HK1257621A1 - Substrate processing apparatus - Google Patents
Substrate processing apparatusInfo
- Publication number
- HK1257621A1 HK1257621A1 HK18116748.1A HK18116748A HK1257621A1 HK 1257621 A1 HK1257621 A1 HK 1257621A1 HK 18116748 A HK18116748 A HK 18116748A HK 1257621 A1 HK1257621 A1 HK 1257621A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- processing apparatus
- substrate processing
- substrate
- processing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013142922A JP2015018006A (en) | 2013-07-08 | 2013-07-08 | Substrate treatment apparatus, device production system, and device production method |
| JP2014123088A JP6459234B2 (en) | 2014-06-16 | 2014-06-16 | Substrate processing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1257621A1 true HK1257621A1 (en) | 2019-10-25 |
Family
ID=52279804
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK16108788.1A HK1220776A1 (en) | 2013-07-08 | 2016-07-21 | Substrate processing apparatus, device manufacturing system, device manufacturing method, and pattern formation apparatus |
| HK18104878.9A HK1245421B (en) | 2013-07-08 | 2016-07-21 | Device manufacturing system, and pattern formation apparatus |
| HK18116748.1A HK1257621A1 (en) | 2013-07-08 | 2016-07-21 | Substrate processing apparatus |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK16108788.1A HK1220776A1 (en) | 2013-07-08 | 2016-07-21 | Substrate processing apparatus, device manufacturing system, device manufacturing method, and pattern formation apparatus |
| HK18104878.9A HK1245421B (en) | 2013-07-08 | 2016-07-21 | Device manufacturing system, and pattern formation apparatus |
Country Status (5)
| Country | Link |
|---|---|
| KR (5) | KR102219169B1 (en) |
| CN (3) | CN107255908B (en) |
| HK (3) | HK1220776A1 (en) |
| TW (4) | TWI757817B (en) |
| WO (1) | WO2015005118A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6561474B2 (en) * | 2015-01-20 | 2019-08-21 | 大日本印刷株式会社 | Method for manufacturing flexible display device |
| JP6662384B2 (en) * | 2015-06-15 | 2020-03-11 | コニカミノルタ株式会社 | Method for manufacturing organic electroluminescence device |
| TWI818915B (en) * | 2017-07-14 | 2023-10-21 | 荷蘭商Ａｓｍｌ荷蘭公司 | Metrology apparatus and substrate stage-handler system |
| KR102267473B1 (en) * | 2019-06-26 | 2021-06-22 | 한국기계연구원 | Fine pattern roll manufacturing system via tension control, and method of manufacturing fine pattern roll using the same |
| JP2019200433A (en) * | 2019-08-01 | 2019-11-21 | 株式会社ニコン | Pattern drawing method |
| KR20210059549A (en) * | 2019-11-15 | 2021-05-25 | 캐논 톡키 가부시키가이샤 | Film forming apparatus |
| CN111580473B (en) * | 2020-04-10 | 2021-05-28 | 彩虹集团有限公司 | Method for automatically controlling glass extraction amount of liquid crystal substrate |
| WO2022063508A1 (en) * | 2020-09-28 | 2022-03-31 | Asml Netherlands B.V. | Metrology tool with position control of projection system |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6019037U (en) * | 1983-07-18 | 1985-02-08 | 株式会社リコー | exposure equipment |
| JP2880314B2 (en) * | 1991-03-26 | 1999-04-05 | ウシオ電機株式会社 | Film transport mechanism and exposure apparatus equipped with this film transport mechanism |
| JP3741013B2 (en) * | 2001-09-17 | 2006-02-01 | ウシオ電機株式会社 | Belt-shaped workpiece exposure device with meandering correction mechanism |
| JP4296741B2 (en) | 2002-01-28 | 2009-07-15 | パナソニック電工株式会社 | Cogeneration system |
| JP2006098718A (en) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | Drawing apparatus |
| JP2006102991A (en) * | 2004-09-30 | 2006-04-20 | Fuji Photo Film Co Ltd | Image recording device and image recording method |
