FI128629B - Method for making a master plate and a master plate - Google Patents
Method for making a master plate and a master plate Download PDFInfo
- Publication number
- FI128629B FI128629B FI20175505A FI20175505A FI128629B FI 128629 B FI128629 B FI 128629B FI 20175505 A FI20175505 A FI 20175505A FI 20175505 A FI20175505 A FI 20175505A FI 128629 B FI128629 B FI 128629B
- Authority
- FI
- Finland
- Prior art keywords
- substrate
- layer
- mask
- etch
- height
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D37/00—Tools as parts of machines covered by this subclass
- B21D37/20—Making tools by operations not covered by a single other subclass
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00769—Producing diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/44—Grating systems; Zone plate systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/0101—Head-up displays characterised by optical features
- G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
- G02B2027/0125—Field-of-view increase by wavefront division
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Dry Formation Of Fiberboard And The Like (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175505A FI128629B (en) | 2017-06-02 | 2017-06-02 | Method for making a master plate and a master plate |
| EP18810137.2A EP3631538B8 (en) | 2017-06-02 | 2018-05-22 | Method of manufacturing a master plate |
| ES18810137T ES2938898T3 (es) | 2017-06-02 | 2018-05-22 | Método de fabricación de una placa maestra |
| US16/618,177 US20210157042A1 (en) | 2017-06-02 | 2018-05-22 | Method of manufacturing a master plate and a master plate |
| JP2019566815A JP7017196B2 (ja) | 2017-06-02 | 2018-05-22 | マスタープレートの製造方法及びマスタープレート |
| PCT/FI2018/050384 WO2018220272A1 (en) | 2017-06-02 | 2018-05-22 | Method of manufacturing a master plate and a master plate |
| CN201880038535.4A CN110998375A (zh) | 2017-06-02 | 2018-05-22 | 制造母板的方法和母板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20175505A FI128629B (en) | 2017-06-02 | 2017-06-02 | Method for making a master plate and a master plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FI20175505A1 FI20175505A1 (en) | 2018-12-03 |
| FI128629B true FI128629B (en) | 2020-09-15 |
Family
ID=64455230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI20175505A FI128629B (en) | 2017-06-02 | 2017-06-02 | Method for making a master plate and a master plate |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20210157042A1 (enExample) |
| EP (1) | EP3631538B8 (enExample) |
| JP (1) | JP7017196B2 (enExample) |
| CN (1) | CN110998375A (enExample) |
| ES (1) | ES2938898T3 (enExample) |
| FI (1) | FI128629B (enExample) |
| WO (1) | WO2018220272A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11554445B2 (en) * | 2018-12-17 | 2023-01-17 | Applied Materials, Inc. | Methods for controlling etch depth by localized heating |
| KR102778504B1 (ko) * | 2019-05-15 | 2025-03-06 | 어플라이드 머티어리얼스, 인코포레이티드 | 가변 깊이 디바이스 구조들을 형성하는 방법들 |
| US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
| JP7584635B2 (ja) * | 2020-09-23 | 2024-11-15 | アプライド マテリアルズ インコーポレイテッド | インクジェットプリンティング堆積による可変屈折率プロファイルを有する回折光学素子の作製 |
| US12259552B2 (en) * | 2020-12-17 | 2025-03-25 | Google Llc | Spatial variance along waveguide incoupler |
| US20230025444A1 (en) * | 2021-07-22 | 2023-01-26 | Lawrence Livermore National Security, Llc | Systems and methods for silicon microstructures fabricated via greyscale drie with soi release |
| EP4190541B1 (en) * | 2021-12-02 | 2024-07-24 | Unilin, BV | Press element and method for manufacturing press elements |
