ES2188006T3 - Instalacion de recubrimiento a vacio y disposicion de acoplamiento y procedimiento para la fabricacion de piezas de trabajo. - Google Patents

Instalacion de recubrimiento a vacio y disposicion de acoplamiento y procedimiento para la fabricacion de piezas de trabajo.

Info

Publication number
ES2188006T3
ES2188006T3 ES98943617T ES98943617T ES2188006T3 ES 2188006 T3 ES2188006 T3 ES 2188006T3 ES 98943617 T ES98943617 T ES 98943617T ES 98943617 T ES98943617 T ES 98943617T ES 2188006 T3 ES2188006 T3 ES 2188006T3
Authority
ES
Spain
Prior art keywords
workpiece
chamber
chambers
work pieces
openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES98943617T
Other languages
English (en)
Inventor
Michael Hans
Martin Zaech
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Unaxis Trading AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unaxis Trading AG filed Critical Unaxis Trading AG
Application granted granted Critical
Publication of ES2188006T3 publication Critical patent/ES2188006T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/03Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations

Abstract

Instalación de recubrimiento a vacío con al menos: - una cámara de distribución central que se puede evacuar con una disposición de transporte de piezas de trabajo accionada controlada esencialmente a lo largo de un plano; - al menos una cámara de control para las cámaras de distribución así como al menos dos cámaras de tratamiento para producto a tratar, cuyas al menos tres cámaras se comunican a través de aberturas de control con la cámara de distribución, a través de cuyas aberturas se pueden transportar piezas de trabajo desde una cámara a la otra por medio de la disposición de transporte, caracterizada porque - están presentes soportes de piezas de trabajo, respectivamente, con una pluralidad de alojamientos de piezas de trabajo, por lo que la disposición de transporte transporta soportes de piezas de trabajo y las piezas de trabajo sobre los soportes de piezas de trabajo pueden ser transportadas a través de las aberturas, - en al menos una de las cámaras de tratamiento están presentesun accionamiento y una conexión de accionamiento, que puede ser establecida y liberada controlada de forma automática, entre el accionamiento y los alojamientos de piezas de trabajo de un soporte de piezas de trabajo introducido en la cámara de tratamiento.
ES98943617T 1997-09-29 1998-09-25 Instalacion de recubrimiento a vacio y disposicion de acoplamiento y procedimiento para la fabricacion de piezas de trabajo. Expired - Lifetime ES2188006T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH227897 1997-09-29
CH173698 1998-08-25

Publications (1)

Publication Number Publication Date
ES2188006T3 true ES2188006T3 (es) 2003-06-16

Family

ID=25688524

Family Applications (1)

Application Number Title Priority Date Filing Date
ES98943617T Expired - Lifetime ES2188006T3 (es) 1997-09-29 1998-09-25 Instalacion de recubrimiento a vacio y disposicion de acoplamiento y procedimiento para la fabricacion de piezas de trabajo.

Country Status (6)

Country Link
US (1) US6471837B1 (es)
EP (1) EP1025277B1 (es)
JP (1) JP2001518559A (es)
DE (1) DE59806376D1 (es)
ES (1) ES2188006T3 (es)
WO (1) WO1999016927A1 (es)

