FR2779131B1 - Support de pastilles et son procede de fabrication - Google Patents

Support de pastilles et son procede de fabrication

Info

Publication number
FR2779131B1
FR2779131B1 FR9906774A FR9906774A FR2779131B1 FR 2779131 B1 FR2779131 B1 FR 2779131B1 FR 9906774 A FR9906774 A FR 9906774A FR 9906774 A FR9906774 A FR 9906774A FR 2779131 B1 FR2779131 B1 FR 2779131B1
Authority
FR
France
Prior art keywords
tablets
manufacturing
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR9906774A
Other languages
English (en)
Other versions
FR2779131A1 (fr
Inventor
Sanjiv M Bhatt
Shawn Eggum
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fluoroware Inc
Original Assignee
Fluoroware Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26776719&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FR2779131(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fluoroware Inc filed Critical Fluoroware Inc
Publication of FR2779131A1 publication Critical patent/FR2779131A1/fr
Application granted granted Critical
Publication of FR2779131B1 publication Critical patent/FR2779131B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67383—Closed carriers characterised by substrate supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/16—Making multilayered or multicoloured articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0037—Other properties
    • B29K2995/0087—Wear resistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/16—Frictional elements, e.g. brake or clutch linings
FR9906774A 1998-05-28 1999-05-28 Support de pastilles et son procede de fabrication Expired - Lifetime FR2779131B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US8720598P 1998-05-28 1998-05-28
US09/317,989 US6428729B1 (en) 1998-05-28 1999-05-25 Composite substrate carrier

Publications (2)

Publication Number Publication Date
FR2779131A1 FR2779131A1 (fr) 1999-12-03
FR2779131B1 true FR2779131B1 (fr) 2002-08-23

Family

ID=26776719

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9906774A Expired - Lifetime FR2779131B1 (fr) 1998-05-28 1999-05-28 Support de pastilles et son procede de fabrication

Country Status (9)

Country Link
US (1) US6428729B1 (fr)
JP (1) JP4150465B2 (fr)
CN (1) CN100556772C (fr)
CA (1) CA2273459A1 (fr)
FR (1) FR2779131B1 (fr)
GB (1) GB2338924B (fr)
IT (1) IT1308059B1 (fr)
MY (1) MY129579A (fr)
SG (1) SG87036A1 (fr)

