ES2938898T3 - Método de fabricación de una placa maestra - Google Patents
Método de fabricación de una placa maestra Download PDFInfo
- Publication number
- ES2938898T3 ES2938898T3 ES18810137T ES18810137T ES2938898T3 ES 2938898 T3 ES2938898 T3 ES 2938898T3 ES 18810137 T ES18810137 T ES 18810137T ES 18810137 T ES18810137 T ES 18810137T ES 2938898 T3 ES2938898 T3 ES 2938898T3
- Authority
- ES
- Spain
- Prior art keywords
- substrate
- layer
- mask
- etching
- etch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 69
- 238000000034 method Methods 0.000 claims abstract description 58
- 238000005530 etching Methods 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000001459 lithography Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000007639 printing Methods 0.000 claims description 4
- 238000000059 patterning Methods 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000004049 embossing Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 28
- 239000011247 coating layer Substances 0.000 claims 3
- 230000003287 optical effect Effects 0.000 description 9
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000000609 electron-beam lithography Methods 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 210000003128 head Anatomy 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000024121 nodulation Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D37/00—Tools as parts of machines covered by this subclass
- B21D37/20—Making tools by operations not covered by a single other subclass
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00769—Producing diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/44—Grating systems; Zone plate systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/0101—Head-up displays characterised by optical features
- G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
- G02B2027/0125—Field-of-view increase by wavefront division
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Dry Formation Of Fiberboard And The Like (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175505A FI128629B (en) | 2017-06-02 | 2017-06-02 | Method for making a master plate and a master plate |
| PCT/FI2018/050384 WO2018220272A1 (en) | 2017-06-02 | 2018-05-22 | Method of manufacturing a master plate and a master plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2938898T3 true ES2938898T3 (es) | 2023-04-17 |
Family
ID=64455230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES18810137T Active ES2938898T3 (es) | 2017-06-02 | 2018-05-22 | Método de fabricación de una placa maestra |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20210157042A1 (enExample) |
| EP (1) | EP3631538B8 (enExample) |
| JP (1) | JP7017196B2 (enExample) |
| CN (1) | CN110998375A (enExample) |
| ES (1) | ES2938898T3 (enExample) |
| FI (1) | FI128629B (enExample) |
| WO (1) | WO2018220272A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020131317A1 (en) | 2018-12-17 | 2020-06-25 | Applied Materials, Inc. | Methods for controlling etch depth by localized heating |
| WO2020232136A1 (en) * | 2019-05-15 | 2020-11-19 | Applied Materials, Inc. | Methods of forming variable-depth device structures |
| US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
| EP4217772A4 (en) * | 2020-09-23 | 2025-02-19 | Applied Materials, Inc. | FABRICATION OF A DIFFRACTIVE OPTICAL ELEMENT HAVING A VARIABLE REFRACTIVE INDEX PROFILE BY INKJET PRINTING DEPOSITION |
| US12259552B2 (en) * | 2020-12-17 | 2025-03-25 | Google Llc | Spatial variance along waveguide incoupler |
