ES2938898T3 - Método de fabricación de una placa maestra - Google Patents
Método de fabricación de una placa maestra Download PDFInfo
- Publication number
- ES2938898T3 ES2938898T3 ES18810137T ES18810137T ES2938898T3 ES 2938898 T3 ES2938898 T3 ES 2938898T3 ES 18810137 T ES18810137 T ES 18810137T ES 18810137 T ES18810137 T ES 18810137T ES 2938898 T3 ES2938898 T3 ES 2938898T3
- Authority
- ES
- Spain
- Prior art keywords
- substrate
- layer
- mask
- etching
- etch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 69
- 238000000034 method Methods 0.000 claims abstract description 58
- 238000005530 etching Methods 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000001459 lithography Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000007639 printing Methods 0.000 claims description 4
- 238000000059 patterning Methods 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000004049 embossing Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 28
- 239000011247 coating layer Substances 0.000 claims 3
- 230000003287 optical effect Effects 0.000 description 9
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000000609 electron-beam lithography Methods 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 210000003128 head Anatomy 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000024121 nodulation Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D37/00—Tools as parts of machines covered by this subclass
- B21D37/20—Making tools by operations not covered by a single other subclass
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00769—Producing diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/44—Grating systems; Zone plate systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/0101—Head-up displays characterised by optical features
- G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
- G02B2027/0125—Field-of-view increase by wavefront division
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Dry Formation Of Fiberboard And The Like (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175505A FI128629B (en) | 2017-06-02 | 2017-06-02 | Method for making a master plate and a master plate |
| PCT/FI2018/050384 WO2018220272A1 (en) | 2017-06-02 | 2018-05-22 | Method of manufacturing a master plate and a master plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2938898T3 true ES2938898T3 (es) | 2023-04-17 |
Family
ID=64455230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES18810137T Active ES2938898T3 (es) | 2017-06-02 | 2018-05-22 | Método de fabricación de una placa maestra |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20210157042A1 (enExample) |
| EP (1) | EP3631538B8 (enExample) |
| JP (1) | JP7017196B2 (enExample) |
| CN (1) | CN110998375A (enExample) |
| ES (1) | ES2938898T3 (enExample) |
| FI (1) | FI128629B (enExample) |
| WO (1) | WO2018220272A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11554445B2 (en) * | 2018-12-17 | 2023-01-17 | Applied Materials, Inc. | Methods for controlling etch depth by localized heating |
| KR102778504B1 (ko) * | 2019-05-15 | 2025-03-06 | 어플라이드 머티어리얼스, 인코포레이티드 | 가변 깊이 디바이스 구조들을 형성하는 방법들 |
| US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
| JP7584635B2 (ja) * | 2020-09-23 | 2024-11-15 | アプライド マテリアルズ インコーポレイテッド | インクジェットプリンティング堆積による可変屈折率プロファイルを有する回折光学素子の作製 |
| US12259552B2 (en) * | 2020-12-17 | 2025-03-25 | Google Llc | Spatial variance along waveguide incoupler |
| US20230025444A1 (en) * | 2021-07-22 | 2023-01-26 | Lawrence Livermore National Security, Llc | Systems and methods for silicon microstructures fabricated via greyscale drie with soi release |
| EP4190541B1 (en) * | 2021-12-02 | 2024-07-24 | Unilin, BV | Press element and method for manufacturing press elements |
| BE1030607B1 (nl) * | 2022-06-10 | 2024-01-16 | Flooring Ind Ltd Sarl | Perselement en werkwijze voor het vervaardigen van perselementen |
| DE102022116428A1 (de) * | 2022-06-30 | 2024-01-04 | Hueck Rheinische Gmbh | Verfahren zur Bearbeitung einer Oberfläche eines Presswerkzeugs, sowie Vorrichtung zur Bearbeitung einer Oberfläche eines Presswerkzeugs |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60103310A (ja) * | 1983-11-11 | 1985-06-07 | Pioneer Electronic Corp | マイクロフレネルレンズの製造方法 |
