GR3034242T3 - An electrolytic process for cleaning electrically conducting surfaces - Google Patents
An electrolytic process for cleaning electrically conducting surfacesInfo
- Publication number
- GR3034242T3 GR3034242T3 GR20000401929T GR20000401929T GR3034242T3 GR 3034242 T3 GR3034242 T3 GR 3034242T3 GR 20000401929 T GR20000401929 T GR 20000401929T GR 20000401929 T GR20000401929 T GR 20000401929T GR 3034242 T3 GR3034242 T3 GR 3034242T3
- Authority
- GR
- Greece
- Prior art keywords
- anode
- cathode
- workpiece
- metal
- electrically conducting
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/026—Anodisation with spark discharge
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electrolytic Production Of Metals (AREA)
- Connection Of Batteries Or Terminals (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Laminated Bodies (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU9696104583A RU2077611C1 (ru) | 1996-03-20 | 1996-03-20 | Способ обработки поверхностей и устройство для его осуществления |
PCT/IB1996/000877 WO1997035052A1 (en) | 1996-03-20 | 1996-08-30 | An electrolytic process for cleaning electrically conducting surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
GR3034242T3 true GR3034242T3 (en) | 2000-12-29 |
Family
ID=20177832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GR20000401929T GR3034242T3 (en) | 1996-03-20 | 2000-08-23 | An electrolytic process for cleaning electrically conducting surfaces |
Country Status (17)
Country | Link |
---|---|
US (1) | US5700366A (el) |
EP (2) | EP0888465A1 (el) |
JP (2) | JP2001501674A (el) |
KR (2) | KR20000064675A (el) |
AT (1) | ATE193337T1 (el) |
AU (2) | AU720588B2 (el) |
BR (2) | BR9612562A (el) |
CA (2) | CA2253311A1 (el) |
CZ (2) | CZ290256B6 (el) |
DE (1) | DE69608579T2 (el) |
DK (1) | DK0904428T3 (el) |
ES (1) | ES2149491T3 (el) |
GR (1) | GR3034242T3 (el) |
PL (2) | PL329001A1 (el) |
PT (1) | PT904428E (el) |
RU (1) | RU2077611C1 (el) |
WO (3) | WO1997035050A1 (el) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2760339B2 (ja) * | 1996-03-05 | 1998-05-28 | 日本電気株式会社 | リードフレームのばり取り方法およびリードフレーム用ばり取り装置 |
US5981084A (en) * | 1996-03-20 | 1999-11-09 | Metal Technology, Inc. | Electrolytic process for cleaning electrically conducting surfaces and product thereof |
US5958604A (en) * | 1996-03-20 | 1999-09-28 | Metal Technology, Inc. | Electrolytic process for cleaning and coating electrically conducting surfaces and product thereof |
CA2304551A1 (en) * | 1997-09-23 | 1999-04-01 | Valerij Leontievich Steblianko | Electro-plating process |
US6203691B1 (en) * | 1998-09-18 | 2001-03-20 | Hoffman Industries International, Ltd. | Electrolytic cleaning of conductive bodies |
US6176992B1 (en) * | 1998-11-03 | 2001-01-23 | Nutool, Inc. | Method and apparatus for electro-chemical mechanical deposition |
US7427337B2 (en) * | 1998-12-01 | 2008-09-23 | Novellus Systems, Inc. | System for electropolishing and electrochemical mechanical polishing |
US7425250B2 (en) | 1998-12-01 | 2008-09-16 | Novellus Systems, Inc. | Electrochemical mechanical processing apparatus |
US6413388B1 (en) * | 2000-02-23 | 2002-07-02 | Nutool Inc. | Pad designs and structures for a versatile materials processing apparatus |
US6902659B2 (en) * | 1998-12-01 | 2005-06-07 | Asm Nutool, Inc. | Method and apparatus for electro-chemical mechanical deposition |
US6197178B1 (en) | 1999-04-02 | 2001-03-06 | Microplasmic Corporation | Method for forming ceramic coatings by micro-arc oxidation of reactive metals |
