GB2244349A - Method for manufacturing a mask - Google Patents

Method for manufacturing a mask Download PDF

Info

Publication number
GB2244349A
GB2244349A GB9021149A GB9021149A GB2244349A GB 2244349 A GB2244349 A GB 2244349A GB 9021149 A GB9021149 A GB 9021149A GB 9021149 A GB9021149 A GB 9021149A GB 2244349 A GB2244349 A GB 2244349A
Authority
GB
United Kingdom
Prior art keywords
mask
phase shift
region
mask plate
photosensitive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB9021149A
Other languages
English (en)
Other versions
GB9021149D0 (en
Inventor
Yong-Hyeon Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9021149D0 publication Critical patent/GB9021149D0/en
Publication of GB2244349A publication Critical patent/GB2244349A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
GB9021149A 1990-05-25 1990-09-28 Method for manufacturing a mask Withdrawn GB2244349A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900007607A KR920009369B1 (ko) 1990-05-25 1990-05-25 마스크의 제작방법

Publications (2)

Publication Number Publication Date
GB9021149D0 GB9021149D0 (en) 1990-11-14
GB2244349A true GB2244349A (en) 1991-11-27

Family

ID=19299430

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9021149A Withdrawn GB2244349A (en) 1990-05-25 1990-09-28 Method for manufacturing a mask

Country Status (6)

Country Link
JP (1) JPH0431858A (it)
KR (1) KR920009369B1 (it)
DE (1) DE4031413A1 (it)
FR (1) FR2662518A1 (it)
GB (1) GB2244349A (it)
IT (1) IT9021589A1 (it)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0501696A1 (en) * 1991-02-27 1992-09-02 AT&T Corp. Single-alignment-level lithographic technique for achieving self-aligned features
US5244759A (en) * 1991-02-27 1993-09-14 At&T Bell Laboratories Single-alignment-level lithographic technique for achieving self-aligned features

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2500050B2 (ja) * 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション リム型の位相シフト・マスクの形成方法
KR100532382B1 (ko) * 1998-05-26 2006-01-27 삼성전자주식회사 반도체장치 제조용 림형 위상 반전 마스크 및그 제조방법
KR100688562B1 (ko) * 2005-07-25 2007-03-02 삼성전자주식회사 림 타입 포토 마스크의 제조방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0383534A2 (en) * 1989-02-13 1990-08-22 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090924B1 (en) * 1982-04-05 1987-11-11 International Business Machines Corporation Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
JPH0690504B2 (ja) * 1985-06-21 1994-11-14 株式会社日立製作所 ホトマスクの製造方法
CA1313792C (en) * 1986-02-28 1993-02-23 Junji Hirokane Method of manufacturing photo-mask and photo-mask manufactured thereby
JPH02211451A (ja) * 1989-02-13 1990-08-22 Toshiba Corp 露光マスク，露光マスクの製造方法及びこれを用いた露光方法
EP0653679B1 (en) * 1989-04-28 2002-08-21 Fujitsu Limited Mask, mask producing method and pattern forming method using mask
EP0437376B1 (en) * 1990-01-12 1997-03-19 Sony Corporation Phase shifting masks and methods of manufacture
JPH03269531A (ja) * 1990-03-20 1991-12-02 Sony Corp 位相シフトマスクの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0383534A2 (en) * 1989-02-13 1990-08-22 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0501696A1 (en) * 1991-02-27 1992-09-02 AT&T Corp. Single-alignment-level lithographic technique for achieving self-aligned features
US5244759A (en) * 1991-02-27 1993-09-14 At&T Bell Laboratories Single-alignment-level lithographic technique for achieving self-aligned features

Also Published As

Publication number Publication date
IT9021589A1 (it) 1991-11-26
DE4031413A1 (de) 1991-11-28
GB9021149D0 (en) 1990-11-14
JPH0431858A (ja) 1992-02-04
KR910020802A (ko) 1991-12-20
KR920009369B1 (ko) 1992-10-15
FR2662518A1 (fr) 1991-11-29
IT9021589A0 (it) 1990-09-27

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)