chief ray (for example, by the point Q1 in Fig. 5 A and line that Pivot axle (the 1st axle) AX1 links) it is vertical.In addition, light will be come from
Cover the prism (the 2nd prism) 92 that M projected light beam EL2 is transmitted via prism 91, polarizing coating 93 towards Projection optics PLM
Outgoing plane be also set to projected light beam EL2 chief ray (for example, the point Q1 in Fig. 5 A and Pivot axle AX1 is linked
Line) it is vertical.Therefore, polarising beam splitter PBS is the projected light beam EL2 relative to the chief ray with telecentricity, with certain
The optical parallel plate of thickness.
As shown in figure 4, due to illumination optics ILM polarising beam splitter PBS sides easily with Projection optics PLM
Physical interference is produced, therefore cuts off a part for the various lens (the 1st lens) that illumination optics ILM is included.In addition,
In 1st embodiment, the situation after being removed to the parts of illumination optics ILM various lens is illustrated, but simultaneously
Not limited to this is constituted.That is or, due to Projection optics PLM polarising beam splitter PBS sides also easily with
Illumination optics ILM produces physical interference, therefore the various lens (the 2nd lens) that excision Projection optics PLM is included
A part.It therefore, it can cut off the various lens that illumination optics ILM and Projection optics PLM both sides are included
A part.But, in general, compared with Projection optics PLM, the optical accuracy that illumination optics ILM is required
It is relatively low, therefore excision illumination optics ILM various lens is a part of relatively simple and preferred.
In illumination optics ILM, the part located at multiple relay lens 56 of polarising beam splitter PBS sides is cut
Remove.Multiple relay lens 56 are the 1st relay lens 56a, the 2nd relay lens successively since illuminating bundle EL1 light incident side
56b, the 3rd relay lens 56c, the 4th relay lens 56d.4th relay lens 56d is adjacent with polarising beam splitter PBS and sets.
3rd relay lens 56c is adjacent with the 4th relay lens 56d and sets.2nd relay lens 56b and the 3rd relay lens 56c are separated by rule
Fixed interval and set, and compared to the interval between the 2nd relay lens 56b and the 1st relay lens 56a, the 2nd relay lens
Interval between 56b and the 3rd relay lens 56c is longer.1st relay lens 56a is adjacent with the 2nd relay lens 56b and sets.From
Polarising beam splitter PBS is formed as the circle centered on optical axis compared with the 1st relay lens 56a in distal side and the 2nd relay lens 56b
Shape.On the other hand, be formed as from polarising beam splitter PBS compared with the 3rd relay lens 56c of nearside and the 4th relay lens 56d by circle
Shape after the part excision of shape.
When illuminating bundle EL1 is incident to the 3rd relay lens 56c and the 4th relay lens 56d, in the 3rd relay lens 56c
And the 4th non-incidence zone for not injecting of relay lens 56d formation illuminating bundle EL1 the incident area S2 that injects and illuminating bundle EL1
Domain S1.3rd relay lens 56c and the 4th relay lens 56d is formed by making non-incident area S1 a part of defect, is formed
For the shape after a circular part is cut off.Specifically, the 3rd relay lens 56c and the 4th relay lens 56d be, will be in XZ
The both sides of the orthogonal direction orthogonal with the 1st optical axis BX1 in face, the shape cut off by the face vertical with orthogonal direction.Cause
This, is to include substantially elliptical, substantially when the 3rd relay lens 56c and the 4th relay lens 56d are from from the 1st optical axis BX1
The shape of Long Circle, substantially oval-shaped etc..
Here, reference picture 5B to the 4th relay lens 56d nearest from polarising beam splitter PBS in Fig. 4 profile one
Individual example is illustrated.Fig. 5 B are the 4th relay lens 56d observed from polarising beam splitter PBS sides figures, clip illumination
, there is the non-incident area S1 that illuminating bundle EL1 does not pass through up and down in Z-direction in the incident area S2 that light beam EL1 is passed through.The
4 relay lens 56d are that after the round lens of manufacture specified diameter, the Partial Resection suitable with non-incident area S1 is formed
's.
The diameter of the round lens is according to the size, operating distance, illuminating bundle EL1 of the illumination region IR on light shield M
The degree of the non-telecentricity of numerical aperture (NA) and the illuminating bundle EL1 illustrated by Fig. 5 A chief ray and determine.In figure 5b,
Being conceived to the illumination region IR being set on light shield M (here, will be made centered on the point Q1 passed through by optical axis BX1 and with Y-direction
For the rectangle on long side) corner.If a point using the corner is FFa, the point FFa in illumination region IR is by from the 4th
The partial illumination light beam EL1a of circular is irradiated in the illuminating bundle EL1 that relay lens 56d passes through.Partial illumination light beam
The size of circular distributions of the EL1a on the 4th relay lens 56d, by operating distance (focal length) and/or illuminating bundle EL1
Numerical aperture (NA) is determined.
In addition, as illustrated by fig. 5, because each chief ray of the illuminating bundle EL1 on light shield M is in XZ faces
The interior state for non-telecentricity, therefore relayed from the partial illumination light beam EL1a passed through of the point FFa on light shield M chief ray the 4th
It is a certain amount of along Z-direction skew on lens 56d.So, the part of each point of illumination region IR corner (and in outer rim) will be irradiated
Whole of the illuminating bundle on the 4th relay lens 56d is distributed overlapping light beam, as being distributed on the 4th relay lens 56d
Incident area S2 illuminating bundle EL1.Therefore, as long as the state of the non-telecentricity with reference to illuminating bundle EL1 in XZ faces
And obtain distributions (diffusion) of the illuminating bundle EL1 on the 4th relay lens 56d, with as covering incident area S2 (illumination lights
Beam EL1 distributed areas) the mode of size determine the 4th relay lens 56d shape and size.
With the 4th relay lens 56d similarly, for other lenses 56c or lens 56a, 56b in Fig. 4, also can
Consider substantial illuminating bundle EL1 distributed areas, and in the way of as the size covered, determine the profile of lens
And size.
In general, the high-precision lens with power (refracting power) are the circles of grinding optical glass and/or quartz etc.
The surface of shape glass material makes, but it is also possible to from it is initial prepare that such as Fig. 5 B determine like that it is suitable with incident area S2
The substantially oval-shaped of size, substantially substantially elliptical, Long Circle or generally rectangular glass material, and grind its surface and shape
Into desired lens face.In this case, the process without cutting off the part suitable with non-incident area S1.
＜ polarising beam splitters ＞
Next, reference picture 6, Fig. 8 to Figure 11, to the polarising beam splitter of the exposure device U3 located at the 1st embodiment
PBS composition is illustrated.Fig. 8 is the figure of the composition around the polarizing coating for the polarising beam splitter for representing the 1st embodiment.Figure
9 be the figure of the composition around the polarizing coating for the polarising beam splitter for representing the comparative example relative to the 1st embodiment.Figure 10 is table
The transmissison characteristic of polarising beam splitter shown in diagram 8 and the curve map of reflection characteristic.Figure 11 is to represent the polarised light shown in Fig. 9
The transmissison characteristic of beam splitter and the curve map of reflection characteristic.
As shown in fig. 6, polarising beam splitter PBS has the 1st prism 91, the 2nd prism 92, located at the 1st prism 91 and the 2nd rib
Polarizing coating 93 between mirror 92.1st prism 91 and the 2nd prism 92 are made up of quartz glass, are different triangles in XZ faces
Triangular prism.Also, polarising beam splitter PBS clips polarizing coating 93 by the 1st prism 91 of triangle and the 2nd prism 92
And engage, and turn into quadrilateral shape in XZ faces.
1st prism 91 is the prism of illuminating bundle EL1 and projected light beam EL2 light incident sides.1st prism 91 has for from photograph
The 1st incident bright optical module ILM illuminating bundle EL1 face D1 and the 2nd face for the projected light beam EL2 incidences from light shield M
D2.Chief rays of the 1st face D1 relative to illuminating bundle EL1 is vertical plane.In addition, masters of the 2nd face D2 relative to projected light beam EL2
Light is vertical plane.
2nd prism 92 is the prism transmitted through the projected light beam EL2 emitting sides of polarizing coating 93.2nd prism 92 has and the 1st
1st face D1 the 3rd relative face D3 and the 4th face D4 relative with the 2nd face D2 of the 1st prism 91 of prism 91.4th face D4 is to penetrate
Enter the projected light beam EL2 of the 1st prism 91 transmitted through polarizing coating 93 and the face projected, relative to the projected light beam EL2 of injection master
Light is vertical plane.At this moment, the 1st face D1 and the 3rd relative face D3 are not parallel, on the other hand, the 2nd face D2 and the 4th relative face
D4 is parallel.
Polarizing coating 93 is incident to from the illuminating bundle EL1 of the 1st prism 91 towards the 2nd prism 92.Polarizing coating 93 reflects S-polarization
The illuminating bundle EL1 of light (rectilinearly polarized light), the projected light beam EL2 of transmitting P-type polarisation light (rectilinearly polarized light).Polarizing coating 93 be by
Principal component is the (SiO of silica2) film body and principal component be hafnium oxide (HfO2) film body film thickness direction be laminated and formed
's.Hafnium oxide is that the less material of light beam is comparably absorbed with quartz, is the material for being difficult to produce change because of the absorption of light beam.
The polarizing coating 93 is the film as defined Brewster angle θ B.Here, Brewster angle θ B are that the reflectivity of P polarization light is 0
Angle.
