FI972733L - Kemiallinen märkäkäsittelylaitteisto - Google Patents

Kemiallinen märkäkäsittelylaitteisto Download PDF

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Publication number
FI972733L
FI972733L FI972733A FI972733A FI972733L FI 972733 L FI972733 L FI 972733L FI 972733 A FI972733 A FI 972733A FI 972733 A FI972733 A FI 972733A FI 972733 L FI972733 L FI 972733L
Authority
FI
Finland
Prior art keywords
processing equipment
wet processing
chemical wet
chemical
equipment
Prior art date
Application number
FI972733A
Other languages
English (en)
Swedish (sv)
Other versions
FI972733A7 (fi
FI972733A0 (fi
Inventor
Johann Durst
Holger Sigel
Werner Schulz
Original Assignee
Steagmicro Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19546990A external-priority patent/DE19546990C2/de
Application filed by Steagmicro Tech Gmbh filed Critical Steagmicro Tech Gmbh
Publication of FI972733A7 publication Critical patent/FI972733A7/fi
Publication of FI972733L publication Critical patent/FI972733L/fi
Publication of FI972733A0 publication Critical patent/FI972733A0/fi

Links

Classifications

    • H10P72/0402—
    • H10P72/3412—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S118/00—Coating apparatus
    • Y10S118/02—Bead coater
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
FI972733A 1995-01-05 1995-12-29 Kemiallinen märkäkäsittelylaitteisto FI972733A0 (fi)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19500239 1995-01-05
DE19546990A DE19546990C2 (de) 1995-01-05 1995-12-15 Anlage zur chemischen Naßbehandlung
PCT/EP1995/005153 WO1996021241A1 (de) 1995-01-05 1995-12-29 Anlage zur chemischen nassbehandlung

Publications (3)

Publication Number Publication Date
FI972733A7 FI972733A7 (fi) 1997-06-25
FI972733L true FI972733L (fi) 1997-06-25
FI972733A0 FI972733A0 (fi) 1997-06-25

Family

ID=26011466

Family Applications (1)

Application Number Title Priority Date Filing Date
FI972733A FI972733A0 (fi) 1995-01-05 1995-12-29 Kemiallinen märkäkäsittelylaitteisto

Country Status (10)

Country Link
US (1) US5902402A (fi)
EP (1) EP0801814B1 (fi)
JP (1) JP3088463B2 (fi)
CN (1) CN1084048C (fi)
AT (1) ATE205017T1 (fi)
CA (1) CA2209339A1 (fi)
DE (4) DE19549487C2 (fi)
FI (1) FI972733A0 (fi)
TW (1) TW399224B (fi)
WO (1) WO1996021241A1 (fi)