| BE1030607B1 (nl) * | 2022-06-10 | 2024-01-16 | Flooring Ind Ltd Sarl | Perselement en werkwijze voor het vervaardigen van perselementen |
| DE102022116428A1 (de) * | 2022-06-30 | 2024-01-04 | Hueck Rheinische Gmbh | Verfahren zur Bearbeitung einer Oberfläche eines Presswerkzeugs, sowie Vorrichtung zur Bearbeitung einer Oberfläche eines Presswerkzeugs |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60103310A (ja) * | 1983-11-11 | 1985-06-07 | Pioneer Electronic Corp | マイクロフレネルレンズの製造方法 |
| JPS6415705A (en) * | 1987-07-09 | 1989-01-19 | Matsushita Electric Industrial Co Ltd | Production of fine element |
| JPH06258510A (ja) * | 1993-03-09 | 1994-09-16 | Canon Inc | 回折格子製作用成形型およびその製造方法 |
| JP3576885B2 (ja) * | 1998-09-18 | 2004-10-13 | キヤノン株式会社 | 素子の製造方法 |
| JP2001004821A (ja) * | 1999-06-24 | 2001-01-12 | Canon Inc | 回折光学素子及びその製造方法 |
| US6905618B2 (en) * | 2002-07-30 | 2005-06-14 | Agilent Technologies, Inc. | Diffractive optical elements and methods of making the same |
| JP2005539393A (ja) * | 2002-09-18 | 2005-12-22 | 学校法人東京理科大学 | 表面加工方法 |
| JP2006017788A (ja) * | 2004-06-30 | 2006-01-19 | Sumitomo Heavy Ind Ltd | 階段状表面を有する部材の製造方法及びその部材 |
| WO2006120720A1 (ja) * | 2005-05-02 | 2006-11-16 | Oki Electric Industry Co., Ltd. | 回折光学素子の製造方法 |
| JP2007057622A (ja) * | 2005-08-22 | 2007-03-08 | Ricoh Co Ltd | 光学素子及びその製造方法、光学素子用形状転写型の製造方法及び光学素子用転写型 |
| US20090176060A1 (en) * | 2005-09-09 | 2009-07-09 | Tokyo University Of Science Educational Foundation Administrative Org. | Process for Producing 3-Dimensional Mold, Process for Producing Microfabrication Product, Process for Producing Micropattern Molding, 3-Dimensional Mold, Microfabrication Product, Micropattern Molding and Optical Device |
| JP2007328096A (ja) * | 2006-06-07 | 2007-12-20 | Ricoh Co Ltd | 回折光学素子とその作製方法および光学モジュール |
| JP2008089923A (ja) * | 2006-09-29 | 2008-04-17 | Oki Electric Ind Co Ltd | 光学素子の製造方法 |
| TWI438500B (zh) * | 2008-10-20 | 2014-05-21 | United Microelectronics Corp | 一種形成相位光柵的方法 |
| EP3494418A4 (en) * | 2016-08-02 | 2020-03-11 | The Government of the United States of America, as represented by the Secretary of the Navy | MANUFACTURING METHOD FOR DIGITAL ETCHING OF NANOSCALE STRUCTURES |
| US10649141B1 (en) * | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
| US10845609B2 (en) * | 2018-06-28 | 2020-11-24 | Intel Corporation | Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same |
-
2017
- 2017-06-02 FI FI20175505A patent/FI128629B/en active IP Right Grant
-
2018
- 2018-05-22 US US16/618,177 patent/US20210157042A1/en not_active Abandoned
- 2018-05-22 JP JP2019566815A patent/JP7017196B2/ja active Active
- 2018-05-22 WO PCT/FI2018/050384 patent/WO2018220272A1/en not_active Ceased
- 2018-05-22 EP EP18810137.2A patent/EP3631538B8/en active Active
- 2018-05-22 ES ES18810137T patent/ES2938898T3/es active Active
- 2018-05-22 CN CN201880038535.4A patent/CN110998375A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2018220272A1 (en) | 2018-12-06 |
| US20210157042A1 (en) | 2021-05-27 |
| EP3631538A1 (en) | 2020-04-08 |
| JP2020522025A (ja) | 2020-07-27 |
| CN110998375A (zh) | 2020-04-10 |
| EP3631538B1 (en) | 2023-01-18 |
| FI20175505A1 (en) | 2018-12-03 |
| EP3631538A4 (en) | 2021-03-03 |
| JP7017196B2 (ja) | 2022-02-08 |
| EP3631538B8 (en) | 2023-03-22 |
| ES2938898T3 (es) | 2023-04-17 |
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| FG | Patent granted |
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