HK1245410A1 - 偏振光分束器及使用了該偏振光分束器的基板處理裝置 - Google Patents

偏振光分束器及使用了該偏振光分束器的基板處理裝置

Info

Publication number
HK1245410A1
HK1245410A1 HK18104809.3A HK18104809A HK1245410A1 HK 1245410 A1 HK1245410 A1 HK 1245410A1 HK 18104809 A HK18104809 A HK 18104809A HK 1245410 A1 HK1245410 A1 HK 1245410A1
Authority
HK
Hong Kong
Prior art keywords
processing apparatus
same
beam splitter
substrate processing
polarization beam
Prior art date
Application number
HK18104809.3A
Other languages
English (en)
Inventor
加藤正紀
鈴木哲男
鐮田剛忠
荒井正範
北紘典
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1245410A1 publication Critical patent/HK1245410A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
HK18104809.3A 2012-11-06 2016-01-15 偏振光分束器及使用了該偏振光分束器的基板處理裝置 HK1245410A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012244731 2012-11-06
JP2013128877 2013-06-19

Publications (1)

Publication Number Publication Date
HK1245410A1 true HK1245410A1 (zh) 2018-08-24

Family

ID=50684638

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18104872.5A HK1245418B (zh) 2012-11-06 2016-01-15 曝光裝置
HK16100427.5A HK1212476A1 (zh) 2012-11-06 2016-01-15 偏振光分束器、基板處理裝置、器件製造系統及器件製造方法
HK18104809.3A HK1245410A1 (zh) 2012-11-06 2016-01-15 偏振光分束器及使用了該偏振光分束器的基板處理裝置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18104872.5A HK1245418B (zh) 2012-11-06 2016-01-15 曝光裝置
HK16100427.5A HK1212476A1 (zh) 2012-11-06 2016-01-15 偏振光分束器、基板處理裝置、器件製造系統及器件製造方法

Country Status (6)

Country Link
JP (3) JP6540027B2 (zh)
KR (4) KR101984451B1 (zh)
CN (3) CN107255911B (zh)
HK (3) HK1245418B (zh)
TW (3) TWI683345B (zh)
WO (1) WO2014073535A1 (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106547172B (zh) * 2015-09-17 2018-11-13 上海微电子装备（集团）股份有限公司 一种曝光装置
CN108169923B (zh) * 2017-12-21 2021-01-26 冯杰 一种光源偏振器
CN109143750A (zh) * 2018-09-08 2019-01-04 深圳阜时科技有限公司 一种光学组件、光学投影模组、感测装置及设备
CN113686892B (zh) * 2021-08-20 2023-08-25 四川轻化工大学 新型轴承表面缺陷智能检测系统

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Also Published As

Publication number Publication date
CN107272095B (zh) 2020-04-28
JP6705527B2 (ja) 2020-06-03
TWI683345B (zh) 2020-01-21
HK1245418B (zh) 2020-04-24
CN107255911A (zh) 2017-10-17
CN104885012B (zh) 2017-07-28
JP6540027B2 (ja) 2019-07-10
TW201738934A (zh) 2017-11-01
JP6512253B2 (ja) 2019-05-15
KR101984451B1 (ko) 2019-05-30
HK1212476A1 (zh) 2016-06-10
JP2019117409A (ja) 2019-07-18
CN104885012A (zh) 2015-09-02
CN107255911B (zh) 2019-07-09
CN107272095A (zh) 2017-10-20
KR20190044126A (ko) 2019-04-29
KR20150083852A (ko) 2015-07-20
TW201432785A (zh) 2014-08-16
WO2014073535A1 (ja) 2014-05-15
JP2018025810A (ja) 2018-02-15
TW201738933A (zh) 2017-11-01
KR20180008893A (ko) 2018-01-24
KR20180071428A (ko) 2018-06-27
KR102045713B1 (ko) 2019-11-15
TWI596652B (zh) 2017-08-21
KR101979979B1 (ko) 2019-05-17
KR101900225B1 (ko) 2018-09-18
JPWO2014073535A1 (ja) 2016-09-08
TWI627662B (zh) 2018-06-21

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