CN106756888B - 一种纳米镀膜设备旋转货架装置 - Google Patents

一种纳米镀膜设备旋转货架装置 Download PDF

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CN106756888B
CN106756888B CN201611077033.1A CN201611077033A CN106756888B CN 106756888 B CN106756888 B CN 106756888B CN 201611077033 A CN201611077033 A CN 201611077033A CN 106756888 B CN106756888 B CN 106756888B
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CN106756888A (zh
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宗坚
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Jiangsu Favored Nanotechnology Co Ltd
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Abstract

本发明一种纳米镀膜设备旋转货架装置，属于真空镀膜技术领域。该装置中，包括反应腔室，所述反应腔室内设置有旋转货架，所述旋转货架的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，所述旋转货架底部圆盘上安装内齿圈，旋转电机轴上安装齿轮，工件放置在旋转货架的置物层上。本发明装置在镀膜过程中货架持续旋转，避免出现因各区域化学单体气体密度不均匀造成固定区域的工件涂层厚度不均匀现象；通过每层货架对应中空管上的通孔，可以使进入腔室内的化学单体气体形成沿每层货架径向往通孔位置扩散的趋势，使得从腔壁到中空管区域化学单体密度更加均匀。

Description

一种纳米镀膜设备旋转货架装置
技术领域
本发明属于真空镀膜技术领域，特别涉及一种纳米镀膜设备旋转货架装置。
背景技术
等离子镀膜作为提升材料表面性能有效方法被广泛应用于航空航天、汽车制造、机械重工和五金工具制造等领域。在等离子镀膜过程中，需要将镀膜设备腔室内空气抽出维持低压力状态，同时需要通入工艺气体和化学单体气体用于反应生成聚合物涂层。由于整个等离子镀膜过程中需要持续抽气，且抽气口、进气口、加料口位置是固定的，因此化学单体气体有向抽气口方向扩散的趋势，导致化学单体气体在加料口区域和扩散方向区域的密度相对较大。这就出现了这些区域放置的被镀膜工件表面聚合物涂层厚度较厚而其他区域涂层厚度较薄现象，造成批量生产的质量不一致。
发明内容
本发明的目的是克服上述不足，提供一种纳米镀膜设备旋转货架装置。
本发明为实现上述目的所采用的技术方案如下：
一种纳米镀膜设备旋转货架装置，其特征在于：包括反应腔室，所述反应腔室内设置有旋转货架，所述旋转货架的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，抽气口安装有导向套，且导向套内径比中空管外径大，中空管可插入抽气口导向套并相对抽气口转动。所述旋转货架底部圆盘上安装内齿圈，旋转电机轴上安装齿轮，齿轮与内齿圈啮合，通过齿轮带动货架底部圆盘齿圈使货架转动，工件放置在旋转货架的置物层上，真空泵通过真空管路与腔体抽气口连接，进气阀通过进气管路与腔体进气口连接，加料阀通过加料管路与腔体加料口连接，射频电源通过导线与腔体内电极连接。
所述反应腔室的腔容积为50L～3000L，材质为铝合金或不锈钢。
所述旋转货架包括1～20层置物层，材质为铝合金或不锈钢。
所述真空泵的功率为3-50KW，抽速为600-1200m3/h。
所述旋转电机的的功率为30-3000W。
所述射频电源的功率为50-1500W。
本发明的上述技术方案与现有技术相比具有以下优点：
(1)镀膜过程中货架持续旋转，避免出现因各区域化学单体气体密度不均匀造成固定区域的工件涂层厚度不均匀现象。同时，货架转动也有利于将进入腔室内的化学单体气体充分混合均匀。
(2)通过每层货架对应中空管上的通孔，可以使进入腔室内的化学单体气体形成沿每层货架径向往通孔位置扩散的趋势，使得从腔壁到中空管区域化学单体密度更加均匀。
附图说明
图1为一种纳米镀膜设备旋转货架装置结构示意图
图中：1、反应腔室，2、旋转货架，3、真空泵，4、进气阀，5、加料阀，6、旋转电机，7、射频电源，8、工件。
具体实施方式
下面结合附图和具体实施例详细说明本发明，但本发明并不局限于具体实施例。
实施例1
如图1所示：一种纳米镀膜设备旋转货架装置，其特征在于：包括反应腔室，反应腔室的容积为50L，所述反应腔室内设置有旋转货架，旋转货架包括1层置物层，所述旋转货架的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，抽气口安装有导向套，且导向套内径比中空管外径大，中空管可插入抽气口导向套并相对抽气口转动，所述旋转货架底部圆盘上安装内齿圈，旋转电机轴上安装齿轮，旋转电机的功率为30W，通过齿轮带动货架底部圆盘齿圈使货架转动，工件放置在旋转货架的置物层上，真空泵通过真空管路与腔体抽气口连接，真空泵的功率为3KW，抽速为600m3/h，进气阀通过进气管路与腔体进气口连接，加料阀通过加料管路与腔体加料口连接，射频电源通过导线与腔体内电极连接，射频电源的功率为50W。
实施例2
如图1所示：一种纳米镀膜设备旋转货架装置，其特征在于：包括反应腔室，反应腔室的容积为500L，所述反应腔室内设置有旋转货架，旋转货架包括10层置物层，所述旋转货架的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，抽气口安装有导向套，且导向套内径比中空管外径大，中空管可插入抽气口导向套并相对抽气口转动，所述旋转货架底部圆盘上安装内齿圈，旋转电机轴上安装齿轮，旋转电机的的功率为300W，通过齿轮带动货架底部圆盘齿圈使货架转动，工件放置在旋转货架的置物层上，真空泵通过真空管路与腔体抽气口连接，真空泵的功率为12KW，抽速为800m3/h，进气阀通过进气管路与腔体进气口连接，加料阀通过加料管路与腔体加料口连接，射频电源通过导线与腔体内电极连接，射频电源的功率为300W。
实施例3
如图1所示：一种纳米镀膜设备旋转货架装置，其特征在于：包括反应腔室，反应腔室的容积为1800L，所述反应腔室内设置有旋转货架，旋转货架包括15层置物层，所述旋转货架的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，抽气口安装有导向套，且导向套内径比中空管外径大，中空管可插入抽气口导向套并相对抽气口转动，所述旋转货架底部圆盘上安装内齿圈，旋转电机轴上安装齿轮，旋转电机的的功率为1500W，通过齿轮带动货架底部圆盘齿圈使货架转动，工件放置在旋转货架的置物层上，真空泵通过真空管路与腔体抽气口连接，真空泵的功率为30KW，抽速为1100m3/h，进气阀通过进气管路与腔体进气口连接，加料阀通过加料管路与腔体加料口连接，射频电源通过导线与腔体内电极连接，射频电源的功率为1000W。
工件制作流程如下：首先将镀膜工件放置于镀膜设备腔室内的旋转货架的置物层上，真空泵从抽气口将腔室内空气抽出使腔室内压力降低，然后通过进气阀从进气口向腔室内通入工艺气体，再通过加料阀从加料口向腔室内添加化学单体气体，旋转电机带动货架旋转,由射频电源放电，引发化学单体气体发生聚合并沉积在工件表面形成聚合物涂层。
实施例4
如图1所示：一种纳米镀膜设备旋转货架装置，其特征在于：包括反应腔室，反应腔室的容积为3000L，所述反应腔室内设置有旋转货架，旋转货架包括20层置物层，所述旋转货架的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，抽气口安装有导向套，且导向套内径比中空管外径大，中空管可插入抽气口导向套并相对抽气口转动，所述旋转货架底部圆盘上安装内齿圈，旋转电机轴上安装齿轮，旋转电机的的功率为3000W，通过齿轮带动货架底部圆盘齿圈使货架转动，工件放置在旋转货架的置物层上，真空泵通过真空管路与腔体抽气口连接，真空泵的功率为50KW，抽速为1200m3/h，进气阀通过进气管路与腔体进气口连接，加料阀通过加料管路与腔体加料口连接，射频电源通过导线与腔体内电极连接，射频电源的功率为1500W。

