BE811380A - Procede de fabrication de structures en relief - Google Patents

Procede de fabrication de structures en relief

Info

Publication number
BE811380A
BE811380A BE141216A BE141216A BE811380A BE 811380 A BE811380 A BE 811380A BE 141216 A BE141216 A BE 141216A BE 141216 A BE141216 A BE 141216A BE 811380 A BE811380 A BE 811380A
Authority
BE
Belgium
Prior art keywords
relief structures
manufacturing relief
manufacturing
structures
relief
Prior art date
Application number
BE141216A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732308830 external-priority patent/DE2308830C3/de
Application filed filed Critical
Publication of BE811380A publication Critical patent/BE811380A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
BE141216A 1973-02-22 1974-02-21 Procede de fabrication de structures en relief BE811380A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732308830 DE2308830C3 (de) 1973-02-22 Verfahren zur Herstellung von Reliefstrukturen

Publications (1)

Publication Number Publication Date
BE811380A true BE811380A (fr) 1974-06-17

Family

ID=5872768

Family Applications (1)

Application Number Title Priority Date Filing Date
BE141216A BE811380A (fr) 1973-02-22 1974-02-21 Procede de fabrication de structures en relief

Country Status (9)

Country Link
US (1) US3957512A (fr)
JP (1) JPS5530207B2 (fr)
AT (1) AT330469B (fr)
BE (1) BE811380A (fr)
FR (1) FR2219446B1 (fr)
GB (1) GB1467226A (fr)
IT (1) IT1008872B (fr)
LU (1) LU69433A1 (fr)
NL (1) NL177718C (fr)

Families Citing this family (111)

* Cited by examiner, † Cited by third party
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JP6487875B2 (ja) 2016-04-19 2019-03-20 信越化学工業株式会社 テトラカルボン酸ジエステル化合物、ポリイミド前駆体の重合体及びその製造方法、ネガ型感光性樹脂組成物、ポジ型感光性樹脂組成物、パターン形成方法、及び硬化被膜形成方法
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JP6637871B2 (ja) 2016-10-27 2020-01-29 信越化学工業株式会社 テトラカルボン酸ジエステル化合物、ポリイミド前駆体の重合体及びその製造方法、ネガ型感光性樹脂組成物、パターン形成方法、及び硬化被膜形成方法
JP6663380B2 (ja) 2017-03-22 2020-03-11 信越化学工業株式会社 ポリイミド前駆体の重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品
JP6810677B2 (ja) 2017-12-05 2021-01-06 信越化学工業株式会社 新規テトラカルボン酸二無水物、ポリイミド樹脂及びその製造方法、感光性樹脂組成物、パターン形成方法及び硬化被膜形成方法、層間絶縁膜、表面保護膜、電子部品
JP7145126B2 (ja) 2018-08-01 2022-09-30 信越化学工業株式会社 ポリアミド、ポリアミドイミド、ポリイミド構造を含む重合体、感光性樹脂組成物、パターン形成方法、感光性ドライフィルム及び電気・電子部品保護用皮膜
JP7154184B2 (ja) 2019-04-15 2022-10-17 信越化学工業株式会社 ポジ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品
US11572442B2 (en) 2020-04-14 2023-02-07 International Business Machines Corporation Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component
US11333975B2 (en) 2020-04-14 2022-05-17 International Business Machines Corporation Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component
JP2022029427A (ja) 2020-08-04 2022-02-17 信越化学工業株式会社 ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品
KR102418193B1 (ko) 2020-08-28 2022-07-07 주식회사 파이솔루션테크놀로지 감광성 폴리이미드 및 이의 조성물
KR20220089659A (ko) 2020-12-21 2022-06-28 주식회사 파이솔루션테크놀로지 네가티브형 감광성 폴리아믹산 에스테르 공중합체의 제조방법
JP2022137420A (ja) 2021-03-09 2022-09-22 信越化学工業株式会社 ポリイミドを含む重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品
JP2023165095A (ja) 2022-05-02 2023-11-15 信越化学工業株式会社 ネガ型感光性樹脂組成物、パターン形成方法、層間絶縁膜、表面保護膜、及び電子部品

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US3801638A (en) * 1971-03-12 1974-04-02 Gaf Corp Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same
BE793732A (fr) * 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
US3847767A (en) * 1973-03-13 1974-11-12 Grace W R & Co Method of producing a screen printable photocurable solder resist

Also Published As

Publication number Publication date
LU69433A1 (fr) 1974-05-29
ATA131474A (de) 1975-09-15
AT330469B (de) 1976-07-12
US3957512A (en) 1976-05-18
DE2308830B2 (de) 1975-06-26
NL177718C (nl) 1985-11-01
JPS5530207B2 (fr) 1980-08-09
NL7400931A (fr) 1974-08-26
NL177718B (nl) 1985-06-03
JPS49115541A (fr) 1974-11-05
DE2308830A1 (de) 1974-08-29
FR2219446A1 (fr) 1974-09-20
FR2219446B1 (fr) 1977-09-23
GB1467226A (en) 1977-03-16
IT1008872B (it) 1976-11-30

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