AU8021782A - Non-silver positive working radiation sensitive compositions - Google Patents

Non-silver positive working radiation sensitive compositions

Info

Publication number
AU8021782A
AU8021782A AU80217/82A AU8021782A AU8021782A AU 8021782 A AU8021782 A AU 8021782A AU 80217/82 A AU80217/82 A AU 80217/82A AU 8021782 A AU8021782 A AU 8021782A AU 8021782 A AU8021782 A AU 8021782A
Authority
AU
Australia
Prior art keywords
radiation sensitive
positive working
sensitive compositions
working radiation
silver positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU80217/82A
Inventor
Jerome Kesselman
James Shelnut
Alan Wilkes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of AU8021782A publication Critical patent/AU8021782A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives
AU80217/82A 1981-02-20 1982-02-05 Non-silver positive working radiation sensitive compositions Abandoned AU8021782A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US23640081A 1981-02-20 1981-02-20
US236400 1981-02-20

Publications (1)

Publication Number Publication Date
AU8021782A true AU8021782A (en) 1982-08-26

Family

ID=22889334

Family Applications (1)

Application Number Title Priority Date Filing Date
AU80217/82A Abandoned AU8021782A (en) 1981-02-20 1982-02-05 Non-silver positive working radiation sensitive compositions

Country Status (5)

Country Link
JP (1) JPS57155534A (en)
AU (1) AU8021782A (en)
DE (1) DE3206108A1 (en)
FR (1) FR2500645A1 (en)
GB (1) GB2094015A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2614847B2 (en) * 1986-06-16 1997-05-28 東京応化工業 株式会社 Positive photosensitive composition
JPH01133045A (en) * 1987-11-17 1989-05-25 Mitsubishi Electric Corp Resist pattern forming method
JP2622267B2 (en) * 1988-03-23 1997-06-18 日立化成工業株式会社 Photosensitive resin composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1052699A (en) * 1963-12-03
FR1530266A (en) * 1966-07-08 1968-06-21 Kalle Ag Method and equipment for duplicating silver films
GB1204917A (en) * 1967-11-14 1970-09-09 Howson Algraphy Ltd Photographic printing plates
CA933791A (en) * 1969-06-13 1973-09-18 Broyde Barret Additives to positive photoresists which increase the sensitivity thereof
US3984250A (en) * 1970-02-12 1976-10-05 Eastman Kodak Company Light-sensitive diazoketone and azide compositions and photographic elements
BE789951A (en) * 1971-10-14 1973-04-11 Hoechst Co American METHOD FOR PRODUCING IMAGES BY MEANS OF A PHOTOSENSITIVE LAYER
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
JPS5619619B2 (en) * 1973-07-27 1981-05-08
DE2541982A1 (en) * 1975-09-20 1977-03-24 Ibm Deutschland PROCESS FOR Awareness Raising A POSITIVE WORKING PHOTORESIST AND PHOTORESIS MATERIAL
DE3071134D1 (en) * 1979-06-01 1985-11-07 Hoechst Co American Colour testing foil
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS5666844A (en) * 1979-11-05 1981-06-05 Kaneo Yamamoto Manufacture of diazo photosensitive paper preventing ground discoloration of copy

Also Published As

Publication number Publication date
DE3206108A1 (en) 1982-11-04
FR2500645A1 (en) 1982-08-27
JPS57155534A (en) 1982-09-25
GB2094015A (en) 1982-09-08

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