WO2002062711A1 - Dispositif de production de solution aqueuse a atome libre, procede de production de solution aqueuse a atome libre, et solution aqueuse a atome libre - Google Patents

Dispositif de production de solution aqueuse a atome libre, procede de production de solution aqueuse a atome libre, et solution aqueuse a atome libre Download PDF

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Publication number
WO2002062711A1
WO2002062711A1 PCT/JP2001/008648 JP0108648W WO02062711A1 WO 2002062711 A1 WO2002062711 A1 WO 2002062711A1 JP 0108648 W JP0108648 W JP 0108648W WO 02062711 A1 WO02062711 A1 WO 02062711A1
Authority
WO
WIPO (PCT)
Prior art keywords
water
free
aqueous solution
producing
atom aqueous
Prior art date
Application number
PCT/JP2001/008648
Other languages
English (en)
French (fr)
Inventor
Kenji Fukui
Hiroaki Kamiya
Original Assignee
Mikasavets Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mikasavets Inc. filed Critical Mikasavets Inc.
Priority to KR1020037010214A priority Critical patent/KR100628006B1/ko
Priority to JP2002562677A priority patent/JP3986438B2/ja
Priority to AT01970323T priority patent/ATE482174T1/de
Priority to US10/470,683 priority patent/US7048862B2/en
Priority to DE60143127T priority patent/DE60143127D1/de
Priority to EP01970323A priority patent/EP1359126B1/en
Publication of WO2002062711A1 publication Critical patent/WO2002062711A1/ja
Priority to HK05101838A priority patent/HK1069376A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/48—Treatment of water, waste water, or sewage with magnetic or electric fields
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/70—Treatment of water, waste water, or sewage by reduction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/727—Treatment of water, waste water, or sewage by oxidation using pure oxygen or oxygen rich gas
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/74—Treatment of water, waste water, or sewage by oxidation with air
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
    • C02F1/766—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens by means of halogens other than chlorine or of halogenated compounds containing halogen other than chlorine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/04—Oxidation reduction potential [ORP]
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Physical Water Treatments (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
PCT/JP2001/008648 2001-02-02 2001-10-01 Dispositif de production de solution aqueuse a atome libre, procede de production de solution aqueuse a atome libre, et solution aqueuse a atome libre WO2002062711A1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1020037010214A KR100628006B1 (ko) 2001-02-02 2001-10-01 원자 유리형 수용액 생성장치 및 원자 유리형 수용액 생성방법
JP2002562677A JP3986438B2 (ja) 2001-02-02 2001-10-01 原子遊離型水溶液生成装置、原子遊離型水溶液生成方法及び原子遊離型水溶液
AT01970323T ATE482174T1 (de) 2001-02-02 2001-10-01 Apparatur zur herstellung einer freie atome enthaltenden wässrigen lösung und verfahren zur herstellung einer freie atome enthaltenden wässrigen lösung
US10/470,683 US7048862B2 (en) 2001-02-02 2001-10-01 Free atom aqueous solution producing apparatus, free-atom aqueous solution producing method, and free-atom aqueous solution
DE60143127T DE60143127D1 (de) 2001-02-02 2001-10-01 Apparatur zur herstellung einer freie atome enthaltenden wässrigen lösung und verfahren zur herstellung einer freie atome enthaltenden wässrigen lösung
EP01970323A EP1359126B1 (en) 2001-02-02 2001-10-01 Free atom aqueous solution producing apparatus and free-atom aqueous solution producing method
HK05101838A HK1069376A1 (en) 2001-02-02 2005-03-02 Free atom aqueous solution producing apparatus, f ree-atom aqueous solution producing method, and free-atom aqueous solution

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001027482 2001-02-02
JP2001-027482 2001-02-02

Publications (1)

Publication Number Publication Date
WO2002062711A1 true WO2002062711A1 (fr) 2002-08-15

Family

ID=18892131

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/008648 WO2002062711A1 (fr) 2001-02-02 2001-10-01 Dispositif de production de solution aqueuse a atome libre, procede de production de solution aqueuse a atome libre, et solution aqueuse a atome libre

Country Status (9)

