BE620660A - - Google Patents

Info

Publication number
BE620660A
BE620660A BE620660DA BE620660A BE 620660 A BE620660 A BE 620660A BE 620660D A BE620660D A BE 620660DA BE 620660 A BE620660 A BE 620660A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE620660A publication Critical patent/BE620660A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
BE620660D 1961-07-28 BE620660A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0044366 1961-07-28

Publications (1)

Publication Number Publication Date
BE620660A true BE620660A (xx)

Family

ID=7223439

Family Applications (1)

Application Number Title Priority Date Filing Date
BE620660D BE620660A (xx) 1961-07-28

Country Status (8)

Country Link
US (1) US3264104A (xx)
AT (1) AT242503B (xx)
BE (1) BE620660A (xx)
CH (1) CH418126A (xx)
DE (1) DE1422921A1 (xx)
GB (1) GB1003857A (xx)
NL (2) NL138044C (xx)
SE (1) SE316078B (xx)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE606888A (xx) * 1960-08-05 1900-01-01
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3634082A (en) * 1967-07-07 1972-01-11 Shipley Co Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS5343285B2 (xx) * 1972-07-26 1978-11-18
US3930857A (en) * 1973-05-03 1976-01-06 International Business Machines Corporation Resist process
JPS5421089B2 (xx) * 1973-05-29 1979-07-27
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4196003A (en) * 1974-02-01 1980-04-01 Fuji Photo Film Co., Ltd. Light-sensitive o-quinone diazide copying composition
US4007047A (en) * 1974-06-06 1977-02-08 International Business Machines Corporation Modified processing of positive photoresists
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
US3961100A (en) * 1974-09-16 1976-06-01 Rca Corporation Method for developing electron beam sensitive resist films
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
US4102686A (en) * 1977-02-25 1978-07-25 Polychrome Corporation Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin
JPS585798B2 (ja) * 1977-06-30 1983-02-01 富士写真フイルム株式会社 平版印刷版用不感脂化液およびそれを用いる平版印刷版の製造方法
JPS5635130A (en) * 1979-08-31 1981-04-07 Fujitsu Ltd Resist material and method for forming resist pattern
US4508813A (en) * 1980-06-16 1985-04-02 Fujitsu Limited Method for producing negative resist images
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
DE3325023A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
GB2188448B (en) * 1986-03-13 1989-11-15 Horsell Graphic Ind Ltd Reversal processing of exposed lithographic printing plates
ZA872295B (xx) * 1986-03-13 1987-09-22
JPH01501176A (ja) * 1986-10-20 1989-04-20 マクダーミッド，インコーポレーテッド 像反転可能なシステム及びプロセス
JP2598059B2 (ja) * 1987-03-27 1997-04-09 ホーセル グラフィック インダストリーズ リミッティッド 露光式石版の製造方法
EP0308400B1 (en) * 1987-03-27 1991-07-17 Horsell Graphic Industries Limited Processing of exposed lithographic printing plates
US4775609A (en) * 1987-05-18 1988-10-04 Hoescht Celanese Corporation Image reversal
EP0361906A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
CA2001852A1 (en) * 1988-11-01 1990-05-01 Iwao Numakura Process and apparatus for the formation of negative resist pattern
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
EP0394738A3 (de) * 1989-04-24 1991-03-27 Siemens Aktiengesellschaft Vereinfachtes Mehrlagenphotoresistsystem
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
US7157213B2 (en) * 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
EP1574907A1 (en) * 2004-03-08 2005-09-14 Think Laboratory Co., Ltd. Developing agent for positive-type photosensitive composition

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2500023A (en) * 1946-03-16 1950-03-07 Du Pont Polymerization of substituted ethylenes containing organic coloring matter in presence of azo compounds
US2480749A (en) * 1947-08-27 1949-08-30 Du Pont Process for preparing cast synthetic resin having integral patterned effects
NL70798C (xx) * 1948-10-15
US3046121A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
BE506677A (xx) * 1950-10-31
NL95407C (xx) * 1954-08-20
NL94867C (xx) * 1955-02-25
US2930691A (en) * 1955-03-28 1960-03-29 Technicolor Corp Planographic dye-absorptive film and method of making same
US3032414A (en) * 1956-11-19 1962-05-01 Kalvar Corp System of photographic reproduction
NL230099A (xx) * 1957-08-01
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
NL247299A (xx) * 1959-01-14
NL130027C (xx) * 1959-01-15

Also Published As

Publication number Publication date
NL138044C (xx)
AT242503B (de) 1965-09-27
CH418126A (de) 1966-07-31
GB1003857A (en) 1965-09-08
DE1422921A1 (de) 1969-01-09
US3264104A (en) 1966-08-02
SE316078B (xx) 1969-10-13
NL280959A (xx)

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