ES2066757T3 - Metodo mejorado para el curado selectivo de una resina fotosensible liquida a traves de exposicion mediante plantilla. - Google Patents

Metodo mejorado para el curado selectivo de una resina fotosensible liquida a traves de exposicion mediante plantilla.

Info

Publication number
ES2066757T3
ES2066757T3 ES87116668T ES87116668T ES2066757T3 ES 2066757 T3 ES2066757 T3 ES 2066757T3 ES 87116668 T ES87116668 T ES 87116668T ES 87116668 T ES87116668 T ES 87116668T ES 2066757 T3 ES2066757 T3 ES 2066757T3
Authority
ES
Spain
Prior art keywords
photosensitive resin
improved method
exposure
liquid photosensitive
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES87116668T
Other languages
English (en)
Inventor
Tsutomu Kojima
Takashi Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Application granted granted Critical
Publication of ES2066757T3 publication Critical patent/ES2066757T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

SE SUMINISTRA UN METODO MEJORADO PARA ENDURECER SELECTIVAMENTE UNA RESINA FOTOSENSIBLE LIQUIDA MEDIANTE EXPOSICION ENMASCARADA EN EL CUAL SE SUMINISTRA UN CONTACTO ASPERO, DESIGUAL O IRREGULAR DIRECTA O INDIRECTAMENTE ENTRE LA PELICULA DE ENMASCARAMIENTO Y EL SUBSTRATO. DEBIDO A ESTA CARACTERISTICA, SE EVITA LA COEXION INTERFACIAL ENTRE LA SUPERFICIE INFERIOR DE LA PELICULA DE ENMASCARAMIENTO QUE MIRA HACIA EL SUBSTRATO Y LA SUPERFICIE SUPERIOR DEL SUBSTRATO QUE MIRA A LA PELICULA DE ENMASCARAMIENTO. DE ESTA FORMA NO EXISTEN BOLSAS DE AIRE FORMADAS ENTRE LAS DOS SUPERFICIES. ADEMAS, NO HAY PELIGRO DE QUE EL SUBSTRATO PUDIERA SOBRESALIR DE LA CAPA DE RESINA DE TAL FORMA QUE LA PLANCHA DE IMPRESION PODRIA TENER UNA DISMINUCION LOCAL NO DESEABLE EN SU GROSOR. COMO RESULTADO MEDIANTE EL METODO DEL PRESENTE INVENTO, SE PUEDE OBTENER UNA LAMINA DE IMPRESION QUE TIENE UN ALTO GRADO DE UNIFORMIDAD EN SU GROSOR, CON BUENA REPRODUCTIBILIDAD.
ES87116668T 1986-11-12 1987-11-11 Metodo mejorado para el curado selectivo de una resina fotosensible liquida a traves de exposicion mediante plantilla. Expired - Lifetime ES2066757T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61267715A JP2515521B2 (ja) 1986-11-12 1986-11-12 改良されたマスキング露光方法及びそれを用いた製版方法

Publications (1)

Publication Number Publication Date
ES2066757T3 true ES2066757T3 (es) 1995-03-16

Family

ID=17448546

Family Applications (1)

Application Number Title Priority Date Filing Date
ES87116668T Expired - Lifetime ES2066757T3 (es) 1986-11-12 1987-11-11 Metodo mejorado para el curado selectivo de una resina fotosensible liquida a traves de exposicion mediante plantilla.