Country Link
US (1) US7048862B2 (ja)
EP (1) EP1359126B1 (ja)
JP (1) JP3986438B2 (ja)
KR (1) KR100628006B1 (ja)
CN (1) CN1239411C (ja)
AT (1) ATE482174T1 (ja)
DE (1) DE60143127D1 (ja)
HK (1) HK1069376A1 (ja)
WO (1) WO2002062711A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1650167A1 (en) * 2003-07-10 2006-04-26 Kankyokiki Corporation Cooling medium flow passage
JPWO2009041049A1 (ja) * 2007-09-27 2011-01-20 聡 井川 殺菌方法および装置
JP2018153804A (ja) * 2017-03-17 2018-10-04 ダイキン工業株式会社 水処理装置および加湿装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060263441A1 (en) * 2003-03-04 2006-11-23 Kenji Fukui Free radical solution water
JP2005061605A (ja) * 2003-08-14 2005-03-10 Tomio Otani 水質浄化上水道管
JP3917578B2 (ja) * 2003-10-30 2007-05-23 株式会社東芝 半導体装置の製造方法及び製造装置
CN1810684B (zh) * 2005-01-28 2011-03-30 谢刚正 饮用水的三合一处理工艺及其装置
US20090008608A1 (en) * 2006-10-25 2009-01-08 Bublitz Mark O Sodium/silicon "treated" water
IT1400483B1 (it) * 2010-05-27 2013-06-11 Ansaldo Energia Spa Dispositivo e metodo per la pulizia di olio
US20150173407A1 (en) * 2013-12-23 2015-06-25 P-Tech Holdings, Inc. Ionically charged nutritional supplement, process of making and apparatus therefore
CN109563413B (zh) 2016-08-01 2022-05-31 沙特基础工业全球技术公司 同步的混合塑料热解及热解油脱氯的催化方法
TWI633064B (zh) 2017-06-05 2018-08-21 財團法人工業技術研究院 電解還原模組單元及淨水裝置
CN107434275A (zh) * 2017-07-26 2017-12-05 邓文丽 一种小分子能量水的制备装置及方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS634893A (ja) * 1986-06-25 1988-01-09 Daicel Chem Ind Ltd 超純水からの微粒子除去装置
JPH02115094A (ja) * 1988-10-25 1990-04-27 Toshiyuki Niki 水道水の処理方法
JPH044090A (ja) * 1990-04-18 1992-01-08 Miura Co Ltd ガス溶存水製造装置
JPH09253632A (ja) * 1996-03-27 1997-09-30 Kanegafuchi Chem Ind Co Ltd 水処理装置
JPH09308888A (ja) * 1996-05-21 1997-12-02 Shinko Setsubi:Kk 磁気水処理装置およびその組立て方法
JPH1028974A (ja) * 1996-07-17 1998-02-03 Shinku Kagaku Kenkyusho オゾン水製造装置
JPH10174980A (ja) * 1996-12-17 1998-06-30 Shigeji Ota 水質改善方法及び水質改善装置
JP2000005765A (ja) * 1998-06-23 2000-01-11 Lawson Inc 水の活性化方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02131186A (ja) * 1988-11-10 1990-05-18 Fuji Keiki:Kk 簡易型水処理装置
US5466425A (en) * 1994-07-08 1995-11-14 Amphion International, Limited Biological decontamination system
US6193878B1 (en) * 1995-01-25 2001-02-27 Zpm, Inc. Multi-modal method and apparatus for treating a solution
JPH1085747A (ja) 1996-09-10 1998-04-07 Nippon Intec Kk 回分式強電解水生成装置
GB2316090B (en) 1996-09-26 1998-12-23 Julian Bryson Method and apparatus for producing a sterilising solution
JPH10230265A (ja) 1996-12-19 1998-09-02 Toto Ltd 弱酸性軟水の生成装置及び弱酸性軟水の生成方法
JP3283231B2 (ja) 1997-03-25 2002-05-20 耕吉 青木 洗車機用水質改良装置
JP3193903B2 (ja) 1998-06-15 2001-07-30 倉科 好麿 流体の磁気処理装置
IL129564A (en) * 1999-04-23 2004-06-20 Atlantium Lasers Ltd A method for disinfecting and purifying liquids and gases and a device for its use

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS634893A (ja) * 1986-06-25 1988-01-09 Daicel Chem Ind Ltd 超純水からの微粒子除去装置
JPH02115094A (ja) * 1988-10-25 1990-04-27 Toshiyuki Niki 水道水の処理方法
JPH044090A (ja) * 1990-04-18 1992-01-08 Miura Co Ltd ガス溶存水製造装置
JPH09253632A (ja) * 1996-03-27 1997-09-30 Kanegafuchi Chem Ind Co Ltd 水処理装置
JPH09308888A (ja) * 1996-05-21 1997-12-02 Shinko Setsubi:Kk 磁気水処理装置およびその組立て方法
JPH1028974A (ja) * 1996-07-17 1998-02-03 Shinku Kagaku Kenkyusho オゾン水製造装置
JPH10174980A (ja) * 1996-12-17 1998-06-30 Shigeji Ota 水質改善方法及び水質改善装置
JP2000005765A (ja) * 1998-06-23 2000-01-11 Lawson Inc 水の活性化方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1650167A1 (en) * 2003-07-10 2006-04-26 Kankyokiki Corporation Cooling medium flow passage
EP1650167A4 (en) * 2003-07-10 2006-10-25 Kankyokiki Corp COOLING POWER PASSAGE
US7481924B2 (en) 2003-07-10 2009-01-27 Kankyokiki Corporation Cooling medium flow passage
EP2053025A1 (en) * 2003-07-10 2009-04-29 Kankyokiki Corporation Cooling medium flow path
US7906020B2 (en) 2003-07-10 2011-03-15 Kankyokiki Corporation Cooling medium flow path
JPWO2009041049A1 (ja) * 2007-09-27 2011-01-20 聡 井川 殺菌方法および装置
JP2018153804A (ja) * 2017-03-17 2018-10-04 ダイキン工業株式会社 水処理装置および加湿装置

Also Published As

Publication number Publication date
JPWO2002062711A1 (ja) 2004-09-09
KR20030076649A (ko) 2003-09-26
DE60143127D1 (de) 2010-11-04
HK1069376A1 (en) 2005-05-20
US20040065625A1 (en) 2004-04-08
EP1359126B1 (en) 2010-09-22
ATE482174T1 (de) 2010-10-15
CN1239411C (zh) 2006-02-01
EP1359126A1 (en) 2003-11-05
JP3986438B2 (ja) 2007-10-03
CN1537080A (zh) 2004-10-13
KR100628006B1 (ko) 2006-09-26
EP1359126A4 (en) 2006-10-18
US7048862B2 (en) 2006-05-23

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