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DE102005003047A1 (de) * 2005-01-22 2006-07-27 Identif Gmbh Vorrichtung zum Bewegen von Werkstücken
DE102006032959B3 (de) * 2006-07-17 2007-12-27 JOH. WINKLHOFER & SÖHNE GMBH & Co. KG Werkstückträger für Vakuumbeschichtungsanlagen mit magnetischen Aufnahmekörpern
US20080072655A1 (en) * 2006-09-22 2008-03-27 Dell Products L.P. Sudden Acceleration Support Coupling
US20080305267A1 (en) * 2007-06-05 2008-12-11 Gray H Robert Method and apparatus for low cost high rate deposition tooling
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US9051650B2 (en) * 2009-01-16 2015-06-09 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
CN101818326B (zh) * 2009-02-26 2012-11-21 鸿富锦精密工业(深圳)有限公司 溅镀装置
CN101886248B (zh) * 2009-05-15 2013-08-21 鸿富锦精密工业(深圳)有限公司 溅镀式镀膜装置
CN101994090B (zh) * 2009-08-14 2013-06-05 鸿富锦精密工业(深圳)有限公司 溅镀载具及包括该溅镀载具的溅镀装置
CN102021528A (zh) * 2009-09-15 2011-04-20 鸿富锦精密工业(深圳)有限公司 镀膜装置
JP5353795B2 (ja) * 2010-03-31 2013-11-27 コベルコ建機株式会社 作業機械
TW201137139A (en) * 2010-04-16 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering device and sputtering method
TWI464284B (zh) * 2010-04-22 2014-12-11 Hon Hai Prec Ind Co Ltd 濺鍍裝置及濺鍍方法
TW201137142A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering device and sputtering method
TW201137145A (en) * 2010-04-29 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering device
CN102234768B (zh) * 2010-04-30 2014-11-05 鸿富锦精密工业(深圳)有限公司 溅镀装置
CN102234767B (zh) * 2010-04-30 2014-04-30 鸿富锦精密工业(深圳)有限公司 镀膜装置及镀膜方法
CN102234769B (zh) * 2010-04-30 2014-11-05 鸿富锦精密工业(深圳)有限公司 溅镀装置及溅镀方法
TW201144462A (en) * 2010-06-10 2011-12-16 Hon Hai Prec Ind Co Ltd Coating device
CN102443766A (zh) * 2010-10-15 2012-05-09 鸿富锦精密工业(深圳)有限公司 镀膜料架及具有该镀膜料架的镀膜设备
TWI480403B (zh) * 2010-10-26 2015-04-11 Hon Hai Prec Ind Co Ltd 鍍膜裝置
TW201217568A (en) * 2010-10-26 2012-05-01 Hon Hai Prec Ind Co Ltd Deposition device
CN102453879A (zh) * 2010-10-27 2012-05-16 鸿富锦精密工业(深圳)有限公司 镀膜装置
TW201226607A (en) * 2010-12-21 2012-07-01 Hon Hai Prec Ind Co Ltd Sputtering device
CN102534515A (zh) * 2010-12-22 2012-07-04 鸿富锦精密工业(深圳)有限公司 溅镀装置
TW201226609A (en) * 2010-12-24 2012-07-01 Hon Hai Prec Ind Co Ltd Sputtering device
CN102534516A (zh) * 2010-12-25 2012-07-04 鸿富锦精密工业(深圳)有限公司 溅镀装置
KR20120081932A (ko) * 2011-01-12 2012-07-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 성막 장치 및 제조 장치
US9722212B2 (en) 2011-02-14 2017-08-01 Semiconductor Energy Laboratory Co., Ltd. Lighting device, light-emitting device, and manufacturing method and manufacturing apparatus thereof
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JP5785131B2 (ja) * 2012-05-14 2015-09-24 トヨタ自動車株式会社 プラズマ成膜装置
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WO2016081407A1 (en) * 2014-11-17 2016-05-26 Integrated 3D Metallizing, Llc Integrated 3d metallizer
US11131024B2 (en) * 2015-02-13 2021-09-28 Oerlikon Surface Solutions Ag, Pfäffikon Fixture comprising magnetic means for holding rotary symmetric workpieces
WO2017200933A1 (en) * 2016-05-16 2017-11-23 Integrated 3D Metallizing, Llc Integrated 3d metallizer
US11339477B2 (en) * 2016-11-30 2022-05-24 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating apparatus and process
CN106756888B (zh) 2016-11-30 2018-07-13 江苏菲沃泰纳米科技有限公司 一种纳米镀膜设备旋转货架装置
CN107805786B (zh) * 2017-12-07 2023-12-08 北京泰科诺科技有限公司 多弧离子真空镀膜机
BR112020020610A2 (pt) * 2018-05-04 2021-01-12 Jiangsu Favored Nanotechnology Co., LTD Método de proteção de nano-revestimento para dispositivos elétricos
CN108950497B (zh) * 2018-08-28 2020-12-08 阜阳知麓信息科技有限公司 一种基于辉光放电原理将金属沉积在塑胶基材表面的镀膜系统
AT522169B1 (de) 2019-10-16 2020-09-15 Ess Holding Gmbh Vorrichtung zur Oberflächenbehandlung eines Werkstückes in einer Fertigungsstraße
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CN113981405A (zh) * 2021-09-03 2022-01-28 广东汇成真空科技股份有限公司 一种设有移动传送工件挂板机械手的大型真空镀膜机
CN114381706B (zh) * 2022-01-19 2023-11-03 湖南轩圣模型制造有限公司 一种双面塑胶制品的表面真空镀膜设备
CN114717532B (zh) * 2022-03-24 2023-11-03 布勒莱宝光学设备(北京)有限公司 真空镀膜系统
CN116426880B (zh) * 2023-04-28 2024-01-12 湖北中一科技股份有限公司 一种真空镀膜设备及其使用方法

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Also Published As

Publication number Publication date
DE59806376D1 (de) 2003-01-02
US6471837B1 (en) 2002-10-29
JP2001518559A (ja) 2001-10-16
EP1025277B1 (de) 2002-11-20
EP1025277A1 (de) 2000-08-09
WO1999016927A1 (de) 1999-04-08

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