Country Status (7)

Country Link
EP (1) EP0267600B1 (es)
JP (1) JP2515521B2 (es)
AU (1) AU599164B2 (es)
DE (1) DE3751023D1 (es)
ES (1) ES2066757T3 (es)
NO (1) NO174880C (es)
ZA (1) ZA878480B (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3906179A1 (de) * 1989-02-28 1990-08-30 Basf Ag Vorrichtung zum belichten von photopolymeren druckplatten
JP2886254B2 (ja) * 1990-04-25 1999-04-26 旭化成工業株式会社 感光性樹脂版の製造方法及びそれに用いる製版装置
IT1271919B (it) * 1993-01-12 1997-06-10 Caria Riccardo De Procedimento di produzione di lastre di stampa fotosensibili perfezionate
US5813342A (en) * 1997-03-27 1998-09-29 Macdermid Imaging Technology, Incorporated Method and assembly for producing printing plates
ES2261094B1 (es) * 2005-09-12 2007-09-16 Ricardo Angel Ruggiero Procedimiento para la fabricacion de rodillos para la impresion de materiales laminares, maquina para la realizacion del procedimiento y soporte de impresion para los rodillos de impresion.
JP2009157122A (ja) * 2007-12-27 2009-07-16 Nakan Corp 感光性樹脂版シートの製造装置および製造方法
JP4872921B2 (ja) * 2008-01-07 2012-02-08 株式会社島津製作所 反応容器
US20100141969A1 (en) * 2008-12-08 2010-06-10 Brazier David B Method and Apparatus for Making Liquid Flexographic Printing Elements
US8198013B2 (en) * 2010-05-05 2012-06-12 E. I. Du Pont De Nemours And Company Method for preparing a printing form
JP2016126240A (ja) * 2015-01-07 2016-07-11 住友ゴム工業株式会社 印刷用樹脂原版の製造方法およびフレキソ印刷版
US9740103B2 (en) * 2015-11-09 2017-08-22 Macdermid Printing Solutions, Llc Method and apparatus for producing liquid flexographic printing plates
CN106094428A (zh) * 2016-08-22 2016-11-09 昆山良品丝印器材有限公司 精密网版晒板夹具
US10625334B2 (en) * 2017-04-11 2020-04-21 Macdermid Graphics Solutions, Llc Method of producing a relief image from a liquid photopolymer resin

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3507593A (en) * 1967-05-08 1970-04-21 Tektronix Inc Contact negative with method and apparatus employing the same
JPS5031488B2 (es) * 1971-10-11 1975-10-11
JPS502936A (es) * 1973-05-08 1975-01-13
JPS5623150A (en) * 1979-07-31 1981-03-04 Kawasaki Seisakusho:Kk Double paper sheet detector
DE2932086A1 (de) * 1979-08-08 1981-02-19 Mohn Gmbh Reinhard Kontaktkopierverfahren sowie vorrichtung zur durchfuehrung des verfahrens
JPS5636653A (en) * 1979-08-31 1981-04-09 Unitika Ltd Photosensitive resin plate for relief
IT8121966V0 (it) * 1981-06-03 1981-06-03 Repro Master Electonic Srl Perfezionamento nelle macchine grafiche del tipo foto-lito, repro, serigrafico, bromografico.
JPS59146056A (ja) * 1983-02-09 1984-08-21 Hitachi Chem Co Ltd 印刷配線板用基板に形成された光重合性樹脂フイルムの焼付法
EP0169294B1 (en) * 1984-07-23 1992-04-01 Asahi Kasei Kogyo Kabushiki Kaisha A resin printing plate and preparation thereof
JPS61172148A (ja) * 1984-11-10 1986-08-02 Osaka Seihan Center Kyogyo Kumiai 樹脂刷版の製版方法
JPS61172149A (ja) * 1984-11-21 1986-08-02 Osaka Seihan Center Kyogyo Kumiai 樹脂刷版の製造方法

Also Published As

Publication number Publication date
AU8111287A (en) 1988-05-19
EP0267600B1 (en) 1995-01-25
NO874706D0 (no) 1987-11-11
NO874706L (no) 1988-05-13
NO174880B (no) 1994-04-18
AU599164B2 (en) 1990-07-12
JP2515521B2 (ja) 1996-07-10
ZA878480B (en) 1988-05-09
EP0267600A2 (en) 1988-05-18
EP0267600A3 (en) 1990-04-04
JPS63121849A (ja) 1988-05-25
NO174880C (no) 1994-08-10
DE3751023D1 (de) 1995-03-09

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