CN110998375A - 制造母板的方法和母板 - Google Patents

制造母板的方法和母板 Download PDF

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Publication number
CN110998375A
CN110998375A CN201880038535.4A CN201880038535A CN110998375A CN 110998375 A CN110998375 A CN 110998375A CN 201880038535 A CN201880038535 A CN 201880038535A CN 110998375 A CN110998375 A CN 110998375A
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CN
China
Prior art keywords
substrate
layer
mask
etch
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201880038535.4A
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English (en)
Chinese (zh)
Inventor
J·拉霍迈基
M·埃尔德马尼斯
I·瓦蒂亚宁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dispelix Oy
Original Assignee
Dispelix Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dispelix Oy filed Critical Dispelix Oy
Publication of CN110998375A publication Critical patent/CN110998375A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D37/00—Tools as parts of machines covered by this subclass
    • B21D37/20—Making tools by operations not covered by a single other subclass
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/44—Grating systems; Zone plate systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1828—Diffraction gratings having means for producing variable diffraction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
    • G02B2027/0125—Field-of-view increase by wavefront division

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dry Formation Of Fiberboard And The Like (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
CN201880038535.4A 2017-06-02 2018-05-22 制造母板的方法和母板 Pending CN110998375A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20175505A FI128629B (en) 2017-06-02 2017-06-02 Method for making a master plate and a master plate
FI20175505 2017-06-02
PCT/FI2018/050384 WO2018220272A1 (en) 2017-06-02 2018-05-22 Method of manufacturing a master plate and a master plate

Publications (1)

Publication Number Publication Date
CN110998375A true CN110998375A (zh) 2020-04-10

Family

ID=64455230

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880038535.4A Pending CN110998375A (zh) 2017-06-02 2018-05-22 制造母板的方法和母板

Country Status (7)

Country Link
US (1) US20210157042A1 (enExample)
EP (1) EP3631538B8 (enExample)
JP (1) JP7017196B2 (enExample)
CN (1) CN110998375A (enExample)
ES (1) ES2938898T3 (enExample)
FI (1) FI128629B (enExample)
WO (1) WO2018220272A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116324533A (zh) * 2020-09-17 2023-06-23 元平台技术有限公司 使用灰色调光刻制造可变蚀刻深度光栅的技术

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020131317A1 (en) 2018-12-17 2020-06-25 Applied Materials, Inc. Methods for controlling etch depth by localized heating
WO2020232136A1 (en) * 2019-05-15 2020-11-19 Applied Materials, Inc. Methods of forming variable-depth device structures
EP4217772A4 (en) * 2020-09-23 2025-02-19 Applied Materials, Inc. FABRICATION OF A DIFFRACTIVE OPTICAL ELEMENT HAVING A VARIABLE REFRACTIVE INDEX PROFILE BY INKJET PRINTING DEPOSITION
US12259552B2 (en) * 2020-12-17 2025-03-25 Google Llc Spatial variance along waveguide incoupler
US12652976B2 (en) * 2021-07-22 2026-06-09 Lawrence Livermore National Security, Llc Systems and methods for silicon microstructures fabricated via greyscale DRIE with SOI release
BE1030607B1 (nl) * 2022-06-10 2024-01-16 Flooring Ind Ltd Sarl Perselement en werkwijze voor het vervaardigen van perselementen
EP4393692A3 (en) * 2021-12-02 2024-10-09 Unilin, BV Press element and method for manufacturing press elements
DE102022116428A1 (de) * 2022-06-30 2024-01-04 Hueck Rheinische Gmbh Verfahren zur Bearbeitung einer Oberfläche eines Presswerkzeugs, sowie Vorrichtung zur Bearbeitung einer Oberfläche eines Presswerkzeugs

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06258510A (ja) * 1993-03-09 1994-09-16 Canon Inc 回折格子製作用成形型およびその製造方法
JP2000155207A (ja) * 1998-09-18 2000-06-06 Canon Inc 素子の製造方法
US20040020892A1 (en) * 2002-07-30 2004-02-05 Matthews James Albert Diffractive optical elements and methods of making the same
JP2006017788A (ja) * 2004-06-30 2006-01-19 Sumitomo Heavy Ind Ltd 階段状表面を有する部材の製造方法及びその部材
US20060151435A1 (en) * 2002-09-18 2006-07-13 Jun Taniguchi Surface processing method
JP2007057622A (ja) * 2005-08-22 2007-03-08 Ricoh Co Ltd 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型
JP2007328096A (ja) * 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
CN101153927A (zh) * 2006-09-29 2008-04-02 冲电气工业株式会社 光学元件的制造方法
CN101171534A (zh) * 2005-05-02 2008-04-30 冲电气工业株式会社 衍射光学元件的制造方法
EP1930776A1 (en) * 2005-09-09 2008-06-11 Tokyo University of Science Educational Foundation Administrative Organization Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device
TW201017232A (en) * 2008-10-20 2010-05-01 United Microelectronics Corp Method for forming phase grating

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103310A (ja) * 1983-11-11 1985-06-07 Pioneer Electronic Corp マイクロフレネルレンズの製造方法
JPS6415705A (en) * 1987-07-09 1989-01-19 Matsushita Electric Industrial Co Ltd Production of fine element
JP2001004821A (ja) * 1999-06-24 2001-01-12 Canon Inc 回折光学素子及びその製造方法
WO2018026412A1 (en) * 2016-08-02 2018-02-08 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory Fabrication method for digital etching of nanometer-scale level structures
US10649141B1 (en) * 2018-04-23 2020-05-12 Facebook Technologies, Llc Gratings with variable etch heights for waveguide displays
US10845609B2 (en) * 2018-06-28 2020-11-24 Intel Corporation Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06258510A (ja) * 1993-03-09 1994-09-16 Canon Inc 回折格子製作用成形型およびその製造方法
JP2000155207A (ja) * 1998-09-18 2000-06-06 Canon Inc 素子の製造方法
US20040020892A1 (en) * 2002-07-30 2004-02-05 Matthews James Albert Diffractive optical elements and methods of making the same
US20060151435A1 (en) * 2002-09-18 2006-07-13 Jun Taniguchi Surface processing method
JP2006017788A (ja) * 2004-06-30 2006-01-19 Sumitomo Heavy Ind Ltd 階段状表面を有する部材の製造方法及びその部材
CN101171534A (zh) * 2005-05-02 2008-04-30 冲电气工业株式会社 衍射光学元件的制造方法
JP2007057622A (ja) * 2005-08-22 2007-03-08 Ricoh Co Ltd 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型
EP1930776A1 (en) * 2005-09-09 2008-06-11 Tokyo University of Science Educational Foundation Administrative Organization Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device
JP2007328096A (ja) * 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
CN101153927A (zh) * 2006-09-29 2008-04-02 冲电气工业株式会社 光学元件的制造方法
TW201017232A (en) * 2008-10-20 2010-05-01 United Microelectronics Corp Method for forming phase grating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116324533A (zh) * 2020-09-17 2023-06-23 元平台技术有限公司 使用灰色调光刻制造可变蚀刻深度光栅的技术

Also Published As

Publication number Publication date
JP7017196B2 (ja) 2022-02-08
FI128629B (en) 2020-09-15
ES2938898T3 (es) 2023-04-17
WO2018220272A1 (en) 2018-12-06
EP3631538B1 (en) 2023-01-18
JP2020522025A (ja) 2020-07-27
EP3631538A4 (en) 2021-03-03
EP3631538B8 (en) 2023-03-22
EP3631538A1 (en) 2020-04-08
FI20175505A1 (en) 2018-12-03
US20210157042A1 (en) 2021-05-27

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