Brewster angle θ B are calculated by following formulas.In addition, nh is the refractive index of hafnium oxide, nL is the folding of silica
Rate is penetrated, ns is the refractive index of prism (quartz glass).
θ B=arcsin ([(nh2×nL2)/{ns2(nh2+nL2)}]0.5)
Here, if nh=2.07 (HfO2), nL=1.47 (SiO2), ns=1.47 (quartz glass), then according to above-mentioned formula
Son, the Brewster angle θ B of polarizing coating 93 are substantially 54.6 °.
But, refractive index nh, nL, ns of each material are not defined in above-mentioned numerical value uniquely.Refractive index can be relative to substantially
Use wavelength from ultraviolet light to visible ray and change, with a little scope.If in addition, also having by being carried out to various materials
Dry addition and refractive index produce the situation of change.For example, the refractive index nh of hafnium oxide is distributed in 2.00~2.15 scope, two
The refractive index nL of silica is distributed in 1.45~1.48 scope.In addition, if considering because making refraction change using wavelength
Situation, then the refractive index ns of prism (quartz glass) can also change.If refractive index ns and above-mentioned SiO2Similarly 1.45
~1.48 scope, then the Brewster angle θ B of polarizing coating 93 have 52.4 °~57.3 ° of model derived from above-mentioned formula
Enclose.
So, because refractive index nh, nL, ns of each material are because material is constituted and/or using wavelength has some changes, because
This Brewster angle θ B can also change, but in following concrete example, be illustrated with θ B=54.6 °.
At this moment, if drawing boost line (dotted line) L1 as shown in Figure 6, understand polarizing coating 93 and the 1st face D1 into
Angle, θ 2 and be incident to polarizing coating 93 illuminating bundle EL1 chief ray incidence angle θ 1 be identical angle.That is,
1st prism 91 is formed as：1st face D1 and the angulation θ 2 and illuminating bundle EL1 of polarizing coating 93 chief ray incidence angle θ 1
For identical angle.
In addition, in figure 6, although (to be thrown by the indirect illumination light beam EL1 of polarizing coating 93 and by the reflected light from light shield M
Shadow light beam EL2) constitute polarising beam splitter PBS transmitted through the mode of polarizing coating 93, but it is also possible to make illuminating bundle EL1 and projection
Reflections of the light beam EL2 relative to polarizing coating 93 and transmissison characteristic are opposite.That is, illuminating bundle EL1 can also be made transmitted through polarizing coating
93, the reflected light (projected light beam EL2) from light shield M is reflected by polarizing coating 93.Remained for this embodiment aftermentioned.
As shown in figure 8, polarizing coating 93 is using the direction that links the 1st prism 91 and the 2nd prism 92 as film thickness direction.Polarizing coating
93 have the 2nd film body H2, the 1st film body H1 and the 2nd film body H2 of the 1st film body H1 of silica and hafnium oxide in film thickness direction layer
It is folded.Specifically, polarizing coating 93 is the layer body H that will be made up of the 1st film body H1 and the 2nd film body H2 on film thickness direction periodicity stratum
Folded multiple cycle layer.Here, it is in the incidence angle θ 1 of the chief ray for the illuminating bundle EL1 for being incident to polarizing coating 93
In the case of 54.6 ° of Brewster angle θ B, polarizing coating 93 is formed as layer body H being laminated for 18 the week more than cycle below 30 cycles
Phase layer.Layer body H is comprising the wavelength X relative to illuminating bundle EL1 is the 1st film body H1 of the thickness of the wavelength of λ/4 and clips the 1st film
Body H1 and located at a pair of the 2nd films of the both sides of film thickness direction and wavelength X relative to illuminating bundle EL1 for the thickness of the wavelength of λ/8
Body H2 and constitute.The layer body H so constituted is multiple in film thickness direction stacking, thus layer body H each 2nd film body H2 and adjacent layer
Body H each 2nd film body H2 is integral, forms the 2nd film body H2 of the thickness of the wavelength of λ/4.Therefore, polarizing coating 93 is：Film thickness direction
Both sides film body for the thickness of the wavelength of λ/8 a pair of the 2nd film body H2, the wavelength of λ/8 thickness a pair of the 2nd film body H2 it
Between, alternately provided with λ/4 wavelength thickness the wavelength of the 1st film body H1 and λ/4 thickness the 2nd film body H2.
In addition, polarizing coating 93 is by adhesive or optical cement, it is fixed between the 1st prism 91 and the 2nd prism 92.For example,
Polarising beam splitter PBS is to be formed on the 1st prism 91 after polarizing coating 93, and the 2nd prism 92 is engaged in into polarization via adhesive
Formed by film 93.
Next, reference picture 10, is illustrated to above-mentioned polarising beam splitter PBS transmissison characteristic and reflection characteristic.
In Figure 10, the incidence angle θ 1 that will be incident to the illuminating bundle EL1 of polarising beam splitter PBS polarizing coating 93 chief ray is set to
54.6 ° of Brewster angle θ B, polarizing coating 93 is 21 cycles layer, and illuminating bundle EL1 uses the YAG laser of 3 (3 times) subharmonic.
In curve map shown in Figure 10, its transverse axis is incidence angle θ 1, and its longitudinal axis is transmissivity and reflectivity.In the curve map shown in Figure 10
In, Rs is the reflected beams for the S-polarization light for being incident to polarizing coating 93, and Rp is the reflected light for the P polarization light for being incident to polarizing coating 93
Beam, Ts is the transmitted light beam for the S-polarization light for being incident to polarizing coating 93, and Tp is the transmitted light for the P polarization light for being incident to polarizing coating 93
Beam.
Here, polarising beam splitter PBS polarizing coating 93 is due to being to make the reflected beams (illuminating bundle) of S-polarization light anti-
The composition that the transmitted light beam (projected light beam) of P polarization light is transmitted is penetrated, made, therefore is the reflected beams Rs reflectivity height, transmitted light
The excellent polarizing coating 93 of the high membrane property of beam Tp transmissivity.In other words, be the reflected beams Rp reflectivity is low, transmitted light beam Ts
The low excellent polarizing coating of membrane property of transmissivity.In Fig. 10, the transmissivity of polarizing coating 93 that uses can be best suitable for and anti-
Penetrating the scope of rate is, the reflectivity and transmitted light beam Tp relative to the reflected beams Rs of the Brewster angle θ B at 54.6 ° it is saturating
Penetrate rate, it is allowed to transmissivity and the scope of reflectivity reduction -5%.That is, due to the transmissivity in Brewster angle θ B and
Reflectivity is 100%, therefore the reflected beams Rs reflectivity and transmitted light beam Tp transmissivity are energy for more than 95% scope
The transmissivity and the scope of reflectivity of enough polarizing coatings 93 for being best suitable for using.Under as in the case illustrated in figure 10, the reflected beams Rs
Reflectivity and transmitted light beam Tp transmissivity in more than 95% scope, the scope of incidence angle θ 1 be more than 46.8 ° and
61.4 below °.
As known from the above, in Fig. 10, due to the illuminating bundle in the polarizing coating 93 by polarising beam splitter PBS is incident to
, can be by illuminating bundle EL1 key light in the case that the incidence angle θ 1 of EL1 chief ray is set to 54.6 ° of Brewster angle θ B
The scope of the incidence angle of light beyond line is set to more than 46.8 ° and less than 61.4 °, therefore, it is possible to make the photograph of injection polarizing coating 93
The angular range of Mingguang City beam EL1 incidence angle is 14.6 ° of scope.
Therefore, exposure device U3 illumination optics ILM can be so as to be incident to polarising beam splitter PBS polarizing coating
The angular range of 93 illuminating bundle EL1 incidence angle θ 1 is more than 46.8 ° and less than 61.4 °, and makes illuminating bundle EL1's
Chief ray projects illuminating bundle EL1 for 54.6 ° of Brewster angle θ B mode.
Next, reference picture 9, to the ratio as the polarising beam splitter PBS relative to the 1st embodiment shown in Fig. 8
Polarising beam splitter PBS compared with example is illustrated.As the polarising beam splitter PBS of comparative example be with the 1st embodiment substantially
Identical is constituted, with the 1st prism 91, the 2nd prism 92 and the polarizing coating 100 between the 1st prism 91 and the 2nd prism 92.
Because the 1st prism 91 and the 2nd prism 92 are identical with the 1st embodiment, therefore omit the description.
It is the illuminating bundle EL1 for being incident to polarizing coating 100 as the polarising beam splitter PBS of comparative example polarizing coating 100
Chief ray for 45 ° of incidence angle θ 1 film.Specifically, it is in the chief ray for being incident to the illuminating bundle EL1 of polarizing coating 100
In the case of 45 ° of incidence angle θ 1, polarizing coating 100 is will to be laminated 31 weeks in film thickness direction with the 1st embodiment identical layer body H
Cycle the layer more than phase and below 40 cycles.
Next, reference picture 11, says to the polarising beam splitter PBS of comparative example transmissison characteristic and reflection characteristic
It is bright.In fig. 11, the incidence angle θ 1 of the illuminating bundle EL1 of polarising beam splitter PBS polarizing coating 100 chief ray will be incident to
45 ° of incidence angle is set to, polarizing coating 100 is 33 cycles layer, and illuminating bundle EL1 uses the YAG laser of 3 (3 times) subharmonic.Figure 11
In shown curve map, in the same manner as Figure 10, its transverse axis is incidence angle, and its longitudinal axis is transmissivity and reflectivity, and Rs is to be incident to
The reflected beams of the S-polarization light of polarizing coating 100, Rp is the reflected beams for the P polarization light for being incident to polarizing coating 100, and Ts is incidence
To the transmitted light beam of the S-polarization light of polarizing coating 100, Tp is the transmitted light beam for the P polarization light for being incident to polarizing coating 100.
