ES2657710T3 - Macro-fotoiniciadores y composiciones curables de los mismos - Google Patents

Macro-fotoiniciadores y composiciones curables de los mismos Download PDF

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Publication number
ES2657710T3
ES2657710T3 ES11759867.2T ES11759867T ES2657710T3 ES 2657710 T3 ES2657710 T3 ES 2657710T3 ES 11759867 T ES11759867 T ES 11759867T ES 2657710 T3 ES2657710 T3 ES 2657710T3
Authority
ES
Spain
Prior art keywords
photoinitiator
macro
alkyl
compounds
independently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES11759867.2T
Other languages
English (en)
Spanish (es)
Inventor
John G. Woods
Roderick Coffey
Anthony F. Jacobine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel IP and Holding GmbH
Original Assignee
Henkel IP and Holding GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Henkel IP and Holding GmbH filed Critical Henkel IP and Holding GmbH
Application granted granted Critical
Publication of ES2657710T3 publication Critical patent/ES2657710T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
ES11759867.2T 2010-03-22 2011-02-17 Macro-fotoiniciadores y composiciones curables de los mismos Active ES2657710T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US316190P 2001-08-30
US31619010P 2010-03-22 2010-03-22
PCT/US2011/025153 WO2011119272A2 (en) 2010-03-22 2011-02-17 Macro-photoinitiators and curable compositions thereof

Publications (1)

Publication Number Publication Date
ES2657710T3 true ES2657710T3 (es) 2018-03-06

Family

ID=44673796

Family Applications (1)

Application Number Title Priority Date Filing Date
ES11759867.2T Active ES2657710T3 (es) 2010-03-22 2011-02-17 Macro-fotoiniciadores y composiciones curables de los mismos

Country Status (8)

Country Link
US (1) US8748503B2 (OSRAM)
EP (1) EP2550307B1 (OSRAM)
JP (1) JP5955832B2 (OSRAM)
KR (1) KR101437751B1 (OSRAM)
CN (1) CN102770465B (OSRAM)
CA (1) CA2786630C (OSRAM)
ES (1) ES2657710T3 (OSRAM)
WO (1) WO2011119272A2 (OSRAM)

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US9097979B2 (en) 2013-03-13 2015-08-04 Wisconsin Alumni Research Foundation Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
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US9587062B2 (en) * 2014-12-15 2017-03-07 Henkel IP & Holding GmbH and Henkel AG & Co. KGaA Photocrosslinkable block copolymers for hot-melt adhesives
EP3242899A4 (en) * 2015-01-08 2018-07-04 Henkel IP & Holding GmbH Process for preparing high molecular weight polyacrylates having narrow polydispersity indices
US10492888B2 (en) 2015-07-07 2019-12-03 Align Technology, Inc. Dental materials using thermoset polymers
EP4183853B1 (en) * 2016-04-15 2024-10-02 Beckman Coulter, Inc. Photoactive macromolecules and uses thereof
CN109476774B (zh) * 2016-07-11 2021-01-12 3M创新有限公司 使用可控自由基引发剂的聚合物材料及制备方法
KR102483100B1 (ko) 2017-09-15 2022-12-30 후지필름 가부시키가이샤 조성물, 막, 적층체, 적외선 투과 필터, 고체 촬상 소자 및 적외선 센서
CN116640061A (zh) * 2018-05-04 2023-08-25 阿莱恩技术有限公司 可聚合单体及其聚合方法
JP7437320B2 (ja) 2018-05-04 2024-02-22 アライン テクノロジー， インコーポレイテッド 高温リソグラフィーに基づく光重合プロセスへの使用の為の硬化性組成物及び其れから架橋されたポリマーを生産する方法
JP7114724B2 (ja) 2018-09-20 2022-08-08 富士フイルム株式会社 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法
JP7260847B2 (ja) 2019-02-26 2023-04-19 株式会社リコー 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置
JP7667735B2 (ja) 2019-06-27 2025-04-23 富士フイルム株式会社 組成物、膜および光センサ
JP7237166B2 (ja) 2019-08-29 2023-03-10 富士フイルム株式会社 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物
EP4024096A4 (en) 2019-08-30 2022-12-14 FUJIFILM Corporation COMPOSITION, FILM, OPTICAL FILTER AND METHOD OF MANUFACTURE THEREOF, SOLID STATE IMAGING ELEMENT, INFRARED SENSOR AND SENSOR MODULE
WO2021087061A2 (en) 2019-10-31 2021-05-06 Align Technology, Inc. Crystallizable resins
CN110981995B (zh) * 2019-12-27 2021-12-07 阜阳欣奕华材料科技有限公司 一种低迁移型光引发剂及其制备方法和应用
WO2021199748A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 組成物、膜及び光センサ
JP7477628B2 (ja) 2020-09-28 2024-05-01 富士フイルム株式会社 積層体の製造方法、アンテナインパッケージの製造方法、及び積層体
CN112430279A (zh) * 2020-11-23 2021-03-02 濮阳展辰新材料有限公司 一种酰化法制备大分子光引发剂的方法及其应用
WO2022131191A1 (ja) 2020-12-16 2022-06-23 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
EP4266093A4 (en) 2020-12-17 2024-08-28 FUJIFILM Corporation Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor
WO2022196599A1 (ja) 2021-03-19 2022-09-22 富士フイルム株式会社 膜および光センサ
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
WO2022210175A1 (ja) 2021-03-29 2022-10-06 富士フイルム株式会社 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット
WO2023032545A1 (ja) 2021-08-31 2023-03-09 富士フイルム株式会社 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液
JPWO2023054142A1 (OSRAM) 2021-09-29 2023-04-06
EP4456133A4 (en) 2021-12-23 2025-07-30 Fujifilm Corp Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part
KR20240129216A (ko) 2022-02-24 2024-08-27 후지필름 가부시키가이샤 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스
JPWO2023190064A1 (OSRAM) 2022-03-29 2023-10-05
WO2024043110A1 (ja) 2022-08-22 2024-02-29 富士フイルム株式会社 感光性組成物、膜および光センサ
WO2024070963A1 (ja) 2022-09-30 2024-04-04 富士フイルム株式会社 膜の製造方法、感光性樹脂組成物、硬化物の製造方法、硬化物、及び積層体
TW202424051A (zh) 2022-09-30 2024-06-16 日商富士軟片股份有限公司 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件
TW202424049A (zh) 2022-09-30 2024-06-16 日商富士軟片股份有限公司 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件

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IE45626B1 (en) 1976-07-14 1982-10-20 Loctite Ltd Filled cyanoacrylate adhesive compositions
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Also Published As

Publication number Publication date
JP5955832B2 (ja) 2016-07-20
EP2550307A2 (en) 2013-01-30
KR101437751B1 (ko) 2014-09-03
CA2786630A1 (en) 2011-09-29
EP2550307A4 (en) 2014-03-19
WO2011119272A3 (en) 2012-01-05
CN102770465B (zh) 2015-04-22
US8748503B2 (en) 2014-06-10
CN102770465A (zh) 2012-11-07
KR20130018702A (ko) 2013-02-25
CA2786630C (en) 2016-02-02
US20130018122A1 (en) 2013-01-17
JP2013522445A (ja) 2013-06-13
WO2011119272A2 (en) 2011-09-29
EP2550307B1 (en) 2017-11-22

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