| US12652976B2 (en) * | 2021-07-22 | 2026-06-09 | Lawrence Livermore National Security, Llc | Systems and methods for silicon microstructures fabricated via greyscale DRIE with SOI release |
| BE1030607B1 (nl) * | 2022-06-10 | 2024-01-16 | Flooring Ind Ltd Sarl | Perselement en werkwijze voor het vervaardigen van perselementen |
| EP4393692A3 (en) * | 2021-12-02 | 2024-10-09 | Unilin, BV | Press element and method for manufacturing press elements |
| DE102022116428A1 (de) * | 2022-06-30 | 2024-01-04 | Hueck Rheinische Gmbh | Verfahren zur Bearbeitung einer Oberfläche eines Presswerkzeugs, sowie Vorrichtung zur Bearbeitung einer Oberfläche eines Presswerkzeugs |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60103310A (ja) * | 1983-11-11 | 1985-06-07 | Pioneer Electronic Corp | マイクロフレネルレンズの製造方法 |
| JPS6415705A (en) * | 1987-07-09 | 1989-01-19 | Matsushita Electric Industrial Co Ltd | Production of fine element |
| JPH06258510A (ja) * | 1993-03-09 | 1994-09-16 | Canon Inc | 回折格子製作用成形型およびその製造方法 |
| JP3576885B2 (ja) * | 1998-09-18 | 2004-10-13 | キヤノン株式会社 | 素子の製造方法 |
| JP2001004821A (ja) * | 1999-06-24 | 2001-01-12 | Canon Inc | 回折光学素子及びその製造方法 |
| US6905618B2 (en) * | 2002-07-30 | 2005-06-14 | Agilent Technologies, Inc. | Diffractive optical elements and methods of making the same |
| EP1547132A1 (en) * | 2002-09-18 | 2005-06-29 | Tokyo University of Science | Surface processing method |
| JP2006017788A (ja) * | 2004-06-30 | 2006-01-19 | Sumitomo Heavy Ind Ltd | 階段状表面を有する部材の製造方法及びその部材 |
| WO2006120720A1 (ja) * | 2005-05-02 | 2006-11-16 | Oki Electric Industry Co., Ltd. | 回折光学素子の製造方法 |
| JP2007057622A (ja) * | 2005-08-22 | 2007-03-08 | Ricoh Co Ltd | 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型 |
| EP1930776A4 (en) * | 2005-09-09 | 2008-11-26 | Univ Tokyo Sci Educ Found | PROCESS FOR PRODUCING A THREE-DIMENSIONAL FORM, PROCESS FOR MANUFACTURING A MICROFABRICATION PRODUCT, PROCESS FOR PRODUCING A MICROSTRUCTURE FORMULATION, THREE-DIMENSIONAL FORM, MICROFABRICATION PRODUCT, MICROSTRUCTURE FORMING AND OPTICAL DEVICE |
| JP2007328096A (ja) * | 2006-06-07 | 2007-12-20 | Ricoh Co Ltd | 回折光学素子とその作製方法および光学モジュール |
| JP2008089923A (ja) * | 2006-09-29 | 2008-04-17 | Oki Electric Ind Co Ltd | 光学素子の製造方法 |
| TWI438500B (zh) * | 2008-10-20 | 2014-05-21 | United Microelectronics Corp | 一種形成相位光柵的方法 |
| WO2018026412A1 (en) * | 2016-08-02 | 2018-02-08 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory | Fabrication method for digital etching of nanometer-scale level structures |
| US10649141B1 (en) * | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
| US10845609B2 (en) * | 2018-06-28 | 2020-11-24 | Intel Corporation | Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same |
-
2017
- 2017-06-02 FI FI20175505A patent/FI128629B/en active IP Right Grant
-
2018
- 2018-05-22 ES ES18810137T patent/ES2938898T3/es active Active
- 2018-05-22 JP JP2019566815A patent/JP7017196B2/ja active Active
- 2018-05-22 WO PCT/FI2018/050384 patent/WO2018220272A1/en not_active Ceased
- 2018-05-22 US US16/618,177 patent/US20210157042A1/en not_active Abandoned
- 2018-05-22 CN CN201880038535.4A patent/CN110998375A/zh active Pending
- 2018-05-22 EP EP18810137.2A patent/EP3631538B8/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN110998375A (zh) | 2020-04-10 |
| JP7017196B2 (ja) | 2022-02-08 |
| FI128629B (en) | 2020-09-15 |
| WO2018220272A1 (en) | 2018-12-06 |
| EP3631538B1 (en) | 2023-01-18 |
| JP2020522025A (ja) | 2020-07-27 |
| EP3631538A4 (en) | 2021-03-03 |
| EP3631538B8 (en) | 2023-03-22 |
| EP3631538A1 (en) | 2020-04-08 |
| FI20175505A1 (en) | 2018-12-03 |
| US20210157042A1 (en) | 2021-05-27 |
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