RU2149930C1 (ru) * | 1999-07-30 | 2000-05-27 | Рябков Данила Витальевич | Способ модифицирования поверхности металлических изделий и устройство для реализации способа |
DE10022074A1 (de) * | 2000-05-06 | 2001-11-08 | Henkel Kgaa | Elektrochemisch erzeugte Schichten zum Korrosionsschutz oder als Haftgrund |
US7754061B2 (en) | 2000-08-10 | 2010-07-13 | Novellus Systems, Inc. | Method for controlling conductor deposition on predetermined portions of a wafer |
US6921551B2 (en) | 2000-08-10 | 2005-07-26 | Asm Nutool, Inc. | Plating method and apparatus for controlling deposition on predetermined portions of a workpiece |
AU2002214797B2 (en) * | 2000-11-08 | 2007-08-30 | Chang, Chak Man Thomas | Plasma electroplating |
AUPR129900A0 (en) * | 2000-11-08 | 2000-11-30 | Chang, Chak Man Thomas | Plasma electroplating |
US20040170753A1 (en) * | 2000-12-18 | 2004-09-02 | Basol Bulent M. | Electrochemical mechanical processing using low temperature process environment |
US7172497B2 (en) * | 2001-01-05 | 2007-02-06 | Asm Nutool, Inc. | Fabrication of semiconductor interconnect structures |
US20030085113A1 (en) * | 2001-05-10 | 2003-05-08 | Andrews Edgar. H. | Process and apparatus for cleaning and/or coating metal surfaces using electro-plasma technology |
US7452454B2 (en) | 2001-10-02 | 2008-11-18 | Henkel Kgaa | Anodized coating over aluminum and aluminum alloy coated substrates |
US7569132B2 (en) * | 2001-10-02 | 2009-08-04 | Henkel Kgaa | Process for anodically coating an aluminum substrate with ceramic oxides prior to polytetrafluoroethylene or silicone coating |
US7820300B2 (en) | 2001-10-02 | 2010-10-26 | Henkel Ag & Co. Kgaa | Article of manufacture and process for anodically coating an aluminum substrate with ceramic oxides prior to organic or inorganic coating |
US7578921B2 (en) | 2001-10-02 | 2009-08-25 | Henkel Kgaa | Process for anodically coating aluminum and/or titanium with ceramic oxides |
US6916414B2 (en) | 2001-10-02 | 2005-07-12 | Henkel Kommanditgesellschaft Auf Aktien | Light metal anodization |
AUPS220302A0 (en) * | 2002-05-08 | 2002-06-06 | Chang, Chak Man Thomas | A plasma formed within bubbles in an aqueous medium and uses therefore |
KR100913151B1 (ko) * | 2002-11-21 | 2009-08-19 | 주식회사 포스코 | 펄스 레이저 유기 충격파를 이용한 금속표면 세정방법 및세정장치 |
US7648622B2 (en) | 2004-02-27 | 2010-01-19 | Novellus Systems, Inc. | System and method for electrochemical mechanical polishing |
EP1745247B1 (en) | 2004-04-23 | 2015-11-11 | Philip Morris Products S.a.s. | Aerosol generators and methods for producing aerosols |
US20060086622A1 (en) * | 2004-10-21 | 2006-04-27 | Trust Sterile Services Ltd. | Apparatus and method for electrolytic cleaning |
US8500985B2 (en) | 2006-07-21 | 2013-08-06 | Novellus Systems, Inc. | Photoresist-free metal deposition |
US9701177B2 (en) | 2009-04-02 | 2017-07-11 | Henkel Ag & Co. Kgaa | Ceramic coated automotive heat exchanger components |
JP5569259B2 (ja) * | 2010-08-26 | 2014-08-13 | Jfeスチール株式会社 | 表面改質された導電性材料の製造方法 |
IN2014KN01651A (el) * | 2012-02-24 | 2015-10-23 | Jfe Steel Corp | |
JP5891845B2 (ja) * | 2012-02-24 | 2016-03-23 | Jfeスチール株式会社 | 表面処理鋼板の製造方法 |
ITMO20130089A1 (it) * | 2013-04-05 | 2014-10-06 | Metaly S R L | Procedimento di elettromarcatura e decorazione di superficie metalliche e dispositivo relativo |
US9243342B2 (en) * | 2013-08-09 | 2016-01-26 | Cap Technologies, Llc | Metal cleaning and deposition process for coiled tubing using electro plasma |
CN103484928B (zh) * | 2013-10-09 | 2016-03-23 | 电子科技大学 | 一种基于等离子体的钢铁制品除锈抛光方法 |
JP6087801B2 (ja) * | 2013-12-18 | 2017-03-01 | 三菱日立パワーシステムズ株式会社 | 金属部材の脱塩方法及び装置 |
US10400350B1 (en) * | 2016-04-20 | 2019-09-03 | IBC Materials & Technologies, Inc. | Method and apparatus for removing paint on metallic components |
US10907265B2 (en) * | 2016-08-04 | 2021-02-02 | Rochester Institute Of Technology | Flow-regulated growth of nanotubes |
CN115198069B (zh) * | 2022-06-29 | 2023-12-01 | 浙江巴顿焊接技术研究院 | 一种等离子体电解热处理方法 |
CN115506002B (zh) * | 2022-09-19 | 2023-07-14 | 张家港红东设备制造有限公司 | 酸洗电极对、电极组、电极装置及酸洗电极位置调整方法 |
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FR892919A (fr) * | 1942-03-19 | 1944-05-24 | Norsk Kjemikalie As | Procédé et dispositif de nettoyage des surfaces métalliques |
FR1500185A (fr) * | 1966-08-08 | 1967-11-03 | Ct De Rech S Du Fer Blanc | Procédé d'étamage électrolytique d'un feuillard d'acier |
CH531910A (fr) * | 1970-07-08 | 1972-12-31 | Battelle Memorial Institute | Procédé de décapage de tôle oxydée et installation pour la mise en oeuvre de ce procédé |
US3834999A (en) * | 1971-04-15 | 1974-09-10 | Atlas Technology Corp | Electrolytic production of glassy layers on metals |
CH527912A (fr) * | 1971-07-16 | 1972-09-15 | Prochimie Engineering | Machine pour le placage électrolytique d'au moins une zone d'une pièce conductrice |
DE2228424C3 (de) * | 1972-06-10 | 1981-02-26 | Hoechst Ag, 6000 Frankfurt | Verfahren zum Erzeugen einer lithographischen Oberfläche auf einem Aluminiumband durch Elektrolyse |
GB1399710A (en) * | 1972-11-08 | 1975-07-02 | Electricity Council | Electrolytic cleaning of metal surfaces |
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SU718504A1 (ru) * | 1976-03-10 | 1980-02-29 | Уральский научно-исследовательский институт трубной промышленности | Устройство дл электрохимической обработки полостей длинномерных изделий |
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CA1165271A (en) * | 1979-03-21 | 1984-04-10 | Richard C. Avellone | Apparatus and method for plating one or both sides of metallic strip |
JPS56102590A (en) * | 1979-08-09 | 1981-08-17 | Koichi Shimamura | Method and device for plating of microarea |
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US4304641A (en) * | 1980-11-24 | 1981-12-08 | International Business Machines Corporation | Rotary electroplating cell with controlled current distribution |
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US4374719A (en) * | 1982-03-19 | 1983-02-22 | United States Steel Corporation | System for electrolytic cleaning of metal wire in loop form |
US4405432A (en) * | 1982-10-22 | 1983-09-20 | National Semiconductor Corporation | Plating head |
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EP0406417A4 (en) * | 1988-12-26 | 1991-01-23 | Slavyansky Filial Vsesojuznogo Nauchno-Issledovatelskogo I Proektno-Konstruktorskogo Instituta Metallurgicheskogo | Installation for continuous production of wire from wire rod |
DE4031234C2 (de) * | 1990-10-04 | 1994-02-03 | Gewerk Keramchemie | Verfahren und Vorrichtung zur Oberflächenbehandlung von bandförmigem Behandlungsgut |
US5232563A (en) * | 1992-07-27 | 1993-08-03 | Motorola, Inc. | Method of cleaning a semiconductor wafer |
IT1265263B1 (it) * | 1993-12-09 | 1996-10-31 | Dario Felisari | Procedimento di lavaggio e condizionamento superficiale ottenuto attraverso un processo di iper-anodizzazione di leghe ossidabili |