In fig. 11, the transmissivity of polarizing coating 100 and the scope of reflectivity that can be best suitable for using be, the reflected beams Rs
Reflectivity and transmitted light beam Tp transmissivity be more than 95% scope.In the case of shown in Figure 11, the reflected beams Rs's
Reflectivity and transmitted light beam Tp transmissivity is in more than 95% scope, the scope of incidence angle θ 1 are more than 41.9 ° and 48.7 °
Below.
As known from the above, in fig. 11, due to the illumination light in the polarizing coating 100 by polarising beam splitter PBS is incident to
The incidence angle θ 1 of beam EL1 chief ray is set in the case of 45 °, can be by the light beyond illuminating bundle EL1 chief ray
The angular range of incidence angle θ 1 is set to more than 41.9 ° and less than 48.7 °, therefore, it is possible to make the illuminating bundle of injection polarizing coating 100
The angular range of EL1 incidence angle θ 1 is 6.8 ° of scope.Therefore, shown in the polarising beam splitter PBS shown in Fig. 8 and Fig. 9
Polarising beam splitter PBS is compared, and can expand the angular range of illuminating bundle EL1 incidence angle θ 1 and be about two times larger.
＜ device making methods ＞
Next, reference picture 12, is illustrated to device making method.Figure 12 is the device system for representing the 1st embodiment
Make the flow chart of method.
In the device making method shown in Figure 12, first, the display of the self-emission device such as based on organic EL is carried out
The function and performance design of panel, necessary circuit pattern and/or wiring pattern (step S201) are designed by CAD etc..Connect down
Come, based on the pattern of each layer in the various layers by designs such as CAD, come the light shield M (steps of the layer amount needed for making
S202).In addition, preparing to be wound with the flexible substrate P (resin film, metal foil film, plastics etc.) as the base material of display panel
Supply with volume FR1 (step S203).In addition, the substrate P of the web-like prepared in step S203 can be as needed, it is right
It is substrate that its surface is modified, the substrate for being previously formed basalis (such as the minute asperities based on impressing mode), pre-
First it is laminated with the functional membrane of photoinduction or the substrate of hyaline membrane (insulating materials).
Then, the electrode and/or wiring, dielectric film, TFT (films half by constituting display panel device are formed in substrate P
Conductor) etc. composition backsheet layer, and form in the way of being laminated in the backboard luminous based on self-emission devices such as organic EL
Layer (display pixel portion) (step S204).In step S204, also illustrate comprising use in each embodiment before
The conventional photo-mask process that exposure device U3 is exposed to photoresist layer, but also include the processing based on following process：
The substrate P that photonasty silane coupling material is coated with to replacement photoresist carries out pattern exposure and forms hydrophilic on surface
The exposure process of property and hydrophobic pattern；Pattern exposure is carried out to the catalyst layer of photoinduction and passes through non-electrolytic plating method
Form the wet type operation of the pattern (wiring, electrode etc.) of metal film；Or utilize conductive ink containing Nano silver grain etc.
Printing process of depicting pattern etc..
Next, being cut by each display panel device being continuously manufactured by by volume mode in the substrate P of strip
Substrate P, stickup protective film (environment reply barrier layer) and/or colored filter etc. on the surface of each display panel device,
So as to assembly device (step S205).Then, carry out inspection operation, check display panel device whether normally function,
Whether desired performance and characteristic (step S206) are met.By described above, display panel (Flexible Displays can be manufactured
Device).
More than, in the 1st embodiment, using the lamp optical system IL for falling to penetrate illumination for having polarising beam splitter PBS
In, by polarising beam splitter PBS illuminating bundle EL1 and make projected light beam EL2 transmit in the case of, in illumination optical system
The IL and projection optical system PL that unites has a polarising beam splitter PBS, and by illumination optics ILM at least close to polarization
The profile of beam splitter PBS lens element is set as the shape corresponding with illuminating bundle EL1 distribution, thus, it is possible to shine
Bright optical module ILM and polarising beam splitter PBS are located between light shield M and Projection optics PLM.Therefore, it is possible to relax photograph
Bright optical system IL and projection optical system PL physical interference, enables in particular to adaptation lighting optical module ILM and projection optics
Component PLM physical interference condition, improves the free degree, the projection of illumination optics ILM and polarising beam splitter PBS configuration
The free degree of optical module PLM and polarising beam splitter PBS configuration, so as to easily configure lamp optical system IL and
Projection optical system PL.
In addition, in the 1st embodiment, the relayings of the 4th relay lens 56d adjacent with polarising beam splitter PBS and/or the 3rd
Lens 56c turn into comprising substantial illuminating bundle EL1 by part (incident area S2) and without substantial illuminating bundle
The lens-shape for the part (non-incident area S1) that EL1 does not pass through, even if therefore be small-sized illumination optics ILM, it is also several
Illuminating bundle EL1 will not be made to produce loss, illumination region IR lighting condition (telecentricity, illumination can be accurately maintained
Uniformity etc.), and the free degree of illumination optics ILM and Projection optics PLM configuration can be improved.
In addition, in the 1st embodiment, although make the lens that illumination optics ILM included a part of defect and
Reduce profile, but it is also possible to make a part of defect for the lens that Projection optics PLM included and reduce profile.This feelings
Condition also in the same manner as illumination optics ILM, can make the lens close to polarising beam splitter PBS sides, such as the 1st lens group
A part of defect of 71 lens positioned at the side of the 1st deflection component 70 and reduce profile.
In addition, in the 1st embodiment, can be by the 2nd film body H2 of the 1st film body H1 of silica and hafnium oxide in thickness
Direction is laminated and formed polarising beam splitter PBS polarizing coating 93.Therefore, polarizing coating 93 can make the S for being incident to polarizing coating 93
The reflectivity of the reflected beams (illuminating bundle) of polarised light and be incident to polarizing coating 93 P polarization light transmitted light beam (projected light
Beam) transmissivity it is higher.Thus, the higher illuminating bundle EL1 of the energy density of the wavelength below as i lines is incident to
In the case of polarizing coating 93, polarising beam splitter PBS can also suppress to be applied to the load of polarizing coating 93, and can be by reflected light
Beam is properly separated with transmitted light beam.
In addition, in the 1st embodiment, polarizing coating 93 can be formed as being incident to the illuminating bundle EL1's of polarizing coating 93
The incidence angle θ 1 of chief ray is 54.6 ° of Brewster angle θ B film.In other words, the illumination light by polarizing coating 93 is incident to is passed through
Beam EL1 chief ray is set to 54.6 ° of Brewster angle θ B, can will be incident to the illuminating bundle EL1 of polarizing coating 93 incidence
Angle θ 1 angular range is set to more than 46.8 ° and less than 61.4 °.Therefore, it is possible to make the illuminating bundle EL1 for being incident to polarizing coating 93
Incidence angle θ 1 angular range expand.Thereby, it is possible to the extensive magnitude phase with the angular range of illuminating bundle EL1 incidence angle θ 1
The numerical aperture NA for the lens answered ground increase adjacent with polarising beam splitter PBS and set.Therefore, by the way that numerical aperture can be used
Lens larger footpath NA, so as to improve exposure device U3 resolution ratio, can expose fine light shield figure relative to substrate P
Case.
Further, since constituting irregular, the polarizing coating in the 1st embodiment of the refractive index of the material (film body) of polarizing coating 93
93 Brewster angle θ B can take 52.4 °~57.3 ° of scope, as long as therefore consider the scope, setting is incident to polarizing coating
The angular range of 93 illuminating bundle EL1 incidence angle θ 1.
In addition, in the 1st embodiment, polarising beam splitter PBS the 1st face D1 and the 3rd face D3 can be made not parallel, the 2nd
Face D2 is parallel with the 4th face D4.In addition, in the 1st embodiment, the 1st face D1 can be made with the angulation θ 2 of polarizing coating 93, with entering
The incidence angle θ 1 for being incident upon the illuminating bundle EL1 of polarizing coating 93 chief ray is identical.Therefore, it is possible to relative to being incident to the 1st face D1
Illuminating bundle EL1 chief ray make the 1st face D1 be vertical plane, in addition, can be relative to the projected light beam for being incident to the 2nd face D2
EL2 chief ray makes the 2nd face D2 be vertical plane.Thus, polarising beam splitter PBS can suppress the illuminating bundle in the 1st face D1
EL1 reflection, and the reflection of the projected light beam EL2 in the 2nd face D2 can be suppressed.
In addition, in the 1st embodiment, it is multiple by the way that defined layer body H is periodically laminated in film thickness direction, and can
Form the polarizing coating 93 as cycle layer.At this moment, the incidence angle θ of chief ray enumerated as an example, illuminating bundle EL1
1 is 54.6 ° of Brewster angle θ B polarizing coating 93 (Fig. 8) and the incidence angle θ 1 of illuminating bundle EL1 chief ray is 45 ° inclined
The beam splitter PBS polarizing coating 100 (Fig. 9) of shaking is compared, and can reduce cycle layer.Therefore, Fig. 8 polarizing coating 93 and Fig. 9's is inclined
Vibrating diaphragm 100 is compared, and can correspondingly be made construction simple with the amount of cycle layer reduction and be reduced polarising beam splitter PBS system
Cause this.
