FR2786939B1 - Laser a semi-conducteur et son procede de fabrication - Google Patents
Laser a semi-conducteur et son procede de fabricationInfo
- Publication number
- FR2786939B1 FR2786939B1 FR9915389A FR9915389A FR2786939B1 FR 2786939 B1 FR2786939 B1 FR 2786939B1 FR 9915389 A FR9915389 A FR 9915389A FR 9915389 A FR9915389 A FR 9915389A FR 2786939 B1 FR2786939 B1 FR 2786939B1
- Authority
- FR
- France
- Prior art keywords
- producing
- same
- semiconductor laser
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2304/00—Special growth methods for semiconductor lasers
- H01S2304/04—MOCVD or MOVPE
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3434—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer comprising at least both As and P as V-compounds
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nanotechnology (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34684298A JP3907854B2 (ja) | 1998-12-07 | 1998-12-07 | 半導体レーザ及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2786939A1 FR2786939A1 (fr) | 2000-06-09 |
FR2786939B1 true FR2786939B1 (fr) | 2006-12-01 |
Family
ID=18386183
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9915389A Expired - Fee Related FR2786939B1 (fr) | 1998-12-07 | 1999-12-07 | Laser a semi-conducteur et son procede de fabrication |
Country Status (4)
Country | Link |
---|---|
US (1) | US6512783B1 (fr) |
JP (1) | JP3907854B2 (fr) |
DE (1) | DE19958275B4 (fr) |
FR (1) | FR2786939B1 (fr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4537549B2 (ja) * | 2000-08-08 | 2010-09-01 | 富士通株式会社 | 化合物半導体装置の製造方法 |
JP3765987B2 (ja) * | 2001-02-15 | 2006-04-12 | ユーディナデバイス株式会社 | 半導体装置の製造方法 |
JP3718129B2 (ja) * | 2001-02-28 | 2005-11-16 | アンリツ株式会社 | 半導体レーザ及びその製造方法 |
US7333733B2 (en) * | 2002-10-25 | 2008-02-19 | The University Of Connecticut | Optoelectronic clock generator producing high frequency optoelectronic pulse trains with variable frequency and variable duty cycle and low jitter |
JP4866550B2 (ja) * | 2002-12-20 | 2012-02-01 | クリー インコーポレイテッド | 自己整合型の半導体メサおよびコンタクト層を有する半導体デバイス、および、該デバイスに関連する構造の形成方法 |
US7345309B2 (en) * | 2004-08-31 | 2008-03-18 | Lockheed Martin Corporation | SiC metal semiconductor field-effect transistor |
JP2007049007A (ja) * | 2005-08-11 | 2007-02-22 | Mitsubishi Electric Corp | 半導体レーザ素子およびその製造方法 |
US7393054B2 (en) * | 2005-11-17 | 2008-07-01 | Lear Corporation | Self adjusting seatback system |
JP5660940B2 (ja) * | 2010-04-27 | 2015-01-28 | 住友電工デバイス・イノベーション株式会社 | 光半導体装置の製造方法 |
JP5545670B2 (ja) | 2010-04-27 | 2014-07-09 | 住友電工デバイス・イノベーション株式会社 | 光半導体装置およびその製造方法 |
JP2012248812A (ja) * | 2011-05-31 | 2012-12-13 | Sumitomo Electric Ind Ltd | 半導体光集積素子の製造方法 |
JP6485341B2 (ja) * | 2015-12-10 | 2019-03-20 | 住友電気工業株式会社 | 量子カスケード半導体レーザを作製する方法、量子カスケード半導体レーザ |
JP6897928B2 (ja) * | 2016-01-14 | 2021-07-07 | 住友電工デバイス・イノベーション株式会社 | 光半導体素子の製造方法および光半導体素子 |
CN109510062A (zh) * | 2018-12-28 | 2019-03-22 | 全磊光电股份有限公司 | 掩埋dfb激光器及其制备方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4841536A (en) * | 1985-04-12 | 1989-06-20 | Hitachi, Ltd. | Semiconductor laser devices |
US5260230A (en) * | 1991-07-12 | 1993-11-09 | Nippon Telegraph And Telephone Corporation | Method of manufacturing buried heterostructure semiconductor laser |
