JPH0431858A - マスクの製作方法 - Google Patents

マスクの製作方法

Info

Publication number
JPH0431858A
JPH0431858A JP2248344A JP24834490A JPH0431858A JP H0431858 A JPH0431858 A JP H0431858A JP 2248344 A JP2248344 A JP 2248344A JP 24834490 A JP24834490 A JP 24834490A JP H0431858 A JPH0431858 A JP H0431858A
Authority
JP
Japan
Prior art keywords
mask
phase inversion
photoresist film
etching
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2248344A
Other languages
English (en)
Japanese (ja)
Inventor
Yong-Hyon Kim
金　容顯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of JPH0431858A publication Critical patent/JPH0431858A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2248344A 1990-05-25 1990-09-18 マスクの製作方法 Pending JPH0431858A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR90-7607 1990-05-25
KR1019900007607A KR920009369B1 (ko) 1990-05-25 1990-05-25 마스크의 제작방법

Publications (1)

Publication Number Publication Date
JPH0431858A true JPH0431858A (ja) 1992-02-04

Family

ID=19299430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2248344A Pending JPH0431858A (ja) 1990-05-25 1990-09-18 マスクの製作方法

Country Status (6)

Country Link
JP (1) JPH0431858A (it)
KR (1) KR920009369B1 (it)
DE (1) DE4031413A1 (it)
FR (1) FR2662518A1 (it)
GB (1) GB2244349A (it)
IT (1) IT9021589A1 (it)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07140633A (ja) * 1992-11-13 1995-06-02 Internatl Business Mach Corp <Ibm> リム型の位相シフト・マスクの形成方法
KR100532382B1 (ko) * 1998-05-26 2006-01-27 삼성전자주식회사 반도체장치 제조용 림형 위상 반전 마스크 및그 제조방법

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2641362B2 (ja) * 1991-02-27 1997-08-13 エイ・ティ・アンド・ティ・コーポレーション リソグラフィー方法および位相シフトマスクの作製方法
US5244759A (en) * 1991-02-27 1993-09-14 At&T Bell Laboratories Single-alignment-level lithographic technique for achieving self-aligned features
KR100688562B1 (ko) * 2005-07-25 2007-03-02 삼성전자주식회사 림 타입 포토 마스크의 제조방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02211451A (ja) * 1989-02-13 1990-08-22 Toshiba Corp 露光マスク，露光マスクの製造方法及びこれを用いた露光方法
JPH03269531A (ja) * 1990-03-20 1991-12-02 Sony Corp 位相シフトマスクの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090924B1 (en) * 1982-04-05 1987-11-11 International Business Machines Corporation Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
JPH0690504B2 (ja) * 1985-06-21 1994-11-14 株式会社日立製作所 ホトマスクの製造方法
CA1313792C (en) * 1986-02-28 1993-02-23 Junji Hirokane Method of manufacturing photo-mask and photo-mask manufactured thereby
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
EP0653679B1 (en) * 1989-04-28 2002-08-21 Fujitsu Limited Mask, mask producing method and pattern forming method using mask
EP0437376B1 (en) * 1990-01-12 1997-03-19 Sony Corporation Phase shifting masks and methods of manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02211451A (ja) * 1989-02-13 1990-08-22 Toshiba Corp 露光マスク，露光マスクの製造方法及びこれを用いた露光方法
JPH03269531A (ja) * 1990-03-20 1991-12-02 Sony Corp 位相シフトマスクの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07140633A (ja) * 1992-11-13 1995-06-02 Internatl Business Mach Corp <Ibm> リム型の位相シフト・マスクの形成方法
KR100532382B1 (ko) * 1998-05-26 2006-01-27 삼성전자주식회사 반도체장치 제조용 림형 위상 반전 마스크 및그 제조방법

Also Published As

Publication number Publication date
IT9021589A1 (it) 1991-11-26
DE4031413A1 (de) 1991-11-28
GB9021149D0 (en) 1990-11-14
KR910020802A (ko) 1991-12-20
KR920009369B1 (ko) 1992-10-15
FR2662518A1 (fr) 1991-11-29
GB2244349A (en) 1991-11-27
IT9021589A0 (it) 1990-09-27

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