In addition, in the 1st embodiment, polarizing coating 93 can be suitably secured into the 1st rib by adhesive or optical cement
Between the prism 92 of mirror 91 and the 2nd.In addition, in the 1st embodiment, can also be by adhesive or optical cement, by polarised light point
Beam device PBS is integrally fixed with quarter wave plate 41.In this case, polarising beam splitter PBS and quarter wave plate 41 can be suppressed
The generation of relative offset.
In addition, in the 1st embodiment, the wavelength below i lines can be used as illuminating bundle EL1, for example, due to can
Using higher hamonic wave laser or PRK, therefore, it is possible to use the illuminating bundle EL1 suitable for exposure-processed.
In addition, in the 1st embodiment, the polarization direction of quarter wave plate 41 is adjusted by using polarization adjustment mechanism 68, can
View field PA illumination is adjusted, multiple view field PA1~PA6 uniform-illumination is thus enabled that.
[the 2nd embodiment]
Next, reference picture 13, is illustrated to the exposure device U3 of the 2nd embodiment.In addition, to avoid the note repeated
Carry, only a pair part different from the 1st embodiment is illustrated, for the 1st embodiment identical inscape, mark and
1st embodiment identical reference is illustrated.Figure 13 is exposure device (the processing substrate dress for representing the 2nd embodiment
Put) the figure being monolithically fabricated.The exposure device U3 of 1st embodiment is that be held in the light shield M of cylindric reflection-type can
The composition of the light shield holding cylinder 21 of rotation, but the exposure device U3 of the 2nd embodiment is to protect flat reflection-type light shield MA
It is held in the composition for the light shield maintaining body 11 that can be moved.
In the exposure device U3 of the 2nd embodiment, light shield maintaining body 11 possesses the light for the light shield MA for keeping plane
Cover microscope carrier 110 and make mask stage 110 scan mobile mobile device in X direction in the face orthogonal with median plane CL (to omit
Diagram).
Because Figure 13 light shield MA light shield face P1 is plane substantially parallel with XY faces, therefore reflected from light shield MA
Projected light beam EL2 chief ray is vertical with XY faces.Therefore, each illumination region IR1~IR6 on to light shield MA is illuminated
Lamp optical system IL1~IL6 illuminating bundle EL1 chief ray be also configured as it is vertical relative to XY faces.
In the case where the projected light beam EL2 reflected by light shield MA chief ray is vertical with XY faces, with projected light beam EL2's
Correspondingly, dividing configuring area E the 1st line L1 and the 2nd line L2 can also change chief ray.That is, the 2nd line L2 is from light shield
MA starts the direction vertical with XY faces with the intersection point that projected light beam EL2 chief ray intersects, and the 1st line L1 is from light shield MA and projection
The intersecting intersection point of light beam EL2 chief ray starts the direction parallel with XY faces.Therefore, illumination optics ILM configuration with
Configuring area E change and suitably change, with the change of illumination optics ILM configuration, polarising beam splitter PBS's matches somebody with somebody
Putting also can suitably change.
In addition, in the case where the projected light beam EL2 reflected from light shield MA chief ray is vertical with XY faces, projection optics group
1st reflecting surface P3 of the 1st deflection component 70 that part PLM the 1st optical system 61 is included is that reflection comes from polarising beam splitter
PBS projected light beam EL2 and make the projected light beam EL2 of reflection from the 1st lens group 71 by and be incident to the 1st concave mirror 72
Angle.Specifically, the 1st reflecting surface P3 of the 1st deflection component 70 is set as substantially relative to the 2nd optical axis BX2 (XY faces)
45°。
In addition, in the 2nd embodiment, also in the same manner as Fig. 2 before, when being observed in XZ faces, from light shield MA
Illumination region IR1 (and IR3, IR5) central point to illumination region IR2 (and IR4, IR6) central point girth, with from along
The central point of view field PA1 (and PA3, PA5) in bearing-surface P2 substrate P is to the 2nd view field PA2 (and PA4, PA6)
Central point girth, be set to be substantially equal.
In Figure 13 exposure device U3, slave control device 16 also controls the mobile device of light shield maintaining body 11 (to sweep
Retouch the linear motor of exposure or the actuator of fine motion etc.), the rotation with substrate supporting cylinder 25 synchronously drives mask stage
110.In Figure 13 exposure device U3, it is scanned by light shield MA to the synchronizing moving of +X direction after exposure, it is necessary to make
Light shield MA returns to the action (rollback) of the initial position of -X direction.Therefore, the continuously rotation of substrate supporting cylinder 25 is made with certain speed
Then in the case of persistently transporting substrate P with constant speed, during light shield MA rollback action, not to carrying out pattern exposure in substrate P
Light, and discretely (discretely) form panel pattern in the conveyance direction of substrate P.But, in practicality, during due to scan exposure
The speed (being peripheral speed here) of substrate P and light shield MA speed be assumed to be 50mm/s~100mm/s, therefore in light shield MA
Rollback when, as long as driving mask stage 110 with such as 500mm/s maximum speed, it becomes possible to which diminution is formed in substrate P
Between panel pattern on white more than conveyance direction.
[the 3rd embodiment]
Next, reference picture 14, is illustrated to the exposure device U3 of the 3rd embodiment.In addition, to avoid the note repeated
Carry, only a pair part different from the 1st embodiment (or the 2nd embodiment) is illustrated, for the 1st embodiment the (or the 2nd
Embodiment) identical inscape, mark and said with the 1st embodiment (or the 2nd embodiment) identical reference
It is bright.Figure 14 is the figure of the composition for the exposure device (substrate board treatment) for representing the 3rd embodiment.Figure 14 exposure device U3 with
Each embodiment before is similarly scanning-exposure apparatus, the cylinder light shield M's of the scanning-exposure apparatus reflexive emitting in future
Reflected light (projected light beam EL2) projection makes the circle of cylinder light shield M rotation to on the flexible substrate P of plane conveyance
The conveyance speed sync of circular velocity and substrate P.
The exposure device U3 of 3rd embodiment is to make illuminating bundle EL1 and the projected light beam in polarising beam splitter PBS
EL2 reflection and transmissison characteristic for the exposure device of opposite situation an example.In fig. 14, along illumination optics
In the relay lens 56 of ILM optical axis BX1 configurations, the relay lens 56 at least closest to polarising beam splitter PBS is by being made
The shape for the part (non-incident area S1) that illuminating bundle EL1 does not pass through is eliminated, to avoid the space with Projection optics PLM
Interference.In addition, illumination optics ILM optical axis BX1 extended line intersects with the 1st axle AX1 (being used as the line of pivot).
Polarising beam splitter PBS is configured to the 2nd face D2 parallel to each other and the 4th face D4 and illumination optics ILM light
Vertically, and it is vertical with Projection optics PLM optical axis BX4 (the 4th optical axis) to be configured to the 1st face D1 by axle BX1 (the 1st optical axis).Light
Intersecting angles of the axle BX1 with optical axis BX4 in XZ faces is identical with the condition of Fig. 6 before polarizing coating 93, but here in order that
Projected light beam EL2 is set as the angle beyond 90 ° with (52.4 °~57.3 °) reflections of Brewster angle θ B.
The polarizing coating 93 (wavefront division face) of polarising beam splitter PBS in present embodiment can be by the of silica
2nd film body of 1 film body and hafnium oxide is laminated multiple and formed in film thickness direction.Therefore, polarizing coating 93 can make to be incident to polarization
The reflectivity of the S-polarization light of film 93 and be incident to polarizing coating 93 P polarization light transmissivity it is higher.Thus, below i lines
Wavelength the higher illuminating bundle EL1 of energy density be incident to polarizing coating 93 in the case of, polarising beam splitter PBS also can
Suppression is applied to the load of polarizing coating 93, and can be properly separated the reflected beams with transmitted light beam.Turn into polarizing coating 93
1st film body H1 of silica and the 2nd film body H2 of hafnium oxide lit-par-lit structure, the 1st embodiment party before being equally applicable
Polarising beam splitter PBS used in formula or the 2nd embodiment.
In the case of 3rd embodiment, the illuminating bundle of P polarization light is injected from polarising beam splitter PBS the 4th face D4
EL1.Therefore, illuminating bundle EL1 transmitted through polarizing coating 93 from the 2nd face D2 project, and from quarter wave plate 41 by and be converted into circle
Polarised light, is irradiated in the illumination region IR on light shield M light shield face P1.With light shield M rotation, show out of illumination region IR
The projected light beam EL2 (circularly polarized light) that existing mask pattern produces (reflection) is converted into S-polarization light by quarter wave plate 41, enters
It is incident upon polarising beam splitter PBS the 2nd face D2.Projected light beam EL2 as S-polarization light is reflected by polarizing coating 93, and from polarization
Beam splitter PBS the 1st face D1 is projected towards Projection optics PLM.
In the present embodiment, the master passed through in projected light beam EL2 from the center (point Q1) of the illumination region IR on light shield M
Light Ls, in the optical axis BX4 eccentric positions from Projection optics PLM, is incident to the initial saturating of Projection optics PLM
Mirror system G1.In the case of projected light beam EL2 diffusion (numerical aperture NA) is less, eliminated by being made in lens combination G1
The shape for the part that projected light beam EL2 does not pass through substantially, when making polarising beam splitter PBS close to cylinder light shield M, can keep away
Exempt from a Projection optics PLM part (lens combination G1) and a cylinder light shield M and/or illumination optics ILM part
(lens 56) produce space interference.