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US6010008A (en) * 1997-07-11 2000-01-04 Fluoroware, Inc. Transport module
US6808668B2 (en) * 1998-05-28 2004-10-26 Entegris, Inc. Process for fabricating composite substrate carrier
US6871741B2 (en) * 1998-05-28 2005-03-29 Entegris, Inc. Composite substrate carrier
KR100543875B1 (ko) * 1999-05-25 2006-01-23 인티그리스, 인코포레이티드 복합의 기판 캐리어
JP4596681B2 (ja) * 2001-05-23 2010-12-08 信越ポリマー株式会社 収納容器とその製造方法
US20030188990A1 (en) * 2001-11-14 2003-10-09 Bhatt Sanjiv M. Composite kinematic coupling
KR20040062966A (ko) * 2001-11-27 2004-07-09 엔테그리스, 아이엔씨. 정전기 소산 필름을 갖는 반도체 구성요소 취급 장치
WO2003045673A1 (fr) * 2001-11-27 2003-06-05 Entegris, Inc. Moulage a insertion de film polymere presentant des informations
CN1636275A (zh) * 2001-11-27 2005-07-06 诚实公司 具有特性薄膜的半导体元件搬运装置
US6644477B2 (en) * 2002-02-26 2003-11-11 Entegris, Inc. Wafer container cushion system
US7175026B2 (en) 2002-05-03 2007-02-13 Maxtor Corporation Memory disk shipping container with improved contaminant control
US20040074808A1 (en) * 2002-07-05 2004-04-22 Entegris, Inc. Fire retardant wafer carrier
JP4146718B2 (ja) * 2002-12-27 2008-09-10 ミライアル株式会社 薄板支持容器
US20040238623A1 (en) * 2003-05-09 2004-12-02 Wayne Asp Component handling device having a film insert molded RFID tag
US7316325B2 (en) * 2003-11-07 2008-01-08 Entegris, Inc. Substrate container
US20050186378A1 (en) * 2004-02-23 2005-08-25 Bhatt Sanjiv M. Compositions comprising carbon nanotubes and articles formed therefrom
US7328727B2 (en) * 2004-04-18 2008-02-12 Entegris, Inc. Substrate container with fluid-sealing flow passageway
US8652391B2 (en) * 2005-02-03 2014-02-18 Entegris, Inc. Method of forming substrate carriers and articles from compositions comprising carbon nanotubes
EP1883105B8 (fr) * 2005-05-06 2013-03-27 Shin-Etsu Polymer Co., Ltd. Conteneur de stockage de substrat et procédé pour le produire
JP4584023B2 (ja) * 2005-05-17 2010-11-17 信越ポリマー株式会社 基板収納容器及びその製造方法
TW200716302A (en) * 2005-05-24 2007-05-01 Entegris Inc CMP retaining ring
FR2896912B1 (fr) * 2005-12-09 2008-11-28 Alcatel Sa Enceinte etanche pour le transport et le stockage de substrats semi-conducteurs
JP2009543374A (ja) * 2006-07-07 2009-12-03 インテグリス・インコーポレーテッド ウエハカセット
US20080041758A1 (en) * 2006-08-16 2008-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer carrier
JP4920387B2 (ja) * 2006-12-01 2012-04-18 信越半導体株式会社 基板収納容器
EP2122014A4 (fr) * 2007-02-28 2014-09-17 Entegris Inc Système de purge pour un récipient de substrat
TWI363030B (en) * 2009-07-10 2012-05-01 Gudeng Prec Industral Co Ltd Wafer container with top flange structure
EP2866998B1 (fr) 2012-06-28 2021-02-10 Henkel AG & Co. KGaA Procédé de fabrication d'un insert composite
US9117863B1 (en) * 2013-05-16 2015-08-25 Seagate Technology Llc Cassette configurations to support platters having different diameters
JP2015177165A (ja) * 2014-03-18 2015-10-05 ダイセル・エボニック株式会社 フロントオープニングシッピングボックス及びその製造方法
KR20170048429A (ko) * 2014-08-28 2017-05-08 엔테그리스, 아이엔씨. 기판 컨테이너
WO2016046985A1 (fr) 2014-09-26 2016-03-31 ミライアル株式会社 Contenant de stockage de substrat
JP6807310B2 (ja) 2014-12-01 2021-01-06 インテグリス・インコーポレーテッド 基板収納容器の弁アセンブリ
JP6577130B2 (ja) 2015-07-13 2019-09-18 インテグリス・インコーポレーテッド 収納部が強化された基板容器
US10361108B2 (en) 2015-12-14 2019-07-23 Solarcity Corporation Ambidextrous cassette and methods of using same
US10388554B2 (en) 2016-04-06 2019-08-20 Entegris, Inc. Wafer shipper with purge capability
TWI645889B (zh) 2016-06-01 2019-01-01 恩特葛瑞斯股份有限公司 導電過濾裝置
JP6701493B2 (ja) * 2016-07-25 2020-05-27 信越ポリマー株式会社 容器本体の製造方法
JP6672570B2 (ja) * 2017-01-10 2020-03-25 信越ポリマー株式会社 基板収納容器及び基板収納容器の製造方法
KR102495884B1 (ko) 2018-05-07 2023-02-06 엔테그리스, 아이엔씨. 정전기 방전 완화 기능이 통합된 유체 회로
JP7113031B2 (ja) 2018-10-29 2022-08-04 ミライアル株式会社 基板収納容器の成形方法、金型、及び、基板収納容器

