DE69735042D1 - Verarbeitungsvorrichtung - Google Patents

Verarbeitungsvorrichtung

Info

Publication number
DE69735042D1
DE69735042D1 DE1997635042 DE69735042A DE69735042D1 DE 69735042 D1 DE69735042 D1 DE 69735042D1 DE 1997635042 DE1997635042 DE 1997635042 DE 69735042 A DE69735042 A DE 69735042A DE 69735042 D1 DE69735042 D1 DE 69735042D1
Authority
DE
Germany
Prior art keywords
processing device
processing
device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1997635042
Other languages
English (en)
Other versions
DE69735042T2 (de
Inventor
C O Tokyo Electron Masami
C O Tokyo Electron Yoichi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP29684096A priority Critical patent/JP3320622B2/ja
Priority to JP31265896A priority patent/JP3421521B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE69735042D1 publication Critical patent/DE69735042D1/de
Anticipated expiration legal-status Critical
Application status is Expired - Lifetime legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67184Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
DE1997635042 1996-11-08 1997-11-07 Verarbeitungsvorrichtung Expired - Lifetime DE69735042D1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP29684096A JP3320622B2 (ja) 1996-11-08 1996-11-08 処理装置および処理方法
JP31265896A JP3421521B2 (ja) 1996-11-11 1996-11-11 処理装置

Publications (1)

Publication Number Publication Date
DE69735042D1 true DE69735042D1 (de) 2006-03-30

Family

ID=26560871

Family Applications (2)

Application Number Title Priority Date Filing Date
DE1997635042 Expired - Lifetime DE69735042T2 (de) 1996-11-08 1997-11-07 Bearbeitungsvorrichtung zur Bearbeitung von Objekten
DE1997635042 Expired - Lifetime DE69735042D1 (de) 1996-11-08 1997-11-07 Verarbeitungsvorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE1997635042 Expired - Lifetime DE69735042T2 (de) 1996-11-08 1997-11-07 Bearbeitungsvorrichtung zur Bearbeitung von Objekten

Country Status (5)