In fig. 14, Projection optics PLM as by lens combination G1 and lens combination G2 along optical axis BX4 configure it is complete
The projection optical system of dioptric system is illustrated, but is not limited to this system or by concave surface, convex surface or plane
The projection optical system of speculum and the reflection-refraction type of lens combination.Alternatively, it is also possible to make lens combination G1 be full folding
Penetrate system, make lens combination G2 be catadioptric systems, by the picture of the pattern in the illumination region IR on the P1 of light shield face be imaged to
Multiplying power during view field PA in substrate P such as can also be at any one expanded or shunk beyond multiplying power (× 1).
In fig. 14, be the substrate supporting part PH using supporting substrates P as flat surface, and in the surface and substrate
The composition of several μm or so of air bearing layer (gas bearing) is formed between the P back side, at least includes view field in substrate P
In PA prescribed limit, assigning certain tension force to substrate P using clipping driven roller etc. provided with one side makes its flat, on one side
By the transport mechanism of substrate P (X-direction) conveyance along its length.Certainly, roll up in the present embodiment or by substrate P
A part for cylinder as substrate supporting cylinder 25 shown in Fig. 2 before being coiled into and the composition that transports.
In addition, by by such as Figure 14 illumination optics ILM, polarising beam splitter PBS, quarter wave plate 41, projection optics group
The exposing unit that part PLM is constituted sets multiple in light shield M Pivot axle (the 1st axle) AX1 direction and turns into multiplex
In the case of, if the 1st axle AX1 comprising the rotation centerline as light shield M, and it is symmetrical to clip the median plane CL parallel with ZY faces
Ground configures exposing unit.
In the 3rd embodiment more than, by using the film body for possessing film body and silica based on hafnium oxide
The polarising beam splitter PBS of the polarizing coating (multilayer film) 93 of lit-par-lit structure, even in the high brightness using ultraviolet wavelength region
In the case that laser is used as illuminating bundle EL1, it also can stably continue high-resolution pattern exposure.Possesses this polarizing coating
93 polarising beam splitter PBS also can be utilized similarly in the 1st embodiment before, the 2nd embodiment.
[the 4th embodiment]
Next, reference picture 15, is illustrated to the exposure device U3 of the 4th embodiment.In addition, to avoid the note repeated
Carry, only a pair part different from the 1st embodiment (from the 1st embodiment to the 3rd embodiment) is illustrated, for the 1st
Embodiment (from the 1st embodiment to the 3rd embodiment) identical inscape, mark is (real from the 1st with the 1st embodiment
Mode is applied to the 3rd embodiment) identical reference illustrates.Figure 15 is the exposure device (base for representing the 4th embodiment
Plate processing unit) the figure being monolithically fabricated.The exposure device U3 of 1st embodiment is to protect the light shield M of cylindric reflection-type
The composition for the light shield holding cylinder 21 that can be rotated is held in, but the exposure device U3 of the 4th embodiment is by flat reflection-type
Light shield MA is held in the composition for the light shield maintaining body 11 that can be moved.
In the exposure device U3 of the 4th embodiment, light shield maintaining body 11 possesses the light for the light shield MA for keeping plane
Cover microscope carrier 110, make mask stage 110 scan mobile mobile device in X direction in the face orthogonal with median plane CL (to save sketch map
Show).
Because Figure 15 light shield MA light shield face P1 is plane substantially parallel with XY faces, therefore reflected from light shield MA
Projected light beam EL2 chief ray is vertical with XY faces.Therefore, each illumination region IR1~IR6 on to light shield MA is illuminated
Lamp optical system IL1~IL6 illuminating bundle EL1 chief ray be also configured as it is vertical relative to XY faces.
Illuminating in the case that light shield MA illuminating bundle EL1 chief ray is vertical with XY faces, polarising beam splitter PBS
It is configured to：Be incident to the illuminating bundle EL1 of polarizing coating 93 chief ray incidence angle θ 1 for Brewster angle θ B (52.4 °~
57.3 °), the illuminating bundle EL1 reflected by polarizing coating 93 chief ray is vertical with XY faces.With polarising beam splitter PBS's
The change of configuration, illumination optics ILM configuration also suitably changes.
In addition, in the case where the projected light beam EL2 reflected from light shield MA chief ray is vertical with XY faces, projection optics group
1st reflecting surface P3 of the 1st deflection component 70 that part PLM the 1st optical system 61 is included, which turns into, to be made to come from polarising beam splitter
PBS projected light beam EL2 reflect and make the projected light beam EL2 of reflection from the 1st lens group 71 by and be incident to the 1st concave mirror 72
Angle.Specifically, the 1st reflecting surface P3 of the 1st deflection component 70 is set as substantially relative to the 2nd optical axis BX2 (XY faces)
45°。
In addition, in the 4th embodiment, also in the same manner as Fig. 2 before, when being observed in XZ faces, from light shield MA
Illumination region IR1 (and IR3, IR5) central point to illumination region IR2 (and IR4, IR6) central point girth, with from along
The central point of view field PA1 (and PA3, PA5) in bearing-surface P2 substrate P is into view field PA2 (and PA4, PA6)
The girth of heart point, is set to be substantially equal.
In Figure 15 exposure device U3, slave control device 16 also controls the mobile device of light shield maintaining body 11 (to sweep
Retouch the linear motor of exposure or the actuator of fine motion etc.), the rotation with substrate supporting cylinder 25 synchronously drives mask stage
110.In Figure 15 exposure device U3, it is scanned by light shield MA to the synchronizing moving of +X direction after exposure, it is necessary to make
Light shield MA returns to the action (rollback) of the initial position of -X direction.Therefore, the continuously rotation of substrate supporting cylinder 25 is made with certain speed
Then in the case of persistently transporting substrate P with constant speed, during light shield MA rollback action, not to carrying out pattern exposure in substrate P
Light, and discretely (discretely) form panel pattern in the conveyance direction of substrate P.But, in practicality, during due to scan exposure
The speed (being peripheral speed here) of substrate P and light shield MA speed be assumed to be 50mm/s~100mm/s, therefore in light shield MA
Rollback when, as long as driving mask stage 110 with such as 500mm/s maximum speed, it becomes possible to which diminution is formed in substrate P
Between panel pattern on white more than conveyance direction.
[the 5th embodiment]
Next, reference picture 16, is illustrated to the exposure device U3 of the 5th embodiment.In addition, to avoid the note repeated
Carry, only a pair part different from the 1st embodiment (from the 1st embodiment to the 4th embodiment) is illustrated, for the 1st
Embodiment (from the 1st embodiment to the 4th embodiment) identical inscape, mark is (real from the 1st with the 1st embodiment
Mode is applied to the 4th embodiment) identical reference illustrates.Figure 16 is the exposure device (base for representing the 5th embodiment
Plate processing unit) composition figure.The exposure device U3 of 5th embodiment is to make the illuminating bundle in polarising beam splitter PBS
Reflections and transmissison characteristic of the EL1 with projected light beam EL2 are an example of the exposure device of opposite situation.In figure 16, edge
In the relay lens 56 of illumination optics ILM optical axis BX1 configurations, the relaying at least closest to polarising beam splitter PBS is saturating
Mirror 56 is by cutting off the part that illuminating bundle EL1 does not pass through, to avoid the interference with Projection optics PLM space.In addition,
Illumination optics ILM optical axis BX1 extended line intersects with the 1st axle AX1 (being used as the line of pivot).
Polarising beam splitter PBS is configured to the 2nd face D2 parallel to each other and the 4th face D4 and illumination optics ILM light
Vertically, and it is vertical with Projection optics PLM optical axis BX4 (the 4th optical axis) to be configured to the 1st face D1 by axle BX1 (the 1st optical axis).Light
Intersecting angles of the axle BX1 with optical axis BX4 in XZ faces is identical with the condition of Fig. 6 before polarizing coating 93, but here in order that
Projected light beam EL2 is set as the angle beyond 90 ° with (52.4 °~57.3 °) reflections of Brewster angle θ B.
In this case, the illuminating bundle of P polarization light is injected from polarising beam splitter PBS the 4th face D4
EL1.Therefore, illuminating bundle EL1 transmitted through polarizing coating 93 from the 2nd face D2 project, and from quarter wave plate 41 by and be converted into circle
Polarised light, is irradiated in the illumination region IR on light shield M light shield face P1.With light shield M rotation, show out of illumination region IR
The projected light beam EL2 (circularly polarized light) that existing mask pattern produces (reflection) is converted into S-polarization light by quarter wave plate 41, enters
It is incident upon polarising beam splitter PBS the 2nd face D2.Projected light beam EL2 as S-polarization light is reflected by polarizing coating 93, and from polarization
Beam splitter PBS the 1st face D1 is projected towards Projection optics PLM.
In the present embodiment, in projected light beam EL2 from illumination region IR on light shield M centrally through chief ray
Ls, in the optical axis BX4 eccentric positions from Projection optics PLM, is incident to Projection optics PLM initial lens system
Unite G1.In the case of projected light beam EL2 diffusion (numerical aperture NA) is less, by cutting off projected light beam in lens combination G1
The part that EL2 does not pass through, can avoid the interference with the space of Projection optics PLM lens 56.
