ATE47431T1 - Verfahren zur oberflaechenbehandlung. - Google Patents

Verfahren zur oberflaechenbehandlung.

Info

Publication number
ATE47431T1
ATE47431T1 AT85107462T AT85107462T ATE47431T1 AT E47431 T1 ATE47431 T1 AT E47431T1 AT 85107462 T AT85107462 T AT 85107462T AT 85107462 T AT85107462 T AT 85107462T AT E47431 T1 ATE47431 T1 AT E47431T1
Authority
AT
Austria
Prior art keywords
surface treatment
substrate
treatment procedures
forming
metal
Prior art date
Application number
AT85107462T
Other languages
English (en)
Inventor
Yasuhiro C O Itami Wor Shimizu
Chome
Akira C O Itami Works Doi
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Application granted granted Critical
Publication of ATE47431T1 publication Critical patent/ATE47431T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT85107462T 1984-06-29 1985-06-14 Verfahren zur oberflaechenbehandlung. ATE47431T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59136024A JPS6115967A (ja) 1984-06-29 1984-06-29 表面処理方法
EP85107462A EP0166349B1 (de) 1984-06-29 1985-06-14 Verfahren zur Oberflächenbehandlung

Publications (1)

Publication Number Publication Date
ATE47431T1 true ATE47431T1 (de) 1989-11-15

Family

ID=15165399

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85107462T ATE47431T1 (de) 1984-06-29 1985-06-14 Verfahren zur oberflaechenbehandlung.

Country Status (6)

Country Link
US (1) US4634600A (de)
EP (1) EP0166349B1 (de)
JP (1) JPS6115967A (de)
AT (1) ATE47431T1 (de)
CA (1) CA1240281A (de)
DE (1) DE3573806D1 (de)

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JP2892231B2 (ja) * 1992-09-16 1999-05-17 健 増本 Ｔｉ−Ｓｉ−Ｎ系複合硬質膜及びその製造方法
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US5391407A (en) * 1994-03-18 1995-02-21 Southwest Research Institute Process for forming protective diamond-like carbon coatings on metallic surfaces
US5984905A (en) 1994-07-11 1999-11-16 Southwest Research Institute Non-irritating antimicrobial coating for medical implants and a process for preparing same
US6335062B1 (en) * 1994-09-13 2002-01-01 The United States Of America As Represented By The Secretary Of The Navy Reactive oxygen-assisted ion implantation into metals and products made therefrom
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DE69611804D1 (de) * 1995-04-17 2001-03-29 Read Rite Corp Bildung eines isolierenden dünnen Filmes durch eine Vielzahl von Ionenstrahlen
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DE69925753T2 (de) 1998-10-23 2006-03-16 Ebara Corp. Gleitkörper und verfahren zu seiner herstellung
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RU2161661C1 (ru) * 1999-08-16 2001-01-10 Падеров Анатолий Николаевич Способ нанесения износостойких покрытий и повышения долговечности деталей
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US20050100673A1 (en) * 2002-05-22 2005-05-12 Ulrich Schoof Method for the surface treatment of a doctor element
US7998174B2 (en) * 2005-02-17 2011-08-16 Kyphon Sarl Percutaneous spinal implants and methods
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US8829331B2 (en) 2012-08-10 2014-09-09 Dimerond Technologies Llc Apparatus pertaining to the co-generation conversion of light into electricity
US9040395B2 (en) 2012-08-10 2015-05-26 Dimerond Technologies, Llc Apparatus pertaining to solar cells having nanowire titanium oxide cores and graphene exteriors and the co-generation conversion of light into electricity using such solar cells
US8586999B1 (en) 2012-08-10 2013-11-19 Dimerond Technologies, Llc Apparatus pertaining to a core of wide band-gap material having a graphene shell
EP3977521A4 (de) 2019-06-03 2023-05-10 Dimerond Technologies, LLC Hocheffiziente graphen-breitband-halbleiter-heteroübergangssolarzellen

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Also Published As

Publication number Publication date
JPH044394B2 (de) 1992-01-28
US4634600A (en) 1987-01-06
EP0166349B1 (de) 1989-10-18
JPS6115967A (ja) 1986-01-24
DE3573806D1 (en) 1989-11-23
EP0166349A1 (de) 1986-01-02
CA1240281A (en) 1988-08-09

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee