AUPS220302A0 - A plasma formed within bubbles in an aqueous medium and uses therefore - Google Patents

A plasma formed within bubbles in an aqueous medium and uses therefore

Info

Publication number
AUPS220302A0
AUPS220302A0 AUPS2203A AUPS220302A AUPS220302A0 AU PS220302 A0 AUPS220302 A0 AU PS220302A0 AU PS2203 A AUPS2203 A AU PS2203A AU PS220302 A AUPS220302 A AU PS220302A AU PS220302 A0 AUPS220302 A0 AU PS220302A0
Authority
AU
Australia
Prior art keywords
bubbles
aqueous medium
plasma formed
plasma
aqueous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AUPS2203A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHANG C M T
Original Assignee
CHANG C M T
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHANG C M T filed Critical CHANG C M T
Priority to AUPS2203A priority Critical patent/AUPS220302A0/en
Publication of AUPS220302A0 publication Critical patent/AUPS220302A0/en
Priority to AU2003221634A priority patent/AU2003221634A1/en
Priority to PCT/AU2003/000549 priority patent/WO2003096767A1/en
Priority to CNA038104156A priority patent/CN1653865A/en
Priority to GB0425109A priority patent/GB2405255B/en
Priority to US10/513,703 priority patent/US20060060464A1/en
Priority to CA002483753A priority patent/CA2483753A1/en
Priority to JP2004504582A priority patent/JP2005529455A/en
Priority to GB0611707A priority patent/GB2424757B/en
Priority to AU2009200889A priority patent/AU2009200889A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/247—Generating plasma using discharges in liquid media
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/15—Ambient air; Ozonisers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/30—Wastewater or sewage treatment systems using renewable energies
    • Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Food Preservation Except Freezing, Refrigeration, And Drying (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Physical Water Treatments (AREA)
  • Hydrogen, Water And Hydrids (AREA)
  • Fire-Extinguishing Compositions (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Manufacture And Refinement Of Metals (AREA)
AUPS2203A 2002-05-08 2002-05-08 A plasma formed within bubbles in an aqueous medium and uses therefore Abandoned AUPS220302A0 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
AUPS2203A AUPS220302A0 (en) 2002-05-08 2002-05-08 A plasma formed within bubbles in an aqueous medium and uses therefore
GB0611707A GB2424757B (en) 2002-05-08 2003-05-08 A plasma formed in an aqueous liquid
GB0425109A GB2405255B (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
PCT/AU2003/000549 WO2003096767A1 (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
CNA038104156A CN1653865A (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
AU2003221634A AU2003221634A1 (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
US10/513,703 US20060060464A1 (en) 2002-05-08 2003-05-08 Plasma formed in a fluid
CA002483753A CA2483753A1 (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
JP2004504582A JP2005529455A (en) 2002-05-08 2003-05-08 Plasma created in fluid
AU2009200889A AU2009200889A1 (en) 2002-05-08 2009-03-06 A plasma formed in a fluid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AUPS2203A AUPS220302A0 (en) 2002-05-08 2002-05-08 A plasma formed within bubbles in an aqueous medium and uses therefore

Publications (1)

Publication Number Publication Date
AUPS220302A0 true AUPS220302A0 (en) 2002-06-06

Family

ID=3835776

Family Applications (3)

Application Number Title Priority Date Filing Date
AUPS2203A Abandoned AUPS220302A0 (en) 2002-05-08 2002-05-08 A plasma formed within bubbles in an aqueous medium and uses therefore
AU2003221634A Abandoned AU2003221634A1 (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
AU2009200889A Abandoned AU2009200889A1 (en) 2002-05-08 2009-03-06 A plasma formed in a fluid

Family Applications After (2)

Application Number Title Priority Date Filing Date
AU2003221634A Abandoned AU2003221634A1 (en) 2002-05-08 2003-05-08 A plasma formed in a fluid
AU2009200889A Abandoned AU2009200889A1 (en) 2002-05-08 2009-03-06 A plasma formed in a fluid

Country Status (7)

Country Link
US (1) US20060060464A1 (en)
JP (1) JP2005529455A (en)
CN (1) CN1653865A (en)
AU (3) AUPS220302A0 (en)
CA (1) CA2483753A1 (en)
GB (2) GB2405255B (en)
WO (1) WO2003096767A1 (en)

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CN112777694A (en) * 2021-01-13 2021-05-11 西安交通大学 High-voltage discharge device for high-conductivity wastewater treatment
CN117030531A (en) * 2023-08-14 2023-11-10 中国矿业大学 Underground lining type cave hydrogen storage warehouse bedding gas concentration monitoring system

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