CN102770465B - 大分子光引发剂及其可固化组合物 - Google Patents

大分子光引发剂及其可固化组合物 Download PDF

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Publication number
CN102770465B
CN102770465B CN201180010476.8A CN201180010476A CN102770465B CN 102770465 B CN102770465 B CN 102770465B CN 201180010476 A CN201180010476 A CN 201180010476A CN 102770465 B CN102770465 B CN 102770465B
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group
alkyl
residue
photoinitiator
macrophotoinitiator
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Chinese (zh)
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CN102770465A (zh
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J·G·伍茨
R·科菲
A·F·雅各比尼
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Henkel IP and Holding GmbH
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Henkel Us Intellectual Property LLC
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
CN201180010476.8A 2010-03-22 2011-02-17 大分子光引发剂及其可固化组合物 Expired - Fee Related CN102770465B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31619010P 2010-03-22 2010-03-22
US61/316,190 2010-03-22
PCT/US2011/025153 WO2011119272A2 (en) 2010-03-22 2011-02-17 Macro-photoinitiators and curable compositions thereof

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CN102770465A CN102770465A (zh) 2012-11-07
CN102770465B true CN102770465B (zh) 2015-04-22

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US (1) US8748503B2 (OSRAM)
EP (1) EP2550307B1 (OSRAM)
JP (1) JP5955832B2 (OSRAM)
KR (1) KR101437751B1 (OSRAM)
CN (1) CN102770465B (OSRAM)
CA (1) CA2786630C (OSRAM)
ES (1) ES2657710T3 (OSRAM)
WO (1) WO2011119272A2 (OSRAM)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9097979B2 (en) 2013-03-13 2015-08-04 Wisconsin Alumni Research Foundation Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
US10340816B2 (en) * 2014-08-29 2019-07-02 Mitsubishi Electric Corporation Semiconductor device and multiphase semiconductor device
US9587062B2 (en) * 2014-12-15 2017-03-07 Henkel IP & Holding GmbH and Henkel AG & Co. KGaA Photocrosslinkable block copolymers for hot-melt adhesives
EP3242899A4 (en) * 2015-01-08 2018-07-04 Henkel IP & Holding GmbH Process for preparing high molecular weight polyacrylates having narrow polydispersity indices
US10492888B2 (en) 2015-07-07 2019-12-03 Align Technology, Inc. Dental materials using thermoset polymers
EP4183853B1 (en) * 2016-04-15 2024-10-02 Beckman Coulter, Inc. Photoactive macromolecules and uses thereof
CN109476774B (zh) * 2016-07-11 2021-01-12 3M创新有限公司 使用可控自由基引发剂的聚合物材料及制备方法
KR102483100B1 (ko) 2017-09-15 2022-12-30 후지필름 가부시키가이샤 조성물, 막, 적층체, 적외선 투과 필터, 고체 촬상 소자 및 적외선 센서
CN116640061A (zh) * 2018-05-04 2023-08-25 阿莱恩技术有限公司 可聚合单体及其聚合方法
JP7437320B2 (ja) 2018-05-04 2024-02-22 アライン テクノロジー， インコーポレイテッド 高温リソグラフィーに基づく光重合プロセスへの使用の為の硬化性組成物及び其れから架橋されたポリマーを生産する方法
JP7114724B2 (ja) 2018-09-20 2022-08-08 富士フイルム株式会社 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法
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WO2021087061A2 (en) 2019-10-31 2021-05-06 Align Technology, Inc. Crystallizable resins
CN110981995B (zh) * 2019-12-27 2021-12-07 阜阳欣奕华材料科技有限公司 一种低迁移型光引发剂及其制备方法和应用
WO2021199748A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 組成物、膜及び光センサ
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CN112430279A (zh) * 2020-11-23 2021-03-02 濮阳展辰新材料有限公司 一种酰化法制备大分子光引发剂的方法及其应用
WO2022131191A1 (ja) 2020-12-16 2022-06-23 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
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TW202424051A (zh) 2022-09-30 2024-06-16 日商富士軟片股份有限公司 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件
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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458864B1 (en) * 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IE45626B1 (en) 1976-07-14 1982-10-20 Loctite Ltd Filled cyanoacrylate adhesive compositions
IE45111B1 (en) 1976-07-14 1982-06-30 Loctite Ltd Cyanoacrylate adhesive paste compositions
EP1177182B1 (en) 1999-05-10 2006-11-29 Ciba SC Holding AG Novel photoinitiators and their applications
EP1517958B1 (en) * 2002-07-03 2009-03-25 The Procter & Gamble Company Radiation curable low stress relaxation elastomeric materials
JP2009209275A (ja) * 2008-03-05 2009-09-17 Fujifilm Corp 光硬化性コーティング組成物、オーバープリント及びその製造方法
US9243083B2 (en) * 2008-04-03 2016-01-26 Henkel IP & Holding GmbH Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458864B1 (en) * 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Synthesis of block copolymers by combination of ATRP and photoiniferter processes;Yasemin Yuksel Durmaz et.al;《Polymer International》;20080813;第57卷(第10期);第1182-1187页 *
Yasemin Yuksel Durmaz et.al.Synthesis of block copolymers by combination of ATRP and photoiniferter processes.《Polymer International》.2008,第57卷(第10期),第1182-1187页. *

Also Published As

Publication number Publication date
JP5955832B2 (ja) 2016-07-20
ES2657710T3 (es) 2018-03-06
EP2550307A2 (en) 2013-01-30
KR101437751B1 (ko) 2014-09-03
CA2786630A1 (en) 2011-09-29
EP2550307A4 (en) 2014-03-19
WO2011119272A3 (en) 2012-01-05
US8748503B2 (en) 2014-06-10
CN102770465A (zh) 2012-11-07
KR20130018702A (ko) 2013-02-25
CA2786630C (en) 2016-02-02
US20130018122A1 (en) 2013-01-17
JP2013522445A (ja) 2013-06-13
WO2011119272A2 (en) 2011-09-29
EP2550307B1 (en) 2017-11-22

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