JPS5652301B2 - - Google Patents

Info

Publication number
JPS5652301B2
JPS5652301B2 JP6643274A JP6643274A JPS5652301B2 JP S5652301 B2 JPS5652301 B2 JP S5652301B2 JP 6643274 A JP6643274 A JP 6643274A JP 6643274 A JP6643274 A JP 6643274A JP S5652301 B2 JPS5652301 B2 JP S5652301B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6643274A
Other versions
JPS5036209A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5036209A publication Critical patent/JPS5036209A/ja
Publication of JPS5652301B2 publication Critical patent/JPS5652301B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
JP6643274A 1973-06-20 1974-06-11 Expired JPS5652301B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2331377A DE2331377C2 (de) 1973-06-20 1973-06-20 Lichtempfindliches Kopiermaterial

Publications (2)

Publication Number Publication Date
JPS5036209A JPS5036209A (ja) 1975-04-05
JPS5652301B2 true JPS5652301B2 (ja) 1981-12-11

Family

ID=5884548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6643274A Expired JPS5652301B2 (ja) 1973-06-20 1974-06-11

Country Status (20)

Country Link
US (1) US3969118A (ja)
JP (1) JPS5652301B2 (ja)
AR (1) AR199440A1 (ja)
AT (1) AT331636B (ja)
BE (1) BE816580A (ja)
BR (1) BR7404981D0 (ja)
CA (1) CA1046332A (ja)
CH (1) CH601842A5 (ja)
CS (1) CS167209B2 (ja)
DE (1) DE2331377C2 (ja)
DK (1) DK144345C (ja)
ES (1) ES427391A1 (ja)
FI (1) FI58221C (ja)
FR (1) FR2234584B1 (ja)
GB (1) GB1463717A (ja)
IT (1) IT1016063B (ja)
NL (1) NL177353C (ja)
NO (1) NO139458C (ja)
SE (1) SE391404B (ja)
ZA (1) ZA743882B (ja)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2626419C2 (de) * 1976-06-12 1982-10-21 Ibm Deutschland Gmbh, 7000 Stuttgart Lichtempfindliches Gemisch
JPS538128A (en) * 1976-07-09 1978-01-25 Fuji Photo Film Co Ltd Photosolubilizable composition
DE2641099A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
DE2641100A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
US4108664A (en) * 1976-11-01 1978-08-22 Gaf Corporation Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
DE2650978A1 (de) * 1976-11-08 1978-05-11 Graenges Oxeloesunds Jaernverk Frischverfahren durch sauerstoffaufblasen
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
GB2005855A (en) * 1977-10-03 1979-04-25 Polychrome Corp Lithographic imaging composition having improved image visibility
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS55126235A (en) * 1979-03-22 1980-09-29 Fuji Photo Film Co Ltd Photosensitive composition
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
US4350753A (en) * 1981-06-15 1982-09-21 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
US4348471A (en) * 1981-06-15 1982-09-07 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
JPS59104421A (ja) * 1982-12-04 1984-06-16 Nippon Steel Corp 含クロム溶鋼の脱炭法
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
DE3510220A1 (de) * 1985-03-21 1986-09-25 Hoechst Ag, 6230 Frankfurt Positiv arbeitende strahlungsempfindliche beschichtungsloesung
EP0164083B1 (de) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positiv arbeitende strahlungsempfindliche Beschichtungslösung
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
JPH07120045B2 (ja) * 1987-10-22 1995-12-20 富士写真フイルム株式会社 パターン形成方法
JPH01142721A (ja) * 1987-11-30 1989-06-05 Fujitsu Ltd ポジ型感光性パターン形成材料およびパターン形成方法
US5250669A (en) * 1987-12-04 1993-10-05 Wako Pure Chemical Industries, Ltd. Photosensitive compound
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5002856A (en) * 1989-08-02 1991-03-26 E. I. Du Pont De Nemours And Company Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
US5250392A (en) * 1991-02-04 1993-10-05 Ocg Microelectronic Materials, Inc. Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
US5206110A (en) * 1991-02-04 1993-04-27 Ocg Microelectronic Materials, Inc. Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
DE4110057A1 (de) * 1991-03-27 1992-10-01 Hoechst Ag Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
GB2277382A (en) * 1993-04-19 1994-10-26 Pan Graphics Ind Limited Photoresist composition
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
DE69905959T2 (de) 1998-04-06 2003-12-04 Fuji Photo Film Co Ltd Lichtempfindliche Harzzusammensetzung
DE60037951T2 (de) 1999-05-21 2009-02-05 Fujifilm Corp. Fotoempfindliche Zusammensetzung und Flachdruckplatte, die diese Zusammensetzung verwendet
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
ATE420767T1 (de) 2000-11-30 2009-01-15 Fujifilm Corp Lithographische druckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
EP1619023B1 (en) 2004-07-20 2008-06-11 FUJIFILM Corporation Image forming material
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
KR101309055B1 (ko) 2006-05-18 2013-09-16 후지필름 가부시키가이샤 피건조물의 건조 방법 및 장치
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5253433B2 (ja) 2010-02-19 2013-07-31 富士フイルム株式会社 平版印刷版の作製方法
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法
US11675266B2 (en) * 2021-04-15 2023-06-13 Industrial Technology Research Institute Photosensitive compound, photosensitive composition, and patterning method

