SG93932A1 - Method and apparatus for drying a substrate - Google Patents
Method and apparatus for drying a substrateInfo
- Publication number
- SG93932A1 SG93932A1 SG200201727A SG200201727A SG93932A1 SG 93932 A1 SG93932 A1 SG 93932A1 SG 200201727 A SG200201727 A SG 200201727A SG 200201727 A SG200201727 A SG 200201727A SG 93932 A1 SG93932 A1 SG 93932A1
- Authority
- SG
- Singapore
- Prior art keywords
- drying
- substrate
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/837,536 US6571806B2 (en) | 1998-09-04 | 2001-04-17 | Method for drying a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
SG93932A1 true SG93932A1 (en) | 2003-01-21 |
Family
ID=25274745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200201727A SG93932A1 (en) | 2001-04-17 | 2002-03-26 | Method and apparatus for drying a substrate |
Country Status (4)
Country | Link |
---|---|
JP (2) | JP2003031544A (en) |
MY (1) | MY140644A (en) |
SG (1) | SG93932A1 (en) |
TW (1) | TW541573B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080066339A1 (en) * | 2006-09-14 | 2008-03-20 | Mike Wallis | Apparatus and method for drying a substrate |
CN110544654B (en) * | 2019-08-27 | 2022-04-15 | 西安奕斯伟材料科技有限公司 | Silicon wafer processing device and method |
CN116678188B (en) * | 2023-08-03 | 2023-10-10 | 福建省德化县信良陶瓷有限公司 | Ceramic body drying device and drying method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5421905A (en) * | 1991-04-02 | 1995-06-06 | Tokyo Electron Limited | Method for washing wafers |
US5884640A (en) * | 1997-08-07 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for drying substrates |
US5902402A (en) * | 1995-01-05 | 1999-05-11 | Steag Microtech Gmbh | Device for chemical wet treatment |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05290373A (en) * | 1992-04-03 | 1993-11-05 | Hitachi Electron Eng Co Ltd | Disk cleaner |
JPH11168080A (en) * | 1997-12-04 | 1999-06-22 | Sony Corp | Device and method of washing |
JP2962705B1 (en) * | 1998-04-27 | 1999-10-12 | 株式会社ダン科学 | Substrate drying apparatus and drying method |
-
2002
- 2002-03-25 MY MYPI20021050 patent/MY140644A/en unknown
- 2002-03-26 SG SG200201727A patent/SG93932A1/en unknown
- 2002-03-26 TW TW91105938A patent/TW541573B/en not_active IP Right Cessation
- 2002-04-17 JP JP2002114906A patent/JP2003031544A/en active Pending
-
2007
- 2007-11-19 JP JP2007299687A patent/JP4599386B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5421905A (en) * | 1991-04-02 | 1995-06-06 | Tokyo Electron Limited | Method for washing wafers |
US5902402A (en) * | 1995-01-05 | 1999-05-11 | Steag Microtech Gmbh | Device for chemical wet treatment |
US5884640A (en) * | 1997-08-07 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for drying substrates |
Also Published As
Publication number | Publication date |
---|---|
JP2008118148A (en) | 2008-05-22 |
JP4599386B2 (en) | 2010-12-15 |
TW541573B (en) | 2003-07-11 |
JP2003031544A (en) | 2003-01-31 |
MY140644A (en) | 2010-01-15 |
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