MY140644A - Method and apparatus for drying a substrate. - Google Patents
Method and apparatus for drying a substrate.Info
- Publication number
- MY140644A MY140644A MYPI20021050A MY140644A MY 140644 A MY140644 A MY 140644A MY PI20021050 A MYPI20021050 A MY PI20021050A MY 140644 A MY140644 A MY 140644A
- Authority
- MY
- Malaysia
- Prior art keywords
- substrate
- liquid
- bath
- holder
- drying
- Prior art date
Links
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A METHOD AND APPARATUS (13) FOR DRYING A DISK-SHAPED SUBSTRATE (10). THE SUBSTRATE IS TYPICALLY A SUBSTRATE USED FOR THE MANUFACTURE OF MAGNETIC DISKS, AND HAS A CENTRALLY LOCATED OPENING (12). THE SUBSTRATE IS LOWERED INTO A LIQUID BATH (16) BY A FIRST HOLDER (22), WHICH ALSO BECOMES IMMERSED IN THE BATH. THE FIRST HOLDER LIFTS THE SUBSTRATE UNTIL THE SUBSTRATE EXTENDS PARTIALLY OUT OF CONTACT WITH THE LIQUID. A SECOND, DRY HOLDER (26) GRABS A DRY PORTION OF THE SUBSTRATE THAT EXTENDS OUT OF THE BATH, AND CONTINUES TO LIFT THE SUBSTRATE OUT OF CONTACT WITH THE LIQUID. IN ONE EMBODIMENT, DIFFERENT PORTIONS OF THE SUBSTRATE (P1-P7) ARE LIFTED PAST THE SURFACE OF THE LIQUID AT DIFFERENT SPEEDS
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/837,536 US6571806B2 (en) | 1998-09-04 | 2001-04-17 | Method for drying a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY140644A true MY140644A (en) | 2010-01-15 |
Family
ID=25274745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI20021050 MY140644A (en) | 2001-04-17 | 2002-03-25 | Method and apparatus for drying a substrate. |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JP2003031544A (en) |
| MY (1) | MY140644A (en) |
| SG (1) | SG93932A1 (en) |
| TW (1) | TW541573B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080066339A1 (en) * | 2006-09-14 | 2008-03-20 | Mike Wallis | Apparatus and method for drying a substrate |
| CN110544654B (en) * | 2019-08-27 | 2022-04-15 | 西安奕斯伟材料科技有限公司 | Silicon wafer processing device and method |
| CN116678188B (en) * | 2023-08-03 | 2023-10-10 | 福建省德化县信良陶瓷有限公司 | Ceramic body drying device and drying method thereof |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2901098B2 (en) * | 1991-04-02 | 1999-06-02 | 東京エレクトロン株式会社 | Cleaning device and cleaning method |
| JPH05290373A (en) * | 1992-04-03 | 1993-11-05 | Hitachi Electron Eng Co Ltd | Disk cleaner |
| DE19549490C2 (en) * | 1995-01-05 | 2001-01-18 | Steag Micro Tech Gmbh | Wet chemical treatment installation for substrate plates |
| US5884640A (en) * | 1997-08-07 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for drying substrates |
| JPH11168080A (en) * | 1997-12-04 | 1999-06-22 | Sony Corp | Device and method of washing |
| JP2962705B1 (en) * | 1998-04-27 | 1999-10-12 | 株式会社ダン科学 | Substrate drying apparatus and drying method |
-
2002
- 2002-03-25 MY MYPI20021050 patent/MY140644A/en unknown
- 2002-03-26 SG SG200201727A patent/SG93932A1/en unknown
- 2002-03-26 TW TW91105938A patent/TW541573B/en not_active IP Right Cessation
- 2002-04-17 JP JP2002114906A patent/JP2003031544A/en active Pending
-
2007
- 2007-11-19 JP JP2007299687A patent/JP4599386B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008118148A (en) | 2008-05-22 |
| SG93932A1 (en) | 2003-01-21 |
| TW541573B (en) | 2003-07-11 |
| JP4599386B2 (en) | 2010-12-15 |
| JP2003031544A (en) | 2003-01-31 |
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