JP3034688B2 (ja) | 1992-04-27 | 2000-04-17 | 株式会社日立製作所 | 半導体装置 |
JP2823476B2 (ja) * | 1992-05-14 | 1998-11-11 | 三菱電機株式会社 | 半導体レーザおよびその製造方法 |
US5441912A (en) * | 1993-07-28 | 1995-08-15 | The Furukawa Electric Co., Ltd. | Method of manufacturing a laser diode |
JP3729210B2 (ja) | 1994-07-26 | 2005-12-21 | 富士通株式会社 | 半導体装置の製造方法 |
KR0146714B1 (ko) * | 1994-08-08 | 1998-11-02 | 양승택 | 평면 매립형 레이저 다이오드의 제조방법 |
JP3421140B2 (ja) | 1994-08-23 | 2003-06-30 | 三菱電機株式会社 | 半導体レーザ装置の製造方法,および半導体レーザ装置 |
US5764842A (en) * | 1995-03-23 | 1998-06-09 | Hitachi, Ltd. | Semiconductor guided-wave optical device and method of fabricating thereof |
JPH09237940A (ja) * | 1995-12-28 | 1997-09-09 | Mitsubishi Electric Corp | 半導体装置,及びその製造方法 |
-
1998
- 1998-12-07 JP JP34684298A patent/JP3907854B2/ja not_active Expired - Fee Related
-
1999
- 1999-12-03 DE DE19958275A patent/DE19958275B4/de not_active Expired - Fee Related
- 1999-12-03 US US09/453,546 patent/US6512783B1/en not_active Expired - Lifetime
- 1999-12-07 FR FR9915389A patent/FR2786939B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20030012240A1 (en) | 2003-01-16 |
DE19958275B4 (de) | 2007-12-20 |
JP3907854B2 (ja) | 2007-04-18 |
US6512783B1 (en) | 2003-01-28 |
DE19958275A1 (de) | 2000-09-28 |
FR2786939A1 (fr) | 2000-06-09 |
JP2000174389A (ja) | 2000-06-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2792458B1 (fr) | Dispositif a semi-conducteur et son procede de fabrication | |
FR2775123B1 (fr) | Module thermoelectrique et son procede de fabrication | |
FR2782294B1 (fr) | Instrument d'ecriture perfectionne et son procede de fabrication | |
FR2779131B1 (fr) | Support de pastilles et son procede de fabrication | |
KR960012575A (ko) | 반도체 장치 제조 방법 | |
KR960012574A (ko) | 반도체장치 제조방법 | |
FR2786939B1 (fr) | Laser a semi-conducteur et son procede de fabrication | |
FR2765347B1 (fr) | Reflecteur de bragg en semi-conducteur et procede de fabrication | |
DE69801342D1 (de) | Halbleiterlaser und dazugehöriges Herstellungsverfahren | |
DE69712541T2 (de) | Halbleiterlaser und Herstellungsverfahren | |
FI954241A (fi) | Puolijohdelaitteen valmistusmenetelmä | |
FR2766616B1 (fr) | Procede de fabrication de microstructures metalliques | |
FR2778907B1 (fr) | Ozoniseur et procede de fabrication dudit ozoniseur | |
DE69504170T2 (de) | Laserherstellungsverfahren | |
FR2747895B1 (fr) | Procede de fabrication de casque personnalise | |
FR2736208B1 (fr) | Procede de fabrication de circuits integres | |
FR2731302B1 (fr) | Laser a semi-conducteur et procede de fabrication de celui-ci | |
FR2745826B1 (fr) | Element decoratif pour textiles et son procede de fabrication | |
SG89321A1 (en) | Semiconductor laser and a manufacturing method for the same | |
DE69941860D1 (de) | Halbleiterlaser und Herstellungsverfahren | |
FR2779747B1 (fr) | Procede de fabrication d'un article tricote et article ainsi obtenu | |
FR2786495B1 (fr) | Procede de fabrication de polyester | |
FR2723520B1 (fr) | Piece de joaillerie et son procede de fabrication | |
FR2709612B1 (fr) | Laser à semi-conducteur et son procédé de fabrication. | |
FR2763005B1 (fr) | Procede de fabrication d'emulsions e/h/e multiples |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20140829 |