In figure 16, Projection optics PLM is to be configured as by lens combination G1 and lens combination G2 along optical axis BX4
What the projection optical system of total refraction system was illustrated, but it is not limited to this system or by concave surface, convex surface or flat
The projection optical system of the speculum in face and the reflection-refraction type of lens combination.Alternatively, it is also possible to make lens combination G1 be
Total refraction system, make lens combination G2 be catadioptric systems, by the picture of the pattern in the illumination region IR on the P1 of light shield face into
As that any one expanded or shunk beyond multiplying power (× 1) such as can also be to multiplying power during view field PA in substrate P.
In figure 16, be the substrate supporting part PH using supporting substrates P as flat surface, and in the surface and substrate
The composition of several μm or so of air bearing layer (gas bearing) is formed between the P back side, at least includes view field in substrate P
In PA prescribed limit, assigning certain tension force to substrate P provided with one side makes its flat, while by substrate P (X along its length
Direction) conveyance transport mechanism.Certainly, in the present embodiment or shown in Fig. 2 before substrate P is wound into
A part for cylinder as substrate supporting cylinder 25 and the composition that transports.
In addition, by by such as Figure 16 illumination optics ILM, polarising beam splitter PBS, quarter wave plate 41, projection optics group
The exposing unit that part PLM is constituted sets multiple in light shield M Pivot axle (the 1st axle) AX1 direction and turns into multiplex
In the case of, if the 1st axle AX1 comprising the rotation centerline as light shield M, and it is symmetrical to clip the median plane CL parallel with ZY faces
Ground configures exposing unit.
It is also by using possessing the film body based on hafnium oxide in the exposure device U3 such as the 5th embodiment more than
With the polarising beam splitter PBS of the polarizing coating (multilayer film) 93 of the lit-par-lit structure of the film body of silica, even in using ultraviolet
In the case that the laser of the high brightness of wavelength region is used as illuminating bundle EL1, it also can stably continue high-resolution pattern
Exposure.
More than each embodiment illustrated by exposure device U3 be fixed as putting down using by pre-determined mask pattern
The light shield M of planar or cylindrical shape, but also can similarly utilize the device that projection exposure is carried out to variable mask pattern, example
Such as, the beam splitter without light shield exposure device disclosed in Japanese Patent No. 4223036.
This without light shield exposure device be by receive by beam splitter reflection exposure illumination light programmable speculum battle array
Row, the light beam (the reflected beams) with forming pattern by the reflection mirror array, (are also wrapped sometimes via beam splitter and optical projection system
Containing microlens array) and project to the composition on substrate.As this beam splitter without light shield exposure device, if before use
Fig. 8 shown in polarising beam splitter PBS, even if being then used as illumination light using the laser of the high brightness of ultraviolet wavelength region,
Also high-resolution pattern exposure can stably be continued.
The polarising beam splitter PBS used in each embodiment before, as polarizing coating 93, be by principal component be two
Silica (SiO2) film body and principal component be hafnium oxide (HfO2) the composition that is laminated repeatedly in film thickness direction of film body, but
Can also be other materials.For example, can also utilize and quartz or silica (SiO2) similarly relative to wavelength 355nm
Neighbouring ultraviolet is low-refraction, is the magnesium fluoride (MgF of the high material of patience relative to Ultra-Violet Laser2).In addition, also can
Using with hafnium oxide (HfO2) it is similarly high index of refraction, relative to Ultra-Violet Laser relative to the ultraviolet near wavelength 355nm
For the zirconium oxide (ZrO of the high material of patience2).Therefore, based on following Figure 17 to Figure 22, to changing the combination of these materials and
Result after the simulated behavior of obtained polarizing coating 93 is illustrated.
Figure 17 is schematically shown using hafnium oxide (HfO2) film body as the material of high index of refraction, use magnesium fluoride
(MgF2) film body as low-refraction material in the case of polarizing coating 93 composition section.If making the folding of hafnium oxide
The rate nh of penetrating is that the refractive index nL of 2.07, magnesium fluoride is that the refractive index ns of 1.40, prism (quartz glass) is 1.47, then Brewster
Angle θ B according to following formulas,
θ B=arcsin ([(nh2×nL2)/{ns2(nh2+nL2)}]0.5)
About 52.1 °.
Therefore, the film body of thickness 22.8nm hafnium oxide will be laminated with the levels of the film body of thickness 78.6nm magnesium fluoride
Material as the cycle layer, will be laminated with 21 periodic quantities the cycle layer polarizing coating 93 be located at the 1st prism 91 and the 2nd prism 92
Composition surface between.In the polarising beam splitter PBS for possessing polarizing coating 93 as shown in Figure 17, the result of simulation is to obtain
Optical characteristics as Figure 18.If the wavelength for making the illumination light in simulation is 355nm, to the reflectivity Rp of P polarization light
Incidence angle θ 1 for less than 5% (transmissivity Tp is more than 95%) is more than 43.5 °, and the reflectivity Rs to S-polarization light is 95%
The incidence angle θ 1 of (transmissivity Ts is less than 5%) is less than 59.5 ° above.The situation of this example is also, relative to Brewster
Angle θ B (52.1 °), can obtain good polarization separation characteristic in the range of about 15 ° of -8.6 °~+7.4 °.
In addition, Figure 19 is schematically shown using zirconium oxide (ZrO2) film body as the material of high index of refraction, use
Silica (SiO2) film body as low-refraction material in the case of polarizing coating 93 composition section.If making oxygen
The refractive index nh for changing zirconium is that the refractive index nL of 2.12, silica is that the refractive index ns of 1.47, prism (quartz glass) is 1.47,
Then according to above-mentioned formula, Brewster angle θ B are about 55.2 °.
Therefore, the film of thickness 20.2nm zirconium oxide will be laminated with the levels of the film body of thickness 88.2nm silica
The material of body is as cycle layer, and the polarizing coating 93 that will be laminated with the cycle layer of 21 periodic quantities is located at the 1st prism 91 and the 2nd prism
Between 92 composition surface.In the polarising beam splitter PBS for possessing the polarizing coating 93 shown in the Figure 19, the result of simulation is to obtain
Optical characteristics as Figure 20.If the wavelength for making the illumination light in simulation is 355nm, to the reflectivity Rp of P polarization light
Incidence angle θ 1 for less than 5% (transmissivity Tp is more than 95%) is 47.7 °, and the reflectivity Rs to S-polarization light is more than 95%
The incidence angle θ 1 of (transmissivity Ts is less than 5%) is 64.1 °.The situation of this example is also, relative to Brewster angle θ B
(55.2 °), can obtain good polarization separation characteristic in the range of about 16.4 ° of -7.5 °~+8.9 °.
Further, Figure 21 is schematically shown using zirconium oxide (ZrO2) film body as high index of refraction material,
Use magnesium fluoride (MgF2) film body as low-refraction material in the case of polarizing coating 93 composition section.If made
The refractive index nh of zirconium oxide is that the refractive index nL of 2.12, magnesium fluoride is that the refractive index ns of 1.40, prism (quartz glass) is 1.47,
Then according to above-mentioned formula, Brewster angle θ B are about 52.6 °.
Therefore, the film body of thickness 22.1nm zirconium oxide will be laminated with the levels of the film body of thickness 77.3nm magnesium fluoride
Material as the cycle layer, will be laminated with 21 periodic quantities the cycle layer polarizing coating 93 be located at the 1st prism 91 and the 2nd prism 92
Composition surface between.In the polarising beam splitter PBS for possessing the polarizing coating 93 shown in the Figure 21, the result of simulation is to obtain
Optical characteristics as Figure 22.If the wavelength for making the illumination light in simulation is 355nm, it is to the reflectivity Rp of P polarization light
The incidence angle θ 1 of less than 5% (transmissivity Tp is more than 95%) is 43.1 °, (saturating for more than 95% to the reflectivity Rs of S-polarization light
It is less than 5% to penetrate rate Ts) incidence angle θ 1 be 60.7 °.The situation of this example is also, relative to Brewster angle θ B (52.6 °),
Good polarization separation characteristic can be obtained in the range of about 17.6 ° of -9.5 °~+8.1 °.
As in the previous as shown in Figure 4, by light shield M reflection projected light beam EL2 with by etc. multiplying power projection optics system
The extended corner θ na that PL numerical aperture (NA) of uniting is limited, and it is projected on substrate P.Numerical aperture NA is defined with NA=sin (θ na),
The resolution ratio RS of the projection image based on projection optical system PL is determined together with illuminating bundle EL1 wavelength X.In light shield M as schemed
In the case that 15 show flat light shield face P1, illuminating bundle EL1 numerical aperture is also set to and projection optical system PL
Light shield M sides numerical aperture NA it is identical or its below.
For example, be that 355nm, process factor (processFactor) k are 0.5 in the wavelength X for making illuminating bundle EL1, as
Resolution ratio RS and obtain in the case of 3 μm, according to RS=k (λ/NA), light shield side etc. the projection optical system PL of multiplying power
Numerical aperture NA is about 0.06 (3.4 ° of θ na ≈).Although the numerical aperture one of the illuminating bundle EL1 from lamp optical system IL
As for light shield M sides than projection optical system PL numerical aperture NA it is smaller, but it is assumed here that to be equal.
