GB9021149D0 - Method for manufacturing a mask - Google Patents

Method for manufacturing a mask

Info

Publication number
GB9021149D0
GB9021149D0 GB909021149A GB9021149A GB9021149D0 GB 9021149 D0 GB9021149 D0 GB 9021149D0 GB 909021149 A GB909021149 A GB 909021149A GB 9021149 A GB9021149 A GB 9021149A GB 9021149 D0 GB9021149 D0 GB 9021149D0
Authority
GB
United Kingdom
Prior art keywords
mask
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB909021149A
Other versions
GB2244349A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9021149D0 publication Critical patent/GB9021149D0/en
Publication of GB2244349A publication Critical patent/GB2244349A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
GB9021149A 1990-05-25 1990-09-28 Method for manufacturing a mask Withdrawn GB2244349A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900007607A KR920009369B1 (en) 1990-05-25 1990-05-25 Manufactuirng method of wafer mask

Publications (2)

Publication Number Publication Date
GB9021149D0 true GB9021149D0 (en) 1990-11-14
GB2244349A GB2244349A (en) 1991-11-27

Family

ID=19299430

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9021149A Withdrawn GB2244349A (en) 1990-05-25 1990-09-28 Method for manufacturing a mask

Country Status (6)

Country Link
JP (1) JPH0431858A (en)
KR (1) KR920009369B1 (en)
DE (1) DE4031413A1 (en)
FR (1) FR2662518A1 (en)
GB (1) GB2244349A (en)
IT (1) IT9021589A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5244759A (en) * 1991-02-27 1993-09-14 At&T Bell Laboratories Single-alignment-level lithographic technique for achieving self-aligned features
JP2641362B2 (en) * 1991-02-27 1997-08-13 エイ・ティ・アンド・ティ・コーポレーション Lithography method and manufacturing method of phase shift mask
JP2500050B2 (en) * 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション Method for forming rim type phase shift mask
KR100532382B1 (en) * 1998-05-26 2006-01-27 삼성전자주식회사 Apparatus of rim typed phase shift mask used for manufacturing semiconductor device & manufacturing method thereof
KR100688562B1 (en) * 2005-07-25 2007-03-02 삼성전자주식회사 Method of manufacturing rim type photo mask

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090924B1 (en) * 1982-04-05 1987-11-11 International Business Machines Corporation Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
JPH0690504B2 (en) * 1985-06-21 1994-11-14 株式会社日立製作所 Photomask manufacturing method
CA1313792C (en) * 1986-02-28 1993-02-23 Junji Hirokane Method of manufacturing photo-mask and photo-mask manufactured thereby
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
JPH02211451A (en) * 1989-02-13 1990-08-22 Toshiba Corp Exposure mask, manufacture of exposure mask, and exposing method using the same
EP0653679B1 (en) * 1989-04-28 2002-08-21 Fujitsu Limited Mask, mask producing method and pattern forming method using mask
EP0730200A3 (en) * 1990-01-12 1997-01-22 Sony Corp Phase shifting masks and methods of manufacture
JPH03269531A (en) * 1990-03-20 1991-12-02 Sony Corp Production of phase shift mask

Also Published As

Publication number Publication date
JPH0431858A (en) 1992-02-04
IT9021589A1 (en) 1991-11-26
GB2244349A (en) 1991-11-27
IT9021589A0 (en) 1990-09-27
KR920009369B1 (en) 1992-10-15
FR2662518A1 (en) 1991-11-29
DE4031413A1 (en) 1991-11-28
KR910020802A (en) 1991-12-20

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)