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL80628C (ja) * 1949-07-23
NL78025C (ja) * 1951-02-02
NL247299A (ja) * 1959-01-14
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
BE620660A (ja) * 1961-07-28
NL292007A (ja) * 1962-04-27
DE1447011A1 (de) * 1963-07-12 1969-01-02 Kalle Ag Mit o-Naphtholchinondiaziden vorsensibilisierte Druckplatten
GB1052699A (ja) * 1963-12-03
DE1447975A1 (de) * 1965-11-05 1969-01-16 Standard Elek K Lorenz Ag Verfahren zur Herstellung von Photokopiedacken
GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
DE1572085B2 (de) * 1966-07-08 1976-10-14 Hoechst Ag, 6000 Frankfurt Verfahren und kopiermaterial zur duplizierung von silberfilmen
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
JPS492284B1 (ja) * 1969-05-30 1974-01-19
US3669658A (en) * 1969-06-11 1972-06-13 Fuji Photo Film Co Ltd Photosensitive printing plate
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
GB1342088A (en) * 1970-06-02 1973-12-25 Agfa Gevaert Process for producing multicolour photographic images
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials

Also Published As

Publication number Publication date
NL177353C (nl) 1985-09-02
NO742238L (ja) 1975-01-13
FR2234584B1 (ja) 1981-09-18
FI58221C (fi) 1980-12-10
AT331636B (de) 1976-08-25
IT1016063B (it) 1977-05-30
JPS5036209A (ja) 1975-04-05
SE391404B (sv) 1977-02-14
DK144345C (da) 1982-07-19
NL177353B (nl) 1985-04-01
DE2331377A1 (de) 1975-01-16
NO139458C (no) 1979-03-14
SE7407871L (ja) 1974-12-23
FR2234584A1 (ja) 1975-01-17
ZA743882B (en) 1975-06-25
AU7015774A (en) 1975-12-18
CA1046332A (en) 1979-01-16
NL7407678A (ja) 1974-12-24
DK327274A (ja) 1975-03-03
BE816580A (fr) 1974-12-19
ATA508274A (de) 1975-11-15
CS167209B2 (ja) 1976-04-29
CH601842A5 (ja) 1978-07-14
AR199440A1 (es) 1974-08-30
GB1463717A (en) 1977-02-09
DK144345B (da) 1982-02-22
ES427391A1 (es) 1977-03-01
BR7404981D0 (pt) 1975-09-30
FI186074A (ja) 1974-12-21
NO139458B (no) 1978-12-04
US3969118A (en) 1976-07-13
FI58221B (fi) 1980-08-29
DE2331377C2 (de) 1982-10-14

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