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US4269802A (en) * 1976-03-17 1981-05-26 Caterpillar Tractor Co. Process for making dual-material self-bonding lip seal
CH643047A5 (de) * 1978-10-18 1984-05-15 Battenfeld Maschfab Verfahren zum herstellen von fittings fuer rohrverbindungen sowie werkzeug zur ausuebung des verfahrens und nach diesem verfahren hergestelltes fitting.
PL122159B1 (en) * 1979-09-15 1982-06-30 Inst Elektrotechniki High tension overhead-line instulator of plastic materialx and method of manufacturing the samerytykh ustanovok i sposob izgotovlenija plastmassovogo izoljatora vysokogo naprjazhenija dlja otkrytykh ustanovok
US4872554A (en) 1987-07-02 1989-10-10 Fluoroware, Inc. Reinforced carrier with embedded rigid insert
JP2816864B2 (ja) * 1989-07-07 1998-10-27 大塚化学株式会社 搬送用ウエーハバスケット及び収納ケース
US5111936A (en) * 1990-11-30 1992-05-12 Fluoroware Wafer carrier
US5186338A (en) * 1991-07-11 1993-02-16 Eastman Kodak Company Pallet for holding a cassette
US5273159A (en) * 1992-05-26 1993-12-28 Empak, Inc. Wafer suspension box
JP3194209B2 (ja) 1992-11-10 2001-07-30 東京エレクトロン株式会社 洗浄処理装置
KR100293906B1 (ko) * 1992-11-17 2001-11-22 가끼자끼다께요시 수지제박판수납용기
US5564714A (en) * 1993-02-23 1996-10-15 Three Bond Co., Ltd. Rubber-like molded product with support frame
US5686040A (en) * 1993-10-28 1997-11-11 White Cap, Inc. Method for producing closure gaskets
EP0692817B1 (fr) * 1994-07-15 1997-09-24 Fluoroware, Inc. Support pour galette semi-conductrice
JP3145252B2 (ja) 1994-07-29 2001-03-12 淀川化成株式会社 基板支承用側板およびそれを用いたカセット
WO1996009787A1 (fr) 1994-09-26 1996-04-04 Asyst Technologies, Inc. Cassette pour plaquettes ('wafer') a semiconducteurs
JPH092564A (ja) * 1995-06-16 1997-01-07 Nippon Plast Co Ltd ディスクケース
US5706946A (en) 1995-06-26 1998-01-13 Kakizaki Manufacturing Co., Ltd Thin-plate supporting container
US5688570A (en) * 1995-10-13 1997-11-18 Crown Cork & Seal Company, Inc. Method and apparatus for forming a multi-layer preform
DE19542032A1 (de) * 1995-11-10 1997-05-15 Moessner Druckguswerk Gmbh Verfahren zur Herstellung einer Dichtung sowie Preßeinrichtung
US5788082A (en) * 1996-07-12 1998-08-04 Fluoroware, Inc. Wafer carrier
US6010008A (en) * 1997-07-11 2000-01-04 Fluoroware, Inc. Transport module

Also Published As

Publication number Publication date
CN1623864A (zh) 2005-06-08
GB2338924A (en) 2000-01-12
SG87036A1 (en) 2002-03-19
MY129579A (en) 2007-04-30
CA2273459A1 (fr) 1999-11-28
US6428729B1 (en) 2002-08-06
JP4150465B2 (ja) 2008-09-17
JP2000012673A (ja) 2000-01-14
GB9912453D0 (en) 1999-07-28
IT1308059B1 (it) 2001-11-29
GB2338924B (en) 2003-02-19
FR2779131A1 (fr) 1999-12-03
CN100556772C (zh) 2009-11-04
ITTO990450A1 (it) 2000-11-28

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Legal Events

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ST Notification of lapse

Effective date: 20110131

D3 Decision to revoke the decision of lapse

Effective date: 20120214

PLFP Fee payment

Year of fee payment: 18

PLFP Fee payment

Year of fee payment: 19

PLFP Fee payment

Year of fee payment: 20