HK1069376A1 - Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution - Google Patents

Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution

Info

Publication number
HK1069376A1
HK1069376A1 HK05101838A HK05101838A HK1069376A1 HK 1069376 A1 HK1069376 A1 HK 1069376A1 HK 05101838 A HK05101838 A HK 05101838A HK 05101838 A HK05101838 A HK 05101838A HK 1069376 A1 HK1069376 A1 HK 1069376A1
Authority
HK
Hong Kong
Prior art keywords
water
aqueous solution
produces
free
atom aqueous
Prior art date
Application number
HK05101838A
Other languages
English (en)
Inventor
Kenji Fukui
Hiroaki Kamiya
Original Assignee
Waterware Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Waterware Inc filed Critical Waterware Inc
Publication of HK1069376A1 publication Critical patent/HK1069376A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/48—Treatment of water, waste water, or sewage with magnetic or electric fields
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/70—Treatment of water, waste water, or sewage by reduction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/727—Treatment of water, waste water, or sewage by oxidation using pure oxygen or oxygen rich gas
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/74—Treatment of water, waste water, or sewage by oxidation with air
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
    • C02F1/766—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens by means of halogens other than chlorine or of halogenated compounds containing halogen other than chlorine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/04—Oxidation reduction potential [ORP]
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Physical Water Treatments (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
HK05101838A 2001-02-02 2005-03-02 Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution HK1069376A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001027482 2001-02-02
PCT/JP2001/008648 WO2002062711A1 (fr) 2001-02-02 2001-10-01 Dispositif de production de solution aqueuse a atome libre, procede de production de solution aqueuse a atome libre, et solution aqueuse a atome libre

Publications (1)

Publication Number Publication Date
HK1069376A1 true HK1069376A1 (en) 2005-05-20

Family

ID=18892131

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05101838A HK1069376A1 (en) 2001-02-02 2005-03-02 Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution

Country Status (9)

Country Link
US (1) US7048862B2 (zh)
EP (1) EP1359126B1 (zh)
JP (1) JP3986438B2 (zh)
KR (1) KR100628006B1 (zh)
CN (1) CN1239411C (zh)
AT (1) ATE482174T1 (zh)
DE (1) DE60143127D1 (zh)
HK (1) HK1069376A1 (zh)
WO (1) WO2002062711A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107434275A (zh) * 2017-07-26 2017-12-05 邓文丽 一种小分子能量水的制备装置及方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060263441A1 (en) * 2003-03-04 2006-11-23 Kenji Fukui Free radical solution water
JP2005040783A (ja) * 2003-07-10 2005-02-17 Kankyo Kiki:Kk 冷却媒体流路
JP2005061605A (ja) * 2003-08-14 2005-03-10 Tomio Otani 水質浄化上水道管
JP3917578B2 (ja) * 2003-10-30 2007-05-23 株式会社東芝 半導体装置の製造方法及び製造装置
CN1810684B (zh) * 2005-01-28 2011-03-30 谢刚正 饮用水的三合一处理工艺及其装置
US20090008608A1 (en) * 2006-10-25 2009-01-08 Bublitz Mark O Sodium/silicon "treated" water
JP4408957B2 (ja) * 2007-09-27 2010-02-03 聡 井川 殺菌方法および装置
IT1400483B1 (it) * 2010-05-27 2013-06-11 Ansaldo Energia Spa Dispositivo e metodo per la pulizia di olio
US20150173407A1 (en) * 2013-12-23 2015-06-25 P-Tech Holdings, Inc. Ionically charged nutritional supplement, process of making and apparatus therefore
CN109563413B (zh) 2016-08-01 2022-05-31 沙特基础工业全球技术公司 同步的混合塑料热解及热解油脱氯的催化方法
CN110431112A (zh) * 2017-03-17 2019-11-08 大金工业株式会社 水处理装置以及加湿装置
TWI633064B (zh) 2017-06-05 2018-08-21 財團法人工業技術研究院 電解還原模組單元及淨水裝置

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JPS634893A (ja) 1986-06-25 1988-01-09 Daicel Chem Ind Ltd 超純水からの微粒子除去装置
JPH02115094A (ja) 1988-10-25 1990-04-27 Toshiyuki Niki 水道水の処理方法
JPH02131186A (ja) * 1988-11-10 1990-05-18 Fuji Keiki:Kk 簡易型水処理装置
JPH044090A (ja) 1990-04-18 1992-01-08 Miura Co Ltd ガス溶存水製造装置
US5466425A (en) * 1994-07-08 1995-11-14 Amphion International, Limited Biological decontamination system
US6193878B1 (en) * 1995-01-25 2001-02-27 Zpm, Inc. Multi-modal method and apparatus for treating a solution
JPH09253632A (ja) 1996-03-27 1997-09-30 Kanegafuchi Chem Ind Co Ltd 水処理装置
JP3269774B2 (ja) 1996-05-21 2002-04-02 有限会社伸興設備 磁気水処理装置およびその組立て方法
JPH1028974A (ja) 1996-07-17 1998-02-03 Shinku Kagaku Kenkyusho オゾン水製造装置
JPH1085747A (ja) 1996-09-10 1998-04-07 Nippon Intec Kk 回分式強電解水生成装置
GB2316090B (en) 1996-09-26 1998-12-23 Julian Bryson Method and apparatus for producing a sterilising solution
JPH10174980A (ja) 1996-12-17 1998-06-30 Shigeji Ota 水質改善方法及び水質改善装置
JPH10230265A (ja) 1996-12-19 1998-09-02 Toto Ltd 弱酸性軟水の生成装置及び弱酸性軟水の生成方法
JP3283231B2 (ja) 1997-03-25 2002-05-20 耕吉 青木 洗車機用水質改良装置
JP3193903B2 (ja) 1998-06-15 2001-07-30 倉科 好麿 流体の磁気処理装置
JP3327462B2 (ja) 1998-06-23 2002-09-24 株式会社 ローソン 米の炊飯用水の活性化方法
IL129564A (en) * 1999-04-23 2004-06-20 Atlantium Lasers Ltd A method for disinfecting and purifying liquids and gases and a device for its use

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107434275A (zh) * 2017-07-26 2017-12-05 邓文丽 一种小分子能量水的制备装置及方法

Also Published As

Publication number Publication date
CN1537080A (zh) 2004-10-13
EP1359126B1 (en) 2010-09-22
JP3986438B2 (ja) 2007-10-03
ATE482174T1 (de) 2010-10-15
JPWO2002062711A1 (ja) 2004-09-09
DE60143127D1 (de) 2010-11-04
EP1359126A1 (en) 2003-11-05
CN1239411C (zh) 2006-02-01
KR100628006B1 (ko) 2006-09-26
US20040065625A1 (en) 2004-04-08
WO2002062711A1 (fr) 2002-08-15
US7048862B2 (en) 2006-05-23
KR20030076649A (ko) 2003-09-26
EP1359126A4 (en) 2006-10-18

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20111001