| JPS6415705A (en) * | 1987-07-09 | 1989-01-19 | Matsushita Electric Industrial Co Ltd | Production of fine element |
| JPH06258510A (ja) * | 1993-03-09 | 1994-09-16 | Canon Inc | 回折格子製作用成形型およびその製造方法 |
| JP3576885B2 (ja) * | 1998-09-18 | 2004-10-13 | キヤノン株式会社 | 素子の製造方法 |
| JP2001004821A (ja) * | 1999-06-24 | 2001-01-12 | Canon Inc | 回折光学素子及びその製造方法 |
| US6905618B2 (en) * | 2002-07-30 | 2005-06-14 | Agilent Technologies, Inc. | Diffractive optical elements and methods of making the same |
| JP2005539393A (ja) * | 2002-09-18 | 2005-12-22 | 学校法人東京理科大学 | 表面加工方法 |
| JP2006017788A (ja) * | 2004-06-30 | 2006-01-19 | Sumitomo Heavy Ind Ltd | 階段状表面を有する部材の製造方法及びその部材 |
| WO2006120720A1 (ja) * | 2005-05-02 | 2006-11-16 | Oki Electric Industry Co., Ltd. | 回折光学素子の製造方法 |
| JP2007057622A (ja) * | 2005-08-22 | 2007-03-08 | Ricoh Co Ltd | 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型 |
| US20090176060A1 (en) * | 2005-09-09 | 2009-07-09 | Tokyo University Of Science Educational Foundation Administrative Org. | Process for Producing 3-Dimensional Mold, Process for Producing Microfabrication Product, Process for Producing Micropattern Molding, 3-Dimensional Mold, Microfabrication Product, Micropattern Molding and Optical Device |
| JP2007328096A (ja) * | 2006-06-07 | 2007-12-20 | Ricoh Co Ltd | 回折光学素子とその作製方法および光学モジュール |
| JP2008089923A (ja) * | 2006-09-29 | 2008-04-17 | Oki Electric Ind Co Ltd | 光学素子の製造方法 |
| TWI438500B (zh) * | 2008-10-20 | 2014-05-21 | United Microelectronics Corp | 一種形成相位光柵的方法 |
| EP3494418A4 (en) * | 2016-08-02 | 2020-03-11 | The Government of the United States of America, as represented by the Secretary of the Navy | MANUFACTURING METHOD FOR DIGITAL ETCHING OF NANOSCALE STRUCTURES |
| US10649141B1 (en) * | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
| US10845609B2 (en) * | 2018-06-28 | 2020-11-24 | Intel Corporation | Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same |
-
2017
- 2017-06-02 FI FI20175505A patent/FI128629B/en active IP Right Grant
-
2018
- 2018-05-22 US US16/618,177 patent/US20210157042A1/en not_active Abandoned
- 2018-05-22 JP JP2019566815A patent/JP7017196B2/ja active Active
- 2018-05-22 WO PCT/FI2018/050384 patent/WO2018220272A1/en not_active Ceased
- 2018-05-22 EP EP18810137.2A patent/EP3631538B8/en active Active
- 2018-05-22 ES ES18810137T patent/ES2938898T3/es active Active
- 2018-05-22 CN CN201880038535.4A patent/CN110998375A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2018220272A1 (en) | 2018-12-06 |
| US20210157042A1 (en) | 2021-05-27 |
| EP3631538A1 (en) | 2020-04-08 |
| JP2020522025A (ja) | 2020-07-27 |
| CN110998375A (zh) | 2020-04-10 |
| EP3631538B1 (en) | 2023-01-18 |
| FI20175505A1 (en) | 2018-12-03 |
| EP3631538A4 (en) | 2021-03-03 |
| JP7017196B2 (ja) | 2022-02-08 |
| FI128629B (en) | 2020-09-15 |
| EP3631538B8 (en) | 2023-03-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP3631538B1 (en) | Method of manufacturing a master plate | |
| US11391870B2 (en) | Height-modulated diffractive master plate and method of manufacturing thereof | |
| JP7338836B2 (ja) | 可変効率回折格子を製造する方法及び回折格子 | |
| JP7293352B2 (ja) | 角度付き格子の形成 | |
| JP6232731B2 (ja) | インプリントモールドの製造方法 | |
| KR20100047268A (ko) | 임프린트 방법 및 임프린트 방법을 사용하는 기판의 가공 방법 | |
| TWI710858B (zh) | 用於控制壓印材料的擴散之方法、製造裝置的方法、和基板 | |
| JP7143974B2 (ja) | 高さ調整された光回折格子を製造する方法 | |
| JP2020522021A (ja) | 回折格子の製造方法 | |
| JP6981064B2 (ja) | インプリントモールド及びそれを用いた凸状構造体の製造方法 | |
| KR20210052256A (ko) | 슈퍼스트레이트 척, 사용 방법 및 물품의 제조 방법 | |
| US10031414B2 (en) | Template, method of manufacturing the same, and imprint method | |
| JP2012035578A (ja) | ナノインプリント用モールド | |
| JP2008112036A (ja) | 微細構造体の製造方法 | |
| JP6221795B2 (ja) | インプリントモールドとこれを用いたインプリント方法およびインプリントモールドを製造するためのマスターモールド | |
| JP6547283B2 (ja) | 基板上構造体の製造方法 | |
| CN120322710A (zh) | 产生具有厚度非均匀的薄膜层的衍射光学元件的方法以及含有具有薄膜层的衍射光学元件的照明光导 | |
| KR20080103325A (ko) | 임프린트 리소그래피용 스탬프 및 이를 이용한 임프린트리소그래피방법 | |
| JP6950224B2 (ja) | インプリントモールド及びインプリントモールドの製造方法 | |
| KR100623027B1 (ko) | 그래이팅 패턴 및 그 제조 방법 | |
| JP6515618B2 (ja) | インプリントモールドとこれを用いたインプリント方法 | |
| JP2006017788A (ja) | 階段状表面を有する部材の製造方法及びその部材 |