However, as in the previous illustrated by Fig. 5 A like that, in light shield face, P1 is along cylinder formed by radius Rm barrel surface
In the case of light shield M, the circumferencial direction of illuminating bundle EL1 chief ray on cylinder light shield M, with broader angle spread.This
In, if the circumferential exposed width of the illumination region IR on the light shield shown in Fig. 3 is set into De, relative to from Fig. 5 A
The illuminating bundle EL1 chief rays that pass through of point Q1, from the exposed width De illuminating bundle EL1 most passed through by circumferential end
The generally ramped following angle of chief ray
sinφ≈(De/2)/(Rm/2)
Here, if cylinder light shield M radius of curvature R m is set into 150mm, exposed width De is set to 10mm, angle
About 3.8 °.Further, due to the master relative to the illuminating bundle EL1 most passed through by circumferential end from exposed width De
Light, applies the angle, θ na (about 3.4 °) of illuminating bundle EL1 numerical aperture mass runoff amount, thus illuminating bundle EL1 to illumination
Region IR extended corner relative to the chief ray from the point Q1 illuminating bundle EL1 passed through, obtain ±Scope.
That is, it is ± 7.2 ° in above-mentioned numerical example, circumferences of the illuminating bundle EL1 on cylinder light shield face is distributed in 14.4 ° of angle
Scope.
So, although illuminating bundle EL1 is set to being incident to cylinder light shield face P1 than larger angular range, but
Even this angular range, as long as the polarising beam splitter PBS and figure of the embodiment shown in Fig. 8, Figure 10 before
The polarising beam splitter PBS of embodiment shown in 17~22, it becomes possible to which illuminating bundle EL1 is inclined well with projected light beam EL2
Shake separation.
In addition, projecting light shield face P1 pattern amplification into the exposure device in substrate P in projection optical system PL, throw
Numerical aperture NAps of the numerical aperture NAm relative to substrate P side of shadow optical system PL light shield face P1 sides, only increases times magnification
Rate Mp amount.If for example, obtain with illustrate before etc. resolution ratio RS identicals acquired by the projection optical system of multiplying power
Resolution ratio, then enlargement ratio Mp is about 0.12 for the numerical aperture NA of the light shield side in 2 times of projection optical system, corresponding to its
Ground projected light beam EL2 extended corner θ na also increase ± 6.8 ° (amplitude is 14.6 °).However, polarising beam splitter can be passed through
The incident angle range of PBS polarization separations well is, about 14.6 ° in case of fig. 10, in the case of Figure 18 about
16 °, in the case of Figure 20 be about 16.4 °, then in the case of Figure 22 be about 17.6 °, no matter any situation, due to all
Extended corner θ na are covered, therefore, it is possible to amplify projection exposure with good picture quality.
As described above, in the case where making light shield M be cylinder light shield, to cover the illumination region being irradiated on the P1 of light shield face
Modes of the IR illuminating bundle EL1 on circumferential maximum angle scope, selection includes the good Bruce of polarization separation characteristic
The polarising beam splitter PBS of incident angle range including special angle θ B.In addition, the polarising beam splitter illustrated in Figure 17~22
PBS Brewster angle θ B are more than 50 °, such as Fig. 4, as shown in Figure 6, even in making lamp optical system IL optical axis
In the case that BX1 is parallel with projection optical system PL optical axis BX2 (or BX3), it can also make the illumination towards cylinder light shield M
Each direct of travel of light beam EL1 and the projected light beam EL2 that is reflected by light shield face in XZ faces is tilted relative to median plane CL, and energy
Enough ensure good imaging performance.
In addition, in each embodiment more than, the film body or the film body of zirconium oxide of the hafnium oxide of polarizing coating 93 are constituted, though
So higher refractive index nh is presented in the light relative to ultraviolet region (below wavelength 400nm), but as long as refractive index nh and base material
The ratio between the refractive index ns of (prism 91,92) nh/ns is more than 1.3, as high-index material, can also use titanium dioxide
Titanium (TiO2) film body, tantalum pentoxide (Ta2O5) film body.
Description of reference numerals
1 device inspection apparatus
2 substrate feeding devices
4 substrate retracting devices
5 host control devices
11 light shield maintaining bodies
12 base supporting mechanisms
13 light supply apparatuses
16 slave control devices
21 light shield holding cylinder
25 substrate supportings cylinder
31 light sources
32 light guide members
41 quarter wave plates
51 collimation lenses
52 fly's-eye lenses
53 collector lenses
54 cylindrical lenses
55 illuminated field diaphragms
56a~56d relay lens
61 the 1st optical systems
62 the 2nd optical systems
63 perspective view diaphragms
64 focus amendment optical components
65 as skew optical component
66 multiplying power amendment optical components
67 rotation correction mechanisms
68 polarization adjustment mechanisms
70 the 1st deflection components
71 the 1st lens groups
72 the 1st concave mirrors
80 the 2nd deflection components
81 the 2nd lens groups
82 the 2nd concave mirrors
91 the 1st prisms
92 the 2nd prisms
93 polarizing coatings
110 mask stages (the 2nd embodiment)
P substrates
FR1 supplies are rolled up
FR2 recovery is rolled up
U1~Un processing units
U3 exposure devices (substrate board treatment)
M light shields
MA light shields (the 2nd embodiment)
The axles of AX1 the 1st
The axles of AX2 the 2nd
P1 light shields face
P2 bearing-surfaces
P7 intermediate image planes
EL1 illuminating bundles
EL2 projected light beams
Rm radius of curvature
Rfa radius of curvature
CL median planes
PBS polarising beam splitters
IR1~IR6 illumination regions
IL1~IL6 lamp optical systems
ILM illumination optics
PA1~PA6 view fields
PL1~PL6 projection optical systems
PLM Projection optics
The optical axises of BX1 the 1st
The optical axises of BX2 the 2nd
The optical axises of BX3 the 3rd
D1 polarising beam splitters PBS the 1st face
D2 polarising beam splitters PBS the 2nd face
D3 polarising beam splitters PBS the 3rd face
D4 polarising beam splitters PBS the 4th face
θ angles
θ 1 (β) incidence angle
θ B Brewster angles
The non-incident areas of S1
S2 incident areas
H layers of body
The film bodies of H1 the 1st
The film bodies of H2 the 2nd
Claims (24)
1. a kind of polarising beam splitter, possesses：
1st prism；
2nd prism, it has the face relative with a face of the 1st prism；With
Polarizing coating, it is separated into causing the incident beam from the 1st prism towards the 2nd prism according to polarization state
The mode of the transmitted light beam transmitted to the reflected beams of the 1st prism lateral reflection or to the 2nd prism side, located at described the
Between the 1 prism face relative with the 2nd prism, and by the 1st film body using silica as principal component and based on hafnium oxide
2nd film body of composition is laminated in film thickness direction.
2. polarising beam splitter according to claim 1, wherein,
The chief ray of the incident beam from the 1st prism towards the polarizing coating with according to polarization state by it is described partially
Vibrating diaphragm is set to be greater than 90 ° to the chief ray angulation of the reflected beams of the 1st prism lateral reflection.
3. polarising beam splitter according to claim 1, wherein,
The polarizing coating is the film of 52.4 °~57.3 ° of Brewster angle.
4. the polarising beam splitter according to claim 1 or 3, wherein,
1st prism has for the 1st incident face of the incident beam and the reflected light for being reflected by the polarizing coating
The 2nd face that beam goes out,
2nd prism have with the 3rd relative face of the 1st face and 4th face relative with the 2nd face,
1st face is the vertical plane being orthogonal relative to the chief ray of the incident incident beam,
The vertical plane that 2nd face is orthogonal for the chief ray of the reflected beams relative to injection,
3rd face and the 1st face are set non-parallelly,
4th face is abreast set with the 2nd face.
5. polarising beam splitter according to claim 4, wherein,
1st face and the polarizing coating angulation are set to and are incident to the incident beam of the polarizing coating
The incidence angle of chief ray is identical.
6. the polarising beam splitter according to any one of claim 1,2,3,5, wherein,
The polarizing coating is the cycle layer for being laminated multiple layers of body in film thickness direction,
The layer body has：
1st film body, the 1st film body is made up of silica, and is the wavelength of λ/4 relative to the wavelength X of the incident beam
Thickness；With
2nd film body, the 2nd film body clips the 1st film body and located at the both sides of film thickness direction, is made up of hafnium oxide, and
Relative to the incident beam wavelength X for the wavelength of λ/8 thickness.
7. polarising beam splitter according to claim 6, wherein,
The polarizing coating is fixed on by adhesive or optical cement between the 1st prism and the 2nd prism.
8. a kind of substrate board treatment, the pattern of light shield is projected to and is projected body, is had：
Light shield holding member, it keeps the mask pattern of reflection-type；
Illumination optics, it guides illuminating bundle to the mask pattern；
Projection optics, projected light beam obtained from it is reflected the illuminating bundle by the mask pattern is projected to being thrown
Shadow body；
Polarising beam splitter any one of claim 1 to 7, it is configured at the illumination optics and the light shield
Between pattern and it is configured between the mask pattern and the Projection optics；With
Wave plate,
The incidence angle of the polarizing coating for being incident to the polarising beam splitter of the illuminating bundle be comprising 52.4 °~
The defined angular range of 57.3 ° of Brewster angle,
The illuminating bundle is reflected towards the mask pattern with the polarising beam splitter and make the projected light beam court
The mode transmitted to the Projection optics, the wave plate makes the illuminating bundle from the polarising beam splitter inclined
Shake and also polarize the projected light beam from the mask pattern.
9. substrate board treatment according to claim 8, wherein,
Angular range as defined in described is set to less than more than 41.5 ° 61.4 °.
10. substrate board treatment according to claim 8 or claim 9, wherein,
The incidence angle for being incident to the polarizing coating of the chief ray of the illuminating bundle is set as the Brewster angle.