US5531874A (en) * | 1994-06-17 | 1996-07-02 | International Business Machines Corporation | Electroetching tool using localized application of channelized flow of electrolyte |
-
1996
- 1996-03-20 RU RU9696104583A patent/RU2077611C1/ru active
- 1996-04-23 WO PCT/RU1996/000096 patent/WO1997035050A1/ru active Application Filing
- 1996-08-30 BR BR9612562-4A patent/BR9612562A/pt active Search and Examination
- 1996-08-30 CA CA002253311A patent/CA2253311A1/en not_active Abandoned
- 1996-08-30 EP EP96927158A patent/EP0888465A1/en not_active Withdrawn
- 1996-08-30 BR BR9612561-6A patent/BR9612561A/pt not_active Application Discontinuation
- 1996-08-30 PT PT96927159T patent/PT904428E/pt unknown
- 1996-08-30 DK DK96927159T patent/DK0904428T3/da active
- 1996-08-30 JP JP09533282A patent/JP2001501674A/ja active Pending
- 1996-08-30 PL PL96329001A patent/PL329001A1/xx unknown
- 1996-08-30 DE DE69608579T patent/DE69608579T2/de not_active Expired - Fee Related
- 1996-08-30 WO PCT/IB1996/000877 patent/WO1997035052A1/en not_active Application Discontinuation
- 1996-08-30 KR KR1019980707392A patent/KR20000064675A/ko not_active Application Discontinuation
- 1996-08-30 WO PCT/IB1996/000876 patent/WO1997035051A1/en not_active Application Discontinuation
- 1996-08-30 CZ CZ19982986A patent/CZ290256B6/cs not_active IP Right Cessation
- 1996-08-30 AU AU67081/96A patent/AU720588B2/en not_active Ceased
- 1996-08-30 CA CA002253214A patent/CA2253214A1/en not_active Abandoned
- 1996-08-30 KR KR1019980707391A patent/KR20000064674A/ko not_active Application Discontinuation
- 1996-08-30 PL PL96329002A patent/PL329002A1/xx unknown
- 1996-08-30 JP JP53328197A patent/JP2001508122A/ja active Pending
- 1996-08-30 AT AT96927159T patent/ATE193337T1/de not_active IP Right Cessation
- 1996-08-30 AU AU67082/96A patent/AU720586B2/en not_active Ceased
- 1996-08-30 EP EP96927159A patent/EP0904428B1/en not_active Expired - Lifetime
- 1996-08-30 ES ES96927159T patent/ES2149491T3/es not_active Expired - Lifetime
- 1996-08-30 CZ CZ19982987A patent/CZ290299B6/cs not_active IP Right Cessation
- 1996-09-03 US US08/706,914 patent/US5700366A/en not_active Expired - Fee Related
-
2000
- 2000-08-23 GR GR20000401929T patent/GR3034242T3/el not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU720588B2 (en) | 2000-06-08 |
AU6708196A (en) | 1997-10-10 |
ES2149491T3 (es) | 2000-11-01 |
PT904428E (pt) | 2000-11-30 |
PL329002A1 (en) | 1999-03-01 |
DE69608579D1 (de) | 2000-06-29 |
EP0904428A1 (en) | 1999-03-31 |
RU2077611C1 (ru) | 1997-04-20 |
ATE193337T1 (de) | 2000-06-15 |
AU720586B2 (en) | 2000-06-08 |
AU6708296A (en) | 1997-10-10 |
BR9612562A (pt) | 1999-12-28 |
CA2253311A1 (en) | 1997-09-25 |
KR20000064675A (ko) | 2000-11-06 |
PL329001A1 (en) | 1999-03-01 |
EP0888465A1 (en) | 1999-01-07 |
WO1997035051A1 (en) | 1997-09-25 |
KR20000064674A (ko) | 2000-11-06 |
DK0904428T3 (da) | 2000-10-09 |
CZ298698A3 (cs) | 1999-04-14 |
JP2001508122A (ja) | 2001-06-19 |
WO1997035052A1 (en) | 1997-09-25 |
DE69608579T2 (de) | 2001-01-18 |
CZ298798A3 (cs) | 1999-04-14 |
WO1997035050A1 (fr) | 1997-09-25 |
EP0904428B1 (en) | 2000-05-24 |
US5700366A (en) | 1997-12-23 |
CZ290299B6 (cs) | 2002-07-17 |
JP2001501674A (ja) | 2001-02-06 |
BR9612561A (pt) | 1999-12-28 |
CZ290256B6 (cs) | 2002-06-12 |
CA2253214A1 (en) | 1997-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ML | Lapse due to non-payment of fees |