FR2219446A1 - - Google Patents

Info

Publication number
FR2219446A1
FR2219446A1 FR7405785A FR7405785A FR2219446A1 FR 2219446 A1 FR2219446 A1 FR 2219446A1 FR 7405785 A FR7405785 A FR 7405785A FR 7405785 A FR7405785 A FR 7405785A FR 2219446 A1 FR2219446 A1 FR 2219446A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7405785A
Other versions
FR2219446B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732308830 external-priority patent/DE2308830C3/de
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2219446A1 publication Critical patent/FR2219446A1/fr
Application granted granted Critical
Publication of FR2219446B1 publication Critical patent/FR2219446B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FR7405785A 1973-02-22 1974-02-20 Expired FR2219446B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732308830 DE2308830C3 (de) 1973-02-22 Verfahren zur Herstellung von Reliefstrukturen

Publications (2)

Publication Number Publication Date
FR2219446A1 true FR2219446A1 (fr) 1974-09-20
FR2219446B1 FR2219446B1 (fr) 1977-09-23

Family

ID=5872768

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7405785A Expired FR2219446B1 (fr) 1973-02-22 1974-02-20

Country Status (9)

Country Link
US (1) US3957512A (fr)
JP (1) JPS5530207B2 (fr)
AT (1) AT330469B (fr)
BE (1) BE811380A (fr)
FR (1) FR2219446B1 (fr)
GB (1) GB1467226A (fr)
IT (1) IT1008872B (fr)
LU (1) LU69433A1 (fr)
NL (1) NL177718C (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0304136A2 (fr) * 1987-08-19 1989-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Compositions photosensibles

Families Citing this family (111)

* Cited by examiner, † Cited by third party
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US4414312A (en) * 1980-09-03 1983-11-08 E. I. Du Pont De Nemours & Co. Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger
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US11572442B2 (en) 2020-04-14 2023-02-07 International Business Machines Corporation Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component
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JP2023165095A (ja) 2022-05-02 2023-11-15 信越化学工業株式会社 ネガ型感光性樹脂組成物、パターン形成方法、層間絶縁膜、表面保護膜、及び電子部品

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BE793732A (fr) * 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
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EP0304136A2 (fr) * 1987-08-19 1989-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Compositions photosensibles
EP0304136A3 (en) * 1987-08-19 1990-01-17 Asahi Kasei Kogyo Kabushiki Kaisha Novel photosensitive composition

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DE2308830A1 (de) 1974-08-29
GB1467226A (en) 1977-03-16
NL177718C (nl) 1985-11-01
NL7400931A (fr) 1974-08-26
ATA131474A (de) 1975-09-15
JPS49115541A (fr) 1974-11-05
FR2219446B1 (fr) 1977-09-23
LU69433A1 (fr) 1974-05-29
BE811380A (fr) 1974-06-17
NL177718B (nl) 1985-06-03
IT1008872B (it) 1976-11-30
US3957512A (en) 1976-05-18
AT330469B (de) 1976-07-12
DE2308830B2 (de) 1975-06-26
JPS5530207B2 (fr) 1980-08-09

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