HK1069376A1 - Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution - Google Patents
Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solutionInfo
- Publication number
- HK1069376A1 HK1069376A1 HK05101838A HK05101838A HK1069376A1 HK 1069376 A1 HK1069376 A1 HK 1069376A1 HK 05101838 A HK05101838 A HK 05101838A HK 05101838 A HK05101838 A HK 05101838A HK 1069376 A1 HK1069376 A1 HK 1069376A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- water
- aqueous solution
- produces
- free
- atom aqueous
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/48—Treatment of water, waste water, or sewage with magnetic or electric fields
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/70—Treatment of water, waste water, or sewage by reduction
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/727—Treatment of water, waste water, or sewage by oxidation using pure oxygen or oxygen rich gas
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/74—Treatment of water, waste water, or sewage by oxidation with air
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
- C02F1/766—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens by means of halogens other than chlorine or of halogenated compounds containing halogen other than chlorine
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/12—Halogens or halogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/04—Oxidation reduction potential [ORP]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/02—Specific form of oxidant
- C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Physical Water Treatments (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001027482 | 2001-02-02 | ||
PCT/JP2001/008648 WO2002062711A1 (fr) | 2001-02-02 | 2001-10-01 | Dispositif de production de solution aqueuse a atome libre, procede de production de solution aqueuse a atome libre, et solution aqueuse a atome libre |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1069376A1 true HK1069376A1 (en) | 2005-05-20 |
Family
ID=18892131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK05101838A HK1069376A1 (en) | 2001-02-02 | 2005-03-02 | Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution |
Country Status (9)
Country | Link |
---|---|
US (1) | US7048862B2 (zh) |
EP (1) | EP1359126B1 (zh) |
JP (1) | JP3986438B2 (zh) |
KR (1) | KR100628006B1 (zh) |
CN (1) | CN1239411C (zh) |
AT (1) | ATE482174T1 (zh) |
DE (1) | DE60143127D1 (zh) |
HK (1) | HK1069376A1 (zh) |
WO (1) | WO2002062711A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107434275A (zh) * | 2017-07-26 | 2017-12-05 | 邓文丽 | 一种小分子能量水的制备装置及方法 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060263441A1 (en) * | 2003-03-04 | 2006-11-23 | Kenji Fukui | Free radical solution water |
JP2005040783A (ja) | 2003-07-10 | 2005-02-17 | Kankyo Kiki:Kk | 冷却媒体流路 |
JP2005061605A (ja) * | 2003-08-14 | 2005-03-10 | Tomio Otani | 水質浄化上水道管 |
JP3917578B2 (ja) * | 2003-10-30 | 2007-05-23 | 株式会社東芝 | 半導体装置の製造方法及び製造装置 |
CN1810684B (zh) * | 2005-01-28 | 2011-03-30 | 谢刚正 | 饮用水的三合一处理工艺及其装置 |
US20090008608A1 (en) * | 2006-10-25 | 2009-01-08 | Bublitz Mark O | Sodium/silicon "treated" water |
WO2009041049A1 (ja) * | 2007-09-27 | 2009-04-02 | Satoshi Ikawa | 殺菌方法および装置 |
IT1400483B1 (it) * | 2010-05-27 | 2013-06-11 | Ansaldo Energia Spa | Dispositivo e metodo per la pulizia di olio |
