FI58221C - Ljuskaensligt kopieringsskikt - Google Patents

Ljuskaensligt kopieringsskikt Download PDF

Info

Publication number
FI58221C
FI58221C FI1860/74A FI186074A FI58221C FI 58221 C FI58221 C FI 58221C FI 1860/74 A FI1860/74 A FI 1860/74A FI 186074 A FI186074 A FI 186074A FI 58221 C FI58221 C FI 58221C
Authority
FI
Finland
Prior art keywords
weight
parts
naphthoquinone
diazide
sulfonic acid
Prior art date
Application number
FI1860/74A
Other languages
English (en)
Finnish (fi)
Other versions
FI186074A (xx
FI58221B (fi
Inventor
Paul Stahlhofen
Rainer Beutel
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI186074A publication Critical patent/FI186074A/fi
Application granted granted Critical
Publication of FI58221B publication Critical patent/FI58221B/fi
Publication of FI58221C publication Critical patent/FI58221C/fi

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Color Printing (AREA)
FI1860/74A 1973-06-20 1974-06-18 Ljuskaensligt kopieringsskikt FI58221C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2331377 1973-06-20
DE2331377A DE2331377C2 (de) 1973-06-20 1973-06-20 Lichtempfindliches Kopiermaterial

Publications (3)

Publication Number Publication Date
FI186074A FI186074A (xx) 1974-12-21
FI58221B FI58221B (fi) 1980-08-29
FI58221C true FI58221C (fi) 1980-12-10

Family

ID=5884548

Family Applications (1)

Application Number Title Priority Date Filing Date
FI1860/74A FI58221C (fi) 1973-06-20 1974-06-18 Ljuskaensligt kopieringsskikt

Country Status (20)

Country Link
US (1) US3969118A (xx)
JP (1) JPS5652301B2 (xx)
AR (1) AR199440A1 (xx)
AT (1) AT331636B (xx)
BE (1) BE816580A (xx)
BR (1) BR7404981D0 (xx)
CA (1) CA1046332A (xx)
CH (1) CH601842A5 (xx)
CS (1) CS167209B2 (xx)
DE (1) DE2331377C2 (xx)
DK (1) DK144345C (xx)
ES (1) ES427391A1 (xx)
FI (1) FI58221C (xx)
FR (1) FR2234584B1 (xx)
GB (1) GB1463717A (xx)
IT (1) IT1016063B (xx)
NL (1) NL177353C (xx)
NO (1) NO139458C (xx)
SE (1) SE391404B (xx)
ZA (1) ZA743882B (xx)

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* Cited by examiner, † Cited by third party
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DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
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DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
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DE3510220A1 (de) * 1985-03-21 1986-09-25 Hoechst Ag, 6230 Frankfurt Positiv arbeitende strahlungsempfindliche beschichtungsloesung
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
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JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
JPH07120045B2 (ja) * 1987-10-22 1995-12-20 富士写真フイルム株式会社 パターン形成方法
JPH01142721A (ja) * 1987-11-30 1989-06-05 Fujitsu Ltd ポジ型感光性パターン形成材料およびパターン形成方法
US5250669A (en) * 1987-12-04 1993-10-05 Wako Pure Chemical Industries, Ltd. Photosensitive compound
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5002856A (en) * 1989-08-02 1991-03-26 E. I. Du Pont De Nemours And Company Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
US5250392A (en) * 1991-02-04 1993-10-05 Ocg Microelectronic Materials, Inc. Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
US5206110A (en) * 1991-02-04 1993-04-27 Ocg Microelectronic Materials, Inc. Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
DE4110057A1 (de) * 1991-03-27 1992-10-01 Hoechst Ag Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
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GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
EP1225478B1 (en) 1998-04-06 2012-12-19 FUJIFILM Corporation Photosensitive resin composition
ATE385463T1 (de) 1999-05-21 2008-02-15 Fujifilm Corp Fotoempfindliche zusammensetzung und flachdruckplatte, die diese zusammensetzung verwendet
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
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US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
ATE398298T1 (de) 2004-07-20 2008-07-15 Fujifilm Corp Bilderzeugendes material
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
KR101309055B1 (ko) 2006-05-18 2013-09-16 후지필름 가부시키가이샤 피건조물의 건조 방법 및 장치
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5253433B2 (ja) 2010-02-19 2013-07-31 富士フイルム株式会社 平版印刷版の作製方法
EP2555054B1 (en) 2010-03-31 2018-06-20 FUJIFILM Corporation Method for manufacturing a lithographic printing plate and printing method
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法
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Also Published As

Publication number Publication date
CS167209B2 (xx) 1976-04-29
JPS5652301B2 (xx) 1981-12-11
ATA508274A (de) 1975-11-15
NL7407678A (xx) 1974-12-24
DK327274A (xx) 1975-03-03
AT331636B (de) 1976-08-25
ZA743882B (en) 1975-06-25
GB1463717A (en) 1977-02-09
BE816580A (fr) 1974-12-19
AU7015774A (en) 1975-12-18
ES427391A1 (es) 1977-03-01
IT1016063B (it) 1977-05-30
DK144345C (da) 1982-07-19
US3969118A (en) 1976-07-13
NO139458B (no) 1978-12-04
FI186074A (xx) 1974-12-21
CA1046332A (en) 1979-01-16
SE7407871L (xx) 1974-12-23
FR2234584B1 (xx) 1981-09-18
JPS5036209A (xx) 1975-04-05
NO139458C (no) 1979-03-14
NL177353C (nl) 1985-09-02
DK144345B (da) 1982-02-22
DE2331377C2 (de) 1982-10-14
FR2234584A1 (xx) 1975-01-17
AR199440A1 (es) 1974-08-30
SE391404B (sv) 1977-02-14
CH601842A5 (xx) 1978-07-14
NL177353B (nl) 1985-04-01
BR7404981D0 (pt) 1975-09-30
NO742238L (xx) 1975-01-13
DE2331377A1 (de) 1975-01-16
FI58221B (fi) 1980-08-29

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