11. substrate board treatment according to claim 8 or claim 9, wherein,
With light supply apparatus, the light of the wavelength below the i lines of the light supply apparatus generation wavelength 365nm is used as the illumination light
Beam.
12. substrate board treatment according to claim 11, wherein,
The light supply apparatus is higher hamonic wave laser.
13. substrate board treatment according to claim 11, wherein,
The light supply apparatus is PRK.
14. substrate board treatment according to claim 8 or claim 9, wherein,
The projected light beam of the polarising beam splitter is incident to be reflected by the mask pattern turns into telecentricity
The mode of state, the illumination optics setting is via the polarising beam splitter to described in mask pattern illumination
The angle of the chief ray of illuminating bundle.
15. substrate board treatment according to claim 8 or claim 9, wherein,
The polarising beam splitter and the wave plate are fixed by adhesive or optical cement.
16. substrate board treatment according to claim 8 or claim 9, wherein,
The illumination optics are accordingly provided with multiple, Duo Gesuo with the multiple illumination regions being formed in the mask pattern
Illumination optics are stated to guide the illuminating bundle to multiple illumination regions,
The Projection optics are accordingly provided with multiple, multiple Projection optics with multiple illumination optics
By from a plurality of projected light beam of the mask pattern reflection in each illumination region of multiple illumination regions to shape
Multiple view fields guiding on body is projected described in Cheng Yu,
The polarising beam splitter and the wave plate and multiple illumination optics and multiple Projection optics point
It is not provided with multiple accordingly,
The substrate board treatment is also equipped with adjusting the polarization adjustment unit of the polarization direction of multiple wave plates respectively.
17. a kind of device inspection apparatus, possesses：
Substrate board treatment any one of claim 8 to 16；With
To the substrate feeding device that body is projected described in substrate board treatment supply.
18. a kind of device making method, including：
Substrate board treatment any one of usage right requirement 8 to 16 goes out and device in the body projection exposure that is projected
Circuit or connect up the corresponding mask pattern；With
By to be projected described in after projection exposure body handled and it is described be projected formed on body device circuit or
Wiring.
19. a kind of substrate board treatment, has：
Light shield holding member, it keeps the mask pattern of reflection-type；
Illumination optics, it guides illuminating bundle to the mask pattern；
Projection optics, projected light beam obtained from it is reflected the illuminating bundle by the mask pattern is projected to being thrown
Shadow body；
Polarising beam splitter any one of claim 1 to 7, it is configured at the illumination optics and the light shield
Between pattern and it is configured between the mask pattern and the Projection optics；With
Wave plate,
The incidence angle of the polarizing coating for being incident to the polarising beam splitter of the projected light beam is set to include 52.4 °
The defined angular range of~57.3 ° of Brewster angle,
The illuminating bundle is transmitted towards the mask pattern with the polarising beam splitter and make the projected light beam court
The mode reflected to the Projection optics, the wave plate makes the illuminating bundle from the polarising beam splitter inclined
Shake and also polarize the projected light beam from the mask pattern.
20. a kind of polarising beam splitter, there is polarizing coating on the composition surface of two optical prisms, by from the optical prism of a side
Separated towards the ultraviolet of the central wavelength lambda of the optical prism of the opposing party according to polarization state by the polarizing coating, its
In,
The polarizing coating is constituted, the 1st film body by the way that the 1st film body and the 2nd film body to be laminated multiple repeatedly in film thickness direction
There is 1st refractive index bigger than the refractive index of the optical prism under the wavelength X, the 2nd film body is under the wavelength X
With 2nd refractive index smaller than the 1st refractive index,
By by being set as more than 50 ° to the Brewster angle of the ultraviolet of the wavelength X obtained from the polarizing coating.
21. polarising beam splitter according to claim 20, it is characterised in that
The optical prism is made up of quartz,
It is any one in hafnium oxide, zirconium oxide, titanium dioxide, tantalum pentoxide to make the 1st film body,
It is any one in silica and magnesium fluoride to make the 2nd film body.
22. the polarising beam splitter according to claim 20 or 21, it is characterised in that
It is anti-along film thickness direction in the way of to there is the Brewster angle between the 1st incident angle and the 2nd incident angle
Cladding folds the 1st film body and the 2nd film body, wherein, the 1st incident angle is relative to being incident to the polarizing coating
Transmissivity and the angle for the reflectivity for being less than 5% that P polarization light is more than 95%, the 2nd incident angle are relative to entering
Reflectivity and the angle for the transmissivity for being less than 5% that the S-polarization light for being incident upon the polarizing coating is more than 95%.
23. polarising beam splitter according to claim 22, it is characterised in that
The difference of 1st incident angle and the 2nd incident angle is set to more than 14 °.
24. a kind of substrate board treatment, has：
Light shield holding member, it keeps the mask pattern of reflection-type；
Illumination optics, it guides illuminating bundle to the mask pattern；
Projection optics, projected light beam obtained from it is reflected the illuminating bundle by the mask pattern is projected to being thrown
Shadow body；
Polarising beam splitter any one of claim 20 to 23, it is configured at the illumination optics and the light
Between cover pattern and it is configured between the mask pattern and the Projection optics；With
Wave plate,
The incidence angle of the polarizing coating for being incident to the polarising beam splitter of the projected light beam is set to include 52.4 °
The defined angular range of~57.3 ° of Brewster angle,
The illuminating bundle is reflected towards the mask pattern to be turned into by the polarising beam splitter and make the throwing
State that shadow light beam is transmitted towards the Projection optics or as making the illuminating bundle saturating towards the mask pattern
The mode for the state that the projected light beam reflects towards the Projection optics is penetrated and makes, the wave plate makes from described
The illuminating bundle of polarising beam splitter polarizes and also polarizes the projected light beam from the mask pattern.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012244731 | 2012-11-06 | ||
| JP2012-244731 | 2012-11-06 | ||
| JP2013128877 | 2013-06-19 | ||
| JP2013-128877 | 2013-06-19 | ||
| CN201380067898.8A CN104885012B (en) | 2012-11-06 | 2013-11-05 | Polarising beam splitter, substrate board treatment, device inspection apparatus and device making method |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201380067898.8A Division CN104885012B (en) | 2012-11-06 | 2013-11-05 | Polarising beam splitter, substrate board treatment, device inspection apparatus and device making method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107272095A true CN107272095A (en) | 2017-10-20 |
| CN107272095B CN107272095B (en) | 2020-04-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710559593.9A Active CN107255911B (en) | 2012-11-06 | 2013-11-05 | Exposure device |
| CN201710559592.4A Active CN107272095B (en) | 2012-11-06 | 2013-11-05 | Polarization beam splitter and substrate processing apparatus using the same |
| CN201380067898.8A Active CN104885012B (en) | 2012-11-06 | 2013-11-05 | Polarising beam splitter, substrate board treatment, device inspection apparatus and device making method |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710559593.9A Active CN107255911B (en) | 2012-11-06 | 2013-11-05 | Exposure device |
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| CN201380067898.8A Active CN104885012B (en) | 2012-11-06 | 2013-11-05 | Polarising beam splitter, substrate board treatment, device inspection apparatus and device making method |
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| JP (3) | JP6540027B2 (en) |
| KR (4) | KR102045713B1 (en) |
| CN (3) | CN107255911B (en) |
| HK (3) | HK1212476A1 (en) |
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| CN106547172B (en) * | 2015-09-17 | 2018-11-13 | 上海微电子装备（集团）股份有限公司 | A kind of exposure device |
| CN108169923B (en) * | 2017-12-21 | 2021-01-26 | 冯杰 | Light source polarizer |
| CN109143750A (en) * | 2018-09-08 | 2019-01-04 | 深圳阜时科技有限公司 | A kind of optical module, optical projection mould group, sensing device and equipment |
| CN113686892B (en) * | 2021-08-20 | 2023-08-25 | 四川轻化工大学 | Novel bearing surface defect intelligent detection system |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2019117409A (en) | 2019-07-18 |
| KR20180071428A (en) | 2018-06-27 |
| JPWO2014073535A1 (en) | 2016-09-08 |
| TWI596652B (en) | 2017-08-21 |
| TW201738933A (en) | 2017-11-01 |
| CN107272095B (en) | 2020-04-28 |
| CN107255911A (en) | 2017-10-17 |
| JP6705527B2 (en) | 2020-06-03 |
| CN104885012B (en) | 2017-07-28 |
| TW201738934A (en) | 2017-11-01 |
| KR101984451B1 (en) | 2019-05-30 |
| TW201432785A (en) | 2014-08-16 |
| CN107255911B (en) | 2019-07-09 |
| TWI683345B (en) | 2020-01-21 |
| JP6512253B2 (en) | 2019-05-15 |
| HK1245418B (en) | 2020-04-24 |
| HK1245410A1 (en) | 2018-08-24 |
| KR20190044126A (en) | 2019-04-29 |
| CN104885012A (en) | 2015-09-02 |
| TWI627662B (en) | 2018-06-21 |
| WO2014073535A1 (en) | 2014-05-15 |
| JP2018025810A (en) | 2018-02-15 |
| JP6540027B2 (en) | 2019-07-10 |
| KR102045713B1 (en) | 2019-11-15 |
| KR20150083852A (en) | 2015-07-20 |
| HK1212476A1 (en) | 2016-06-10 |
| KR20180008893A (en) | 2018-01-24 |
| KR101900225B1 (en) | 2018-09-18 |
| KR101979979B1 (en) | 2019-05-17 |
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