US20150173407A1 (en) * | 2013-12-23 | 2015-06-25 | P-Tech Holdings, Inc. | Ionically charged nutritional supplement, process of making and apparatus therefore |
EP3491103B1 (en) | 2016-08-01 | 2023-08-02 | SABIC Global Technologies B.V. | A catalytic process of simultaneous pyrolysis of mixed plastics and dechlorination of the pyrolysis oil |
WO2018168868A1 (ja) * | 2017-03-17 | 2018-09-20 | ダイキン工業株式会社 | 水処理装置および加湿装置 |
TWI633064B (zh) | 2017-06-05 | 2018-08-21 | 財團法人工業技術研究院 | 電解還原模組單元及淨水裝置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS634893A (ja) | 1986-06-25 | 1988-01-09 | Daicel Chem Ind Ltd | 超純水からの微粒子除去装置 |
JPH02115094A (ja) | 1988-10-25 | 1990-04-27 | Toshiyuki Niki | 水道水の処理方法 |
JPH02131186A (ja) * | 1988-11-10 | 1990-05-18 | Fuji Keiki:Kk | 簡易型水処理装置 |
JPH044090A (ja) | 1990-04-18 | 1992-01-08 | Miura Co Ltd | ガス溶存水製造装置 |
US5466425A (en) * | 1994-07-08 | 1995-11-14 | Amphion International, Limited | Biological decontamination system |
US6193878B1 (en) * | 1995-01-25 | 2001-02-27 | Zpm, Inc. | Multi-modal method and apparatus for treating a solution |
JPH09253632A (ja) | 1996-03-27 | 1997-09-30 | Kanegafuchi Chem Ind Co Ltd | 水処理装置 |
JP3269774B2 (ja) | 1996-05-21 | 2002-04-02 | 有限会社伸興設備 | 磁気水処理装置およびその組立て方法 |
JPH1028974A (ja) | 1996-07-17 | 1998-02-03 | Shinku Kagaku Kenkyusho | オゾン水製造装置 |
JPH1085747A (ja) | 1996-09-10 | 1998-04-07 | Nippon Intec Kk | 回分式強電解水生成装置 |
GB2316090B (en) | 1996-09-26 | 1998-12-23 | Julian Bryson | Method and apparatus for producing a sterilising solution |
JPH10174980A (ja) | 1996-12-17 | 1998-06-30 | Shigeji Ota | 水質改善方法及び水質改善装置 |
JPH10230265A (ja) | 1996-12-19 | 1998-09-02 | Toto Ltd | 弱酸性軟水の生成装置及び弱酸性軟水の生成方法 |
JP3283231B2 (ja) | 1997-03-25 | 2002-05-20 | 耕吉 青木 | 洗車機用水質改良装置 |
JP3193903B2 (ja) | 1998-06-15 | 2001-07-30 | 倉科 好麿 | 流体の磁気処理装置 |
JP3327462B2 (ja) | 1998-06-23 | 2002-09-24 | 株式会社 ローソン | 米の炊飯用水の活性化方法 |
IL129564A (en) * | 1999-04-23 | 2004-06-20 | Atlantium Lasers Ltd | A method for disinfecting and purifying liquids and gases and a device for its use |
-
2001
- 2001-10-01 DE DE60143127T patent/DE60143127D1/de not_active Expired - Lifetime
- 2001-10-01 US US10/470,683 patent/US7048862B2/en not_active Expired - Fee Related
- 2001-10-01 JP JP2002562677A patent/JP3986438B2/ja not_active Expired - Fee Related
- 2001-10-01 WO PCT/JP2001/008648 patent/WO2002062711A1/ja not_active Application Discontinuation
- 2001-10-01 CN CNB018228453A patent/CN1239411C/zh not_active Expired - Fee Related
- 2001-10-01 EP EP01970323A patent/EP1359126B1/en not_active Expired - Lifetime
- 2001-10-01 KR KR1020037010214A patent/KR100628006B1/ko not_active IP Right Cessation
- 2001-10-01 AT AT01970323T patent/ATE482174T1/de not_active IP Right Cessation
-
2005
- 2005-03-02 HK HK05101838A patent/HK1069376A1/xx not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107434275A (zh) * | 2017-07-26 | 2017-12-05 | 邓文丽 | 一种小分子能量水的制备装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
KR100628006B1 (ko) | 2006-09-26 |
CN1239411C (zh) | 2006-02-01 |
WO2002062711A1 (fr) | 2002-08-15 |
ATE482174T1 (de) | 2010-10-15 |
EP1359126B1 (en) | 2010-09-22 |
KR20030076649A (ko) | 2003-09-26 |
JP3986438B2 (ja) | 2007-10-03 |
US20040065625A1 (en) | 2004-04-08 |
EP1359126A1 (en) | 2003-11-05 |
EP1359126A4 (en) | 2006-10-18 |
CN1537080A (zh) | 2004-10-13 |
US7048862B2 (en) | 2006-05-23 |
JPWO2002062711A1 (ja) | 2004-09-09 |
DE60143127D1 (de) | 2010-11-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20111001 |