JP7017196B2 - マスタープレートの製造方法及びマスタープレート - Google Patents

マスタープレートの製造方法及びマスタープレート Download PDF

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JP7017196B2
JP7017196B2 JP2019566815A JP2019566815A JP7017196B2 JP 7017196 B2 JP7017196 B2 JP 7017196B2 JP 2019566815 A JP2019566815 A JP 2019566815A JP 2019566815 A JP2019566815 A JP 2019566815A JP 7017196 B2 JP7017196 B2 JP 7017196B2
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layer
substrate
mask
etch
manufacturing
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Japanese (ja)
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JP2020522025A (ja
JP2020522025A5 (enExample
Inventor
ラホマキ、ユッシ
エルトマニス、ミハイル
バルティアイネン、イスモ
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ディスペリックス オーイー
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D37/00—Tools as parts of machines covered by this subclass
    • B21D37/20—Making tools by operations not covered by a single other subclass
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/44—Grating systems; Zone plate systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1828—Diffraction gratings having means for producing variable diffraction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
    • G02B2027/0125—Field-of-view increase by wavefront division

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dry Formation Of Fiberboard And The Like (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
JP2019566815A 2017-06-02 2018-05-22 マスタープレートの製造方法及びマスタープレート Active JP7017196B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20175505 2017-06-02
FI20175505A FI128629B (en) 2017-06-02 2017-06-02 Method for making a master plate and a master plate
PCT/FI2018/050384 WO2018220272A1 (en) 2017-06-02 2018-05-22 Method of manufacturing a master plate and a master plate

Publications (3)

Publication Number Publication Date
JP2020522025A JP2020522025A (ja) 2020-07-27
JP2020522025A5 JP2020522025A5 (enExample) 2020-12-17
JP7017196B2 true JP7017196B2 (ja) 2022-02-08

Family

ID=64455230

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JP2019566815A Active JP7017196B2 (ja) 2017-06-02 2018-05-22 マスタープレートの製造方法及びマスタープレート

Country Status (7)

Country Link
US (1) US20210157042A1 (enExample)
EP (1) EP3631538B8 (enExample)
JP (1) JP7017196B2 (enExample)
CN (1) CN110998375A (enExample)
ES (1) ES2938898T3 (enExample)
FI (1) FI128629B (enExample)
WO (1) WO2018220272A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11554445B2 (en) * 2018-12-17 2023-01-17 Applied Materials, Inc. Methods for controlling etch depth by localized heating
KR102778504B1 (ko) * 2019-05-15 2025-03-06 어플라이드 머티어리얼스, 인코포레이티드 가변 깊이 디바이스 구조들을 형성하는 방법들
US20220082739A1 (en) * 2020-09-17 2022-03-17 Facebook Technologies, Llc Techniques for manufacturing variable etch depth gratings using gray-tone lithography
JP7584635B2 (ja) * 2020-09-23 2024-11-15 アプライド マテリアルズ インコーポレイテッド インクジェットプリンティング堆積による可変屈折率プロファイルを有する回折光学素子の作製
US12259552B2 (en) * 2020-12-17 2025-03-25 Google Llc Spatial variance along waveguide incoupler
US20230025444A1 (en) * 2021-07-22 2023-01-26 Lawrence Livermore National Security, Llc Systems and methods for silicon microstructures fabricated via greyscale drie with soi release
EP4190541B1 (en) * 2021-12-02 2024-07-24 Unilin, BV Press element and method for manufacturing press elements
BE1030607B1 (nl) * 2022-06-10 2024-01-16 Flooring Ind Ltd Sarl Perselement en werkwijze voor het vervaardigen van perselementen
DE102022116428A1 (de) * 2022-06-30 2024-01-04 Hueck Rheinische Gmbh Verfahren zur Bearbeitung einer Oberfläche eines Presswerkzeugs, sowie Vorrichtung zur Bearbeitung einer Oberfläche eines Presswerkzeugs