| CN100517080C (en) * | 2006-04-27 | 2009-07-22 | 株式会社Orc制作所 | Conveying device |
| JP5181451B2 (en) * | 2006-09-20 | 2013-04-10 | 株式会社ニコン | Mask, exposure apparatus, exposure method, and device manufacturing method |
| JP2009220945A (en) * | 2008-03-17 | 2009-10-01 | Orc Mfg Co Ltd | Conveyance apparatus |
| CN101364052B (en) * | 2008-10-08 | 2010-10-27 | 上海微电子装备有限公司 | Active vibration damping system and forecast control method thereof |
| JP2010207961A (en) * | 2009-03-10 | 2010-09-24 | Fuji Electric Systems Co Ltd | Die cutting method for long film and device therefor |
| US8541163B2 (en) * | 2009-06-05 | 2013-09-24 | Nikon Corporation | Transporting method, transporting apparatus, exposure method, and exposure apparatus |
| KR101070734B1 (en) * | 2009-06-30 | 2011-10-07 | 건국대학교 산학협력단 | Feedforward control of cross direction register system and methode for printed electronics roll-to-roll |
| US8379186B2 (en) * | 2009-07-17 | 2013-02-19 | Nikon Corporation | Pattern formation apparatus, pattern formation method, and device manufacturing method |
| KR101816327B1 (en) * | 2010-02-12 | 2018-01-08 | 가부시키가이샤 니콘 | Substrate processing device |
| NL2006385A (en) * | 2010-04-12 | 2011-10-13 | Asml Netherlands Bv | Substrate handling apparatus and lithographic apparatus. |
| WO2012081607A1 (en) * | 2010-12-15 | 2012-06-21 | 株式会社ニコン | Substrate processing system and method for producing display elements |
-
2014
- 2014-06-25 KR KR1020207009396A patent/KR102219169B1/en active IP Right Grant
- 2014-06-25 KR KR1020197022344A patent/KR102058830B1/en active IP Right Grant
- 2014-06-25 KR KR1020197037109A patent/KR102097769B1/en active IP Right Grant
- 2014-06-25 CN CN201710545966.7A patent/CN107255908B/en active Active
- 2014-06-25 WO PCT/JP2014/066885 patent/WO2015005118A1/en active Application Filing
- 2014-06-25 CN CN201480049332.7A patent/CN105556391B/en active Active
- 2014-06-25 KR KR1020167002859A patent/KR101984360B1/en active IP Right Grant
- 2014-06-25 CN CN201810608818.XA patent/CN108919607B/en active Active
- 2014-06-25 KR KR1020197014816A patent/KR102007627B1/en active IP Right Grant
- 2014-07-07 TW TW109126679A patent/TWI757817B/en active
- 2014-07-07 TW TW107115588A patent/TWI681261B/en active
- 2014-07-07 TW TW103123245A patent/TWI627510B/en active
- 2014-07-07 TW TW108146949A patent/TWI706234B/en active
-
2016
- 2016-07-21 HK HK16108788.1A patent/HK1220776A1/en not_active IP Right Cessation
- 2016-07-21 HK HK18104878.9A patent/HK1245421B/en not_active IP Right Cessation
- 2016-07-21 HK HK18116748.1A patent/HK1257621A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN108919607B (en) | 2020-10-30 |
| HK1245421B (en) | 2020-05-15 |
| HK1220776A1 (en) | 2017-05-12 |
| KR101984360B1 (en) | 2019-05-30 |
| KR102058830B1 (en) | 2019-12-23 |
| TWI757817B (en) | 2022-03-11 |
| TW202013096A (en) | 2020-04-01 |
| KR102097769B1 (en) | 2020-04-07 |
| KR102219169B1 (en) | 2021-02-23 |
| TWI681261B (en) | 2020-01-01 |
| KR20190091575A (en) | 2019-08-06 |
| TW201832017A (en) | 2018-09-01 |
| CN107255908B (en) | 2019-08-06 |
| CN105556391B (en) | 2018-06-29 |
| TW201514631A (en) | 2015-04-16 |
| KR20190141793A (en) | 2019-12-24 |
| CN105556391A (en) | 2016-05-04 |
| KR20190060003A (en) | 2019-05-31 |
| TWI627510B (en) | 2018-06-21 |
| KR20160029099A (en) | 2016-03-14 |
| CN107255908A (en) | 2017-10-17 |
| TW202041981A (en) | 2020-11-16 |
| WO2015005118A1 (en) | 2015-01-15 |
| TWI706234B (en) | 2020-10-01 |
| KR20200037452A (en) | 2020-04-08 |
| KR102007627B1 (en) | 2019-08-05 |
| CN108919607A (en) | 2018-11-30 |
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