DE2626419C2
(de)
*
|
1976-06-12 |
1982-10-21 |
Ibm Deutschland Gmbh, 7000 Stuttgart |
Lichtempfindliches Gemisch
|
JPS538128A
(en)
*
|
1976-07-09 |
1978-01-25 |
Fuji Photo Film Co Ltd |
Photosolubilizable composition
|
DE2641099A1
(de)
*
|
1976-09-13 |
1978-03-16 |
Hoechst Ag |
Lichtempfindliche kopierschicht
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DE2641100C2
(de)
*
|
1976-09-13 |
1987-02-26 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches Gemisch
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US4108664A
(en)
*
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1976-11-01 |
1978-08-22 |
Gaf Corporation |
Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
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DE2650978A1
(de)
*
|
1976-11-08 |
1978-05-11 |
Graenges Oxeloesunds Jaernverk |
Frischverfahren durch sauerstoffaufblasen
|
GB1604652A
(en)
*
|
1977-04-12 |
1981-12-16 |
Vickers Ltd |
Radiation sensitive materials
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GB2005855A
(en)
*
|
1977-10-03 |
1979-04-25 |
Polychrome Corp |
Lithographic imaging composition having improved image visibility
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US4212935A
(en)
*
|
1978-02-24 |
1980-07-15 |
International Business Machines Corporation |
Method of modifying the development profile of photoresists
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JPS5562444A
(en)
*
|
1978-11-02 |
1980-05-10 |
Konishiroku Photo Ind Co Ltd |
Photosensitive composition
|
DE2847878A1
(de)
*
|
1978-11-04 |
1980-05-22 |
Hoechst Ag |
Lichtempfindliches gemisch
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US4308368A
(en)
*
|
1979-03-16 |
1981-12-29 |
Daicel Chemical Industries Ltd. |
Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
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JPS55126235A
(en)
*
|
1979-03-22 |
1980-09-29 |
Fuji Photo Film Co Ltd |
Photosensitive composition
|
JPS55129341A
(en)
*
|
1979-03-29 |
1980-10-07 |
Daicel Chem Ind Ltd |
Photosensitive covering composition
|
JPS569740A
(en)
*
|
1979-07-05 |
1981-01-31 |
Fuji Photo Film Co Ltd |
Image forming method
|
JPS56140342A
(en)
*
|
1980-04-02 |
1981-11-02 |
Tokyo Ohka Kogyo Co Ltd |
Image forming composition and formation of resist image
|
DE3100077A1
(de)
|
1981-01-03 |
1982-08-05 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
|
AU8021782A
(en)
*
|
1981-02-20 |
1982-08-26 |
Polychrome Corp. |
Non-silver positive working radiation sensitive compositions
|
JPS57163234A
(en)
*
|
1981-04-01 |
1982-10-07 |
Fuji Photo Film Co Ltd |
Photosensitive composition
|
US4350753A
(en)
*
|
1981-06-15 |
1982-09-21 |
Polychrome Corporation |
Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
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US4348471A
(en)
*
|
1981-06-15 |
1982-09-07 |
Polychrome Corporation |
Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff
|
DE3144480A1
(de)
*
|
1981-11-09 |
1983-05-19 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
|
DE3144499A1
(de)
*
|
1981-11-09 |
1983-05-19 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
|
JPS59104421A
(ja)
*
|
1982-12-04 |
1984-06-16 |
Nippon Steel Corp |
含クロム溶鋼の脱炭法
|
GB2139369B
(en)
*
|
1983-05-06 |
1987-01-21 |
Sericol Group Ltd |
Photosensitive systems showing visible indication of exposure
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DE3510220A1
(de)
*
|
1985-03-21 |
1986-09-25 |
Hoechst Ag, 6230 Frankfurt |
Positiv arbeitende strahlungsempfindliche beschichtungsloesung
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DE3582697D1
(de)
*
|
1984-06-07 |
1991-06-06 |
Hoechst Ag |
Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
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DE3445276A1
(de)
*
|
1984-12-12 |
1986-06-19 |
Hoechst Ag, 6230 Frankfurt |
Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
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US4672021A
(en)
*
|
1985-06-03 |
1987-06-09 |
Fairmount Chemical Company |
Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
|
JPS6478249A
(en)
*
|
1987-09-18 |
1989-03-23 |
Fuji Photo Film Co Ltd |
Photosensitive material and image forming method
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JPH07120045B2
(ja)
*
|
1987-10-22 |
1995-12-20 |
富士写真フイルム株式会社 |
パターン形成方法
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JPH01142721A
(ja)
*
|
1987-11-30 |
1989-06-05 |
Fujitsu Ltd |
ポジ型感光性パターン形成材料およびパターン形成方法
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US5250669A
(en)
*
|
1987-12-04 |
1993-10-05 |
Wako Pure Chemical Industries, Ltd. |
Photosensitive compound
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US5272026A
(en)
*
|
1987-12-18 |
1993-12-21 |
Ucb S.A. |
Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
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GB8729510D0
(en)
*
|
1987-12-18 |
1988-02-03 |
Ucb Sa |
Photosensitive compositions containing phenolic resins & diazoquinone compounds
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JP2623309B2
(ja)
*
|
1988-02-22 |
1997-06-25 |
ユーシービー ソシエテ アノニム |
レジストパターンを得る方法
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EP0410606B1
(en)
|
1989-07-12 |
1996-11-13 |
Fuji Photo Film Co., Ltd. |
Siloxane polymers and positive working light-sensitive compositions comprising the same
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US5002856A
(en)
*
|
1989-08-02 |
1991-03-26 |
E. I. Du Pont De Nemours And Company |
Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
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US5206110A
(en)
*
|
1991-02-04 |
1993-04-27 |
Ocg Microelectronic Materials, Inc. |
Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
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US5250392A
(en)
*
|
1991-02-04 |
1993-10-05 |
Ocg Microelectronic Materials, Inc. |
Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
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DE4110057A1
(de)
*
|
1991-03-27 |
1992-10-01 |
Hoechst Ag |
Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial
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JP2944296B2
(ja)
|
1992-04-06 |
1999-08-30 |
富士写真フイルム株式会社 |
感光性平版印刷版の製造方法
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GB2277382A
(en)
*
|
1993-04-19 |
1994-10-26 |
Pan Graphics Ind Limited |
Photoresist composition
|
GB9326150D0
(en)
*
|
1993-12-22 |
1994-02-23 |
Alcan Int Ltd |
Electrochemical roughening method
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JP3290316B2
(ja)
|
1994-11-18 |
2002-06-10 |
富士写真フイルム株式会社 |
感光性平版印刷版
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DE69905959T2
(de)
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1998-04-06 |
2003-12-04 |
Fuji Photo Film Co., Ltd. |
Lichtempfindliche Harzzusammensetzung
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EP1872943B1
(en)
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1999-05-21 |
2009-08-12 |
FUJIFILM Corporation |
Photosensitive composition and planographic printing plate base using same
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US6296982B1
(en)
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1999-11-19 |
2001-10-02 |
Kodak Polychrome Graphics Llc |
Imaging articles
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JP2001264979A
(ja)
*
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2000-03-22 |
2001-09-28 |
Fuji Photo Film Co Ltd |
ポジ型感光性平版印刷版
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EP1211065B1
(en)
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2000-11-30 |
2009-01-14 |
FUJIFILM Corporation |
Planographic printing plate precursor
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US20040067435A1
(en)
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2002-09-17 |
2004-04-08 |
Fuji Photo Film Co., Ltd. |
Image forming material
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US7146909B2
(en)
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2004-07-20 |
2006-12-12 |
Fuji Photo Film Co., Ltd. |
Image forming material
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JP2006058430A
(ja)
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2004-08-18 |
2006-03-02 |
Fuji Photo Film Co Ltd |
平版印刷版原版
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JP4404734B2
(ja)
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2004-09-27 |
2010-01-27 |
富士フイルム株式会社 |
平版印刷版原版
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JP4474296B2
(ja)
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2005-02-09 |
2010-06-02 |
富士フイルム株式会社 |
平版印刷版原版
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JP4404792B2
(ja)
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2005-03-22 |
2010-01-27 |
富士フイルム株式会社 |
平版印刷版原版
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WO2007136005A1
(ja)
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2006-05-18 |
2007-11-29 |
Fujifilm Corporation |
被乾燥物の乾燥方法及び装置
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JP4890403B2
(ja)
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2007-09-27 |
2012-03-07 |
富士フイルム株式会社 |
平版印刷版原版
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JP2009085984A
(ja)
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2007-09-27 |
2009-04-23 |
Fujifilm Corp |
平版印刷版原版
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JP2009083106A
(ja)
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2007-09-27 |
2009-04-23 |
Fujifilm Corp |
平版印刷版用版面保護剤及び平版印刷版の製版方法
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JP4994175B2
(ja)
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2007-09-28 |
2012-08-08 |
富士フイルム株式会社 |
平版印刷版原版、及びそれに用いる共重合体の製造方法
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JP4790682B2
(ja)
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2007-09-28 |
2011-10-12 |
富士フイルム株式会社 |
平版印刷版原版
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JPWO2009063824A1
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2007-11-14 |
2011-03-31 |
富士フイルム株式会社 |
塗布膜の乾燥方法及び平版印刷版原版の製造方法
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JP2009236355A
(ja)
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2008-03-26 |
2009-10-15 |
Fujifilm Corp |
乾燥方法及び装置
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JP5164640B2
(ja)
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2008-04-02 |
2013-03-21 |
富士フイルム株式会社 |
平版印刷版原版
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JP5183380B2
(ja)
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2008-09-09 |
2013-04-17 |
富士フイルム株式会社 |
赤外線レーザ用感光性平版印刷版原版
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JP2010237435A
(ja)
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2009-03-31 |
2010-10-21 |
Fujifilm Corp |
平版印刷版原版
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WO2011037005A1
(ja)
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2009-09-24 |
2011-03-31 |
富士フイルム株式会社 |
平版印刷版原版
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2010-02-17 |
2014-09-09 |
Fujifilm Corporation |
Method for producing a planographic printing plate
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JP5253433B2
(ja)
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2010-02-19 |
2013-07-31 |
富士フイルム株式会社 |
平版印刷版の作製方法
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WO2011125913A1
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2010-03-31 |
2011-10-13 |
富士フイルム株式会社 |
平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
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JP5490168B2
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2012-03-23 |
2014-05-14 |
富士フイルム株式会社 |
平版印刷版原版及び平版印刷版の作製方法
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JP5512730B2
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2012-03-30 |
2014-06-04 |
富士フイルム株式会社 |
平版印刷版の作製方法
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2021-04-15 |
2023-06-13 |
Industrial Technology Research Institute |
Photosensitive compound, photosensitive composition, and patterning method
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