Citations (9)

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Publication number Priority date Publication date Assignee Title
JP2000155207A (ja) 1998-09-18 2000-06-06 Canon Inc 素子の製造方法
JP2004062200A (ja) 2002-07-30 2004-02-26 Agilent Technol Inc 回折光学素子及びその製作方法
JP2006017788A (ja) 2004-06-30 2006-01-19 Sumitomo Heavy Ind Ltd 階段状表面を有する部材の製造方法及びその部材
JP2007328096A (ja) 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
JP2008089923A (ja) 2006-09-29 2008-04-17 Oki Electric Ind Co Ltd 光学素子の製造方法
CN101171534A (zh) 2005-05-02 2008-04-30 冲电气工业株式会社 衍射光学元件的制造方法
US20180040654A1 (en) 2016-08-02 2018-02-08 Marc Christophersen Fabrication method for digital etching of nanometer-scale level structures
US20190041656A1 (en) 2018-06-28 2019-02-07 Intel Corporation Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same
US10649141B1 (en) 2018-04-23 2020-05-12 Facebook Technologies, Llc Gratings with variable etch heights for waveguide displays

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JPS60103310A (ja) * 1983-11-11 1985-06-07 Pioneer Electronic Corp マイクロフレネルレンズの製造方法
JPS6415705A (en) * 1987-07-09 1989-01-19 Matsushita Electric Industrial Co Ltd Production of fine element
JPH06258510A (ja) * 1993-03-09 1994-09-16 Canon Inc 回折格子製作用成形型およびその製造方法
JP2001004821A (ja) * 1999-06-24 2001-01-12 Canon Inc 回折光学素子及びその製造方法
JP2005539393A (ja) * 2002-09-18 2005-12-22 学校法人東京理科大学 表面加工方法
JP2007057622A (ja) * 2005-08-22 2007-03-08 Ricoh Co Ltd 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型
US20090176060A1 (en) * 2005-09-09 2009-07-09 Tokyo University Of Science Educational Foundation Administrative Org. Process for Producing 3-Dimensional Mold, Process for Producing Microfabrication Product, Process for Producing Micropattern Molding, 3-Dimensional Mold, Microfabrication Product, Micropattern Molding and Optical Device
TWI438500B (zh) * 2008-10-20 2014-05-21 United Microelectronics Corp 一種形成相位光柵的方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000155207A (ja) 1998-09-18 2000-06-06 Canon Inc 素子の製造方法
JP2004062200A (ja) 2002-07-30 2004-02-26 Agilent Technol Inc 回折光学素子及びその製作方法
JP2006017788A (ja) 2004-06-30 2006-01-19 Sumitomo Heavy Ind Ltd 階段状表面を有する部材の製造方法及びその部材
CN101171534A (zh) 2005-05-02 2008-04-30 冲电气工业株式会社 衍射光学元件的制造方法
JP2007328096A (ja) 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
JP2008089923A (ja) 2006-09-29 2008-04-17 Oki Electric Ind Co Ltd 光学素子の製造方法
US20180040654A1 (en) 2016-08-02 2018-02-08 Marc Christophersen Fabrication method for digital etching of nanometer-scale level structures
US10649141B1 (en) 2018-04-23 2020-05-12 Facebook Technologies, Llc Gratings with variable etch heights for waveguide displays
US20190041656A1 (en) 2018-06-28 2019-02-07 Intel Corporation Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same

Also Published As

Publication number Publication date
WO2018220272A1 (en) 2018-12-06
US20210157042A1 (en) 2021-05-27
EP3631538A1 (en) 2020-04-08
JP2020522025A (ja) 2020-07-27
CN110998375A (zh) 2020-04-10
EP3631538B1 (en) 2023-01-18
FI20175505A1 (en) 2018-12-03
EP3631538A4 (en) 2021-03-03
FI128629B (en) 2020-09-15
EP3631538B8 (en) 2023-03-22
ES2938898T3 (es) 2023-04-17

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