IT9021589A1 - Metodo per la fabbricazione di una maschera. - Google Patents

Metodo per la fabbricazione di una maschera.

Info

Publication number
IT9021589A1
IT9021589A1 IT021589A IT2158990A IT9021589A1 IT 9021589 A1 IT9021589 A1 IT 9021589A1 IT 021589 A IT021589 A IT 021589A IT 2158990 A IT2158990 A IT 2158990A IT 9021589 A1 IT9021589 A1 IT 9021589A1
Authority
IT
Italy
Prior art keywords
mask
manufacture
Prior art date
Application number
IT021589A
Other languages
English (en)
Other versions
IT9021589A0 (it
Inventor
Yong-Hyeon Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of IT9021589A0 publication Critical patent/IT9021589A0/it
Publication of IT9021589A1 publication Critical patent/IT9021589A1/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
IT021589A 1990-05-25 1990-09-27 Metodo per la fabbricazione di una maschera. IT9021589A1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900007607A KR920009369B1 (ko) 1990-05-25 1990-05-25 마스크의 제작방법

Publications (2)

Publication Number Publication Date
IT9021589A0 IT9021589A0 (it) 1990-09-27
IT9021589A1 true IT9021589A1 (it) 1991-11-26

Family

ID=19299430

Family Applications (1)

Application Number Title Priority Date Filing Date
IT021589A IT9021589A1 (it) 1990-05-25 1990-09-27 Metodo per la fabbricazione di una maschera.

Country Status (6)

Country Link
JP (1) JPH0431858A (it)
KR (1) KR920009369B1 (it)
DE (1) DE4031413A1 (it)
FR (1) FR2662518A1 (it)
GB (1) GB2244349A (it)
IT (1) IT9021589A1 (it)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5244759A (en) * 1991-02-27 1993-09-14 At&T Bell Laboratories Single-alignment-level lithographic technique for achieving self-aligned features
JP2641362B2 (ja) * 1991-02-27 1997-08-13 エイ・ティ・アンド・ティ・コーポレーション リソグラフィー方法および位相シフトマスクの作製方法
JP2500050B2 (ja) * 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション リム型の位相シフト・マスクの形成方法
KR100532382B1 (ko) * 1998-05-26 2006-01-27 삼성전자주식회사 반도체장치 제조용 림형 위상 반전 마스크 및그 제조방법
KR100688562B1 (ko) * 2005-07-25 2007-03-02 삼성전자주식회사 림 타입 포토 마스크의 제조방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090924B1 (en) * 1982-04-05 1987-11-11 International Business Machines Corporation Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
JPH0690504B2 (ja) * 1985-06-21 1994-11-14 株式会社日立製作所 ホトマスクの製造方法
CA1313792C (en) * 1986-02-28 1993-02-23 Junji Hirokane Method of manufacturing photo-mask and photo-mask manufactured thereby
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
JPH02211451A (ja) * 1989-02-13 1990-08-22 Toshiba Corp 露光マスク，露光マスクの製造方法及びこれを用いた露光方法
EP0653679B1 (en) * 1989-04-28 2002-08-21 Fujitsu Limited Mask, mask producing method and pattern forming method using mask
EP0730200A3 (en) * 1990-01-12 1997-01-22 Sony Corp Phase shift mask and manufacturing method
JPH03269531A (ja) * 1990-03-20 1991-12-02 Sony Corp 位相シフトマスクの製造方法

Also Published As

Publication number Publication date
JPH0431858A (ja) 1992-02-04
GB2244349A (en) 1991-11-27
IT9021589A0 (it) 1990-09-27
GB9021149D0 (en) 1990-11-14
KR920009369B1 (ko) 1992-10-15
FR2662518A1 (fr) 1991-11-29
DE4031413A1 (de) 1991-11-28
KR910020802A (ko) 1991-12-20

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Legal Events

Date Code Title Description
0002 Rejected