Claims (6)

1.一种纳米镀膜设备旋转货架装置，其特征在于：包括反应腔室(1)，所述反应腔室(1)内设置有旋转货架(2)，所述旋转货架(2)的中心轴为中空管结构，且中空管上设置有通孔，反应腔室顶部安装有抽气口，抽气口与中空管在同一轴线上且位于其上方，抽气口安装有导向套，且导向套内径比中空管外径大，所述旋转货架(2)底部圆盘上安装内齿圈，旋转电机(6)轴上安装齿轮，工件(8)放置在旋转货架(2)的置物层上，真空泵(3)通过真空管路与反应腔室(1)腔体抽气口连接，进气阀(4)通过进气管路与反应腔室(1)腔体进气口连接，加料阀(5)通过加料管路与反应腔室(1)腔体加料口连接，射频电源(7)通过导线与反应腔室(1)腔体内电极连接。
2.根据权利要求1所述的一种纳米镀膜设备旋转货架装置，其特征在于：所述反应腔室(1)的腔容积为50L～3000L，材质为铝合金或不锈钢。
3.根据权利要求1所述的一种纳米镀膜设备旋转货架装置，其特征在于：所述旋转货架(2)包括1～20层置物层，材质为铝合金或不锈钢。
4.根据权利要求1所述的一种纳米镀膜设备旋转货架装置，其特征在于：所述真空泵(3)的功率为3-50KW，抽速为600-1200m3/h。
5.根据权利要求1所述的一种纳米镀膜设备旋转货架装置，其特征在于：所述旋转电机(6)的功率为30-3000W。
6.根据权利要求1所述的一种纳米镀膜设备旋转货架装置，其特征在于：所述射频电源(7)的功率为50-1500W。
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