Country Link
US (1) US5937223A (de)
EP (1) EP0841688B1 (de)
DE (2) DE69735042T2 (de)
SG (1) SG72768A1 (de)
TW (1) TW353777B (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW402737B (en) * 1997-05-27 2000-08-21 Tokyo Electron Ltd Cleaning/drying device and method
SG76561A1 (en) * 1997-09-22 2000-11-21 Tokyo Electron Ltd Processing apparatus and method
WO1999057509A1 (fr) * 1998-05-01 1999-11-11 Tokyo Electron Limited Instrument pour mesurer l'epaisseur d'un film ainsi que procede et appareil pour le traitement de plaquettes
JP3517121B2 (ja) * 1998-08-12 2004-04-05 東京エレクトロン株式会社 処理装置
US6350316B1 (en) * 1998-11-04 2002-02-26 Tokyo Electron Limited Apparatus for forming coating film
US6533531B1 (en) * 1998-12-29 2003-03-18 Asml Us, Inc. Device for handling wafers in microelectronic manufacturing
US6616394B1 (en) 1998-12-30 2003-09-09 Silicon Valley Group Apparatus for processing wafers
JP3542919B2 (ja) * 1999-03-18 2004-07-14 東京エレクトロン株式会社 基板処理装置
JP4021118B2 (ja) * 1999-04-28 2007-12-12 東京エレクトロン株式会社 基板処理装置
JP4343326B2 (ja) * 1999-05-14 2009-10-14 キヤノン株式会社 基板搬送装置および露光装置
JP3416078B2 (ja) 1999-06-09 2003-06-16 東京エレクトロン株式会社 基板処理装置
US6402400B1 (en) * 1999-10-06 2002-06-11 Tokyo Electron Limited Substrate processing apparatus
US6402401B1 (en) * 1999-10-19 2002-06-11 Tokyo Electron Limited Substrate processing apparatus and substrate processing method
KR100348938B1 (ko) * 1999-12-06 2002-08-14 한국디엔에스 주식회사 포토리소그라피 공정을 위한 반도체 제조장치
US6676757B2 (en) * 1999-12-17 2004-01-13 Tokyo Electron Limited Coating film forming apparatus and coating unit
EP1124252A2 (de) * 2000-02-10 2001-08-16 Applied Materials, Inc. Verfahren und Vorrichtung zur Verarbeitung von Substraten
US20020045967A1 (en) * 2000-10-17 2002-04-18 Masayuki Nakano Substrate processing system
JP3713447B2 (ja) * 2001-04-05 2005-11-09 東京エレクトロン株式会社 現像処理装置
US7067010B2 (en) * 2002-04-05 2006-06-27 Biddle Harold A Indexing spray machine
JP2003347186A (ja) * 2002-05-23 2003-12-05 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2004071730A (ja) * 2002-08-05 2004-03-04 Nikon Corp レチクルハンドリング方法、レチクルハンドリング装置及び露光装置
KR100483428B1 (ko) * 2003-01-24 2005-04-14 삼성전자주식회사 기판 가공 장치
JP4325622B2 (ja) * 2003-08-29 2009-09-02 株式会社ニコン 露光装置及びデバイス製造方法
US7267497B2 (en) 2005-01-21 2007-09-11 Tokyo Electron Limited Coating and developing system and coating and developing method
JP4955976B2 (ja) * 2005-01-21 2012-06-20 東京エレクトロン株式会社 塗布、現像装置及びその方法
JP4459831B2 (ja) 2005-02-01 2010-04-28 東京エレクトロン株式会社 塗布、現像装置
JP4666494B2 (ja) * 2005-11-21 2011-04-06 大日本スクリーン製造株式会社 基板処理装置
JP4767783B2 (ja) * 2006-07-26 2011-09-07 東京エレクトロン株式会社 液処理装置
KR100897850B1 (ko) * 2007-06-18 2009-05-15 세메스 주식회사 기판 처리 장치
JP5006122B2 (ja) 2007-06-29 2012-08-22 株式会社Sokudo 基板処理装置
DE102007051726A1 (de) * 2007-10-25 2009-04-30 Hänel & Co. Lageranordnung mit vorgebbarer Lagerungsatmosphäre
JP2009135169A (ja) * 2007-11-29 2009-06-18 Tokyo Electron Ltd 基板処理システムおよび基板処理方法
JP5128918B2 (ja) 2007-11-30 2013-01-23 株式会社Sokudo 基板処理装置
JP5318403B2 (ja) 2007-11-30 2013-10-16 株式会社Sokudo 基板処理装置
JP5179170B2 (ja) * 2007-12-28 2013-04-10 株式会社Sokudo 基板処理装置
JP5001828B2 (ja) 2007-12-28 2012-08-15 株式会社Sokudo 基板処理装置
JP5397399B2 (ja) * 2010-07-09 2014-01-22 東京エレクトロン株式会社 塗布、現像装置
JP6503281B2 (ja) 2015-11-13 2019-04-17 株式会社Screenホールディングス 基板処理装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970003907B1 (ko) * 1988-02-12 1997-03-22 이노우에 아키라 기판처리 장치 및 기판처리 방법
JP2559617B2 (ja) * 1988-03-24 1996-12-04 キヤノン株式会社 基板処理装置
JP2919925B2 (ja) * 1990-07-26 1999-07-19 東京エレクトロン株式会社 処理装置
JP2867194B2 (ja) * 1992-02-05 1999-03-08 東京エレクトロン株式会社 処理装置及び処理方法
JP2928432B2 (ja) * 1993-02-16 1999-08-03 東京エレクトロン株式会社 半導体ウエハの蒸気乾燥装置及びその消火方法及び洗浄システム
JP3196917B2 (ja) * 1994-06-17 2001-08-06 大日本スクリーン製造株式会社 基板処理装置
US5826129A (en) * 1994-06-30 1998-10-20 Tokyo Electron Limited Substrate processing system
JP3213748B2 (ja) * 1994-08-04 2001-10-02 東京エレクトロン株式会社 処理システム
TW297910B (de) * 1995-02-02 1997-02-11 Tokyo Electron Co Ltd

Also Published As

Publication number Publication date
KR19980042217A (ko) 1998-08-17
SG72768A1 (en) 2000-05-23
TW353777B (en) 1999-03-01
DE69735042T2 (de) 2006-08-24
US5937223A (en) 1999-08-10
EP0841688B1 (de) 2006-01-04
EP0841688A3 (de) 1999-12-29
EP0841688A2 (de) 1998-05-13

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Legal Events

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8364 No opposition during term of opposition