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DE19640848C2 (de) * 1996-10-03 1998-07-16 Steag Microtech Gmbh Pliezhaus Verfahren und Vorrichtung zum Behandeln von Substraten
DE19706072C1 (de) 1997-02-17 1998-06-04 Steag Microtech Gmbh Pliezhaus Vorrichtung und Verfahren zum Behandeln von Substraten in einem Fluid-Behälter
AU6327398A (en) * 1997-02-18 1998-09-08 Scp Global Technologies Multiple stage wet processing chamber
DE19832038A1 (de) * 1997-07-17 1999-01-28 Tokyo Electron Ltd Verfahren und Einrichtung zum Reinigen und Trocknen
FR2777210A1 (fr) * 1998-04-10 1999-10-15 Scps Dispositif d'activation conductrice pour structures poreuses
US6216709B1 (en) 1998-09-04 2001-04-17 Komag, Inc. Method for drying a substrate
US6571806B2 (en) 1998-09-04 2003-06-03 Komag, Inc. Method for drying a substrate
US6343425B1 (en) * 1999-05-06 2002-02-05 Intecon Systems, Inc. Measurement and cleaning of elastomeric articles having particulate adhered thereto
WO2000074113A1 (en) 1999-05-27 2000-12-07 Lam Research Corporation Wafer drying apparatus and method
KR100639840B1 (ko) * 2000-02-16 2006-10-27 동경 엘렉트론 주식회사 처리장치
JP2002016038A (ja) * 2000-04-11 2002-01-18 Samsung Electronics Co Ltd 半導体ウェハ洗浄装置及びこれを利用した半導体ウェハ洗浄方法
KR100419561B1 (ko) * 2001-02-01 2004-02-19 에이펫(주) 웨이퍼 세정 및 건조 장치
US6405452B1 (en) * 2001-03-28 2002-06-18 Taiwan Semiconductor Manufacturing Co., Ltd Method and apparatus for drying wafers after wet bench
MY140644A (en) * 2001-04-17 2010-01-15 Komag Inc Method and apparatus for drying a substrate.
DE10122669A1 (de) * 2001-05-10 2002-12-12 Mattson Wet Products Gmbh Vorrichtung zum Nassreinigen von scheibenförmigen Substraten
US6740163B1 (en) * 2001-06-15 2004-05-25 Seagate Technology Llc Photoresist recirculation and viscosity control for dip coating applications
DE10256696A1 (de) * 2002-12-04 2004-06-24 Mattson Wet Products Gmbh Verfahren zum Trocknen von Substraten
US7355437B2 (en) * 2006-03-06 2008-04-08 Altera Corporation Latch-up prevention circuitry for integrated circuits with transistor body biasing
US8137758B2 (en) * 2007-11-08 2012-03-20 Nucor Corporation Dip coating system with stepped apron recovery
US20100215859A1 (en) * 2009-02-20 2010-08-26 David Lee Alexander Portable dip-coating system for applying liquid coating materials, and related methods
US20110186088A1 (en) * 2010-01-31 2011-08-04 Miller Kenneth C Substrate nest with drip remover
US20120306139A1 (en) 2011-06-03 2012-12-06 Arthur Keigler Parallel single substrate processing system holder
DE102013102545A1 (de) * 2012-04-27 2013-10-31 Awt Advanced Wet Technologies Gmbh Verfahren zum Behandeln von zumindest einem Substrat in einem flüssigen Medium
CN104253063B (zh) * 2013-06-28 2017-12-01 上海华虹宏力半导体制造有限公司 一种用于防止晶片偏移掉落的装置
CN103400790B (zh) * 2013-08-14 2016-05-11 上海华力微电子有限公司 湿法化学清洗设备中的传送装置
CN103887151B (zh) * 2014-03-07 2017-02-01 京东方科技集团股份有限公司 一种构图装置和构图方法
US10529606B2 (en) 2014-12-05 2020-01-07 RENA Technologies GmbH Device for treating substrates
US9829249B2 (en) 2015-03-10 2017-11-28 Mei, Llc Wafer dryer apparatus and method
CN106153715A (zh) * 2016-08-31 2016-11-23 南京佳业检测工程有限公司 磁粉探伤机
CN108962720A (zh) * 2017-05-18 2018-12-07 上海新昇半导体科技有限公司 一种硅片的干燥方法
DE102018121708A1 (de) * 2018-09-05 2020-03-05 Vaf Gmbh Reinigungsvorrichtung und Verfahren zum Reinigen eines im Tauchverfahren beschichteten Körpers
CN112844950B (zh) * 2021-01-05 2022-04-08 泰和县祥峰木艺制品有限公司 一种复式房用楼梯支柱上色设备
CN116294548B (zh) * 2023-03-03 2025-06-17 上海至纯洁净系统科技股份有限公司 一种优化摆动型马兰格尼干燥流场的干燥槽体结构

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US3611987A (en) * 1969-09-08 1971-10-12 Kohler Coating Machinery Corp Paper coater blowoff apparatus
US4267857A (en) * 1979-09-25 1981-05-19 Haaften Henry M T Van Duct system containing a movable plug body
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US4534921A (en) * 1984-03-06 1985-08-13 Asm Fico Tooling, B.V. Method and apparatus for mold cleaning by reverse sputtering
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DE3637880C2 (de) * 1986-11-06 1994-09-01 Meissner & Wurst Transportierbares Behältnis zur Handhabung von Halbleiterelementen während ihrer Herstellung sowie Verfahren zur partikelfreien Übergabe von Produkten
JPH0298956A (ja) * 1988-10-05 1990-04-11 Nec Corp 半導体基板搬送方法
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JPH0680208A (ja) * 1992-09-01 1994-03-22 Hitachi Ltd ウェハー自動移載装置
JP3110218B2 (ja) * 1992-09-25 2000-11-20 三菱電機株式会社 半導体洗浄装置及び方法、ウエハカセット、専用グローブ並びにウエハ受け治具
DE4232183A1 (de) * 1992-09-25 1994-03-31 Ralf G Helmecke Verfahren und Vorrichtung zur Oberflächenbehandlung von aus einem Tauchbad geführten Festkörpern
DE4413077C2 (de) * 1994-04-15 1997-02-06 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur chemischen Behandlung von Substraten

Also Published As

Publication number Publication date
JP3088463B2 (ja) 2000-09-18
DE19549487C2 (de) 2000-11-16
EP0801814B1 (de) 2001-08-29
CN1084048C (zh) 2002-05-01
WO1996021241A1 (de) 1996-07-11
TW399224B (en) 2000-07-21
US5902402A (en) 1999-05-11
DE59509568D1 (de) 2001-10-04
DE19549488C2 (de) 2001-08-02
FI972733A7 (fi) 1997-06-25
DE19549490C2 (de) 2001-01-18
CN1171858A (zh) 1998-01-28
FI972733A0 (fi) 1997-06-25
CA2209339A1 (en) 1996-07-11
ATE205017T1 (de) 2001-09-15
EP0801814A1 (de) 1997-10-22
JPH10503327A (ja) 1998-03-24

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